JPH062213B2 - Halogen-based waste gas dry treatment agent - Google Patents
Halogen-based waste gas dry treatment agentInfo
- Publication number
- JPH062213B2 JPH062213B2 JP2286561A JP28656190A JPH062213B2 JP H062213 B2 JPH062213 B2 JP H062213B2 JP 2286561 A JP2286561 A JP 2286561A JP 28656190 A JP28656190 A JP 28656190A JP H062213 B2 JPH062213 B2 JP H062213B2
- Authority
- JP
- Japan
- Prior art keywords
- waste gas
- halogen
- gas
- treatment agent
- treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Treating Waste Gases (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Description
【発明の詳細な説明】 ≪産業上の利用分野≫ 本発明は、塩化ホウ素、フッ化水素などのハロゲン系の
有害ガスを含有する廃ガスの除害をするための処理剤に
関し、これらの有害ガスを長期間高い効率で除害できる
ものを提供するものである。DETAILED DESCRIPTION OF THE INVENTION << Industrial Application Field >> The present invention relates to a treatment agent for removing waste gas containing a halogen-based harmful gas such as boron chloride and hydrogen fluoride, and a harmful agent for treating the harmful gas. It is intended to provide a gas that can remove gas with high efficiency for a long period of time.
≪従来技術≫ 上記ハロゲン系廃ガスの代表例としては、半導体製造過
程での廃ガスがあるが、この半導体廃ガスの除害剤とし
て、従来、活性炭に炭酸ナトリウムを含浸させたものや
水酸化カルシウム粒に酸化銅を担持させたものが知られ
ている。«Prior Art» A typical example of the above halogen-based waste gas is waste gas in the semiconductor manufacturing process. Conventionally, as a harmful agent for this semiconductor waste gas, activated carbon impregnated with sodium carbonate or hydroxide is conventionally used. It is known that calcium particles carry copper oxide.
また、酸化第１鉄（FeO）と活性炭とを層状に配置した
もの（特開昭６３−１３７７３６号）や、ソーダライム
と活性炭とを層状に配置したもの（特開昭６２−１２１
６２１号）で半導体廃ガス中のハロゲン系ガスを除去す
るものも提案されている。Further, ferrous oxide (FeO) and activated carbon are arranged in layers (JP-A-63-137736), and soda lime and activated carbon are arranged in layers (JP-A-62-121).
No. 621), a method of removing a halogen-based gas in a semiconductor waste gas is also proposed.
≪解決しようとする課題≫ ところが、従来の活性炭に炭酸ナトリウムを含浸させた
処理剤や水酸化カルシウム粒に酸化銅を担持させた処理
剤は処理できるハロゲンガスに選択性があり、十分な処
理能力を発揮することが難しい問題があった。<Problems to be solved> However, conventional treatment agents in which activated carbon is impregnated with sodium carbonate and treatment agents in which calcium oxide particles carry copper oxide have sufficient selectivity for halogen gas that can be treated. There was a problem that was difficult to exert.
また、酸化鉄と活性炭を層状に配置したものや活性炭と
ソーダライムとを層状に配置したものでは、活性炭の吸
着量で処理量が決定してしまい、処理能力が小さいとい
う問題があった。Further, in the case where iron oxide and activated carbon are arranged in layers and the case where activated carbon and soda lime are arranged in layers, the treatment amount is determined by the adsorption amount of activated carbon, and there is a problem that the treatment capacity is small.
本発明は、このような点に着目してなされたもので、フ
ッ素系、塩素系のガスを同時に除去することのできるハ
ロゲン系廃ガスの処理剤を提供することを目的とする。The present invention has been made in view of such a point, and an object thereof is to provide a treatment agent for halogen-based waste gas capable of simultaneously removing fluorine-based gas and chlorine-based gas.
