JPH06283572A - Mechanism for correcting parallelism - Google Patents

Mechanism for correcting parallelism

Info

Publication number
JPH06283572A
JPH06283572A JP5066832A JP6683293A JPH06283572A JP H06283572 A JPH06283572 A JP H06283572A JP 5066832 A JP5066832 A JP 5066832A JP 6683293 A JP6683293 A JP 6683293A JP H06283572 A JPH06283572 A JP H06283572A
Authority
JP
Japan
Prior art keywords
point material
melting point
low melting
semiconductor element
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5066832A
Other languages
Japanese (ja)
Inventor
Hidekazu Sato
英一 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP5066832A priority Critical patent/JPH06283572A/en
Publication of JPH06283572A publication Critical patent/JPH06283572A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0555Shape
    • H01L2224/05552Shape in top view
    • H01L2224/05554Shape in top view being square
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/50Tape automated bonding [TAB] connectors, i.e. film carriers; Manufacturing methods related thereto

Landscapes

  • Wire Bonding (AREA)

Abstract

PURPOSE:To provide mechanism for correcting parallelism capable of correcting parallelism of a pressurizing tool and a mounting base in a short time. CONSTITUTION:In the region containing a movable part like an universal coupling mechanism 5 of a mechanism for correcting of parallelism, a low melting point material holding part 9 is arranged, the low melting point material holding part 9 is filled with low melting point material, which is fused by heating, and a pressurizing tool 7 is brought into contact with a mounting surface 17 at the time of fusing, thereby performing correction of parallelism. After correction parallelism is finished, the low melting point material is again hardened, and correction of parallelism is completed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、インナーリードボンデ
ィング装置、アウターリードボンディング装置、等の押
圧手段と載置台との平行だし機構に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a parallel extension mechanism for pressing means such as an inner lead bonding apparatus, an outer lead bonding apparatus, etc. and a mounting table.

【0002】[0002]

【従来の技術】従来の平行だし機構を、インナーリード
ボンディング装置に例えて説明する。インナーリードボ
ンディング装置について説明すると、図3の斜視図のご
とく半導体素子載置台上32に載置された半導体素子2
0は、図示しない位置決めガイドにより所定の位置に位
置決めされる。一方図示しないテープレールにガイドさ
れ送り装置により搬送されたフイルム基板21は、その
デバイスホール30が半導体素子20上に達した位置で
停止し、半導体素子20上に設けた多数の電極31と各
リード22とをそれぞれ整合させる。次いで、加熱した
ボンディングツール18を下降させて各リード22を加
圧および加熱してそれぞれの電極31と接続する。この
時半導体素子載置台32の半導体素子搭載面29と、ボ
ンディングツール18のボンディング面28との平行状
態を確保しないと、半導体素子搭載面29に載置した半
導体素子20の多数の電極31と、フイルム基板21上
に配置したリード22との全体にわたっての均一な接続
が不能となる。このためボンディングツール18を固定
するボンディングツールホルダー33は、ボンディング
ツールホルダー33を自在に傾けることが可能な平行調
整ネジ34と、ボンディング装置のツール保持部35に
水平なX方向に移動可能なXステージ36及び、X方向
に直行する水平なY方向に移動可能なYステージ37
と、それぞれの調整ネジ38で調整可能であり、かつ固
定ネジ39で固定されている。
2. Description of the Related Art A conventional parallel extension mechanism will be described by exemplifying an inner lead bonding apparatus. The inner lead bonding apparatus will be described. As shown in the perspective view of FIG. 3, the semiconductor element 2 mounted on the semiconductor element mounting table 32 is shown.
0 is positioned at a predetermined position by a positioning guide (not shown). On the other hand, the film substrate 21 guided by a tape rail (not shown) and conveyed by the feeder stops at a position where the device hole 30 reaches the semiconductor element 20, and a large number of electrodes 31 provided on the semiconductor element 20 and each lead. 22 and 22, respectively. Next, the heated bonding tool 18 is lowered to pressurize and heat each lead 22 to connect with each electrode 31. At this time, if the parallel state between the semiconductor element mounting surface 29 of the semiconductor element mounting base 32 and the bonding surface 28 of the bonding tool 18 is not ensured, a large number of electrodes 31 of the semiconductor element 20 mounted on the semiconductor element mounting surface 29, A uniform connection with the leads 22 arranged on the film substrate 21 is impossible. For this reason, the bonding tool holder 33 for fixing the bonding tool 18 includes a parallel adjustment screw 34 capable of freely tilting the bonding tool holder 33 and an X stage movable in the X direction horizontal to the tool holding portion 35 of the bonding apparatus. 36 and a Y stage 37 movable in the horizontal Y direction orthogonal to the X direction
Are adjustable with the respective adjusting screws 38, and are fixed with the fixing screws 39.

