JPH0620496A - Semiconductor memory - Google Patents

Semiconductor memory

Info

Publication number
JPH0620496A
JPH0620496A JP4173923A JP17392392A JPH0620496A JP H0620496 A JPH0620496 A JP H0620496A JP 4173923 A JP4173923 A JP 4173923A JP 17392392 A JP17392392 A JP 17392392A JP H0620496 A JPH0620496 A JP H0620496A
Authority
JP
Japan
Prior art keywords
level
word line
signal
word
semiconductor memory
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP4173923A
Other languages
Japanese (ja)
Inventor
Yasuhiro Edo
靖浩 江戸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP4173923A priority Critical patent/JPH0620496A/en
Publication of JPH0620496A publication Critical patent/JPH0620496A/en
Withdrawn legal-status Critical Current

Links

Abstract

PURPOSE:To shorten a reliability acceleration test time by providing a word line simultaneous selection means, making the output ends of the signals of the same level and the inverse level as each bit of the address signal of an address buffer an active level also and making plural word lines a selection level simultaneously. CONSTITUTION:When a test signal TSTb becomes the active level, the levels in the output ends of the signals A1, A1b, A2, A2b... of the address buffer 1 become 'H' also. Thus, the output ends, as well of the inverters IV9-IV12... of an X decoder 3 become 'H' also, and transistors Q3-Q6 are turned on, and the word line drive voltage VWd of higher level than at a regular operation time is applied to each word line. In such a manner, since plural pieces of word lines become the higher level than at the regular operation time simultaneously, the reliability acceleration test time is shortened.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体記憶装置に関し、
特に信頼性加速試験を行う半導体記憶装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor memory device,
In particular, it relates to a semiconductor memory device that performs a reliability acceleration test.

【0002】[0002]

【従来の技術】従来の半導体記憶装置の信頼性加速試験
には、試験対象の半導体記憶装置に規定電圧以上の電圧
を加えて試験する電圧加速方法や、耐電圧,耐熱などの
試験方法があるが、この中の電圧加速方法について説明
する。
2. Description of the Related Art A conventional semiconductor memory device reliability acceleration test includes a voltage acceleration method of applying a voltage higher than a specified voltage to a semiconductor memory device to be tested, and a test method of withstanding voltage, heat resistance and the like. However, the voltage acceleration method among them will be described.

【0003】図3及び図4はそれぞれ電圧加速試験方法
による信頼性加速試験が実施される従来の半導体記憶装
置のブロック図及びその各部内部回路の具体例を示す回
路図である。
3 and 4 are a block diagram of a conventional semiconductor memory device in which a reliability acceleration test is performed by a voltage acceleration test method and a circuit diagram showing a concrete example of an internal circuit of each part thereof.

