JPH06279061A - Antifouling glass article having low reflectance - Google Patents

Antifouling glass article having low reflectance

Info

Publication number
JPH06279061A
JPH06279061A JP6551093A JP6551093A JPH06279061A JP H06279061 A JPH06279061 A JP H06279061A JP 6551093 A JP6551093 A JP 6551093A JP 6551093 A JP6551093 A JP 6551093A JP H06279061 A JPH06279061 A JP H06279061A
Authority
JP
Japan
Prior art keywords
layer
glass
antifouling
porous
low
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6551093A
Other languages
Japanese (ja)
Other versions
JP3387142B2 (en
Inventor
Hiroaki Tada
多田弘明
Hirotsugu Nagayama
永山裕嗣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Sheet Glass Co Ltd
Original Assignee
Nippon Sheet Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Sheet Glass Co Ltd filed Critical Nippon Sheet Glass Co Ltd
Priority to JP06551093A priority Critical patent/JP3387142B2/en
Publication of JPH06279061A publication Critical patent/JPH06279061A/en
Application granted granted Critical
Publication of JP3387142B2 publication Critical patent/JP3387142B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To obtain the subject glass article useful as CRT front glass of computers, etc., by forming an antireflecting film composed of a porous substance and an antifouling layer of a fluorosilane on the surface of a glass substrate. CONSTITUTION:A porous layer of this glass article is typically a skeletal layer prepared in treating the glass surface with an inorganic acid. This layer is obtained by immersing a silicate glass substrate in a supersaturated aqueous solution of silica in 1-4 mol hydrosilicofluoric acid per 1 at 25-50 deg.C for 1-4hr, eluting components other than silicon oxide in the surface layer of the substrate, e.g. components such as Na or K in the aqueous solution and removing the components from the surface layer. The thickness of the surface layer is preferably 10-300nm. A material for forming an antifouling layer may be a material having chemical binding properties to the porous surface and a low surface free energy. A fluorosilane-based material is preferred as an especially effective one and heptadecafluoromethyldichlorosilane, etc., are preferred. The antifouling layer is prepared by a vacuum CVD method.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は,防汚性低反射率ガラ
ス、特にパーソナルコンピューターのディスプレー例え
ばCRTの前面ガラス等に用いる防汚性低反射率ガラス
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an antifouling low reflectance glass, and more particularly to an antifouling low reflectance glass used for a display of a personal computer such as a front glass of a CRT.

【0002】[0002]

【従来の技術】近年,OA化の急速な進展にともなっ
て,長時間にわたるCRT作業による目の疲労が問題に
なっている。この問題を軽減するために,CRT前面に
反射防止ガラスが使用されている。ガラスの反射率を小
さくする方法には,(i)低屈折率膜,(ii)多層干
渉膜および(iii)多孔質膜の利用がある。
2. Description of the Related Art In recent years, with the rapid development of OA, eye fatigue caused by CRT work for a long time has become a problem. To alleviate this problem, antireflection glass is used on the front of the CRT. Methods for reducing the reflectance of glass include the use of (i) a low refractive index film, (ii) a multilayer interference film, and (iii) a porous film.

【0003】低屈折率膜による反射率の低減は,光の干
渉効果に基づいている。理論的には,被膜の光学的膜厚
がλ/4(λは波長)で,かつ,波長λにおける被膜の
屈折率(nf)とガラスの屈折率(ng)がnf=ng 1/2
の関係にある時に,波長λにおける光の反射率は0にな
る。ngは約1.5であるから,nf=1.22を有する
材料が最適である。実際には,これに近い屈折率を有す
るMgF2(nf=1.38)あるいは氷晶石(AlF3
・3NaF, nf=1.33)が用いられている。
The reduction in reflectance due to the low refractive index film is based on the effect of light interference. Theoretically, the optical thickness of the coating is λ / 4 (λ is the wavelength), and the refractive index (n f ) of the coating and the refractive index ( ng ) of the glass at the wavelength λ are n f = n g 1/2
In the relationship of, the reflectance of light at the wavelength λ becomes zero. Since n g is about 1.5, the material with n f = 1.22 is optimal. Actually, MgF 2 (n f = 1.38) or cryolite (AlF 3 ) having a refractive index close to this is used.
· 3NaF, n f = 1.33) is used.

