JPH06203337A - Magneto-resitance effect type magnetic head - Google Patents

Magneto-resitance effect type magnetic head

Info

Publication number
JPH06203337A
JPH06203337A JP36047792A JP36047792A JPH06203337A JP H06203337 A JPH06203337 A JP H06203337A JP 36047792 A JP36047792 A JP 36047792A JP 36047792 A JP36047792 A JP 36047792A JP H06203337 A JPH06203337 A JP H06203337A
Authority
JP
Japan
Prior art keywords
magnetic pole
lower magnetic
magnetoresistive effect
substrate
head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP36047792A
Other languages
Japanese (ja)
Inventor
Takuji Matsuo
拓治 松尾
Hideo Suyama
英夫 陶山
Shoji Terada
尚司 寺田
Mamoru Sasaki
守 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP36047792A priority Critical patent/JPH06203337A/en
Publication of JPH06203337A publication Critical patent/JPH06203337A/en
Withdrawn legal-status Critical Current

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Abstract

PURPOSE:To lessen the saturation of bias magnetic fields in a magneto-resistance effect element and the leakage of the bias magnetic fields and signal magnetic fields to a lower magnetic pole, to improve reproducing output and to stabilize reproducing characteristics. CONSTITUTION:A magneto-resistance effect element magneto-sensitive part consisting of the MR element 5, a front end electrode 7a, a rear end electrode 7b and a bias conductor 8 is disposed between the lower magnetic pole 2 and upper magnetic pole 3 laminated to face each other on a substrate 1. A groove part 10 is formed in the part facing the MR element 5 exclusive of the part of the lower magnetic pole 2 near the front end electrode 7a and a nonmagnetic metal 11 is embedded in this groove part 10. The hardness of the material constituting the lower magnetic pole and the hardness of the nonmagnetic metal may be made approximately the same at this time. The substrate may be formed as the lower magnetic pole.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、磁気抵抗効果型磁気ヘ
ッドに係わり、詳細にはその形状に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic resistance effect type magnetic head, and more particularly to the shape thereof.

【0002】[0002]

【従来の技術】例えば、ハードディスクドライブ装置の
再生用磁気ヘッドとして磁気抵抗効果型磁気ヘッド(以
下、MRヘッドと称する。)がよく用いられている。上
記MRヘッドは、例えばAl2 3 −TiC等よりなる
基板(スライダ)上に、ハードディスクとの対接面、す
なわちABS(エア・ベアリング・サーフェス)面に臨
んで下部磁極と上部磁極がその前方端部間に所定の間隔
を有して積層されてなる。そして、上記間隙内に絶縁層
を介して少なくとも磁気抵抗効果素子(以下、MR素子
と称する。)よりなる磁気抵抗効果感磁部(以下、MR
感磁部と称する。)の一端或いはその先端電極が上記A
BS面に臨むように配置されている。
2. Description of the Related Art For example, a magnetoresistive effect magnetic head (hereinafter referred to as an MR head) is often used as a reproducing magnetic head of a hard disk drive. In the MR head, a lower magnetic pole and an upper magnetic pole are located in front of a substrate (slider) made of, for example, Al 2 O 3 —TiC, facing a contact surface with a hard disk, that is, an ABS (air bearing surface) surface. It is laminated with a predetermined gap between the ends. Then, a magnetoresistive effect magnetic sensing section (hereinafter referred to as MR) including at least a magnetoresistive effect element (hereinafter referred to as an MR element) via an insulating layer in the gap.
It is called a magnetic sensitive section. ) One end or its tip electrode is the above A
It is arranged so as to face the BS surface.

【0003】また、上記ABS面と反対側には、上記M
R感磁部の他方の電極が上記一電極と略平行に設けられ
ている。そして、上記MR感磁部の略中央部には、通電
により所定の向きの磁化状態を与えられたMR素子を磁
気抵抗効果特性が優れた直線性と高い感度を示す特性領
域で動作するようになすバイアス導体が、絶縁層を介し
て上記MR素子を横切る形で設けられている。
On the opposite side of the ABS surface, the M
The other electrode of the R magnetism sensing portion is provided substantially parallel to the one electrode. The MR element, which has been magnetized in a predetermined direction by energization, is operated in a characteristic region having excellent linearity and high sensitivity in a magnetoresistive effect characteristic in a substantially central portion of the MR magnetic sensitive section. A bias conductor is provided so as to cross the MR element via an insulating layer.

【0004】[0004]

【発明が解決しようとする課題】ところが、上記のよう
なMRヘッドにおいては、バイアス導体によってMR素
子に印加されるバイアス磁界の局所的な(特にMR素子
の先端部)飽和が発生し易く、MR素子の磁気抵抗効果
特性の直線性を損なうといった現象が起こっている。
However, in the above MR head, local saturation (especially at the tip of the MR element) of the bias magnetic field applied to the MR element by the bias conductor is likely to occur, and the MR The phenomenon that the linearity of the magnetoresistive effect characteristic of the element is impaired is occurring.

【0005】また、バイアス導体によってMR素子に印
加されるバイアス磁界、或いはMR素子に入ってくる信
号磁界が、絶縁層を介してMR素子の下層に形成される
下部磁極に漏洩してしまうといった現象も起こってい
る。
Further, the phenomenon that the bias magnetic field applied to the MR element by the bias conductor or the signal magnetic field entering the MR element leaks to the lower magnetic pole formed in the lower layer of the MR element through the insulating layer. Is also happening.