【0004】この半導体記憶装置は、インバータ(IV
1〜IV8…)を備え複数ビットのアドレス信号Aj
(j=1,2,…)を入力しこのアドレス信号Ajの各
ビットと同一レベル(Aj)及びその反転レベル(Aj
b)の信号を出力するアドレスバッファ回路1aと、テ
スト信号TSTbがインアクティブレベル(高レベル)
のときは第1のレベル(通常の選択レベル)、アクティ
ブレベルのときはこの第1のレベルより高い第2のレベ
ルのワード線ドライブ電圧Vwdを発生するワード線ド
ライブ回路2と、それぞれ選択用のトランジスタQ1,
Q2を備えて行方向,列方向に配列されこれらトランジ
スタQ1,Q2がオン状態のとき選択状態となりデータ
の書込み,読出しを行う複数のメモリセルMC、及び選
択レベルのときこれら複数のメモリセルMCのうちの対
応する行のメモリセルのトランジスタQ1,Q2をオン
状態とする複数のワード線WLを含むメモリセルアレイ
4と、NANDゲート(G5〜G8…)、インバータ
(IV9〜IV12…)、トランジスタ(Q3〜Q6
…)を備えアドレスバッファ回路1aの出力信号に従っ
て複数のワード線WLのうちの所定のワード線をワード
線ドライブ電圧Vwdと対応する選択レベルに駆動する
ワードデコーダのXデコーダ3とを有する構成となって
いる。なお、Xデコーダ3及びメモリセルアレイ4はそ
れぞれ複数設けられている。
This semiconductor memory device includes an inverter (IV
1 to IV8 ...) and a plurality of bits of the address signal Aj
(J = 1, 2, ...) Is input and the same level (Aj) as each bit of this address signal Aj and its inversion level (Aj).
The address buffer circuit 1a which outputs the signal of b) and the test signal TSTb are inactive level (high level).
Of the word line drive circuit 2 for generating the word line drive voltage Vwd of the first level (normal selection level) when it is, and the second level which is higher than the first level when it is the active level. Transistor Q1,
A plurality of memory cells MC which are provided with Q2 and are arranged in the row direction and the column direction are brought into a selected state when the transistors Q1 and Q2 are in an ON state to write and read data, and a plurality of memory cells MC which are at a selected level. A memory cell array 4 including a plurality of word lines WL for turning on the transistors Q1 and Q2 of the memory cells in the corresponding rows, a NAND gate (G5 to G8 ...), an inverter (IV9 to IV12 ...), a transistor (Q3 ~ Q6
...) and a word decoder X decoder 3 for driving a predetermined word line of the plurality of word lines WL to a selection level corresponding to the word line drive voltage Vwd in accordance with the output signal of the address buffer circuit 1a. ing. A plurality of X decoders 3 and memory cell arrays 4 are provided.

【0005】テスト信号TSTbがインアクティブレベ
ルのとき、すなわち通常動作のとき、ワード線ドライブ
回路2から、電源電圧に対してトランジスタQ1,Q2
のしきい値電圧だけ高い通常の選択レベルのワード線ド
ライブ電圧Vwdが出力される。アドレスバッファ回路
1a及びXデコーダ3は、アドレス信号Ajに従って複
数のワード線WLのうちの1本をワード線ドライブ電圧
Vwdと対応する選択レベルにする。
When the test signal TSTb is at the inactive level, that is, in the normal operation, the word line drive circuit 2 supplies transistors Q1 and Q2 with respect to the power supply voltage.
The word line drive voltage Vwd of the normal selection level which is higher by the threshold voltage of is output. The address buffer circuit 1a and the X decoder 3 set one of the plurality of word lines WL to a selection level corresponding to the word line drive voltage Vwd according to the address signal Aj.

【0006】この結果、メモリセルMCのトランジスタ
Q1,Q2がオンとなりこのメモリセルMCは選択状態
となる。そしてディジット線DL1,DL2からのデー
タが書込まれ、また、記憶しているデータがディジット
線DL1,DL2に読出される。
As a result, the transistors Q1 and Q2 of the memory cell MC are turned on and the memory cell MC is in the selected state. Then, the data from the digit lines DL1 and DL2 is written, and the stored data is read out to the digit lines DL1 and DL2.

【0007】テスト信号TSTbがアクティブレベル
(低レベル)のときは、ワード線ドライブ電圧Vwdが
通常の選択レベルより高いほかは前述の通常動作と同様
である。
When the test signal TSTb is at the active level (low level), the operation is the same as the above-mentioned normal operation except that the word line drive voltage Vwd is higher than the normal selection level.

【0008】この結果、選択状態のメモリセルMCのト
ランジスタQ1,Q2のゲートには通常動作時より高い
電圧が印加され、信頼性加速試験が行われる。
As a result, a voltage higher than that in the normal operation is applied to the gates of the transistors Q1 and Q2 of the selected memory cell MC, and the reliability acceleration test is performed.

【0009】[0009]

【発明が解決しようとする課題】この従来の半導体記憶
装置では、信頼性加速試験を行う場合でも、アドレス信
号Ajに従って複数のワード線WLのうちの1本を選択
レベルとする構成となっているので、メモリ容量が増大
するにつれて試験時間が長くなるという問題点があっ
た。
In the conventional semiconductor memory device, one of the plurality of word lines WL is set to the selection level according to the address signal Aj even when the reliability acceleration test is performed. Therefore, there is a problem that the test time becomes longer as the memory capacity increases.

