JPH06194510A - Diffraction grating spectrsocope - Google Patents

Diffraction grating spectrsocope

Info

Publication number
JPH06194510A
JPH06194510A JP7867293A JP7867293A JPH06194510A JP H06194510 A JPH06194510 A JP H06194510A JP 7867293 A JP7867293 A JP 7867293A JP 7867293 A JP7867293 A JP 7867293A JP H06194510 A JPH06194510 A JP H06194510A
Authority
JP
Japan
Prior art keywords
diffraction grating
center
concave
curvature
radius
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7867293A
Other languages
Japanese (ja)
Other versions
JP2518505B2 (en
Inventor
Hideyuki Noda
英行 野田
Masahito Koike
雅人 小池
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP5078672A priority Critical patent/JP2518505B2/en
Publication of JPH06194510A publication Critical patent/JPH06194510A/en
Application granted granted Critical
Publication of JP2518505B2 publication Critical patent/JP2518505B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To well correct aberrations by using luminous fluxes which are obtd. by reflecting divergent luminous fluxes from spot light sources with a off axial concave surface mirrors by using a holographic diffraction grating in exposing and contains the aberrations. CONSTITUTION:The radius of curvature of the concave surface diffraction grating 10 of the Seya-Namioka mounting spectroscope is set at 500, the distance r from an incident slit 6 to the center of the diffraction grating and the distance r' from the center of the diffraction grating to an exit slit 7 are respectively set at 140 and an angle theta to be formed by both slit positions with the center of the diffraction grating is set at about 69.7 deg.. The exposing conditions of the holographic diffraction grating are set as follows: The spot light source 14 is disposed at a point of the distance r= about 2.00X10<3> from the point 0 in the direction apart an angle alpha= about 4.77 deg. from a normal N erected at the center 0 of a diffraction grating substrate 11 (concave spherical surface of 500 radius of curvature). The spot light source 14 is disposed in a position of the distance p= about 205 from 0' apart an angle 2r= about 16.44o from a line connecting the centers 0', 0, 0' of the concave spherical surface mirror 13 in a position of r'= about 871 apart an angle beta= about 11 deg. on the opposite side. The exposing wavelength is set at 457.93nm.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はホログラフィック回折格
子を用いた分光器に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a spectrometer using a holographic diffraction grating.

【0002】[0002]

【従来の技術】平面回折格子は従来機械切りで格子溝を
作っており、格子パターンは等間隔直線格子であるが、
この型の回折格子はそれ自身は収差を持っていないが、
リトローマウントの分光器のようにコリメータ素子とテ
レメータ素子に凹面鏡を使ったものでは、凹面鏡に球面
鏡を用い軸外し状態で使うため、これらの凹面鏡によっ
て収差が発生していた。この収差を補正するためには回
折格子の格子パターンを特殊なものにして、回折格子に
コリメータ鏡及びカメラ鏡によって発生する収差を打ち
消すような収差を発生させればよいが、ホログラフイの
利用によってそのような特殊な格子パターンに近い格子
パターンを製作する可能性が出て来た。しかし従来のホ
ログラフィックな回折格子では回折格子のパターンを格
子基板上に形成するための記録光に球面波を用いていた
ため、格子パターンは回転双曲面群と格子基板との交線
群に限定され、収差補正は不充分なものであった。また
瀬谷・波岡マウント分光器のように凹面回折格子を用い
る分光器では回折格子自身に結像作用があるからコリメ
ータ素子やテレメータ素子が不要であり、これらによっ
て生ずる収差はないが、この場合凹面回折格子の結像性
に収差が現れる。この場合にもホログラフィを用いて格
子パターンを製作することによって収差を補正すること
が行われるようになって来たが、この場合にも従来は記
録光に球面波を用いて来たので充分な収差補正ができな
かった。
2. Description of the Related Art A plane diffraction grating has conventionally been formed by mechanical cutting to form a grating groove, and the grating pattern is an evenly spaced linear grating.
This type of grating has no aberrations on its own,
In the case of a concave mirror used as a collimator element and a telemeter element like a Littrow mount spectroscope, a spherical mirror is used as the concave mirror and it is used in an off-axis state, so that aberration is generated by these concave mirrors. In order to correct this aberration, the grating pattern of the diffraction grating may be made special so that the aberration generated by the collimator mirror and the camera mirror is canceled by the diffraction grating. There is a possibility of producing a lattice pattern close to such a special lattice pattern. However, in conventional holographic diffraction gratings, spherical waves are used as the recording light for forming the diffraction grating pattern on the grating substrate, so the grating pattern is limited to the group of intersecting lines between the rotating hyperboloid group and the grating substrate. However, the aberration correction was insufficient. In a spectrograph using a concave diffraction grating such as the Seya / Namioka mount spectroscope, since the diffraction grating itself has an image forming action, a collimator element or a telemeter element is not necessary, and there is no aberration caused by these elements. Aberration appears in the imaging property of the grating. In this case as well, aberrations have come to be corrected by producing a grating pattern by using holography, but in this case as well, since spherical waves have been used for recording light in the past, it is sufficient. Aberration correction was not possible.