【0006】上述のようなバイアス磁界のMR素子にお
ける局所的な飽和に起因するMR素子の磁気抵抗効果特
性の直線性の損失、バイアス磁界或いは信号磁界の下部
磁極への漏洩が発生すると、MR感磁部の再生出力の低
下や再生特性の不安定化を招いてしまう。
[0006] When the loss of the linearity of the magnetoresistive effect characteristic of the MR element due to the local saturation of the MR element of the bias magnetic field as described above and the leakage of the bias magnetic field or the signal magnetic field to the lower magnetic pole occur, the MR feeling is sensed. This leads to a reduction in the reproduction output of the magnetic part and instability of the reproduction characteristics.

【0007】そこで本発明は、従来の実情に鑑みて提案
されたものであり、バイアス磁界のMR素子における局
所的な飽和、バイアス磁界,信号磁界の下部磁極への漏
洩が発生しにくく、再生出力が向上し、かつ再生特性の
安定した磁気抵抗効果型磁気ヘッドを提供することを目
的とする。
Therefore, the present invention has been proposed in view of the conventional circumstances, and the local saturation of the bias magnetic field in the MR element, the leakage of the bias magnetic field and the signal magnetic field to the lower magnetic pole hardly occur, and the reproduction output is obtained. It is an object of the present invention to provide a magnetoresistive effect magnetic head having improved reproduction characteristics and stable reproduction characteristics.

【0008】[0008]

【課題を解決するための手段】上述の目的を達成するた
めに本発明者等は鋭意検討した結果、下部磁極の先端電
極近傍を除いたMR素子に対向する部分に溝部を設け、
該溝部に非磁性金属を配することにより、MR素子と下
部磁極間に磁気的な分離層を形成し、バイアス磁界のM
R素子における局所的な飽和、バイアス磁界,信号磁界
の下部磁極への漏洩を低減させることが可能であること
を見出した。
In order to achieve the above-mentioned object, the inventors of the present invention have made earnest studies, and as a result, provided a groove portion in a portion facing the MR element except the vicinity of the tip electrode of the lower magnetic pole,
By arranging a non-magnetic metal in the groove, a magnetic separation layer is formed between the MR element and the lower magnetic pole, and the bias magnetic field M
It has been found that it is possible to reduce local saturation, bias magnetic field, and signal magnetic field leakage to the lower magnetic pole in the R element.

【0009】すなわち、本発明は、基板上に相対向して
積層される下部磁極と上部磁極間に磁気抵抗効果感磁部
を配してなる磁気抵抗効果型磁気ヘッドにおいて、下部
磁極の先端電極近傍を除いた磁気抵抗効果素子に対向す
る部分に溝部を形成し、該溝部に非磁性金属を埋め込ん
だことを特徴とするものである。
That is, the present invention provides a magnetoresistive effect magnetic head comprising a lower magnetic pole and an upper magnetic pole, which are laminated on a substrate so as to face each other, and a magnetoresistive magnetic sensitive section is provided between the lower magnetic pole and the upper magnetic pole. It is characterized in that a groove portion is formed in a portion facing the magnetoresistive effect element except the vicinity thereof, and a nonmagnetic metal is embedded in the groove portion.

【0010】ところで、上記のようなMRヘッドを製造
する際には、基板上に下部磁極,絶縁層,MR感磁部,
絶縁層,上部磁極を順次積層して製造を行う。よって、
下部磁極に内部に非磁性金属の配された溝部を設けるに
は、基板上に下部磁極を積層した後に溝部を設け、これ
に非磁性金属を埋め込むことになる。この際、非磁性金
属を埋め込んだ溝部上にMR感磁部等を更に積層するた
め、溝部近傍は平滑である必要があり、非磁性金属を埋
め込んだ後に、下部磁極及び非磁性金属表面に研磨を施
すこととなる。この際、非磁性金属と下部磁極を構成す
る材料の硬度が大きく異なると、研磨速度に差が生じ、
均一に加工することが難しく、平滑な面を得ることは困
難である。
By the way, when manufacturing the MR head as described above, the lower magnetic pole, the insulating layer, the MR magnetic sensing part,
The insulating layer and the upper magnetic pole are sequentially laminated to manufacture. Therefore,
In order to provide the lower magnetic pole with the groove portion in which the non-magnetic metal is arranged, the lower magnetic pole is laminated on the substrate and then the groove portion is provided, and the non-magnetic metal is embedded therein. At this time, the MR magnetic sensitive portion is further laminated on the groove portion in which the non-magnetic metal is embedded, so that the vicinity of the groove portion needs to be smooth. After the non-magnetic metal is embedded, the lower magnetic pole and the surface of the non-magnetic metal are polished. Will be applied. At this time, if the hardness of the non-magnetic metal and the material of the lower magnetic pole are significantly different, the polishing rate will be different,
It is difficult to process uniformly and it is difficult to obtain a smooth surface.

【0011】そこで、本発明は、基板上に相対向して積
層される下部磁極と上部磁極間に磁気抵抗効果感磁部を
配してなる磁気抵抗効果型磁気ヘッドの下部磁極の先端
電極近傍を除いた磁気抵抗効果素子に対向する部分に溝
部を形成し、該溝部に非磁性金属を埋め込んだ磁気抵抗
効果型磁気ヘッドにおいて、非磁性金属が下部磁極を構
成する材料と略々同じ硬度であることを特徴とするもの
である。
Therefore, according to the present invention, in the vicinity of the tip electrode of the lower magnetic pole of the magnetoresistive effect type magnetic head in which the magnetoresistive effect magnetic sensitive portion is arranged between the lower magnetic pole and the upper magnetic pole which are laminated on the substrate so as to face each other. In a magnetoresistive effect magnetic head in which a groove is formed in a portion opposite to the magnetoresistive effect element except that the nonmagnetic metal is embedded in the groove, the nonmagnetic metal has substantially the same hardness as the material forming the lower magnetic pole. It is characterized by being.