【0010】本発明の目的は、信頼性加速試験の時間を
短縮することができる半導体記憶装置を提供することに
ある。
An object of the present invention is to provide a semiconductor memory device capable of shortening the time required for the reliability acceleration test.

【0011】[0011]

【課題を解決するための手段】本発明の半導体記憶装置
は、複数ビットのアドレス信号を入力しこのアドレス信
号の各ビットと同一レベル及びその反転レベルの信号を
出力するアドレスバッファ回路と、テスト信号がインア
クティブレベルのときは第1のレベル、アクティブレベ
ルのときは前記第1のレベルより高い第2のレベルのワ
ード線ドライブ電圧を発生するワード線ドライブ回路
と、それぞれ選択用のトランジスタを備えて行方向,列
方向に配列され前記トランジスタがオン状態のとき選択
状態となりデータの書込み,読出しを行う複数のメモリ
セル、及び選択レベルのときこれら複数のメモリセルの
うちの対応する行のメモリセルのトランジスタをオン状
態とする複数のワード線を含むメモリセルアレイと、前
記アドレスバッファ回路の出力信号に従って前記複数の
ワード線のうちの所定のワード線を前記ワード線ドライ
ブ電圧と対応する選択レベルに駆動するワードデコーダ
とを有する半導体記憶装置において、前記テスト信号が
アクティブレベルのとき、前記複数のワード線のうち少
なくとも2本を同時に選択レベルとするワード線同時選
択手段を設けて構成される。
SUMMARY OF THE INVENTION A semiconductor memory device of the present invention includes an address buffer circuit which receives an address signal of a plurality of bits and outputs a signal of the same level as each bit of the address signal and an inverted level thereof, and a test signal. A word line drive circuit for generating a word line drive voltage of a first level when is an inactive level and a second level higher than the first level when is an active level, and a selection transistor respectively. A plurality of memory cells which are arranged in the row direction and the column direction and are in a selected state when the transistors are in an ON state and for writing and reading data, and when the selected level is selected, the memory cells in a corresponding row of the plurality of memory cells A memory cell array including a plurality of word lines for turning on a transistor, and the address buffer. In a semiconductor memory device having a word decoder that drives a predetermined word line of the plurality of word lines to a selection level corresponding to the word line drive voltage according to an output signal of a path, when the test signal is at an active level, The word line simultaneous selection means for simultaneously setting at least two of the plurality of word lines to the selection level is provided.

【0012】また、ワード線同時選択手段が、アドレス
バッファ回路に設けられ、テスト信号がアクティブレベ
ルのときアドレス信号の所定のビットと同一レベル及び
その反転レベルの信号の出力端を同時にアクティブレベ
ルとする論理ゲートにより形成される。
Further, the word line simultaneous selection means is provided in the address buffer circuit, and when the test signal is at the active level, the output terminals of the signal of the same level as the predetermined bit of the address signal and its inverted level are simultaneously set to the active level. It is formed by a logic gate.

【0013】[0013]

【実施例】次に本発明の実施例について図面を参照して
説明する。
Embodiments of the present invention will now be described with reference to the drawings.

【0014】図1及び図2は本発明の一実施例のブロッ
ク図及びこの実施例の各部内部回路の具体例を示す回路
図である。
1 and 2 are a block diagram of an embodiment of the present invention and a circuit diagram showing a concrete example of an internal circuit of each part of this embodiment.

