JPH06296937A - Bubbling cleaner - Google Patents

Bubbling cleaner

Info

Publication number
JPH06296937A
JPH06296937A JP8581093A JP8581093A JPH06296937A JP H06296937 A JPH06296937 A JP H06296937A JP 8581093 A JP8581093 A JP 8581093A JP 8581093 A JP8581093 A JP 8581093A JP H06296937 A JPH06296937 A JP H06296937A
Authority
JP
Japan
Prior art keywords
gas
ejection port
cleaning
water tank
port
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8581093A
Other languages
Japanese (ja)
Other versions
JP3142412B2 (en
Inventor
Kimitoshi Mato
公利 間藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP05085810A priority Critical patent/JP3142412B2/en
Publication of JPH06296937A publication Critical patent/JPH06296937A/en
Application granted granted Critical
Publication of JP3142412B2 publication Critical patent/JP3142412B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Cleaning By Liquid Or Steam (AREA)

Abstract

PURPOSE:To obtain an excellent cleaning effect by fractionating a gas injected from a gas. injection port with a high-speed vortex injected from a liq. injection port to forcedly mix and diffuse the gas and forming a forced circulating current freed from the superfine-particle bubble in a water tank. CONSTITUTION:A cleaning soln. suction port 13 and a cleaning soln. discharge port 14 are provided to the side wall of a water tank 10, in which various works W to be cleaned such as semiconductor parts are suspended, one end of a circulating pipe 12 having a diaphragm pump 16 is extended into a cleaning tank 15 provided with a filter 17 for filtering the cleaning soln. sucked from the suction port 13, and the other end is connected to an ejector-type vortex gas-liq. mixture injection nozzle 30 furnished to the discharge port 14. The cleaning water is injected from the annular liq. injection port of the nozzle 30 formed in a revolution state to form a high-speed vortex, the gas injected from the gas injection port is fractionated, forcedly mixed and diffused by the vortex, and a superfine-particle bubble is dispersed in the cleaning water current.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は水槽内で超微粒子状の気
泡を洗浄対象物に当てて、洗浄対象物を洗浄するバブリ
ング洗浄装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a bubbling cleaning device for cleaning an object to be cleaned by applying ultrafine particles to the object to be cleaned in a water tank.

【0002】[0002]

【従来の技術】半導体部品,時計部品,ガラス部品,プ
ラスチック部品等の洗浄には、これまでフロンが一般に
使用されてきた。しかし、フロンはオゾン層を破壊する
おそれがある等の公害問題に鑑みて使用が全廃されるこ
ととなったため、新たな洗浄技術が必要となってきた。
2. Description of the Related Art Freon has been generally used for cleaning semiconductor parts, watch parts, glass parts, plastic parts and the like. However, since the use of CFCs has been abolished in view of pollution problems such as the possibility of destroying the ozone layer, new cleaning technology has become necessary.

【0003】そしてフロンを使用しない洗浄装置として
は、水槽内に収容した洗浄対象物に気泡を吹き付け、気
泡の汚れ包括作用、気泡の汚れ破裂作用を利用して洗浄
する、いわゆるバブリング洗浄装置が知られている。
As a cleaning device which does not use chlorofluorocarbon, there is known a so-called bubbling cleaning device in which air bubbles are blown to an object to be cleaned contained in a water tank, and cleaning is performed by utilizing the dirt entrapping action of the bubbles and the dirt bursting action of the bubbles. Has been.

【0004】[0004]

【発明の解決しようとする課題】しかしこの種の装置で
は、水槽内で発生する気泡径が比較的大きいため、微小
隙間にまで気泡が侵入できず、十分な洗浄効果が期待で
きないという問題があった。本発明は前記従来技術の問
題点に鑑みなされたもので、その目的は気体を超微粒子
状態として洗浄液中に噴射することによって水槽内に強
制循環流を形成し、強制循環流中に分散されている超微
粒子状の気泡を洗浄対象物に当てることによって洗浄効
果に優れたバブリング洗浄装置を提供することにある。
However, in this type of device, since the diameter of bubbles generated in the water tank is relatively large, there is a problem that bubbles cannot penetrate into the minute gaps and a sufficient cleaning effect cannot be expected. It was The present invention has been made in view of the above-mentioned problems of the prior art, and its object is to form a forced circulation flow in a water tank by injecting a gas into a cleaning liquid in a state of ultrafine particles, and to be dispersed in the forced circulation flow. An object of the present invention is to provide a bubbling cleaning device having an excellent cleaning effect by applying the ultrafine particles of air bubbles to an object to be cleaned.

