JP5153388B2 - X-ray generator, X-ray analyzer, X-ray transmission image measuring device, and X-ray interferometer - Google Patents

X-ray generator, X-ray analyzer, X-ray transmission image measuring device, and X-ray interferometer Download PDF

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JP5153388B2
JP5153388B2 JP2008056737A JP2008056737A JP5153388B2 JP 5153388 B2 JP5153388 B2 JP 5153388B2 JP 2008056737 A JP2008056737 A JP 2008056737A JP 2008056737 A JP2008056737 A JP 2008056737A JP 5153388 B2 JP5153388 B2 JP 5153388B2
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朝雄 中野
勝 栗林
正明 山片
雅弘 野々口
省三 青木
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Rigaku Corp
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本発明は、電子ビームのドリフトによる位置変動の影響を受けることなく、安定した位置から微小スポットのX線を出射するX線発生装置ならびに該X線発生装置を備えたX線分析装置、X線透過像計測装置及びX線干渉計に関する。   The present invention relates to an X-ray generator that emits X-rays of a minute spot from a stable position without being affected by position fluctuations caused by electron beam drift, an X-ray analyzer including the X-ray generator, and an X-ray analyzer The present invention relates to a transmission image measuring apparatus and an X-ray interferometer.

X線管に関する従来技術としては、特公昭34−10727号公報(特許文献1)、特開平7−169422号公報(特許文献2)及び特開2001−35428号公報(特許文献3)が知られている。   Japanese Patent Publication No. 34-10727 (Patent Document 1), Japanese Patent Application Laid-Open No. 7-169422 (Patent Document 2) and Japanese Patent Application Laid-Open No. 2001-35428 (Patent Document 3) are known as conventional techniques related to X-ray tubes. ing.

特許文献1には、X線管の陽極構成台材に所要焦点の面積のタングステン陽極材を充填して陽極とし、発生したX線の進行方向に該陽極台材からのX線を良く吸収する物質より成る単数又は複数の物質のフィルターを衝立せしめた微細陽極X線管が記載されている。   In Patent Document 1, an anode component base material of an X-ray tube is filled with a tungsten anode material having a required focal area to form an anode, and X-rays from the anode base material are well absorbed in the traveling direction of the generated X-rays. A fine anode X-ray tube is described in which a filter of one or more substances made of a material is screened.

また、特許文献2には、真空外囲器内に陰極フィラメントと重金属の陽極ターゲット片とが対向配置され、該陽極ターゲット片が陽極基体に支持されてなるX線管において、上記陽極基体は合成ダイヤモンドからなることが記載されている。   Further, in Patent Document 2, in an X-ray tube in which a cathode filament and a heavy metal anode target piece are arranged to face each other in a vacuum envelope, and the anode target piece is supported by an anode substrate, the anode substrate is synthesized. It is described that it consists of diamond.

また、特許文献3には、内部を真空可能な管本体と、該管本体に設けられて前記管本体内で電子ビームを発生する電子源と、前記管本体に設けられて前記電子源からの電子ビームの照射によりX線を発生する金属ターゲットとを備えたX線発生装置において、前記金属ターゲットを、微小サイズにパターンニングされた金属薄膜で構成してあり、前記電子ビームが前記金属ターゲットの被照射面の一部を照射するように設けてあり、前記金属ターゲットが基材に埋め込まれたことが記載されている。   Patent Document 3 discloses a tube main body that can be evacuated inside, an electron source that is provided in the tube main body and generates an electron beam in the tube main body, and is provided in the tube main body from the electron source. An X-ray generator comprising a metal target that generates X-rays upon irradiation with an electron beam, wherein the metal target is composed of a metal thin film patterned in a minute size, and the electron beam is formed on the metal target. It is provided that a part of the irradiated surface is irradiated and the metal target is embedded in the base material.

特公昭34−10727号公報Japanese Patent Publication No. 34-10727 特開平7−169422号公報JP-A-7-169422 特開2001−35428号公報JP 2001-35428 A

しかしながら、上記特許文献1乃至3のいずれにも、電子ビーム照射ターゲット位置の変動の影響を受けることなく、高出力のX線を一定方向に安定して放出することについて考慮されていなかった。   However, none of the above-mentioned Patent Documents 1 to 3 considers the stable emission of high-power X-rays in a certain direction without being affected by fluctuations in the electron beam irradiation target position.