【0004】多層干渉膜は光の多層干渉理論に基づい
て,高屈折率膜および低屈折率膜を交互に積層したもの
で,単層膜に比べて反射率を広い波長域で低減すること
が可能である。材料的には,通常,低屈折率膜としてM
gF2,SiO2(nf=1.46)が高屈折率膜として
TiO2(nf=2.3)が用いられる。
The multi-layer interference film is formed by alternately stacking high-refractive index films and low-refractive index films based on the theory of multi-layer interference of light, and can reduce the reflectance in a wider wavelength range than a single-layer film. It is possible. In terms of material, it is usually M as a low refractive index film.
gF 2 , SiO 2 (n f = 1.46) is used as the high refractive index film TiO 2 (n f = 2.3).

【0005】また多孔質層としては,ガラス表面を無機
酸で処理した時に得られるスケルトン層が代表的なもの
としてあげられる。このスケルトン層は、1リットル当
り1〜4モルの濃度の珪弗化水素酸のシリカ過飽和水溶
液に珪酸塩ガラス基材を25〜50℃で1〜4時間浸漬
することにより基材の表面層中の酸化珪素以外の成分例
えばナトリウム、カリウムなどの成分を水溶液中に溶出
させて表面層から除去することにより形成する。
A typical example of the porous layer is a skeleton layer obtained by treating the glass surface with an inorganic acid. This skeleton layer is formed by immersing a silicate glass substrate in a silica supersaturated aqueous solution of hydrosilicofluoric acid at a concentration of 1 to 4 mol per liter at 25 to 50 ° C. for 1 to 4 hours in the surface layer of the substrate. It is formed by eluting components other than silicon oxide, such as sodium and potassium, in an aqueous solution and removing them from the surface layer.

【0006】このようにして得られたスケルトン層の個
々のスケルトンの直径は数nm〜数十nmである。また
スケルトン層の厚みは、基材と珪弗化水素酸のシリカ過
飽和水溶液との接触時間を大きくすれば大となるが、1
0nm〜300nmが適当である。300nmを越える
とガラス物品の透明性が低下して好ましくない。
The diameter of each skeleton of the skeleton layer thus obtained is several nm to several tens nm. Further, the thickness of the skeleton layer increases as the contact time between the base material and the silica supersaturated aqueous solution of hydrofluoric acid increases, but
0 nm to 300 nm is suitable. When it exceeds 300 nm, the transparency of the glass article is lowered, which is not preferable.

【0007】[0007]

【発明が解決しようとする課題】前記3者の反射防止性
能を比較すると,一般に,多層干渉膜および多孔質層が
特に優れている。
Comparing the antireflection performances of the three parties, the multilayer interference film and the porous layer are generally particularly excellent.

【0008】しかしながら,多層干渉膜は膜厚制御が困
難であるばかりでなく,コストが高い。これは,多層膜
であるが故に避け難い問題である。
However, the multilayer interference film is not only difficult to control the film thickness, but also high in cost. This is an unavoidable problem because it is a multilayer film.

【0009】一方,多孔質層は1層の処理で済むことか
ら,コスト的には有利であるが,表面凹凸形状のために
汚れが付き易く,例えば前面ガラス板に人の指が触れる
と指の油脂成分がガラス表面に付着し易くしかも落ちに
くいという欠点がある。しかも,無理に汚れを落とそう
とすれば,表面が傷つき易いということも問題である。
On the other hand, since the porous layer can be processed by one layer, it is advantageous in terms of cost, but it is easy to get stains due to the uneven surface, and for example, when a human finger touches the front glass plate It has a drawback that the oil and fat component is easily attached to the glass surface and is hard to be removed. In addition, the problem is that the surface is easily scratched if the dirt is forcibly removed.

【0010】[0010]

【課題を解決するための手段】上述の様な多孔質層を有
する低反射ガラスが一般的に抱える汚れの問題点を克服
するために,本発明に係わる低反射ガラス物品は最表面
にフロロシランからなる防汚層を設けている。
SUMMARY OF THE INVENTION In order to overcome the problems of stains generally associated with a low reflection glass having a porous layer as described above, the low reflection glass article according to the present invention comprises fluorosilane on the outermost surface. The antifouling layer is provided.

【0011】防汚層を形成する材料としては,表面自由
エネルギーの低いもので,かつ,多孔質層表面との化学
結合性を有するものであれば,いかなるものでも使用す
ることができる。通常のシランカップリング剤,ポリオ
ルガノシロキサンなどもある程度の効果があり、使用す
ることが可能であるが,本発明者らは鋭意研究の結果,
中でもフロロシラン系の材料が特に有効であることを見
いだした。フロロシラン系の材料としては、片末端に少
なくとも1個の塩素を有するフロロシランなどを用いる
ことが可能であるが、ヘプタデカフルオロメチルジクロ
ロシラン、ヘプタデカフルオロトリクロロシラン等を特
に好適に使用することができる。
As a material for forming the antifouling layer, any material can be used as long as it has a low surface free energy and has a chemical bond with the surface of the porous layer. Ordinary silane coupling agents, polyorganosiloxanes, etc. have some effect and can be used, but as a result of earnest research by the inventors,
It has been found that fluorosilane-based materials are particularly effective. As the fluorosilane-based material, it is possible to use fluorosilane having at least one chlorine at one end, and the like, but heptadecafluoromethyldichlorosilane, heptadecafluorotrichlorosilane and the like can be particularly preferably used. .