【0003】[0003]

【発明が解決しようとする課題】本発明は回折格子分光
器、特に瀬谷・波岡マウント分光器およびリトローマウ
ント分光器において、上述した収差の補正が完全である
ようにしようとするものである。
SUMMARY OF THE INVENTION The present invention is intended to ensure that the above-mentioned aberration correction is complete in a diffraction grating spectroscope, especially a Seya-Namioka mount spectrograph and a Littrow mount spectrograph.

【0004】[0004]

【課題を解決するための手段】使用する回折格子が分光
器の光学系によって発生する収差を補正するような逆方
向の収差を発生するようにして、分光器の収差を補正す
るもので、回折格子が上述したような収差特性を持った
ものとするため、回折格子をホログラフィック回折格子
とし、露光において使用する光束を点光源からの発散光
束を軸外し凹面鏡で反射させた収差を含んだ光束とし
た。
The diffraction grating to be used is such that aberration of the spectroscope is corrected by causing aberration in the opposite direction to correct the aberration generated by the optical system of the spectroscope. In order to make the grating have the above-mentioned aberration characteristics, the diffraction grating is a holographic diffraction grating, and the light flux used in the exposure is an off-axis of the divergent light flux from the point light source and is reflected by a concave mirror. And

【0005】[0005]

【作用】本発明の対象となっている分光器ではコリメー
タ鏡およびカメラ鏡が軸外しの状態で用いられるので収
差が発生するが、原理的にはこのような収差は回折格子
でそれと逆の収差を発生させることで補正できるであろ
うことが予想される。そのような回折格子をホログラフ
ィックな方法で作るとしても、その露光条件は上述した
ような原理だけから導出することはできない。分光器の
各部配置を一つ決めると、それに対してホログラフィッ
ク露光の最適配置が求められるが、分光器の配置を変え
ると、最適の露光配置も変わるので、両者の配置を変え
て一番良い所を探り当てる必要がある。本発明はそのよ
うにして探り当てられた分光器およびホログラフィック
露光の配置を示すものである。
In the spectroscope to which the present invention is applied, the collimator mirror and the camera mirror are used off-axis, so that an aberration occurs. In principle, however, such an aberration is an aberration opposite to that of the diffraction grating. It is expected that it can be corrected by generating Even if such a diffraction grating is made by a holographic method, the exposure conditions cannot be derived only from the principle described above. If you decide on the layout of each part of the spectroscope, the optimum layout for holographic exposure is required, but if you change the layout of the spectroscope, the optimum layout for exposure also changes. You need to figure out where. The invention shows the arrangement of the spectrograph and the holographic exposure so spotted.

【0006】[0006]