【0003】平行調整ネジ34によりボンディング面2
8と半導体素子搭載面29との平行調整を行い、その後
X方向及びY方向の調整ネジ38を用いてボンディング
ツール18のボンディング面28と半導体素子搭載面2
9との平行だしを行い、固定ネジ39で固定していた。
By the parallel adjustment screw 34, the bonding surface 2
8 and the semiconductor element mounting surface 29 are adjusted in parallel, and then the bonding surface 28 of the bonding tool 18 and the semiconductor element mounting surface 2 are adjusted by using the adjusting screws 38 in the X and Y directions.
It was paralleled with 9 and fixed with a fixing screw 39.

【0004】[0004]

【発明が解決しようとする課題】上記従来技術によって
は、調整ネジの微妙な動きによりツールの平行だしを行
うためにツールの平行だしが難しく熟練した作業と多大
な調整時間を必要としていた。また時としては平行だし
不良のために良好なボンディングを行うことができない
場合があった。
According to the above-mentioned prior art, since the tool is parallelized due to the delicate movement of the adjusting screw, it is difficult to parallelize the tool, and skilled work and a great amount of adjustment time are required. In some cases, it was impossible to perform good bonding due to the failure of parallelization.

【0005】本発明は、かかる課題を解決するためにな
されたものであり、その目的はツールの平行だしが容易
となる平行だし機構を提供することにある。
The present invention has been made to solve the above problems, and an object thereof is to provide a paralleling mechanism for facilitating parallelizing of a tool.

【0006】[0006]

【課題を解決するための手段】本発明の平行だし機構
は、加圧伝達部と加圧体とを接続する接続部に自在継ぎ
手を配置して、自在継ぎ手部を含む範囲に、低融点材料
保持部と、発熱部とを配置し、自在継ぎ手部を含む範囲
の低融点材料保持部内に低融点材料を充填する。
In the parallel squeezing mechanism of the present invention, a universal joint is arranged at a connecting portion for connecting a pressure transmitting portion and a pressure body, and a low melting point material is included in a range including the universal joint portion. The holding portion and the heat generating portion are arranged, and the low melting point material holding portion in the range including the universal joint portion is filled with the low melting point material.

【0007】または、載置台に可動機構を付与し、可動
機構を含む範囲に低融点材料保持部と、発熱部とを配置
して、可動機構の周囲は低融点材料保持部内の低融点材
料により充填する。
Alternatively, the movable table is provided with a movable mechanism, and the low melting point material holding portion and the heat generating portion are arranged in a range including the movable mechanism, and the periphery of the movable mechanism is made of the low melting point material in the low melting point material holding portion. Fill.

【0008】次に、低融点材料保持部内の低融点材料を
発熱部の加熱により溶融状態または軟化状態にして、加
圧体に接続した加圧工具の加工面と載置台とを接触させ
加圧することにより、自在継ぎ手の倣い作用により加圧
面と載置台の載置面との平行出しを行う。
Next, the low-melting-point material in the low-melting-point material holding section is brought into a molten state or a softened state by heating the heating section, and the processing surface of the pressure tool connected to the pressure body is brought into contact with the mounting table to apply pressure. As a result, the pressurizing surface and the mounting surface of the mounting table are parallelized by the copying action of the universal joint.

【0009】または、低融点材料保持部内の低融点材料
を発熱部の加熱により溶融状態または軟化状態にして、
加圧体に接続した加圧工具の加工面と載置台とを接触さ
せ加圧することにより、載置台の可動機構の倣い作用に
より下降面と載置台の載置面との平行出しを行う。
Alternatively, the low-melting-point material in the low-melting-point material holding portion is melted or softened by heating the heat-generating portion,
The working surface of the pressure tool connected to the pressurizing body and the mounting table are brought into contact with each other to apply pressure, whereby the descending surface and the mounting surface of the mounting table are parallelized by the copying action of the movable mechanism of the mounting table.

【0010】平行だし終了後に、発熱部の発熱を停止す
ることで、低融点材料を再び固化し自在継ぎ手部あるい
は可動機構を固定し、加圧面と載置面との平行状態を維
持することが可能となる。
By stopping the heat generation of the heat generating portion after the parallel alignment is completed, the low melting point material is solidified again and the universal joint portion or the movable mechanism is fixed, and the parallel state between the pressing surface and the mounting surface can be maintained. It will be possible.

