JPH0630172B2 - Method for manufacturing stamper for optical disk - Google Patents

Method for manufacturing stamper for optical disk

Info

Publication number
JPH0630172B2
JPH0630172B2 JP59042607A JP4260784A JPH0630172B2 JP H0630172 B2 JPH0630172 B2 JP H0630172B2 JP 59042607 A JP59042607 A JP 59042607A JP 4260784 A JP4260784 A JP 4260784A JP H0630172 B2 JPH0630172 B2 JP H0630172B2
Authority
JP
Japan
Prior art keywords
stamper
vapor deposition
film
nickel
optical disk
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59042607A
Other languages
Japanese (ja)
Other versions
JPS60187952A (en
Inventor
実 中島
岩雄 津川
長明 越野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59042607A priority Critical patent/JPH0630172B2/en
Publication of JPS60187952A publication Critical patent/JPS60187952A/en
Publication of JPH0630172B2 publication Critical patent/JPH0630172B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26Apparatus or processes specially adapted for the manufacture of record carriers

Description

【発明の詳細な説明】 (a)発明の技術分野 本発明は欠陥密度の少ない光ディスク用スタンパの製造
方法に関する。
Description: (a) Technical Field of the Invention The present invention relates to a method for manufacturing a stamper for an optical disc having a low defect density.

(b)技術の背景 光ディスクは大容量の情報記録が可能であり、情報の記
録と再生をディスク面と非接触の状態で行うことがで
き、また塵埃の影響を受けにくいなどの特徴を備えたメ
モリである。
(B) Background of technology The optical disc is capable of recording a large amount of information, and can record and reproduce information in a non-contact state with the disc surface, and is not easily affected by dust. It is a memory.

すなわち磁気ディスクや磁気テープでは1ビットの情報
記録に数10平方μmの面積を要するのに対し、光ディス
クの場合はレーザ光を直径約1μmの微少スポットに集
光して記録を行うため、記録面積は1平方μm程度で足
りることになり、大容量記録が可能となる。
In other words, a magnetic disk or magnetic tape requires an area of several tens of square μm for recording 1-bit information, whereas an optical disk condenses laser light into a minute spot with a diameter of about 1 μm for recording. Is about 1 square μm, and a large capacity recording is possible.

また対物レンズによつて絞り込まれるレーザ光のレンズ
端面からディスク面までの距離は1乃至2mmあるので磁
気ディスクで問題となるヘッドクラッシュの危険性は避
けることができ、従って長寿命化が可能となる。
Further, since the distance from the lens end surface of the laser light focused by the objective lens to the disk surface is 1 to 2 mm, the risk of head crash, which is a problem with magnetic disks, can be avoided, and therefore the life can be extended. .

また記録再生用のレーザ光は厚さが1mm程度の透明なカ
バーを通して絞り込まれるため記録媒体が露出しておら
ず、そのため汚染が避けられると共に、直径が1μm程
度のスポットも透明カバー上では直径が1mm程度の光ビ
ームであるため塵埃の存在が殆ど影響を及ぼさなくな
る。
Since the recording / reproducing laser beam is focused through a transparent cover with a thickness of about 1 mm, the recording medium is not exposed, so that contamination can be avoided and a spot with a diameter of about 1 μm has a diameter on the transparent cover. Since the light beam is about 1 mm, the presence of dust has almost no effect.

本発明はかかる特徴をもつ光ディスクを製造する際に使
用するスタンパの製造方法に関するものである。
The present invention relates to a method of manufacturing a stamper used when manufacturing an optical disc having such characteristics.

(c)従来技術と問題点 第1図は光ディスク用スタンパの製造工程を示すもので
ある。
(C) Prior Art and Problems FIG. 1 shows a manufacturing process of an optical disk stamper.

すなわち良く研磨した厚さが約5mmで直径が20乃至40cm
のガラス円板を基板とし、同図(A)に示すようにこの
基板1の上にスピンコート法を用いてレジスト膜2を形
成する。
Well-polished thickness is about 5mm and diameter is 20-40cm
Using the glass disk as a substrate, a resist film 2 is formed on the substrate 1 by spin coating as shown in FIG.

次にレーザ光をプリグルーブ位置およびトラックNo.や
セクタNo.などのアドレス位置に選択照射してレジスト
膜2を感光せしめ、これを現像することにより同図
(B)に示すようなプリグルーブ原盤3ができあがる。
Next, a laser beam is selectively applied to the pre-groove position and the address position such as the track No. and the sector No. to expose the resist film 2 to light, and by developing this, the pre-groove master shown in FIG. 3 is completed.

