JPH06215711A - Parallel x-ray source - Google Patents

Parallel x-ray source

Info

Publication number
JPH06215711A
JPH06215711A JP530993A JP530993A JPH06215711A JP H06215711 A JPH06215711 A JP H06215711A JP 530993 A JP530993 A JP 530993A JP 530993 A JP530993 A JP 530993A JP H06215711 A JPH06215711 A JP H06215711A
Authority
JP
Japan
Prior art keywords
target
rays
film
metal
parallel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP530993A
Other languages
Japanese (ja)
Other versions
JP2759033B2 (en
Inventor
Yasuhiro Koshimoto
泰弘 越本
Tsutomu Wada
力 和田
Masami Kakuchi
正美 覚知
Tetsuo Iijima
哲生 飯島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP530993A priority Critical patent/JP2759033B2/en
Publication of JPH06215711A publication Critical patent/JPH06215711A/en
Application granted granted Critical
Publication of JP2759033B2 publication Critical patent/JP2759033B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To provide X-ray beams in parallel to each other by using a small device at low power by filling a metal in the pore of a planar alumite film, and by having electrons collided with the target surface, for which metal is coated on the pore filled with metal. CONSTITUTION:Electron beams e<-> directly drawn from a cathode 1 are flowed in a target 3 by a high electric field applied between the cathode 1 and an electrode 12, and a part of the kinetic energy accelerated at high speed by the high electric field, is emitted as a characteristic X-ray of target atom. A porous film 14 which is the other side of a target film 11, is formed of a thin film consisting of a positive electrode alumite oxide and a metal pillar. When the X-rays penetrate the film 14, the component perpendicular to the film surface of the X-rays passes only the alumite part, while the X-rays distracted from the normal of the film surface are absorbed in the metal pillar. Thus only the X-rays of the component in the normal direction are emitted from the target 3. X-rays beams in parallel to each other, can thus be provided by a small device at low power.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は平行なX線を得るための
平行X線源に関する。
FIELD OF THE INVENTION The present invention relates to a parallel X-ray source for obtaining parallel X-rays.

【0002】[0002]

【従来の技術】従来、鋼線入りの強化ベルト、ファイバ
ースリーブ、線びきダイス、電子部品など、不透明な材
質のために微小な内部構造が外部より透視できない微小
な部品では検査に通常の光学顕微鏡計測を用いることが
できなかった。このため、完成した部品のサンプルを切
断して光学検査するなどしてロットの製品検査を行って
いたが、手間が掛かり、また、破壊試験であるため原理
的に全数検査は不可能であった。
2. Description of the Related Art Conventionally, an ordinary optical microscope is used for inspection of small parts such as reinforced belts containing steel wires, fiber sleeves, wire dies, electronic parts, etc. Measurements could not be used. For this reason, lots of products were inspected by cutting a sample of the completed parts and performing optical inspection, but it was time-consuming, and because it was a destructive test, 100% inspection was impossible in principle. .

【0003】また、微細なパターンを形成する技術とし
てX線露光法が知られているが、この場合も平行なX線
が必要であった。
An X-ray exposure method is known as a technique for forming a fine pattern, but in this case as well, parallel X-rays are required.

【0004】不透明物の可視化検査用として古くよりマ
イクロラジオグラフィを用いれば可能であることが知ら
れており、平行なX線を利用して投影法によって透視像
を観察するX線投影法が工業用、医療用に用いられてい
る。しかし、X線の平行度が悪いと透過像がぼやけるか
ら、高度な計測や露光に用いるには平行度を高くする必
要がある。厳密に平行なX線源を得るためには、従来は
図3に示すようにエキシマレーザ31の励起によるレー
ザ光をレンズ32を通して点X線源のターゲット33に
当て、このターゲット33からでたX線を多層膜で構成
した凹面鏡34で平行化して平行X線を得るるなど、高
価で巨大な装置が必要であった。通常の高電圧加速電子
を用いたX線源で点光源を得ようとして電子線を絞ると
局部的に電子が当たることによる発熱のためにターゲッ
トの損傷が激しく、その冷却のためにやはり高価な冷却
系や真空内でのターゲット回転機構などが必要であっ
た。
It has long been known that microradiography can be used for visual inspection of opaque objects, and the X-ray projection method for observing a perspective image by a projection method using parallel X-rays is industrial. It is used for medical and medical purposes. However, if the parallelism of X-rays is poor, the transmitted image will be blurred, so it is necessary to increase the parallelism for use in advanced measurement and exposure. In order to obtain a strictly parallel X-ray source, conventionally, as shown in FIG. 3, laser light excited by an excimer laser 31 is applied to a target 33 of a point X-ray source through a lens 32, and the X emitted from this target 33 is emitted. An expensive and huge device was required, such as parallelizing the lines with a concave mirror 34 formed of a multilayer film to obtain parallel X-rays. When an electron beam is narrowed down to obtain a point light source with an X-ray source using ordinary high-voltage accelerating electrons, the target is severely damaged due to heat generated by the local hitting of the electron, which is also expensive due to its cooling. A cooling system and a target rotation mechanism in a vacuum were required.