本発明の目的は、上記課題を解決すべく、電磁気的な要因で電子ビーム照射ターゲット位置が数μm程度の変動の影響を受けることなく、10〜50μm程度の微小径特性X線を一本あるいは複数本のビームとして一定方向に安定して取り出せることを可能にしたX線発生装置ならびに該X線発生装置を備えたX線分析装置、X線透過像計測装置及びX線干渉計を提供することにある。   An object of the present invention is to solve the above-mentioned problems by using a single X-ray having a small diameter of about 10 to 50 μm without affecting the position of the electron beam irradiation target by about several μm due to electromagnetic factors. To provide an X-ray generator capable of stably taking out a plurality of beams in a fixed direction, an X-ray analyzer equipped with the X-ray generator, an X-ray transmission image measuring device, and an X-ray interferometer It is in.

上記目的を達成するために、本発明は、内部を真空可能に構成した管本体と、該管本体内において電子ビームを発生する電子源と、前記管本体内に設けられ、前記電子源からの電子ビームが照射されることによりX線を発生するためのターゲット部材とを備えたX線発生装置において、前記ターゲット部材を、繰り返される複数の微小幅のストライプ状金属薄膜(金属ターゲット)を基材に埋め込んで形成し、前記電子ビームを前記特定のストライプ状金属薄膜(金属ターゲット)に照射することにより前記特定のストライプ状金属薄膜(金属ターゲット)から特性X線を低角度でX線窓を通して外部に出射するように構成したことを特徴とする。   In order to achieve the above object, the present invention provides a tube main body configured to be evacuated inside, an electron source for generating an electron beam in the tube main body, and provided in the tube main body, from the electron source. In an X-ray generator comprising a target member for generating X-rays by irradiation with an electron beam, the target member is made of a plurality of repeated striped metal thin films (metal targets) having a small width. The characteristic X-rays are emitted from the specific stripe-shaped metal thin film (metal target) at a low angle through the X-ray window by irradiating the specific stripe-shaped metal thin film (metal target) with the electron beam. It is characterized by being configured to emit light.

また、本発明は、前記X線発生装置において、前記基材に埋め込まれたストライプ状金属薄膜(金属ターゲット)の前記微小幅が、前記ターゲット部材上に照射される前記電子ビームの径よりも狭いことを特徴とする。   In the X-ray generator according to the present invention, the fine width of the stripe-shaped metal thin film (metal target) embedded in the base material is narrower than the diameter of the electron beam irradiated onto the target member. It is characterized by that.

また、本発明は、前記X線発生装置において、さらに、前記電子源から出射される電子ビームを前記ターゲット部材上に集束して照射させる電子レンズを備えたことを特徴とする。   Further, the present invention is characterized in that the X-ray generator further comprises an electron lens that focuses and irradiates an electron beam emitted from the electron source onto the target member.

また、本発明は、前記X線発生装置の前記ターゲット部材において、前記基材を銅材で形成したときは、前記ストライプ状金属薄膜をモリブデン、金、銀、タングステン、ニッケル、クロムのいずれかを用いて形成したことを特徴とする。   In the target member of the X-ray generator, when the base material is formed of a copper material, the striped metal thin film is made of molybdenum, gold, silver, tungsten, nickel, or chromium. It was formed using.

また、本発明は、前記X線発生装置の前記ターゲット部材において、前記基材を銅材とその表面にタングステン膜を形成して構成した場合には、前記ストライプ状金属薄膜をモリブデン、金、銀、銅、ニッケル、クロムのいずれかを用いて形成したことを特徴とする。   Further, in the target member of the X-ray generator, when the base material is formed of a copper material and a tungsten film on the surface thereof, the striped metal thin film is formed of molybdenum, gold, silver. , Copper, nickel, or chromium.

また、本発明は、前記X線発生装置の前記ターゲット部材上において照射される前記電子ビームの径が40〜500μmの範囲内であることを特徴とする。   Moreover, the present invention is characterized in that the diameter of the electron beam irradiated on the target member of the X-ray generator is within a range of 40 to 500 μm.

また、本発明は、前記X線発生装置において、前記ターゲット部材は、前記ストライプ状金属薄膜の下地に合成ダイヤモンド層を有することを特徴とする。   In the X-ray generator according to the present invention, the target member has a synthetic diamond layer on a base of the striped metal thin film.

また、本発明は、前記X線発生装置を備えたことを特徴とするX線分析装置である。   In addition, the present invention is an X-ray analysis apparatus comprising the X-ray generation apparatus.

