JPH06192896A - Method and device for dissolving plating metallic material - Google Patents

Method and device for dissolving plating metallic material

Info

Publication number
JPH06192896A
JPH06192896A JP34591192A JP34591192A JPH06192896A JP H06192896 A JPH06192896 A JP H06192896A JP 34591192 A JP34591192 A JP 34591192A JP 34591192 A JP34591192 A JP 34591192A JP H06192896 A JPH06192896 A JP H06192896A
Authority
JP
Japan
Prior art keywords
plating
metal
tank
slurry
raw material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP34591192A
Other languages
Japanese (ja)
Inventor
Hiroshi Nakano
浩 中野
Yasuhide Okada
康秀 岡田
Shingo Fujii
慎吾 藤井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP34591192A priority Critical patent/JPH06192896A/en
Publication of JPH06192896A publication Critical patent/JPH06192896A/en
Pending legal-status Critical Current

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  • Manufacture And Refinement Of Metals (AREA)
  • Coating With Molten Metal (AREA)

Abstract

PURPOSE:To prevent the generation of dust from a fine plating metal and to dissolve the plating metal in a plating soln. at a high rate in the metal plating using an insoluble anode by mixing the plating metal with the plating soln. and dissolving the metal in the soln. CONSTITUTION:The plating metal ion in a plating soln. consumed in plating is replenished in a metal plating device using an insoluble anode. In this case, a plating metal powder M in a receiving tank 1 is charged into a solid-liq. mixing tank 3 by a feeder 2 and mixed with a plating soln. having a low content of plating metal ion from a pipeline 12 to obtain a slurry, the slurry is supplied to a dissolution tank 4 through a pipeline 9 provided with a pump 6 and sufficiently agitated to dissolve the metal M in a plating soln. to replenish the plating metal ion, and the slurry is returned to the plating tank. Since the fine-powder plating metal M is slurried, the loss due to the generation of dust is eliminated, and the metal is dissolved in the plating soln. at a high rate.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、不溶性陽極を用いる電
気亜鉛めっき設備において消費される亜鉛等の金属イオ
ンをめっき液中に補給するためのめっき用金属性原料の
搬送ならびに溶解技術に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for transporting and dissolving a metallic raw material for plating for replenishing a plating solution with metal ions such as zinc consumed in an electrogalvanizing facility using an insoluble anode.

【0002】[0002]

【従来の技術】従来、不溶性陽極を用いる電気亜鉛めっ
き設備において消費される亜鉛等の金属イオンをめっき
液中に補給するやり方としては、金属粉末あるいは金属
化合物をめっき液に溶解させることが行われる。これら
の原料は、空気輸送やスクリューコンベヤ等における搬
送時の取扱い易さの観点からは粒径が大きい方が好都合
である。亜鉛イオンを例にとると、受入れる原料として
酸化亜鉛粉末の場合は粒径 300μm 以上のもの、金属亜
鉛粉末の場合は粒径 1mm以上のものが好ましいが、こう
したいわば粒径の大きいものは、めっき液に溶解する場
合には溶解速度が低いという問題点があり、溶解性の観
点からは、もっと粒径の細かいものの方が有利であるこ
とはいうまでもない。しかし、受入れる原料の粒径が細
かい場合、搬送に用いるスクリューコンベヤの継ぎ目か
らの発塵や、溶解槽への投入口における発塵が甚だし
く、この発塵がめっき液のヒュームによって周囲に固着
して目詰まりや洩れの原因となるなどのトラブルがあ
り、改善が望まれていた。
2. Description of the Related Art Conventionally, a method of replenishing a plating solution with metal ions such as zinc consumed in an electrogalvanizing facility using an insoluble anode is to dissolve a metal powder or a metal compound in the plating solution. . It is preferable that these raw materials have a large particle size from the viewpoint of easiness of handling at the time of pneumatic transportation or transportation by a screw conveyor or the like. Taking zinc ions as an example, it is preferable to use zinc oxide powder with a particle size of 300 μm or more as the starting material, and metal zinc powder with a particle size of 1 mm or more. When dissolved in a liquid, there is a problem that the dissolution rate is low, and it goes without saying that a finer particle size is advantageous from the viewpoint of solubility. However, when the particle size of the raw material to be received is small, the dust generation from the joint of the screw conveyor used for transportation and the dust generation at the inlet to the melting tank is extremely large, and this dust is fixed around by the fumes of the plating solution. There were problems such as clogging and leakage, and improvements were desired.

