JPH0616645A - New synthetic intermediate and production of amino acid derivative - Google Patents
New synthetic intermediate and production of amino acid derivativeInfo
- Publication number
- JPH0616645A JPH0616645A JP4175806A JP17580692A JPH0616645A JP H0616645 A JPH0616645 A JP H0616645A JP 4175806 A JP4175806 A JP 4175806A JP 17580692 A JP17580692 A JP 17580692A JP H0616645 A JPH0616645 A JP H0616645A
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- lower alkyl
- alkyl group
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 42
- 150000003862 amino acid derivatives Chemical class 0.000 title abstract description 12
- 150000001875 compounds Chemical class 0.000 claims abstract description 81
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 69
- 125000002252 acyl group Chemical group 0.000 claims abstract description 31
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 27
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 18
- 125000000623 heterocyclic group Chemical group 0.000 claims abstract description 18
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 16
- 125000001424 substituent group Chemical group 0.000 claims abstract description 16
- 125000003118 aryl group Chemical group 0.000 claims abstract description 13
- 125000004433 nitrogen atom Chemical group N* 0.000 claims abstract description 13
- 125000004414 alkyl thio group Chemical group 0.000 claims abstract description 6
- 150000003839 salts Chemical class 0.000 claims description 57
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 26
- 239000001257 hydrogen Substances 0.000 claims description 26
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 22
- 125000003277 amino group Chemical group 0.000 claims description 15
- 229910052757 nitrogen Inorganic materials 0.000 claims description 13
- 125000006518 morpholino carbonyl group Chemical group [H]C1([H])OC([H])([H])C([H])([H])N(C(*)=O)C1([H])[H] 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 7
- 125000006239 protecting group Chemical group 0.000 claims description 5
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims description 5
- 125000005843 halogen group Chemical group 0.000 claims description 3
- HNDVDQJCIGZPNO-UHFFFAOYSA-N histidine Natural products OC(=O)C(N)CC1=CN=CN1 HNDVDQJCIGZPNO-UHFFFAOYSA-N 0.000 claims description 3
- 125000004043 oxo group Chemical group O=* 0.000 claims description 3
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 102100028255 Renin Human genes 0.000 abstract description 3
- 108090000783 Renin Proteins 0.000 abstract description 3
- 230000002401 inhibitory effect Effects 0.000 abstract description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 abstract description 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 abstract 1
- -1 methylhexyl Chemical group 0.000 description 138
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 93
- 238000006243 chemical reaction Methods 0.000 description 81
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 66
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 39
- 239000000243 solution Substances 0.000 description 34
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 33
- 239000000203 mixture Substances 0.000 description 29
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 28
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 26
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 26
- 239000002904 solvent Substances 0.000 description 25
- 239000010410 layer Substances 0.000 description 23
- 239000000126 substance Substances 0.000 description 23
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 21
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 21
- 239000012044 organic layer Substances 0.000 description 21
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical class CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 19
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 18
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 15
- 239000002253 acid Substances 0.000 description 15
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 14
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 13
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 12
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 12
- 235000019341 magnesium sulphate Nutrition 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 10
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 10
- 239000003054 catalyst Substances 0.000 description 10
- 238000003756 stirring Methods 0.000 description 10
- 125000005115 alkyl carbamoyl group Chemical group 0.000 description 9
- 239000002585 base Substances 0.000 description 9
- 238000006482 condensation reaction Methods 0.000 description 9
- 239000013078 crystal Substances 0.000 description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 9
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 8
- 238000003379 elimination reaction Methods 0.000 description 8
- 238000006722 reduction reaction Methods 0.000 description 7
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 6
- 235000011054 acetic acid Nutrition 0.000 description 6
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
- 239000003638 chemical reducing agent Substances 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 6
- 239000000706 filtrate Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 5
- 229910052783 alkali metal Inorganic materials 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 238000000605 extraction Methods 0.000 description 5
- 239000012467 final product Substances 0.000 description 5
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 5
- 229960002885 histidine Drugs 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000007858 starting material Substances 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 230000002411 adverse Effects 0.000 description 4
- 238000010531 catalytic reduction reaction Methods 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 4
- 125000002883 imidazolyl group Chemical group 0.000 description 4
- 229910052749 magnesium Inorganic materials 0.000 description 4
- 239000011777 magnesium Substances 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 235000017557 sodium bicarbonate Nutrition 0.000 description 4
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 4
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 4
- BTVXUNDDVUJORV-QFIPXVFZSA-N (2s)-2-(dibenzylamino)-3-phenylpropanoic acid Chemical compound C([C@@H](C(=O)O)N(CC=1C=CC=CC=1)CC=1C=CC=CC=1)C1=CC=CC=C1 BTVXUNDDVUJORV-QFIPXVFZSA-N 0.000 description 3
- CKGMOMHVIYUFJU-KBPBESRZSA-N (2s,3s)-2-amino-1-cyclohexyl-6-methylheptan-3-ol Chemical compound CC(C)CC[C@H](O)[C@@H](N)CC1CCCCC1 CKGMOMHVIYUFJU-KBPBESRZSA-N 0.000 description 3
- SJNKSJOXLPSIJA-LSLKUGRBSA-N (3s)-1-amino-1-cyclohexyl-6-methylheptan-3-ol Chemical compound CC(C)CC[C@H](O)CC(N)C1CCCCC1 SJNKSJOXLPSIJA-LSLKUGRBSA-N 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 3
- HNDVDQJCIGZPNO-YFKPBYRVSA-N L-histidine Chemical compound OC(=O)[C@@H](N)CC1=CN=CN1 HNDVDQJCIGZPNO-YFKPBYRVSA-N 0.000 description 3
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 3
- NQTADLQHYWFPDB-UHFFFAOYSA-N N-Hydroxysuccinimide Chemical compound ON1C(=O)CCC1=O NQTADLQHYWFPDB-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 3
- 125000003282 alkyl amino group Chemical group 0.000 description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 125000001584 benzyloxycarbonyl group Chemical group C(=O)(OCC1=CC=CC=C1)* 0.000 description 3
- 239000012267 brine Substances 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- UKVIEHSSVKSQBA-UHFFFAOYSA-N methane;palladium Chemical compound C.[Pd] UKVIEHSSVKSQBA-UHFFFAOYSA-N 0.000 description 3
- 150000007522 mineralic acids Chemical class 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- UYWQUFXKFGHYNT-UHFFFAOYSA-N phenylmethyl ester of formic acid Natural products O=COCC1=CC=CC=C1 UYWQUFXKFGHYNT-UHFFFAOYSA-N 0.000 description 3
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 235000019260 propionic acid Nutrition 0.000 description 3
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 3
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 description 3
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 3
- BSZQZNOAYQCQFZ-QHCPKHFHSA-N (2s)-2-azaniumyl-3-(1-tritylimidazol-4-yl)propanoate Chemical compound C1=NC(C[C@H]([NH3+])C([O-])=O)=CN1C(C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 BSZQZNOAYQCQFZ-QHCPKHFHSA-N 0.000 description 2
- ADFXKUOMJKEIND-UHFFFAOYSA-N 1,3-dicyclohexylurea Chemical compound C1CCCCC1NC(=O)NC1CCCCC1 ADFXKUOMJKEIND-UHFFFAOYSA-N 0.000 description 2