次に同図(C)に示すように真空蒸着法によりプリグル
ーブ原盤3の上に厚さ数100 Åのニッケル(Ni )蒸着
膜4を作り、更にこの蒸着膜4の上に同図(D)で示す
ように電解鍍金(以下略してメッキ)法により厚さ約30
0 μmのNi 層5を形成する。
Next, as shown in FIG. 2C, a nickel (Ni) vapor deposition film 4 having a thickness of several hundred Å is formed on the pre-groove master 3 by the vacuum vapor deposition method, and further on the vapor deposition film 4 shown in FIG. ), The thickness is about 30 by electrolytic plating (hereinafter abbreviated as plating) method.
A Ni layer 5 of 0 μm is formed.

このようにして作られたNi 層5を同図(B)に示すプ
リグルーブ原盤3から剥離することで同図(E)に示す
ようなスタンパ6が完成する。
The Ni layer 5 thus produced is peeled from the pre-groove master 3 shown in FIG. 6B to complete the stamper 6 as shown in FIG.

このようにして作られたスタンパ6はこれを鋳型とし、
レコード製作と類似の方法で合成樹脂を成型し、この合
成樹脂板の上に記録媒体層を形成することにより光ディ
スクが作られている。
The stamper 6 made in this way uses this as a mold,
An optical disc is manufactured by molding a synthetic resin by a method similar to that of record production and forming a recording medium layer on the synthetic resin plate.

本発明はかかる光ディスクの形成に使用するスタンパの
製造方法に関するものである。
The present invention relates to a method of manufacturing a stamper used for forming such an optical disc.

ここでスタンパ6の必要条件は第1図(B)に示すよう
にレジスト膜2に形成されているプリグルーブやアドレ
スなどの情報が高精度に再現されていると共に、これか
ら情報の書込みが行われる位置例えばプリグルーブ位置
は平坦であつて欠陥の無いことが必要である。
Here, the necessary condition of the stamper 6 is that the information such as the pre-groove and the address formed on the resist film 2 is reproduced with high accuracy as shown in FIG. The position, for example the pre-groove position, must be flat and free of defects.

その理由は記録媒体面に凹凸が存在すると読出しに当た
ってレーザ光が乱反射してノイズが増大すると共に情報
品質が著しく損なわれる。
The reason for this is that if unevenness exists on the surface of the recording medium, the laser light is diffusely reflected during reading, noise increases, and the information quality is significantly impaired.

そこでガラス基板1は平滑に研磨したものを使用すると
共に第1図(C)で示すレジスト膜2の上にNi 蒸着膜
4を形成する工程においてもレジスト膜2との密着性を
向上するために基板1を加熱することが行われている。
Therefore, in order to improve the adhesion with the resist film 2 in the step of forming the Ni vapor deposition film 4 on the resist film 2 shown in FIG. The substrate 1 is being heated.

然し、このように基板加熱を行いつつNi の蒸着を行う
とレジスト膜2から揮発成分が発生してNi 蒸着膜4の
中に混入すること、レジスト膜2とNi 蒸着膜4とが何
らかの反応を起こすことなどが原因してNi 蒸着膜が撥
水性を帯び、その次のNi メッキ工程においてNi 層5
とNi 蒸着膜4との密着性が不完全となる。そのためス
タンパ6の形成のためにNi 層5をプリグループ原盤3
から剥離するに当たつてNi 蒸着膜4の一部がレジスト
2の上に残存し、そのためスタンパ6の欠陥数が多いと
云う問題がある。
However, when Ni is vapor-deposited while heating the substrate in this way, volatile components are generated from the resist film 2 and are mixed in the Ni vapor-deposited film 4, and the resist film 2 and the Ni vapor-deposited film 4 may react with each other. The Ni vapor-deposited film becomes water repellent due to the occurrence of such a phenomenon, and the Ni layer 5 is formed in the subsequent Ni plating step.
And the Ni vapor-deposited film 4 have incomplete adhesion. Therefore, to form the stamper 6, the Ni layer 5 is formed on the pre-group master 3
There is a problem that a part of the Ni vapor deposition film 4 remains on the resist 2 when it is peeled off from the resist, so that the stamper 6 has a large number of defects.

この解決法としてNi 蒸着膜4を形成した後に溶剤を使
用して膜面を洗浄することが考えられるが、Ni 蒸着膜
4の厚さが薄く、またレジストが一般の溶剤に対し容易
に溶解するため、洗浄などの表面処理を行えないと云う
問題があつた。
As a solution to this problem, it is conceivable to wash the film surface with a solvent after forming the Ni vapor-deposited film 4, but the Ni vapor-deposited film 4 is thin and the resist is easily dissolved in a general solvent. Therefore, there is a problem that surface treatment such as cleaning cannot be performed.

