JPH0620270A - Production of aluminum board for magnetic disc - Google Patents
Production of aluminum board for magnetic discInfo
- Publication number
- JPH0620270A JPH0620270A JP19640992A JP19640992A JPH0620270A JP H0620270 A JPH0620270 A JP H0620270A JP 19640992 A JP19640992 A JP 19640992A JP 19640992 A JP19640992 A JP 19640992A JP H0620270 A JPH0620270 A JP H0620270A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- substrate
- boards
- board
- electroless
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、磁気ディスク用のアル
ミニウム基板の製造方法に関し、特にNi−Pめっき処
理工程における改良に係る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an aluminum substrate for a magnetic disk, and more particularly to improvements in the Ni-P plating process.
【0002】[0002]
【従来の技術及びその問題点】磁気ディスク用のアルミ
ニウム(アルミニウム合金をも含む、以下同様)基板
は、圧延材をドーナツ状に打ち抜いてブランク材とし、
これを旋削ないしは研削により表面仕上げしてサブスト
レートとし、これにさらに無電解Ni−Pめっきを施
し、ポリッシングして下地処理品となる。2. Description of the Related Art Aluminum (including aluminum alloys, the same applies below) substrates for magnetic disks are blanked by punching a rolled material into a donut shape.
The surface of this is finished by turning or grinding to obtain a substrate, which is further electroless Ni-P plated and polished to obtain a substrate-treated product.
【0003】これら磁気ディスク基板作製工程における
無電解Ni−Pめっき工程は、図1に示されるように複
数枚の磁気ディスク基板1をシャフト吊り治具2に等間
隔(例えば10mmピッチ)で配置し、これをめっき液
中に浸漬してめっき処理する。このようなめっき処理時
において、めっき液の流れ方が特に両端に配置された基
板では、めっき膜厚が基板隣接側とめっき液開放側とに
おいて差が生じ、めっき液開放側の方が基板隣接側より
厚くなる。その結果、膜応力の差が生じ、両端の基板の
平面度が悪化する。特に近時における基板の薄肉化
(1.27tから0.8t)に伴い、基板の歪が発生し
易くなっている。In the electroless Ni-P plating process in these magnetic disk substrate manufacturing processes, as shown in FIG. 1, a plurality of magnetic disk substrates 1 are arranged on a shaft suspension jig 2 at equal intervals (for example, 10 mm pitch). Then, this is immersed in a plating solution for plating treatment. In such a plating process, in a substrate in which the flow of the plating solution is particularly arranged at both ends, the plating film thickness differs between the substrate adjacent side and the plating solution open side, and the plating solution open side is adjacent to the substrate. Thicker than the side. As a result, a difference in film stress occurs and the flatness of the substrates at both ends deteriorates. In particular, as the thickness of the substrate has recently been reduced (from 1.27 t to 0.8 t), the strain of the substrate is likely to occur.
【0004】本発明は、無電解Ni−Pめっき処理時に
おける吊り治具両端における基板の平面度の悪化を防止
し、無電解Ni−Pめっき処理工程の歩留を向上させ得
る磁気ディスク用アルミニウム基板の製造方法を提供す
ることを目的とする。The present invention prevents the flatness of the substrate from deteriorating at both ends of the hanging jig during the electroless Ni-P plating treatment and improves the yield of the electroless Ni-P plating treatment step. It is an object to provide a method for manufacturing a substrate.
【0005】[0005]
【問題点を解決するための手段】本発明方法は、磁気デ
ィスク用アルミニウム基板を下地無電解Ni−Pめっき
するに際し、吊り治具で等間隔に配置された複数枚の基
板の両端にガラス基板もしくはステンレス基板を配置し
たことを特徴とするものであり、これにより前記問題点
を解決したものである。According to the method of the present invention, when an aluminum substrate for a magnetic disk is plated with an electroless Ni-P underlayer, a glass substrate is provided on both ends of a plurality of substrates arranged at equal intervals by a hanging jig. Alternatively, it is characterized by disposing a stainless steel substrate, which solves the above problems.
【0006】図2は、本発明を実施する場合の一例を示
すものであり、この図2において、1は磁気ディスク基
板、2はシャフト吊り治具であることは図1と同様であ
るが、このような配置において吊り治具2の両端にはガ
ラス基板もしくはステンレス基板等からなるダミー基板
3が配置されている。FIG. 2 shows an example in which the present invention is carried out. In FIG. 2, 1 is a magnetic disk substrate and 2 is a shaft hanging jig, which is similar to FIG. In such an arrangement, dummy substrates 3 made of a glass substrate, a stainless steel substrate, or the like are arranged at both ends of the hanging jig 2.
【0007】ダミー基板3は、強酸、強アルカリに対し
て安定で、100℃の高温めっき液中で安定であり、無
電解Ni−Pめっき膜が付きにくいもの、不導体ででき
たものであってめっき処理に繰返して使用できるもの、
もしくは安価であることが好ましく、この点から、前述
したようにガラス基板もしくはステンレス基板が特に好
ましく適用できる。また、このダミー基板3の厚さ及び
寸法は、磁気ディスク基板1と同様にする必要はなく、
任意に設定できる。The dummy substrate 3 is stable to a strong acid and a strong alkali, stable in a high temperature plating solution at 100 ° C., is hard to be coated with an electroless Ni-P plating film, and is made of a non-conductor. That can be used repeatedly for plating
Alternatively, it is preferably inexpensive, and from this point, a glass substrate or a stainless steel substrate is particularly preferably applicable as described above. The thickness and dimensions of the dummy substrate 3 need not be the same as those of the magnetic disk substrate 1,
It can be set arbitrarily.
