JPH06186176A - X-ray mapping measurement method and device - Google Patents

Abstract

PURPOSE:To improve reliability for measuring mapping using X rays. CONSTITUTION:X-ray beams R which are wide and parallel are formed by diffracting the X rays emitted from an X-ray source 1 by a single-crystal member 2 in non-symmetrical cut and then the parallel X-ray beam R is applied to a fine region position P of a sample 3 via a small opening 7 of a slide slit 6. X rays diffracted by the region P are detected by an X-ray counter 5. When the slide slit 6 is moved in parallel in XY direction, the position of the opening 7 moves and then the incidence position of X rays entering the sample 3 changes, thus achieving X-ray diffraction measurement for a plurality of different points for the sample 3, namely mapping measurement. Since the sample 3 is positioned at a fixed location and there is no error fluctuation, a highly reliable measurement can be made.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an X-ray mapping measuring method for irradiating a sample having a relatively large area with X-rays at different positions and performing X-ray diffraction measurement individually for each X-ray irradiation position. The present invention relates to an X-ray mapping measurement apparatus for carrying out the method.

[0002]

2. Description of the Related Art Generally, an X-ray diffractometer irradiates a sample with X-rays and detects the X-rays diffracted by the sample with an X-ray detector to detect the composition of the sample and the internal crystal structure. Determine. In such an X-ray diffractometer, for example,
When measuring a sample having a large area, it is not possible to grasp the sample as a whole by measuring only one point of the sample, and it may be required to measure at multiple points of the sample. Such X-ray diffraction measurement is usually called mapping measurement.

When performing such mapping measurement, conventionally, a sample is placed on an XY slide stage and the XY
By moving the slide stage in the plane, different positions of the sample are sequentially carried to the X-ray irradiation position and the X-ray diffraction measurement is performed individually.

[0004]

However, the conventional X-ray mapping measurement using the XY slide stage has the following problems. Even if the XY slide stage is translated in-plane, it is not a perfect translation but always exhibits some vertical movement. Such up-and-down fluctuations are not a serious problem in ordinary machines and devices commonly found in the world, but they cause a very serious problem in X-ray diffraction measurement. For example, for a quartz plate produced by being cut from a single crystal ingot of quartz, when measuring the deviation of the inclination angle formed by the cut surface and the crystal lattice plane inside the quartz plate,
The deviation must be determined in angular units of a few seconds.
Despite this situation, if the XY slide stage on which the crystal plate to be inspected is mounted moves up and down, highly reliable X-ray mapping measurement cannot be expected.

The present invention has been made to solve the above problems, and an object thereof is to improve the reliability of mapping measurement using X-rays.

[0006]

In order to achieve the above object, an X-ray mapping measuring method according to the present invention forms an X-ray emitted from an X-ray source into a parallel and wide parallel X-ray beam bundle. Then, the position of the X-ray incident on the sample is changed by translating a slide slit having an opening of a minute area for passing the X-ray beam in a plane perpendicular to the parallel X-ray beam. Is characterized by.

Further, the X-ray mapping measuring apparatus according to the present invention comprises a parallel X-ray beam forming means arranged between the X-ray source and the sample, and a parallel X-ray beam forming means arranged between the parallel X-ray beam forming means and the sample. And a slide slit formed therein. Parallel X
The ray beam forming means shapes the X-ray beam emitted from the X-ray source into a parallel X-ray beam bundle having a wide width and parallel. The slide slit is provided with an opening having a minute area through which the X-ray beam passes, and moves in parallel in a plane perpendicular to the parallel X-ray beam bundle.

[0008]

When the slide slit is translated in the direction perpendicular to the parallel X-ray beam bundle, the aperture formed in the slide slit moves, and the incident position of the X-ray incident on the sample changes. Thereby, the X-ray diffraction measurement is performed on different positions of the sample. At this time, since the sample itself is placed at a fixed position and does not move in parallel, the sample does not change its position, and therefore the reliability of the X-ray diffraction measurement does not deteriorate.

[0009]

1 shows an embodiment of an X-ray mapping measuring apparatus according to the present invention. This device comprises an X-ray source 1,
An asymmetrically cut single crystal member 2 as a parallel X-ray beam forming means, a sample support base 4 for supporting a crystal plate 3 having a relatively large area as an inspection object, and an X for detecting X-rays diffracted by the crystal plate 3. It has an X-ray counter 5 as a line detecting means. The sample support base 4 can rotate and swing in an appropriate angle range as indicated by an arrow A about an axis ω passing through the center of the surface of the crystal plate 3.

The asymmetrically cut single crystal member 2 is
As shown in FIG. 2, the cut surface 2a of the single crystal member 2 is not parallel to the internal crystal lattice surface 2b, but an angle is provided between them. The X-rays emitted from the X-ray source 1 are incident on the single crystal member 2 in a state in which the slit 8 arranged at the front position of the single crystal member 2 has a narrow width. The incident X-rays are diffracted (reflected) by the crystal lattice plane 2b inclined with respect to the cut surface 2a, and thereby a parallel and parallel X-ray beam bundle R having a wide width is emitted from the single crystal member 2.

