JPH06251739A - Electrostatic lens - Google Patents

Electrostatic lens

Info

Publication number
JPH06251739A
JPH06251739A JP3320793A JP3320793A JPH06251739A JP H06251739 A JPH06251739 A JP H06251739A JP 3320793 A JP3320793 A JP 3320793A JP 3320793 A JP3320793 A JP 3320793A JP H06251739 A JPH06251739 A JP H06251739A
Authority
JP
Japan
Prior art keywords
electrode
high voltage
electrostatic lens
voltage
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP3320793A
Other languages
Japanese (ja)
Inventor
Yasushi Kokubo
靖 小久保
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP3320793A priority Critical patent/JPH06251739A/en
Publication of JPH06251739A publication Critical patent/JPH06251739A/en
Withdrawn legal-status Critical Current

Links

Abstract

PURPOSE:To provide an electrostatic lens which can be controlled at high speed in the electrostatic lens upon which high voltage is impressed. CONSTITUTION:An electrostatic lens is formed in a three-pole structure of a central electrode 30 and outside electrodes 31 and 32. The outside electrodes 31 and 32 are connected electrically to each other, and high voltage is impressed upon the central electrode 30 from a high voltage circuit 33, and high voltage is impressed upon the outside electrodes 31 and 32 from a high voltage circuit 34. When strength of the electrostatic lens is changed minutely, voltage impressed upon the outside electrodes 31 and 32 from the high voltage circuit 34 is changed within a range of several kVs from several hundred Vs. Since an electric potential difference between the central electrode 30 and the outside electrodes 31 and 32 changes microscopically according to this voltage change, an ion beam focusing degree can be changed microscopically.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、イオン顕微鏡などの集
束イオンビーム装置に用いて最適な静電レンズに関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrostatic lens most suitable for a focused ion beam device such as an ion microscope.

【0002】[0002]

【従来の技術】図1は一般的なイオン顕微鏡を示してお
り、1はイオンエミッター、2は引き出し電極であり、
エミッター1と電極2との間には高圧回路3より高電圧
が印加される。引き出し電極2から発生したイオンビー
ムIBは、コンデンサレンズ4,対物レンズ5によって
試料6上に細く集束される。コンデンサレンズ4,対物
レンズ5は、アインツェル型の静電レンズであり、それ
ぞれ中心電極7,8と接地電位の外側電極9,10とを
有している。中心電極7には高圧回路11から高電圧が
印加され、中心電極8には高圧回路12から高電圧が印
加される。なお、イオン顕微鏡のレンズは、その集束す
る対象がイオンであり、その質量が電子の2000倍以
上もあるために、磁石を利用した電磁レンズを使用する
ことができない。そのため、このような静電レンズを用
いている。
2. Description of the Related Art FIG. 1 shows a general ion microscope, 1 is an ion emitter, 2 is an extraction electrode,
A high voltage is applied from the high voltage circuit 3 between the emitter 1 and the electrode 2. The ion beam IB generated from the extraction electrode 2 is finely focused on the sample 6 by the condenser lens 4 and the objective lens 5. The condenser lens 4 and the objective lens 5 are Einzel-type electrostatic lenses, and have center electrodes 7 and 8 and outer electrodes 9 and 10 at ground potential, respectively. A high voltage is applied to the center electrode 7 from the high voltage circuit 11, and a high voltage is applied to the center electrode 8 from the high voltage circuit 12. It should be noted that the lens of the ion microscope cannot focus on an electromagnetic lens using a magnet because the object to be focused is an ion and its mass is 2000 times or more that of an electron. Therefore, such an electrostatic lens is used.

【0003】13はアライメント電極であり、アライメ
ント回路14からアライメント用の電圧が印加され、イ
オンビームIBの軸合わせを行なう。15は偏向電極で
あり、走査回路16から試料6上でイオンビームを走査
するための走査信号が供給される。17は非点補正電極
であり、非点補正回路18から非点補正電圧が印加され
る。上記した各回路3,11,12,14,16,18
は、CPU19からインターフェース20,21,2
2,23,24,25を介して制御される。このような
構成の動作を次に説明する。
Reference numeral 13 is an alignment electrode, to which an alignment voltage is applied from the alignment circuit 14 to align the axis of the ion beam IB. Reference numeral 15 is a deflection electrode, to which a scanning signal for scanning the ion beam on the sample 6 is supplied from the scanning circuit 16. Reference numeral 17 denotes an astigmatism correction electrode, to which an astigmatism correction voltage is applied from the astigmatism correction circuit 18. Each circuit 3, 11, 12, 14, 16, 18 described above
From the CPU 19 to the interfaces 20, 21, 2
Controlled via 2, 23, 24, 25. The operation of such a configuration will be described below.