(d)発明の目的 本発明の目的は光ディスク用スタンパの製作に当たって
プリグルーブ原盤の上に形成されているNi 蒸着膜の撥
水性を除去してNi メッキ層を形成する方法を提供する
にある。
(D) Object of the Invention An object of the present invention is to provide a method for forming a Ni plating layer by removing the water repellency of a Ni vapor deposition film formed on a pre-groove master in manufacturing an optical disk stamper.

(e)発明の構成 本発明の目的は光ディスクのプリグルーブ原盤上にニッ
ケル蒸着膜を形成したる後、該原盤をニッケル鍍金液に
浸漬して回転させ、前記ニッケル蒸着膜の濡れ性を回復
させる前処理を行って後、ニッケルの電気鍍金を行うこ
とを特徴とする光ディスク用スタンパの製造方法により
達成することができる。
(E) Structure of the invention The purpose of the present invention is to form a nickel vapor deposition film on a pre-groove master of an optical disc, and then immerse the master in a nickel plating solution and rotate it to restore the wettability of the nickel vapor deposition film. This can be achieved by a method for manufacturing an optical disk stamper characterized by performing nickel electroplating after performing pretreatment.

(f)発明の実施例 スタンパ6の製作に当たっては成型面における欠陥は出
来うる限り少なくすることが必要であり、この見地から
Ni 蒸着膜4の形成に当たって密着性向上のための基板
1の加熱は必要である。
(F) Embodiments of the Invention In manufacturing the stamper 6, it is necessary to reduce defects on the molding surface as much as possible. From this viewpoint, heating the substrate 1 for improving the adhesion in forming the Ni vapor deposition film 4 is necessary.

然りこの加熱処理によりNi 蒸着膜4に撥水性を生じて
しまう。
However, this heat treatment causes water repellency in the Ni vapor deposition film 4.

発明者等は溶剤処理を行うことなく撥水性を除去する方
法として第1図(C)に示すNi 蒸着膜4を形成したプ
リグルーブ原盤(以下略して蒸着基板)をNi メッキ液
の中に浸漬し、回転処理を行うことにより撥水性が除去
できることを見いだした。
The inventors of the present invention, as a method of removing water repellency without performing solvent treatment, immerse a pre-groove master (hereinafter abbreviated vapor deposition substrate) having a Ni vapor deposition film 4 shown in FIG. 1C into a Ni plating liquid. Then, it was found that the water repellency can be removed by performing the rotation treatment.

然しこの撥水性の除去は本質的なものではなく、水洗洗
浄を行ったのち乾燥処理を施せば再び元の撥水性が現れ
てくる。この理由は明瞭ではないが恐らくNi 蒸着膜と
メッキ液との電位差および回転による撹拌効果に依って
メッキ液に添加してある界面活性剤が蒸着基板の表面に
析出して撥水性を消失させていると思われる。
However, the removal of this water repellency is not essential, and the original water repellency will appear again if it is washed with water and then dried. The reason for this is not clear, but probably the surfactant added to the plating solution is deposited on the surface of the deposition substrate due to the potential difference between the Ni deposition film and the plating solution and the stirring effect due to rotation, causing the water repellency to disappear. It seems that

但し蒸着基板の液中での回転は短時間では効果はなく、
少なくとも数10分に互って行うことが必要である。
However, rotation of the vapor deposition substrate in the liquid is not effective in a short time,
It is necessary to do it for at least several tens of minutes.

この方法により、蒸着基板とNi メッキ層との密着性は
向上し、第1図(D)で示すNi 層5を剥離してスタン
パ6を作る際にNi 蒸着膜4の残存による欠陥を無くす
ることができる。
By this method, the adhesion between the vapor-deposited substrate and the Ni-plated layer is improved, and when the Ni layer 5 shown in FIG. 1 (D) is peeled off to form the stamper 6, defects due to the remaining Ni-vapor-deposited film 4 are eliminated. be able to.

以下実施例に就いて説明する。Examples will be described below.

プリグルーブ原盤にNi 蒸着膜を形成する際の基板加熱
温度を140 ℃とし、この条件で蒸着して厚さ500 ÅのN
i 蒸着膜4を形成した。
The substrate heating temperature when forming the Ni vapor deposition film on the pre-groove master was 140 ° C, and the vapor deposition was performed under these conditions to obtain a 500 Å thick N film.
i Deposited film 4 was formed.

この蒸着基板をスルフアミン酸ニッケルを主構成分とす
る市販のニッケルメッキ液に浸漬し100 RPM の回転数で
40分に互って回転させ、その後通常の方法でメッキを行
ってスタンパ6を作つたが欠陥密度は10程度であり、従
来と較べると遥かに少ない。
This vapor-deposited substrate was immersed in a commercially available nickel plating solution containing nickel sulfamate as the main constituent, and rotated at 100 RPM.
The stamper 6 was made by rotating each other for 40 minutes and then plating by a normal method, but the defect density is about 10, which is far smaller than the conventional one.