また、本発明は、前記X線発生装置を備えたことを特徴とするX線透過像計測装置である。   In addition, the present invention is an X-ray transmission image measuring apparatus comprising the X-ray generator.

また、本発明は、前記X線発生装置を備えたことを特徴とするX線干渉計である。   The present invention also provides an X-ray interferometer including the X-ray generator.

本発明によれば、X線発生装置において、電磁気的な要因で数μm程度の電子ビーム照射位置がターゲット部材上でドリフトしても、10〜50μm程度の微小径の特性X線を一定方向に安定して出射すること可能にした。   According to the present invention, in an X-ray generator, even if an electron beam irradiation position of about several μm drifts on the target member due to electromagnetic factors, characteristic X-rays with a minute diameter of about 10 to 50 μm are directed in a certain direction. It was possible to emit light stably.

本発明に係るストライプ状のX線金属ターゲット(金属薄膜)を備えたX線発生装置(X線管)ならびに該X線発生装置を備えたX線分析装置、X線透過像計測装置及びX線干渉計の実施の形態について図面を用いて説明する。   X-ray generator (X-ray tube) provided with a striped X-ray metal target (metal thin film) according to the present invention, an X-ray analyzer provided with the X-ray generator, an X-ray transmission image measuring device, and an X-ray An embodiment of an interferometer will be described with reference to the drawings.

[第1の実施の形態]
図1は、本発明に係るストライプ状のX線金属ターゲット(金属薄膜)を備えたX線発生装置(X線管)の第1の実施の形態を示す斜視図である。図2は、本発明に係るストライプ状のX線金属ターゲット(金属薄膜)を備えたX線発生装置(X線管)の第1の実施の形態を示す断面図である。即ち、本発明に係るX線発生装置(X線管)の第1の実施の形態は、内部を真空可能に構成したステンレス製のX線管本体1に電子源2と陽極3を形成するターゲット部材3a及び3bとを設けて構成される。電子源2はフィラメント電源41による加熱で熱電子を放出し陰極を構成するフィラメント21と、電子ビーム23を30〜60μm程度(特性X線の径を10〜30μm程度を得ようとする場合)に収束する電子レンズ22とを備えて構成される。電子レンズ22は、静電場によるものでも、磁場によるものでも同等の効果を発揮する。本実施例では静電レンズによるものを示しており、特にバイアス電圧42を印加しなくても電子ビームの金属ターゲット上収束径30〜60μmを得ることは可能である。フィラメント21と陽極3との間には金属ターゲット(金属薄膜)3aに対して収束させた電子ビーム23を照射するための高圧電源4が設けられている。発生したX線はX線取り出し窓34の方向に射出されるもの35がX線発生装置から取り出され使用される。
[First Embodiment]
FIG. 1 is a perspective view showing a first embodiment of an X-ray generator (X-ray tube) provided with a striped X-ray metal target (metal thin film) according to the present invention. FIG. 2 is a cross-sectional view showing a first embodiment of an X-ray generator (X-ray tube) provided with a striped X-ray metal target (metal thin film) according to the present invention. That is, in the first embodiment of the X-ray generator (X-ray tube) according to the present invention, the target for forming the electron source 2 and the anode 3 on the stainless steel X-ray tube main body 1 configured to be evacuated inside. Members 3a and 3b are provided. The electron source 2 emits thermoelectrons when heated by the filament power source 41 and the filament 21 constituting the cathode and the electron beam 23 are about 30 to 60 μm (when the characteristic X-ray diameter is about 10 to 30 μm). And a converging electron lens 22. The electron lens 22 exhibits the same effect regardless of whether it is based on an electrostatic field or a magnetic field. In this embodiment, an electrostatic lens is used, and it is possible to obtain a convergence diameter of 30 to 60 μm on the metal target of the electron beam without applying the bias voltage 42 in particular. Between the filament 21 and the anode 3, a high voltage power source 4 for irradiating an electron beam 23 focused on a metal target (metal thin film) 3a is provided. The generated X-rays 35 that are emitted in the direction of the X-ray extraction window 34 are extracted from the X-ray generator and used.