【実施例】この実施例は瀬谷・波岡マウント分光器に関
するものである。この実施例における回折格子は曲率半
径500mmの凹球面で中心における格子ピッチは60
0本/mmであり、これを用いる分光系を第1図に示
す。10が本発明に係る上記凹面回折格子で、6は入射
スリット、7は出射スリットで、入射スリット6から格
子中心0までの距離r=409.8374mm、格子中
心から出射スリットまでの距離r’=410.8190
mm、入射スリットと出射スリットとの格子中心に関す
る角距離θ=69.7083°で、使用波長範囲は10
0〜700nmである。第2図は上記回折格子10の格
子パターン記録時の配置を示す。11が回折格子基板で
曲率半径500mmの凹球面であり、その中心0に立て
た法線をNとする。Nを含む平面内で、同法線Nと角α
=4.77°離れた方向で0点からの距離r=199
9.4mmの所に点光源12を置き、法線Nに関し、点
光源12と反対側に角度β=11°だけ離れ、0点から
の距離r’=871.4mmの位置に凹面球面鏡13の
中心0’を置き、0’点から0,0’を結ぶ線より角度
2r=16.4°だけ法線N寄りに離れ、0’から距離
p=204.9mmの位置に点光源14を配置した。記
録光として波長457.93nmのレーザー光を用い
た。第3は上述回折格子とコマ収差補正を行った従来の
ホログラフィック回折格子とを第3図に示す分光器で使
い比べたときのスポットダイヤグラム(計算値)であり
各波長において本発明が優れていることが分かる。
EXAMPLE This example relates to a Seya-Namioka mount spectrometer. The diffraction grating in this embodiment is a concave spherical surface having a radius of curvature of 500 mm and the grating pitch at the center is 60.
The number is 0 / mm, and a spectroscopic system using this is shown in FIG. 10 is the concave diffraction grating according to the present invention, 6 is an entrance slit, 7 is an exit slit, and the distance r from the entrance slit 6 to the grating center 0 is r = 409.8374 mm, and the distance r ′ from the grating center to the exit slit is r ′ = 410.8190
mm, the angular distance θ between the entrance slit and the exit slit with respect to the center of the grating is 69.7083 °, and the usable wavelength range is 10
It is 0 to 700 nm. FIG. 2 shows the arrangement of the diffraction grating 10 at the time of recording the grating pattern. Reference numeral 11 denotes a diffraction grating substrate, which is a concave spherical surface having a radius of curvature of 500 mm, and the normal line standing at the center 0 is N. In the plane containing N, the normal N and the angle α
= Distance from the 0 point in the direction away from 4.77 ° r = 199
The point light source 12 is placed at a position of 9.4 mm, and with respect to the normal line N, the point β is separated by an angle β = 11 ° on the side opposite to the point light source 12, and the concave spherical mirror 13 is placed at a position r ′ = 871.4 mm from the 0 point. The center 0 ′ is placed, and the point light source 14 is arranged at a position p = 204.9 mm from 0 ′, which is separated from the line connecting the 0 ′ and 0,0 ′ by the angle 2r = 16.4 ° toward the normal line N. did. Laser light having a wavelength of 457.93 nm was used as the recording light. The third is a spot diagram (calculated value) when the above diffraction grating and a conventional holographic diffraction grating corrected for coma are used and compared in the spectroscope shown in FIG. 3, and the present invention is excellent at each wavelength. I know that

【0007】これはリトローマウント分光器用について
の実施例で、平面回折格子に関するものである。第4図
は上記実施例を示す。1が平面回折格子基板、2,3が
記録光源点で、夫々は同一レーザ(図外)から発射され
たレーザビームを2分割して収束させることにより形成
されている。記録光源点2,3から発散する球面波はそ
れぞれ凹面鏡4,5により非球面波として反射され、回
折格子基板1上で干渉縞を形成する。第5図は本発明に
より作成したホログラフィック平面回折格子を用いたリ
トローマウントの分光系の一例を示す。分光系の波長領
域を200〜800nm、回折格子12の中心での格子
定数を1/1800mmとし、コリメータ鏡8を単位長
の曲率半径をもつ球面鏡とする。上記回折格子製作の詳
細を述べると、記録光としてレーザ波長441.6nm
のレーザ光を用い、露光系の配置は第4図において pc=0.3986 qc=0.8710 tc=6.188° pd=0.3912 qd=0.8708 td=13.545° である。また凹面鏡4,5の曲率半径R4,R5はR4
=R5=1.000である。分光器の配置は第5図にお
いてr=0.4988D=0.4087,D’=0.4
093,r’=0.4973,θ=4.290°,2K
=2.405°,θ’=5.709°で使用次数−1,
コリメータ鏡8の曲率半径R8はR8=1.000であ
る。したがって、qc,qd、さらに凹面鏡4,5の曲
率半径はコリメータ鏡8の曲率半径に等しいか、もしく
はその近傍にある。上の例では二つの記録光源2,3に
関して、夫々凹面鏡を使用しているが、この構成には二
つの記録光源のうち少なくとも一方についてだけ採用し
ておけば充分な場合が設計上多い。また回折格子基板に
ついても平面以外にシリンドリカル面、球面などを用い
ることが可能である。上述各実施例に示された各パラメ
ータの値は、その値の近傍では収差特性が安定してい
て、多少の変動によっても、収差特性は殆ど変わらない
ものである。
This is an embodiment for a Littrow-mounted spectroscope and relates to a plane diffraction grating. FIG. 4 shows the above embodiment. Reference numeral 1 is a plane diffraction grating substrate, 2 and 3 are recording light source points, each of which is formed by dividing a laser beam emitted from the same laser (not shown) into two and converging the laser beam. The spherical waves diverging from the recording light source points 2 and 3 are reflected as aspherical waves by the concave mirrors 4 and 5, respectively, and form interference fringes on the diffraction grating substrate 1. FIG. 5 shows an example of a Littrow mount spectroscopic system using a holographic plane diffraction grating prepared according to the present invention. The wavelength range of the spectroscopic system is 200 to 800 nm, the grating constant at the center of the diffraction grating 12 is 1/1800 mm, and the collimator mirror 8 is a spherical mirror having a unit radius of curvature. The details of the production of the diffraction grating will be described. As the recording light, the laser wavelength is 441.6 nm.
4, the exposure system is arranged as follows: pc = 0.3986 qc = 0.8710 tc = 6.188 ° pd = 0.3912 qd = 0.8708 td = 13.545 °. Also, the curvature radii R4 and R5 of the concave mirrors 4 and 5 are R4.
= R5 = 1.000. The arrangement of the spectroscope is as shown in FIG. 5, r = 0.4988D = 0.40887, D '= 0.4.
093, r '= 0.4973, θ = 4.290 °, 2K
= 2.405 °, θ ′ = 5.709 °, use order −1,
The radius of curvature R8 of the collimator mirror 8 is R8 = 1.000. Therefore, qc and qd, and the radius of curvature of the concave mirrors 4 and 5 are equal to or near the radius of curvature of the collimator mirror 8. In the above example, concave mirrors are used for the two recording light sources 2 and 3, respectively. However, in many cases, it is sufficient for this configuration to employ at least one of the two recording light sources. Also for the diffraction grating substrate, it is possible to use a cylindrical surface, a spherical surface, or the like in addition to the flat surface. Regarding the value of each parameter shown in each of the above-described examples, the aberration characteristic is stable in the vicinity of the value, and the aberration characteristic hardly changes even if it is changed a little.

