JPH06181265A - Storing package for semiconductor device - Google Patents

Storing package for semiconductor device

Info

Publication number
JPH06181265A
JPH06181265A JP4334132A JP33413292A JPH06181265A JP H06181265 A JPH06181265 A JP H06181265A JP 4334132 A JP4334132 A JP 4334132A JP 33413292 A JP33413292 A JP 33413292A JP H06181265 A JPH06181265 A JP H06181265A
Authority
JP
Japan
Prior art keywords
frame member
semiconductor element
metal
semiconductor device
lid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4334132A
Other languages
Japanese (ja)
Inventor
Toshifumi Kiyohara
敏史 清原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP4334132A priority Critical patent/JPH06181265A/en
Publication of JPH06181265A publication Critical patent/JPH06181265A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/1615Shape
    • H01L2924/16195Flat cap [not enclosing an internal cavity]

Landscapes

  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

PURPOSE:To hold a semiconductor device stably in good operational condition for a long time, by sealing a semiconductor device in a hermetic state completely and preventing a crack or a slit in a frame part even when outer force is applied to a metallic base. CONSTITUTION:A package for storing a semiconductor device 4 comprises a metallic base 1 having a mounting part 1a for mounting a semiconductor device 4, a frame member 2 detachable from the metallic base 1 and provided around the mounting part 1a for mounting the semiconductor device 4, and a metallic cover part 3 on the frame member 2 for blocking an opening of the frame member 2. The metallic cover part is made of metal having Young's modulus of 20000 Kg/mm<2> or above.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体素子を収容する半
導体素子収納用パッケージの改良に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improvement of a semiconductor element housing package for housing a semiconductor element.

【0002】[0002]

【従来技術】近年、情報処理装置の高性能化に伴いそれ
を構成する半導体素子も高密度化、高集積化が急激に進
んでいる。そのため半導体素子は作動時に発生する単位
面積、単位体積あたりの発熱量が増大し、半導体素子を
正常、且つ安定に作動させるためにはその熱をいかに効
率的に除去するかが課題となっている。
2. Description of the Related Art In recent years, as the performance of information processing apparatuses has increased, the density and integration of the semiconductor elements forming the information processing apparatuses have rapidly increased. Therefore, the amount of heat generated per unit area and unit volume of the semiconductor element increases during operation, and how to efficiently remove the heat is a problem in order to operate the semiconductor element normally and stably. .

【0003】従来、半導体素子の発生する熱の除去方法
としては、一般に銅ータングステン合金等から成り、上
面に半導体素子が載置される載置部を有する金属基体
と、前記金属基体上に取着され、半導体素子が載置され
る載置部を囲繞する酸化アルミニウム質焼結体等の電気
絶縁材料から成る枠部材と、前記枠部材上に取着され、
枠部材の開口を塞ぐコバール金属や42アロイ等の金属
材料から成る金属製蓋体とで構成される半導体素子収納
用パッケージを準備し、金属基体の半導体素子載置部に
半導体素子を載置固定して半導体素子から発生される熱
を金属基体に吸収させるとともに該吸収した熱を大気中
に放散させることによって行われている。
Conventionally, as a method of removing heat generated by a semiconductor element, a metal base generally made of copper-tungsten alloy or the like and having a mounting portion on which the semiconductor element is mounted, and a metal base are mounted on the metal base. And a frame member made of an electrically insulating material such as an aluminum oxide sintered body that surrounds a mounting portion on which the semiconductor element is mounted, and is mounted on the frame member,
A semiconductor element housing package composed of a metal cover made of a metal material such as Kovar metal or 42 alloy that closes the opening of the frame member is prepared, and the semiconductor element is mounted and fixed on the semiconductor element mounting portion of the metal base. Then, the heat generated from the semiconductor element is absorbed by the metal substrate and the absorbed heat is diffused into the atmosphere.