- OHVLMTFVQDZYHP-UHFFFAOYSA-N 1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-2-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound N1N=NC=2CN(CCC=21)C(CN1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)=O OHVLMTFVQDZYHP-UHFFFAOYSA-N 0.000 description 2
- KZEVSDGEBAJOTK-UHFFFAOYSA-N 1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-2-[5-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]-1,3,4-oxadiazol-2-yl]ethanone Chemical compound N1N=NC=2CN(CCC=21)C(CC=1OC(=NN=1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)=O KZEVSDGEBAJOTK-UHFFFAOYSA-N 0.000 description 2
- ASOKPJOREAFHNY-UHFFFAOYSA-N 1-Hydroxybenzotriazole Chemical compound C1=CC=C2N(O)N=NC2=C1 ASOKPJOREAFHNY-UHFFFAOYSA-N 0.000 description 2
- YXZFFTJAHVMMLF-UHFFFAOYSA-N 1-bromo-3-methylbutane Chemical compound CC(C)CCBr YXZFFTJAHVMMLF-UHFFFAOYSA-N 0.000 description 2
- YQTCQNIPQMJNTI-UHFFFAOYSA-N 2,2-dimethylpropan-1-one Chemical group CC(C)(C)[C]=O YQTCQNIPQMJNTI-UHFFFAOYSA-N 0.000 description 2
- JVSFQJZRHXAUGT-UHFFFAOYSA-N 2,2-dimethylpropanoyl chloride Chemical compound CC(C)(C)C(Cl)=O JVSFQJZRHXAUGT-UHFFFAOYSA-N 0.000 description 2
- JQMFQLVAJGZSQS-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-N-(2-oxo-3H-1,3-benzoxazol-6-yl)acetamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)NC1=CC2=C(NC(O2)=O)C=C1 JQMFQLVAJGZSQS-UHFFFAOYSA-N 0.000 description 2
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical class CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 2
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- OJJFVTGDRNRWQZ-NDEPHWFRSA-N CC(C)CCC(C[C@@H](C1=CC=CC=C1)N(CC1=CC=CC=C1)CC1=CC=CC=C1)=O Chemical compound CC(C)CCC(C[C@@H](C1=CC=CC=C1)N(CC1=CC=CC=C1)CC1=CC=CC=C1)=O OJJFVTGDRNRWQZ-NDEPHWFRSA-N 0.000 description 2
- MGJIEQAKPGKYSJ-NDEPHWFRSA-N CC(C)CCC(C[C@@H](C1CCCCC1)N(CC1=CC=CC=C1)CC1=CC=CC=C1)=O Chemical compound CC(C)CCC(C[C@@H](C1CCCCC1)N(CC1=CC=CC=C1)CC1=CC=CC=C1)=O MGJIEQAKPGKYSJ-NDEPHWFRSA-N 0.000 description 2
- SVXMMQJEBWNWDA-KBPBESRZSA-N CC(C)CC[C@@H](C[C@@H](C1=CC=CC=C1)N)O Chemical compound CC(C)CC[C@@H](C[C@@H](C1=CC=CC=C1)N)O SVXMMQJEBWNWDA-KBPBESRZSA-N 0.000 description 2
- ZNQMQZYKXSAQNR-NSOVKSMOSA-N CC(C)CC[C@@H](C[C@@H](C1CCCCC1)N(CC1=CC=CC=C1)CC1=CC=CC=C1)O Chemical compound CC(C)CC[C@@H](C[C@@H](C1CCCCC1)N(CC1=CC=CC=C1)CC1=CC=CC=C1)O ZNQMQZYKXSAQNR-NSOVKSMOSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 206010020772 Hypertension Diseases 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- COLNVLDHVKWLRT-QMMMGPOBSA-N L-phenylalanine Chemical compound OC(=O)[C@@H](N)CC1=CC=CC=C1 COLNVLDHVKWLRT-QMMMGPOBSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 150000003973 alkyl amines Chemical class 0.000 description 2
- 239000002168 alkylating agent Substances 0.000 description 2
- 229940100198 alkylating agent Drugs 0.000 description 2
- 238000005804 alkylation reaction Methods 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 125000000539 amino acid group Chemical group 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- VZTDIZULWFCMLS-UHFFFAOYSA-N ammonium formate Chemical compound [NH4+].[O-]C=O VZTDIZULWFCMLS-UHFFFAOYSA-N 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 238000010533 azeotropic distillation Methods 0.000 description 2
- XOAGXYJGAZOTAA-LJAQVGFWSA-N benzyl (2s)-2-(dibenzylamino)-3-phenylpropanoate Chemical compound O=C([C@H](CC=1C=CC=CC=1)N(CC=1C=CC=CC=1)CC=1C=CC=CC=1)OCC1=CC=CC=C1 XOAGXYJGAZOTAA-LJAQVGFWSA-N 0.000 description 2
- 125000004744 butyloxycarbonyl group Chemical group 0.000 description 2
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- 125000003630 glycyl group Chemical group [H]N([H])C([H])([H])C(*)=O 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 150000004679 hydroxides Chemical class 0.000 description 2
- 150000007529 inorganic bases Chemical class 0.000 description 2
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- JSIPPBVQCSSUOQ-QHCPKHFHSA-N methyl (2s)-3-cyclohexyl-2-(dibenzylamino)propanoate Chemical compound C([C@@H](C(=O)OC)N(CC=1C=CC=CC=1)CC=1C=CC=CC=1)C1CCCCC1 JSIPPBVQCSSUOQ-QHCPKHFHSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 150000007530 organic bases Chemical class 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Chemical compound ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 description 2
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical compound [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229960005190 phenylalanine Drugs 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 235000011007 phosphoric acid Nutrition 0.000 description 2
- 150000003016 phosphoric acids Chemical class 0.000 description 2
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 2
- 125000000612 phthaloyl group Chemical group C(C=1C(C(=O)*)=CC=CC1)(=O)* 0.000 description 2
- 229910003446 platinum oxide Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- AOJFQRQNPXYVLM-UHFFFAOYSA-N pyridin-1-ium;chloride Chemical compound [Cl-].C1=CC=[NH+]C=C1 AOJFQRQNPXYVLM-UHFFFAOYSA-N 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000006884 silylation reaction Methods 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000012279 sodium borohydride Substances 0.000 description 2
- 229910000033 sodium borohydride Inorganic materials 0.000 description 2
- XHFLOLLMZOTPSM-UHFFFAOYSA-M sodium;hydrogen carbonate;hydrate Chemical compound [OH-].[Na+].OC(O)=O XHFLOLLMZOTPSM-UHFFFAOYSA-M 0.000 description 2
- 238000010189 synthetic method Methods 0.000 description 2
- 229940095064 tartrate Drugs 0.000 description 2
- RUPAXCPQAAOIPB-UHFFFAOYSA-N tert-butyl formate Chemical group CC(C)(C)OC=O RUPAXCPQAAOIPB-UHFFFAOYSA-N 0.000 description 2
- 125000004044 trifluoroacetyl group Chemical group FC(C(=O)*)(F)F 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- 125000003774 valeryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- MHQICDREDPPKEH-QFIPXVFZSA-N (2s)-3-cyclohexyl-2-(dibenzylamino)propanoic acid Chemical compound C([C@@H](C(=O)O)N(CC=1C=CC=CC=1)CC=1C=CC=CC=1)C1CCCCC1 MHQICDREDPPKEH-QFIPXVFZSA-N 0.000 description 1
- VGRXAHXMIDCTNV-UHFFFAOYSA-N (6-chlorobenzotriazol-1-yl) 4-chlorobenzenesulfonate Chemical compound C1=CC(Cl)=CC=C1S(=O)(=O)ON1C2=CC(Cl)=CC=C2N=N1 VGRXAHXMIDCTNV-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- MASDFXZJIDNRTR-UHFFFAOYSA-N 1,3-bis(trimethylsilyl)urea Chemical compound C[Si](C)(C)NC(=O)N[Si](C)(C)C MASDFXZJIDNRTR-UHFFFAOYSA-N 0.000 description 1
- BDNKZNFMNDZQMI-UHFFFAOYSA-N 1,3-diisopropylcarbodiimide Chemical compound CC(C)N=C=NC(C)C BDNKZNFMNDZQMI-UHFFFAOYSA-N 0.000 description 1
- SGUVLZREKBPKCE-UHFFFAOYSA-N 1,5-diazabicyclo[4.3.0]-non-5-ene Chemical compound C1CCN=C2CCCN21 SGUVLZREKBPKCE-UHFFFAOYSA-N 0.000 description 1
- VFWCMGCRMGJXDK-UHFFFAOYSA-N 1-chlorobutane Chemical compound CCCCCl VFWCMGCRMGJXDK-UHFFFAOYSA-N 0.000 description 1
- SQCZQTSHSZLZIQ-UHFFFAOYSA-N 1-chloropentane Chemical compound CCCCCCl SQCZQTSHSZLZIQ-UHFFFAOYSA-N 0.000 description 1
- LMDZBCPBFSXMTL-UHFFFAOYSA-N 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide Chemical compound CCN=C=NCCCN(C)C LMDZBCPBFSXMTL-UHFFFAOYSA-N 0.000 description 1
- SNUSZUYTMHKCPM-UHFFFAOYSA-N 1-hydroxypyridin-2-one Chemical compound ON1C=CC=CC1=O SNUSZUYTMHKCPM-UHFFFAOYSA-N 0.000 description 1
- 125000004214 1-pyrrolidinyl group Chemical group [H]C1([H])N(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- OXQGTIUCKGYOAA-UHFFFAOYSA-N 2-Ethylbutanoic acid Chemical compound CCC(CC)C(O)=O OXQGTIUCKGYOAA-UHFFFAOYSA-N 0.000 description 1
- LPZOCVVDSHQFST-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-3-ethylpyrazol-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C=1C(=NN(C=1)CC(=O)N1CC2=C(CC1)NN=N2)CC LPZOCVVDSHQFST-UHFFFAOYSA-N 0.000 description 1
- AVZBOAGCVKEESJ-UHFFFAOYSA-O 2-ethyl-1,2-benzoxazol-2-ium-7-ol Chemical class C1=CC(O)=C2O[N+](CC)=CC2=C1 AVZBOAGCVKEESJ-UHFFFAOYSA-O 0.000 description 1
- CFMZSMGAMPBRBE-UHFFFAOYSA-N 2-hydroxyisoindole-1,3-dione Chemical compound C1=CC=C2C(=O)N(O)C(=O)C2=C1 CFMZSMGAMPBRBE-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-M 2-methylbenzenesulfonate Chemical compound CC1=CC=CC=C1S([O-])(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-M 0.000 description 1
- SDXAWLJRERMRKF-UHFFFAOYSA-N 3,5-dimethyl-1h-pyrazole Chemical compound CC=1C=C(C)NN=1 SDXAWLJRERMRKF-UHFFFAOYSA-N 0.000 description 1
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 1
- NSHAOELVDPKZIC-UHFFFAOYSA-N 3-(2-ethyl-1,2-oxazol-2-ium-5-yl)benzenesulfonic acid;hydroxide Chemical compound [OH-].O1[N+](CC)=CC=C1C1=CC=CC(S(O)(=O)=O)=C1 NSHAOELVDPKZIC-UHFFFAOYSA-N 0.000 description 1