【0012】さらに上記のような磁気抵抗効果型磁気ヘ
ッドにおいては、基板を下部磁極とすることも可能であ
り、本発明は上記のような磁気抵抗効果型磁気ヘッドに
おいて、基板が下部磁極とされていることを特徴とする
ものである。
Further, in the magnetoresistive effect type magnetic head as described above, the substrate can be used as the lower magnetic pole. In the magnetoresistive effect type magnetic head as described above, the substrate is the lower magnetic pole. It is characterized by that.

【0013】[0013]

【作用】本発明においては、基板上に相対向して積層さ
れる下部磁極と上部磁極間に磁気抵抗効果感磁部を配し
てなる磁気抵抗効果型磁気ヘッドにおいて、下部磁極の
先端電極近傍を除いた磁気抵抗効果素子に対向する部分
に溝部を形成し、該溝部に非磁性金属を埋め込んでいる
ため、バイアス磁界の磁気抵抗効果素子における飽和、
バイアス磁界或いは情報磁界の下部磁極への漏洩が発生
しにくい。
According to the present invention, in the magnetoresistive effect type magnetic head having the magnetoresistive effect magnetic sensitive portion between the lower magnetic pole and the upper magnetic pole, which are laminated on the substrate so as to face each other, in the vicinity of the tip electrode of the lower magnetic pole. Since a groove portion is formed in a portion facing the magnetoresistive effect element except for, and the nonmagnetic metal is embedded in the groove portion, saturation of the bias magnetic field in the magnetoresistive effect element,
The bias magnetic field or the information magnetic field is unlikely to leak to the lower magnetic pole.

【0014】また、本発明においては、上記のような磁
気抵抗効果型磁気ヘッドにおいて非磁性金属が下部磁極
を構成する材料と略々同じ硬度であるため、下部磁極及
び非磁性金属を均一に加工することが可能である。
Further, in the present invention, since the nonmagnetic metal in the magnetoresistive head as described above has substantially the same hardness as the material forming the lower magnetic pole, the lower magnetic pole and the nonmagnetic metal are uniformly processed. It is possible to

【0015】さらに本発明においては、上記のような磁
気抵抗効果型磁気ヘッドにおいて、基板が下部磁極とさ
れているため、製造工程を短縮することが可能である。
Further, according to the present invention, in the magnetoresistive effect type magnetic head as described above, since the substrate is the lower magnetic pole, the manufacturing process can be shortened.

【0016】[0016]

【実施例】以下、本発明を適用した具体的な実施例につ
いて図面を参照しながら説明する。本実施例のMRヘッ
ドは、図1に示すように、下部磁極1と上部磁極2がそ
の前方端部間に所定の間隔を持って相対向してスライダ
ーと称される基板3上に積層形成されてなる。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Specific embodiments to which the present invention is applied will be described below with reference to the drawings. In the MR head of this embodiment, as shown in FIG. 1, a lower magnetic pole 1 and an upper magnetic pole 2 are laminated and formed on a substrate 3 called a slider so that their front ends face each other with a predetermined gap therebetween. It will be done.

【0017】上記下部磁極1は、上記基板3上に設けら
れ、磁気記録媒体、例えばハードディスクとの対接面と
なるABS面4にその一端を臨ませるようにしてこのA
BS面4に対して略直交する方向に延在して設けられて
いる。
The lower magnetic pole 1 is provided on the substrate 3, and one end of the lower magnetic pole 1 is made to face an ABS surface 4 which is a contact surface with a magnetic recording medium such as a hard disk.
It is provided so as to extend in a direction substantially orthogonal to the BS surface 4.

【0018】一方、上部磁極2は、上記ABS面4にそ
の一端を臨ませるようにしてこのABS面4に対して略
直交する方向に延在して設けられ、そのABS面4に臨
む前方端部で上記下部磁極1との間隔が狭まるように屈
曲形成されている。さらに、上部磁極2は、後部端部で
上記下部磁極1と磁気的に接触してバックギャップを構
成するとともに閉磁路を構成している。
On the other hand, the upper magnetic pole 2 is provided so as to have one end thereof facing the ABS surface 4 and extends in a direction substantially orthogonal to the ABS surface 4, and the front end facing the ABS surface 4 is provided. It is bent and formed so that the space between the lower magnetic pole 1 and the lower magnetic pole 1 is narrowed. Further, the upper magnetic pole 2 magnetically contacts the lower magnetic pole 1 at the rear end to form a back gap and a closed magnetic path.

【0019】そして本実施例のMRヘッドにおいては、
上記上部磁極2と下部磁極1間の間隙のABS面4から
後方に向かって磁気抵抗効果素子であるMR素子5が設
けられている。上記MR素子5は、その長手方向が前記
ABS面4に対する直交方向となるように設けられ、一
端縁がABS面4に臨むようになされるとともに、後端
縁が相対向する下部磁極1と上部磁極2の略中途部に至
る位置とされている。さらに上記MR素子5は、基板3
上に設けられる下部磁極1との絶縁をとるために、第1
の絶縁層6aを介して上記下部磁極1上に設けられてい
る。なお、上記MR素子5は、バルクハウゼンノイズの
発生を回避するために、例えばSiO2等よりなる非磁
性の絶縁層を介して静磁的に結合する一対の磁気抵抗効
果薄膜を積層する形とすることが望ましい。
In the MR head of this embodiment,
An MR element 5, which is a magnetoresistive effect element, is provided rearward from the ABS surface 4 in the gap between the upper magnetic pole 2 and the lower magnetic pole 1. The MR element 5 is provided such that its longitudinal direction is orthogonal to the ABS surface 4, one edge thereof faces the ABS surface 4, and the trailing edge of the MR element 5 and the lower magnetic pole 1 face each other. The magnetic pole 2 is located almost in the middle. Further, the MR element 5 includes the substrate 3
In order to insulate the lower magnetic pole 1 provided above, the first
Is provided on the lower magnetic pole 1 through the insulating layer 6a. The MR element 5 has a structure in which a pair of magnetoresistive effect thin films that are magnetostatically coupled via a nonmagnetic insulating layer made of, for example, SiO 2 are laminated in order to avoid the occurrence of Barkhausen noise. It is desirable to do.