【0005】[0005]

【課題を解決するための手段】請求項1に係るバブリン
グ洗浄装置においては、洗浄水で満たされ、洗浄対象物
が収容される水槽と、前記水槽内又は水槽壁に設けら
れ、水槽内に微小気泡の分散された強制循環流を形成す
る気液混合体噴射ノズルと、を備えたバブリング洗浄装
置であって、前記噴射ノズルを、前方に向け開口する気
体噴出口と、前記気体噴出口を取り囲む位置に形成され
た円環状の渦流室と、前記円環状渦流室に渦巻状に延
び、供給された洗浄水を渦流室に高速で導入し、渦流室
に高速旋回流を形成する旋回導孔と、前記渦流室の気体
噴出口を取り囲む位置に形成され、気体噴出口前方に先
細り円錐形の高速渦流を噴射形成する円環状の液体噴射
口と、から構成するようにしたものである。
In a bubbling cleaning device according to a first aspect of the present invention, there is provided a water tank which is filled with cleaning water and accommodates an object to be cleaned, and a water tank which is provided in the water tank or on the wall of the water tank and which is minute in the water tank. A bubbling cleaning device comprising: a gas-liquid mixture injection nozzle that forms a forced circulation flow in which bubbles are dispersed, the gas injection port opening the injection nozzle forward, and surrounding the gas injection port. An annular swirl chamber formed at a position, and a swirl guide hole that extends spirally in the annular swirl chamber, introduces the supplied cleaning water into the swirl chamber at high speed, and forms a high-speed swirl flow in the swirl chamber. And a ring-shaped liquid jet port formed at a position surrounding the gas jet port of the swirl chamber to jet and form a tapered conical high-speed swirl flow in front of the gas jet port.

【0006】請求項2に係るバブリング洗浄装置におい
ては、請求項1記載のバブリング洗浄装置において、前
記噴射ノズルの気体噴出口を、空気パイプを介して大気
に連通し、液体噴射口からの液体の噴射に伴って気体噴
出口前方に負圧領域を形成し、この負圧を利用して気体
噴出口から空気を前方に吸引噴出するようにしたもので
ある。
In a bubbling cleaning device according to a second aspect of the present invention, in the bubbling cleaning device according to the first aspect, the gas ejection port of the injection nozzle communicates with the atmosphere through an air pipe, and the liquid from the liquid ejection port is discharged. A negative pressure region is formed in front of the gas ejection port along with the ejection, and the negative pressure is used to suck air out forward from the gas ejection port.

【0007】[0007]

【作用】渦流室に形成された洗浄液の高速旋回流が環状
の液体噴射口から気体噴出口の前方に噴射され、水槽内
のノズル前方に先細り円錐形の高速渦流を形成する。そ
して気体噴出口から噴出した気体が、液体噴射口から噴
射されて気体周りに形成された洗浄水の高速渦流と接触
することで破砕され、強制混合拡散されて、ノズル前方
には超微粒子状気泡が分散された洗浄水の旋回流が形成
される。そして水槽内には、ノズルの作動により気泡を
分散した強制循環流が形成され、循環流中に分散されて
いる超微粒子状の気泡が水槽内の洗浄対象物と接触して
汚れを洗浄する。
The high-speed swirling flow of the cleaning liquid formed in the swirl chamber is jetted from the annular liquid jet port to the front of the gas jet port to form a tapered conical high-speed swirl flow in front of the nozzle in the water tank. Then, the gas ejected from the gas ejection port is crushed by coming into contact with the high-speed swirl flow of the cleaning water that is ejected from the liquid ejection port and is formed around the gas, is forcibly mixed and diffused, and ultrafine particulate bubbles are present in front of the nozzle. A swirling flow of the wash water in which is dispersed is formed. Then, in the water tank, a forced circulation flow in which bubbles are dispersed is formed by the operation of the nozzle, and the ultrafine particles dispersed in the circulation flow come into contact with the object to be cleaned in the water tank to wash dirt.

