JPH061696A - Method for growing beta-barium borate single crystal - Google Patents

Method for growing beta-barium borate single crystal

Info

Publication number
JPH061696A
JPH061696A JP15907192A JP15907192A JPH061696A JP H061696 A JPH061696 A JP H061696A JP 15907192 A JP15907192 A JP 15907192A JP 15907192 A JP15907192 A JP 15907192A JP H061696 A JPH061696 A JP H061696A
Authority
JP
Japan
Prior art keywords
seed crystal
beta
crystal
growing
single crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15907192A
Other languages
Japanese (ja)
Other versions
JP2861640B2 (en
Inventor
Hikari Kouda
光 古宇田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP15907192A priority Critical patent/JP2861640B2/en
Publication of JPH061696A publication Critical patent/JPH061696A/en
Application granted granted Critical
Publication of JP2861640B2 publication Critical patent/JP2861640B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To realize the condition where the beta phase is crystallized in a seed crystal with good reproducibility in the process for growing a beta-barium borate single crystal (beta-BaB2O4 expressed BBO hereunder) using a seed crystal by the pull method. CONSTITUTION:A seed crystal with the edge sharpened is specularly ground and held directly above a molten material before growth, the tip of the seed crystal is heat-treated or etched with phosphoric acid, and then a crystal is grown. Consequently, the seed crystal is not cracked, and the thermal condition where the beta phase is crystallized is satisfied.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、ベータバリウムボレイ
ト単結晶(β−BaB2 4 :以後BBOと略記する)
を種子結晶を用いて引上法で育成する方法に関する。
BACKGROUND OF THE INVENTION The present invention relates to a beta barium borate single crystal (β-BaB 2 O 4 : hereinafter abbreviated as BBO).
The present invention relates to a method for growing seeds by a pulling method using seed crystals.

【従来の技術】従来、BBOを種子結晶を用いて引上法
で育成する際に用いる種子結晶は、種子結晶に必要な直
径および長さに育成した結晶をそのまま用いていた(特
願平3−272046)。
2. Description of the Related Art Conventionally, as a seed crystal used for growing BBO by a pull-up method using a seed crystal, a crystal grown to have a diameter and a length required for the seed crystal was used as it is (Japanese Patent Application No. 3-311). -272046).

【0002】[0002]

【発明が解決しようとする課題】種子結晶に必要な大き
さのBBOを再現良く育成することは非常に難しかっ
た。
It has been very difficult to grow BBO having a size required for seed crystals with good reproducibility.

【0003】[0003]

【課題を解決するための手段】本発明は先を尖らせて加
工した種子結晶の表面を鏡面研磨し、融液直上に保持し
て先端部分の表面を熱処理してから育成することによ
り、容易にBBOを育成する方法であり、また、先を尖
らせて加工した種子結晶の表面を鏡面研磨し、種子結晶
の先端を燐酸でエッチングしてから育成を開始すること
により、容易にBBOを育成する方法である。
According to the present invention, the surface of a seed crystal processed with a sharpened tip is mirror-polished, and the surface of the tip portion is heat-treated and held immediately above the melt, and then grown. Is a method for growing BBO, and the surface of the seed crystal processed with a sharpened tip is mirror-polished, and the tip of the seed crystal is etched with phosphoric acid, and then the growth is started to easily grow BBO. Is the way to do it.

【0004】[0004]