【0004】イオンビームIBは引き出し電極2から引
き出され、コンデンサレンズ4と対物レンズ5によって
試料6上に細く集束される。試料6上のイオンビームの
照射位置は、偏向電極15に走査回路16から走査信号
を供給することによって走査される。試料6へのイオン
ビームの照射に基づいて発生した2次電子や2次イオン
は、図示していない検出器によって検出される。この検
出信号はフレームメモリー26に記憶される。このフレ
ームメモリー26に記憶された信号は適宜読み出され、
陰極線管などの表示装置に供給されて試料の走査像が表
示される。
The ion beam IB is extracted from the extraction electrode 2 and finely focused on the sample 6 by the condenser lens 4 and the objective lens 5. The irradiation position of the ion beam on the sample 6 is scanned by supplying a scanning signal from the scanning circuit 16 to the deflection electrode 15. Secondary electrons and secondary ions generated based on the irradiation of the sample 6 with the ion beam are detected by a detector (not shown). This detection signal is stored in the frame memory 26. The signal stored in the frame memory 26 is read out as appropriate,
It is supplied to a display device such as a cathode ray tube to display a scan image of the sample.

【0005】なお、試料6に照射されるイオンビームの
軸合わせはアライメント電極13にアライメント回路1
4から必要な電圧を印加することによって行われ、ま
た、イオンビームの非点の補正は、非点補正電極17に
非点補正回路18から補正電圧を印加することによって
行われる。
The axis of the ion beam with which the sample 6 is irradiated is aligned with the alignment electrode 13 by the alignment circuit 1.
4 is applied by applying a necessary voltage, and the astigmatism of the ion beam is corrected by applying a correction voltage from the astigmatism correction circuit 18 to the astigmatism correction electrode 17.

【0006】[0006]

【発明が解決しようとする課題】上記した装置におい
て、イオンビームIBの加速電圧を高くするにつれ、静
電レンズ4,5の中心電極7,8に印加する電圧は高電
圧となる。この電圧は通常10kV〜100kV程度と
なる。しかしながら、印加する電圧が高電圧になるほど
電圧を印加する電気回路や電圧供給ケーブルの容量によ
り、回路の周波数特性が悪くなり、高速でのイオンビー
ムの制御が困難となる。
In the above apparatus, the voltage applied to the central electrodes 7, 8 of the electrostatic lenses 4, 5 becomes higher as the acceleration voltage of the ion beam IB is increased. This voltage is usually about 10 kV to 100 kV. However, as the applied voltage becomes higher, the frequency characteristics of the circuit deteriorate due to the capacity of the electric circuit and the voltage supply cable that apply the voltage, and it becomes difficult to control the ion beam at high speed.

【0007】例えば、100kV程度の高電圧電源で
は、電圧を変化させようとしてもそのレスポンスは20
0msec〜500msec程度である。一方、通常の走査電子
顕微鏡で使用される電磁レンズのレスポンスはコア付き
コイルを用いた場合は数msecであり、また、空芯コイル
を用いた場合は数μsec オーダーとなって極めて速い制
御が可能である。そのため、上記装置では、通常の走査
電子顕微鏡で行われているような、イオンビームの自動
焦点合わせ動作や、傾斜した試料の全視野をジャストフ
ォーカスで観察するダイナミックフォーカス動作や、鏡
筒の電圧軸合わせなどを高速で行うことが非常に困難と
なる。
For example, in a high voltage power supply of about 100 kV, the response is 20 even if the voltage is changed.
It is about 0 msec to 500 msec. On the other hand, the response of the electromagnetic lens used in a normal scanning electron microscope is a few msec when a coil with a core is used, and on the order of a few μsec when an air-core coil is used, enabling extremely fast control. Is. Therefore, in the above device, the automatic focusing operation of the ion beam, the dynamic focus operation of observing the entire field of view of the tilted sample with just focus, and the voltage axis of the lens barrel, which are performed in a normal scanning electron microscope, are performed. It becomes very difficult to perform matching at high speed.