【0008】請求項2では、液気混合体噴射ノズルが、
液体が液体噴射口から噴射されることにより気体噴出口
前方に形成される負圧を利用して気体を吸引噴出され
る、いわゆるエジェクター作用を利用した構造であるた
め、ブロワやポンプ等により気体噴出口に気体を圧送す
る必要がない。
In the second aspect, the liquid-air mixture injection nozzle is
When the liquid is ejected from the liquid ejection port, the negative pressure formed in front of the gas ejection port is used to suck and eject the gas. There is no need to pump gas to the outlet.

【0009】[0009]

【実施例】次に本発明の実施例を図面に基づいて説明す
る。図1〜図4は本発明の一実施例を示すもので、図1
はバブリング洗浄装置の全体概要図、図2は同装置の平
面図、図3は同装置の要部であるエジェクター式渦流型
気液混合体噴射ノズルの拡大正面図、図4は同ノズルの
縦断面図(図3に示す線IV−IVに沿う断面図、図5は旋
回導孔の形成されている旋回導孔形成部の斜視図であ
る。
Embodiments of the present invention will now be described with reference to the drawings. 1 to 4 show an embodiment of the present invention.
2 is an overall schematic view of the bubbling cleaning device, FIG. 2 is a plan view of the device, FIG. 3 is an enlarged front view of an ejector type vortex flow type gas-liquid mixture injection nozzle which is a main part of the device, and FIG. 4 is a vertical section of the nozzle. FIG. 5 is a sectional view taken along line IV-IV shown in FIG. 3, and FIG. 5 is a perspective view of a swirl guide hole forming portion in which swirl guide holes are formed.

【0010】これらの図において、符号10は洗浄液で
満たされた水槽で、水槽10内には、被洗浄対象物Wが
懸吊等されることにより収容されている。符号12(1
2a,12b)は、水槽10の側壁に設けられた洗浄液
吸込口13と洗浄液吐出口14間に配設された洗浄水循
環パイプで、パイプ12の一端は水槽10に隣接して設
けられた浄化槽15に延び、パイプ12の他端は吐出口
14に設けられたエジェクター式渦流型気液混合体噴射
ノズル(以下、単にノズルという)30に接続されてい
る。循環パイプ12の途中にはダイヤフラムポンプ16
が設けられて、水槽10内の洗浄水をこの循環パイプ1
2を介して循環させるようになっている。
In these drawings, reference numeral 10 is a water tank filled with a cleaning liquid, and an object W to be cleaned is accommodated in the water tank 10 by being suspended. Reference numeral 12 (1
2a and 12b) are cleaning water circulation pipes provided between the cleaning liquid suction port 13 and the cleaning liquid discharge port 14 provided on the side wall of the water tank 10, and one end of the pipe 12 is a purification tank 15 provided adjacent to the water tank 10. And the other end of the pipe 12 is connected to an ejector-type vortex-type gas-liquid mixture injection nozzle (hereinafter, simply referred to as a nozzle) 30 provided at the discharge port 14. A diaphragm pump 16 is provided in the middle of the circulation pipe 12.
Is provided, and the wash water in the water tank 10 is supplied to the circulation pipe 1
It circulates through 2.

【0011】浄化槽15内には、吸込口13から吸い込
んだ洗浄水を濾過するフィルター17が設けられてい
る。符号18は浄化槽15内に発生する空気を排出する
エア抜きパイプである。ノズル30とポンプ16間の循
環パイプ12bの途中には、水槽10内に開口する洗浄
水噴射口20が設けられ、循環パイプ12により循環さ
れた洗浄水は、ノズル30と噴射口20の双方から水槽
10内に供給される。符号22はノズル30へ供給する
循環洗浄水量調整バルブである。
In the septic tank 15, there is provided a filter 17 for filtering the wash water sucked from the suction port 13. Reference numeral 18 is an air vent pipe for discharging the air generated in the septic tank 15. In the middle of the circulation pipe 12b between the nozzle 30 and the pump 16, a wash water injection port 20 that opens into the water tank 10 is provided, and the wash water circulated by the circulation pipe 12 is discharged from both the nozzle 30 and the injection port 20. It is supplied into the water tank 10. Reference numeral 22 denotes a circulating cleaning water amount adjusting valve which is supplied to the nozzle 30.