- XMIIGOLPHOKFCH-UHFFFAOYSA-N 3-phenylpropionic acid Chemical compound OC(=O)CCC1=CC=CC=C1 XMIIGOLPHOKFCH-UHFFFAOYSA-N 0.000 description 1
- IGIJSFNBEUBMGB-UHFFFAOYSA-N 4-(cyclohexyliminomethylideneamino)-n,n-diethylcyclohexan-1-amine Chemical compound C1CC(N(CC)CC)CCC1N=C=NC1CCCCC1 IGIJSFNBEUBMGB-UHFFFAOYSA-N 0.000 description 1
- UQRONKZLYKUEMO-UHFFFAOYSA-N 4-methyl-1-(2,4,6-trimethylphenyl)pent-4-en-2-one Chemical group CC(=C)CC(=O)Cc1c(C)cc(C)cc1C UQRONKZLYKUEMO-UHFFFAOYSA-N 0.000 description 1
- JRLTTZUODKEYDH-UHFFFAOYSA-N 8-methylquinoline Chemical group C1=CN=C2C(C)=CC=CC2=C1 JRLTTZUODKEYDH-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- CBUSRLOENIBFDD-NSOVKSMOSA-N C(C1=CC=CC=C1)N(CC1=CC=CC=C1)[C@@H](C[C@H](CCC(C)C)O)C1=CC=CC=C1 Chemical compound C(C1=CC=CC=C1)N(CC1=CC=CC=C1)[C@@H](C[C@H](CCC(C)C)O)C1=CC=CC=C1 CBUSRLOENIBFDD-NSOVKSMOSA-N 0.000 description 1
- SSUFDOMYCBCHML-UHFFFAOYSA-N CCCCC[S](=O)=O Chemical group CCCCC[S](=O)=O SSUFDOMYCBCHML-UHFFFAOYSA-N 0.000 description 1
- JGLMVXWAHNTPRF-CMDGGOBGSA-N CCN1N=C(C)C=C1C(=O)NC1=NC2=CC(=CC(OC)=C2N1C\C=C\CN1C(NC(=O)C2=CC(C)=NN2CC)=NC2=CC(=CC(OCCCN3CCOCC3)=C12)C(N)=O)C(N)=O Chemical compound CCN1N=C(C)C=C1C(=O)NC1=NC2=CC(=CC(OC)=C2N1C\C=C\CN1C(NC(=O)C2=CC(C)=NN2CC)=NC2=CC(=CC(OCCCN3CCOCC3)=C12)C(N)=O)C(N)=O JGLMVXWAHNTPRF-CMDGGOBGSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- 229910021555 Chromium Chloride Inorganic materials 0.000 description 1
- ZJRBNXQVQBTAEJ-GPFYXIAXSA-N Cl.NC(C[C@H](CCC(C)C)O)C1CCCCC1 Chemical compound Cl.NC(C[C@H](CCC(C)C)O)C1CCCCC1 ZJRBNXQVQBTAEJ-GPFYXIAXSA-N 0.000 description 1
- HDFFVHSMHLDSLO-UHFFFAOYSA-N Dibenzyl phosphate Chemical compound C=1C=CC=CC=1COP(=O)(O)OCC1=CC=CC=C1 HDFFVHSMHLDSLO-UHFFFAOYSA-N 0.000 description 1
- XBPCUCUWBYBCDP-UHFFFAOYSA-N Dicyclohexylamine Chemical class C1CCCCC1NC1CCCCC1 XBPCUCUWBYBCDP-UHFFFAOYSA-N 0.000 description 1
- ASMQGLCHMVWBQR-UHFFFAOYSA-N Diphenyl phosphate Chemical compound C=1C=CC=CC=1OP(=O)(O)OC1=CC=CC=C1 ASMQGLCHMVWBQR-UHFFFAOYSA-N 0.000 description 1
- 208000007530 Essential hypertension Diseases 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- 206010019280 Heart failures Diseases 0.000 description 1
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 1
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- XNPOFXIBHOVFFH-UHFFFAOYSA-N N-cyclohexyl-N'-(2-(4-morpholinyl)ethyl)carbodiimide Chemical compound C1CCCCC1N=C=NCCN1CCOCC1 XNPOFXIBHOVFFH-UHFFFAOYSA-N 0.000 description 1
- 206010028980 Neoplasm Diseases 0.000 description 1
- BOCNQDNOBXRZNH-UHFFFAOYSA-M O1CCCC1.C(CC(C)C)[Mg]Br Chemical compound O1CCCC1.C(CC(C)C)[Mg]Br BOCNQDNOBXRZNH-UHFFFAOYSA-M 0.000 description 1
- 229920000388 Polyphosphate Polymers 0.000 description 1
- 239000007868 Raney catalyst Substances 0.000 description 1
- 229910000564 Raney nickel Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- DTQVDTLACAAQTR-UHFFFAOYSA-M Trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-M 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 1
- 125000005092 alkenyloxycarbonyl group Chemical group 0.000 description 1
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 1
- 235000008206 alpha-amino acids Nutrition 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229940024606 amino acid Drugs 0.000 description 1
- 235000001014 amino acid Nutrition 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 125000003435 aroyl group Chemical group 0.000 description 1
- 125000004391 aryl sulfonyl group Chemical group 0.000 description 1
- 229940009098 aspartate Drugs 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- HKNWKTRXBJXGMT-UHFFFAOYSA-N barium palladium Chemical compound [Pd].[Ba] HKNWKTRXBJXGMT-UHFFFAOYSA-N 0.000 description 1
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Inorganic materials [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 1
- JUHORIMYRDESRB-UHFFFAOYSA-N benzathine Chemical class C=1C=CC=CC=1CNCCNCC1=CC=CC=C1 JUHORIMYRDESRB-UHFFFAOYSA-N 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-M benzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-M 0.000 description 1
- 229940077388 benzenesulfonate Drugs 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- AGEZXYOZHKGVCM-UHFFFAOYSA-N benzyl bromide Chemical compound BrCC1=CC=CC=C1 AGEZXYOZHKGVCM-UHFFFAOYSA-N 0.000 description 1
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 description 1
- 229940073608 benzyl chloride Drugs 0.000 description 1
- SIOVKLKJSOKLIF-UHFFFAOYSA-N bis(trimethylsilyl)acetamide Chemical compound C[Si](C)(C)OC(C)=N[Si](C)(C)C SIOVKLKJSOKLIF-UHFFFAOYSA-N 0.000 description 1
- KMGBZBJJOKUPIA-UHFFFAOYSA-N butyl iodide Chemical compound CCCCI KMGBZBJJOKUPIA-UHFFFAOYSA-N 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- 201000011510 cancer Diseases 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229950005499 carbon tetrachloride Drugs 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 125000003901 ceryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- FZFAMSAMCHXGEF-UHFFFAOYSA-N chloro formate Chemical compound ClOC=O FZFAMSAMCHXGEF-UHFFFAOYSA-N 0.000 description 1
- QQVDYSUDFZZPSU-UHFFFAOYSA-M chloromethylidene(dimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)=CCl QQVDYSUDFZZPSU-UHFFFAOYSA-M 0.000 description 1
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 1
- WYYQVWLEPYFFLP-UHFFFAOYSA-K chromium(3+);triacetate Chemical compound [Cr+3].CC([O-])=O.CC([O-])=O.CC([O-])=O WYYQVWLEPYFFLP-UHFFFAOYSA-K 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 125000002592 cumenyl group Chemical group C1(=C(C=CC=C1)*)C(C)C 0.000 description 1
- 125000006637 cyclobutyl carbonyl group Chemical group 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000006639 cyclohexyl carbonyl group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 150000003946 cyclohexylamines Chemical class 0.000 description 1
- 125000006638 cyclopentyl carbonyl group Chemical group 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000006255 cyclopropyl carbonyl group Chemical group [H]C1([H])C([H])([H])C1([H])C(*)=O 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 125000002697 cystyl group Chemical group 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- ZZVUWRFHKOJYTH-UHFFFAOYSA-N diphenhydramine Chemical group C=1C=CC=CC=1C(OCCN(C)C)C1=CC=CC=C1 ZZVUWRFHKOJYTH-UHFFFAOYSA-N 0.000 description 1
- MKRTXPORKIRPDG-UHFFFAOYSA-N diphenylphosphoryl azide Chemical group C=1C=CC=CC=1P(=O)(N=[N+]=[N-])C1=CC=CC=C1 MKRTXPORKIRPDG-UHFFFAOYSA-N 0.000 description 1
- HCUYBXPSSCRKRF-UHFFFAOYSA-N diphosgene Chemical compound ClC(=O)OC(Cl)(Cl)Cl HCUYBXPSSCRKRF-UHFFFAOYSA-N 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 150000002081 enamines Chemical class 0.000 description 1
- 125000005448 ethoxyethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- 125000005745 ethoxymethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])* 0.000 description 1
- OAYLNYINCPYISS-UHFFFAOYSA-N ethyl acetate;hexane Chemical compound CCCCCC.CCOC(C)=O OAYLNYINCPYISS-UHFFFAOYSA-N 0.000 description 1
- RIFGWPKJUGCATF-UHFFFAOYSA-N ethyl chloroformate Chemical compound CCOC(Cl)=O RIFGWPKJUGCATF-UHFFFAOYSA-N 0.000 description 1
- 125000006125 ethylsulfonyl group Chemical group 0.000 description 1
- 229930195712 glutamate Natural products 0.000 description 1
- 125000000291 glutamic acid group Chemical group N[C@@H](CCC(O)=O)C(=O)* 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 125000005935 hexyloxycarbonyl group Chemical group 0.000 description 1
- 125000000487 histidyl group Chemical group [H]N([H])C(C(=O)O*)C([H])([H])C1=C([H])N([H])C([H])=N1 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- HVTICUPFWKNHNG-UHFFFAOYSA-N iodoethane Chemical compound CCI HVTICUPFWKNHNG-UHFFFAOYSA-N 0.000 description 1
- 125000005929 isobutyloxycarbonyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])OC(*)=O 0.000 description 1
- 125000000741 isoleucyl group Chemical group [H]N([H])C(C(C([H])([H])[H])C([H])([H])C([H])([H])[H])C(=O)O* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000005928 isopropyloxycarbonyl group Chemical group [H]C([H])([H])C([H])(OC(*)=O)C([H])([H])[H] 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- 229950003188 isovaleryl diethylamide Drugs 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 125000001909 leucine group Chemical group [H]N(*)C(C(*)=O)C([H])([H])C(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 159000000003 magnesium salts Chemical class 0.000 description 1