【0020】また、上記MR素子5の先端部と後端部に
は、図示しない定電流源からのセンス電流を通ずるため
の一対の電極7a,7b(以下、ABS面4側に設けら
れる電極7aを先端電極7a、後端部に設けられる電極
7bを後端電極7bと称する。)が当該MR素子5と電
気的に接続して積層されている。
A pair of electrodes 7a and 7b (hereinafter, referred to as an electrode 7a provided on the ABS surface 4 side) for passing a sense current from a constant current source (not shown) is provided at the front end and the rear end of the MR element 5. Is referred to as the front end electrode 7a, and the electrode 7b provided at the rear end portion is referred to as the rear end electrode 7b) are electrically connected to the MR element 5 and are stacked.

【0021】上記先端電極7aは、平面形状が略L字状
をなす配線パターンとして形成され、その一端部が上記
MR素子5の先端部に積層されている。そして、その先
端電極7aのうちMR素子5上に積層される側のパター
ンの一側縁部が上記ABS面4に露出するようになって
いる。なお、バック側に引き出された配線パターンの端
部は接地用端子部とされている。
The tip electrode 7a is formed as a wiring pattern having a substantially L shape in a plan view, and one end thereof is laminated on the tip of the MR element 5. Then, one side edge portion of the pattern of the tip electrode 7a on the side laminated on the MR element 5 is exposed to the ABS surface 4. The end portion of the wiring pattern drawn out to the back side is a grounding terminal portion.

【0022】一方、後端電極7bは、上記先端電極7a
と同様平面略L字状の配線パターンとして形成され、上
記MR素子5を挟んで上記先端電極7aとは反対側に設
けられている。そして、その後端電極7bの一端部は、
上記MR素子5の後端部に積層されるようになってい
る。なお、バック側に引き出された配線パターンの端部
は、電流源用端子部となされている。
On the other hand, the rear end electrode 7b is the front end electrode 7a.
Similar to the above, the wiring pattern is formed in a substantially L-shaped plane, and is provided on the opposite side of the tip electrode 7a with the MR element 5 interposed therebetween. And, one end of the rear end electrode 7b is
The MR element 5 is laminated on the rear end portion thereof. The end of the wiring pattern pulled out to the back side serves as a current source terminal.

【0023】そして、上記先端電極7aと後端電極7b
の間には、通電により所定の向きの磁化状態を与えられ
たMR素子5を磁気抵抗効果特性が優れた直線性と高い
感度を示す特性領域で動作するようになすバイアス導体
8が設けられている。バイアス導体8は、MR素子5を
横切る形で上記電極7a,7b間に設けられ、その両端
部がそれぞれバック側に引き出されるようになってい
る。そのバック側に引き出された端部が、上記バイアス
導体8に電流を通ずるための端子部とされている。な
お、上記バイアス導体8は、MR素子5,両電極7a,
7bと絶縁するために第2の絶縁層6b上に形成されて
いる。なお、バイアス導体8上に第3の絶縁層6cを介
して上部磁極2が形成され、上部磁極2の上には保護膜
層9が設けられ、MRヘッドを不用意な外力等から保護
するようになっている。
The front electrode 7a and the rear electrode 7b are
A bias conductor 8 is provided between the MR element 5 and the MR element 5, which is given a magnetized state in a predetermined direction by energization, to operate in a characteristic region exhibiting excellent linearity and high sensitivity of the magnetoresistive effect characteristic. There is. The bias conductor 8 is provided across the MR element 5 between the electrodes 7a and 7b, and both ends of the bias conductor 8 are drawn out to the back side. The end portion pulled out to the back side serves as a terminal portion for passing a current through the bias conductor 8. The bias conductor 8 includes the MR element 5, both electrodes 7a,
It is formed on the second insulating layer 6b to insulate it from 7b. The upper magnetic pole 2 is formed on the bias conductor 8 via the third insulating layer 6c, and the protective film layer 9 is provided on the upper magnetic pole 2 so as to protect the MR head from inadvertent external force or the like. It has become.

【0024】そして特に、本実施例のMRヘッドにおい
ては、下部磁極1の先端電極7a近傍を除いたMR素子
5に対向する位置に溝部10が設けられ、該溝部10に
は非磁性金属11が埋め込まれている。上記非磁性金属
11の埋め込まれた溝部10は、バイアス導体8の発生
するバイアス磁界のMR素子5における局部的な飽和、
バイアス磁界或いは情報磁界のMR素子5から下部磁極
1への漏洩を防止するために設けられるものであり、そ
の深さは100nmオーダーが好適である。また、上記
非磁性金属11としては、後述する製造工程の都合上、
下部磁極1を構成する材料と同等の硬度を有した材料が
好ましく、Ti,Ta,Cu,Ni等の金属が好適であ
る。なお、非磁性金属11の代わりに非磁性酸化物材料
等を用いることも考えられるが、下部磁極1との硬度が
異なるため好ましくない。
In particular, in the MR head of this embodiment, the groove portion 10 is provided at a position facing the MR element 5 except the vicinity of the tip electrode 7a of the lower magnetic pole 1, and the nonmagnetic metal 11 is provided in the groove portion 10. It is embedded. The groove 10 in which the non-magnetic metal 11 is embedded locally saturates the bias magnetic field generated by the bias conductor 8 in the MR element 5,
It is provided in order to prevent the bias magnetic field or the information magnetic field from leaking from the MR element 5 to the lower magnetic pole 1, and the depth thereof is preferably on the order of 100 nm. Further, as the non-magnetic metal 11, the non-magnetic metal 11 may be used because of the manufacturing process described later.
A material having a hardness equivalent to that of the material forming the lower magnetic pole 1 is preferable, and metals such as Ti, Ta, Cu and Ni are preferable. A non-magnetic oxide material or the like may be used instead of the non-magnetic metal 11, but it is not preferable because the hardness is different from that of the lower magnetic pole 1.

