JPH0622981Y2 - プラズマ発生装置 - Google Patents
プラズマ発生装置Info
- Publication number
- JPH0622981Y2 JPH0622981Y2 JP1985091515U JP9151585U JPH0622981Y2 JP H0622981 Y2 JPH0622981 Y2 JP H0622981Y2 JP 1985091515 U JP1985091515 U JP 1985091515U JP 9151585 U JP9151585 U JP 9151585U JP H0622981 Y2 JPH0622981 Y2 JP H0622981Y2
- Authority
- JP
- Japan
- Prior art keywords
- plasma generator
- waveguide
- microwave
- short
- circuit plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010453 quartz Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000012141 concentrate Substances 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985091515U JPH0622981Y2 (ja) | 1985-06-19 | 1985-06-19 | プラズマ発生装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985091515U JPH0622981Y2 (ja) | 1985-06-19 | 1985-06-19 | プラズマ発生装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS622244U JPS622244U (enrdf_load_stackoverflow) | 1987-01-08 |
| JPH0622981Y2 true JPH0622981Y2 (ja) | 1994-06-15 |
Family
ID=30647474
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985091515U Expired - Lifetime JPH0622981Y2 (ja) | 1985-06-19 | 1985-06-19 | プラズマ発生装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0622981Y2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6404111B2 (ja) * | 2014-12-18 | 2018-10-10 | 東京エレクトロン株式会社 | プラズマ処理装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56147438A (en) * | 1980-04-16 | 1981-11-16 | Fujitsu Ltd | Microplasma treatment apparatus |
-
1985
- 1985-06-19 JP JP1985091515U patent/JPH0622981Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS622244U (enrdf_load_stackoverflow) | 1987-01-08 |
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