JPH06219781A - Production of glass intaglio - Google Patents

Abstract

PURPOSE:To provide a method for producing an intaglio suitably usable in printing a color filter for color liquid crystal display on a glass substrate according to an intaglio printing method. CONSTITUTION:The top surface of a quartz glass plate 2 is successively coated with an aluminum thin film and a chromium thin film to provide a masking film, which is subsequently patterned into a prescribed shape. The exposed part of the glass plate is then anisotropically dry etched with a hydrocarbon containing fluorine.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a glass intaglio plate, and more particularly to a method for producing a glass intaglio plate which is preferably used when a printing type color filter used for color liquid crystal display or the like is printed on a glass substrate. .

[0002]

2. Description of the Related Art As a method for producing a glass substrate for a color liquid crystal display by providing a color filter of red, green, blue, etc. on a glass substrate, a masking agent is used when high definition and high resolution of display are required. It is manufactured by the photolithography method, and is manufactured by the screen printing method when a relatively coarse color pattern of 100 μm or more is sufficient. When the resolution is in the middle, it is manufactured by the intaglio printing method.

[0003]

SUMMARY OF THE INVENTION It is an object of the present invention to provide a method for producing a glass intaglio used for forming a pattern having a line width of tens to hundreds of μm on a glass substrate. And

[0004]

The present invention provides a masking film in which an aluminum thin film and a chromium thin film are sequentially coated on a glass plate of quartz glass or borosilicate glass, and after patterning the masking film into a predetermined shape, This is a method for producing a glass intaglio plate in which an exposed part of a glass plate is anisotropically dry-etched with a hydrocarbon containing fluorine.

[0005]

The chromium thin film having a strong dry etching resistance as the outermost surface of the two-layered masking film used in the present invention is
Since a soft aluminum thin film is used as the base, the internal stress is small, and even if it is thickly coated, cracking does not occur.

[0006]

EXAMPLES The glass used in the present invention is limited to quartz glass and borosilicate glass which react with a hydrocarbon containing fluorine to form a volatile compound when the glass is etched. Examples of the borosilicate glass include Vycor glass and Pyrex glass. For these glasses, dry etching conditions are CHF ₃ gas pressure 5P.
a, the amount of introduction is 50 sccm, and the etching conditions are 200 W of high-frequency power, the quartz glass and Vycor glass are 43 n
m / min, Pyrex glass can be etched at a high speed of 42 nm / min. However, soda lime silicate glass containing a relatively large amount of sodium and calcium (72% by weight of the main component SiO ₂ 72%, N
a ₂ O 13%, CaO 8%, MgO 4%) under the above etching conditions is 4.5 nm / min, and barium aluminosilicate glass (trade name 7059) is 4.1 nm / m.
In, the etching rate is small by about one digit.

The masking film used in the present invention is a two-layer film consisting of an aluminum thin film and a chromium thin film. Under the above etching conditions, the chromium thin film coated by sputtering has an etching rate of about 1/40 that of glass, and the aluminum thin film coated by sputtering is about 1/16.
The etching rate was.

FIG. 1 is a partial sectional view of a glass intaglio plate obtained according to the present invention. In the glass intaglio 1, a large number of U-shaped grooves 3 having a cross-sectional shape are formed in a stripe shape on a surface of a glass substrate 2 at intervals. FIG. 2 is a diagram illustrating an intaglio printing step of printing ink on a glass substrate using the glass intaglio obtained according to the present invention.

A quartz glass substrate was coated with an aluminum thin film to a thickness of 100 nm by a sputtering method, and then a chromium thin film was coated to a thickness of 300 nm. This glass was taken out of the sputtering apparatus, and a resist (trade name: PMER6030, manufactured by Tokyo Ohka Kogyo Co., Ltd.) was formed in a predetermined shape on the surface of the masking film composed of two layers. After that, the chromium thin film was etched with a cerium ammonium nitrate aqueous solution, and the aluminum thin film was etched with a phosphoric acid aqueous solution to remove the masking film. The side etching amount of the masking film by etching was 0.1 μm. Next, after peeling off the resist, the glass substrate was put in a dry etching apparatus, and CHF ₃ was introduced at 50 sccm to obtain 5
While maintaining the pressure of Pa, high-frequency power of 200 W was applied for 4 hours to perform dry etching, thereby forming stripe-shaped U-shaped grooves in which grooves having a depth of 12 μm were formed at equal intervals. No cracks were found in the masking film of the obtained sample. After that, the masking film was removed with an acid to obtain a glass intaglio having a cross section as shown in FIG.

An ink intaglio printing test was conducted using this glass intaglio plate and an ink containing an organic gold compound. The paste was filled with a doctor blade to the upper end of the groove of the glass intaglio (FIG. 2 (a)), and then the silicon rubber roller was rotated while pressing on the glass intaglio to transfer the ink in the groove onto the roller. (FIG.2 (b)). Next, this roller was rotated while being pressed against the glass plate, and ink was printed on the glass plate (FIG. 2 (c)). This glass plate is 7
It was dried at 0 ° C. for 10 minutes and then calcined at 500 ° C. for 1 hour. The width of the printed ink was slightly narrower than the line width of the intaglio plate, but it was confirmed that the line and space was 5 μm. Comparative Example Striped grooves were formed on the quartz glass substrate in the same manner as in Example except that the masking film prepared by the sputtering method was a chromium thin film having a thickness of 300 nm. Many cracks were found in the masking film of the obtained sample, and the glass covered with the masking film was also shallow and irregularly etched. An intaglio printing test was conducted using this glass intaglio plate and an ink containing a coloring pigment in the same manner as in the example. The width of the printed ink was formed with a line and space of 5 μm,
It was confirmed that many minute amounts of ink were transferred to the space portion.

INDUSTRIAL APPLICABILITY By using the glass intaglio obtained by the method of the present invention, it is possible to print ink having a fine size and shape on a substrate.

[Brief description of drawings]

FIG. 1 is a partial cross-sectional view of a glass intaglio plate obtained according to the present invention.

FIG. 2 is a diagram illustrating an intaglio printing process of printing ink on a glass plate using the glass intaglio obtained by the present invention.

[Explanation of symbols]

 1 ... Glass intaglio, 2 ... Glass plate, 3 ... Groove

Claims (1)

[Claims] 1. A masking film obtained by sequentially coating an aluminum thin film and a chromium thin film on a glass plate of quartz glass or borosilicate glass, patterning the masking film into a predetermined shape, and then exposing the exposed portion of the glass plate with fluorine. A method for producing a glass intaglio, which is anisotropic dry-etched with a hydrocarbon containing.