【0015】この実施例が図3及び図4に示された従来
の半導体記憶装置と相違する点は、アドレスバッファ回
路1を、従来のアドレスバッファ回路1aのインバータ
(IV5〜IV8…)に代えて第1の入力端にテスト信
号TSTbを入力する2入力のNANDゲート(G1〜
G4…)を設け、これらNANDゲート(G1〜G4
…)により、テスト信号TSTbがアクティブレベル
(低レベル)にときアドレス信号Ajの各ビットと同一
レベル及びその反転レベルの信号の出力端と高レベルの
アクティブレベルとするワード線同時選択手段を含む構
成とし、この出力端の高レベルによって複数のワード線
が同時に選択レベルとなるようにした点にある。
This embodiment differs from the conventional semiconductor memory device shown in FIGS. 3 and 4 in that the address buffer circuit 1 is replaced by the inverters (IV5 to IV8 ...) Of the conventional address buffer circuit 1a. A 2-input NAND gate (G1 to G1) for inputting the test signal TSTb to the first input terminal
G4 ...) are provided, and these NAND gates (G1 to G4) are provided.
...), the test signal TSTb is at an active level (low level) and includes an output end of a signal having the same level as that of each bit of the address signal Aj and an inverted level thereof and a word line simultaneous selection means for making a high level active level. A plurality of word lines are simultaneously set to the selection level by the high level at the output end.

【0016】図2において、テスト信号TSTbがアク
ティブレベルになると、アドレスバッファ回路1の信号
(A1,A1b,A2,A2b…)出力端のレベルは全
て高レベルとなる。この結果、Xデコーダ3のインバー
タ(IV9〜IV12…)の出力端も全て高レベルとな
り、トランジスタ(Q3〜Q6…)がオンとなって、通
常動作時により高いレベルのワード線ドライブ電圧Vw
dが各ワード線に印加される。
In FIG. 2, when the test signal TSTb becomes the active level, all the output terminals of the signals (A1, A1b, A2, A2b ...) Of the address buffer circuit 1 become the high level. As a result, all the output terminals of the inverters (IV9 to IV12 ...) Of the X decoder 3 also become high level, the transistors (Q3 to Q6 ...) Are turned on, and the word line drive voltage Vw at a higher level during normal operation.
d is applied to each word line.

【0017】こうして、複数本のワード線が同時に通常
動作時により高いレベル選択レベルとなるので、信頼性
加速試験の時間を短縮することができる。
In this way, since the plurality of word lines simultaneously reach a higher level selection level during normal operation, the time required for the reliability acceleration test can be shortened.

【0018】なお、テスト信号TSTbが高レベルのイ
ンアクティブレベルのときは、NANDゲート(G1〜
G4…)は単なるインバータとして動作するので、図4
に示された従来例と等価な回路となる。
When the test signal TSTb is a high level inactive level, the NAND gates (G1 to G1
G4 ...) operates simply as an inverter,
The circuit is equivalent to the conventional example shown in FIG.

【0019】[0019]

【発明の効果】以上説明したように本発明は、アドレス
バッファ回路のアドレス信号の各ビットと同一レベル及
びその反転レベルの信号の出力端を共にアクティブレベ
ルとして複数のワード線を同時に選択レベルとするワー
ド線同時選択手段を設けたので、一度に試験できるメモ
リセルの数が従来例より大幅に多くなり、従って信頼性
加速試験の時間を短縮することができる効果がある。
As described above, according to the present invention, a plurality of word lines are simultaneously set to the selection level while the output terminals of the signal having the same level as that of each bit of the address signal of the address buffer circuit and its inverted level are both set to the active level. Since the word line simultaneous selection means is provided, the number of memory cells that can be tested at one time is significantly larger than that of the conventional example, so that there is an effect that the time of the reliability acceleration test can be shortened.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例を示すブロック図である。FIG. 1 is a block diagram showing an embodiment of the present invention.

【図2】図1に示された実施例の各部内部回路具体例を
示す回路図である。
FIG. 2 is a circuit diagram showing a specific example of an internal circuit of each part of the embodiment shown in FIG.

【図3】従来の半導体記憶装置の一例を示すブロック図
である。
FIG. 3 is a block diagram showing an example of a conventional semiconductor memory device.

【図4】図3に示された半導体記憶装置の各部内部回路
の具体例を示す回路図である。
FIG. 4 is a circuit diagram showing a specific example of an internal circuit of each part of the semiconductor memory device shown in FIG.