【0008】[0008]

【発明の効果】本発明による回折格子は従来のホログラ
フィック回折格子に比し、記録光に非球面波を用いたこ
とにより格子パターンを形成したので、分光器を構成す
る光学素子或は回折格子自身を軸外し状態で用いること
により発生する収差の補正が従来のホログラフィック回
折格子に比し一層良好になった。また非球面波を得るの
に凹球面鏡を軸外しで用いると、非球面光学系を用いる
のに非し、回折格子の格子パターン記録用光学系を容易
にきわめて精密に最適設計の諸パラメータに合わせて構
成することができる。
As compared with the conventional holographic diffraction grating, the diffraction grating according to the present invention forms the grating pattern by using the aspherical wave for the recording light, so that the optical element or the diffraction grating constituting the spectroscope is formed. The correction of the aberration generated by using itself in the off-axis state is better than that of the conventional holographic diffraction grating. If a concave spherical mirror is used off-axis to obtain an aspherical wave, it is not necessary to use an aspherical optical system, and the grating pattern recording optical system of the diffraction grating can be adjusted very precisely to the parameters of the optimum design. Can be configured.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の一実施例分光器の平面図、FIG. 1 is a plan view of a spectroscope according to an embodiment of the present invention,

【図2】 同実施例の回折格子の格子パターン記録次の
配置を示す平面図、
FIG. 2 is a plan view showing the arrangement of a grating pattern recorded next to the diffraction grating of the embodiment,

【図3】 同実施例の効果を示すグラフ、FIG. 3 is a graph showing the effect of the same embodiment,

【図4】 本発明の更に他の一実施例の回折格子の格子
パターン記録時の配置を示す平面図、
FIG. 4 is a plan view showing an arrangement of a diffraction grating of another embodiment of the present invention during recording of a grating pattern,

【図5】 同実施例による回折格子を用いた分光器の平
面図。
FIG. 5 is a plan view of a spectroscope using a diffraction grating according to the example.

【符号の説明】[Explanation of symbols]

1 平面回折格子基板 2,3 記録点光源 4,5 凹面鏡 6 入射スリット 7 出射スリット 8 コリメータ鏡 9 出口スリット 10 凹面回折格子 11 凹面回折格子基板 12 平面回折格子 1 plane diffraction grating substrate 2,3 recording point light source 4,5 concave mirror 6 entrance slit 7 exit slit 8 collimator mirror 9 exit slit 10 concave diffraction grating 11 concave diffraction grating substrate 12 plane diffraction grating