【0011】[0011]

【作用】本発明の平行だし機構によれば、加圧伝達部と
加圧体を連結する自在継ぎ手部を含む範囲または載置台
の可動機構を含む範囲に低融点材料保持部と、発熱部と
を配置し、自在継ぎ手部を含む範囲または載置台の可動
機構部を含む範囲の低融点材料保持部内に低融点材料を
充填する。
According to the parallel squeezing mechanism of the present invention, the low melting point material holding portion, the heat generating portion, and the range including the universal joint portion for connecting the pressure transmitting portion and the pressure body or the range including the movable mechanism of the mounting table are provided. Are arranged, and the low melting point material is filled in the low melting point material holding portion in the range including the universal joint portion or the range including the movable mechanism portion of the mounting table.

【0012】低融点材料保持部内の低融点材料を、発熱
部の加熱により溶融状態または軟化状態とする。
The low melting point material in the low melting point material holding portion is brought into a molten state or a softened state by heating the heat generating portion.

【0013】低融点材料の溶融または軟化時に、加圧体
に接続した加圧工具の加工面と載置台の載置面とを接触
させ加圧することで、自在継ぎ手部または可動機構部の
倣い作用により加圧体の加工面と載置台の載置面との平
行出しを行う。
When the low-melting-point material is melted or softened, the working surface of the pressure tool connected to the pressure body and the mounting surface of the mounting table are brought into contact with each other to pressurize them, thereby imitating the copying action of the universal joint portion or the movable mechanism portion. Thus, the processed surface of the pressurizing body and the mounting surface of the mounting table are parallel to each other.

【0014】その後、自在継ぎ手部または可動機構部を
含む範囲に配置した低融点材料保持部内の低融点材料
を、発熱部の加熱を停止することで冷却固化して自在継
ぎ手部または可動機構部を固定する。以上により、加圧
体の加工面と載置台の載置面との平行だしが終了する。
After that, the low melting point material in the low melting point material holding portion arranged in the range including the universal joint portion or the movable mechanism portion is cooled and solidified by stopping the heating of the heat generating portion, and the universal joint portion or the movable mechanism portion is removed. Fix it. With the above, the parallelization of the processed surface of the pressing body and the mounting surface of the mounting table is completed.

【0015】[0015]

【実施例】(実施例1)本発明の実施例を説明するため
の構造断面図図1において、加圧伝達部1と加圧体2
は、加圧伝達部1の先端に有する球体部3と、加圧体2
先端部に配置した球体部3を内包する球座部4により接
続され、球体部3と球座部4は自在継ぎ手機構5を構成
し、加圧伝達部1と加圧体2とを接続している。加圧伝
達部1の他端は図示しない上下移動機構及び加圧機構に
接続している。
(Embodiment 1) Structural sectional view for explaining an embodiment of the present invention. In FIG. 1, a pressure transmitting portion 1 and a pressure body 2 are provided.
Is a spherical body portion 3 at the tip of the pressure transmitting portion 1 and a pressure body 2
They are connected by a ball seat portion 4 which includes a ball portion 3 arranged at the tip end, and the ball portion 3 and the ball seat portion 4 constitute a universal joint mechanism 5, which connects the pressure transmitting portion 1 and the pressure body 2. ing. The other end of the pressure transmission unit 1 is connected to a vertical movement mechanism and a pressure mechanism (not shown).

【0016】加圧体2の他端には加圧工具取り付け部6
を有し、加圧工具7を接続する。
At the other end of the pressure body 2, a pressure tool attachment portion 6 is provided.
And the pressurizing tool 7 is connected.

【0017】加圧体2の側面部8には、低融点材料保持
部9が配置され、低融点材料保持部9の内壁10には帯
状発熱体11を配置し加熱可能とし、低融点材料保持部
9内には低融点材料12を充填した。
A low-melting material holding portion 9 is arranged on the side surface portion 8 of the pressurizing body 2, and a band-shaped heating element 11 is arranged on the inner wall 10 of the low-melting material holding portion 9 to enable heating to hold the low-melting material. A low melting point material 12 was filled in the portion 9.