≪課題を解決するための手段≫ 上述の目的を達成するために本発明は、ハロゲン系廃ガ
スと処理剤とを接触させて当該廃ガスから有害成分を除
去する廃ガスの処理方法において、処理塔に充填する処
理剤として、ソーダライムの表面に四三酸化鉄を付着さ
せたものを用いることを特徴としている。<< Means for Solving the Problems >> In order to achieve the above-mentioned object, the present invention provides a method for treating a waste gas, which comprises contacting a halogen-based waste gas with a treatment agent to remove harmful components from the waste gas. The treatment agent to be packed in the tower is characterized by using soda lime with iron oxide black oxide deposited on its surface.
≪作 用≫ 本発明では、処理塔に充填する処理剤として、ソーダラ
イムの表面に四三酸化鉄を付着させたものを用いるよう
にしているので、処理剤と処理ガスとが化学反応して、
廃ガス中の有害ガスを完全に無害化することができるう
え、化学反応で処理することから物理吸着のような脱着
のおそれがなく、処理剤交換時での安全性も増すことに
なる。<< Operation >> In the present invention, as the treatment agent to be filled in the treatment tower, soda lime oxide on the surface of which is used, so that the treatment agent and the treatment gas chemically react with each other. ,
The harmful gas in the waste gas can be completely rendered harmless, and since it is treated by a chemical reaction, there is no fear of desorption such as physical adsorption, and the safety at the time of exchanging the treatment agent is increased.
≪実 施 例≫ 図面はハロゲン系廃ガス処理装置の実験設備を示し、図
中符号（１）は半導体製造設備から排出されるハロゲン
系廃棄ガスにかわる標準ガスを収容した被処理ガスシリ
ンダ、（２）は希釈用窒素ガスを収容した希釈ガスシリ
ンダ、（３）は被処理ガスを導出する被処理ガス通路、
（４）はリアクター（処理塔）であり、処理塔（４）内
に処理剤（５）と検知剤（６）とが収容してある。≪Practical example≫ The drawing shows the experimental equipment of the halogen-based waste gas treatment equipment, and the reference numeral (1) in the figure is the treated gas cylinder containing the standard gas in place of the halogen-based waste gas discharged from the semiconductor manufacturing equipment, ( 2) is a dilution gas cylinder containing a nitrogen gas for dilution, (3) is a processed gas passage for leading out a processed gas,
Reference numeral (4) is a reactor (treatment tower), and the treatment agent (5) and the detection agent (6) are contained in the treatment tower (4).
処理塔（４）に収容される処理剤（５）は、生石灰を水
酸化ナトリウムの濃厚溶液に浸し、加熱してつくった強
い塩基性の白色粒状の固形物質であるので市販のソーダ
ライムの表面に、四三酸化鉄を２０wt％付着して処理剤
（５）を形成した。Since the treating agent (5) contained in the treating tower (4) is a strong basic white granular solid substance produced by immersing quicklime in a concentrated solution of sodium hydroxide and heating it, the surface of commercially available soda lime is used. Then, 20 wt% of ferrosoferric oxide was adhered to form a treating agent (5).
§実験例１ 内径１６．８mmの石英製の円筒体で構成した処理塔
（４）内に粒径１〜２mmの前記処理剤（５）を１３５mm
（３０ml、２８．５ｇ）を充填し、その上にヨードデン
プン反応を利用した検知剤（６）を充填長１０mmとなる
ように充填し、さらにその上に処理剤（５）を２０mm充
填した。§Experimental Example 1 The processing agent (5) having a particle diameter of 1 to 2 mm was put into a processing tower (4) composed of a quartz cylinder having an inner diameter of 16.8 mm and having a diameter of 135 mm.
(30 ml, 28.5 g) was filled, and then a detection agent (6) utilizing the iodostarch reaction was filled so as to have a filling length of 10 mm, and further 20 mm of the treatment agent (5) was filled thereon.
そして、処理塔（４）の下部から５％の三塩化ホウ素を
含有する窒素ガスを常温で１００ml／min（空筒線速度
０．７５cm／sec）で流通させ、検知剤（６）が白色か
ら紫色に変色する間での時間を測定した結果、２５２分
で変色した。これは、三塩化ホウ素の処理能力が４２リ
ットル／リットルの除去剤に相当する。Then, nitrogen gas containing 5% boron trichloride was passed from the lower part of the treatment tower (4) at room temperature at 100 ml / min (empty cylinder linear velocity 0.75 cm / sec), and the detection agent (6) changed from white. As a result of measuring the time during which the color changed to purple, the color changed in 252 minutes. This corresponds to a scavenger with a boron trichloride throughput of 42 liters / liter.
