JPH0627644A - Pellicle and production of pellicle - Google Patents

Abstract

PURPOSE:To prevent the deformation of a pellicle film by a fluctuation in outdoor pressure of the pellicle to be stuck to a photomask used in the process for production of semiconductor devices, etc. CONSTITUTION:The pellicle film 1 in the outer peripheral part of the pellicle is previously reinforced and a reinforced part 8 is provided with a fine hole 7. Other methods include a method of boring a small hole in a pellicle frame 2 and sealing the hole of the pellicle frame 2 with a tape provided with the fine holes at least at one point, a method of providing the pellicle frame 2 with an aperture and sticking an airtight film provided with deflection to the above-mentioned aperture, etc. The difference between the atm. pressures in and out of the pellicle is automatically regulated and the intrusion of the foreign matter at the time of air pressure regulation, etc., is prevented. In addition, the danger of the intrusion of the foreign matter is eliminated and, therefore, the need for the inspection of the foreign matter which is heretofore carried out is eliminated and further, the operation for resticking of the pellicle which is heretofore carried out in the event of the intrusion of the foreign matter and the failure of the pellicle is eliminated.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure of a pellicle mounted on a mask and a reticle used in a photolithography process in a manufacturing process of a semiconductor device or the like.

[0002]

2. Description of the Related Art FIG. 4 shows the structure of a pellicle according to the prior art. FIG. 4A is an external view showing a state in which a pellicle according to a conventional technique is mounted on a photomask.
4B is a cross-sectional view of a portion to which the seal tape 4 of FIG. 4A is attached.

Reference numeral 1 in the drawing denotes a pellicle film, which is adhered to a pellicle frame shown by 2,
Further, an adhesive 5 is applied to the surface of the pellicle frame 2 opposite to the surface on which the pellicle film is adhered. This is called a pellicle.

The pellicle is fixed on the photomask indicated by 3 with an adhesive 5 so as to prevent foreign matter from adhering to the photomask.

However, due to the expansion and contraction of the air sandwiched between the pellicle film and the photomask due to the fluctuation of the atmospheric pressure of the outside air, the pellicle film moves up and down from the frame surface, which hinders the transfer performance, inspection, etc. Since the pellicle film may be broken, it is necessary to eliminate the pressure difference between the inside and outside of the pellicle in order to prevent the influence of atmospheric pressure fluctuation.

Therefore, in order to address the above-mentioned problems, in the conventional technique, a vent hole 6 is opened in the side surface of the pellicle frame 2 and the vent hole 6 is sealed with a seal tape 4. In addition, a method was adopted in which the pressure difference between the inside and outside of the pellicle is eliminated by peeling off the seal tape 4 when the atmospheric pressure changes.

[0007]

However, in the above-mentioned prior art, the diameter of the vent hole is limited to about 0.5 to 1.0 mm, and foreign matter is completely prevented from entering the pellicle during air pressure adjustment. It had a problem that it could not be done. Furthermore, since a person peels off the sealing tape when the atmospheric pressure changes, there is a problem that foreign matters are likely to adhere and that the atmospheric pressure change cannot be dealt with in real time.
The work was complicated.

Therefore, the present invention solves such a problem, and an object of the present invention is to provide a pellicle capable of automatically adjusting the pressure difference between the inside and outside of the pellicle without relying on human hands.

[0009]

The pellicle of the present invention is: (1) In a pellicle to be attached to a photomask used in a manufacturing process of a semiconductor device or the like, the pellicle film is prevented from being deformed due to a change in the pressure of the outside air. In order to prevent this, a small hole is made in the pellicle frame, and the hole of the pellicle frame is sealed with a tape having at least one fine hole.

(2) In a pellicle to be attached to a photomask used in a manufacturing process of a semiconductor device or the like,
In order to prevent the pellicle film from being deformed due to a change in the pressure of the outside air, the pellicle film on the outer periphery of the pellicle is reinforced in advance, and at least one fine hole is provided in the reinforced part.

(3) In a pellicle attached to a photomask used in a manufacturing process of a semiconductor device,
The pellicle frame is provided with an opening in order to prevent the pellicle film from being deformed due to a change in the pressure of the outside air, and a flexible airtight film is attached to the opening.

[0012]

Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 shows the structure of the pellicle of the present invention relating to the means (1). FIG. 1A is an external view showing a state in which the pellicle of the present invention is mounted on a photomask, and FIG. 1B is a sectional view of a portion to which the seal tape 4 of FIG. 1A is attached. is there.

