JPH06304064A - Ceramic heating container - Google Patents
Ceramic heating containerInfo
- Publication number
- JPH06304064A JPH06304064A JP9341093A JP9341093A JPH06304064A JP H06304064 A JPH06304064 A JP H06304064A JP 9341093 A JP9341093 A JP 9341093A JP 9341093 A JP9341093 A JP 9341093A JP H06304064 A JPH06304064 A JP H06304064A
- Authority
- JP
- Japan
- Prior art keywords
- container
- nickel
- film
- elements
- electromagnetic induction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Cookers (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、電磁調理器用もしくは
電磁誘導加熱装置用のセラミックス製加熱容器に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a ceramic heating container for an electromagnetic cooker or an electromagnetic induction heating device.
【０００２】[0002]
【従来の技術】電磁誘導加熱装置は、その加熱原理か
ら、鉄やステンレス等の金属しか加熱できないために、
セラミックスやガラスの容器を加熱する場合は、その容
器の外側もしくは内側に銀あるいはアルミニウムの薄膜
を形成させていた。2. Description of the Related Art An electromagnetic induction heating device can heat only metals such as iron and stainless steel because of its heating principle.
When heating a ceramic or glass container, a thin film of silver or aluminum was formed on the outside or inside of the container.
【０００３】しかしながら、銀薄膜はセラミックスとの
付着力が弱く、剥離してしまうという問題があり、この
ため、この銀薄膜の上にさらに保護膜を形成しなければ
ならず、製造工程の複雑化やコストが向上するという問
題がある。However, the silver thin film has a problem of weak adhesion to ceramics and peeling off. Therefore, a protective film must be further formed on the silver thin film, which complicates the manufacturing process. There is a problem that the cost is improved.
【０００４】一方、アルミニウム粉をセラミックス容器
の表面に溶射し薄膜を形成させるという方法がある（実
開昭６１−１６６４９７号公報参照）。この方法によっ
て、セラミックス容器表面に、強い付着力のアルミニウ
ム薄膜を安価に形成することができるが、この容器はア
ルミニウムの融点が低いため、ガスコンロの直火による
加熱ができなかった。さらに、空炊きなどの過酷な条件
で電磁誘導加熱装置での使用を続けたい場合、形成させ
たアルミニウムが薄膜（約２８μｍ）であるため、薄膜
が融点近い温度（約６００℃）に達してしまい、膜が酸
化して加熱ができなくなるという問題がある。On the other hand, there is a method of spraying aluminum powder on the surface of a ceramics container to form a thin film (see Japanese Utility Model Publication No. 61-166497). By this method, an aluminum thin film having a strong adhesive force can be formed on the surface of the ceramic container at low cost, but this container cannot be heated by the direct fire of the gas stove because the melting point of aluminum is low. Furthermore, when it is desired to continue using the electromagnetic induction heating device under severe conditions such as cooking in the air, since the formed aluminum is a thin film (about 28 μm), the thin film reaches a temperature close to the melting point (about 600 ° C.). However, there is a problem that the film is oxidized and cannot be heated.
【０００５】[0005]
【発明が解決しようとする課題】本発明が解決すべき課
題は、セラミックス容器表面へ形成した銀の薄膜の剥離
やコスト等の問題の解消、アルミニウム溶射による薄膜
の酸化等の問題の解消を図ることにある。The problems to be solved by the present invention are to solve the problems such as the peeling of the silver thin film formed on the surface of the ceramic container and the problems such as cost, and the problems such as oxidation of the thin film due to aluminum spraying. Especially.
【０００６】[0006]
【課題を解決するための手段】前記課題を解決するた
め、本発明の加熱容器は、セラミックス製の容器の外側
もしくは内側の少なくとも一方に、ニッケル膜を形成さ
せたものである。In order to solve the above problems, the heating container of the present invention has a nickel film formed on at least one of the outside and the inside of a ceramic container.