【0025】ところで、上述のMRヘッドは、次に述べ
るような製造工程を経て製造される。先ず、基板3上に
下部磁極1を形成する。すなわち、図2に示すように、
基板3上に下部磁極1を形成するNiFe膜を電気メッ
キ法により成膜し、該NiFe膜をリソグラフィにより
所定形状の下部磁極1に加工する。
By the way, the above-mentioned MR head is manufactured through the following manufacturing steps. First, the lower magnetic pole 1 is formed on the substrate 3. That is, as shown in FIG.
A NiFe film for forming the lower magnetic pole 1 is formed on the substrate 3 by electroplating, and the NiFe film is processed into the lower magnetic pole 1 having a predetermined shape by lithography.

【0026】次に、図3に示すように上記下部磁極1の
所定位置にフォトリソグラフィ又はイオンエッチングに
より深さ数百nm程度の溝部10を形成する。次いで、
図4に示すように溝部10の形成された下部磁極1上に
スパッタ法或いは電気メッキ法等により非磁性金属11
を溝部10の深さよりも厚く成膜する。ところで、後工
程において、上記下部磁極1上にはMR感磁部等が積層
されるため該下部磁極1表面は平滑面である必要があ
る。そこで、非磁性金属11の形成された下部磁極1上
を先ず金属定盤(例えば、スズ定盤,銅ケメット定盤等
が挙げられる。)とダイヤモンド砥粒を用いて機械的に
研磨し、その後表面平滑性を向上させるために柔軟性を
有するラップシート(例えばクロス研磨シート)とSi
2 砥粒を用いて研磨し、図5に示されるような表面平
滑性の高い非磁性金属11の埋め込まれた溝部10を有
する下部磁極1を得る。
Next, as shown in FIG. 3, a groove 10 having a depth of several hundred nm is formed at a predetermined position of the lower magnetic pole 1 by photolithography or ion etching. Then
As shown in FIG. 4, a non-magnetic metal 11 is formed on the lower magnetic pole 1 having a groove 10 by sputtering or electroplating.
Is formed thicker than the depth of the groove portion 10. By the way, in the subsequent step, since the MR magnetic sensing portion and the like are laminated on the lower magnetic pole 1, the surface of the lower magnetic pole 1 needs to be smooth. Therefore, the lower magnetic pole 1 on which the non-magnetic metal 11 is formed is first mechanically polished by using a metal surface plate (for example, a tin surface plate, a copper Kemet surface plate, etc.) and diamond abrasive grains, and thereafter. A wrap sheet having flexibility to improve surface smoothness (for example, a cloth polishing sheet) and Si
Polishing is performed using O 2 abrasive grains to obtain the lower magnetic pole 1 having the groove portion 10 in which the non-magnetic metal 11 having high surface smoothness is embedded as shown in FIG.

【0027】上記のように溝部10に埋め込む材料を非
磁性金属11とした場合においては下部磁極1と非磁性
金属11の硬度に大きな差がないことから、均一に研磨
され、非磁性金属11膜形成後研磨を施しても下部磁極
1と非磁性金属11間に段差を生じることがなく、平滑
面を得ることができる。ところが、前述のように溝部1
0に埋め込む材料として非磁性酸化物材料等を用いた場
合においては、図6に示すような下部磁極1と溝部10
に埋め込まれた非磁性酸化物材料12間に硬度の差があ
るため、これらに研磨を施すと図中に示すように段差を
生じてしまう。例えば、下部磁極1としてNiFe膜を
用い、非磁性材料としてAl2 3 を用いた場合におい
て、金属定盤(銅ケメット定盤)とダイヤモンド砥粒
(粒径2μm)によって面圧60g/cm2 ,回転速度
60rpmの条件で研磨を行ったところ、下部磁極1と
非磁性酸化物材料12の境界部で約0.1μm程度の段
差を生じた。その後、表面平滑性を向上させる目的でク
ロス研磨シートとSiO2 砥粒を用いて研磨したとこ
ろ、SiO2 によって非磁性酸化物材料12であるAl
2 3 が化学的に研磨されてしまい、非磁性酸化物材料
12表面が窪んでしまった。前述のように、下部磁極1
上にはMR感磁部等を積層するため下部磁極1表面は平
滑面である必要があり、上記のような段差の発生は好ま
しくない。よって、下部磁極1に形成される溝部10に
埋め込まれる非磁性材料としては、非磁性金属、特に下
部磁極1と略々の硬度を有する非磁性金属が好ましい。
When the material to be embedded in the groove 10 is the non-magnetic metal 11 as described above, there is no great difference in hardness between the lower magnetic pole 1 and the non-magnetic metal 11, so that the non-magnetic metal 11 is uniformly polished to form the non-magnetic metal 11 film. Even if polishing is performed after the formation, there is no step between the lower magnetic pole 1 and the nonmagnetic metal 11, and a smooth surface can be obtained. However, as described above, the groove 1
When a nonmagnetic oxide material or the like is used as the material to be embedded in 0, the lower magnetic pole 1 and the groove portion 10 as shown in FIG.
Since there is a difference in hardness between the non-magnetic oxide materials 12 embedded in, the polishing will cause a step as shown in the figure. For example, when a NiFe film is used as the lower magnetic pole 1 and Al 2 O 3 is used as the non-magnetic material, a surface pressure of 60 g / cm 2 is applied by a metal surface plate (copper Kemet surface plate) and diamond abrasive grains (particle diameter 2 μm). When polishing was performed at a rotation speed of 60 rpm, a step of about 0.1 μm was formed at the boundary between the lower magnetic pole 1 and the nonmagnetic oxide material 12. Thereafter, it was polished using a cross abrasive sheet and SiO 2 abrasive grains in order to improve the surface smoothness of a non-magnetic oxide material 12 by SiO 2 Al
2 O 3 was chemically polished, and the surface of the nonmagnetic oxide material 12 was dented. As described above, the lower magnetic pole 1
Since the MR magnetic sensitive portion and the like are laminated on the upper surface, the surface of the lower magnetic pole 1 needs to be a smooth surface, and the above-described step difference is not preferable. Therefore, as the non-magnetic material to be embedded in the groove 10 formed in the lower magnetic pole 1, a non-magnetic metal, particularly a non-magnetic metal having substantially the same hardness as the lower magnetic pole 1, is preferable.