The basic structure of the pellicle is the same as that of the prior art. Reference numeral 1 in the drawing is a pellicle film, and 2 is a pellicle film.
The adhesive 5 is applied to the surface of the pellicle frame 2 opposite to the surface on which the pellicle film is adhered. A vent hole 6 is formed in the side surface of the pellicle frame 2, and the vent hole 6 is closed with a seal tape 4.

As the sealing tape 4, a fine ventilation hole 7 (having a diameter of 0.2 to 1.0 .mu.m) which is preliminarily formed in one to several places is used.

The fine vent holes 7 are formed by using laser light or electric discharge, and the diameter thereof is smaller than the diameter of particles which are not desired to be attached to the photomask surface, and
It is desirable to select a diameter within a range through which air can pass, and in the case of the above embodiment, 0.2 to 1.0 μm.
The diameter was selected and processing was performed.

By bonding and fixing the above-described pellicle according to the present invention to the photomask 3 via the adhesive 5, even when the atmospheric pressure outside the pellicle changes due to atmospheric fluctuations or the like, the inside of the pellicle (pellicle film, pellicle frame) is changed. The pressure in the space surrounded by the photomask is set to be the ventilation holes 6 of the pellicle frame 2 and the fine ventilation holes 7 of the seal tape 4.
Can automatically follow the atmospheric pressure outside the pellicle.

Next, FIG. 2 shows the structure of the pellicle of the present invention relating to the means (2). FIG. 2A is an external view showing a state in which the pellicle of the present invention is mounted on a photomask, and FIG. 2B is a cross-sectional view of a portion to which the pellicle film reinforcement 8 of FIG. 2A is applied. is there.

Reference numeral 1 in the drawing denotes a pellicle film, which is adhered to a pellicle frame shown by 2,
Further, an adhesive 5 is applied to the surface of the pellicle frame 2 opposite to the surface on which the pellicle film is adhered.

Here, a pellicle membrane reinforcement 8 is provided on the outer peripheral portion of the pellicle membrane 1, and a fine ventilation hole 7 is formed in the pellicle membrane reinforcement portion 8. The manufacturing process is as follows. It is something.

After the pellicle film material such as nitrocellulose is spin-coated on the glass substrate, the pellicle film material is additionally applied to the portion corresponding to the outer periphery of the pellicle while the glass substrate is stationary, and the pellicle film is thickened. The reinforcing portion 8 is formed. Subsequently, after the pellicle film is peeled off by the frame for peeling the pellicle film, the fine ventilation holes 7 are opened in the pellicle film reinforcing portion 8. The pellicle of the present invention is completed by adhering the pellicle film thus produced to the pellicle frame and cutting the pellicle film according to the pellicle frame. In this way, by opening fine ventilation holes in the pellicle film before adhering the pellicle film to the pellicle frame, damage to the pellicle during processing can be prevented and workability can be improved.

The film thickness of the pellicle film reinforcing portion is preferably 10 to several tens of μm, and the fine ventilation holes 7 are formed by using laser light or discharge, and the diameter thereof is on the surface of the photomask. It is desirable to select a diameter that is smaller than the diameter of the particles that are not desired to be adhered and that allows air to pass through.
The diameter of 1.0 μm was selected and processed.

By bonding and fixing the above-described pellicle according to the present invention to the photomask 3 via the adhesive 5, even when the atmospheric pressure outside the pellicle changes due to atmospheric fluctuations or the like, the inside of the pellicle (pellicle film, pellicle frame) is changed. The pressure in the space surrounded by the photomask) can automatically follow the atmospheric pressure outside the pellicle through the fine ventilation holes 7 in the pellicle film 1.

Further, unlike the prior art, it is not necessary to form a vent hole in the side surface of the pellicle frame 2, and therefore it is advantageous over the prior art in terms of workability and quality of foreign matters.

Next, FIG. 3 shows the structure of the pellicle of the present invention relating to the means (3). FIG. 3A is an external view showing a state in which the pellicle of the present invention is mounted on a photomask, and FIG. 3B is a cross section of a portion to which the deformable hermetic film 10 of FIG. 3A is attached. It is a figure.