ターゲット部材31は、熱伝導率の高い(0.94cal/cm・sec・deg)銅(Cu)等からなる基材3aに10〜20μm程度の厚さで目的とするX線発生ビーム径より狭い幅をもつストライプ状の金属ターゲット(金属薄膜)(例えばモリブデン(Mo)、金(Au)、銀(Ag)、タングステン(W)、ニッケル(Ni)、クロム(Cr)等)3bをターゲット表面から3〜15度程度の角度(β)でX線取り出し窓34の射出取り出し方向に対して、ほぼ直角方向に所定のピッチ(間隔)で繰り返し埋め込んで形成される。上記所定のピッチ(間隔)としては、30〜60μm程度で形成される。これは電子ビームの収束径より大きい数値を用いる。また、ターゲット部材31は、基材3aを熱伝導率の高い銅材とその表面にタングステン膜を形成して構成した場合には、10〜20μm程度の厚さで目的とするX線発生ビーム径より狭い幅をもつストライプ状の金属ターゲット(金属薄膜)(例えばモリブデン(Mo)、金(Au)、銀(Ag)、銅(Cu)、ニッケル(Ni)、クロム(Cr)等)3bをターゲット表面から3〜15度程度の角度(β)でX線取り出し窓34の射出取り出し方向に対して、ほぼ直角方向に所定のピッチ(間隔)で繰り返し埋め込んで形成される。また、ターゲット部材31の裏面には図2に示すように冷却水5を流す流路が設けられ、ターゲット部材31で発生する熱を除去できるようにしている。熱の除去はターゲット部材31の裏面を直接冷却する方法以外に図3に示すようにターゲット部材31からの熱を除去するように熱伝導セラミックス36によりX線管1の表面を冷却する方式も可能である。   The target member 31 is narrower than the target X-ray generation beam diameter at a thickness of about 10 to 20 μm on a base material 3a made of copper (Cu) or the like having high thermal conductivity (0.94 cal / cm · sec · deg). Striped metal target (metal thin film) having a width (for example, molybdenum (Mo), gold (Au), silver (Ag), tungsten (W), nickel (Ni), chromium (Cr), etc.)) 3b from the target surface It is formed by being repeatedly embedded at a predetermined pitch (interval) in a direction substantially perpendicular to the exit extraction direction of the X-ray extraction window 34 at an angle (β) of about 3 to 15 degrees. The predetermined pitch (interval) is about 30 to 60 μm. For this, a numerical value larger than the convergence diameter of the electron beam is used. Further, the target member 31 has a target X-ray generation beam diameter of about 10 to 20 μm when the base material 3a is formed by forming a copper material having a high thermal conductivity and a tungsten film on the surface thereof. Target a striped metal target (metal thin film) 3b (for example, molybdenum (Mo), gold (Au), silver (Ag), copper (Cu), nickel (Ni), chromium (Cr), etc.)) 3b having a narrower width It is formed by being repeatedly embedded at a predetermined pitch (interval) in a direction substantially perpendicular to the emission extraction direction of the X-ray extraction window 34 at an angle (β) of about 3 to 15 degrees from the surface. Further, as shown in FIG. 2, a flow path through which the cooling water 5 flows is provided on the back surface of the target member 31 so that heat generated in the target member 31 can be removed. In addition to the method of directly cooling the back surface of the target member 31, heat can be removed by cooling the surface of the X-ray tube 1 with the heat conductive ceramics 36 so as to remove the heat from the target member 31 as shown in FIG. It is.

本発明ではターゲット部材31に基材3aとストライプ状金属薄膜3bを用いるので、電子ビームの照射により2種類以上の金属からの特性X線がターゲットから放出されることになる。特性X線は金属毎に決まっており、例えば基材3aに用いる銅(Cu)の特性X線(Kα)は8.04keV、ストライプ状金属薄膜3bにモリブデンを用いたときにはモリブデン(Mo)の特性X線(Kα)17.4keVが同時に放出されることになる。このうち17.4keVの特性X線だけを使うためには図4に示すX線弁別用モノクロメータあるいは多層膜を形成した反射鏡等のX線選択デバイス51を用いて試料にX線を照射することがある。X線選択デバイス51を用いない方法としては、図4に示す本発明のX線発生装置11を用いるX線分析装置、X線透過像計測装置又はX線干渉計52におけるX線検出器54にX線弁別能力をもつものを適用することにより、データ処理装置55の中で17.4keVの特性X線に由来するデータのみを用いてデータ解析することにより、所望の解析結果を得ることができる。   In the present invention, since the base member 3a and the striped metal thin film 3b are used for the target member 31, characteristic X-rays from two or more kinds of metals are emitted from the target by irradiation with an electron beam. The characteristic X-ray is determined for each metal. For example, the characteristic X-ray (Kα) of copper (Cu) used for the base material 3a is 8.04 keV, and the molybdenum (Mo) characteristic when molybdenum is used for the striped metal thin film 3b. X-rays (Kα) 17.4 keV are emitted at the same time. Of these, in order to use only 17.4 keV characteristic X-rays, the sample is irradiated with X-rays using an X-ray discrimination monochromator shown in FIG. 4 or an X-ray selection device 51 such as a reflecting mirror formed with a multilayer film. Sometimes. As a method not using the X-ray selection device 51, an X-ray analysis apparatus, an X-ray transmission image measurement apparatus using the X-ray generation apparatus 11 of the present invention shown in FIG. By applying a device having X-ray discrimination capability, a desired analysis result can be obtained by performing data analysis using only data derived from characteristic X-rays of 17.4 keV in the data processing device 55. .