【0028】そして、非磁性金属11の埋め込まれた溝
部10を有する下部磁極1上に、第1の絶縁層6a,M
R素子5,先端電極7a及び後端電極7b,第2の絶縁
層6b,バイアス導体8,第3の絶縁層6c,上部磁極
2,保護膜層9を順次積層し、図1に示すようなMRヘ
ッドを得る。
Then, the first insulating layers 6a, M are formed on the lower magnetic pole 1 having the groove portion 10 in which the nonmagnetic metal 11 is embedded.
As shown in FIG. 1, the R element 5, the front electrode 7a and the rear electrode 7b, the second insulating layer 6b, the bias conductor 8, the third insulating layer 6c, the upper magnetic pole 2, and the protective film layer 9 are sequentially laminated. Obtain an MR head.

【0029】なお、上述した本実施例のMRヘッドにお
いては、基板を下部磁極とすることも可能であり、例え
ば図7に示すように、基板23上に第1の絶縁層26
a,MR素子25,先端電極27a及び後端電極27
b,第2の絶縁層26b,バイアス導体28,第3の絶
縁層26c,上部磁極22,保護膜層29が順次積層さ
れるものとしても良い。上記のMRヘッドにおいては、
上記基板23が下部磁極を兼ねている。このMRヘッド
においても第1の絶縁層26a,MR素子25,先端電
極27a及び後端電極27b,第2の絶縁層26b,バ
イアス導体28,第3の絶縁層26c,上部磁極22,
保護膜層29の形状,配置位置,役割は先に述べた通り
である。なお、下部磁極となされる基板23には、溝部
30が設けられ、該溝部30には非磁性金属31が埋め
込まれている。
In the MR head of this embodiment described above, the substrate can be used as the lower magnetic pole. For example, as shown in FIG. 7, the first insulating layer 26 is formed on the substrate 23.
a, MR element 25, front electrode 27a and rear electrode 27
b, the second insulating layer 26b, the bias conductor 28, the third insulating layer 26c, the upper magnetic pole 22, and the protective film layer 29 may be sequentially laminated. In the above MR head,
The substrate 23 also serves as the lower magnetic pole. Also in this MR head, the first insulating layer 26a, the MR element 25, the front electrode 27a and the rear electrode 27b, the second insulating layer 26b, the bias conductor 28, the third insulating layer 26c, the upper magnetic pole 22,
The shape, arrangement position, and role of the protective film layer 29 are as described above. A groove portion 30 is provided in the substrate 23 serving as a lower magnetic pole, and a nonmagnetic metal 31 is embedded in the groove portion 30.

【0030】このようなMRヘッドも先に述べたような
製造工程を経て製造される。但し、基板を下部磁極とし
ていることから、先ず、基板の所定位置に前述したよう
にフォトリソグラフィ及びイオンエッチングにより深さ
数百nm程度の溝部30を形成する。そして、この上に
スパッタ法或いは電気メッキ法等により非磁性金属31
を溝部30の深さよりも厚く成膜し、この表面を研磨し
た後、第1の絶縁層26a,MR素子25,先端電極2
7a及び後端電極27b,第2の絶縁層26b,バイア
ス導体28,第3の絶縁層26c,上部磁極22,保護
膜層29を順次積層して図7に示すようなMRヘッドを
得る。
Such an MR head is also manufactured through the manufacturing process described above. However, since the substrate is the lower magnetic pole, first, the groove portion 30 having a depth of several hundred nm is formed at a predetermined position of the substrate by photolithography and ion etching as described above. Then, a non-magnetic metal 31 is formed on this by sputtering or electroplating.
Is formed to be thicker than the depth of the groove portion 30, and the surface thereof is polished. Then, the first insulating layer 26a, the MR element 25, and the tip electrode 2 are formed.
7a and the rear end electrode 27b, the second insulating layer 26b, the bias conductor 28, the third insulating layer 26c, the upper magnetic pole 22, and the protective film layer 29 are sequentially laminated to obtain an MR head as shown in FIG.

【0031】本実施例においては、いわゆるシールド型
のMRヘッドの実施例について述べてきたが、いわゆる
ヨーク型のMRヘッドにおいても適用可能であることは
言うまでもない。
In this embodiment, a so-called shield type MR head has been described, but it goes without saying that the present invention is also applicable to a so-called yoke type MR head.