【0005】[0005]

【発明が解決しようとする課題】本発明は上記の事情に
鑑みてなされたもので、X線発生を最初から平行となる
ようにコリメーターを一体的に設け、装置を根本的に小
さくした平行X線源を提供することを目的とする。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and a collimator is integrally provided so as to make X-ray generation parallel from the beginning, and the apparatus is basically reduced in parallel. The purpose is to provide an X-ray source.

【0006】[0006]

【課題を解決するための手段及び作用】本発明は上記課
題を解決するために、平面状のアルマイト膜のポアに金
属を充填し、かつその上に金属を皮膜して成るターゲッ
ト面に電子を衝突せしめることを特徴とするもので、ポ
アを用い無くとも少ない電力でその焦点を非常に小さく
できるから、これを用いて小形のX線顕微鏡が実現で
き、不可視物の検査が便利になる利点がある。
In order to solve the above problems, the present invention fills the pores of a planar alumite film with metal and coats the metal with a metal to deposit electrons on the target surface. It is characterized by colliding, and its focus can be made very small with a small amount of power without using pores, so a small X-ray microscope can be realized using this, and the advantage of convenient inspection of invisible objects is there.

【0007】[0007]

【実施例】以下図面を参照して本発明の実施例を詳細に
説明する。
Embodiments of the present invention will now be described in detail with reference to the drawings.

【0008】図1(a),(b)は本発明によるX線源
(X線発生管)の構造説明図であり、1はカソード、2
は管ステム、3はターゲット、5は管壁、6は第1の直
流電源、7は第2の直流電源、11はターゲット膜、1
2は電極、13は絶縁シム、14は平面状の多孔膜、2
3は基板である。管壁5とカソード1を含む管ステム
2、ターゲット3、電極12で囲まれた空間は真空管と
同様に高真空に保たれている。
1 (a) and 1 (b) are structural explanatory views of an X-ray source (X-ray generating tube) according to the present invention.
Is a tube stem, 3 is a target, 5 is a tube wall, 6 is a first DC power supply, 7 is a second DC power supply, 11 is a target film, 1
2 is an electrode, 13 is an insulating shim, 14 is a planar porous film, 2
3 is a substrate. The space surrounded by the tube stem 5 including the tube wall 5 and the cathode 1, the target 3, and the electrode 12 is maintained in a high vacuum like a vacuum tube.

【0009】図2は多孔膜14を含むターゲット3の構
造を模式的に示したもので、21は陽極酸化アルマイ
ト、22は金属ピラー、23は基板、11がターゲット
膜でピラー22は直径数十nmの円柱状、ピラー22の
間隔は数十〜数百nmである。
FIG. 2 schematically shows the structure of the target 3 including the porous film 14. Reference numeral 21 is anodized alumite, 22 is a metal pillar, 23 is a substrate, 11 is a target film, and the pillar 22 has a diameter of several tens. The pillar 22 has a columnar shape of nm and the distance between the pillars 22 is several tens to several hundreds nm.

【0010】ターゲット3は電子発生源であるカソード
1に対して垂直に配置された平面状であり、真空側は
銅、タングステンなどの金属膜からなるターゲット膜1
1、逆側は陽極酸化アルマイト21及び金属ピラー22
よりなる多孔膜14が形成された薄膜で構成され、ター
ゲット部分が穴となっている電極12に固着されてい
る。
The target 3 has a planar shape which is arranged perpendicularly to the cathode 1 which is an electron generating source, and the vacuum side has a target film 1 made of a metal film such as copper or tungsten.
1, the other side is anodized alumite 21 and metal pillar 22
The target portion is fixed to the electrode 12 having a hole.

