JPH0620931Y2 - 滑り制限差動装置 - Google Patents

滑り制限差動装置

Info

Publication number
JPH0620931Y2
JPH0620931Y2 JP3506589U JP3506589U JPH0620931Y2 JP H0620931 Y2 JPH0620931 Y2 JP H0620931Y2 JP 3506589 U JP3506589 U JP 3506589U JP 3506589 U JP3506589 U JP 3506589U JP H0620931 Y2 JPH0620931 Y2 JP H0620931Y2
Authority
JP
Japan
Prior art keywords
gear
clutch plate
cam portion
drive gear
drive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP3506589U
Other languages
English (en)
Japanese (ja)
Other versions
JPH02125236U (US20070167544A1-20070719-C00007.png
Inventor
正夫 寺岡
光雄 瓦井
Original Assignee
栃木富士産業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 栃木富士産業株式会社 filed Critical 栃木富士産業株式会社
Priority to JP3506589U priority Critical patent/JPH0620931Y2/ja
Priority to DE69013037T priority patent/DE69013037T2/de
Priority to US07/498,844 priority patent/US5037362A/en
Priority to EP90303197A priority patent/EP0390466B1/en
Publication of JPH02125236U publication Critical patent/JPH02125236U/ja
Application granted granted Critical
Publication of JPH0620931Y2 publication Critical patent/JPH0620931Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Retarders (AREA)
JP3506589U 1989-03-28 1989-03-28 滑り制限差動装置 Expired - Lifetime JPH0620931Y2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP3506589U JPH0620931Y2 (ja) 1989-03-28 1989-03-28 滑り制限差動装置
DE69013037T DE69013037T2 (de) 1989-03-28 1990-03-26 Schlupfbegrenztes Differential.
US07/498,844 US5037362A (en) 1989-03-28 1990-03-26 Limited slip differential
EP90303197A EP0390466B1 (en) 1989-03-28 1990-03-26 Limited slip deferential

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3506589U JPH0620931Y2 (ja) 1989-03-28 1989-03-28 滑り制限差動装置

Publications (2)

Publication Number Publication Date
JPH02125236U JPH02125236U (US20070167544A1-20070719-C00007.png) 1990-10-16
JPH0620931Y2 true JPH0620931Y2 (ja) 1994-06-01

Family

ID=31540099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3506589U Expired - Lifetime JPH0620931Y2 (ja) 1989-03-28 1989-03-28 滑り制限差動装置

Country Status (1)

Country Link
JP (1) JPH0620931Y2 (US20070167544A1-20070719-C00007.png)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8900778B2 (en) 2008-09-01 2014-12-02 D2S, Inc. Method for forming circular patterns on a surface
US8916315B2 (en) 2009-08-26 2014-12-23 D2S, Inc. Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
US9164372B2 (en) 2009-08-26 2015-10-20 D2S, Inc. Method and system for forming non-manhattan patterns using variable shaped beam lithography
US9274412B2 (en) 2008-09-01 2016-03-01 D2S, Inc. Method and system for design of a reticle to be manufactured using variable shaped beam lithography
US9323140B2 (en) 2008-09-01 2016-04-26 D2S, Inc. Method and system for forming a pattern on a reticle using charged particle beam lithography
US9341936B2 (en) 2008-09-01 2016-05-17 D2S, Inc. Method and system for forming a pattern on a reticle using charged particle beam lithography
US9372391B2 (en) 2008-09-01 2016-06-21 D2S, Inc. Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
US9400857B2 (en) 2011-09-19 2016-07-26 D2S, Inc. Method and system for forming patterns using charged particle beam lithography
US9448473B2 (en) 2009-08-26 2016-09-20 D2S, Inc. Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
US9465297B2 (en) 2011-06-25 2016-10-11 D2S, Inc. Method and system for forming patterns with charged particle beam lithography

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8900778B2 (en) 2008-09-01 2014-12-02 D2S, Inc. Method for forming circular patterns on a surface
US9268214B2 (en) 2008-09-01 2016-02-23 D2S, Inc. Method for forming circular patterns on a surface
US9274412B2 (en) 2008-09-01 2016-03-01 D2S, Inc. Method and system for design of a reticle to be manufactured using variable shaped beam lithography
US9323140B2 (en) 2008-09-01 2016-04-26 D2S, Inc. Method and system for forming a pattern on a reticle using charged particle beam lithography
US9341936B2 (en) 2008-09-01 2016-05-17 D2S, Inc. Method and system for forming a pattern on a reticle using charged particle beam lithography
US9372391B2 (en) 2008-09-01 2016-06-21 D2S, Inc. Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
US8916315B2 (en) 2009-08-26 2014-12-23 D2S, Inc. Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
US9164372B2 (en) 2009-08-26 2015-10-20 D2S, Inc. Method and system for forming non-manhattan patterns using variable shaped beam lithography
US9448473B2 (en) 2009-08-26 2016-09-20 D2S, Inc. Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
US9465297B2 (en) 2011-06-25 2016-10-11 D2S, Inc. Method and system for forming patterns with charged particle beam lithography
US9400857B2 (en) 2011-09-19 2016-07-26 D2S, Inc. Method and system for forming patterns using charged particle beam lithography

Also Published As

Publication number Publication date
JPH02125236U (US20070167544A1-20070719-C00007.png) 1990-10-16

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