【0012】防汚層の膜付け方法としては,特に限定さ
れず,公知のラビング法,ディッピング法,ゾル−ゲル
法などを用いることができるが,多孔質内部への均一な
膜形成の観点から,特に減圧CVD法が有効であること
が明らかになった。
The method for depositing the antifouling layer is not particularly limited, and a known rubbing method, dipping method, sol-gel method or the like can be used, but from the viewpoint of forming a uniform film inside the porous material. It became clear that the low pressure CVD method is particularly effective.

【0013】CVD処理時の真空度は,十分なフロロシ
ラン系の材料の蒸気圧が得られるように設定すれば良
い。従って,用いるフロロシラン系の材料の種類によっ
て異なるが,通常は10Torr程度で十分である。
The degree of vacuum during the CVD process may be set so that a sufficient vapor pressure of the fluorosilane-based material can be obtained. Therefore, about 10 Torr is usually sufficient, although it depends on the type of fluorosilane-based material used.

【0014】防汚層と基板表面との反応を促進するため
には,CVD処理時に基板を加熱することが有効であ
る。加熱温度は,基板表面物質および処理剤の種類によ
って異なるが,SiO2表面を、片末端に少なくとも1
個の塩素を有するフロロシラン系処理剤で処理する場合
には80℃程度で十分である。この反応はSi−OH基
と塩素基を有するフロロシランの脱塩酸反応である。
In order to promote the reaction between the antifouling layer and the surface of the substrate, it is effective to heat the substrate during the CVD process. The heating temperature varies depending on the substrate surface material and the type of treatment agent, but the SiO 2 surface should be at least 1 at one end.
In the case of treating with a fluorosilane-based treating agent having chlorine, about 80 ° C. is sufficient. This reaction is a dehydrochlorination reaction of fluorosilane having Si-OH groups and chlorine groups.

【0015】防汚層は、単分子膜であることが好まし
い。
The antifouling layer is preferably a monomolecular film.

【0016】[0016]

【実施例】以下,図1に示した本発明の実施例に係わる
防汚性低反射ガラスについて詳細に説明する。図1は表
面に多孔性反射防止膜を形成したソーダライムガラスに
防汚処理を施した基板の断面を模式的に示している。1
はガラス基板,2は多孔質低反射率膜,3は防汚層であ
る。防汚層3を構成するマッチ棒形状はパーフルオル基
分子を表わし、そのマッチ棒の頭部分は基材とのシロキ
サン結合分子であって多孔質低反射率膜の孔に入りこん
でいる。
EXAMPLES The antifouling low reflection glass according to the example of the present invention shown in FIG. 1 will be described in detail below. FIG. 1 schematically shows a cross section of a substrate obtained by applying antifouling treatment to soda lime glass having a porous antireflection film formed on the surface thereof. 1
Is a glass substrate, 2 is a porous low reflectance film, and 3 is an antifouling layer. The shape of the matchstick that constitutes the antifouling layer 3 represents a perfluoro group molecule, and the head portion of the matchstick is a siloxane-bonded molecule with the base material and enters the pores of the porous low reflectance film.

【0017】ソーダライムガラスの板を1.0%の弗酸
水溶液に30分間浸漬して表面の汚れを落とした後、水
洗した。次に35℃で、1リットル当り2.0モルの濃
度の珪弗化水素酸にシリカゲル粉末を飽和に達するま
で、すなわち1リットル当り20グラム溶解させ、さら
にほう酸を1リットル当り0.005モル添加してシリ
カ過飽和水溶液を調製した。この水溶液に上記ガラス基
材を100分浸漬してガラス板表面に厚みが約90nm
のスケルトン層を設けた。その後それを洗浄,乾燥させ
た。
A soda lime glass plate was immersed in a 1.0% aqueous solution of hydrofluoric acid for 30 minutes to remove surface stains, and then washed with water. Next, at 35 ° C., the silica gel powder is dissolved in hydrosilicofluoric acid at a concentration of 2.0 mol per liter until saturation is reached, that is, 20 g per liter is added, and further boric acid is added at 0.005 mol per liter. Then, a silica supersaturated aqueous solution was prepared. The glass substrate is immersed in this aqueous solution for 100 minutes to have a thickness of about 90 nm on the surface of the glass plate.
The skeleton layer of Then it was washed and dried.