- WJGVYRMMIIWBAU-UHFFFAOYSA-M magnesium;2-methylbutane;bromide Chemical compound [Mg+2].[Br-].CC(C)C[CH2-] WJGVYRMMIIWBAU-UHFFFAOYSA-M 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 230000036210 malignancy Effects 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- UHAAFJWANJYDIS-UHFFFAOYSA-N n,n'-diethylmethanediimine Chemical compound CCN=C=NCC UHAAFJWANJYDIS-UHFFFAOYSA-N 0.000 description 1
- VMESOKCXSYNAKD-UHFFFAOYSA-N n,n-dimethylhydroxylamine Chemical compound CN(C)O VMESOKCXSYNAKD-UHFFFAOYSA-N 0.000 description 1
- JVHPKYBRJQNPAT-UHFFFAOYSA-N n-cyclohexyl-2,2-diphenylethenimine Chemical compound C1CCCCC1N=C=C(C=1C=CC=CC=1)C1=CC=CC=C1 JVHPKYBRJQNPAT-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- PVWOIHVRPOBWPI-UHFFFAOYSA-N n-propyl iodide Chemical compound CCCI PVWOIHVRPOBWPI-UHFFFAOYSA-N 0.000 description 1
- LWFWUJCJKPUZLV-UHFFFAOYSA-N n-trimethylsilylacetamide Chemical compound CC(=O)N[Si](C)(C)C LWFWUJCJKPUZLV-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 125000005740 oxycarbonyl group Chemical group [*:1]OC([*:2])=O 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 229910003445 palladium oxide Inorganic materials 0.000 description 1
- JQPTYAILLJKUCY-UHFFFAOYSA-N palladium(ii) oxide Chemical compound [O-2].[Pd+2] JQPTYAILLJKUCY-UHFFFAOYSA-N 0.000 description 1
- 125000001148 pentyloxycarbonyl group Chemical group 0.000 description 1
- CMPQUABWPXYYSH-UHFFFAOYSA-N phenyl phosphate Chemical compound OP(O)(=O)OC1=CC=CC=C1 CMPQUABWPXYYSH-UHFFFAOYSA-N 0.000 description 1
- 125000000405 phenylalanyl group Chemical group 0.000 description 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 1
- IUGYQRQAERSCNH-UHFFFAOYSA-N pivalic acid Chemical compound CC(C)(C)C(O)=O IUGYQRQAERSCNH-UHFFFAOYSA-N 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 239000001205 polyphosphate Substances 0.000 description 1
- 235000011176 polyphosphates Nutrition 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 125000001500 prolyl group Chemical group [H]N1C([H])(C(=O)[*])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000004742 propyloxycarbonyl group Chemical group 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 206010038464 renal hypertension Diseases 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- 229940079827 sodium hydrogen sulfite Drugs 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 235000009518 sodium iodide Nutrition 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- DHCDFWKWKRSZHF-UHFFFAOYSA-N sulfurothioic S-acid Chemical compound OS(O)(=O)=S DHCDFWKWKRSZHF-UHFFFAOYSA-N 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000003419 tautomerization reaction Methods 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- 125000000335 thiazolyl group Chemical group 0.000 description 1
- 125000000341 threoninyl group Chemical group [H]OC([H])(C([H])([H])[H])C([H])(N([H])[H])C(*)=O 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 125000005425 toluyl group Chemical group 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 1
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical class CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 1
- JBWKIWSBJXDJDT-UHFFFAOYSA-N triphenylmethyl chloride Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(Cl)C1=CC=CC=C1 JBWKIWSBJXDJDT-UHFFFAOYSA-N 0.000 description 1
- 238000005866 tritylation reaction Methods 0.000 description 1
- 125000002114 valyl group Chemical group 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明はレニン阻害活性を有する
アミノ酸誘導体を製造するための新規合成中間体、およ
びこの合成中間体を用いる前記アミノ酸誘導体の製造法
に関する。TECHNICAL FIELD The present invention relates to a novel synthetic intermediate for producing an amino acid derivative having renin inhibitory activity, and a method for producing the amino acid derivative using the synthetic intermediate.
【0002】[0002]
式 formula
【0003】[0003]
【化21】 [Chemical 21]
【0004】〔式中、R1 、R2 、R3 、R10の定義は
後記を参照する〕で示されるアミノ酸誘導体はレニン阻
害活性を有し、本態性高血圧症、腎性高血圧症、悪性高
血圧症等の高血圧症、心不全等の治療に有用であること
が知られている。特開昭64−19071号公報には、
この化合物の製造法として下記のような合成法が記載さ
れている。The amino acid derivative represented by the formula [wherein R 1 , R 2 , R 3 and R 10 are referred to below] has renin inhibitory activity and is essential hypertension, renal hypertension and malignancy. It is known to be useful for treating hypertension such as hypertension and heart failure. Japanese Patent Laid-Open No. 64-19071 discloses that
The following synthetic method is described as a method for producing this compound.
【0005】[0005]
【化22】 [Chemical formula 22]
【0006】〔式中、R1 、R2 、R3 、R4 、R10の
定義は後記を参照する〕しかしながら、上記の製造法は
原料化合物(VI)が比較的高価であること、また工程全
体の総収率が40〜50%程度と低いことから、最終生
成物であるアミノ酸誘導体(I)の製造コストが高くな
り工業的な製造法として満足な方法ではない。本発明の
目的は、上記従来法の問題点を解決し、より安価な原料
から高収率でアミノ酸誘導体(I)が得られる工業的に
有利な製造法を提供することにある。本発明の他の目的
はアミノ酸誘導体(I)を製造するための安価な原料よ
り製造される中間体を提供することにある。[In the formula, the definitions of R 1 , R 2 , R 3 , R 4 and R 10 are referred to later.] However, in the above production method, the starting compound (VI) is relatively expensive, and Since the total yield of the whole process is as low as about 40 to 50%, the production cost of the amino acid derivative (I) which is the final product is high, which is not a satisfactory industrial production method. An object of the present invention is to solve the above-mentioned problems of the conventional method and to provide an industrially advantageous production method by which the amino acid derivative (I) can be obtained in a high yield from a cheaper raw material. Another object of the present invention is to provide an intermediate produced from inexpensive raw materials for producing the amino acid derivative (I).
【0007】[0007]
【課題を解決するための手段】本発明者らは、後記の新
規中間体である化合物(II)を経由する合成法により、
安価な原料から高収率でアミノ酸誘導体(I)が得られ
ることを見出し本発明を完成した。[Means for Solving the Problems] The inventors of the present invention have conducted a synthetic method via compound (II), which is a novel intermediate described below, to
The present invention has been completed by finding that the amino acid derivative (I) can be obtained in high yield from an inexpensive raw material.
【0008】本発明は式The present invention has the formula
【0009】[0009]
【化23】 [Chemical formula 23]
【0010】〔式中、R1 はアシル基、ヒドロキシ基、
低級アルコキシ基、アリール基、低級アルキルチオ基お
よび式[Wherein R 1 is an acyl group, a hydroxy group,
Lower alkoxy group, aryl group, lower alkylthio group and formula
【0011】[0011]
【化24】 [Chemical formula 24]
【0012】(式中、R6 は水素またはアシル基、R7
は水素または低級アルキル基をそれぞれ意味する)で示
される基よりなる群から選択された置換基で置換されて
いてもよい低級アルキル基;アリール基;または低級ア
ルキル基およびアシル基よりなる群から選択された置換
基で置換されていてもよいアミノ基;R2 は水素または
低級アルキル基を意味するか、またはR1 およびR2 は
隣接する窒素原子と一緒になって、低級アルキル基、ヒ
ドロキシ(低級)アルキル基、低級アルコキシ(低級)
アルキル基、アシル(低級)アルキル基、オキソ基およ
びアシル基よりなる群から選択された置換基で置換され
ていてもよい複素環基を形成する、R3 は水素または低
級アルキル基、R4 は水素またはN−保護基、R5 は水
素またはカルボキシ保護基を意味する〕で示される化合
物(II) またはその塩に関する。(Wherein R 6 is hydrogen or an acyl group, R 7
Is a hydrogen or a lower alkyl group), and a lower alkyl group optionally substituted with a substituent selected from the group consisting of the groups represented by the following; a aryl group; or a lower alkyl group and an acyl group selected from the group consisting of An amino group optionally substituted with a substituent; R 2 represents hydrogen or a lower alkyl group, or R 1 and R 2 together with an adjacent nitrogen atom form a lower alkyl group, hydroxy ( Lower) alkyl group, lower alkoxy (lower)
An alkyl group, an acyl (lower) alkyl group, an oxo group and an acyl group form a heterocyclic group which may be substituted with a substituent selected from the group consisting of, R 3 is hydrogen or a lower alkyl group, and R 4 is Hydrogen or an N-protecting group, and R 5 represents a hydrogen or a carboxy protecting group] or a salt thereof.
【0013】本発明によれば、式According to the invention, the formula
【0014】[0014]
【化25】 [Chemical 25]
【0015】〔式中、R10は低級アルキル基、R1 、R
2 、R3 はそれぞれ前記定義の通りである〕で示される
化合物(I)またはその塩は、式[Wherein R 10 is a lower alkyl group, R 1 and R
2 and R 3 are each as defined above, and the compound (I) or a salt thereof has the formula
【0016】[0016]
【化26】 [Chemical formula 26]
【0017】〔式中、R1 、R2 、R3 、R4 はそれぞ
れ前記定義の通りである〕で示される化合物(IIa)もし
くはカルボキシ基におけるその反応性誘導体またはそれ
らの塩を、式[Wherein R 1 , R 2 , R 3 and R 4 are as defined above] or a reactive derivative thereof at the carboxy group or a salt thereof is represented by the formula:
【0018】[0018]
【化27】 [Chemical 27]
【0019】〔式中、R10は前記定義の通りである〕で
示される化合物(III)もしくはそのアミノ基における反
応性誘導体またはそれらの塩と反応させ、必要に応じて
N−保護基を脱離することにより製造することができる
(以下、製造法aという)。[Wherein R 10 is as defined above] and reacted with a compound (III) represented by the formula (1) or a reactive derivative of the amino group thereof or a salt thereof, and if necessary, the N-protecting group is removed. It can be manufactured by separating (hereinafter referred to as manufacturing method a).