【0012】符号24はノズル30に空気を供給する空
気吸込パイプで、空気吸込パイプ24の上端開口部には
フィルター26が設けられ、フィルター26は一般洗浄
ではゴミの侵入を防ぐ上で、また半導体部品等の洗浄で
はバクテリア等の雑菌の除去を行う上で有効である。符
号28はノズル30に供給される吸込エア量調整用のバ
ルブで、気体噴出口32に負圧吸引される空気量、即ち
気体噴出口32から噴出される空気量を調整する。符号
29は洗浄水を排出するためのドレンである。符号Hは
水槽10内の洗浄水を洗浄に最適な所定温度に保つため
のヒータである。
Reference numeral 24 is an air suction pipe for supplying air to the nozzle 30, and a filter 26 is provided at an upper end opening of the air suction pipe 24. The filter 26 is used for preventing dust from entering in general cleaning, and is a semiconductor. Cleaning the parts is effective for removing bacteria such as bacteria. Reference numeral 28 is a valve for adjusting the amount of suction air supplied to the nozzle 30, and adjusts the amount of air that is negatively sucked into the gas ejection port 32, that is, the amount of air ejected from the gas ejection port 32. Reference numeral 29 is a drain for discharging the cleaning water. Reference numeral H is a heater for maintaining the cleaning water in the water tank 10 at a predetermined temperature that is optimum for cleaning.

【0013】噴射ノズル30は、図3及び図5に示され
るように、空気吸込パイプ24と連通する横断面円形の
気体噴出口32と、この気体噴出口32を取り囲む円環
状の渦流室34と、前後に延びる円筒状の循環洗浄水供
給室35から渦流室34に渦巻状に延びる複数本の旋回
導孔36と、渦流室34の気体噴出口32に臨む側に形
成された円環状の液体噴射口38とが、ノズルケーシン
グ31内に形成された構造となっている。
As shown in FIGS. 3 and 5, the injection nozzle 30 has a gas ejection port 32 having a circular cross section and communicating with the air suction pipe 24, and an annular swirl chamber 34 surrounding the gas ejection port 32. , A plurality of swirl guide holes 36 spirally extending from the cylindrical circulation wash water supply chamber 35 extending in the front-rear direction to the swirl chamber 34, and an annular liquid formed on the side of the swirl chamber 34 facing the gas ejection port 32. The injection port 38 has a structure formed in the nozzle casing 31.

【0014】ノズルケーシング31の側部には、洗浄水
供給室35と連通し、循環パイプ12bが連結されるパ
イプ連結部31aが形成され、ノズルケーシング31の
後端部には、空気吸込パイプ24が接続される空気供給
室33aが設けられている。旋回導孔36は、図3〜図
5に示されるように、洗浄水供給室35から渦巻状に前
方の渦流室34に延びており、洗浄水はこの旋回導孔3
6を通過する際に高速水流となる。渦流室34では、旋
回導孔36により圧送された高速水流によって旋回水流
が形成され、絞られた円環状の液体噴射口38から気体
噴出口32の前方に向かって高速旋回水流が噴射され、
符号Oを焦点とする先細り円錐形の高速渦流が形成され
る(図1,2,4参照)。
A pipe connecting portion 31a, which is connected to the circulation pipe 12b and communicates with the wash water supply chamber 35, is formed at a side portion of the nozzle casing 31, and an air suction pipe 24 is provided at a rear end portion of the nozzle casing 31. Is provided with an air supply chamber 33a. As shown in FIGS. 3 to 5, the swirl guide hole 36 spirally extends from the wash water supply chamber 35 to the forward swirl chamber 34.
A high-speed water stream is formed when passing through 6. In the swirl chamber 34, a swirl water flow is formed by the high-speed water flow pumped by the swirl guide hole 36, and the high-speed swirl water flow is jetted from the narrowed annular liquid jet port 38 toward the front of the gas jet port 32,
A tapered cone-shaped high-speed vortex whose focus is O is formed (see FIGS. 1, 2, and 4).

【0015】気体噴出口32の形成された中子33がノ
ズルケーシング31内に収容されることで、洗浄水供給
室35、旋回導孔36、渦流室34及び液体噴射口38
が形成され、円環状の液体噴射口38は軸心L上の一点
に向けて開口している。このため液体噴射口38から噴
射された高速旋回流は軸心L上の点Oを焦点とする先細
り円錐形の高速旋回流となる。
Since the core 33 having the gas ejection port 32 formed therein is housed in the nozzle casing 31, the cleaning water supply chamber 35, the swirl guide hole 36, the swirl chamber 34, and the liquid ejection port 38.
Is formed, and the annular liquid ejection port 38 opens toward a point on the axis L. Therefore, the high-speed swirling flow ejected from the liquid ejecting port 38 becomes a tapered conical high-speed swirling flow having a point O on the axis L as the focal point.