【0004】尚、前記枠部材はその上下両面に予めメタ
ライズ金属層が被着形成されており、枠部材の下面に被
着させたメタライズ金属層に金属基体を銀ロウ等のロウ
材を介しロウ付けすることによって枠部材は金属基体上
に取着され、また枠部材の上面に被着させたメタライズ
金属層に金属製蓋体を金ー錫合金等のロウ材を介しロウ
付けすることによって金属製蓋体は枠部材の上面に該枠
部材の開口を塞ぐようにして取着される。
A metallized metal layer is previously formed on both upper and lower surfaces of the frame member. The metallized metal layer deposited on the lower surface of the frame member is brazed with a metal base through a brazing material such as silver solder. The frame member is attached to the metal base by attaching the metal lid to the metallized metal layer adhered to the upper surface of the frame member by brazing the metal lid through a brazing material such as a gold-tin alloy. The lid-making body is attached to the upper surface of the frame member so as to close the opening of the frame member.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、この従
来の半導体素子収納用パッケージは内部に半導体素子を
気密に収容し、半導体装置となした後、半導体装置を外
部電気回路基板に実装する際等において金属基体に外力
が印加されると該外力によって枠部材に変形が生じると
ともにクラックや割れ等が発生してしまい、その結果、
前記枠部材に発生するクラックや割れ等によって半導体
素子収納用パッケージ内部の気密封止が破れ、内部に収
容する半導体素子を長期間にわたり正常、且つ安定に作
動させることができないという欠点を有していた。
However, this conventional package for accommodating a semiconductor element has a structure in which a semiconductor element is hermetically accommodated inside to form a semiconductor device and then the semiconductor device is mounted on an external electric circuit board. When an external force is applied to the metal substrate, the frame member is deformed by the external force and cracks or breaks occur, and as a result,
There is a drawback that the airtight sealing inside the semiconductor element housing package is broken due to cracks or breaks generated in the frame member, and the semiconductor element housed inside cannot be operated normally and stably for a long period of time. It was

【0006】[0006]

【発明の目的】本発明は上記欠点に鑑み案出されたもの
で、その目的は金属基体に外力が印加されても枠部材に
クラックや割れ等が発生することはなく、内部に収容す
る半導体素子の気密封止を完全として半導体素子を長期
間にわたり正常、且つ安定に作動させることができる半
導体素子収納用パッケージを提供することにある。
DISCLOSURE OF THE INVENTION The present invention has been devised in view of the above-mentioned drawbacks, and its object is to prevent the frame member from being cracked or broken even when an external force is applied to the metal substrate, and to store the semiconductor inside. An object of the present invention is to provide a package for accommodating a semiconductor element, which is capable of operating the semiconductor element normally and stably for a long period of time by completely hermetically sealing the element.

【0007】[0007]

【課題を解決するための手段】本発明は上面に半導体素
子が載置される載置部を有する金属基体と、前記金属基
体上に取着され、半導体素子が載置される載置部を囲繞
する枠部材と、前記枠部材上に取着され、枠部材の開口
を塞ぐ金属製蓋体とから成る半導体素子収納用パッケー
ジであって、前記金属製蓋体が20000Kg/mm2 以上のヤン
グ率を有する金属材で形成されていることを特徴とする
ものである。
According to the present invention, there are provided a metal base having a mounting portion on which a semiconductor element is mounted, and a mounting portion which is mounted on the metal base and on which the semiconductor element is mounted. A semiconductor element housing package comprising a surrounding frame member and a metal lid body attached to the frame member and closing the opening of the frame member, wherein the metal lid body is 20000 kg / mm 2 or more Young. It is characterized by being formed of a metal material having a ratio.