【0020】また本発明によれば、化合物(I)または
その塩は、式According to the present invention, compound (I) or a salt thereof has the formula
【0021】[0021]
【化28】 [Chemical 28]
【0022】〔式中、R1 、R2 はそれぞれ前記定義の
通りである〕で示される化合物(IV)もしくはカルボキ
シ基におけるその反応性誘導体またはそれらの塩を、式A compound (IV) represented by the formula: wherein R 1 and R 2 are as defined above, or a reactive derivative thereof at the carboxy group or a salt thereof is
【0023】[0023]
【化29】 [Chemical 29]
【0024】〔式中、R3 、R4 、R5 はそれぞれ前記
定義の通りである〕で示される化合物(V)またはその
塩と反応させ、式[Wherein R 3 , R 4 and R 5 are as defined above] and reacted with a compound (V) represented by the formula
【0025】[0025]
【化30】 [Chemical 30]
【0026】〔式中、R1 、R2 、R3 、R4 、R5 は
それぞれ前記定義の通りである〕で示される化合物(I
I) またはその塩を得、次いでこれを式[Wherein R 1 , R 2 , R 3 , R 4 , and R 5 are as defined above] (I
I) or a salt thereof, which is then of the formula
【0027】[0027]
【化31】 [Chemical 31]
【0028】〔式中、R10は前記定義の通りである〕で
示される化合物 (III)またはその塩と反応させ、必要に
応じてN−保護基を脱離することにより製造することが
できる(以下、製造法bという)。It can be produced by reacting with a compound (III) represented by the formula: [wherein R 10 is as defined above] or a salt thereof, and removing the N-protecting group if necessary. (Hereinafter, referred to as production method b).
【0029】さらに本発明によれば、化合物(I)また
はその塩は、式Further according to the present invention, compound (I) or a salt thereof has the formula
【0030】[0030]
【化32】 [Chemical 32]
【0031】〔式中、R1 、R2 はそれぞれ前記定義の
通りである〕で示される化合物(IV)もしくはカルボキ
シ基におけるその反応性誘導体またはそれらの塩を、式A compound (IV) represented by the formula (wherein R 1 and R 2 are as defined above) or a reactive derivative thereof at the carboxy group or a salt thereof is
【0032】[0032]
【化33】 [Chemical 33]
【0033】〔式中、R4 、R5 はそれぞれ前記定義の
通りである〕で示される化合物 (Va)またはその塩と反
応させ、式[Wherein R 4 and R 5 are as defined above] and reacted with a compound (Va) represented by
【0034】[0034]
【化34】 [Chemical 34]
【0035】〔式中、R1 、R2 、R4 、R5 はそれぞ
れ前記定義の通りである〕で示される化合物 (IIb)また
はその塩を得、次いでこれを塩基の存在下に式A compound (IIb) represented by the formula (wherein R 1 , R 2 , R 4 and R 5 are as defined above) or a salt thereof is obtained, and the compound (IIb) is added to the compound in the presence of a base.
【0036】[0036]
【化35】 [Chemical 35]
【0037】〔式中、Xはハロゲン、R3 a は低級アル
キル基を示す〕で示される化合物と反応させ、式[Wherein X represents halogen and R 3 a represents a lower alkyl group], and the compound represented by the formula
【0038】[0038]
【化36】 [Chemical 36]
【0039】〔式中、R1 、R2 、R3 a 、R4 、R5
はそれぞれ前記定義の通りである〕で示される化合物
(IIc)またはその塩を得、更にこれを式[In the formula, R 1 , R 2 , R 3 a, R 4 and R 5
Are each as defined above]
(IIc) or a salt thereof, which is further represented by the formula
【0040】[0040]
【化37】 [Chemical 37]
【0041】〔式中、R10は前記定義の通りである〕で
示される化合物 (III)またはその塩と反応させ、必要に
応じてN−保護基を脱離することにより製造することが
できる(以下、製造法cという)。It can be produced by reacting with a compound (III) represented by the formula [wherein R 10 is as defined above] or a salt thereof, and by removing the N-protecting group if necessary. (Hereinafter, referred to as production method c).
【0042】この明細書および請求の範囲の記載におい
て、この発明の範囲内に包含される種々の定義の好適な
例を以下詳細に述べる。「低級」とは、特に指示がなけ
れば、炭素原子1〜7個を有する基を意味するものとす
る。好適な「低級アルキル基」としては、メチル、エチ
ル、プロピル、イソプロピル、ブチル、イソブチル、第
三級ブチル、ペンチル、イソペンチル、ヘキシル、メチ
ルヘキシル、ヘプチル等のような直鎖または分枝鎖アル
キル基が挙げられる。In this specification and in the description of the claims, suitable examples of the various definitions included within the scope of the invention are set forth in detail below. “Lower” means a group having 1 to 7 carbon atoms, unless otherwise specified. Suitable "lower alkyl group" is a straight chain or branched chain alkyl group such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tertiary butyl, pentyl, isopentyl, hexyl, methylhexyl, heptyl and the like. Can be mentioned.
【0043】好適な「アシル基」および「アシル(低
級)アルキル基」の好適な「アシル」部分としては、式Suitable "acyl" moieties of the "acyl group" and "acyl (lower) alkyl groups" are of the formula
【0044】[0044]
【化38】 [Chemical 38]
【0045】〔式中、R8 およびR9 はそれぞれ水素;
アリール基;シクロ(低級)アルキル基;複素環基;ま
たは低級アルコキシカルボニル基、低級アルコキシ基、
アリール基および複素環基よりなる群から選択された置
換基で置換されていてもよい低級アルキル基を意味する
か、またはR8 およびR9 は隣接する窒素原子と一緒に
なって、低級アルキル基で置換されていてもよい複素環
基を形成する、R11はアリール基;シクロ(低級)アル
キル基;低級アルコキシ基およびモノまたはジ(低級)
アルキルアミノ基よりなる群から選択された置換基で置
換されていてもよい低級アルキル基;または低級アルカ
ノイル基およびアリール基よりなる群から選択された置
換基で置換されていてもよい低級アルコキシ基を意味す
る〕で示される基、アミノ基が保護されていてもよいア
ミノ酸残基等が挙げられる。[In the formula, R 8 and R 9 are each hydrogen;
Aryl group; cyclo (lower) alkyl group; heterocyclic group; or lower alkoxycarbonyl group, lower alkoxy group,
A lower alkyl group which may be substituted with a substituent selected from the group consisting of an aryl group and a heterocyclic group, or R 8 and R 9 together with an adjacent nitrogen atom, is a lower alkyl group. R 11 is an aryl group; a cyclo (lower) alkyl group; a lower alkoxy group and a mono- or di (lower)
A lower alkyl group optionally substituted by a substituent selected from the group consisting of an alkylamino group; or a lower alkoxy group optionally substituted by a substituent selected from a group consisting of a lower alkanoyl group and an aryl group, Meaning], an amino acid residue in which an amino group may be protected, and the like.
【0046】好適な「アリール基」としては、フェニ
ル、ナフチル、トリル、キシリル、メシチル、クメニル
等の基が挙げられ、それらの中で好ましいものはフェニ
ル基である。好適な「シクロ(低級)アルキル基」とし
てはシクロプロピル、シクロブチル、シクロペンチル、
シクロヘキシル等の基が挙げられる。R8 およびR9 の
好適な「複素環基」ならびにR8 およびR9 の低級アル
キル基の置換基としての好適な「複素環基」としては、
窒素原子、酸素原子またはイオウ原子のようなヘテロ原
子少なくとも1個を含む飽和または不飽和単環式または
多環式複素環基、好ましくはN、Oおよび/またはS含
有5員または6員複素環基が挙げられ、それらの中で最
も好ましいものはモルホリノ基、ピリジル基およびチア
ゾリル基である。Suitable "aryl group" includes groups such as phenyl, naphthyl, tolyl, xylyl, mesityl, cumenyl and the like, among which the preferred one is phenyl group. Suitable "cyclo (lower) alkyl group" includes cyclopropyl, cyclobutyl, cyclopentyl,
Examples thereof include groups such as cyclohexyl. Suitable "heterocyclic group" for R 8 and R 9 and suitable "heterocyclic group" as a substituent for the lower alkyl group for R 8 and R 9 are:
Saturated or unsaturated monocyclic or polycyclic heterocyclic group containing at least one heteroatom such as nitrogen atom, oxygen atom or sulfur atom, preferably N-, O- and / or S-containing 5- or 6-membered heterocycle Groups, of which the most preferred are morpholino, pyridyl and thiazolyl groups.
【0047】好適な「低級アルコキシ基」および「低級
アルコキシカルボニル基」の好適な「低級アルコキシ」
部分としては、メトキシ、エトキシ、プロポキシ、イソ
プロポキシ、ブトキシ、イソブトキシ、第三級ブトキ
シ、ペンチルオキシ、ヘキシルオキシ等のような直鎖ま
たは分枝鎖アルコキシ基が挙げられ、それらの中でさら
に好ましいものとしてはC1 −C4 アルコキシ基が挙げ
られる。Preferred "lower alkoxy group" and preferred "lower alkoxy" of "lower alkoxycarbonyl group"
The moieties include straight chain or branched chain alkoxy groups such as methoxy, ethoxy, propoxy, isopropoxy, butoxy, isobutoxy, tertiary butoxy, pentyloxy, hexyloxy and the like, among which the more preferable ones Is a C 1 -C 4 alkoxy group.
【0048】R8 、R9 および隣接する窒素原子によっ
て形成される好適な「複素環基」としては、モルホリ
ノ、チオモルホリノ、その1−オキシドまたは1,1−
ジオキシド、ピロリジン−1−イル、ピラゾリジン−1
−イル、ピペリジノ、ピペラジン−1−イル、ピロリン
−1−イル、チアゾリジン−3−イル、その1−オキシ
ドまたは1,1−ジオキシド、オキサゾリジン−3−イ
ル、ペルヒドロピリダジン−1−イル、1,4−ジヒド
ロピリジン−1−イル、1,2,3,6−テトラヒドロ
ピリジン−1−イル、1,2,3,4−テトラヒドロイ
ソキノリン−2−イル、1,2,3,4−テトラヒドロ
キノリン−1−イル、ヘキサメチレンイミノ、1,4−
ジアザビシクロ〔4.3.0〕ノナン−4−イル等が挙
げられる。Suitable "heterocyclic group" formed by R 8 , R 9 and the adjacent nitrogen atom is morpholino, thiomorpholino, its 1-oxide or 1,1-.
Dioxide, pyrrolidin-1-yl, pyrazolidine-1
-Yl, piperidino, piperazin-1-yl, pyrrolin-1-yl, thiazolidin-3-yl, its 1-oxide or 1,1-dioxide, oxazolidin-3-yl, perhydropyridazin-1-yl, 1, 4-dihydropyridin-1-yl, 1,2,3,6-tetrahydropyridin-1-yl, 1,2,3,4-tetrahydroisoquinolin-2-yl, 1,2,3,4-tetrahydroquinoline-1 -Yl, hexamethyleneimino, 1,4-
Examples thereof include diazabicyclo [4.3.0] nonan-4-yl and the like.