第2図はスタンパの欠陥密度と浸漬時間との関係を示す
もので、欠陥数はスタンパの表面をレーザスポットで走
査する場合に反射光の異常から計測した。
FIG. 2 shows the relationship between the defect density of the stamper and the immersion time. The number of defects was measured from the abnormality of the reflected light when the surface of the stamper was scanned with a laser spot.

ここで蒸着基板の回転は100 RPM であるが、特性曲線7
より明らかなように欠陥密度は浸漬時間と共に減少して
一定値に近づく。
The rotation of the deposition substrate is 100 RPM, but the characteristic curve 7
As is clearer, the defect density decreases with the immersion time and approaches a constant value.

なおここで欠陥密度はスタンパ表面に生じている総ての
欠陥を計数したものであつて、特性曲線7の飽和値にお
いてはNi 蒸着膜の剥離欠陥は見当たらない。
Here, the defect density is a count of all the defects generated on the stamper surface, and no peeling defect of the Ni vapor deposition film is found at the saturation value of the characteristic curve 7.

以上のように蒸着基板を液中に回転させると云う簡単な
処理を施すことにより、スタンパの欠陥を減らすことが
できる。
As described above, the stamper defects can be reduced by performing the simple process of rotating the vapor deposition substrate in the liquid.

(g)発明の効果 本発明はNi 蒸着膜のプリグルーブ原盤への密着性向上
のために行う基板加熱に伴って生ずる撥水性を除去する
もので、本発明の実施により良質の光ディスクの製造が
可能となる。
(G) Effect of the Invention The present invention removes the water repellency that occurs when the substrate is heated to improve the adhesion of the Ni vapor deposition film to the pre-groove master. It will be possible.

【図面の簡単な説明】[Brief description of drawings]

第1図(A)乃至(E)は光ディスク用スタンパの製造
工程を示す断面図また第2図はスタンパと浸漬時間の関
係図である。 図において 1は基板、2はレジスト、3はプリグルー
ブ原盤、4はニッケル蒸着膜、5はニッケル層、6はス
タンパ。
1 (A) to 1 (E) are cross-sectional views showing a manufacturing process of an optical disk stamper, and FIG. 2 is a relationship diagram of the stamper and the immersion time. In the figure, 1 is a substrate, 2 is a resist, 3 is a pre-groove master, 4 is a nickel vapor deposition film, 5 is a nickel layer, and 6 is a stamper.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】光ディスクのプリグルーブ原盤上にニッケ
ル蒸着膜を形成したる後、該原盤をニッケル鍍金液に浸
漬して回転させ、前記ニッケル蒸着膜の濡れ性を回復さ
せる前処理を行って後、ニッケルの電気鍍金を行うこと
を特徴とする光ディスク用スタンパの製造方法。
1. After forming a nickel vapor deposition film on a pre-groove master of an optical disc, the master is immersed in a nickel plating solution and rotated to perform a pretreatment for recovering the wettability of the nickel vapor deposition film. , A method for manufacturing a stamper for an optical disk, which comprises electroplating nickel.
JP59042607A 1984-03-06 1984-03-06 Method for manufacturing stamper for optical disk Expired - Lifetime JPH0630172B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59042607A JPH0630172B2 (en) 1984-03-06 1984-03-06 Method for manufacturing stamper for optical disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59042607A JPH0630172B2 (en) 1984-03-06 1984-03-06 Method for manufacturing stamper for optical disk

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP9897795A Division JP2663912B2 (en) 1995-04-24 1995-04-24 Disc manufacturing method

Publications (2)

Publication Number Publication Date
JPS60187952A JPS60187952A (en) 1985-09-25
JPH0630172B2 true JPH0630172B2 (en) 1994-04-20

Family

ID=12640718

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59042607A Expired - Lifetime JPH0630172B2 (en) 1984-03-06 1984-03-06 Method for manufacturing stamper for optical disk

Country Status (1)

Country Link
JP (1) JPH0630172B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07109668B2 (en) * 1986-10-24 1995-11-22 キヤノン株式会社 Method for manufacturing duplicate mold for precision molding
DE4029099A1 (en) * 1990-09-13 1992-04-09 Technics Plasma Gmbh Data carrier injection mouldmfr. - has base plate layer structured to a mask laser beam for anisotropic etching and subsequplating

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5852291Y2 (en) * 1980-12-27 1983-11-29 亘男 笹 Comperator for automatic barrel plating equipment
JPS58175152A (en) * 1982-04-05 1983-10-14 Hitachi Ltd Stamper

Also Published As

Publication number Publication date
JPS60187952A (en) 1985-09-25

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