【0018】約0.2gのヘキサデカフルオロデシルト
リクロロシラン(HDFDTCS)を入れたシャーレお
よび前記反射防止ガラス基板をチャンバー内にセットし
た。真空ポンプで2分間真空引きした後に,系を閉じて
80℃に加熱した。1時間反応させた後に,真空引きし
ながら99℃まで昇温し,コールドトラップで余分のH
DFDTCSを除去した。これにより図1に示すよう
な、ガラス基板、その表面上の厚み900nmの多孔質
ガラス反射防止膜被膜、およびその上のフルオロシラン
単分子膜からなる防汚性低反射率ガラスが得られた。な
お,再現性を調べるために,同じ実験を繰り返し,2つ
のサンプルを作製した。
A petri dish containing about 0.2 g of hexadecafluorodecyltrichlorosilane (HDFDTCS) and the antireflection glass substrate were set in the chamber. After evacuation with a vacuum pump for 2 minutes, the system was closed and heated to 80 ° C. After reacting for 1 hour, the temperature was raised to 99 ° C while vacuuming, and excess H
DFDTCS was removed. As a result, an antifouling low-reflectance glass consisting of a glass substrate, a 900-nm-thick porous glass antireflection film coating on the surface thereof, and a fluorosilane monomolecular film thereon was obtained as shown in FIG. In addition, in order to investigate reproducibility, the same experiment was repeated and two samples were prepared.

【0019】図2は可視光反射率スペクトルである。通
常の無処理のソーダライムガラス1(1点鎖線)では,
反射率は8〜9%であるのに対して,表面に多孔質層を
形成せず防汚層のみを形成させたガラス板2(点線)
は,反射率は著しく減少(波長500nmでは0.21
%)していることがわかる。また,多孔質層の上に更に
防汚層を形成させた防汚性低反射率ガラス3(実線)は
その反射率低減効果は十分に維持されていることが明ら
かである(波長500nmでは0.72%)。
FIG. 2 is a visible light reflectance spectrum. In normal untreated soda lime glass 1 (dashed line),
The glass plate 2 (dotted line) has a reflectance of 8 to 9%, whereas a porous layer is not formed on the surface and only an antifouling layer is formed.
Has a significantly reduced reflectance (0.21 at a wavelength of 500 nm).
%). Further, it is clear that the antifouling low reflectance glass 3 (solid line) in which an antifouling layer is further formed on the porous layer maintains the reflectance reducing effect sufficiently (0 at a wavelength of 500 nm. .72%).

【0020】次に同じ人が、表面に多孔質層を形成した
ガラス板試料および多孔質層の上に更に防汚層を形成さ
せた防汚性低反射率ガラス板試料の表面を指で軽く触っ
て同時に左右の指紋をガラス上に付けたものを観察する
と、前者試料では指紋の跡がくっきりと見えるのに対し
て、後者試料では指紋の跡がかすかに見え、防汚処理の
有無による汚れの差異は明瞭であった。これより,防汚
処理を施すことによって,明らかに指紋が付き難くなっ
ていることがわかる。
Next, the same person lightly touched the surface of the glass plate sample having the porous layer formed on the surface and the antifouling low reflectance glass plate sample having the antifouling layer formed on the porous layer with a finger. When touching and observing the left and right fingerprints on the glass at the same time, the fingerprint traces are clearly visible in the former sample, whereas the fingerprint traces are faint in the latter sample and stains due to the presence or absence of antifouling treatment. The difference was clear. From this, it can be seen that fingerprints are less likely to be attached by applying the antifouling treatment.