【０００７】[0007]
【作用】ニッケルのキュリー点は３６０℃であるため、
電磁誘導による加熱ではこの温度で制御され、ニッケル
膜の温度が必要以上に上がるのを抑える効果がある。ま
た、ニッケルに元素周期表の３Ａから２Ｂ族の元素（金
属，遷移金属全体）、元素周期表３Ｂと４Ｂ族の元素
（半金属）及び元素周期表５Ｂと６Ｂ族の元素（非金
属）の少なくとも一種類を０．１〜５０重量％の範囲で
適量を添加することでキュリー点を変化させると、膜の
加熱温度が制御される。これらの元素の添加量が０．１
重量％以下であるとキュリー点温度の変化が小さくてニ
ッケル膜に対する温度抑制効果が余りなくなり、５０重
量％以上であるとキュリー点が下がり過ぎてニッケル膜
の特性が得られなくなるため、０．１〜５０重量％の範
囲が好適である。[Function] Since the Curie point of nickel is 360 ° C,
The heating by electromagnetic induction is controlled by this temperature, and has an effect of suppressing the temperature of the nickel film from rising more than necessary. In addition, nickel includes elements of groups 3A to 2B of the periodic table of elements (metals and transition metals as a whole), elements of groups 3B and 4B of the periodic table of elements (metalloids), and elements of groups 5B and 6B of the periodic table of elements (nonmetals). When the Curie point is changed by adding an appropriate amount of at least one kind within the range of 0.1 to 50% by weight, the heating temperature of the film is controlled. Addition amount of these elements is 0.1
If it is less than 10% by weight, the change in Curie point temperature is small and the effect of suppressing the temperature on the nickel film becomes insignificant, and if it is more than 50% by weight, the Curie point is too low to obtain the characteristics of the nickel film. A range of ˜50% by weight is preferred.
【０００８】さらに、ニッケルの融点は１４５５℃であ
り、アルミニウム（融点６６０℃）と比べ耐熱性が高
い。また、ニッケルは酸化しにくい金属である。これら
のことから、ニッケルの膜は電磁誘導加熱用の発熱体に
適していることがわかる。Furthermore, the melting point of nickel is 1455 ° C., which is higher in heat resistance than aluminum (melting point 660 ° C.). Also, nickel is a metal that is difficult to oxidize. From these, it is understood that the nickel film is suitable as a heating element for electromagnetic induction heating.
【０００９】また、ニッケル膜の下地として、ニッケル
にアルミニウムもしくはクロムを１〜３０重量％添加し
た合金もしくは複合材の膜を形成することでセラミック
ス容器と膜の密着性を上げ、剥離を抑えている。添加量
が１重量％以下では密着性がニッケルのときと余り変わ
らなくなり、３０重量％以上であると密着性がそれほど
変化しないため、１〜３０重量％の範囲が好適である。Further, by forming a film of an alloy or a composite material in which aluminum or chromium is added to nickel in an amount of 1 to 30% by weight as a base of the nickel film, adhesion between the ceramic container and the film is increased and peeling is suppressed. . When the addition amount is 1% by weight or less, the adhesiveness does not change much when it is nickel, and when it is 30% by weight or more, the adhesiveness does not change so much. Therefore, the range of 1 to 30% by weight is preferable.
【００１０】この下地はキュリー点がニッケルより低く
なっているために、加熱面であるニッケル膜の温度制御
に影響を与えない。Since the Curie point of this underlayer is lower than that of nickel, it does not affect the temperature control of the nickel film which is the heating surface.
【００１１】[0011]
【実施例】以下、本発明の実施例を示して説明する。EXAMPLES Examples of the present invention will be described below.
【００１２】〔実施例１〕図１に示すように、内径が１
８ｃｍのセラミックス容器１の外側底部表面上に厚さ２
００μｍのニッケル膜２をガス溶射によって形成させ、
電磁誘導加熱（電磁調理器）用加熱容器を作製した。こ
れを電磁誘導加熱装置（電磁調理器）で使用すると、容
器の加熱面はニッケルのキュリー点である３６０℃で制
御された。[Embodiment 1] As shown in FIG.