【符号の説明】[Explanation of symbols]

1,1a アドレスバッファ回路 2 ワード線ドライブ回路 3 Xデコーダ 4 メモリセルアレイ DL1,DL2 ディジット線 G1〜G8 NANDゲート IV1〜IV12 インバータ MC メモリセル Q1〜Q6 トランジスタ WL ワード線 1, 1a Address buffer circuit 2 Word line drive circuit 3 X decoder 4 Memory cell array DL1, DL2 Digit line G1 to G8 NAND gate IV1 to IV12 Inverter MC Memory cell Q1 to Q6 Transistor WL Word line

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 複数ビットのアドレス信号を入力しこの
アドレス信号の各ビットと同一レベル及びその反転レベ
ルの信号を出力するアドレスバッファ回路と、テスト信
号がインアクティブレベルのときは第1のレベル、アク
ティブレベルのときは前記第1のレベルより高い第2の
レベルのワード線ドライブ電圧を発生するワード線ドラ
イブ回路と、それぞれ選択用のトランジスタを備えて行
方向,列方向に配列され前記トランジスタがオン状態の
とき選択状態となりデータの書込み,読出しを行う複数
のメモリセル、及び選択レベルのときこれら複数のメモ
リセルのうちの対応する行のメモリセルのトランジスタ
をオン状態とする複数のワード線を含むメモリセルアレ
イと、前記アドレスバッファ回路の出力信号に従って前
記複数のワード線のうちの所定のワード線を前記ワード
線ドライブ電圧と対応する選択レベルに駆動するワード
デコーダとを有する半導体記憶装置において、前記テス
ト信号がアクティブレベルのとき、前記複数のワード線
のうち少なくとも2本を同時に選択レベルとするワード
線同時選択手段を設けたことを特徴とする半導体記憶装
置。
1. An address buffer circuit which inputs an address signal of a plurality of bits and outputs a signal of the same level as each bit of the address signal and its inverted level, and a first level when a test signal is an inactive level, A word line drive circuit that generates a word line drive voltage of a second level higher than the first level when the active level is provided, and transistors for selecting each are arranged in the row direction and the column direction, and the transistors are turned on. And a plurality of word lines for turning on the transistors of the memory cells of the corresponding row of the plurality of memory cells when the selected level is set. A memory cell array and a plurality of word lines of the plurality of word lines according to an output signal of the address buffer circuit. In a semiconductor memory device having a word decoder for driving a predetermined word line of the word line to a selection level corresponding to the word line drive voltage, at least two of the plurality of word lines are activated when the test signal is at an active level. A semiconductor memory device characterized in that word line simultaneous selection means for simultaneously setting selection levels is provided.
【請求項2】 ワード線同時選択手段が、アドレスバッ
ファ回路に設けられ、テスト信号がアクティブレベルの
ときアドレス信号の所定のビットと同一レベル及びその
反転レベルの信号の出力端を同時にアクティブレベルと
する論理ゲートにより形成された請求項1記載の半導体
記憶装置。
2. A word line simultaneous selection means is provided in the address buffer circuit, and when the test signal is at the active level, the output terminals of the signal at the same level as the predetermined bit of the address signal and its inverted level are simultaneously set to the active level. The semiconductor memory device according to claim 1, which is formed by a logic gate.
JP4173923A 1992-07-01 1992-07-01 Semiconductor memory Withdrawn JPH0620496A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4173923A JPH0620496A (en) 1992-07-01 1992-07-01 Semiconductor memory

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4173923A JPH0620496A (en) 1992-07-01 1992-07-01 Semiconductor memory

Publications (1)

Publication Number Publication Date
JPH0620496A true JPH0620496A (en) 1994-01-28

Family

ID=15969585

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4173923A Withdrawn JPH0620496A (en) 1992-07-01 1992-07-01 Semiconductor memory

Country Status (1)

Country Link
JP (1) JPH0620496A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013114733A (en) * 2011-12-01 2013-06-10 Fujitsu Semiconductor Ltd Semiconductor integrated circuit, and method for testing semiconductor integrated circuit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013114733A (en) * 2011-12-01 2013-06-10 Fujitsu Semiconductor Ltd Semiconductor integrated circuit, and method for testing semiconductor integrated circuit

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