【0016】一方、気体噴出口32は空気吸込パイプ2
4を介して大気と連通し、液体噴射口38から洗浄水が
噴射される際にこの気体噴出口32内には負圧が生じる
ので、この負圧によって空気が気体噴出口32から吸引
噴出される(図4白抜矢印参照)。そして気体噴出口3
2から吸引噴出された空気は、液体噴射口38から噴射
形成された円錐形の高速渦流と接触し破砕され、強制混
合拡散されて超微粒子状の気泡となって分散される。
On the other hand, the gas outlet 32 is used as the air suction pipe 2.
4 is communicated with the atmosphere through 4, and a negative pressure is generated in the gas ejection port 32 when the cleaning water is ejected from the liquid ejection port 38, so that the negative pressure causes the air to be sucked and ejected from the gas ejection port 32. (See the white arrow in Fig. 4). And gas outlet 3
The air sucked and ejected from No. 2 comes into contact with a conical high-speed vortex flow jet-formed from the liquid jet port 38, is crushed, forcedly mixed and diffused, and dispersed as ultrafine-particle-like bubbles.

【0017】なお符号39はノズルケーシング31の前
端部外周に形成された雄ねじ39aに螺合された締結ナ
ットで、このナット39とノズルケーシング側段差部3
9bとによって水槽10の側壁を挟持することで、ノズ
ル30を水槽10の側壁に固定できる。このように本実
施例に係るバブリング洗浄装置では、気体噴出口32か
ら吸引噴出された空気は、環状の液体噴射口38から噴
射形成された洗浄水の円錐形高速渦流と接触し、破砕さ
れ強制混合拡散されて、従来装置では得られなかった超
微粒子状の気泡が分散された図1,2白抜矢印の様な循
環流が形成される。そして循環流の流れの中で、気泡が
循環しながら浮力により上昇し、このとき洗浄対象物W
と接触して汚れを洗浄する。即ち、循環する洗浄水中に
分散されている気泡は従来では到底得られなかった超微
粒子状であるため、気泡と洗浄対象物と接触面積が大き
く、洗浄効果が極めて高いと推測される。
Reference numeral 39 is a fastening nut screwed with a male screw 39a formed on the outer periphery of the front end portion of the nozzle casing 31, and the nut 39 and the step portion 3 on the nozzle casing side.
By sandwiching the side wall of the water tank 10 with 9b, the nozzle 30 can be fixed to the side wall of the water tank 10. As described above, in the bubbling cleaning device according to the present embodiment, the air ejected by suction from the gas ejection port 32 comes into contact with the conical high-speed vortex of the cleaning water ejected from the annular liquid ejection port 38, and is crushed and forced. By mixing and diffusing, a circulating flow as shown by a white arrow in FIGS. 1 and 2 in which ultrafine particle bubbles, which cannot be obtained by the conventional apparatus, are dispersed is formed. Then, in the flow of the circulation flow, the bubbles are circulated and rise due to the buoyancy.
Contact with and clean dirt. That is, since the air bubbles dispersed in the circulating wash water are in the form of ultrafine particles, which has never been obtained in the past, the contact area between the air bubbles and the object to be cleaned is large, and it is presumed that the cleaning effect is extremely high.

【0018】また本実施例装置では、空気をエジェクタ
ー方式で吸引するので、空気を供給するためのブロワ等
のエネルギー源が不要で、消費エネルギーの節約にもつ
ながる。また本実施例装置の施工には、従来のバブリン
グ洗浄装置における循環パイプの循環液吐出口に、本実
施例で示すコンパクトなエジェクター式渦流型気液混合
体噴射ノズル30を設置するだけでよく、施工も非常に
簡単である。
Further, in the apparatus of this embodiment, since the air is sucked by the ejector system, an energy source such as a blower for supplying the air is unnecessary, which leads to a saving of energy consumption. Further, for the construction of the device of this embodiment, it is sufficient to install the compact ejector type vortex type gas-liquid mixture injection nozzle 30 shown in this embodiment at the circulating liquid discharge port of the circulation pipe in the conventional bubbling cleaning device. Construction is also very easy.