【0049】好適な「モノ−またはジ(低級)アルキル
アミノ基」としては、メチルアミノ、エチルアミノ、プ
ロピルアミノ、イソプロピルアミノ、ブチルアミノ、イ
ソブチルアミノ、ジメチルアミノ、メチルエチルアミ
ノ、メチルイソプロピルアミノ、ジエチルアミノ等の基
が挙げられる。好適な「低級アルカノイル基」として
は、ホルミル、アセチル、プロピオニル、ブチリル、イ
ソブチリル、バレリル、イソバレリル、ピバロイル、4
−メチルバレリル等の基が挙げられる。Suitable "mono- or di (lower) alkylamino group" is methylamino, ethylamino, propylamino, isopropylamino, butylamino, isobutylamino, dimethylamino, methylethylamino, methylisopropylamino, diethylamino. And other groups. Suitable "lower alkanoyl group" is formyl, acetyl, propionyl, butyryl, isobutyryl, valeryl, isovaleryl, pivaloyl, 4
Groups such as -methylvaleryl and the like.
【0050】好適な「アミノ基が保護されていてもよい
アミノ酸残基」としては、グリシル、アラリル、β−ア
ラリル、バリル、ロイシル、イソロイシル、ヒスチジ
ル、プロリル、セリル、スレオニル、シスチル、フェニ
ルアラニル、アスパルチル、グルタミル、トリプトフィ
ル等の残基で、それらの残基の各アミノ基は、例えばホ
ルミル、アセチル、プロピオニル、トリフルオロアセチ
ル等の置換されたまたは非置換低級アルカノイル基、フ
タロイル基、例えば第三級ブトキシカルボニル、第三級
アミルオキシカルボニル等の低級アルコキシカルボニル
基、例えばベンジルオキシカルボニル、p−ニトロベン
ジルオキシカルボニル等の置換されたまたは非置換アラ
ルコキシカルボニル基、例えばベンゼンスルホニル、ト
シル等の置換されたまたは非置換アレーンスルホニル
基、ニトロフェニルスルフェニル基、例えばトリチル、
ベンジル等のアラルキル基等のような慣用のN−保護基
によって保護されていてもよい。Suitable "amino acid residue with optionally protected amino group" includes glycyl, aralyl, β-aralyl, valyl, leucyl, isoleucyl, histidyl, prolyl, ceryl, threonyl, cystyl, phenylalanyl, In residues such as aspartyl, glutamyl, and tryptophyll, each amino group of these residues is, for example, a substituted or unsubstituted lower alkanoyl group such as formyl, acetyl, propionyl, and trifluoroacetyl, a phthaloyl group such as a tertiary group. Lower alkoxycarbonyl groups such as butoxycarbonyl, tertiary amyloxycarbonyl, etc., substituted or unsubstituted aralkoxycarbonyl groups such as benzyloxycarbonyl, p-nitrobenzyloxycarbonyl, etc., substituted with benzenesulfonyl, tosyl, etc. Was Other unsubstituted arenesulfonyl group, nitrophenyl sulphenyl group, for example trityl,
It may be protected by a conventional N-protecting group such as an aralkyl group such as benzyl.
【0051】前記アシル基のより好ましい例としては、
例えばホルミル、アセチル、プロピオニル、ブチリル、
イソブチリル、バレリル、イソバレリル、ピバロイル、
4−メチルバレリル等の低級アルカノイル基、例えばメ
チルアミノアセチル、メチルアミノプロピオニル、ジメ
チルアミノブチリル等のモノーまたはジ(低級)アルキ
ルアミノ(低級)アルカノイル基、例えばメトキシアセ
チル、メトキシプロピオニル、エトキシプロピオニル等
の低級アルコキシ(低級)アルカノイル基、例えばベン
ゾイル、トルオイル等のアロイル基、例えばシクロプロ
ピルカルボニル、シクロブチルカルボニル、シクロペン
チルカルボニル、シクロヘキシルカルボニル等のシクロ
(低級)アルキルカルボニル基、例えばグリシル、ベン
ゾイルグリシル、第三級ブトキシカルボニルグリシル、
第三級ブトキシカルボニルロイシル、アセチルロイシ
ル、第三級ブトキシカルボニルヒスチジル等のアミノ基
が保護されていてもよいアミノ酸残基、カルバモイル
基、例えばメチルカルバモイル、エチルカルバモイル、
プロピルカルバモイル、イソプロピルカルバモイル、ブ
チルカルバモイル、ペンチルカルバモイル、イソブチル
カルバモイル、第三級ブチルカルバモイル、ジメチルカ
ルバモイル、ジエチルカルバモイル、メチルエチルカル
バモイル、メチルイソプロピルカルバモイル、メチルイ
ソブチルカルバモイル等のモノーまたはジ(低級)アル
キルカルバモイル基、例えばピコリルカルバモイル、ピ
リジルエチルカルバモイル、チアゾリルメチルカルバモ
イル、モルホリノメチルカルバモイル、モルホリノエチ
ルカルバモイル等の複素環(低級)アルキルカルバモイ
ル基、例えばN−ピコリル−N−メチルカルバモイル、
N−ピリジルエチル−N−メチルカルバモイル、N−モ
ルホリノメチル−N−エチルカルバモイル、N−モルホ
リノエチル−N−メチルカルバモイル等のN−複素環
(低級)アルキル−N−低級アルキルカルバモイル基、
例えばベンジルカルバモイル、フェネチルカルバモイ
ル、ベンズヒドリルカルバモイル等のアル(低級)アル
キルカルバモイル基、例えばN−ベンジル−N−メチル
カルバモイル、N−フェネチル−N−メチルカルバモイ
ル、N−フェネチル−N−エチルカルバモイル等のN−
アル(低級)アルキル−N−低級アルキルカルバモイル
基、例えばN−フェニル−N−メチルカルバモイル等の
N−アリール−N−低級アルキルカルバモイル基、例え
ばメトキシカルボニルメチルカルバモイル、エトキシカ
ルボニルメチルカルバモイル、エトキシカルボニルエチ
ルカルバモイル等の低級アルコキシカルボニル(低級)
アルキルカルバモイル基、例えばメトキシメチルカルバ
モイル、メトキシエチルカルバモイル、エトキシプロピ
ルカルバモイル等の低級アルコキシ(低級)アルキルカ
ルバモイル基、例えばベンゾイルカルバモイル、トルオ
イルカルバモイル等のアロイルカルバモイル基、例えば
ピリジルカルバモイル、モルホリノカルバモイル、チア
ゾリルカルバモイル等の複素環カルバモイル基、例えば
N−ピリジル−N−メチルカルバモイル、N−チアゾリ
ル−N−メチルカルバモイル等のN−複素環−N−低級
アルキルカルバモイル基、複素環カルボニル基、より好
ましくは例えばモルホリノカルボニル、チオモルホリノ
カルボニル、ピペリジノカルボニル、4−メチル−1−
ピペラジニルカルボニル、1,2,3,6−テトラヒド
ロ−1−ピリジルカルボニル等の、低級アルキル基で置
換されていてもよいN−含有複素環−N−イルカルボニ
ル基、例えばメトキシカルボニル、エトキシカルボニ
ル、プロポキシカルボニル、イソプロポキシカルボニ
ル、ブトキシカルボニル、イソブトキシカルボニル、第
三級ブトキシカルボニル、ペンチルオキシカルボニル、
ヘキシルオキシカルボニル等の低級アルコキシカルボニ
ル基、例えばヨードエトキシカルボニル、ジクロロエト
キシカルボニル、トリクロロエトキシカルボニル、トリ
フルオロメトキシカルボニル等のモノー(またはジまた
はトリ)ハロ(低級)アルコキシカルボニル基、例えば
ヒドロキシメトキシカルボニル、ヒドロキシエトキシカ
ルボニル、ヒドロキシプロポキシカルボニル、ヒドロキ
シブトキシカルボニル等のヒドロキシ(低級)アルコキ
シカルボニル基、例えばベンジルオキシカルボニル、フ
ェネチルオキシカルボニル、4−ニトロベンジルオキシ
カルボニル、トリチルオキシカルボニル、ベンズヒドリ
ルオキシカルボニル等のアル(低級)アルコキシカルボ
ニル基、例えばビニルオキシカルボニル、アリルオキシ
カルボニル等の低級アルケニルオキシカルボニル基、例
えばアセチルメトキシカルボニル、プロピオニルメトキ
シカルボニル、アセチルエトキシカルボニル等の低級ア
ルカノイル(低級)アルコキシカルボニル基、例えばメ
シル、エチルスルホニル、プロピルスルホニル、イソプ
ロピルスルホニル、ブチルスルホニル、イソブチルスル
ホニル、第三級ブチルスルホニル、ペンチルスルホニ
ル、ヘキシルスルホニル等の低級アルキルスルホニル
基、例えばフェニルスルホニル、トシル等のアリールス
ルホニル基等が挙げられる。More preferred examples of the acyl group are:
Formyl, acetyl, propionyl, butyryl,
Isobutyryl, valeryl, isovaleryl, pivaloyl,
Lower alkanoyl group such as 4-methylvaleryl, for example, mono- or di (lower) alkylamino (lower) alkanoyl group such as methylaminoacetyl, methylaminopropionyl, dimethylaminobutyryl, lower such as methoxyacetyl, methoxypropionyl, ethoxypropionyl, etc. Alkoxy (lower) alkanoyl groups such as benzoyl and toluoyl aroyl groups such as cyclopropylcarbonyl, cyclobutylcarbonyl, cyclopentylcarbonyl, cyclohexylcarbonyl and other cyclo (lower) alkylcarbonyl groups such as glycyl, benzoylglycyl and tertiary Butoxycarbonylglycyl,
Tertiary butoxycarbonyl leucyl, acetyl leucyl, an amino group which may have a protected amino group such as tertiary butoxycarbonyl histidyl, a carbamoyl group, for example, methylcarbamoyl, ethylcarbamoyl,
Mono- or di (lower) alkylcarbamoyl groups such as propylcarbamoyl, isopropylcarbamoyl, butylcarbamoyl, pentylcarbamoyl, isobutylcarbamoyl, tert-butylcarbamoyl, dimethylcarbamoyl, diethylcarbamoyl, methylethylcarbamoyl, methylisopropylcarbamoyl, methylisobutylcarbamoyl, etc. Heterocyclic (lower) alkylcarbamoyl groups such as picolylcarbamoyl, pyridylethylcarbamoyl, thiazolylmethylcarbamoyl, morpholinomethylcarbamoyl, morpholinoethylcarbamoyl, such as N-picolyl-N-methylcarbamoyl,
N-heterocyclic (lower) alkyl-N-lower alkylcarbamoyl groups such as N-pyridylethyl-N-methylcarbamoyl, N-morpholinomethyl-N-ethylcarbamoyl, N-morpholinoethyl-N-methylcarbamoyl,
For example, an ar (lower) alkylcarbamoyl group such as benzylcarbamoyl, phenethylcarbamoyl, benzhydrylcarbamoyl and the like, N-benzyl-N-methylcarbamoyl, N-phenethyl-N-methylcarbamoyl, N-phenethyl-N-ethylcarbamoyl and the like N −