Reference numeral 1 in the drawing denotes a pellicle film, which is adhered to a pellicle frame shown by 2,
Further, an adhesive 5 is applied to the surface of the pellicle frame 2 opposite to the surface on which the pellicle film is adhered. Further, an opening 9 is opened on the side surface of the pellicle frame 2, and the opening 9 is closed by a flexible airtight film 10 having a bend.

When the above-described pellicle according to the present invention is adhered and fixed to the photomask 3 via the adhesive 5, the deformation of the pellicle film can be automatically prevented by the following actions.

When the atmospheric pressure outside the pellicle becomes high due to atmospheric fluctuations or the like, the variable airtight film 10 is recessed toward the inside of the pellicle, and the volume inside the pellicle decreases, so that the pressure inside and outside the pellicle becomes equilibrium. It is kept to prevent the pellicle film 1 from being depressed. On the contrary, when the atmospheric pressure outside the pellicle becomes low, the variable airtight film 10 bulges toward the outside of the pellicle and prevents the pellicle film 1 from bulging.

In a commonly used pellicle for a 5-inch reticle, an opening ratio of about 30 to 40% with respect to the area of the side surface of the pellicle frame and a deflection amount of the variable airtight film of about 2 to 4 mm are set to 5 It was possible to cope with pressure fluctuations outside the pellicle of about%.

[0030]

As described above, according to the pellicle of the present invention, (1) a small hole is made in the pellicle frame, and the hole of the pellicle frame is sealed with tape having at least one fine hole (2). Reinforce the pellicle film around the pellicle in advance,
At least one fine hole is provided in the reinforcing portion. (3) Fluctuations in atmospheric pressure outside the pellicle due to a simple structure in which an opening is provided in the pellicle frame and a flexible airtight film is attached to the opening. This has the effects of automatically preventing the deformation of the pellicle film due to the above, and preventing foreign matter from being mixed in when the pressure inside and outside the pellicle is adjusted.

Further, since there is no danger of foreign matter entering,
Since the foreign substance inspection that was conventionally performed is no longer necessary, and the pellicle reattachment work that was performed when foreign substances are mixed or when the pellicle is damaged is no longer required, thus increasing the speed of manufacturing semiconductor devices.

[Brief description of drawings]

FIG. 1 is an outline view of a pellicle according to method 1 of the present invention.

FIG. 2 is an outline view of a pellicle according to method 2 of the present invention.

FIG. 3 is an outline view of a pellicle according to method 3 of the present invention.

FIG. 4 is an external view of a pellicle according to a conventional method.

[Explanation of symbols]

 1 Pellicle Membrane 2 Pellicle Frame 3 Photomask 4 Sealing Tape 5 Adhesive 6 Vent 7 Micro Vent 8 Pellicle Membrane Reinforcement 9 Opening 10 Variable Airtight Membrane

Claims (4)

[Claims] 1. In a pellicle attached to a photomask used in a manufacturing process of a semiconductor device or the like, a small hole is formed in a pellicle frame to prevent the pellicle film from being deformed due to a change in the pressure of the outside air, and a finer hole is formed. A pellicle having a structure in which the hole of the pellicle frame is sealed by a tape provided with at least one portion. 2. In a pellicle to be attached to a photomask used in a manufacturing process of a semiconductor device or the like, in order to prevent the pellicle film from being deformed due to the fluctuation of the pressure of the outside air, the pellicle film on the outer periphery of the pellicle is reinforced in advance. A pellicle characterized by being provided with at least one fine hole in the reinforcing portion. 3. A step of spin-coating a pellicle film material on a substrate to form a pellicle film, a step of peeling the pellicle film using a frame for peeling, and the pellicle film peeled by the frame on a pellicle frame. In a method of manufacturing a pellicle having a step of adhering and cutting the pellicle in accordance with the pellicle frame, a step of spin-coating a pellicle film material on a substrate to form a pellicle film is followed by resting the pellicle film material on an outer peripheral portion of the pellicle. And a step of forming fine holes in a portion of the outer periphery of the pellicle where the pellicle film material is statically applied after the step of peeling the pellicle film using a frame for peeling. The method for manufacturing a pellicle according to claim 2, wherein the pellicle is manufactured. 4. In a pellicle attached to a photomask used in a manufacturing process of a semiconductor device or the like, an opening is provided in the pellicle frame to prevent the pellicle film from being deformed due to a change in pressure of the outside air. A pellicle characterized by having a structure in which an airtight membrane having a flexure is attached to the part.