【0018】低融点材料保持部9と、加圧体2の側面部
8との接続部は、ネジ13及び、封止体14を配置し
て、低融点材料12の流れだしを防止する機構とした。
加圧工具7には加圧面15を有し、加圧面15は、載置
台16の載置面17と対向して配置されている。上記の
ごとき構造について以下詳細に説明する。
A screw 13 and a sealing body 14 are arranged at a connecting portion between the low-melting-point material holding portion 9 and the side surface portion 8 of the pressurizing body 2 to prevent the low-melting-point material 12 from flowing out. did.
The pressing tool 7 has a pressing surface 15, and the pressing surface 15 is arranged to face the mounting surface 17 of the mounting table 16. The structure as described above will be described in detail below.

【0019】載置面17と加圧面15との平行出しを行
う場合、先ず、低融点材料保持部9内に充填された低融
点材料12を帯状発熱体11により加熱することで溶融
状態あるいは、軟化状態にさせる。
When the placing surface 17 and the pressing surface 15 are parallelly arranged, first, the low-melting-point material 12 filled in the low-melting-point material holding portion 9 is heated by the band-shaped heat generating element 11 to be in a molten state or Let it soften.

【0020】低融点材料12には、今回熱可塑系樹脂、
石油系ワックス、天然ワックス等を原料とするホットメ
ルト樹脂を用い、軟化点温度が摂氏約120度となるホ
ットメルト樹脂を選択したが、スズ、鉛、ビスマス、イ
ンジウム等の合金からなるところの低融点金属を用いて
も同様の効果を得ることができる。
The low melting point material 12 is a thermoplastic resin this time,
We used a hot-melt resin made from petroleum wax, natural wax, etc., and selected a hot-melt resin with a softening point of about 120 degrees Celsius, but the low temperature of alloys such as tin, lead, bismuth, and indium. The same effect can be obtained by using a melting point metal.

【0021】このような低融点材料12を、帯状発熱体
11により加熱し、溶融状態にするためには、帯状発熱
体の発熱温度は、摂氏約160度から220度を要す
る。
In order to heat the low melting point material 12 with the strip heating element 11 to bring it into a molten state, the heating temperature of the strip heating element needs to be about 160 to 220 degrees Celsius.

【0022】低融点材料12を溶融状態にした場合、加
圧伝達部の先端に有する球体部3と加圧体2先端部に配
置した球体部3を内包する球座部4により接続され、球
体部3と球座部4は自在継ぎ手機構5を構成しているた
めに、加圧体2に力が加わった場合非常に動きやすくな
る。
When the low-melting-point material 12 is in a molten state, it is connected by a sphere portion 3 having the tip of the pressure transmitting portion and a sphere seat portion 4 containing the sphere portion 3 arranged at the tip of the pressure body 2 to form a sphere. Since the portion 3 and the ball seat portion 4 constitute the universal joint mechanism 5, when the force is applied to the pressure body 2, it becomes very easy to move.

【0023】低融点材料12の溶融状態、あるいは軟化
状態において、図示しない上下移動機構及び加圧機構に
より、加圧伝達部1及び、自在継ぎ手機構5、加圧体2
と、加圧体2に接続した加圧工具7の加圧面15を、載
置台16の載置面17に接触させ、かつ加圧工具7によ
り若干の加圧を行うことにより、加圧工具7の加圧面1
5は載置台16の載置面17に接触し、次に加圧工具7
の加圧面15が多少傾いていても自在継ぎ手機構5の動
きにより、載置面17に倣うことで、加圧面15は載置
面17と均一な接触面を得ることが可能となり、載置面
17に対して加圧工具7の加圧面15を平行にすること
ができる。
When the low melting point material 12 is in a molten state or a softened state, the pressure transmitting section 1, the universal joint mechanism 5 and the pressure body 2 are moved by an up / down moving mechanism and a pressure mechanism (not shown).
Then, the pressing surface 15 of the pressing tool 7 connected to the pressing body 2 is brought into contact with the mounting surface 17 of the mounting table 16, and the pressing tool 7 slightly presses the pressing tool 7. Pressurized surface 1
5 contacts the mounting surface 17 of the mounting table 16 and then the pressing tool 7
Even if the pressurizing surface 15 is slightly inclined, the pressurizing surface 15 can obtain a uniform contact surface with the mounting surface 17 by following the mounting surface 17 by the movement of the universal joint mechanism 5. The pressing surface 15 of the pressing tool 7 can be parallel to 17.