N-aryl-N-lower alkylcarbamoyl groups such as ar (lower) alkyl-N-lower alkylcarbamoyl groups such as N-phenyl-N-methylcarbamoyl, eg methoxycarbonylmethylcarbamoyl, ethoxycarbonylmethylcarbamoyl, ethoxycarbonylethylcarbamoyl. Lower alkoxycarbonyl (lower)
Alkylcarbamoyl groups such as lower alkoxy (lower) alkylcarbamoyl groups such as methoxymethylcarbamoyl, methoxyethylcarbamoyl, ethoxypropylcarbamoyl, etc., aroylcarbamoyl groups such as benzoylcarbamoyl, toluoylcarbamoyl, etc., eg pyridylcarbamoyl, morpholinocarbamoyl, thiazolylcarbamoyl. And other heterocyclic carbamoyl groups, such as N-pyridyl-N-methylcarbamoyl, N-thiazolyl-N-methylcarbamoyl and other N-heterocycle-N-lower alkylcarbamoyl groups, heterocyclic carbonyl groups, and more preferably, for example, morpholinocarbonyl. , Thiomorpholinocarbonyl, piperidinocarbonyl, 4-methyl-1-
N-containing heterocycle-N-ylcarbonyl groups optionally substituted with lower alkyl groups such as piperazinylcarbonyl, 1,2,3,6-tetrahydro-1-pyridylcarbonyl, eg methoxycarbonyl, ethoxycarbonyl , Propoxycarbonyl, isopropoxycarbonyl, butoxycarbonyl, isobutoxycarbonyl, tertiary butoxycarbonyl, pentyloxycarbonyl,
Hexyloxycarbonyl and other lower alkoxycarbonyl groups such as iodoethoxycarbonyl, dichloroethoxycarbonyl, trichloroethoxycarbonyl, trifluoromethoxycarbonyl and other mono- (or di- or tri) halo (lower) alkoxycarbonyl groups such as hydroxymethoxycarbonyl, hydroxy Hydroxy (lower) alkoxycarbonyl groups such as ethoxycarbonyl, hydroxypropoxycarbonyl, hydroxybutoxycarbonyl, etc., such as benzyloxycarbonyl, phenethyloxycarbonyl, 4-nitrobenzyloxycarbonyl, trityloxycarbonyl, benzhydryloxycarbonyl, etc. ) Alkoxycarbonyl groups, for example vinyloxycarbonyl, allyloxycarbonyl, etc. Alkenyloxycarbonyl groups such as acetylmethoxycarbonyl, propionylmethoxycarbonyl, acetylethoxycarbonyl and other lower alkanoyl (lower) alkoxycarbonyl groups such as mesyl, ethylsulfonyl, propylsulfonyl, isopropylsulfonyl, butylsulfonyl, isobutylsulfonyl, tertiary butyl Examples thereof include lower alkylsulfonyl groups such as sulfonyl, pentylsulfonyl and hexylsulfonyl, and arylsulfonyl groups such as phenylsulfonyl and tosyl.
【0052】好適な「低級アルキルチオ基」としては、
メチルチオ、エチルチオ、プロピルチオ、イソプロピル
チオ、ブチルチオ、イソブチルチオ、第三級ブチルチ
オ、ペンチルチオ、ヘキシルチオ等のような直鎖または
分枝鎖アルキルチオ基が挙げられ、それらの中でさらに
好ましいものとしてはC1 −C4 アルキルチオ基が挙げ
られる。R1 、R2 および隣接する窒素原子によって形
成される好適な「複素環基」については、前に例示した
ようなR8 、R9 および隣接する窒素原子によって形成
された複素環基を参照すればよい。好適な「ヒドロキシ
(低級)アルキル基」としては、ヒドロキシメチル、ヒ
ドロキシエチル、ヒドロキシプロピル、ヒドロキシイソ
プロピル、ヒドロキシブチル等が挙げられる。好適な
「低級アルコキシ(低級)アルキル基」としては、メト
キシメチル、エトキシメチル、メトキシエチル、エトキ
シエチル、メトキシプロピル等が挙げられる。Suitable "lower alkylthio group" is
Examples thereof include linear or branched alkylthio groups such as methylthio, ethylthio, propylthio, isopropylthio, butylthio, isobutylthio, tertiary butylthio, pentylthio, hexylthio and the like, and among them, more preferable ones are C 1-. C 4 alkylthio group. For suitable “heterocyclic group” formed by R 1 , R 2 and the adjacent nitrogen atom, refer to the heterocyclic group formed by R 8 , R 9 and the adjacent nitrogen atom as exemplified above. Good. Suitable “hydroxy (lower) alkyl group” includes hydroxymethyl, hydroxyethyl, hydroxypropyl, hydroxyisopropyl, hydroxybutyl and the like. Suitable "lower alkoxy (lower) alkyl group" includes methoxymethyl, ethoxymethyl, methoxyethyl, ethoxyethyl, methoxypropyl and the like.
【0053】好適な「N−保護基」としては、例えばホ
ルミル、アセチル、プロピオニル、トリフルオロアセチ
ル等の置換されたまたは非置換低級アルカノイル基、フ
タロイル基、例えば第三級ブトキシカルボニル、第三級
アミルオキシカルボニル等の低級アルコキシカルボニル
基、例えばベンジルオキシカルボニル、p−ニトロベン
ジルオキシカルボニル等の置換されたまたは非置換アラ
ルコキシカルボニル基、例えばベンゼンスルホニル、ト
シル等の置換されたまたは非置換アレーンスルホニル
基、ニトロフェニルスルフェニル基、例えばトリチル、
ベンジル等のアラルキル基等が挙げられる。好適な「カ
ルボキシ保護基」としては、メチル、エチル、プロピ
ル、イソプロピル、ブチル、第二級ブチル、イソブチ
ル、第三級ブチル、ペンチル、ネオペンチル、ヘキシル
等の低級アルキル基、任意に置換されていてもよいアル
(低級)アルキル基、その例として例えばベンジル、4
−ニトロベンジル、ベンズヒドリル、トリチル等のニト
ロ基等で置換されていてもよいモノ−またはジ−または
トリ−フェニル(低級)アルキル基等が挙げられる。Suitable "N-protecting group" is, for example, a substituted or unsubstituted lower alkanoyl group such as formyl, acetyl, propionyl, trifluoroacetyl and the like, phthaloyl group, for example, tertiary butoxycarbonyl, tertiary amyl. Lower alkoxycarbonyl groups such as oxycarbonyl, substituted or unsubstituted aralkoxycarbonyl groups such as benzyloxycarbonyl, p-nitrobenzyloxycarbonyl, etc., substituted or unsubstituted arenesulfonyl groups such as benzenesulfonyl, tosyl, etc. , A nitrophenylsulfenyl group, for example trityl,
Examples thereof include aralkyl groups such as benzyl. Suitable "carboxy protecting group" is a lower alkyl group such as methyl, ethyl, propyl, isopropyl, butyl, secondary butyl, isobutyl, tertiary butyl, pentyl, neopentyl and hexyl, which may be optionally substituted. Good ar (lower) alkyl groups, for example benzyl, 4
Examples thereof include a mono- or di- or tri-phenyl (lower) alkyl group which may be substituted with a nitro group such as -nitrobenzyl, benzhydryl and trityl.
【0054】好適な塩類としては、例えばギ酸塩、酢酸
塩、トリフルオロ酢酸塩、マレイン酸塩、酒石酸塩、メ
タンスルホン酸塩、ベンゼンスルホン酸塩、トルエンス
ルホン酸塩等の有機酸付加塩、例えば塩酸塩、臭化水素
酸塩、硫酸塩、燐酸塩等の無機酸付加塩、例えばアルパ
ラギン酸塩、グルタミン酸塩等のアミノ酸との塩のよう
な酸付加塩が挙げられる。カルボキシ基を有する化合物
の場合は、好適な塩類として前記酸付加塩の他に、例え
ばナトリウム塩、カリウム塩等のアルカリ金属塩、例え
ばカルシウム塩、マグネシウム塩等のアルカリ土類金属
塩、アンモニウム塩、例えばトリメチルアミン塩、トリ
エチルアミン塩、ピリジン塩、ピコリン塩、ジシクロヘ
キシルアミン塩、N,N’−ジベンジルエチレンジアミ
ン塩等の有機塩基塩等のような塩基塩が挙げられる。Suitable salts include, for example, organic acid addition salts such as formate, acetate, trifluoroacetate, maleate, tartrate, methanesulfonate, benzenesulfonate, toluenesulfonate, and the like. Examples thereof include inorganic acid addition salts such as hydrochloride, hydrobromide, sulfate and phosphate, and acid addition salts such as salts with amino acids such as aspartate and glutamate. In the case of a compound having a carboxy group, in addition to the acid addition salts as suitable salts, for example, alkali metal salts such as sodium salt and potassium salt, for example, alkaline earth metal salts such as calcium salt and magnesium salt, ammonium salt, Examples thereof include base salts such as trimethylamine salt, triethylamine salt, pyridine salt, picoline salt, dicyclohexylamine salt, and organic base salts such as N, N′-dibenzylethylenediamine salt.