【0032】本実施例のMRヘッドにおいては、下部磁
極或いは基板の先端電極近傍を除いたMR素子に対向す
る部分に溝部を形成し、該溝部に非磁性金属を埋め込ん
でいるため、バイアス導体によってMR素子に印加され
るバイアス磁界のMR素子での局所的(特にMR素子先
端部)な飽和が発生しにくく、バイアス磁界がMR素子
の先端電極と後端電極間の感磁部全体に均一に印加さ
れ、MR素子の磁気抵抗効果特性が均一化され、MR素
子の感磁部全体が線形動作領域で動作することができる
ため、MR素子の磁気抵抗効果特性の直線性が向上され
る。
In the MR head of this embodiment, since the groove portion is formed in the portion facing the MR element except the lower magnetic pole or the vicinity of the tip electrode of the substrate, and the nonmagnetic metal is buried in the groove portion, the bias conductor is used. The bias magnetic field applied to the MR element is unlikely to be locally saturated (especially at the tip of the MR element) in the MR element, and the bias magnetic field is evenly distributed over the entire magnetic sensing portion between the front electrode and the rear electrode of the MR element. When applied, the magnetoresistive effect characteristics of the MR element are made uniform, and the entire magnetic sensing portion of the MR element can operate in a linear operation region, so that the linearity of the magnetoresistive effect characteristics of the MR element is improved.

【0033】また、バイアス導体によってMR素子に印
加されるバイアス磁界やMR素子に入ってくる信号磁界
のMR素子の下層に形成される下部磁極への漏洩が発生
しにくくなり、MR素子に強い信号磁界が入るようにな
る。
Also, the bias magnetic field applied to the MR element by the bias conductor and the signal magnetic field entering the MR element are less likely to leak to the lower magnetic pole formed in the lower layer of the MR element, so that a strong signal is applied to the MR element. A magnetic field comes in.

【0034】これらのことによって、本実施例のMRヘ
ッドにおいては、再生出力が向上し、且つ再生出力が安
定化される。
As a result, in the MR head of this embodiment, the reproduction output is improved and the reproduction output is stabilized.

【0035】また、本実施例のMRヘッドにおいては、
溝部に埋め込む非磁性金属の硬度を下部磁極或いは基板
の硬度と略々同じとしたことから、下部磁極或いは基板
と非磁性金属の表面を均一に加工することが可能であ
り、平滑面を得ることができ、下部磁極或いは基板上に
形成されるMR素子の特性を安定化させることが可能で
ある。
Further, in the MR head of this embodiment,
Since the hardness of the non-magnetic metal embedded in the groove is substantially the same as the hardness of the lower magnetic pole or the substrate, the surface of the lower magnetic pole or the substrate and the non-magnetic metal can be uniformly processed, and a smooth surface can be obtained. Therefore, the characteristics of the MR element formed on the lower magnetic pole or the substrate can be stabilized.

【0036】さらに本実施例のMRヘッドにおいては、
基板を下部磁極としても良く、その特性を損なうことな
く製造工程を短縮することが可能である。
Further, in the MR head of this embodiment,
The substrate may be the lower magnetic pole, and the manufacturing process can be shortened without impairing its characteristics.

【0037】[0037]

【発明の効果】以上の説明からも明らかなように、本発
明においては、基板上に相対向して積層される下部磁極
と上部磁極間に磁気抵抗効果感磁部を配してなる磁気抵
抗効果型磁気ヘッドにおいて、下部磁極の先端電極近傍
を除いた磁気抵抗効果素子に対向する部分に溝部を形成
し、該溝部に非磁性金属を埋め込んでいるため、バイア
ス磁界の磁気抵抗効果素子における飽和、バイアス磁界
或いは情報磁界の下部磁極への漏洩が発生しにくく、磁
気抵抗効果型磁気ヘッドの再生出力の向上並びに安定化
が達成される。
As is apparent from the above description, in the present invention, the magnetoresistive effect magnetic sensitive portion is disposed between the lower magnetic pole and the upper magnetic pole which are laminated on the substrate so as to face each other. In the effect type magnetic head, a groove is formed in a portion facing the magnetoresistive effect element excluding the vicinity of the tip electrode of the lower magnetic pole, and a nonmagnetic metal is embedded in the groove, so that saturation of the bias magnetic field in the magnetoresistive effect element occurs. The leakage of the bias magnetic field or the information magnetic field to the lower magnetic pole is unlikely to occur, and the improvement and stabilization of the reproduction output of the magnetoresistive head can be achieved.

【0038】また、本発明においては、上記のような磁
気抵抗効果型磁気ヘッドにおいて非磁性金属が下部磁極
を構成する材料と略々同じ硬度であるため、下部磁極と
非磁性金属を均一に加工することができ、下部磁極上に
形成される磁気抵抗効果素子の特性を安定化させること
ができるため、磁気抵抗効果型磁気ヘッドの再生出力の
向上並びに安定化が達成される。
Further, in the present invention, since the nonmagnetic metal in the above-described magnetoresistive magnetic head has substantially the same hardness as the material forming the lower magnetic pole, the lower magnetic pole and the nonmagnetic metal are uniformly processed. Since it is possible to stabilize the characteristics of the magnetoresistive effect element formed on the lower magnetic pole, the reproduction output of the magnetoresistive effect type magnetic head is improved and stabilized.

【0039】さらに本発明においては、上記のような磁
気抵抗効果型磁気ヘッドにおいて、基板が下部磁極とさ
れているため、製造工程を短縮することが可能であり、
その工業的価値は非常に高い。
Further, according to the present invention, in the above-mentioned magnetoresistive effect type magnetic head, since the substrate is the lower magnetic pole, the manufacturing process can be shortened,
Its industrial value is very high.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明を適用した磁気抵抗効果型磁気ヘッドの
一実施例を示す要部概略断面図である。
FIG. 1 is a schematic cross-sectional view of essential parts showing an embodiment of a magnetoresistive effect magnetic head to which the present invention is applied.