A thickness of 2 on the outer bottom surface of an 8 cm ceramics container 1.
Forming a nickel film 2 of 00 μm by gas spraying,
A heating container for electromagnetic induction heating (electromagnetic cooker) was produced. When this was used in an electromagnetic induction heating device (electromagnetic cooker), the heating surface of the container was controlled at 360 ° C. which is the Curie point of nickel.
【００１３】〔実施例２〕図２に示すように、内径が１
８ｃｍのセラミックス容器１１の外側底部表面にまず下
地としてニッケル９５％とアルミニウム５％の合金膜１
２をガス溶射で形成し（厚さ１００μｍ）、その上に厚
さ２００μｍのニッケル膜１３を溶射で形成して電磁誘
導加熱用容器を作製した。この下地１２を設けることで
滑らかなセラミックス容器１１の表面にも接着力が強い
ニッケル膜１３を形成することができ、また「実施例
１」同様、この容器の加熱面はニッケルのキュリー点で
ある３６０℃で制御された。[Embodiment 2] As shown in FIG. 2, the inner diameter is 1
On the outer bottom surface of the ceramic container 11 of 8 cm, an alloy film 1 of nickel 95% and aluminum 5% is first formed as a base
2 was formed by gas spraying (thickness: 100 μm), and a nickel film 13 having a thickness of 200 μm was formed thereon by spraying to prepare an electromagnetic induction heating container. By providing the base 12, the nickel film 13 having a strong adhesive force can be formed on the surface of the smooth ceramics container 11, and the heating surface of this container is the Curie point of nickel as in the case of "Example 1". Controlled at 360 ° C.
【００１４】〔実施例３〕図３に示すように、内径が１
８ｃｍのセラミックス容器２１の外側底部表面にまず下
地としてニッケル９５％とクロム５％の合金膜２２をガ
ス溶射で形成し（厚さ１００μｍ）、その上に厚さ２０
０μｍのニッケル膜２３を溶射で形成して電磁誘導加熱
用容器を作製した。この下地２２を設けることで滑らか
なセラミックス容器２１の表面にも接着力が強いニッケ
ル膜２３を形成することができ、また「実施例１」同
様、この容器の加熱面はニッケルのキュリー点である３
６０℃で制御された。[Embodiment 3] As shown in FIG. 3, the inner diameter is 1
First, an alloy film 22 of nickel 95% and chromium 5% is formed on the outer bottom surface of an 8 cm ceramics container 21 as a base by gas spraying (thickness 100 μm), and a thickness 20 is formed thereon.
A nickel film 23 of 0 μm was formed by thermal spraying to manufacture a container for electromagnetic induction heating. By providing this base 22, a nickel film 23 having a strong adhesive force can be formed even on the surface of the smooth ceramics container 21, and the heating surface of this container is the Curie point of nickel, as in “Example 1”. Three
Controlled at 60 ° C.
【００１５】〔実施例４〕同様に、セラミックス容器の
外側表面にニッケル８７％と鉄３％の合金膜をガス溶射
で形成し（厚さ２００μｍ）、電磁誘導加熱用容器を作
製した。これを電磁誘導加熱装置（電磁調理器）で加熱
するとこの容器の加熱面は約４００℃で制御された。Example 4 Similarly, an alloy film of nickel 87% and iron 3% was formed by gas spraying (thickness: 200 μm) on the outer surface of the ceramics container to prepare a container for electromagnetic induction heating. When this was heated with an electromagnetic induction heating device (electromagnetic cooker), the heating surface of this container was controlled at about 400 ° C.
【００１６】〔実施例５〕セラミックス容器の外側表面
にニッケル９６％とチタン４％の合金膜をガス溶射で形
成し（厚さ２００μｍ）、電磁誘導加熱用容器を作製し
た。これを電磁誘導加熱装置（電磁調理器）で加熱する
とこの容器の加熱面は約２００℃で制御された。Example 5 An alloy film of nickel 96% and titanium 4% was formed by gas spraying (thickness: 200 μm) on the outer surface of a ceramics container to prepare a container for electromagnetic induction heating. When this was heated with an electromagnetic induction heating device (electromagnetic cooker), the heating surface of this container was controlled at about 200 ° C.