【0008】別の方法として、上記した静電レンズを主
のレンズとして、主レンズに接近して補助の静電レンズ
を配置し、この補助静電レンズのレンズ強度を変化さ
せ、イオンビームの焦点合わせなどを行わせることも考
えられる。しかしながら、主静電レンズと補助静電レン
ズを用いると、両レンズ間の軸ずれが問題となり、実際
の使用に耐えられない。
As another method, the above electrostatic lens is used as a main lens, an auxiliary electrostatic lens is arranged close to the main lens, the lens strength of the auxiliary electrostatic lens is changed, and the focus of the ion beam is changed. It is also possible to make adjustments. However, when the main electrostatic lens and the auxiliary electrostatic lens are used, the axial misalignment between the two lenses poses a problem and cannot be put to practical use.

【0009】本発明は、このような点に鑑みてなされた
もので、その目的は、高電圧を印加するようにした静電
レンズにおいて、高速でのレンズの制御を可能とする静
電レンズを実現するにある。
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide an electrostatic lens capable of controlling the lens at high speed in an electrostatic lens to which a high voltage is applied. It will be realized.

【0010】[0010]

【課題を解決するための手段】本発明に基づく静電レン
ズは、比較的高い電圧が印加される第1の電極と、第1
の電極と一体となって静電レンズ作用を行なうための第
1の電極より低い電圧が印加される第2の電極とを備え
ており、第2の電極に印加する電圧を制御することによ
り、静電レンズ強度を変えるように構成したことを特徴
としている。
The electrostatic lens according to the present invention comprises a first electrode to which a relatively high voltage is applied, and a first electrode.
A second electrode to which a voltage lower than that of the first electrode for performing the electrostatic lens action integrally with the electrode is applied, and by controlling the voltage applied to the second electrode, It is characterized in that the electrostatic lens strength is changed.

【0011】[0011]

【作用】本発明に基づく静電レンズは、静電レンズ作用
を行なうための2枚の電極のうち一方に比較的高い電圧
を印加し、他方の電極に低い電圧を印加し、他方の電極
の印加電圧を制御することによって静電レンズ強度を変
化させる。
In the electrostatic lens according to the present invention, a relatively high voltage is applied to one of the two electrodes for performing the electrostatic lens action, a low voltage is applied to the other electrode, and the other electrode is applied. The electrostatic lens strength is changed by controlling the applied voltage.

【0012】[0012]

【実施例】以下、図面を参照して本発明の一実施例を詳
細に説明する。図2は本発明に基づく静電レンズの一実
施例を示しており、この静電レンズは中心電極30と外
側電極31.32の3極構造となっている。各電極は円
盤状に形成されており、それぞれ中心部分にはイオンビ
ーム通過開口が穿たれている。外側電極31,32は電
気的に接続されており、中心電極30には高圧回路33
から高電圧が印加され、外側電極31,32には高圧回
路34から高電圧が印加される。このような構造の動作
を次に説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail below with reference to the drawings. FIG. 2 shows an embodiment of an electrostatic lens according to the present invention, which has a three-pole structure of a center electrode 30 and an outer electrode 31.32. Each electrode is formed in a disk shape, and an ion beam passage opening is formed in the center of each electrode. The outer electrodes 31 and 32 are electrically connected, and the high voltage circuit 33 is connected to the center electrode 30.
From the high voltage circuit 34 is applied to the outer electrodes 31 and 32. The operation of such a structure will be described below.