【0008】[0008]

【作用】本発明の半導体素子収納用パッケージによれ
ば、金属製蓋体をヤング率が20000Kg/mm2 以上の変形し
難い金属で形成したことから内部に半導体素子を気密に
収容し、半導体装置となした後、半導体装置の金属基体
に外力が印加され、枠部材を変形させようとしてもその
変形は枠部材の上面に取着させた金属製蓋体で有効に阻
止され、その結果、枠部材は変形に起因するクラックや
割れ等の発生が殆どなく、半導体素子収納用パッケージ
内部の気密封止を完全として内部に収容する半導体素子
を長期間にわたり正常、且つ安定に作動させることが可
能となる。
According to the semiconductor element housing package of the present invention, since the metal lid is made of a metal having a Young's modulus of 20000 Kg / mm 2 or more which is not easily deformed, the semiconductor element is hermetically housed in the semiconductor device. After that, even if an external force is applied to the metal base of the semiconductor device and the frame member is deformed, the deformation is effectively prevented by the metal lid attached to the upper surface of the frame member. There is almost no crack or breakage due to deformation of the member, and it is possible to operate the semiconductor element housed inside completely and completely and hermetically sealing the inside of the package for housing the semiconductor element normally and stably for a long period of time. Become.

【0009】[0009]

【実施例】次に本発明を添付図面に示す実施例に基づき
詳細に説明する。図1 は本発明の半導体素子収納用パッ
ケージの一実施例を示し、1 は金属基体、2 は枠部材、
3 は金属製蓋体である。この金属基体1 と枠部材2 と金
属製蓋体3 とで半導体素子4 を内部に収容するための容
器が構成される。
The present invention will now be described in detail with reference to the embodiments shown in the accompanying drawings. FIG. 1 shows an embodiment of a semiconductor element storage package of the present invention, 1 is a metal base, 2 is a frame member,
3 is a metal lid. The metal base 1, the frame member 2, and the metal lid 3 constitute a container for accommodating the semiconductor element 4 inside.

【0010】前記金属基体1 はその上面略中央部に半導
体素子4 が載置される載置部1aを有し、該載置部1a上に
半導体素子4 が接着剤を介して載置固定される。
The metal base 1 has a mounting portion 1a on the upper surface of which a semiconductor element 4 is mounted. The semiconductor element 4 is mounted and fixed on the mounting portion 1a with an adhesive. It

【0011】前記金属基体1 は半導体素子4 を支持する
支持部材として作用するとともに半導体素子4 が作動時
に発する熱を大気中に放散させる作用を為し、銅ータン
グステン合金等の金属材料で形成されている。
The metal base 1 functions as a support member for supporting the semiconductor element 4 and also dissipates heat generated during operation of the semiconductor element 4 into the atmosphere, and is made of a metal material such as a copper-tungsten alloy. ing.

【0012】前記銅ータングステン合金から成る金属基
体1 は該銅ータングステン合金の熱伝導率が150W/m・K
以上と高く、熱を伝導し易いことから金属基体1 上に半
導体素子4 を載置固定した場合、金属基体1 は半導体素
子4 が作動時に発する熱を直接伝導吸収するとともに該
吸収した熱を大気中に良好に放散させることができ、そ
の結果、半導体素子4 を常に低温となし、半導体素子4
を長期間にわたり正常、且つ安定に作動させることがで
きる。
The metal base 1 made of the copper-tungsten alloy has a thermal conductivity of 150 W / mK
When the semiconductor element 4 is mounted and fixed on the metal base 1 because it is high and it is easy to conduct heat, the metal base 1 directly conducts and absorbs the heat generated when the semiconductor element 4 operates, and at the same time absorbs the absorbed heat into the atmosphere. It is possible to dissipate well into the semiconductor element 4, and as a result, the semiconductor element 4 is always kept at a low temperature.
Can be operated normally and stably for a long period of time.

【0013】尚、前記銅ータングステン合金から成る金
属基体1 は、例えばタングステンの粉末( 約10μm)を10
0Kg/cm2 の圧力で加圧成形するとともにこれを還元雰囲
気中、約2300℃の温度で焼成して多孔質のタングステン
焼結体を得、次ぎに1100℃の温度で加熱溶融させた銅を
前記タングステン焼結体の多孔部分に毛管現象を利用し
て含浸させることによって製作される。
The metal substrate 1 made of the copper-tungsten alloy is made of, for example, tungsten powder (about 10 μm) 10
While press-molding at a pressure of 0 Kg / cm 2 and calcining this in a reducing atmosphere at a temperature of about 2300 ° C., a porous tungsten sintered body was obtained, and then copper melted by heating at a temperature of 1100 ° C. It is manufactured by impregnating the porous portion of the tungsten sintered body by utilizing a capillary phenomenon.