【0024】低融点材料12を溶融状態、あるいは軟化
状態においての載置台16の載置面17と、加圧工具7
の加圧面15との平行だしの後、加圧工具7を加圧状態
のまま、低融点材料保持部9の内壁10に配置した、帯
状発熱体11の発熱を停止させて、低融点材料12の温
度を低下させ、低融点材料12を溶融状態あるいは軟化
状態より、固化状態に再び戻すことにより、低融点材料
12によって自在継ぎ手機構5を固定することが可能と
なる。
The mounting surface 17 of the mounting table 16 and the pressing tool 7 when the low melting point material 12 is in a molten state or a softened state.
After being laid parallel to the pressing surface 15 of the low melting point material 12, the pressing tool 7 is kept in the pressed state and the heat generation of the band-shaped heating element 11 arranged on the inner wall 10 of the low melting point material holding portion 9 is stopped to lower the low melting point material 12 It is possible to fix the universal joint mechanism 5 by the low-melting point material 12 by lowering the temperature and returning the low-melting point material 12 from the molten state or the softened state to the solidified state again.

【0025】以上のごとき構造の平行だし機構をインナ
ーリードボンディング装置に採用した場合、従来の平行
だし機構によって非常に時間を要していた平行だしを短
時間で終了させることが可能となる。また、加圧工具
が、インナーリードボンディングのボンディングツール
等加圧と共に、加熱されるものについては、加圧工具あ
るいは、加圧工具取付部に、冷却媒体による所の冷却機
構を付与し低融点材料保持部への加圧工具よりの伝熱を
遮断することにより低融点材料の軟化を防ぐことができ
ることは明らかであるため本発明に含まれる。
When the parallel alignment mechanism having the above structure is adopted in the inner lead bonding apparatus, it is possible to finish the parallel alignment, which takes a very long time by the conventional parallel alignment mechanism, in a short time. In addition, if the pressure tool is heated with pressure, such as a bonding tool for inner lead bonding, a low-melting-point material with a cooling mechanism provided by a cooling medium is added to the pressure tool or the pressure tool mounting portion. Since it is clear that softening of the low melting point material can be prevented by blocking the heat transfer from the pressing tool to the holding portion, it is included in the present invention.

【0026】(実施例2)本実施例の第2の実施例とし
て、図2の断面図を用いてインナーリードボンディング
装置の半導体素子搭載台に平行だし機構を応用した例に
ついて説明する。
(Embodiment 2) As a second embodiment of this embodiment, an example in which a paralleling mechanism is applied to the semiconductor element mounting base of the inner lead bonding apparatus will be described with reference to the sectional view of FIG.

【0027】図示しない上下加圧機構に接続したボンデ
ィングツール18は半導体素子搭載台19上に配置した
半導体素子20と、フイルム基板21に設けられた各リ
ード22とを接続する。半導体素子搭載台19は半導体
素子搭載台保持部23上の凹球面体24上に載置され、
半導体素子搭載台19の半導体素子搭載台保持部23と
の接触部25は凸球面体26とした。これにより半導体
素子搭載台19は、わずかな力がかかることにより可動
可能となっている。
The bonding tool 18 connected to a vertical pressing mechanism (not shown) connects the semiconductor element 20 arranged on the semiconductor element mounting base 19 and each lead 22 provided on the film substrate 21. The semiconductor element mounting base 19 is placed on the concave spherical body 24 on the semiconductor element mounting base holding portion 23,
The contact portion 25 of the semiconductor element mounting base 19 with the semiconductor element mounting base holding portion 23 is a convex spherical body 26. As a result, the semiconductor element mounting base 19 can be moved by applying a slight force.

【0028】半導体素子搭載台保持部23の周囲には低
融点材料保持部9を配置して、半導体素子搭載台保持部
23に固定する。半導体素子搭載台保持部23には棒状
発熱体27を埋め込み加熱可能な状態にした。
A low melting point material holding portion 9 is arranged around the semiconductor element mounting base holding portion 23 and fixed to the semiconductor element mounting base holding portion 23. A rod-shaped heating element 27 was embedded in the semiconductor element mounting base holding portion 23 so that heating was possible.

【0029】以上のごとき機構のボンディング装置にお
いて、ボンディングツール18のボンディング面28
と、半導体素子搭載台19の半導体素子搭載面29との
平行出しを行う場合には、先ず半導体素子搭載台保持部
23に埋め込まれている棒状発熱体27を加熱すること
で、低融点材料12を溶融状態または軟化状態にする。
In the bonding apparatus having the above mechanism, the bonding surface 28 of the bonding tool 18 is
In parallel with the semiconductor element mounting surface 29 of the semiconductor element mounting base 19, first, the rod-shaped heating element 27 embedded in the semiconductor element mounting base holding portion 23 is heated, whereby the low melting point material 12 To a molten state or a softened state.