【0011】本発明の特徴である多孔膜14はアルミニ
ウムを片側から陽極酸化した後、エッチングによりポア
を拡大し、さらに該孔に金属を付着せしめて封孔処理し
たものである。
The porous film 14, which is a feature of the present invention, is obtained by anodizing aluminum from one side, enlarging the pores by etching, and further applying a metal to the pores for sealing treatment.

【0012】図1(a),(b)に沿って本発明の動作
を説明すると、カソード1と電極12の間には電源6に
より数十kVの高電界が印加されており、この高電界の
ためにカソード1から直接電子が真空中に引き出され
る。電界引出し電極12側より見ると該ターゲット3以
外は絶縁シム13で覆われているため、電界引出し電極
12より引き出された電子線e- はターゲットに流入す
る。カソード1より引き出された電子線e- はターゲッ
ト3に流入するが、この際、電子線e- が高電界により
高速に加速されているため、ターゲット原子の内核に進
入し、運動エネルギーの一部が原子の特性X線としてタ
ーゲット3から放出される。X線の発生波長、効率は電
子線e- の加速電圧とターゲット3の原子番号に比例す
るから、ターゲット3を薄い金属とすることにより電子
線e- の運動方向に沿って効率よくX線の発生ができ
る。
The operation of the present invention will be described with reference to FIGS. 1 (a) and 1 (b). A high electric field of several tens of kV is applied between the cathode 1 and the electrode 12 by the power source 6. Because of this, electrons are directly drawn from the cathode 1 into the vacuum. When viewed from the side of the electric field extracting electrode 12, the electron beam e extracted from the electric field extracting electrode 12 flows into the target because the parts other than the target 3 are covered with the insulating shim 13. The electron beam e extracted from the cathode 1 flows into the target 3. At this time, since the electron beam e is accelerated at a high speed by the high electric field, it enters the inner core of the target atom and a part of the kinetic energy is absorbed. Are emitted from the target 3 as characteristic X-rays of atoms. The generation wavelength and efficiency of X-rays are proportional to the acceleration voltage of the electron beam e and the atomic number of the target 3. Therefore, by using a thin metal for the target 3, the X-rays can be efficiently generated along the moving direction of the electron beam e . Can occur.

【0013】X線はターゲット3を加速された電子がぶ
つかることによって発生し、ターゲット3を突き抜けて
ほぼ等方的に放射される。すなわち、X線発生源として
は電子のぶつかる領域の広さを有する。しかし、ターゲ
ット膜11と表裏をなす多孔膜14を突き抜けるとき、
ターゲット膜11面より出たX線は膜面に垂直な成分は
アルマイト21部分のみを通過するが、膜面法線方向か
らずれたX線は金属ピラー22を通過するため吸収され
てしまい、結果として法線方向成分のX線のみがターゲ
ット3から出て平行なX線が放出される。
X-rays are generated by collision of the accelerated electrons with the target 3, penetrate through the target 3 and are emitted isotropically. That is, the X-ray generation source has a size of a region where electrons collide. However, when penetrating the target film 11 and the porous film 14 forming the front and back,
As for the X-rays emitted from the surface of the target film 11, the components perpendicular to the film surface pass only through the alumite 21 portion, but the X-rays deviated from the normal direction of the film surface are absorbed because they pass through the metal pillars 22. As a result, only X-rays of the normal direction component are emitted from the target 3 and parallel X-rays are emitted.

【0014】また、図1の例ではターゲット3が電子を
加速するため真空とする必要のある内部と外部との仕切
りを兼ねており、X線の放射方向にはX線を吸収する可
能性のある物質がないから効率よくX線を取り出すこと
ができる。基板23はその上にアルミニウムを付着して
陽極酸化し、その後の金属メッキを行うときの土台とし
ての役割を果たせば良いから、平面加工が簡単でX線吸
収の低い材料であれば良く、たとえばグラファイトや、
ポリイミドのようなプラスチックでも良い。また、本実
施例の説明では薄い基板23を用いている例を示してい
るが、アルミニウムを用いて所定の厚さに陽極酸化後、
逆側からエッチングして除去してももちろん良い。
Further, in the example of FIG. 1, the target 3 also serves as a partition between the inside and the outside that needs to be evacuated in order to accelerate electrons, and there is a possibility of absorbing X-rays in the X-ray radiation direction. X-rays can be extracted efficiently because there is no certain substance. Since the substrate 23 only needs to play a role as a base when aluminum is deposited on the substrate 23 for anodic oxidation and the subsequent metal plating is performed, any material that can be easily planarized and has low X-ray absorption may be used. Graphite,
A plastic such as polyimide may be used. Further, although the thin substrate 23 is used in the description of the present embodiment, aluminum is used to anodize to a predetermined thickness.
Of course, it may be removed by etching from the opposite side.