また、同様にして塩素ガスを流通させた場合の処理能力
は４４リットル／リットルであり、フッ素ガスを流通さ
せた場合の処理能力は１２０リットル／リットルであっ
た。Similarly, the throughput when chlorine gas was circulated was 44 liters / liter, and the throughput when fluorine gas was circulated was 120 liters / liter.
なお、この場合の処理剤（６）の処理塔（４）への充填
密度は０．５〜２．０ｇ／cc、好ましくは０．８〜１．
２ｇ／ccがよく、また、空筒速度は５０００hr-1以下、
好ましくは５００hr-1以下がよい。In this case, the packing density of the processing agent (6) in the processing tower (4) is 0.5 to 2.0 g / cc, preferably 0.8 to 1.
2g / cc is good, and the empty cylinder speed is less than 5000hr -1 ,
It is preferably 500 hr -1 or less.
§実験例２ 上述の処理剤の含有水分量に対する三塩化ホウ素の除去
量変化を測定した結果を第２図に示す。§Experimental Example 2 FIG. 2 shows the results of measurement of changes in the amount of boron trichloride removed with respect to the water content of the treatment agent described above.
この結果、含有水量は１〜２５％に設定すると、三塩化
ホウ素の処理能力を２５リットル／リットル以上に保持
できることが分かる。なお、この含有水分量は、８〜１
２％に設定することが好ましい。As a result, it can be seen that the treatment capacity of boron trichloride can be maintained at 25 liters / liter or more when the water content is set to 1 to 25%. The water content is 8 to 1
It is preferably set to 2%.
§実験例３ 次にソーダライムに対する四三酸化鉄の付着量と三塩化
ホウ素除去量との関係を第３図に示す。§Experimental Example 3 Next, FIG. 3 shows the relationship between the amount of ferric tetroxide adhering to soda lime and the amount of boron trichloride removed.
この結果、四三酸化鉄の不着量は５〜３０wt％で三塩化
ホウ素の処理能力を３０リットル／リットル以上に保持
でき、より好ましくは、２０〜２５wt％に設定すること
が好ましい。As a result, the non-deposition amount of ferric tetroxide is 5 to 30 wt% and the treatment capacity of boron trichloride can be maintained at 30 liter / liter or more, more preferably 20 to 25 wt%.
§比較例１ 前記実施例の処理剤にかえて、活性炭に炭酸ナトリウム
を含浸させたものを処理塔（４）に充填して、前記実施
例と同様に三塩化ホウ素を流通させた結果は、７８分で
変色した。三塩化ホウ素の処理能力が１３リットル／リ
ットルの除去剤に相当する。§Comparative Example 1 Instead of the treating agent of the above Example, activated carbon impregnated with sodium carbonate was charged into the treatment tower (4), and boron trichloride was circulated in the same manner as in the above Example. The color changed in 78 minutes. The throughput of boron trichloride corresponds to a scavenger of 13 liters / liter.
同様にして塩素ガスを流通させた場合の処理能力は２２
リットル／リットル、フッ素ガスを流通させた場合の処
理能力は５０リットル／リットルであった。Similarly, the processing capacity when chlorine gas is distributed is 22.
L / l, the processing capacity when the fluorine gas was passed was 50 l / l.
≪効 果≫ 本発明では、処理塔に充填する処理剤として、ソーダラ
イマの表面に四三酸化鉄を付着させたものを用いている
ので、処理剤と処理ガスとが化学反応して、廃ガス中の
有害ガスを完全に無害化することができるうえ、化学反
応で処理することから物理吸着のような脱着のおそれが
なく、処理剤交換時での安全性を高めることができる。<< Effects >> In the present invention, as the treatment agent to be filled in the treatment tower, the one in which ferric tetroxide is attached to the surface of soda lime is used. The harmful gas therein can be made completely harmless, and since it is treated by a chemical reaction, there is no fear of desorption such as physical adsorption, and the safety at the time of exchanging the treatment agent can be enhanced.