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 瀬谷・波岡マウント分光器において、凹
球面の回折格子基板を用い、同基板とほゞ同じ曲率半径
をもつ凹面鏡に対して軸外し位置に点光源を配置して回
折格子基板面に干渉パターンを形成させて作られたホロ
グラフィック凹面回折格子を用い、この凹面回折格子の
曲率半径を基準としてこれを500としたとき、分光器
において、入射スリットから回折格子中心までの距離r
および回折格子中心から出射スリットまでの距離r’を
夫々約410、両スリット位置が回折格子中心に対して
張る角θを約69.7°とし、上記ホログラフィック回
折格子の露光条件を下記のようにしたことを特徴とする
回折格子分光器。 記 図2によって定義された各パラメータに対して凹面回折
格子の曲率半径を基準としてこれを500としたとき、 r 約2.00×103 r 約871 p 約205 α 約4.77° β 約11° r 約8.2° 露光波長 457.93nm
1. In a Seya-Namioka mount spectrometer, a diffraction grating substrate having a concave spherical surface is used, and a point light source is arranged at an off-axis position with respect to a concave mirror having substantially the same radius of curvature as that of the diffraction grating substrate surface. When a holographic concave diffraction grating made by forming an interference pattern is used and the radius of curvature of this concave diffraction grating is taken as 500, the distance r from the entrance slit to the center of the diffraction grating in the spectroscope is
The distance r ′ from the center of the diffraction grating to the exit slit is about 410, and the angle θ formed by the positions of both slits with respect to the center of the diffraction grating is about 69.7 °. The exposure conditions of the holographic diffraction grating are as follows. A diffraction grating spectroscope characterized in that When the radius of curvature of the concave diffraction grating is taken as a reference for each parameter defined by FIG. 2 and is set to 500, r about 2.00 × 10 3 r about 871 p about 205 α about 4.77 ° β about 11 ° r about 8.2 ° exposure wavelength 457.93 nm
【請求項2】 リトローマウント分光器であって、使用
する回折格子が平面回折格子であり、コリメータ鏡の曲
率半径を基準にしてこれを1とするとき、図5によって
定義される分光器についてのパラメータが D,D’ 約0.41 r,r’ 約0.5° θ 約4.3° θ’ 約5.7° K 約1.2° であり、上記回折格子のホログラフィック露光条件が、
図4によって定義されるパラメータについて、 pc,pd 約0.4 qc,qd 約0.87 tc,qd 約6.2° td 約13.5° 露光波長 441.6nm であることを特徴とする回折格子分光器
2. A Littrow mount spectrograph, wherein the diffraction grating used is a plane diffraction grating, and when this is set to 1 on the basis of the radius of curvature of the collimator mirror, the spectroscope defined by FIG. Is about 0.41 r, r ′ is about 0.5 ° θ is about 4.3 ° θ ′ is about 5.7 ° K is about 1.2 °, and the holographic exposure condition of the diffraction grating is But,
For the parameters defined by FIG. 4, pc, pd about 0.4 qc, qd about 0.87 tc, qd about 6.2 ° td about 13.5 ° exposure wavelength 441.6 nm Grating spectrometer
JP5078672A 1985-04-11 1993-03-13 Diffraction grating spectrometer Expired - Lifetime JP2518505B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5078672A JP2518505B2 (en) 1985-04-11 1993-03-13 Diffraction grating spectrometer

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP60-77154 1985-04-11
JP7715485 1985-04-11
JP5078672A JP2518505B2 (en) 1985-04-11 1993-03-13 Diffraction grating spectrometer

Publications (2)

Publication Number Publication Date
JPH06194510A true JPH06194510A (en) 1994-07-15
JP2518505B2 JP2518505B2 (en) 1996-07-24

Family

ID=26418250

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5078672A Expired - Lifetime JP2518505B2 (en) 1985-04-11 1993-03-13 Diffraction grating spectrometer

Country Status (1)

Country Link
JP (1) JP2518505B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020013061A (en) * 2000-08-10 2002-02-20 조기환 Method for Determinating spectrum using multslit and mult channel spectrograph using the same
CN100434945C (en) * 2006-07-07 2008-11-19 中国科学院长春光学精密机械与物理研究所 IV type concave holographic grating production process
JP2015503764A (en) * 2012-01-13 2015-02-02 ローパー サイエンティフィック インコーポレイテッドRoper Scientific,Inc. Aberration imaging spectrometer

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WO2017212522A1 (en) 2016-06-06 2017-12-14 株式会社島津製作所 Diffraction grating and spectral device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020013061A (en) * 2000-08-10 2002-02-20 조기환 Method for Determinating spectrum using multslit and mult channel spectrograph using the same
CN100434945C (en) * 2006-07-07 2008-11-19 中国科学院长春光学精密机械与物理研究所 IV type concave holographic grating production process
JP2015503764A (en) * 2012-01-13 2015-02-02 ローパー サイエンティフィック インコーポレイテッドRoper Scientific,Inc. Aberration imaging spectrometer

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