【0003】[0003]

【発明が解決しようとする課題】本発明は、こうした問
題点を解消し、原料の搬送性、発塵等の対環境性を満足
しながら溶解性にすぐれるようなめっき液原料の搬送な
らびに溶解技術を実現することを目的とする。
DISCLOSURE OF THE INVENTION The present invention solves these problems, and transports and dissolves a plating solution raw material which is excellent in solubility while satisfying the transportability of the raw material and environmental resistance such as dust generation. The purpose is to realize the technology.

【0004】[0004]

【課題を解決するための手段】本発明のめっき用金属原
料の溶解方法は、受入れた金属性原料をめっき液に混合
させ、スラリ状にして溶解槽に搬送し、溶解槽において
溶解させることを特徴とする。また、本発明のめっき用
金属原料の溶解装置は、金属性原料の受入れ槽と溶解槽
との間にこの金属性原料をめっき液に混合させてスラリ
状とする混合手段とスラリ輸送設備を設けたことを特徴
とする。
The method for dissolving a metal raw material for plating according to the present invention is to mix the received metallic raw material with a plating solution, form a slurry, and convey the slurry to a melting tank to dissolve it in the melting tank. Characterize. Further, the apparatus for dissolving a metal raw material for plating of the present invention is provided with a mixing means and a slurry transportation facility for mixing the metal raw material with a plating solution to form a slurry between a receiving tank for the metal raw material and a dissolving tank. It is characterized by that.

【0005】[0005]

【作 用】本発明によれば、受入れる原料としては発塵
のおそれや搬送性等を考慮せずに溶解性にすぐれた粒径
の細かいものを採用し、受入れ直後にこれをめっき液と
混合してスラリ状態として密閉したスラリ配管により溶
解槽へ搬送するから、搬送段階における発塵がなくな
り、かつ溶解槽における大きい溶解速度を実現すること
ができる。
[Operation] According to the present invention, as the raw material to be received, a fine particle having excellent solubility is used without considering the possibility of dust generation, transportability, etc., and this is mixed with the plating solution immediately after receiving. Then, since the slurry is conveyed to the melting tank in a slurry state by a closed slurry pipe, dust generation at the conveying stage is eliminated and a high melting speed in the melting tank can be realized.

【0006】スラリの濃度としては、重量で20%以下と
するのが好ましい。これ以上の濃度では固くなってスラ
リの搬送性が悪い。一方、あまり薄くすることは搬送効
率が低下しタンク等の容量が大きくなってしまうから、
好ましくないことはいうまでもない。
The slurry concentration is preferably 20% or less by weight. If the concentration is higher than this, it becomes hard and the transportability of the slurry is poor. On the other hand, if it is too thin, the transport efficiency will decrease and the capacity of the tank etc. will increase,
Needless to say, it is not preferable.

【0007】[0007]

【実施例】図1に本発明の第1の実施例の溶解装置を示
す。1は原料ホッパ、2は切り出し装置、3は固液混合
槽、4は溶解槽、5は循環タンク、6はスラリポンプ、
7は液送ポンプ、8はめっき液循環ポンプ、9はスラリ
配管、10はラインタンク行き配管、11はラインタンク戻
り配管、12は溶解設備送り配管、Mは原料で、この実施
例においては酸化亜鉛の粉体(JIS特号粉末品、平均
粒径 0.3μm)である。
EXAMPLE FIG. 1 shows a melting apparatus according to a first example of the present invention. 1 is a raw material hopper, 2 is a cutting device, 3 is a solid-liquid mixing tank, 4 is a dissolution tank, 5 is a circulation tank, 6 is a slurry pump,
7 is a liquid feed pump, 8 is a plating solution circulation pump, 9 is a slurry pipe, 10 is a line tank going pipe, 11 is a line tank return pipe, 12 is a melting equipment feeding pipe, and M is a raw material. Zinc powder (JIS special powder product, average particle size 0.3 μm).