【0014】また前記金属基体1 の上面には該金属基体
1 の半導体素子載置部1aを囲繞するようにして枠部材2
が取着されており、金属基体1 と枠部材2 とで半導体素
子4を収容するための空所が内部に形成されている。
Further, on the upper surface of the metal base 1, the metal base
The frame member 2 so as to surround the semiconductor element mounting portion 1a of 1
The metal base 1 and the frame member 2 are formed inside to form a space for housing the semiconductor element 4.

【0015】前記金属基体1 に取着される枠部材2 は酸
化アルミニウム質焼結体やムライト質焼結体、窒化アル
ミニウム質焼結体、炭化珪素質焼結体等の電気絶縁材料
から成り、例えば酸化アルミニウム質焼結体から成る場
合、酸化アルミニウム(Al 2O 3 ) 、シリカ(SiO2 ) 、
カルシア(CaO) 、マグネシア(MgO) 等の原料粉末に適当
な有機溶剤、溶媒を添加混合して泥漿状となすとともに
これを従来周知のドクターブレード法やカレンダーロー
ル法を採用しシート状に成形してセラミックグリーンシ
ート( セラミック生シート) を得、しかる後、前記セラ
ミックグリーンシートに適当な打ち抜き加工を施すとと
もに複数枚積層し、高温( 約1600℃) で焼成することに
よって製作される。
The frame member 2 attached to the metal substrate 1 is made of an electrically insulating material such as an aluminum oxide sintered body, a mullite sintered body, an aluminum nitride sintered body, and a silicon carbide sintered body. For example, when it is composed of an aluminum oxide sintered body, aluminum oxide (Al 2 O 3 ), silica (SiO 2 ),
Calcia (CaO), magnesia (MgO), and other raw material powders are mixed with an appropriate organic solvent and solvent to form a slurry, which is then formed into a sheet using the conventionally known doctor blade method and calender roll method. To obtain a ceramic green sheet (ceramic green sheet), and thereafter, the ceramic green sheet is appropriately punched, laminated with a plurality of sheets, and fired at a high temperature (about 1600 ° C.).

【0016】前記枠部材2 はその下面にタングステン、
モリブデン、マンガン等の高融点金属粉末から成るメタ
ライズ金属層5 が被着形成されており、該メタライズ金
属層5 は金属基体1 に枠部材2 をロウ付け取着する際の
下地金属層として作用し、メタライズ金属層5 と金属基
体1 の上面とを銀ロウ等のロウ材を介しロウ付けするこ
とによって枠部材2 は金属基体1 上に取着される。
The frame member 2 has tungsten on its lower surface,
A metallized metal layer 5 made of a refractory metal powder such as molybdenum or manganese is deposited and formed.The metallized metal layer 5 acts as a base metal layer when brazing and attaching the frame member 2 to the metal substrate 1. The frame member 2 is attached to the metal base 1 by brazing the metallized metal layer 5 and the upper surface of the metal base 1 with a brazing material such as silver brazing.

【0017】前記メタライズ金属層5 はタングステン、
モリブデン等の金属粉末に適当な有機溶剤、溶媒を添加
混合して得た金属ペーストを枠部材2 と成るセラミック
グリーンシートに予め従来周知のスクリーン印刷法によ
り所定パターンに印刷塗布しておくことによって枠部材
2 の下面に被着形成される。
The metallized metal layer 5 is made of tungsten,
An appropriate organic solvent to a metal powder such as molybdenum, a metal paste obtained by adding and mixing a solvent is applied to a ceramic green sheet as the frame member 2 in advance in a predetermined pattern by a known screen printing method to form a frame. Element
It is adhered to the lower surface of 2.