【0030】次に、ボンディングツール18を図示しな
い上下機構により下降して、半導体素子搭載面29に接
触させ、かつ若干の加圧をかけることにより半導体素子
搭載台19の半導体素子搭載面29と、ボンディングツ
ール18のボンディング面28を、平行状態にすること
が可能となる。
Next, the bonding tool 18 is lowered by an up-and-down mechanism (not shown) to contact the semiconductor element mounting surface 29 and apply a slight pressure to the semiconductor element mounting surface 29 of the semiconductor element mounting base 19. The bonding surface 28 of the bonding tool 18 can be made parallel.

【0031】ボンディングツール18のボンディング面
28に接触加圧状態で平行を維持している半導体素子搭
載台19は、半導体素子搭載台保持部23に埋設する棒
状発熱体27の発熱を停止することで、温度が低下し低
融点材料12が固化状態に戻り凸球面体26を低融点材
料12が保持するために維持固定することが可能とな
る。
The semiconductor element mounting base 19 which is kept parallel to the bonding surface 28 of the bonding tool 18 in a contact pressure state stops the heat generation of the rod-shaped heating element 27 embedded in the semiconductor element mounting base holder 23. As the temperature lowers and the low melting point material 12 returns to the solidified state, the convex spherical body 26 can be maintained and fixed because the low melting point material 12 holds it.

【0032】以上により平行出しを終了した半導体素子
搭載台19上の半導体素子搭載面29に、半導体素子2
0を所定の位置に位置決めして載置する。一方図示しな
いテープレールにガイドされ送り装置により搬送された
フイルム基板21は、そのデバイスホール30が半導体
素子20上に達した位置で停止し、半導体素子20上に
設けた多数の電極31と各リード22とをそれぞれ整合
させる。
On the semiconductor element mounting surface 29 on the semiconductor element mounting base 19 which has completed parallel alignment as described above, the semiconductor element 2
0 is positioned and placed at a predetermined position. On the other hand, the film substrate 21 guided by a tape rail (not shown) and conveyed by the feeding device stops at the position where the device hole 30 reaches the semiconductor element 20, and a large number of electrodes 31 and the leads provided on the semiconductor element 20. 22 and 22, respectively.

【0033】次に、図示しない上下加圧機構に接続した
ボンディングツール18は半導体素子搭載台19上に配
置した半導体素子20と、フイルム基板21に設けられ
た各リード22とを接続する。
Next, the bonding tool 18 connected to a vertical pressing mechanism (not shown) connects the semiconductor element 20 arranged on the semiconductor element mounting base 19 and each lead 22 provided on the film substrate 21.

【0034】この時低融点材料12の溶融あるいは軟化
状態において、半導体素子搭載台19の半導体素子搭載
面29と、ボンディングツール18のボンディング面2
8との平行状態が確保されているために、半導体素子搭
載面29上に載置した半導体素子20の多数の電極31
と、フイルム基板21上に配置したリード22との全体
にわたっての均一な接続が可能となる。
At this time, in the molten or softened state of the low melting point material 12, the semiconductor element mounting surface 29 of the semiconductor element mounting base 19 and the bonding surface 2 of the bonding tool 18.
Since the parallel state with 8 is secured, a large number of electrodes 31 of the semiconductor element 20 mounted on the semiconductor element mounting surface 29 are provided.
And the leads 22 arranged on the film substrate 21 can be connected uniformly over the whole area.

【0035】また、さらに平行だし精度を向上させる方
法としては、半導体素子搭載面29に、半導体素子20
を搭載し、電極31とリード22との整合を行い、ボン
ディングツール18のボンディング面28をリード22
上に接触加圧した状態で、低融点材料12を冷却するこ
とによって実際の接続状況に更に近い状態での平行だし
が可能なる。
As a method for further improving the parallelization accuracy, the semiconductor element 20 is mounted on the semiconductor element mounting surface 29.
Is mounted, the electrode 31 and the lead 22 are aligned, and the bonding surface 28 of the bonding tool 18 is connected to the lead 22.
By cooling the low-melting-point material 12 in the state of being contact-pressed on the upper surface, parallel spreading in a state closer to the actual connection state is possible.