また、本発明の処理剤はフッ素系ガスと塩素系ガスとを
同時に除去することができるうえ、従来の除去剤よりも
単位体積当たり２〜２．５倍の除去能力を発揮すること
ができる。Further, the treatment agent of the present invention can remove both fluorine-based gas and chlorine-based gas at the same time, and can exhibit a removal capacity of 2 to 2.5 times per unit volume as compared with conventional removal agents.
第１図はハロゲン系廃ガス処理用実験装置の概略構成図
であり、第２図は処理剤の含有水分量に対する三塩化ホ
ウ素の除去量変化を示すグラフ、第３図はソーダライム
に対する四三酸化鉄の付着量と三塩化ホウ素除去量との
関係を示すグラフである。FIG. 1 is a schematic configuration diagram of an experimental apparatus for treating halogen-based waste gas, FIG. 2 is a graph showing changes in the amount of boron trichloride removed with respect to the water content of a treating agent, and FIG. 6 is a graph showing the relationship between the amount of iron oxide deposited and the amount of boron trichloride removed.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｈ０１Ｌ 21/205 (72)発明者 佐枝 学 滋賀県守山市勝部町1095番地 株式会社岩 谷ガス開発研究所内 (56)参考文献 特開 昭63−137736（ＪＰ，Ａ) 特開 昭62−121621（ＪＰ，Ａ)─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Internal reference number FI Technical display location H01L 21/205 (72) Inventor Manabu Saeda 1095 Katsube-cho, Moriyama-shi, Shiga Iwatani Gas Development Co., Ltd. In the laboratory (56) Reference JP 63-137736 (JP, A) JP 62-121621 (JP, A)
Claims (1)
のハロゲン系ガスを一種以上含有する廃ガスと処理剤と
を接触させて当該廃ガスから有害成分を除去する廃ガス
の処理方法において、 処理塔に充填する処理剤として、ソーダライムの表面に
四三酸化鉄を付着させたものを用いることを特徴とする
ハロゲン系廃ガスの乾式処理剤。1. A method for treating waste gas, comprising removing a harmful component from the waste gas by contacting a waste gas containing one or more halogen-containing gases such as boron chloride and hydrogen fluoride as a harmful component with a treating agent. A halogen type waste gas dry treatment agent characterized by using, as a treatment agent to be filled in a treatment tower, soda lime having iron oxide black on its surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2286561A JPH062213B2 (en) | 1990-10-23 | 1990-10-23 | Halogen-based waste gas dry treatment agent |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2286561A JPH062213B2 (en) | 1990-10-23 | 1990-10-23 | Halogen-based waste gas dry treatment agent |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04161224A JPH04161224A (en) | 1992-06-04 |
| JPH062213B2 true JPH062213B2 (en) | 1994-01-12 |
Family
ID=17706005
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2286561A Expired - Lifetime JPH062213B2 (en) | 1990-10-23 | 1990-10-23 | Halogen-based waste gas dry treatment agent |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH062213B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69522662T2 (en) * | 1994-01-10 | 2002-06-20 | Advanced Tech Materials | METALLO-OXOMERIC SCRUBBER COMPOSITIONS AND METHOD FOR GAS PURIFICATION USING THESE COMPOSITIONS |
| US6060034A (en) * | 1998-06-02 | 2000-05-09 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Abatement system for ClF3 containing exhaust gases |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62121621A (en) * | 1985-11-22 | 1987-06-02 | Ube Ind Ltd | Gas adsorbing and trapping device |
| JPH0741145B2 (en) * | 1986-11-28 | 1995-05-10 | 旭硝子株式会社 | Etching exhaust gas removal method |
-
1990
- 1990-10-23 JP JP2286561A patent/JPH062213B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04161224A (en) | 1992-06-04 |
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