JPH062198Y2 - 微細ビーム成形装置 - Google Patents
微細ビーム成形装置Info
- Publication number
- JPH062198Y2 JPH062198Y2 JP1837988U JP1837988U JPH062198Y2 JP H062198 Y2 JPH062198 Y2 JP H062198Y2 JP 1837988 U JP1837988 U JP 1837988U JP 1837988 U JP1837988 U JP 1837988U JP H062198 Y2 JPH062198 Y2 JP H062198Y2
- Authority
- JP
- Japan
- Prior art keywords
- collimator
- energy
- slit
- ion
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 150000002500 ions Chemical class 0.000 claims description 20
- 238000010884 ion-beam technique Methods 0.000 claims description 18
- 102100027340 Slit homolog 2 protein Human genes 0.000 claims description 13
- 101710133576 Slit homolog 2 protein Proteins 0.000 claims description 13
- 229910052734 helium Inorganic materials 0.000 description 11
- 239000001307 helium Substances 0.000 description 11
- -1 helium ion Chemical class 0.000 description 7
- 238000000034 method Methods 0.000 description 5
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 4
- 238000007493 shaping process Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 238000012512 characterization method Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 239000003779 heat-resistant material Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 101700004678 SLIT3 Proteins 0.000 description 1
- 102100027339 Slit homolog 3 protein Human genes 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000004452 microanalysis Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000004846 x-ray emission Methods 0.000 description 1
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1837988U JPH062198Y2 (ja) | 1988-02-15 | 1988-02-15 | 微細ビーム成形装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1837988U JPH062198Y2 (ja) | 1988-02-15 | 1988-02-15 | 微細ビーム成形装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01122254U JPH01122254U (en, 2012) | 1989-08-18 |
JPH062198Y2 true JPH062198Y2 (ja) | 1994-01-19 |
Family
ID=31232974
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1837988U Expired - Lifetime JPH062198Y2 (ja) | 1988-02-15 | 1988-02-15 | 微細ビーム成形装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH062198Y2 (en, 2012) |
-
1988
- 1988-02-15 JP JP1837988U patent/JPH062198Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH01122254U (en, 2012) | 1989-08-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4482179B2 (ja) | 粒子ビーム装置 | |
US8208603B2 (en) | X-ray generating device | |
Yao | Focused ion beam systems: basics and applications | |
Fisher | On the temperature rise in electron irradiated foils | |
US4352985A (en) | Scanning ion microscope | |
US6259765B1 (en) | X-ray tube comprising an electron source with microtips and magnetic guiding means | |
JP2019537206A (ja) | 構造化されたx線ターゲット | |
JP2627062B2 (ja) | 粒子線装置 | |
Pijper et al. | Detection of energy-selected secondary electrons in coincidence with energy-loss events in thin carbon foils | |
US9048064B2 (en) | Cathode assembly for a long throw length X-ray tube | |
Ishitani et al. | Objective comparison of scanning ion and scanning electron microscope images | |
US6730907B1 (en) | Charged particle device | |
Schwestka et al. | A versatile ion beam spectrometer for studies of ion interaction with 2D materials | |
Ryabchikov et al. | High intensity, macroparticle-free, aluminum ion beam formation | |
KR0165996B1 (ko) | 전자빔 노광 장치 및 전자빔 노광 장치의 교정 방법 | |
Ruehlicke et al. | AFM studies of a new type of radiation defect on mica surfaces caused by highly charged ion impact | |
JPH062198Y2 (ja) | 微細ビーム成形装置 | |
US2814729A (en) | X-ray microscope | |
US6653628B2 (en) | Electron spectroscopic analyzer using X-rays | |
Ishino et al. | In situ studies of the effects of ion beams on materials using the electron microscope ion beam interface | |
US3243667A (en) | Non dispersive magnetic deflection apparatus and method | |
US5689112A (en) | Apparatus for detection of surface contaminations on silicon wafers | |
JP2002082173A (ja) | 大電流ビームモニタ | |
Zeng et al. | Design and Analysis of an Electron-beam Tuning Prototype for Current Quantization | |
JP4747361B2 (ja) | 多価イオン照射装置及びそれを用いた微細構造の製造方法 |