【0036】[0036]

【発明の効果】加圧伝達部と、加圧体との接続部を有
し、前記加圧体に接続した加圧工具の加工面と対向して
配置され、かつ被押圧体を載置する載置台とを有する平
行だし機構において、前記加圧伝達部と加圧体とを接続
する接続部範囲に、低融点材料保持部と、発熱部とを配
置し、前記接続部の周囲は該低融点材料保持部内の低融
点材料により充填されていることを特徴とする平行だし
機構によれば、自在継ぎ手部に、低融点材料保持部と、
発熱部とを配置し、自在継ぎ手部あるいは可動機構部を
含む範囲の低融点材料保持部内に低融点材料を充填す
る。
EFFECTS OF THE INVENTION The present invention has a pressure transmitting portion and a connecting portion for a pressure body, is arranged to face the processing surface of a pressure tool connected to the pressure body, and mounts a pressed body. In the parallel squeezing mechanism having a mounting table, a low-melting-point material holding portion and a heat generating portion are arranged in a connecting portion range that connects the pressure transmitting portion and the pressing body, and the periphery of the connecting portion has the low temperature. According to the parallel squeezing mechanism characterized by being filled with the low melting point material in the melting point material holding part, the universal joint part has the low melting point material holding part,
A heat generating portion is disposed, and the low melting point material holding portion in the range including the universal joint portion or the movable mechanism portion is filled with the low melting point material.

【0037】さらに、低融点材料保持部内の低融点材料
を発熱部の加熱により溶融状態または軟化状態にして、
加圧面と載置台とを接触させ加圧することにより、自在
継ぎ手部の倣い作用により加圧面と載置台の載置面との
平行出しを行う。
Furthermore, the low-melting-point material in the low-melting-point material holding portion is melted or softened by heating the heat-generating portion,
When the pressing surface and the mounting table are brought into contact with each other and pressed, the pressing surface and the mounting surface of the mounting table are parallelized by the copying action of the universal joint portion.

【0038】平行だし終了後に発熱部の発熱を停止する
ことで低融点材料を再び固化し自在継ぎ手部あるいは可
動機構を固定し加圧面と載置面との平行状態を維持する
ことが可能となる。
By stopping the heat generation of the heat generating portion after the completion of parallelizing, it becomes possible to solidify the low melting point material again and fix the universal joint portion or the movable mechanism to maintain the parallel state between the pressing surface and the mounting surface. .

【0039】また載置台に可動機構を付与し、該可動機
構を含む範囲に低融点材料保持部と発熱部とを配置し
て、可動機構の周囲は低融点材料保持部内の低融点材料
により充填されていることを特徴とする平行だし機構に
よれば可動部を含む範囲に低融点材料保持部と発熱部と
を配置して低融点材料保持部内に低融点材料を充填する
ことにより、低融点材料の溶融または軟化状態において
加圧面と載置台の載置面とを接触させ、さらに加圧する
ことにより可動部の倣い作用により加圧面と載置面との
平行出しを行い、平行だし終了後に発熱部の発熱を停止
することで低融点材料を再び固化して可動機構を固定し
加圧面と載置面との平行状態を維持することが可能とな
る。
Further, a movable mechanism is provided to the mounting table, a low melting point material holding portion and a heat generating portion are arranged in a range including the movable mechanism, and the periphery of the movable mechanism is filled with the low melting point material in the low melting point material holding portion. According to the parallel squeezing mechanism characterized in that the low melting point material holding portion and the heat generating portion are arranged in the range including the movable portion and the low melting point material holding portion is filled with the low melting point material, When the material is melted or softened, the pressure surface and the mounting surface of the mounting table are brought into contact with each other, and further pressure is applied to make the pressure surface and the mounting surface parallel to each other by the copying action of the movable part, and heat is generated after the parallelization is completed. By stopping the heat generation of the part, the low melting point material is solidified again, the movable mechanism is fixed, and the parallel state between the pressing surface and the mounting surface can be maintained.

【0040】上記のごとき本発明の平行だし機構によれ
ば、従来調整ネジの微妙な動きによるツールの平行だし
作業に比較して大幅に調整時間を短縮することが可能と
なり、平行だし不良に起因するボンディング不良をも回
避することが可能となる。
According to the parallel alignment mechanism of the present invention as described above, it is possible to significantly reduce the adjustment time as compared with the conventional parallel alignment work of the tool due to the subtle movement of the adjustment screw. It is possible to avoid even a defective bonding.

【0041】更に従来要求されていた平行だしのための
熟練作業をも本発明の平行だし機構により容易な作業に
変更することが可能となった。併せて加圧面と、載置台
との平行だし精度も従来に比較して大幅な精度向上を図
ることが可能となる。
Further, it becomes possible to change the skilled work required for parallel setting, which has been conventionally required, to an easy work by the parallel setting mechanism of the present invention. At the same time, it is possible to greatly improve the accuracy of parallelizing the pressing surface and the mounting table as compared with the conventional one.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の第1の実施例を説明するための構造
断面図。
FIG. 1 is a structural sectional view for explaining a first embodiment of the present invention.