【作用】BBOを種子結晶を用いて引上法で育成するた
めには種子結晶からの熱の逃げが大きくなければならな
い。必要な種子結晶の大きさに加工しただけでは結晶表
面からの熱の逃げが悪くまた表面の加工歪みの影響で、
融液に接触させたときにクラックが入ってしまう。その
ため種子結晶に必要な大きさに育成した、表面が平滑で
加工歪みの無い結晶をそのまま用いなければならなかっ
た。しかし先を尖らせて加工した種子結晶の表面全体を
鏡面研磨し、育成開始前に融液直上に種子結晶を保持す
ることで種子結晶表面の加工歪みが除去され、また先が
尖っていることで融液に接触させたときの熱ショックも
緩和されてクラックが入らず、β相の結晶が育成される
条件を実現することが出来る。
In order to grow BBO by using the seed crystal by the pulling method, the heat escape from the seed crystal must be large. Only by processing to the required size of seed crystal, the heat escape from the crystal surface is poor and due to the processing strain on the surface,
It cracks when it comes into contact with the melt. Therefore, it has been necessary to use a crystal having a smooth surface and no processing strain, which has been grown to a size necessary for a seed crystal. However, the processing strain on the seed crystal surface is removed by mirror-polishing the entire surface of the seed crystal processed by sharpening and holding the seed crystal directly above the melt before the start of growth, and the point is also sharp. Thus, the condition that the heat shock when brought into contact with the melt is relaxed, cracks do not occur, and the β-phase crystal is grown can be realized.

【0005】また熱燐酸でエッチングすることでも加工
歪みが除去され、前記方法と同様にβ相の結晶が育成さ
れる条件を実現することが出来る。
Also, etching with hot phosphoric acid removes the processing strain, and the conditions under which β-phase crystals are grown can be realized as in the above method.

【0006】[0006]

【実施例】長さ50mm、直径3mmに加工したBBO
の片側の先を長さ10mmだけ直径1.0mmまで尖ら
せた。表面全体を鏡面研磨して種子結晶とし、育成前に
原料を融解させた融液直上に種子結晶を約5時間保持し
た。その後種子結晶を融液中に約10mm/hrで直径
が2mmの部分まで下ろした。その状態で約15分保持
した後、1mm/hrで引上げを開始したところ、β相
の単結晶が育成された。
[Example] BBO processed to a length of 50 mm and a diameter of 3 mm
The tip on one side was sharpened to a diameter of 1.0 mm by a length of 10 mm. The entire surface was mirror-polished to form seed crystals, and the seed crystals were held for about 5 hours directly above the melt in which the raw materials were melted before growing. After that, the seed crystal was lowered into the melt at a rate of about 10 mm / hr to a diameter of 2 mm. After holding in that state for about 15 minutes, when pulling was started at 1 mm / hr, a β-phase single crystal was grown.

【0007】また、前記と同様に加工した種子結晶の先
端部分約10mmを熱燐酸で180℃、5分間エッチン
グした後、育成原料の融液に約10mm/hrで直径が
2mmの部分まで下ろした。その状態で約15分保持し
た後、1mm/hrで引上げを開始したところ、β相の
単結晶が育成された。
Further, about 10 mm of the tip portion of the seed crystal processed in the same manner as described above was etched with hot phosphoric acid at 180 ° C. for 5 minutes, and then dropped into the melt of the growing material at a portion of about 2 mm in diameter at about 10 mm / hr. . After holding in that state for about 15 minutes, when pulling was started at 1 mm / hr, a β-phase single crystal was grown.

【0008】[0008]