In FIG. 1, a slide slit 6 is provided between the single crystal member 2 and the crystal plate 3. The slide slit 6 is made of a material capable of blocking passage of X-rays, and has a circular opening 7 of a small area for passing X-rays formed at the central position thereof. Further, a parallel moving device (not shown) is attached to the slide slit 6, and the parallel moving device moves the slide slit 6 in the parallel X direction.
The line beam bundle R can be moved in two directions at right angles, that is, in the X direction and the Y direction by an arbitrary distance.

Since the X-ray mapping measuring apparatus according to this embodiment is constructed as described above, most of the parallel X-ray beam bundle R diffracted by the single crystal member 2 and emitted from the single crystal member 2 is a slide slit. The progress is blocked by 6,
Only a minute cross-section portion corresponding to the opening 7 passes through the slide slit 6 and enters one point P of the crystal plate 3. When the crystal plate 3 rotates and swings in response to the swing of the support base 4 in the A direction, if the X-rays incident on the crystal plate 3 satisfy the diffraction condition with the crystal lattice plane in the crystal plate 3, X The line diffracts at the crystal lattice plane, and the diffracted line is detected by the X-ray counter 5.
By measuring the rotation angle of the crystal plate 3 at this time and comparing it with a reference angle, the deviation of the inclination angle of the cut surface with respect to the crystal lattice plane of the crystal plate 3 is measured. Strictly speaking, the cut surface of the crystal plate 3 referred to here is the support base 4
It can be considered that it is the surface that contacts X.sub.2, but is substantially the opposite surface (the upper surface in the figure) on which X-rays are incident.

When the X-ray diffraction measurement for one point P, that is, the cut surface inspection is completed, the slide slit 6 is driven by the parallel moving device to move in parallel in the X direction, the Y direction, or both directions by an appropriate distance. For example, in FIG. 2, the slide slit 6 translates from the solid line position to the broken line position Q1. Then, the position of the opening 7 provided in the slide slit 6 moves, so that the incident position of the X-ray beam that passes through the opening 7 and enters the quartz plate 3 changes from P to P1. In this state, the X-ray diffraction measurement is performed by the X-ray counter 5 to measure the angular deviation of the crystal lattice plane at the point P1, that is, the angular deviation of the cut plane. Further, when the slide slit 6 is moved in parallel to the position of the alternate long and short dash line Q2, the X-ray incident position is moved to the point P2, and the cut surface inspection can be performed at this point.

As described above, by moving the slide slit 6 in parallel, X-ray diffraction measurement, that is, X-ray mapping measurement, is performed at a number of different points as necessary. At the time of this measurement, the crystal plate 3 is always stationary at a fixed position on the support base 4 and there is no position change. Therefore, the conventional measurement is performed while the crystal plate is moved in parallel using the slide stage. Compared with the method, the inspection can be performed with extremely high reliability.

Although the present invention has been described with reference to one embodiment, the present invention is not limited to this embodiment. For example, the minute cross-sectional opening 7 for X-ray passage provided in the slide slit 6 is not limited to a circular shape and may be a quadrangular shape.

The sample to be inspected is not limited to the quartz plate,
It is also possible to use any other single crystal sample or a polycrystalline sample.

Further, the means for shaping the X-rays emitted from the X-ray source 1 into a wide and parallel X-ray beam, that is, a parallel X-ray beam bundle is not necessarily limited to an asymmetric cut single crystal member. Not a thing. For example, the parallel X-ray beam bundle can be formed by using a well-known solar slit configured by laminating a plurality of metal plates at a minute interval.

[0018]

According to the present invention, the incident position of X-rays incident on the sample can be changed without moving the sample in parallel, so that the measurement error due to the position variation of the sample can be changed. The X-ray mapping measurement can be performed with high reliability without causing

[0019]

[Brief description of drawings]

FIG. 1 is a perspective view showing an embodiment of an X-ray mapping measuring apparatus according to the present invention.

FIG. 2 is a schematic view showing a case where the same mapping measuring apparatus is viewed from the side.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 X-ray source 2 Single crystal member (parallel X-ray beam forming means) 3 Quartz plate (sample) 4 Sample support 5 X-ray counter (X-ray detection means) 6 Slide slit 7 X-ray passage opening 8 Slit

Claims (3)

[Claims] 1. An X-ray mapping measurement method for irradiating X-rays to different positions of a sample to perform X-ray diffraction measurement, wherein X-rays emitted from an X-ray source are parallel X
X-rays incident on the sample are formed into a beam bundle of rays, and a slide slit having an opening of a small area for passing the X-ray beam is translated in a plane perpendicular to the parallel X-ray beam. X-ray mapping measurement method characterized by changing the position of the. 2. An X-ray mapping measuring apparatus having an X-ray source for radiating X-rays, a sample stage on which a sample is placed, and an X-ray detection means for detecting X-rays diffracted by the sample, Parallel X-ray beam forming means for forming an X-ray beam emitted from an X-ray source into a parallel and parallel X-ray beam bundle having a wide width and a parallel X-ray beam forming means and a sample And an opening having a very small area for passing an X-ray beam.
An X-ray mapping measuring device, comprising: a slide slit that can be translated in a plane perpendicular to a line beam bundle. 3. The X-ray mapping measurement apparatus according to claim 2, wherein the parallel beam forming means is a single crystal member having an asymmetric cut.