【図2】本発明を適用した磁気抵抗効果型磁気ヘッドの
一実施例の製造工程を工程順に示すものであって、基板
上に下部磁極を形成する工程を示す断面図である。
FIG. 2 is a cross-sectional view showing a manufacturing process of an embodiment of a magnetoresistive effect magnetic head to which the present invention is applied and showing a process of forming a lower magnetic pole on a substrate.

【図3】下部磁極に溝部を形成する工程を示す断面図で
ある。
FIG. 3 is a cross-sectional view showing a step of forming a groove on the lower magnetic pole.

【図4】溝部に非磁性金属膜を成膜する工程を示す断面
図である。
FIG. 4 is a cross-sectional view showing a step of forming a nonmagnetic metal film in a groove.

【図5】下部磁極に研磨を行った状態を示す断面図であ
る。
FIG. 5 is a cross-sectional view showing a state where the lower magnetic pole is polished.

【図6】溝部に非磁性酸化物材料を埋め込み、研磨を行
った状態を示す断面図である。
FIG. 6 is a cross-sectional view showing a state in which a nonmagnetic oxide material is embedded in a groove and polishing is performed.

【図7】本発明を適用した磁気抵抗効果型磁気ヘッドの
他の実施例を示す要部概略断面図である。
FIG. 7 is a schematic cross-sectional view of a main part showing another embodiment of the magnetoresistive effect magnetic head to which the present invention is applied.

【符号の説明】[Explanation of symbols]

1・・・・・・・・下部磁極 2,22・・・・・上部磁極 3,23・・・・・基板 4・・・・・・・・ABS面 5,25・・・・・MR素子 6a,26a・・・第1の絶縁層 6b,26b・・・第2の絶縁層 6c,26c・・・第3の絶縁層 7a,27a・・・先端電極 7b,27b・・・後端電極 8,28・・・・・バイアス導体 9,29・・・・・保護膜層 10,30・・・・溝部 11,31・・・・非磁性金属 1 --- Lower magnetic pole 2,22-Upper magnetic pole 3,23-Substrate 4 --- ABS surface 5,25-MR Element 6a, 26a ... First insulating layer 6b, 26b ... Second insulating layer 6c, 26c ... Third insulating layer 7a, 27a ... Tip electrode 7b, 27b ... Rear end Electrodes 8, 28 ... Bias conductors 9, 29 ... Protective film layer 10, 30 ... Grooves 11, 31 ... Non-magnetic metal

───────────────────────────────────────────────────── フロントページの続き (72)発明者 佐々木 守 東京都品川区北品川6丁目7番35号 ソニ ー株式会社内 ─────────────────────────────────────────────────── ─── Continued Front Page (72) Inventor Mamoru Sasaki 6-735 Kitashinagawa, Shinagawa-ku, Tokyo Sony Corporation

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 基板上に相対向して積層される下部磁極
と上部磁極間に磁気抵抗効果感磁部を配してなる磁気抵
抗効果型磁気ヘッドにおいて、 下部磁極の先端電極近傍を除いた磁気抵抗効果素子に対
向する部分に溝部を形成し、該溝部に非磁性金属を埋め
込んだことを特徴とする磁気抵抗効果型磁気ヘッド。
1. A magnetoresistive effect type magnetic head comprising a magnetoresistive effect magnetic sensitive portion between a lower magnetic pole and an upper magnetic pole, which are laminated facing each other on a substrate, except for the vicinity of the tip electrode of the lower magnetic pole. A magnetoresistive effect type magnetic head, characterized in that a groove is formed in a portion facing the magnetoresistive effect element, and a nonmagnetic metal is embedded in the groove.
【請求項2】 非磁性金属が下部磁極を構成する材料と
略々同じ硬度であることを特徴とする請求項1記載の磁
気抵抗効果型磁気ヘッド。
2. The magnetoresistive effect magnetic head according to claim 1, wherein the nonmagnetic metal has substantially the same hardness as the material forming the lower magnetic pole.
【請求項3】 基板が下部磁極とされていることを特徴
とする請求項1記載の磁気抵抗効果型磁気ヘッド。
3. A magnetoresistive effect magnetic head according to claim 1, wherein the substrate has a lower magnetic pole.
JP36047792A 1992-12-29 1992-12-29 Magneto-resitance effect type magnetic head Withdrawn JPH06203337A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP36047792A JPH06203337A (en) 1992-12-29 1992-12-29 Magneto-resitance effect type magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP36047792A JPH06203337A (en) 1992-12-29 1992-12-29 Magneto-resitance effect type magnetic head

Publications (1)

Publication Number Publication Date
JPH06203337A true JPH06203337A (en) 1994-07-22

Family

ID=18469574

Family Applications (1)

Application Number Title Priority Date Filing Date
JP36047792A Withdrawn JPH06203337A (en) 1992-12-29 1992-12-29 Magneto-resitance effect type magnetic head

Country Status (1)

Country Link
JP (1) JPH06203337A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5867350A (en) * 1995-03-29 1999-02-02 Sony Corporation Magneto-resistance effect head with insulated bias conductor embedded in shield groove
KR100510451B1 (en) * 1998-01-15 2005-10-26 삼성전자주식회사 Magnetic resistance head
KR100682930B1 (en) * 2005-02-07 2007-02-15 삼성전자주식회사 Magnetic head

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5867350A (en) * 1995-03-29 1999-02-02 Sony Corporation Magneto-resistance effect head with insulated bias conductor embedded in shield groove
KR100510451B1 (en) * 1998-01-15 2005-10-26 삼성전자주식회사 Magnetic resistance head
KR100682930B1 (en) * 2005-02-07 2007-02-15 삼성전자주식회사 Magnetic head
US7486478B2 (en) 2005-02-07 2009-02-03 Samsung Electronics Co., Ltd. Magnetic head

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A300 Withdrawal of application because of no request for examination

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Effective date: 20000307