X線励起用電子ビーム23は静電場あるいは電磁場により収束して照射するが、電子ビームは地磁気の変化や搭載されるX線分析装置、X線透過像計測装置又はX線分析計の駆動モータによる磁場の影響でその収束位置が目的の位置からわずかにずれる。このため、電子レンズ22に磁気シールド効果のある金属材料を用いることにより、電子ビーム収束位置のずれあるいは時間的な変動を抑制することができる。しかし、周囲の磁場の影響を完全に遮断することは難しく、わずかな位置ずれが生じる。   The X-ray excitation electron beam 23 is converged and irradiated by an electrostatic field or an electromagnetic field. The electron beam is changed by a change in geomagnetism or an X-ray analyzer, an X-ray transmission image measuring device, or a drive motor of the X-ray analyzer. The convergence position slightly deviates from the target position due to the magnetic field. For this reason, by using a metal material having a magnetic shielding effect for the electron lens 22, it is possible to suppress the deviation or temporal variation of the electron beam convergence position. However, it is difficult to completely block the influence of the surrounding magnetic field, and a slight misalignment occurs.

本発明に係るX線発生装置(X線管)ではストライプ状金属薄膜ターゲット3bに収束電子ビームを照射する構造としているため、磁場が電子ビーム照射位置に影響を与えても、所望の特性X線を発生する部分はストライプ状となっているため、ストライプ状金属薄膜ターゲット3bに直交した方向成分ではX線発生の位置は変動しない。一方、ストライプ状金属薄膜3bに平行な方向に位置変動する場合は図5に示すように電子ビーム照射位置24の変動25を生じる。しかし、本発明のX線発生装置(X線管)ではターゲット部材31面に対するX線の取り出し角(β)を6度に選択するため、X線取り出し方向での見かけ上の図6に示すように位置変動はターゲット部材31面上の変動の1/10程度に抑制している。従って、30マイクロm径の電子ビームが10μm位置移動しても、X線発生部分の位置変動は1μm程度に抑制され、X線発生部分の直径の5%以内の位置変動に抑制することが可能である。ここで、ストライプ状金属薄膜ターゲット3bを照射する電子ビーム23の形状をストライプと平行な方向にはストライプの幅とsinβで割り算した商の大きさに選択すると、X線ビームの見かけの大きさが円あるいは正方形の類似の形状とすることができ、使用上好ましい。なお、X線の取り出し角(β)は3〜15度の範囲内で選択することが可能である。   Since the X-ray generator (X-ray tube) according to the present invention is configured to irradiate the stripe-shaped metal thin film target 3b with a focused electron beam, even if the magnetic field affects the electron beam irradiation position, a desired characteristic X-ray is obtained. Since the portion that generates the light has a stripe shape, the position of the X-ray generation does not change in the direction component orthogonal to the stripe-shaped metal thin film target 3b. On the other hand, when the position varies in a direction parallel to the stripe-shaped metal thin film 3b, a variation 25 of the electron beam irradiation position 24 occurs as shown in FIG. However, in the X-ray generation apparatus (X-ray tube) of the present invention, since the X-ray extraction angle (β) with respect to the surface of the target member 31 is selected to be 6 degrees, as shown in FIG. 6 apparent in the X-ray extraction direction. The position variation is suppressed to about 1/10 of the variation on the surface of the target member 31. Therefore, even if an electron beam with a diameter of 30 μm moves to a position of 10 μm, the position fluctuation of the X-ray generation part is suppressed to about 1 μm, and can be suppressed to a position fluctuation within 5% of the diameter of the X-ray generation part. It is. Here, if the shape of the electron beam 23 that irradiates the stripe-shaped metal thin film target 3b is selected to be a quotient size divided by the stripe width and sin β in the direction parallel to the stripe, the apparent size of the X-ray beam is obtained. A similar shape such as a circle or a square can be used, which is preferable in use. The X-ray extraction angle (β) can be selected within a range of 3 to 15 degrees.