【0008】この実施例におけるめっき液の組成は、硫
酸浴中に、亜鉛イオン 35 g/l を含有しpHは 1.7、
液温50℃である。原料ホッパ1に受入れた原料Mをスク
リューフィーダ等の切り出し装置2により適当量切り出
し、直接固液混合槽3に落下させ、溶解設備送り配管12
による循環タンクからの戻りめっき液の一部と原料Mを
混合させて重量で 5%のスラリ状とし、スラリポンプ6
とスラリ配管9で構成されるスラリ輸送設備によりスラ
リ状の原料を溶解槽4へ送り込んだ。スラリ輸送条件
は、圧力 5 kgf/cm2、揚程 10m、吐出量 10m3/H である
が、順調に輸送することができた。
The composition of the plating solution in this embodiment was such that the sulfuric acid bath contained zinc ions of 35 g / l and the pH was 1.7,
The liquid temperature is 50 ° C. An appropriate amount of the raw material M received in the raw material hopper 1 is cut out by a cutting device 2 such as a screw feeder and directly dropped into the solid-liquid mixing tank 3, and the melting equipment feed pipe 12
A part of the return plating solution from the circulation tank by and the raw material M are mixed to form a slurry with a weight of 5%.
The slurry-like raw material was sent to the melting tank 4 by means of a slurry transporting facility composed of the slurry pipe 9 and the slurry pipe 9. The slurry transportation conditions were a pressure of 5 kgf / cm 2 , a head of 10 m, and a discharge rate of 10 m 3 / H, but it was successfully transported.

【0009】溶解槽4に投入された原料スラリは内蔵の
攪拌機で攪拌しながらめっき液中に溶解させた。従来の
粉体からの直接の溶解の場合と比較すると、溶解槽の前
段階で一次溶解を行った結果となって、従来の粉体から
の直接の溶解の場合と比較すると約 10 %の溶解速度の
向上が見られた。なお、溶解槽4の上澄み液は液送ポン
プ7により循環タンク5に送られ、めっき液循環ポンプ
8によりラインタンク行き配管10とラインタンク戻り配
管11により図示しないラインタンクとの間を循環し、ま
ためっき液循環ポンプ8からのめっき液の一部はスラリ
混合と原料溶解のため固液混合槽3および溶解槽4に戻
される。
The raw material slurry charged in the dissolution tank 4 was dissolved in the plating solution while stirring with a built-in stirrer. Compared to the case of direct dissolution from conventional powder, the result of primary dissolution was carried out in the previous stage of the dissolution tank, which is about 10% of the dissolution compared to the case of direct dissolution from conventional powder. Speed improvements were seen. The supernatant liquid of the dissolution tank 4 is sent to the circulation tank 5 by the liquid feed pump 7, and circulated between the line tank going pipe 10 and the line tank return pipe 11 by the plating liquid circulating pump 8 and a line tank not shown, A part of the plating solution from the plating solution circulation pump 8 is returned to the solid-liquid mixing tank 3 and the dissolution tank 4 for slurry mixing and raw material dissolution.

【0010】なお、原料として酸化亜鉛粉体の例を示し
たが、金属亜鉛粉末、あるいは他の金属酸化物、金属粉
末の場合も結果は同様であり、搬送には何ら問題はな
く、すぐれた溶解性が得られる。
Although the example of zinc oxide powder was shown as a raw material, the same results were obtained in the case of metal zinc powder, other metal oxides, and metal powders, and there was no problem in transportation and it was excellent. Solubility is obtained.