【0018】また前記枠部材2 はその内部に複数個のメ
タライズ配線層6 が埋設してあり、該メタライズ配線層
6 は半導体素子3 の電極を外部リード端子7 に接続する
作用を為し、その一端に外部リード端子7 が、また他端
には半導体素子4 の電極に接続されたボンディングワイ
ヤ8 が各々、取着される。
The frame member 2 has a plurality of metallized wiring layers 6 embedded therein.
6 serves to connect the electrode of the semiconductor element 3 to the external lead terminal 7, and has the external lead terminal 7 at one end and the bonding wire 8 connected to the electrode of the semiconductor element 4 at the other end. Be worn.

【0019】前記メタライズ配線層6 はタングステン、
モリブデン、マンガン等の高融点金属粉末から成り、前
記枠部材2 の下面に被着形成したメタライズ金属層5 と
同様の方法によって枠部材2 の内部に埋設される。
The metallized wiring layer 6 is made of tungsten,
It is made of refractory metal powder such as molybdenum or manganese, and is embedded in the frame member 2 by the same method as the metallized metal layer 5 formed on the lower surface of the frame member 2.

【0020】前記枠部材2 に埋設したメタライズ配線層
6 にはその一端に外部リード端子7が銀ロウ等のロウ材
を介してロウ付け取着されており、該外部リード端子7
は内部に収容する半導体素子4 の各電極を外部電気回路
に電気的に接続する作用を為し、コバール金属( 鉄ーニ
ッケルーコバルト合金) や42アロイ(鉄ーニッケル合
金)等の金属をピン状になしたものが使用される。
Metallized wiring layer embedded in the frame member 2
The external lead terminal 7 is brazed and attached to one end of the external lead terminal 6 through a brazing material such as silver solder.
Has a function of electrically connecting each electrode of the semiconductor element 4 housed inside to an external electric circuit, and a metal such as Kovar metal (iron-nickel-cobalt alloy) or 42 alloy (iron-nickel alloy) is pin-shaped. What is made is used.

【0021】尚、前記外部リード端子7 はその外表面に
ニッケル、金等の耐蝕性に優れ、良導電性で、且つロウ
材との濡れ性(反応性)が良い金属をメッキ法より1.0
乃至20.0μm の厚みに層着させておくと、外部リード端
子7 の酸化腐食が有効に防止されるとともに外部リード
端子7 と外部電気回路との電気的接続を良好となすこと
ができる。従って、前記外部リード端子7 はその外表面
にニッケル、金等の金属をメッキ法より1.0 乃至20.0μ
m の厚みに層着させておくことが好ましい。
It should be noted that the external lead terminal 7 has a metal such as nickel or gold having excellent corrosion resistance, good conductivity, and good wettability (reactivity) with the brazing material on the outer surface of the outer lead terminal 7 by the plating method.
By layering the external lead terminals 7 to a thickness of 20.0 μm, oxidative corrosion of the external lead terminals 7 can be effectively prevented and good electrical connection between the external lead terminals 7 and the external electric circuit can be achieved. Therefore, the external lead terminal 7 is plated with a metal such as nickel or gold at 1.0 to 20.0 μm on its outer surface.
It is preferable that the layers are laminated in a thickness of m.

【0022】また前記枠部材2 は更にその上面にメタラ
イズ金属層9 が被着形成されており、該メタライズ金属
層9 は枠部材2 に金属製蓋体3 を取着させる際の下地金
属層として作用し、メタライズ金属層9 に金属製蓋体3
を金ー錫合金等のロウ材を介しロウ付け取着することに
よって金属基体1 と枠部材2 と金属製蓋体3 とから容器
内部に半導体素子4 が気密に収容される。
A metallized metal layer 9 is further formed on the upper surface of the frame member 2, and the metallized metal layer 9 serves as a base metal layer when the metal lid 3 is attached to the frame member 2. Working and metallized metal layer 9 with metal lid 3
The semiconductor element 4 is hermetically housed in the container from the metal base body 1, the frame member 2, and the metal lid 3 by brazing and attaching the above with a brazing material such as a gold-tin alloy.