【図2】 本発明の第2の実施例を説明する断面図。FIG. 2 is a sectional view illustrating a second embodiment of the present invention.

【図3】 従来の平行だし機構を説明するための斜視
図。
FIG. 3 is a perspective view for explaining a conventional parallel extension mechanism.

【符号の説明】[Explanation of symbols]

1 加圧伝達部 2 加圧体 3 球体部 4 球座部 5 自在継ぎ手機構 6 加圧工具取り付け部 7 加圧工具 8 側面部 9 低融点材料保持部 10 内壁 11 帯状発熱体 12 低融点材料 13 ネジ 14 封止体 15 加圧面 16 載置台 17 載置面 18 ボンディングツール 19 半導体素子搭載台 20 半導体素子 21 フイルム基板 22 リード 23 半導体素子搭載台保持部 24 凹球面体 25 接触部 26 凸球面体 27 棒状発熱体 28 ボンディング面 29 半導体素子搭載面 30 デバイスホール 31 電極 DESCRIPTION OF SYMBOLS 1 Pressurization transmission part 2 Pressurizing body 3 Sphere part 4 Ball seat part 5 Universal joint mechanism 6 Pressurizing tool attachment part 7 Pressurizing tool 8 Side part 9 Low melting point material holding part 10 Inner wall 11 Belt heating element 12 Low melting point material 13 Screws 14 Sealing body 15 Pressurizing surface 16 Mounting table 17 Mounting surface 18 Bonding tool 19 Semiconductor element mounting table 20 Semiconductor element 21 Film substrate 22 Lead 23 Semiconductor element mounting table holding part 24 Concave spherical body 25 Contact part 26 Convex spherical body 27 Rod-shaped heating element 28 Bonding surface 29 Semiconductor element mounting surface 30 Device hole 31 Electrode

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 加圧伝達部と、加圧体との接続部を有
し、前記加圧体に接続した加圧工具の加工面と対向して
配置され、かつ被押圧体を載置する載置台とを有する平
行だし機構において、前記加圧伝達部と加圧体とを接続
する接続部範囲に、低融点材料保持部と、発熱部とを配
置し、前記接続部の周囲は該低融点材料保持部内の低融
点材料により充填されていることを特徴とする平行だし
機構。
1. A pressure transmitting portion and a connecting portion for connecting a pressure body, which is arranged to face a processing surface of a pressure tool connected to the pressure body and on which a pressed body is placed. In the parallel squeezing mechanism having a mounting table, a low-melting-point material holding portion and a heat generating portion are arranged in a connecting portion range that connects the pressure transmitting portion and the pressing body, and the periphery of the connecting portion has the low temperature. A parallel squeezing mechanism characterized by being filled with a low melting point material in a melting point material holding portion.
【請求項2】 加圧工具の加工面と対向して配置され、
かつ被押圧体を載置する載置台を有する平行だし機構に
おいて、前記載置台に可動機構を付与し、該可動機構を
含む範囲に前記低融点材料保持部と、前記発熱部とを配
置して、前記可動機構の周囲は該低融点材料保持部内の
低融点材料により充填されていることを特徴とする平行
だし機構。
2. Arranged to face the processing surface of the pressure tool,
And, in the parallel feeding mechanism having a mounting table for mounting the pressed body, a movable mechanism is provided to the mounting table, and the low melting point material holding portion and the heat generating portion are arranged in a range including the movable mechanism. The parallel extension mechanism is characterized in that the periphery of the movable mechanism is filled with the low melting point material in the low melting point material holding portion.
JP5066832A 1993-03-25 1993-03-25 Mechanism for correcting parallelism Pending JPH06283572A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5066832A JPH06283572A (en) 1993-03-25 1993-03-25 Mechanism for correcting parallelism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5066832A JPH06283572A (en) 1993-03-25 1993-03-25 Mechanism for correcting parallelism

Publications (1)

Publication Number Publication Date
JPH06283572A true JPH06283572A (en) 1994-10-07

Family

ID=13327213

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5066832A Pending JPH06283572A (en) 1993-03-25 1993-03-25 Mechanism for correcting parallelism

Country Status (1)

Country Link
JP (1) JPH06283572A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010225721A (en) * 2009-03-23 2010-10-07 Toyota Motor Corp Wire bonding method of semiconductor element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010225721A (en) * 2009-03-23 2010-10-07 Toyota Motor Corp Wire bonding method of semiconductor element

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