【0011】[0011]

【発明の効果】本発明によれば、受入れた原料は直接固
液混合槽に投入されるから、目詰まり、発塵等の問題は
全く発生しないので搬送性を考慮することなく溶解性の
よい粒径の小さい原料を選択することができ、作業環境
が改善され、かつ高い溶解速度が得られるというすぐれ
た効果がある。
According to the present invention, since the received raw material is directly charged into the solid-liquid mixing tank, problems such as clogging and dust generation do not occur at all, and the solubility is good without considering the transportability. A raw material having a small particle size can be selected, the working environment is improved, and a high dissolution rate can be obtained, which is an excellent effect.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例を示す構成図である。FIG. 1 is a configuration diagram showing an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 原料ホッパ 2 切り出し装置 3 固液混合槽 4 溶解槽 5 循環タンク 6 スラリポンプ 7 液送ポンプ 8 めっき液循環ポンプ 9 スラリ配管 10 ラインタンク行き配管 11 ラインタンク戻り配管 12 溶解設備送り配管 M 原料 1 Raw material hopper 2 Cutting device 3 Solid-liquid mixing tank 4 Melting tank 5 Circulating tank 6 Slurry pump 7 Liquid feeding pump 8 Plating liquid circulating pump 9 Slurry piping 10 Line tank going piping 11 Line tank return piping 12 Melting equipment feeding piping M Raw material

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 消費される金属イオンをめっき液中に補
給するためのめっき用金属性原料の溶解方法において、
受入れた金属性原料(M)をめっき液に混合させ、スラ
リ状にして溶解槽(4)に搬送し、溶解槽(4)におい
て溶解させることを特徴とするめっき用金属性原料の溶
解方法。
1. A method for dissolving a metallic raw material for plating to replenish consumed metal ions into a plating solution,
A method for dissolving a metallic raw material for plating, characterized in that the received metallic raw material (M) is mixed with a plating solution, is made into a slurry and is conveyed to a dissolving tank (4), and is dissolved in the dissolving tank (4).
【請求項2】 消費される金属イオンをめっき液中に補
給するためのめっき用金属性原料の溶解装置において、
金属性原料(M)の受入れ槽(1)と溶解槽(4)との
間にこの金属性原料(M)をめっき液に混合させてスラ
リ状とする混合手段(3)とスラリ輸送設備(6、9)
を設けたことを特徴とするめっき用金属性原料の溶解装
置。
2. An apparatus for dissolving a metallic raw material for plating for replenishing consumed metal ions into a plating solution,
Mixing means (3) for mixing the metallic raw material (M) with the plating solution to form a slurry between the receiving tank (1) for receiving the metallic raw material (M) and the dissolving tank (4), and a slurry transport facility ( 6, 9)
An apparatus for melting a metallic raw material for plating, characterized by being provided with.
JP34591192A 1992-12-25 1992-12-25 Method and device for dissolving plating metallic material Pending JPH06192896A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34591192A JPH06192896A (en) 1992-12-25 1992-12-25 Method and device for dissolving plating metallic material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34591192A JPH06192896A (en) 1992-12-25 1992-12-25 Method and device for dissolving plating metallic material

Publications (1)

Publication Number Publication Date
JPH06192896A true JPH06192896A (en) 1994-07-12

Family

ID=18379836

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34591192A Pending JPH06192896A (en) 1992-12-25 1992-12-25 Method and device for dissolving plating metallic material

Country Status (1)

Country Link
JP (1) JPH06192896A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100833023B1 (en) * 2001-11-30 2008-05-27 주식회사 포스코 A resolving apparatus for settled kcl responding to the level of strip plating liquid

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100833023B1 (en) * 2001-11-30 2008-05-27 주식회사 포스코 A resolving apparatus for settled kcl responding to the level of strip plating liquid

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