本発明は、ストライプ状金属薄膜ターゲット3bを複数本形成することにより、電子ビーム照射位置の初期調整において最大でもストライプの間隔に相当する距離を電子源2を水平に移動するだけで、X線の取り出せるターゲット位置を得ることができる。このため、本発明の構成により微小焦点のX線発生装置として、高い生産性を獲得している。   In the present invention, by forming a plurality of stripe-shaped metal thin film targets 3b, the initial adjustment of the electron beam irradiation position can be performed by moving the electron source 2 horizontally by a distance corresponding to the distance between the stripes at the maximum. A target position that can be taken out can be obtained. For this reason, the configuration of the present invention has achieved high productivity as a microfocus X-ray generator.

[第2の実施の形態]
本発明に係るストライプ状のX線金属ターゲット(金属薄膜)を備えたX線発生装置(X線管)の第2の実施の形態において、第1の実施の形態と相違する点は、図6を用いて説明する。
[Second Embodiment]
The second embodiment of the X-ray generator (X-ray tube) provided with the striped X-ray metal target (metal thin film) according to the present invention is different from the first embodiment in that FIG. Will be described.

図6に示す第2の実施の形態と第1の実施の形態との相違点は、金属薄膜ターゲット部材3bの下地に銅の熱伝導率の2〜5倍の熱伝導率を有する合成ダイヤモンド層33を形成したことにある。この構造の特徴は、電子ビーム照射による電流が金属薄膜ターゲット3bの電気伝導でX線発生用高圧電源4に戻され、発生する熱が金属薄膜ターゲット部材3bとダイヤモンド層33とにより伝達される。ここで、金属薄膜ターゲット部材3bの厚さは電子ビームの侵入深さ程度とし、10〜50μm程度の厚さとなる。50μm以下の厚さの金属薄膜の熱伝導は大きくないため、熱伝導は主として金属薄膜ターゲット材3bより厚く形成されるダイヤモンド層33により行われる。このダイヤモンド層33の熱伝導が高いため単一の金属でターゲット全体を形成するより、X線発生部位となる電子ビーム照射部位の冷却効率が大きくなる。この効果を図7に示す。   The difference between the second embodiment shown in FIG. 6 and the first embodiment is that a synthetic diamond layer having a thermal conductivity of 2 to 5 times the thermal conductivity of copper on the base of the metal thin film target member 3b. 33 is formed. The feature of this structure is that the current caused by the electron beam irradiation is returned to the X-ray generation high-voltage power supply 4 by electrical conduction of the metal thin film target 3 b, and the generated heat is transmitted by the metal thin film target member 3 b and the diamond layer 33. Here, the thickness of the metal thin film target member 3b is about the penetration depth of the electron beam, and is about 10 to 50 μm. Since the heat conduction of the metal thin film having a thickness of 50 μm or less is not large, the heat conduction is mainly performed by the diamond layer 33 formed thicker than the metal thin film target material 3b. Since the diamond layer 33 has a high thermal conductivity, the cooling efficiency of the electron beam irradiation site, which is the X-ray generation site, is greater than the case where the entire target is formed of a single metal. This effect is shown in FIG.

合成ダイヤモンド層33の熱伝導率を銅の2倍とし、合成ダイヤモンド層の厚さをX線発生部位となる電子ビーム照射部位の直径以上とすると、図7の鎖線に示すように銅と同等以上の熱流量を示す部位37の断面積は約4.5倍以上となり、金属薄膜ターゲット部材3b下部に合成ダイヤモンド層を使わないときに比べて大きな電子ビーム電力の照射が可能となる。実際には金属薄膜ターゲット部材3bからダイヤモンド層33への界面での熱伝導ロス等が生じるので、熱流量は2倍程度となる。   Assuming that the thermal conductivity of the synthetic diamond layer 33 is twice that of copper and the thickness of the synthetic diamond layer is equal to or greater than the diameter of the electron beam irradiation site serving as the X-ray generation site, as shown by the chain line in FIG. The cross-sectional area of the portion 37 showing the heat flow is about 4.5 times or more, and it is possible to irradiate a larger electron beam power than when the synthetic diamond layer is not used under the metal thin film target member 3b. Actually, heat conduction loss or the like occurs at the interface from the metal thin film target member 3b to the diamond layer 33, so that the heat flow rate is about double.