【0013】中心電極30には高圧回路33から例えば
50kV程度の高電圧が印加され、従来は接地電位とさ
れていた外側電極31,32には、高圧回路34から、
例えば1kV程度の比較的低い高電圧が印加される。こ
の静電レンズは、中心電極30と外側電極31,32と
の間の電位差に応じた静電レンズ作用を行ない、各電極
の中心開口を通過するイオンビームIBを集束する。
A high voltage of, for example, about 50 kV is applied to the center electrode 30 from the high voltage circuit 33, and the outer electrodes 31 and 32, which are conventionally at the ground potential, are fed from the high voltage circuit 34.
For example, a relatively low high voltage of about 1 kV is applied. This electrostatic lens acts as an electrostatic lens according to the potential difference between the center electrode 30 and the outer electrodes 31 and 32, and focuses the ion beam IB passing through the center aperture of each electrode.

【0014】ここで、静電レンズ強度を細かく変化させ
る場合、高圧回路34から外側電極31,32に印加す
る電圧を数百Vから数kVの範囲で変化させる。この電
圧変化に応じて、中心電極30と外側電極31,32と
の間の電位差は微小に変化し、イオンビームの集束の程
度を微小に変化させることができる。この高圧回路34
は、1kV前後の電圧を発生させるもので、電圧を供給
するケーブルの耐圧や回路設計が容易となるばかりでな
く、その周波数特性も数msecのオーダーとすることがで
きる。その結果、この外側電極31,32に印加する電
圧を変化させることにより、イオンビームの自動焦点合
わせ動作や、傾斜した試料の全視野をジャストフォーカ
スで観察するダイナミックフォーカス動作や、鏡筒の電
圧軸合わせなどを高速で行うことが可能となる。
Here, when the electrostatic lens strength is finely changed, the voltage applied from the high voltage circuit 34 to the outer electrodes 31 and 32 is changed within the range of several hundreds of volts to several kV. In accordance with this voltage change, the potential difference between the center electrode 30 and the outer electrodes 31, 32 changes minutely, and the degree of ion beam focusing can be changed minutely. This high voltage circuit 34
Generates a voltage of about 1 kV, which not only facilitates the withstand voltage of the cable that supplies the voltage and circuit design, but also makes its frequency characteristic on the order of several msec. As a result, by changing the voltage applied to the outer electrodes 31 and 32, the automatic focusing operation of the ion beam, the dynamic focusing operation of observing the entire field of view of the tilted sample by just focus, the voltage axis of the lens barrel, and the like. It becomes possible to perform the matching and the like at high speed.

【0015】図3は本発明の他の実施例を示しており、
この実施例では、中心電極30に高圧回路34から50
kV程度の高電圧を印加し、外側電極31,32の一方
の電極31を接地電位とし、他方の電極32に高圧回路
34から1kV前後の電圧を印加するように構成してい
る。このような構成でも高圧回路34から外側電極32
に印加される電圧を微小変化させることにより、高速に
静電レンズ強度を変化させることができる。なお、外側
電極32を接地電位とし、外側電極31に高圧回路34
から制御電圧を印加するように構成しても良い。
FIG. 3 shows another embodiment of the present invention,
In this embodiment, the high voltage circuits 34 to 50 are connected to the center electrode 30.
A high voltage of about kV is applied, one electrode 31 of the outer electrodes 31, 32 is set to the ground potential, and a voltage of about 1 kV is applied to the other electrode 32 from the high voltage circuit 34. Even in such a configuration, the high voltage circuit 34 is connected to the outer electrode 32.
The electrostatic lens strength can be changed at high speed by minutely changing the voltage applied to. The outer electrode 32 is set to the ground potential, and the high voltage circuit 34 is connected to the outer electrode 31.
The control voltage may be applied from the above.

【0016】以上本発明の実施例を詳述したが、本発明
はこの実施例に限定されない。例えば、3枚電極構成の
静電レンズを例に説明したが、2枚電極構成の静電レン
ズで、一方の電極に比較的高い電圧を印加し、他方の電
極に比較的低い制御電圧を印加するようにしても良い。
Although the embodiment of the present invention has been described in detail above, the present invention is not limited to this embodiment. For example, although the electrostatic lens having a three-electrode configuration has been described as an example, in the electrostatic lens having a two-electrode configuration, a relatively high voltage is applied to one electrode and a relatively low control voltage is applied to the other electrode. It may be done.