【発明の効果】本発明によれば種子結晶を用いてBBO
を育成する際に、種子結晶にβ相が晶出する熱的条件を
実現でき、また種子結晶は再現性良く作成できるので、
BBO育成の歩留まりが向上する。
INDUSTRIAL APPLICABILITY According to the present invention, BBO using seed crystals
When growing, it is possible to realize the thermal condition that the β phase crystallizes in the seed crystal, and because the seed crystal can be created with good reproducibility,
The yield of BBO growth is improved.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 ベータバリウムボレイト単結晶を引上法
で育成する方法において、先を尖らせて鏡面研磨した種
子結晶を融液直上に保持し先端の表面を熱処理してから
育成を開始することを特徴とする、ベータバリウムボレ
イト単結晶の育成方法。
1. A method for growing a beta barium borate single crystal by a pulling method, wherein a seed crystal having a pointed and mirror-polished surface is held directly above the melt and the surface of the tip is heat-treated before starting the growth. A method for growing a beta barium borate single crystal, which is characterized in that
【請求項2】 ベータバリウムボレイト単結晶を引上法
で育成する方法において、先を尖らせて鏡面研磨した種
子結晶の先端を燐酸でエッチングしてから育成を開始す
ることを特徴とする、ベータバリウムボレイト単結晶の
育成方法。
2. A method for growing a beta-barium borate single crystal by the pulling method, characterized in that the tip of a seed crystal having a pointed and mirror-polished surface is etched with phosphoric acid before starting the growth. Method for growing beta-barium borate single crystal.
JP15907192A 1992-06-18 1992-06-18 Beta barium borate single crystal growth method Expired - Fee Related JP2861640B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15907192A JP2861640B2 (en) 1992-06-18 1992-06-18 Beta barium borate single crystal growth method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15907192A JP2861640B2 (en) 1992-06-18 1992-06-18 Beta barium borate single crystal growth method

Publications (2)

Publication Number Publication Date
JPH061696A true JPH061696A (en) 1994-01-11
JP2861640B2 JP2861640B2 (en) 1999-02-24

Family

ID=15685587

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15907192A Expired - Fee Related JP2861640B2 (en) 1992-06-18 1992-06-18 Beta barium borate single crystal growth method

Country Status (1)

Country Link
JP (1) JP2861640B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5456303A (en) * 1994-02-23 1995-10-10 Seiki Hanbai Co., Ltd. Open-and-close screen door
US20120136370A1 (en) * 2010-11-30 2012-05-31 Olympus Corporation Medical manipulator
WO2013073713A1 (en) 2011-11-16 2013-05-23 Olympus Corporation Medical treatment tool and manipulator including the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5456303A (en) * 1994-02-23 1995-10-10 Seiki Hanbai Co., Ltd. Open-and-close screen door
US20120136370A1 (en) * 2010-11-30 2012-05-31 Olympus Corporation Medical manipulator
WO2013073713A1 (en) 2011-11-16 2013-05-23 Olympus Corporation Medical treatment tool and manipulator including the same

Also Published As

Publication number Publication date
JP2861640B2 (en) 1999-02-24

Similar Documents

Publication Publication Date Title
CN101565185B (en) Method of manufacturing polycrystalline silicon rod
JPS6065787A (en) Manufacture of dislocation-free silicon single crystal rod
JP2848067B2 (en) Seed crystal of silicon single crystal
JP2861640B2 (en) Beta barium borate single crystal growth method
JP3904093B2 (en) Single crystal growth method
JP2959097B2 (en) Single crystal growth method
US5454345A (en) Method of growing single crystal of β-barium borate
JP2712594B2 (en) Method for producing group 3-5 compound semiconductor single crystal
JP2809364B2 (en) Method for producing lithium tetraborate single crystal
JP3115156B2 (en) Single crystal manufacturing method
JPS61251600A (en) Processing of wafer
JP2787996B2 (en) Method for producing lithium tetraborate single crystal
JP2507997B2 (en) Single crystal growth method
JP2781857B2 (en) Single crystal manufacturing method
JPH0737360B2 (en) Beta barium borate single crystal growth method
JP2861626B2 (en) Method of discriminating crystal phase of grown single crystal
JP3560067B2 (en) Single crystal growth method
JP2739554B2 (en) Method for producing lithium tetraborate crystal
JP2760819B2 (en) Method and apparatus for manufacturing compound semiconductor by boat growth method
RU1810401C (en) Method of growing single crystals of bismuth germanate
JPS55167200A (en) Crystal growing method
JP2501797B2 (en) Method for growing semiconductor single crystal
JPS6360194A (en) Method for pulling up single crystal
CN116397315A (en) CeF realized by using C-direction seed crystal 3 Method for directional growth of crystals
JPH0124760B2 (en)

Legal Events

Date Code Title Description
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 19981110

LAPS Cancellation because of no payment of annual fees