合成ダイヤモンド層33上に作製される金属薄膜ターゲット3bはストライプ状構造をもつものでも熱伝導及び金属薄膜ターゲット冷却に関する効果は同じであり、本発明に係る第2の実施の形態を用いることにより従来例より大きな電子ビーム電力を印加することが可能である。従って、本発明に係る金属薄膜ターゲット及びダイヤモンド高熱伝導層をもったX線発生装置(X線管)により30μmの電子ビーム照射径に対し50W以上の電子ビーム電力を印加することが可能となるとともに、X線発生部位の位置変動が3μm以下の安定したX線発生装置とすることが可能である。さらに、本発明のX線発生装置(X線管)を用いてX線分析装置、X線透過像計測装置あるいはX線干渉計を構成することにより、従来技術と比較して分析精度が高く安定したX線分析装置、高解像度のX線透過像計測装置あるいはX線干渉計を提供することが可能となる。   Even if the metal thin film target 3b produced on the synthetic diamond layer 33 has a stripe-like structure, the effects on the heat conduction and the metal thin film target cooling are the same. By using the second embodiment according to the present invention, the metal thin film target 3b is conventionally used. It is possible to apply a higher electron beam power than the example. Therefore, it becomes possible to apply an electron beam power of 50 W or more to an electron beam irradiation diameter of 30 μm by an X-ray generator (X-ray tube) having a metal thin film target and a diamond high thermal conductive layer according to the present invention. It is possible to provide a stable X-ray generation apparatus in which the position variation of the X-ray generation site is 3 μm or less. Furthermore, by using the X-ray generator (X-ray tube) according to the present invention to form an X-ray analyzer, an X-ray transmission image measuring device, or an X-ray interferometer, the analysis accuracy is high and stable compared to the prior art. It is possible to provide an X-ray analysis apparatus, a high-resolution X-ray transmission image measurement apparatus, or an X-ray interferometer.

本発明に係るストライプ状の金属薄膜ターゲットを備えたX線発生装置(X線管)の第1の実施の形態の概略構成を示す斜視図。The perspective view which shows schematic structure of 1st Embodiment of the X-ray generator (X-ray tube) provided with the stripe-shaped metal thin film target which concerns on this invention. 本発明に係るストライプ状の金属薄膜ターゲットを備えたX線発生装置(X線管)の第1の実施の形態の金属薄膜ターゲット及び冷却方法の構成を示す斜視図。The perspective view which shows the structure of the metal thin film target and cooling method of 1st Embodiment of the X-ray generator (X-ray tube) provided with the stripe-shaped metal thin film target which concerns on this invention. 本発明に係るストライプ状の金属薄膜ターゲットを備えたX線発生装置(X線管)の第1の実施の形態のX線管外側から金属薄膜ターゲットを冷却する方法の構成を示す斜視図。The perspective view which shows the structure of the method of cooling a metal thin film target from the X-ray tube outer side of 1st Embodiment of X-ray generator (X-ray tube) provided with the stripe-shaped metal thin film target which concerns on this invention. 本発明に係るストライプ状の金属薄膜ターゲットを備えたX線発生装置(X線管)を用いたX線分析装置並びにX線透過像計測装置及びX線干渉計の構成を示す概略図の第1の実施の形態の金属薄膜ターゲット及び冷却方法の構成を示す斜視図。FIG. 1 is a first schematic diagram illustrating the configuration of an X-ray analyzer, an X-ray transmission image measuring device, and an X-ray interferometer using an X-ray generator (X-ray tube) including a stripe-shaped metal thin film target according to the present invention. The perspective view which shows the structure of the metal thin film target of this embodiment, and the cooling method. 本発明に係るストライプ状の金属薄膜ターゲット及び電子ビームの移動を示す上面図。The top view which shows the movement of a striped metal thin film target and electron beam concerning the present invention. 本発明に係るストライプ状の金属薄膜ターゲットを備えたX線発生装置(X線管)の第2の実施の形態の金属薄膜ターゲット及び冷却方法の構成を示す斜視図。The perspective view which shows the structure of the metal thin film target and cooling method of 2nd Embodiment of the X-ray generator (X-ray tube) provided with the stripe-shaped metal thin film target which concerns on this invention. 本発明に係るストライプ状の金属薄膜ターゲットを備えたX線発生装置(X線管)の第2の実施の形態の金属薄膜ターゲットの高効率冷却方法の説明図。Explanatory drawing of the highly efficient cooling method of the metal thin film target of 2nd Embodiment of the X-ray generator (X-ray tube) provided with the striped metal thin film target which concerns on this invention.