【0017】[0017]

【発明の効果】以上説明したように、本発明に基づく静
電レンズは、静電レンズ作用を行なうための2枚の電極
のうち一方に比較的高い電圧を印加し、他方の電極に低
い電圧を印加し、他方の電極の印加電圧を制御すること
によって静電レンズ強度を変化させるように構成したの
で、高電圧を印加するようにした静電レンズにおいて、
高速でのレンズの制御が可能となる。その結果、イオン
ビームの自動焦点合わせ動作や、傾斜した試料の全視野
をジャストフォーカスで観察するダイナミックフォーカ
ス動作や、鏡筒の電圧軸合わせなどを高速で行うことが
可能となる。
As described above, in the electrostatic lens according to the present invention, a relatively high voltage is applied to one of the two electrodes for performing the electrostatic lens action, and a low voltage is applied to the other electrode. Is applied, and the electrostatic lens strength is changed by controlling the voltage applied to the other electrode. Therefore, in the electrostatic lens to which a high voltage is applied,
It is possible to control the lens at high speed. As a result, the automatic focusing operation of the ion beam, the dynamic focusing operation of observing the entire field of view of the tilted sample with just focus, and the voltage axis alignment of the lens barrel can be performed at high speed.

【図面の簡単な説明】[Brief description of drawings]

【図1】従来のイオンビーム装置を示す図である。FIG. 1 is a diagram showing a conventional ion beam device.

【図2】本発明の一実施例を示す図である。FIG. 2 is a diagram showing an embodiment of the present invention.

【図3】本発明の他の実施例を示す図である。FIG. 3 is a diagram showing another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

30 中心電極 31,32 外側電極 33,34 高圧回路 30 center electrode 31,32 outer electrode 33,34 high voltage circuit

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 比較的高い電圧が印加される第1の電極
と、第1の電極と一体となって静電レンズ作用を行なう
ための第1の電極より低い電圧が印加される第2の電極
とを備えており、第2の電極に印加する電圧を制御する
ことにより、静電レンズ強度を変えるように構成した静
電レンズ。
1. A first electrode to which a relatively high voltage is applied, and a second voltage to which a voltage lower than that of the first electrode for performing an electrostatic lens action integrally with the first electrode is applied. An electrostatic lens comprising an electrode and configured to change the electrostatic lens strength by controlling the voltage applied to the second electrode.
JP3320793A 1993-02-23 1993-02-23 Electrostatic lens Withdrawn JPH06251739A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3320793A JPH06251739A (en) 1993-02-23 1993-02-23 Electrostatic lens

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3320793A JPH06251739A (en) 1993-02-23 1993-02-23 Electrostatic lens

Publications (1)

Publication Number Publication Date
JPH06251739A true JPH06251739A (en) 1994-09-09

Family

ID=12380023

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3320793A Withdrawn JPH06251739A (en) 1993-02-23 1993-02-23 Electrostatic lens

Country Status (1)

Country Link
JP (1) JPH06251739A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3829854A1 (en) * 1988-09-02 1990-03-15 Bayerische Motoren Werke Ag Light alloy, especially die-cast engine housing for liquid-cooled internal combustion engines
JP2006210456A (en) * 2005-01-26 2006-08-10 Canon Inc Electrostatic lens apparatus, method of regulating it and electrically-charged particle beam exposure device using the electrostatic lens apparatus
WO2012153987A2 (en) * 2011-05-11 2012-11-15 한국표준과학연구원 High-precision vacuum electrostatic lens for vacuum

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3829854A1 (en) * 1988-09-02 1990-03-15 Bayerische Motoren Werke Ag Light alloy, especially die-cast engine housing for liquid-cooled internal combustion engines
JP2006210456A (en) * 2005-01-26 2006-08-10 Canon Inc Electrostatic lens apparatus, method of regulating it and electrically-charged particle beam exposure device using the electrostatic lens apparatus
WO2012153987A2 (en) * 2011-05-11 2012-11-15 한국표준과학연구원 High-precision vacuum electrostatic lens for vacuum
KR101219194B1 (en) * 2011-05-11 2013-01-09 한국표준과학연구원 High-precision vacuum electrostatic lens
WO2012153987A3 (en) * 2011-05-11 2013-02-14 한국표준과학연구원 High-precision vacuum electrostatic lens for vacuum

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