【0019】なお前記実施例は、液体の噴射による負圧
を利用したエジェクター方式で空気を自給する構造とな
っているが、空気吸込パイプ24にブロワを設けて、空
気を強制的に気体噴出口32に供給するようにしてもよ
い。図6及び図7は、本発明の第2の実施例を示すもの
で、図6はバブリング洗浄装置の要部であるエジェクタ
ー式渦流型気液混合体噴射ノズルの正面図を示し、図7
は同ノズルの縦断面図を示す。
In the above-described embodiment, the air is self-supplied by the ejector system utilizing the negative pressure generated by the liquid injection. However, the blower is provided in the air suction pipe 24 to force the air to blow out the gas. You may make it supply to 32. 6 and 7 show a second embodiment of the present invention, and FIG. 6 shows a front view of an ejector type vortex flow type gas-liquid mixture injection nozzle which is a main part of a bubbling cleaning device.
Shows a vertical sectional view of the nozzle.

【0020】前記した第1の実施例における噴射ノズル
30は、渦巻状に延びる比較的流路面積の小さい複数本
の旋回導孔36が渦流室34に延び、さらに渦流室34
に設けられた液体噴射口38の流路面積も比較的小さく
形成されていたが、本実施側では、比較的流路面積の大
きい1本の旋回導孔46が渦流室34に延び、さらに渦
流室34から比較的流路面積の大きい円錐状に延びる流
路48によって液体噴射口38が形成されており、流路
面積が大きい分だけ目詰まりしにくい構造となってい
る。即ち、図6,7に示すように液体噴射口38の流路
面積を大きく形成しても、第1の実施例と同程度の気泡
の微粒子化を達成できるので、洗浄効果が前記第1の実
施例より劣るということはない。その他は前記第1の実
施例と同様であり、同一の符号を付すことによりその説
明は省略する。
In the injection nozzle 30 of the first embodiment described above, a plurality of swirl guide holes 36 extending in a spiral shape and having a relatively small flow passage area extend to the swirl chamber 34, and further the swirl chamber 34.
The flow passage area of the liquid injection port 38 provided in the above was also formed to be relatively small. However, on the present implementation side, one swirl guide hole 46 having a relatively large flow passage area extends to the swirl chamber 34, and the swirl flow is further increased. The liquid ejection port 38 is formed by the flow passage 48 extending from the chamber 34 in a conical shape having a relatively large flow passage area, and has a structure in which clogging is less likely to occur due to the larger flow passage area. That is, as shown in FIGS. 6 and 7, even if the flow passage area of the liquid ejection port 38 is formed large, the atomization of bubbles to the same extent as in the first embodiment can be achieved, so that the cleaning effect is the same as that of the first embodiment. It is not inferior to the examples. Others are the same as those in the first embodiment, and the description thereof will be omitted by giving the same reference numerals.

【0021】図8は本発明の他の実施例であるバブリン
グ洗浄装置の平面図を示すものである。前記した実施例
では、水槽10に1個のノズル30を設けた構造となっ
ているが、本実施例では、ノズル30を2個並設し、所
定時間毎に一方のノズルを作動させることで、正逆反対
方向となる循環流(符号F1,F2参照)を形成し、洗浄
効果を高める構造となっている。
FIG. 8 is a plan view of a bubbling cleaning device which is another embodiment of the present invention. In the above-described embodiment, the water tank 10 is provided with one nozzle 30, but in the present embodiment, two nozzles 30 are arranged side by side and one nozzle is operated at a predetermined time interval. , And a circulation flow (see symbols F 1 and F 2 ) in opposite directions are formed to enhance the cleaning effect.

【0022】また図9に示すように、多くのノズル30
をその設置位置を異ならしめて水槽の側壁に設けること
で、さらなる洗浄効果を高める構造としてもよい。さら
に前記した種々の実施例で示すバルブリング洗浄装置に
従来公知の超音波洗浄技術を組合わせた構造とすること
により、洗浄効果を高めるようにしてもよい。
Further, as shown in FIG. 9, many nozzles 30 are provided.
May be provided on the side wall of the water tank with different installation positions to further enhance the cleaning effect. Further, the cleaning effect may be enhanced by combining the valve ring cleaning device shown in the above-described various embodiments with a conventionally known ultrasonic cleaning technique.