【0015】ターゲット3は電子が集中して衝突すると
発熱するが、ターゲット3に接続している電極12が電
流の通路となると同時に、発生する熱の放熱路を兼ね
る。さらに本実施例ではターゲット3の大きさに関係な
くX線は平行になるから、ターゲット3に衝突する電子
密度を小さくでき、発熱の影響を避けることができる。
The target 3 generates heat when electrons are concentrated and collide, but the electrode 12 connected to the target 3 serves as a current path and also serves as a heat radiation path for heat generated. Further, in this embodiment, the X-rays are parallel regardless of the size of the target 3, so that the electron density colliding with the target 3 can be reduced and the influence of heat generation can be avoided.

【0016】また、電子線を小さい領域に集中してター
ゲット3に衝突せしめることがX線の焦点を小さくする
ために肝要であるが、電極12をコーン状としても該構
造では電子線を積極的に収束するための電子レンズを用
いなければ電子線はどうしても電位分布にしたがって広
がり、電子の管壁5への衝突などを生じて電子線の運動
量が直線状の分布から外れる。これを避けるために管を
大きくすると真空度の維持や機械的な安定性が悪くな
る。そこで本実施例では発生管全体を極端に小さく構成
する。具体的には目的とするμmオーダーのターゲット
3領域に対してターゲット3−カソード1の間隔を数十
μm以内とすると、カソード1より引き出された電子を
極端に拡散することなくターゲット3にぶつけられる。
管ステム2の大きさをその数十倍程度とすることにより
実用的に問題の無いX線発生管を作製することができ
る。
Further, it is essential to concentrate the electron beam in a small area and collide with the target 3 in order to reduce the focus of the X-ray. However, even if the electrode 12 has a cone shape, the electron beam is positively applied in the structure. Unless an electron lens for converging on is used, the electron beam inevitably spreads according to the potential distribution, and the electron beam collides with the tube wall 5 and the momentum of the electron beam deviates from the linear distribution. If the tube is enlarged to avoid this, the vacuum degree is not maintained and the mechanical stability is deteriorated. Therefore, in this embodiment, the entire generating tube is made extremely small. Specifically, when the distance between the target 3 and the cathode 1 is within several tens of μm with respect to the target target 3 region of the μm order, the electrons extracted from the cathode 1 are hit against the target 3 without being extremely diffused. .
By making the size of the tube stem 2 several tens of times the size of the tube stem 2, it is possible to manufacture an X-ray generating tube having practically no problem.

【0017】ターゲット膜11の材質とピラー22の材
質は適宜選択することにより効率の良いX線発生ができ
ることも周知である。たとえば、1.5オングストロー
ム程度のX線顕微鏡を作るにはターゲット膜11に銅
を、ピラー22に鉄を用いれば良く、より短い平行X線
源を得たい場合にはターゲット膜11にタングステン
を、ピラー22に銀などを用いれば良い。
It is well known that the X-rays can be efficiently generated by appropriately selecting the materials of the target film 11 and the pillars 22. For example, copper can be used for the target film 11 and iron can be used for the pillars 22 to form an X-ray microscope of about 1.5 angstroms. To obtain a shorter parallel X-ray source, tungsten can be used for the target film 11. Silver or the like may be used for the pillar 22.