符号の説明Explanation of symbols

1…X線管本体、2…電子源、3…陽極、4…高圧電源、11…X線発生装置、21…フィラメント、22…電子レンズ、23…電子ビーム、24…電子ビーム照射部、25…電子ビームの位置変動、31…ターゲット部材、3a…基材、3b…金属ターゲット、33…ダイヤモンド層、35…X線、36…熱伝導セラミックス、37…高熱流量部、41…フィラメント電源、42…バイアス電源、51…X線選択デバイス、52…X線分析装置あるいはX線透過像計測装置あるいはX線干渉計、53…試料、54…X線検出器、55…データ処理装置。   DESCRIPTION OF SYMBOLS 1 ... X-ray tube main body, 2 ... Electron source, 3 ... Anode, 4 ... High voltage power supply, 11 ... X-ray generator, 21 ... Filament, 22 ... Electron lens, 23 ... Electron beam, 24 ... Electron beam irradiation part, 25 ... Position variation of electron beam, 31 ... Target member, 3a ... Base material, 3b ... Metal target, 33 ... Diamond layer, 35 ... X-ray, 36 ... Thermally conductive ceramics, 37 ... High heat flow rate part, 41 ... Filament power source, 42 ... Bias power supply, 51... X-ray selection device, 52... X-ray analyzer or X-ray transmission image measuring device or X-ray interferometer, 53.

Claims (4)

内部を真空可能に構成した管本体と、該管本体内において電子ビームを発生する電子源と、前記管本体内に設けられ、前記電子源から出射される電子ビームが照射されることによりX線を発生するためのターゲット部材とを備えたX線発生装置において、
前記電子源から出射される電子ビームを前記ターゲット部材上に径が30〜60μmの範囲内で集束して照射させる電子レンズを備え、かつ、当該電子レンズに磁気シールド効果のある金属材料を用い、
さらに、前記ターゲット部材を、熱伝導が銅の2〜5倍の合成ダイヤモンド層の基材と、当該基材上に形成の繰り返される前記ターゲット部材上に照射される前記電子ビームの径よりも狭い複数の微小幅のストライプ状金属薄膜とで構成するとともに、前記合成ダイヤモンド層の基材を前記ストライプ状金属薄膜より厚く形成し、
前記電子源から出射される電子ビームを前記電子レンズにより前記ストライプ状金属薄膜に集束して照射させることにより、前記ストライプ状金属薄膜から発生する特性X線を低角度でX線窓を通して外部に出射させるとともに、前記ストライプ状金属薄膜から発生する熱を前記合成ダイヤモンド層の基材に伝達させて前記ストライプ状金属薄膜を冷却させることを特徴とするX線発生装置。
A tube main body configured to be evacuated inside, an electron source that generates an electron beam in the tube main body, an X-ray that is provided in the tube main body and irradiated with an electron beam emitted from the electron source In an X-ray generator provided with a target member for generating
An electron lens for focusing and irradiating an electron beam emitted from the electron source on the target member within a range of 30 to 60 μm in diameter is used, and a metal material having a magnetic shielding effect is used for the electron lens. ,
Further, the target member, the substrate of the thermal conductivity of 2 to 5 times the synthetic diamond layer of copper, than the diameter of the electron beam irradiated onto the target member repeated a formed on the substrate It is composed of a plurality of narrow micro-width striped metal thin films, and the synthetic diamond layer substrate is formed thicker than the striped metal thin films,
The electron beam emitted from the electron source is focused on the stripe-shaped metal thin film by the electron lens and irradiated to emit characteristic X-rays generated from the stripe-shaped metal thin film to the outside through an X-ray window at a low angle. And an X-ray generator that cools the striped metal thin film by transferring heat generated from the striped metal thin film to the base material of the synthetic diamond layer.
請求項1に記載のX線発生装置を備えたことを特徴とするX線分析装置。   An X-ray analyzer comprising the X-ray generator according to claim 1. 請求項1に記載のX線発生装置を備えたことを特徴とするX線透過像計測装置。   An X-ray transmission image measurement apparatus comprising the X-ray generation apparatus according to claim 1. 請求項1に記載のX線発生装置を備えたことを特徴とするX線干渉計。   An X-ray interferometer comprising the X-ray generator according to claim 1.
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