【0023】[0023]

【発明の効果】以上の説明から明らかなように、本発明
に係るバブリング洗浄装置によれば、気体噴出口から噴
出した気体が液体噴射口から噴射した高速渦流によって
破砕され、強制混合拡散されて、水槽内には超微粒子状
の気泡の分散された強制循環流が形成される。このため
洗浄対象物との大きな接触面積の確保できる超微粒子状
の気泡によって、洗浄対象物の微小隙間における汚れも
確実に除去できることとなって、顕著な洗浄効果が達成
できる。
As is apparent from the above description, according to the bubbling cleaning device of the present invention, the gas ejected from the gas ejection port is crushed by the high-speed vortex flow ejected from the liquid ejection port and forcedly mixed and diffused. In the water tank, a forced circulation flow in which ultrafine particles are dispersed is formed. For this reason, the ultrafine particle bubbles capable of ensuring a large contact area with the object to be cleaned can surely remove the dirt in the minute gaps of the object to be cleaned, and a remarkable cleaning effect can be achieved.

【0024】請求項2では、ノズルをエジェクター構造
としたので、ブロワやポンプ等の気体噴出口への空気圧
送手段が不要で、エネルギーの節約という点で有効であ
る。
According to the second aspect, since the nozzle has the ejector structure, there is no need for an air pressure feeding means such as a blower or a pump to the gas ejection port, which is effective in saving energy.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例であるバブリング洗浄装置の
全体概要図
FIG. 1 is an overall schematic diagram of a bubbling cleaning device that is an embodiment of the present invention.

【図2】同装置の平面図FIG. 2 is a plan view of the device.

【図3】バブリング洗浄装置の要部であるエジェクター
式渦流型気液混合体噴射ノズルの正面図
FIG. 3 is a front view of an ejector-type vortex-type gas-liquid mixture injection nozzle that is a main part of a bubbling cleaning device.

【図4】同ノズルの縦断面図(図3に示す線IV−IVに沿
う断面図)
FIG. 4 is a vertical sectional view of the nozzle (a sectional view taken along line IV-IV shown in FIG. 3).

【図5】旋回導孔形成部の斜視図FIG. 5 is a perspective view of a turning guide hole forming portion.

【図6】本発明の他の実施例の要部であるエジェクター
式渦流型気液混合体噴射ノズルの正面図
FIG. 6 is a front view of an ejector type vortex flow type gas-liquid mixture injection nozzle which is a main part of another embodiment of the present invention.

【図7】同ノズルの縦断面図FIG. 7 is a vertical sectional view of the nozzle.

【図8】本発明のさらに他の実施例であるバブリング洗
浄装置の平面図
FIG. 8 is a plan view of a bubbling cleaning device which is still another embodiment of the present invention.

【図9】本発明のさらに他の実施例であるバブリング洗
浄装置の平面図
FIG. 9 is a plan view of a bubbling cleaning device which is still another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

10 水槽 12(12a,12b) 洗浄水循環パイプ 13 洗浄水吸込口 14 洗浄水吐出口 16 ポンプ 24 空気吸込パイプ 30 エジェクター式渦流型気液混合体噴射ノズル 31 ノズルケーシング 32 気体噴出口 33 中子 34 渦流室 36,46 旋回導孔 38 液体噴射口 10 Water Tank 12 (12a, 12b) Wash Water Circulation Pipe 13 Wash Water Suction Port 14 Wash Water Discharge Port 16 Pump 24 Air Suction Pipe 30 Ejector-type Vortex-type Mixture Injection Nozzle 31 Nozzle Casing 32 Gas Jet 33 Core 34 Vortex Chamber 36,46 Swirl guide hole 38 Liquid jet port