【００１７】〔実施例６〕セラミックス容器の外側表面
にニッケル９５％と銅５％の合金膜をガス溶射で形成し
（厚さ２００μｍ）、電磁誘導加熱用容器を作製した。
これを電磁誘導加熱装置（電磁調理器）で加熱すると、
この容器の加熱面は約３００℃で制御された。Example 6 An alloy film of nickel 95% and copper 5% was formed by gas spraying (thickness: 200 μm) on the outer surface of a ceramics container to prepare a container for electromagnetic induction heating.
When this is heated with an electromagnetic induction heating device (electromagnetic cooker),
The heated surface of this vessel was controlled at about 300 ° C.
【００１８】〔実施例７〕セラミックス容器の外側表面
にニッケル９７％とシリコン３％の合金膜をガス溶射で
形成し（厚さ２００μｍ）、電磁誘導加熱用容器を作製
した。これを電磁誘導加熱装置（電磁調理器）で加熱す
るとこの容器の加熱面は約１００℃で制御された。Example 7 An alloy film of nickel 97% and silicon 3% was formed by gas spraying (thickness: 200 μm) on the outer surface of a ceramics container to prepare a container for electromagnetic induction heating. When this was heated with an electromagnetic induction heating device (electromagnetic cooker), the heating surface of this container was controlled at about 100 ° C.
【００１９】〔実施例８〕セラミックス容器の外側表面
にニッケル９５％とアンチモン５％の合金膜をガス溶射
で形成し（厚さ２００μｍ）、電磁誘導加熱用容器を作
製した。これを電磁誘導加熱装置（電磁調理器）で加熱
するとこの容器の加熱面は約２５０℃で制御された。Example 8 An alloy film of 95% nickel and 5% antimony was formed on the outer surface of a ceramics container by gas spraying (thickness: 200 μm) to prepare a container for electromagnetic induction heating. When this was heated with an electromagnetic induction heating device (electromagnetic cooker), the heating surface of this container was controlled at about 250 ° C.
【００２０】〔実施例９〕セラミックス容器の外側表面
にニッケル９７％とアルミニウム３％の合金膜をガス溶
射で形成し（厚さ２００μｍ）、電磁誘導加熱用容器を
作製した。これを電磁誘導加熱装置（電磁調理器）で加
熱するとこの容器の加熱面は約２５０℃で制御された。Example 9 An alloy film of 97% nickel and 3% aluminum was formed by gas spraying (thickness: 200 μm) on the outer surface of the ceramics container to prepare a container for electromagnetic induction heating. When this was heated with an electromagnetic induction heating device (electromagnetic cooker), the heating surface of this container was controlled at about 250 ° C.
【００２１】[0021]
【発明の効果】以上述べたように、本発明によれば、膜
の剥離の問題や酸化の問題を解決して、さらにガスコン
ロの直火による加熱も可能な誘電加熱用のセラミックス
容器を安価に作製することが可能になった。As described above, according to the present invention, a ceramic container for dielectric heating which solves the problem of film peeling and the problem of oxidation, and which can be heated by the direct fire of a gas stove is also available at low cost. It became possible to make.
【図１】 本発明の実施例１の構造を示す平面図及び断
面図である。FIG. 1 is a plan view and a cross-sectional view showing a structure of a first embodiment of the present invention.
【図２】 本発明の実施例２の構造を示す平面図及び断
面図である。2A and 2B are a plan view and a cross-sectional view showing the structure of Example 2 of the present invention.
【図３】 本発明の実施例３の構造を示す平面図及び断
面図である。3A and 3B are a plan view and a cross-sectional view showing the structure of Example 3 of the present invention.