【0021】上記防汚処理を行う前の低反射ガラスおよ
び上記防汚処理を行った低反射率ガラスに対する水(表
面張力72.8mNm-1)およびn−ヘキサデカン(表
面張力27.3mNm-1)の接触角を測定したところ、
上記防汚処理を行う前の低反射ガラスは、水の接触角は
0度、n−ヘキサデカンのそれは0度であり、それに対
して、上記防汚処理を行った低反射率ガラスに対する水
およびn−ヘキサデカンの接触角はそれぞれ120.9
度(標準偏差1.17)および80.7度(標準偏差
3.46)であった。いずれの接触角も防汚処理を施し
たサンプルの方が著しく大きくなっていることがわか
る。この結果から,防汚処理を施すことにより,水,油
等が付着し難くなることが明らかである。従って,親水
性および親油性の汚れに対して,防汚効果が発現される
ことが理解できる。
Water (surface tension: 72.8 mNm -1 ) and n-hexadecane (surface tension: 27.3 mNm -1 ) for the low-reflection glass before the antifouling treatment and the low-reflectance glass for which the antifouling treatment has been performed. When the contact angle of was measured,
The low-reflection glass before the antifouling treatment has a contact angle of water of 0 degree and that of n-hexadecane is 0 degrees, while the water and n of the low-reflection glass subjected to the antifouling treatment have a contact angle of 0 degree. -The contact angle of hexadecane is 120.9 each.
Degrees (standard deviation 1.17) and 80.7 degrees (standard deviation 3.46). It can be seen that in all cases, the contact angle of the sample subjected to the antifouling treatment is significantly larger. From this result, it is clear that the antifouling treatment makes it difficult for water, oil, etc. to adhere. Therefore, it can be understood that the antifouling effect is exhibited against hydrophilic and lipophilic stains.

【0022】[0022]

【発明の効果】以上説明したように,本発明の防汚性低
反射率ガラスは,大きな反射防止機能を有すると同時
に,指紋などによる汚れが付着しにくく,優れた防汚機
能を有することが明らかである。
As described above, the antifouling low-reflectance glass of the present invention has a large antireflection function and, at the same time, has an excellent antifouling function because stains such as fingerprints are not easily attached. it is obvious.

【0023】従って,本発明による防汚性低反射率ガラ
スは,コンピューター等のCRT前面ガラスに好適に使
用することが可能である。
Therefore, the antifouling low reflectance glass according to the present invention can be suitably used for a CRT front glass of a computer or the like.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の防汚性低反射ガラスの構成を示す説
明図である。
FIG. 1 is an explanatory view showing a constitution of an antifouling low reflection glass of the present invention.

【図2】 本発明の防汚性低反射ガラスの可視光反射ス
ペクトルを表わす説明図である。
FIG. 2 is an explanatory diagram showing a visible light reflection spectrum of the antifouling low reflection glass of the present invention.

【符号の説明】[Explanation of symbols]

1 ガラス基板 2 反射防止(多孔質)膜 3 防汚層 1 Glass Substrate 2 Antireflection (Porous) Film 3 Antifouling Layer

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】ガラス基材(1)と、前記ガラス基材
(1)の表面に形成させた多孔質からなる反射防止膜
(2)と,該反射防止膜(2)の表面に形成させたフロ
ロシランの防汚層(3)からなることを特徴とする防汚
性低反射率ガラス。
1. A glass substrate (1), a porous antireflection film (2) formed on the surface of the glass substrate (1), and an antireflection film (2) formed on the surface of the antireflection film (2). An antifouling low reflectance glass comprising a fluorosilane antifouling layer (3).
【請求項2】前記防汚層が(3)減圧CVD法で作製さ
れるものである請求項1記載の防汚性低反射率ガラス物
品。
2. The antifouling low-reflectance glass article according to claim 1, wherein the antifouling layer is (3) produced by a low pressure CVD method.
JP06551093A 1993-03-24 1993-03-24 Anti-fouling low reflectance glass article Expired - Fee Related JP3387142B2 (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR980005166A (en) * 1996-06-05 1998-03-30 이데이 노부유키 Reflective filter for display device
US5851674A (en) * 1997-07-30 1998-12-22 Minnesota Mining And Manufacturing Company Antisoiling coatings for antireflective surfaces and methods of preparation
US6277485B1 (en) 1998-01-27 2001-08-21 3M Innovative Properties Company Antisoiling coatings for antireflective surfaces and methods of preparation
US6632872B1 (en) 2000-09-19 2003-10-14 3M Innovative Properties Company Adhesive compositions including self-assembling molecules, adhesives, articles, and methods

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR980005166A (en) * 1996-06-05 1998-03-30 이데이 노부유키 Reflective filter for display device
US5851674A (en) * 1997-07-30 1998-12-22 Minnesota Mining And Manufacturing Company Antisoiling coatings for antireflective surfaces and methods of preparation
US6277485B1 (en) 1998-01-27 2001-08-21 3M Innovative Properties Company Antisoiling coatings for antireflective surfaces and methods of preparation
US6632872B1 (en) 2000-09-19 2003-10-14 3M Innovative Properties Company Adhesive compositions including self-assembling molecules, adhesives, articles, and methods
US6743470B2 (en) 2000-09-19 2004-06-01 3M Innovative Properties Company Method of modifying a surface molecules, adhesives, articles, and methods

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