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 洗浄水で満たされ、洗浄対象物が収容さ
れる水槽と、前記水槽内又は水槽壁に設けられ、水槽内
に微小気泡の分散された強制循環流を形成する気液混合
体噴射ノズルと、を備えたバブリング洗浄装置であっ
て、 前記噴射ノズルは、前方に向け開口する気体噴出口と、 前記気体噴出口を取り囲む位置に形成された円環状の渦
流室と、 前記円環状渦流室に渦巻状に延び、供給された洗浄水を
渦流室に高速で導入し、渦流室に高速旋回流を形成する
旋回導孔と、 前記渦流室の気体噴出口を取り囲む位置に形成され、気
体噴出口前方に先細り円錐形の高速渦流を噴射形成する
円環状の液体噴射口と、から構成されたことを特徴とす
るバブリング洗浄装置。
1. A water tank filled with cleaning water and containing an object to be cleaned, and a gas-liquid mixture provided in the water tank or on the wall of the water tank to form a forced circulation flow in which micro bubbles are dispersed in the water tank. A bubbling cleaning device comprising: an injection nozzle, wherein the injection nozzle has a gas ejection port that opens forward, an annular vortex chamber formed at a position surrounding the gas ejection port, and the annular ring. A swirl extending into the swirl chamber, the supplied cleaning water is introduced into the swirl chamber at high speed, and a swirl guide hole that forms a high-speed swirl flow in the swirl chamber, and is formed at a position surrounding the gas ejection port of the swirl chamber, A bubbling cleaning device comprising: an annular liquid ejection port for ejecting and forming a tapered conical high-speed vortex in front of a gas ejection port.
【請求項2】 前記噴射ノズルの気体噴出口は空気パイ
プを介して大気に連通されており、液体噴射口からの液
体の噴射に伴って気体噴出口前方に形成される負圧によ
り気体噴出口から空気が前方に吸引噴出されることを特
徴とする請求項1記載のバブリング洗浄装置。
2. The gas ejection port of the ejection nozzle is communicated with the atmosphere through an air pipe, and the gas ejection port is formed by a negative pressure formed in front of the gas ejection port as the liquid is ejected from the liquid ejection port. The bubbling cleaning device according to claim 1, wherein air is sucked and ejected forward from the device.
JP05085810A 1993-04-13 1993-04-13 Bubbling cleaning device Expired - Fee Related JP3142412B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP05085810A JP3142412B2 (en) 1993-04-13 1993-04-13 Bubbling cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP05085810A JP3142412B2 (en) 1993-04-13 1993-04-13 Bubbling cleaning device

Publications (2)

Publication Number Publication Date
JPH06296937A true JPH06296937A (en) 1994-10-25
JP3142412B2 JP3142412B2 (en) 2001-03-07

Family

ID=13869228

Family Applications (1)

Application Number Title Priority Date Filing Date
JP05085810A Expired - Fee Related JP3142412B2 (en) 1993-04-13 1993-04-13 Bubbling cleaning device

Country Status (1)

Country Link
JP (1) JP3142412B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004314048A (en) * 2003-01-15 2004-11-11 Toray Ind Inc Circulation type mouthpiece washing device and washing method
JPWO2004112970A1 (en) * 2003-06-23 2006-07-27 池田 正明 Eddy current type liquid atomization nozzle
JP2007152227A (en) * 2005-12-05 2007-06-21 Hiroyoshi Hamanaka Release cleaning method using kinetically functional aerosol
JP2011036815A (en) * 2009-08-13 2011-02-24 Mitsubishi Electric Engineering Co Ltd Washing apparatus
JP2013086089A (en) * 2011-10-24 2013-05-13 Tdk Corp Device and method for cleaning microbubble
JP5842049B1 (en) * 2014-12-18 2016-01-13 ゼニス羽田株式会社 Solid cleaning equipment

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001253113A (en) 2000-03-13 2001-09-18 Fuji Xerox Co Ltd Color imaging apparatus
US8149475B2 (en) 2007-10-30 2012-04-03 Ricoh Company, Ltd. Apparatus, method, and computer program product for processing image

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004314048A (en) * 2003-01-15 2004-11-11 Toray Ind Inc Circulation type mouthpiece washing device and washing method
JPWO2004112970A1 (en) * 2003-06-23 2006-07-27 池田 正明 Eddy current type liquid atomization nozzle
JP4659616B2 (en) * 2003-06-23 2011-03-30 正明 池田 Eddy current type liquid atomization nozzle
JP2007152227A (en) * 2005-12-05 2007-06-21 Hiroyoshi Hamanaka Release cleaning method using kinetically functional aerosol
JP2011036815A (en) * 2009-08-13 2011-02-24 Mitsubishi Electric Engineering Co Ltd Washing apparatus
JP2013086089A (en) * 2011-10-24 2013-05-13 Tdk Corp Device and method for cleaning microbubble
JP5842049B1 (en) * 2014-12-18 2016-01-13 ゼニス羽田株式会社 Solid cleaning equipment

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