JPH06196772A - Magnetic resistance element - Google Patents

Magnetic resistance element

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Publication number
JPH06196772A
JPH06196772A JP43A JP34314092A JPH06196772A JP H06196772 A JPH06196772 A JP H06196772A JP 43 A JP43 A JP 43A JP 34314092 A JP34314092 A JP 34314092A JP H06196772 A JPH06196772 A JP H06196772A
Authority
JP
Japan
Prior art keywords
thin film
metal thin
ferromagnetic metal
film
magnetic resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP43A
Other languages
Japanese (ja)
Inventor
Tadao Suzuki
忠男 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tama Electric Co Ltd
Original Assignee
Tama Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tama Electric Co Ltd filed Critical Tama Electric Co Ltd
Priority to JP43A priority Critical patent/JPH06196772A/en
Publication of JPH06196772A publication Critical patent/JPH06196772A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To make a resistance temperature coefficient of a magnetic resistance element small by using a ternary alloy of Cr, Al, and Fe for a ferromagnetic metal thin film of the magnetic resistance element and by setting the composition of the film within the specific range. CONSTITUTION:A resistor pattern 2 which is formed of a ferromagnetic metal thin film is manufactured by depositing an alloy film which has the composition of Cr 17%, Al 13.5% and Fe for the rest and by patterning the allay film by photolithography and by forming electrodes 3 and a protective film 4 and then by heat-treating at 300 deg.C. When the ferromagnetic metal thin film is heat-treated in vacuum at 300 deg.C for one hour, a temperature coefficient of a magnetic resistance is very much improved and becomes very small, +-50ppm/ deg.C or smaller.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は,強磁性金属薄膜を用い
た磁電 変換素子である磁気抵抗素子の改良に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to improvement of a magnetoresistive element which is a magnetoelectric conversion element using a ferromagnetic metal thin film.

【0002】[0002]

【従来の技術】電気絶縁性の基板の一面に,強磁性金属
薄膜を着膜し,フォトエッチングプロセスによってジグ
ザグ状の抵抗体パターンを形成し,互いに直交させて配
置しそれらを中点で直列に結線して電圧端子として使わ
れている。゛抵抗体の長手方向と直角に磁界をかけると
抵抗体の抵抗値が減少し,他の抵抗体の抵抗値は増加す
る。
2. Description of the Related Art A ferromagnetic metal thin film is deposited on one surface of an electrically insulating substrate, a zigzag resistor pattern is formed by a photoetching process, and the resistor patterns are arranged orthogonally to each other and they are arranged in series at a midpoint. Wired and used as a voltage terminal. When a magnetic field is applied perpendicularly to the longitudinal direction of the resistor, the resistance value of the resistor decreases and the resistance values of other resistors increase.

【0003】従来の磁気抵抗素子には,Fe−Ni系合
金,Ni−Co系合金が用いられているが,Fe−Ni
系は,磁気抵抗効果が小さく,Ni−Co系は磁気抵抗
効果は大きいがヒステリシスも大きい。Fe−Ni系と
Ni−Co系は低磁界50Oe以下に於て磁気抵抗効果
が小さかった。またFe−Ni系とNi−Co系は電気
抵抗の温度係数が大きく2500〜3500PPM/℃
であった。
Fe-Ni type alloys and Ni-Co type alloys have been used for conventional magnetoresistive elements.
The system has a small magnetoresistive effect, and the Ni-Co system has a large magnetoresistive effect but a large hysteresis. The Fe-Ni system and the Ni-Co system had a small magnetoresistive effect in a low magnetic field of 50 Oe or less. In addition, the temperature coefficient of electric resistance of the Fe-Ni system and the Ni-Co system is large and 2500-3500 PPM / ° C.
Met.

【0004】[0004]

【発明が解決しようとする課題】上述のように従来の磁
気抵抗素子は強磁性金属薄膜にFe−Ni系かNi−C
o系の合金を用いていたため特に電気抵抗の温度係数が
大きかった。この発明はこれらの問題を解消できる磁気
抵抗素子を提案するのが目的である。
As described above, in the conventional magnetoresistive element, the ferromagnetic metal thin film is made of Fe-Ni system or Ni-C.
Since an o-based alloy was used, the temperature coefficient of electric resistance was particularly large. An object of the present invention is to propose a magnetoresistive element capable of solving these problems.

【0005】[0005]

【課題を解決するための手段】この問題を解決するため
に本発明の磁気抵抗素子は強磁性金属薄膜にCr,A
l,Feの三元合金を用いその組成を,Cr15〜20
%,Al3〜4%残Feにした。さらに第2の発明では
この強磁性金属薄膜を大気中で250〜350℃の熱処
理を施した。そして第3の発明では,前記三元合金から
なる強磁性金属薄膜の抵抗体パターンを基板上に形成
し,この抵抗体パターン上に電極と保護膜とを設けたこ
とを特徴とするものである。
In order to solve this problem, the magnetoresistive element of the present invention comprises a ferromagnetic metal thin film containing Cr and A.
A ternary alloy of 1 and Fe is used, and its composition is set to Cr15 to 20.
%, Al 3-4% Residual Fe. Further, in the second invention, this ferromagnetic metal thin film was heat-treated at 250 to 350 ° C. in the atmosphere. The third invention is characterized in that a resistor pattern of the ferromagnetic metal thin film made of the ternary alloy is formed on a substrate, and an electrode and a protective film are provided on the resistor pattern. .