【0023】前記枠部材2 の上面に被着されるメタライ
ズ金属層9 はタングステン、モリブデン、マンガン等の
高融点金属粉末から成り、枠部材2 の下面に被着させた
メタライズ金属層5 と同様の方法よって枠部材2 の上面
に被着形成される。
The metallized metal layer 9 deposited on the upper surface of the frame member 2 is made of refractory metal powder such as tungsten, molybdenum and manganese, and is similar to the metallized metal layer 5 deposited on the lower surface of the frame member 2. It is formed on the upper surface of the frame member 2 by a method.

【0024】更に前記枠部材2 のメタライズ金属層9 に
ロウ材を介してロウ付け取着される金属製蓋体3 はヤン
グ率が20000Kg/mm2 以上の金属、具体的にはタングステ
ン、モリブデン、銅ータングステン合金等で形成され、
該金属製蓋体3 は枠部材2 の開口部を塞ぎ、半導体素子
4 を容器内部に気密に封止する作用を為す。
Further, the metal lid 3 which is brazed and attached to the metallized metal layer 9 of the frame member 2 through a brazing material has a Young's modulus of 20000 Kg / mm 2 or more, specifically, tungsten, molybdenum, Made of copper-tungsten alloy, etc.,
The metal lid 3 closes the opening of the frame member 2 and
4 acts to hermetically seal the inside of the container.

【0025】前記金属製蓋体3 はそのヤング率が20000K
g/mm2 以上であり、変形し難いことから容器内部に半導
体素子を気密に収容し、半導体装置となした後、金属基
体1に外力が印加され、枠部材2 を変形させようとして
も枠部材2 の上面には変形し難い金属製蓋体2 が取着さ
れていることからその変形が有効に阻止され、その結
果、枠部材2 には変形に伴うクラックや割れ等の発生が
殆どなく、容器内部の気密封止が完全となって内部に収
容する半導体素子4 を長期間にわたり正常、且つ安定に
作動させることが可能となる。
The Young's modulus of the metal lid 3 is 20000K
Since g / mm 2 or more is difficult to deform, the semiconductor element is hermetically housed inside the container to form a semiconductor device, and then an external force is applied to the metal base 1 to deform the frame member 2 even if the frame member 2 is deformed. Since the metal lid 2 that is difficult to deform is attached to the upper surface of the member 2, the deformation is effectively prevented, and as a result, the frame member 2 has almost no cracks or fractures due to the deformation. Since the hermetically sealed inside of the container is complete, the semiconductor element 4 housed inside can be operated normally and stably for a long period of time.

【0026】尚、前記金属製蓋体3 のヤング率が20000K
g/mm2 未満であると金属基体1 に外力が印加されると該
外力によって枠部材2 に変形が生じるとともにクラック
や割れ等が発生し、半導体素子を収容する容器内部の気
密封止が破れてしまう。従って、前記金属製蓋体3 はヤ
ング率が20000Kg/mm2 以上に特定される。
The Young's modulus of the metallic lid 3 is 20000K.
If it is less than g / mm 2 , when an external force is applied to the metal substrate 1, the external force causes the frame member 2 to be deformed and cracks or breaks occur, which breaks the hermetic seal inside the container that houses the semiconductor element. Will end up. Therefore, Young's modulus of the metallic lid 3 is specified to 20000 Kg / mm 2 or more.

【0027】かくして本発明の半導体素子収納用パッケ
ージによれば枠部材2 が取着された金属基体1 の半導体
素子載置部1a上に半導体素子4 を接着剤を介して載置固
定し、半導体素子4 の各電極をボンディングワイヤ8 を
介してメタライズ配線層6 に接続するとともに金属製蓋
体3 を枠部材2 の上面にロウ材を介して接合させること
によって製品としての半導体装置となる。
Thus, according to the semiconductor element housing package of the present invention, the semiconductor element 4 is mounted and fixed on the semiconductor element mounting portion 1a of the metal substrate 1 to which the frame member 2 is attached by the adhesive, By connecting each electrode of the element 4 to the metallized wiring layer 6 via the bonding wire 8 and joining the metal lid 3 to the upper surface of the frame member 2 via the brazing material, a semiconductor device as a product is obtained.