【0018】上記説明から明らかなように、陽極酸化し
たアルマイト21のポアに金属を充填することにより簡
単なX線コリメーターが実現できることは容易に類推で
きる。さらに、充填すべき金属をはぶき、アルマイト2
1のポアをX線通過路とすることも容易に考えられ、た
とえばターゲット材としてカーボンやシリコンなどを用
いて得られる非常に長いX線(数十〜数百オングストロ
ーム)を対象とする場合には充分実用になることも当然
である。
As is apparent from the above description, it can be easily inferred that a simple X-ray collimator can be realized by filling the pores of anodized alumite 21 with a metal. Furthermore, wipe off the metal to be filled, and remove alumite 2
It is easy to consider that the pore 1 is an X-ray passage. For example, when a very long X-ray (several tens to several hundred angstroms) obtained by using carbon or silicon as a target material is targeted. It goes without saying that it will be fully practical.

【0019】[0019]

【発明の効果】以上述べたように、本発明に依ればポア
を用い無くとも少ない電力でその焦点を非常に小さくで
きるから、これを用いて小形のX線顕微鏡が実現でき、
不可視物の検査が便利になる利点がある。
As described above, according to the present invention, the focal point can be made extremely small with a small amount of electric power without using a pore. Therefore, a small X-ray microscope can be realized by using this.
There is an advantage that inspection of invisible objects becomes convenient.

【図面の簡単な説明】[Brief description of drawings]

【図1】(a)は本発明に係るX線発生管の一例を示す
構造図、(b)は(a)のターゲットの一例を示す拡大
図である。
FIG. 1A is a structural view showing an example of an X-ray generating tube according to the present invention, and FIG. 1B is an enlarged view showing an example of a target shown in FIG.

【図2】本発明に係る多孔膜を含むターゲットの一例を
示す模式的構造図である。
FIG. 2 is a schematic structural diagram showing an example of a target including a porous film according to the present invention.

【図3】従来の平行X線源を示す構成説明図である。FIG. 3 is a structural explanatory view showing a conventional parallel X-ray source.

【符号の説明】[Explanation of symbols]

1…カソード、2…管ステム、3…ターゲット、5…管
壁、6…第1の直流電源、7…第2の直流電源、11…
ターゲット膜、12…電極、13…絶縁シム、14…多
孔膜、21…陽極酸化アルマイト、22…金属ピラー、
23…基板。
DESCRIPTION OF SYMBOLS 1 ... Cathode, 2 ... Tube stem, 3 ... Target, 5 ... Tube wall, 6 ... 1st DC power supply, 7 ... 2nd DC power supply, 11 ...
Target film, 12 ... Electrode, 13 ... Insulation shim, 14 ... Porous film, 21 ... Anodized alumite, 22 ... Metal pillar,
23 ... Substrate.

フロントページの続き (72)発明者 飯島 哲生 東京都千代田区内幸町一丁目1番6号 日 本電信電話株式会社内Front page continuation (72) Inventor Tetsuo Iijima 1-1-6 Uchisaiwaicho, Chiyoda-ku, Tokyo Nihon Telegraph and Telephone Corporation

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 平面状のアルマイト膜のポアに金属を充
填し、かつその上に金属を皮膜して成るターゲット面に
電子を衝突せしめることを特徴とする平行X線源。
1. A parallel X-ray source, characterized in that the pores of a planar alumite film are filled with metal, and electrons are made to collide with a target surface formed by coating the metal on the pores.
JP530993A 1993-01-14 1993-01-14 Parallel X-ray source Expired - Fee Related JP2759033B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP530993A JP2759033B2 (en) 1993-01-14 1993-01-14 Parallel X-ray source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP530993A JP2759033B2 (en) 1993-01-14 1993-01-14 Parallel X-ray source

Publications (2)

Publication Number Publication Date
JPH06215711A true JPH06215711A (en) 1994-08-05
JP2759033B2 JP2759033B2 (en) 1998-05-28

Family

ID=11607679

Family Applications (1)

Application Number Title Priority Date Filing Date
JP530993A Expired - Fee Related JP2759033B2 (en) 1993-01-14 1993-01-14 Parallel X-ray source

Country Status (1)

Country Link
JP (1) JP2759033B2 (en)

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CN111785763A (en) * 2020-07-29 2020-10-16 北海惠科光电技术有限公司 Display panel and manufacturing method thereof

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JP2019211738A (en) * 2018-06-08 2019-12-12 株式会社オプトニクス精密 X-ray mask and method for producing x-ray mask
CN111785763A (en) * 2020-07-29 2020-10-16 北海惠科光电技术有限公司 Display panel and manufacturing method thereof

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