【0006】[0006]

【作 用】本発明によれば周囲温度の変化に関係なく
安定して磁気の検出が可能である。
[Operation] According to the present invention, it is possible to stably detect magnetism regardless of changes in ambient temperature.

【0007 】[0007]

【実施例1】1図の実施例で1は電気絶縁性の基板,2
は基板表面に真空蒸着またはスパッタリングにより着膜
した強磁性金属薄膜をフォトリソグラフィーによってジ
グザグ状のパターンをエッチングで形成したパターン,
3と4はそれぞれ抵抗体パターン2上に設けた電極と保
護膜である。
Embodiment 1 In the embodiment shown in FIG. 1, 1 is an electrically insulating substrate, and 2
Is a pattern formed by etching a zigzag pattern by photolithography on a ferromagnetic metal thin film deposited by vacuum deposition or sputtering on the substrate surface,
Reference numerals 3 and 4 respectively denote an electrode and a protective film provided on the resistor pattern 2.

【0008 】強磁性金属薄膜からなる抵抗体パターン
2はCr17 %,Al3.5%残Feの組成の合金膜
を着膜させ,フォトリソグラフィーによってパターンを
形成しその後電極 3保護膜4を作成し300℃の熱処
理を行っている。 薄膜の厚みは8000A,抵抗体
パターンの幅は50μmに形成されている。
A resistor pattern 2 made of a ferromagnetic metal thin film is formed by depositing an alloy film having a composition of Cr 17% and Al 3.5% residual Fe, forming a pattern by photolithography, and thereafter forming an electrode 3 protective film 4. Heat treatment at ℃ is performed. The thin film has a thickness of 8000 A and the resistor pattern has a width of 50 μm.

【0009 】このような強磁性金属薄膜を真空中30
0℃1時間保持の熱処理の場合のものの磁気抵抗の温度
係数は従来技術と比較して表1に示すように小さな値で
改善の度合が大きい。
Such a ferromagnetic metal thin film is placed in vacuum 30
As shown in Table 1, the temperature coefficient of magnetic resistance in the case of the heat treatment of holding at 0 ° C. for 1 hour is small as shown in Table 1, and the degree of improvement is large.

【0010】[0010]

【発明の効果】この発明によれば磁気抵抗素子の抵抗温
度係数が従来品の1/100と小さく温度変化による出
力の変動が小さくなり特に50Oe以下の低磁界におい
て安定して測定することが出来る。
According to the present invention, the temperature coefficient of resistance of the magnetoresistive element is as small as 1/100 of that of the conventional product, and the fluctuation of the output due to the temperature change is small, and stable measurement can be performed particularly in a low magnetic field of 50 Oe or less. .

【図面の簡単な説明】[Brief description of drawings]

【図1】は本発明の磁気抵抗素子の側面図FIG. 1 is a side view of a magnetoresistive element of the present invention.

【図2】は本発明の磁気抵抗素子の平面図FIG. 2 is a plan view of a magnetoresistive element of the present invention.

【符号の説明】[Explanation of symbols]

1 基板 2 薄膜磁気抵抗パターン 3 電極 4 保護膜 1 substrate 2 thin film magnetoresistive pattern 3 electrode 4 protective film

【表1】 [Table 1]

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 重量比にて,Cr15〜20%,Al3
〜4%,残Feからなる強磁性金属薄膜で,室温付近に
おける電気抵抗の温度係数がプラスマイナス50PPM
/℃以下を有することを特徴とする磁気抵抗素子。
1. A weight ratio of Cr15 to 20%, Al3
Ferromagnetic metal thin film consisting of ~ 4% and residual Fe, with temperature coefficient of electric resistance around room temperature plus or minus 50PPM
A magnetoresistive element having a temperature of / ° C or less.
【請求項2】 重量比にて,Cr15〜20%,Al3
〜4%,残Feからなる強磁性金属薄膜を有し,この強
磁性金属薄膜は大気中または,真空中で250〜350
℃の熱処理を施したことを特徴とする磁気抵抗素子。
2. A weight ratio of Cr 15 to 20% and Al 3
〜4%, the remaining Fe has a ferromagnetic metal thin film, and this ferromagnetic metal thin film is 250 to 350 in air or vacuum.
A magnetoresistive element characterized by being subjected to heat treatment at ℃.
【請求項3】 重量比にて,Cr15〜20%,Al3
〜4%,残Feからなる強磁性金属薄膜の抵抗体 パタ
ーンを基板上に形成し,この抵抗体パターン上に電極と
保護膜とを設けたことを特徴とする磁気抵抗素子。
3. A weight ratio of Cr15 to 20%, Al3
A magnetoresistive element characterized in that a resistor pattern of a ferromagnetic metal thin film consisting of ˜4% of residual Fe is formed on a substrate, and an electrode and a protective film are provided on this resistor pattern.
JP43A 1992-11-30 1992-11-30 Magnetic resistance element Pending JPH06196772A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP43A JPH06196772A (en) 1992-11-30 1992-11-30 Magnetic resistance element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP43A JPH06196772A (en) 1992-11-30 1992-11-30 Magnetic resistance element

Publications (1)

Publication Number Publication Date
JPH06196772A true JPH06196772A (en) 1994-07-15

Family

ID=18359223

Family Applications (1)

Application Number Title Priority Date Filing Date
JP43A Pending JPH06196772A (en) 1992-11-30 1992-11-30 Magnetic resistance element

Country Status (1)

Country Link
JP (1) JPH06196772A (en)

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