【0028】尚、本発明は上述の実施例に限定されるも
のではなく、本発明の要旨を逸脱しない範囲であれば種
々の変更は可能である。
The present invention is not limited to the above-mentioned embodiments, and various modifications can be made without departing from the gist of the present invention.

【0029】[0029]

【発明の効果】本発明の半導体素子収納用パッケージに
よれば、金属製蓋体をヤング率が20000Kg/mm2 以上の変
形し難い金属で形成したことから内部に半導体素子を気
密に収容し、半導体装置となした後、半導体装置の金属
基体に外力が印加され、枠部材を変形させようとしても
その変形は枠部材の上面に取着させた金属製蓋体で有効
に阻止され、その結果、枠部材は変形に起因するクラッ
クや割れ等の発生が殆どなく、半導体素子収納用パッケ
ージ内部の気密封止を完全として内部に収容する半導体
素子を長期間にわたり正常、且つ安定に作動させること
が可能となる。
According to the semiconductor element housing package of the present invention, since the metal lid is made of a metal which has a Young's modulus of 20000 Kg / mm 2 or more and is hard to deform, the semiconductor element is hermetically housed inside, After forming the semiconductor device, an external force is applied to the metal base of the semiconductor device, and even if the frame member is deformed, the deformation is effectively prevented by the metal lid attached to the upper surface of the frame member. The frame member has almost no cracks or breaks due to deformation, and the semiconductor element housed inside the semiconductor element housing package is completely hermetically sealed and can operate normally and stably for a long period of time. It will be possible.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の半導体素子収納用パッケージの一実施
例を示す断面図である。
FIG. 1 is a cross-sectional view showing an embodiment of a semiconductor element housing package of the present invention.

【符号の説明】[Explanation of symbols]

1・・・・・金属基体 1a・・・・半導体素子載置部 2・・・・・枠部材 3・・・・・金属製蓋体 4・・・・・半導体素子 6・・・・・メタライズ配線層 7・・・・・外部リード端子 DESCRIPTION OF SYMBOLS 1 ... Metal substrate 1a ... Semiconductor element mounting part 2 ... Frame member 3 ... Metal lid 4 ... Semiconductor element 6 ... Metallized wiring layer 7 ... External lead terminals

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】上面に半導体素子が載置される載置部を有
する金属基体と、前記金属基体上に取着され、半導体素
子が載置される載置部を囲繞する枠部材と、前記枠部材
上に取着され、枠部材の開口を塞ぐ金属製蓋体とから成
る半導体素子収納用パッケージであって、前記金属製蓋
体が20000Kg/mm2 以上のヤング率を有する金属材で形成
されていることを特徴とする半導体素子収納用パッケー
ジ。
1. A metal base having an upper surface on which a semiconductor element is mounted, a frame member attached to the metal base and surrounding the mounting section on which the semiconductor element is mounted, A package for storing a semiconductor element, comprising a metal lid attached to a frame member and closing an opening of the frame member, wherein the metal lid is made of a metal material having a Young's modulus of 20000 Kg / mm 2 or more. A package for housing a semiconductor element, which is characterized in that
JP4334132A 1992-12-15 1992-12-15 Storing package for semiconductor device Pending JPH06181265A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4334132A JPH06181265A (en) 1992-12-15 1992-12-15 Storing package for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4334132A JPH06181265A (en) 1992-12-15 1992-12-15 Storing package for semiconductor device

Publications (1)

Publication Number Publication Date
JPH06181265A true JPH06181265A (en) 1994-06-28

Family

ID=18273886

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4334132A Pending JPH06181265A (en) 1992-12-15 1992-12-15 Storing package for semiconductor device

Country Status (1)

Country Link
JP (1) JPH06181265A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003007885A (en) * 2001-06-26 2003-01-10 Kyocera Corp Package for storing semiconductor element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003007885A (en) * 2001-06-26 2003-01-10 Kyocera Corp Package for storing semiconductor element

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