【0008】図2のようにシャフト吊り治具の両端にダ
ミー基板3を配置して無電解Ni−Pめっき処理を施す
と、ダミー基板3の解放側と磁気ディスク基板1の隣接
側とでめっき液の流れ方に差が生じ、その結果としてダ
ミー基板3の両面におけるめっき膜厚に差が生じてもこ
のダミー基板3は製品とはならず、何ら問題とはならな
い。このダミー基板3は繰返して使用することができ
る。As shown in FIG. 2, when the dummy substrates 3 are arranged at both ends of the shaft suspension jig and electroless Ni-P plating is performed, plating is performed on the release side of the dummy substrate 3 and the adjacent side of the magnetic disk substrate 1. Even if there is a difference in the flow of the liquid, resulting in a difference in the plating film thickness on both sides of the dummy substrate 3, this dummy substrate 3 does not become a product and does not cause any problem. This dummy substrate 3 can be used repeatedly.
【0009】[0009]
【発明の効果】以上のような本発明によれば、シャフト
吊り治具の両端に配置される磁気ディスク基板に発生し
ていた平面度不良が無くなり、歩留よく、無電解Ni−
Pめっき処理が行える。As described above, according to the present invention, the flatness defects that have occurred in the magnetic disk substrates arranged at both ends of the shaft suspension jig are eliminated, the yield is good, and the electroless Ni-
P plating process can be performed.
【0010】[0010]
【実施例】アルミニウムディスク材料としてA5052
−H34からなる3.5インチのドーナツ状基板(厚さ
0.8t)を図2に示されるように、25枚入りカセッ
ト型容器を利用して10mmピッチとし、1シャフトで
50枚吊りし、従来例として全ての基板を磁気ディスク
基板1とした場合と、本発明に従いシャフト両端にガラ
ス基板からなるダミー基板3を4枚配置した場合とで、
無電解Ni−Pめっき処理後の基板を検査した。その結
果、従来法の場合には両端に配置された4枚の磁気ディ
スク基板1がすべて平面度不良となり、歩留が92%で
あったのに対し、本発明法に従いシャフト吊り治具2の
両端にダミー基板を配置した場合には、磁気ディスク基
板1の平面度不良は皆無となった。EXAMPLES A5052 as an aluminum disc material
As shown in FIG. 2, a 3.5-inch doughnut-shaped substrate (thickness: 0.8 t) made of -H 34 is set to 10 mm pitch using a cassette type container containing 25 pieces, and 50 pieces are hung by one shaft. As a conventional example, when all the substrates are magnetic disk substrates 1, and when four dummy substrates 3 made of glass substrates are arranged at both ends of the shaft according to the present invention,
The substrate after the electroless Ni-P plating treatment was inspected. As a result, in the case of the conventional method, the four magnetic disk substrates 1 arranged at both ends all had poor flatness and the yield was 92%. When the dummy substrates were arranged on both ends, the magnetic disk substrate 1 had no flatness defect.
【図1】従来法により無電解Ni−Pめっき処理する場
合の一例を示す説明図である。FIG. 1 is an explanatory diagram showing an example of a case where an electroless Ni—P plating process is performed by a conventional method.
【図2】本発明方法により無電解Ni−Pめっき処理す
る場合の一例を示す説明図である。FIG. 2 is an explanatory diagram showing an example of a case of performing electroless Ni—P plating according to the method of the present invention.
1 磁気ディスク基板 2 シャフト吊り治具 3 ダミー基板 1 magnetic disk substrate 2 shaft hanging jig 3 dummy substrate
Claims (1)
無電解Ni−Pめっきするに際し、吊り治具で等間隔に
配置された複数枚の基板の両端にガラス基板もしくはス
テンレス基板を配置したことを特徴とする磁気ディスク
用アルミニウム基板の製造方法。1. A glass substrate or a stainless steel substrate is arranged at both ends of a plurality of substrates arranged at equal intervals by a hanging jig when an underlayer electroless Ni-P plating is performed on an aluminum substrate for a magnetic disk. Method for manufacturing aluminum substrate for magnetic disk.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4196409A JP2741312B2 (en) | 1992-06-30 | 1992-06-30 | Method of manufacturing aluminum substrate for magnetic disk |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4196409A JP2741312B2 (en) | 1992-06-30 | 1992-06-30 | Method of manufacturing aluminum substrate for magnetic disk |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0620270A true JPH0620270A (en) | 1994-01-28 |
JP2741312B2 JP2741312B2 (en) | 1998-04-15 |
Family
ID=16357383
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4196409A Expired - Fee Related JP2741312B2 (en) | 1992-06-30 | 1992-06-30 | Method of manufacturing aluminum substrate for magnetic disk |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2741312B2 (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5796973U (en) * | 1980-12-08 | 1982-06-15 | ||
JPS62183036A (en) * | 1986-02-06 | 1987-08-11 | Chuo Seisakusho:Kk | Plating equipment for magnetic disc base |
-
1992
- 1992-06-30 JP JP4196409A patent/JP2741312B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5796973U (en) * | 1980-12-08 | 1982-06-15 | ||
JPS62183036A (en) * | 1986-02-06 | 1987-08-11 | Chuo Seisakusho:Kk | Plating equipment for magnetic disc base |
Also Published As
Publication number | Publication date |
---|---|
JP2741312B2 (en) | 1998-04-15 |
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