１，１１，２１ セラミックス製容器、２，１３，２３
ニッケル膜、１２，２２ 合金膜（下地）1,11,21 Ceramic container, 2,13,23
Nickel film, 12,22 alloy film (base)
───────────────────────────────────────────────────── フロントページの続き (72)発明者 中尾 浩 佐賀県西松浦郡有田町中部田ノ平3100−５ 佐賀県窯業技術センター内 (72)発明者 坂口 庭見 佐賀県杵島郡山内町大字鳥海18−811 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hiroshi Nakao 3100-5 Nakano Tanohira, Arita-cho, Nishimatsuura-gun, Saga Inside Ceramics Technology Center, Saga (72) Inventor, Sakaguchi Nami, Chonai, Yamauchi-cho, Kijima-gun, Saga Prefecture 18 −811
Claims (3)
側の少なくとも一方に、ニッケル膜を形成させた加熱容
器。1. A heating container in which a nickel film is formed on at least one of the outside and the inside of a ceramic container.
ルミニウムもしくはクロムを１〜３０重量％添加した合
金あるいは複合材の膜をセラミックス製容器に形成した
請求項１記載の加熱容器。2. The heating container according to claim 1, wherein a film of an alloy or a composite material in which aluminum or chromium is added to nickel in an amount of 1 to 30% by weight is formed on a ceramic container as a base of the nickel film.
表の３Ａから２Ｂ族の元素と元素周期表３Ｂと４Ｂ族の
元素及び元素周期表５Ｂと６Ｂの元素の少なくとも１種
類を０．１〜５０重量％添加したものを用いた請求項１
記載の加熱容器。3. As a nickel film, at least one element selected from the group consisting of elements of Groups 3A to 2B of the Periodic Table of Elements, elements of Groups 3B and 4B of the Periodic Table of Elements, and 5B and 6B of the Periodic Table of Elements is used in nickel. A method in which a material added by weight% is used.
The heating container described.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5093410A JP2544076B2 (en) | 1993-04-20 | 1993-04-20 | Ceramic heating container |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5093410A JP2544076B2 (en) | 1993-04-20 | 1993-04-20 | Ceramic heating container |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06304064A true JPH06304064A (en) | 1994-11-01 |
| JP2544076B2 JP2544076B2 (en) | 1996-10-16 |
Family
ID=14081533
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5093410A Expired - Lifetime JP2544076B2 (en) | 1993-04-20 | 1993-04-20 | Ceramic heating container |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2544076B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2323388A (en) * | 1997-03-21 | 1998-09-23 | Tokuyama Corp | Container for holding isopropyl alcohol |
| WO2005060802A1 (en) * | 2003-12-22 | 2005-07-07 | Empa | Ceramic cooking pot, especially a fondue pot |
| JP2007261842A (en) * | 2006-03-28 | 2007-10-11 | Shiga Pref Gov | Ni CERAMIC COMPOSITE AND METHOD OF MANUFACTURING THE SAME |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6166393A (en) * | 1984-09-07 | 1986-04-05 | 河村碍子工業株式会社 | Porcelain device for electromagnetic cooking device |
-
1993
- 1993-04-20 JP JP5093410A patent/JP2544076B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6166393A (en) * | 1984-09-07 | 1986-04-05 | 河村碍子工業株式会社 | Porcelain device for electromagnetic cooking device |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2323388A (en) * | 1997-03-21 | 1998-09-23 | Tokuyama Corp | Container for holding isopropyl alcohol |
| US6200692B1 (en) | 1997-03-21 | 2001-03-13 | Tokuyama Corporation | Container for holding high purity isopropyl alcohol |
| GB2323388B (en) * | 1997-03-21 | 2001-07-11 | Tokuyama Corp | Container for holding high purity isopropyl alcohol |
| WO2005060802A1 (en) * | 2003-12-22 | 2005-07-07 | Empa | Ceramic cooking pot, especially a fondue pot |
| JP2007261842A (en) * | 2006-03-28 | 2007-10-11 | Shiga Pref Gov | Ni CERAMIC COMPOSITE AND METHOD OF MANUFACTURING THE SAME |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2544076B2 (en) | 1996-10-16 |
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