【0055】R1 からR5 におけるより好ましい具体例
を、以下に示す。R1 は式:More preferable specific examples of R 1 to R 5 are shown below. R 1 is the formula:
【0056】[0056]
【化39】 [Chemical Formula 39]
【0057】〔式中、R7 は水素または低級アルキル基
を意味し、R8 およびR9 は隣接する窒素原子と一緒に
なって、低級アルキル基で置換されていてもよい複素環
を形成する〕で示される基で置換された低級アルキル
基、R2 は低級アルキル基、R3 は水素または低級アル
キル基、R4 は水素またはN−保護基、およびR5 は水
素または低級アルキル基。[Wherein R 7 represents hydrogen or a lower alkyl group, and R 8 and R 9 together with an adjacent nitrogen atom form a heterocycle optionally substituted with a lower alkyl group. ] A lower alkyl group substituted with a group represented by: R 2 is a lower alkyl group, R 3 is a hydrogen or a lower alkyl group, R 4 is a hydrogen or an N-protecting group, and R 5 is a hydrogen or a lower alkyl group.
【0058】化合物(II)として特に好ましい例として
は、Nα−〔2(S)−〔N−メチル−N−〔2−{N
−(モルホリノカルボニル)−N−メチルアミノ}エチ
ル〕アミノカルボニルオキシ〕−3−フェニルプロピオ
ニル〕−Nim−トリチル−L−ヒスチジンまたはその
塩、およびNα−〔2(S)−〔N−メチル−N−〔2
−{N−(モルホリノカルボニル)−N−メチルアミ
ノ}エチル〕アミノカルボニルオキシ)−3−フェニル
プロピオニル〕−Nα−メチル−Nim−トリチル−L−
ヒスチジンまたはその塩が挙げられる。化合物(II)は
不斉炭素原子にもとづく一つ以上の立体異性体を含むこ
とがあるが、これらのすべての異性体およびそれらの混
合物は本発明の範囲に含まれる。Particularly preferred examples of the compound (II) include Nα- [2 (S)-[N-methyl-N- [2- {N
- (morpholinocarbonyl) -N- methylamino} ethyl] aminocarbonyloxy] -3-phenylpropionyl] -N im - trityl -L- histidine or a salt thereof, and Nα- [2 (S) - [N- methyl - N- [2
- {N-(morpholinocarbonyl) -N- methylamino} ethyl] aminocarbonyl) -3-phenylpropionyl] -Nα- methyl -N im - trityl -L-
Histidine or its salt is mentioned. Compound (II) may contain one or more stereoisomers based on the asymmetric carbon atom, and all these isomers and mixtures thereof are included in the scope of the present invention.
【0059】本発明の化合物(II) は、アミノ酸誘導体
(I)を合成するための中間体として有用であり、以下
に化合物(II) を経由するアミノ酸誘導体(I)の製造
方法について説明する。The compound (II) of the present invention is useful as an intermediate for synthesizing the amino acid derivative (I), and a method for producing the amino acid derivative (I) via the compound (II) will be described below.
【0060】[0060]
【化40】 [Chemical 40]
【0061】〔式中、R1 、R2 、R3 、R4 、R10は
それぞれ前記定義の通りである〕化合物(I)またはそ
の塩は、化合物(IIa)もしくはカルボキシ基における
その反応性誘導体またはそれらの塩を、化合物(III) も
しくはアミノ基におけるその反応性誘導体またはそれら
の塩と反応させ、必要に応じてN−保護基を脱離するこ
とにより製造することができる。[Wherein R 1 , R 2 , R 3 , R 4 and R 10 are as defined above] Compound (I) or a salt thereof is compound (IIa) or its reactivity at the carboxy group. The derivative or a salt thereof can be produced by reacting the compound (III) or a reactive derivative thereof at an amino group or a salt thereof, and removing an N-protecting group if necessary.
【0062】化合物(IIa)のカルボキシ基における好
適な反応性誘導体としては、酸ハロゲン化物、酸無水
物、活性化アミド、活性化エステル等が挙げられる。そ
れらの反応性誘導体の好適な例としては酸塩化物;酸ア
ジド;例えばジアルキル燐酸、フェニル燐酸、ジフェニ
ル燐酸、ジベンジル燐酸、ハロゲン化燐酸等の置換され
た燐酸、ジアルキル亜燐酸、亜硫酸、チオ硫酸、硫酸、
例えばメタンスルホン酸等のスルホン酸、例えば酢酸、
プロピオン酸、酪酸、イソ酪酸、ピバリン酸、ペンタン
酸、イソペンタン酸、2−エチル酪酸、トリクロロ酢酸
等の脂肪族カルボン酸または例えば安息香酸等の芳香族
カルボン酸のような酸との混合酸無水物;対称酸無水
物;イミダゾール、4−置換イミダゾール、ジメチルピ
ラゾール、トリアゾールまたはテトラゾールとの活性化
アミド;または例えばシアノメチルエステル、メトキシ
メチルエステル、ジメチルイミノメチル[(CH3 )2 N
+ =CH−] エステル、ビニルエステル、プロパルギル
エステル、p−ニトロフェニルエステル、2,4−ジニ
トロフェニルエステル、トリクロロフェニルエステル、
ペンタクロロフェニルエステル、メシルフェニルエステ
ル、フェニルアゾフェニルエステル、フェニルチオエス
テル、p−ニトロフェニルチオエステル、p−クレジル
エステル、カルボキシルメチルチオエステル、ピラニル
エステル、ピリジルエステル、ピペリジルエステル、8
−キノリルチオエステル等の活性化エステル、または例
えばN,N−ジメチルヒドロキシルアミン、1−ヒドロ
キシ−2−(1H)−ピリドン、N−ヒドロキシスクシ
ンイミド、N−ヒドロキシフタルイミド、1−ヒドロキ
シ−1H−ベンゾトリアゾール等のN−ヒドロキシ化合
物とのエステル等が挙げられる。これらの反応性誘導体
は使用すべき化合物(IIa)の種類によってそれらの中
から任意に選択することができる。Suitable reactive derivative at the carboxy group of the compound (IIa) includes acid halide, acid anhydride, activated amide, activated ester and the like. Suitable examples of these reactive derivatives are acid chlorides; acid azides; substituted phosphoric acids such as dialkyl phosphoric acid, phenyl phosphoric acid, diphenyl phosphoric acid, dibenzyl phosphoric acid, halogenated phosphoric acid, dialkyl phosphorous acid, sulfurous acid, thiosulfuric acid, Sulfuric acid,
Sulfonic acids such as methanesulfonic acid, such as acetic acid,
Mixed acid anhydride with an aliphatic carboxylic acid such as propionic acid, butyric acid, isobutyric acid, pivalic acid, pentanoic acid, isopentanoic acid, 2-ethylbutyric acid, trichloroacetic acid or an aromatic carboxylic acid such as benzoic acid. Symmetric acid anhydrides; activated amides with imidazole, 4-substituted imidazole, dimethylpyrazole, triazole or tetrazole; or for example cyanomethyl ester, methoxymethyl ester, dimethyliminomethyl [(CH 3 ) 2 N
+ = CH-] ester, vinyl ester, propargyl ester, p-nitrophenyl ester, 2,4-dinitrophenyl ester, trichlorophenyl ester,
Pentachlorophenyl ester, mesylphenyl ester, phenylazophenyl ester, phenylthioester, p-nitrophenylthioester, p-cresyl ester, carboxylmethylthioester, pyranyl ester, pyridyl ester, piperidyl ester, 8
-Activated esters such as quinolyl thioesters, or for example N, N-dimethylhydroxylamine, 1-hydroxy-2- (1H) -pyridone, N-hydroxysuccinimide, N-hydroxyphthalimide, 1-hydroxy-1H-benzotriazole. Esters with N-hydroxy compounds such as These reactive derivatives can be arbitrarily selected from among them depending on the kind of the compound (IIa) to be used.
【0063】化合物(III) のアミノ基における好適な反
応性誘導体としては化合物(III) とアルデヒド、ケトン
等のようなカルボニル化合物との反応によって生成する
シッフの塩基型イミノ基またはそのエナミン型互変異性
体;化合物(III) とビス(トリメチルシリル)アセトア
ミド、モノ(トリメチルシリル)アセトアミド、ビス
(トリメチルシリル)尿素、1,1,1,3,3,3−
ヘキサメチルジシラザンとトリメチルシリルクロライド
との組み合わせ等のようなシリル化合物との反応によっ
て生成するシリル誘導体;化合物(III) と三塩化燐、ホ
スゲンとの反応によって生成する誘導体等が挙げられ
る。Suitable reactive derivative at the amino group of the compound (III) is a Schiff's base type imino group or its enamine type tautomerism produced by the reaction of the compound (III) with a carbonyl compound such as aldehyde, ketone and the like. Properties: Compound (III) and bis (trimethylsilyl) acetamide, mono (trimethylsilyl) acetamide, bis (trimethylsilyl) urea, 1,1,1,3,3,3-
Examples thereof include a silyl derivative formed by reaction with a silyl compound such as a combination of hexamethyldisilazane and trimethylsilyl chloride; a derivative formed by reaction of compound (III) with phosphorus trichloride or phosgene.
【0064】反応は通常、水、例えばメタノール、エタ
ノール等のアルコール、アセトン、ジオキサン、アセト
ニトリル、クロロホルム、塩化メチレン、塩化エチレ
ン、エトラヒドロフラン、酢酸エチル、N,N−ジメチ
ルホルムアミド、ピリジンのような常用の溶媒中で行わ
れるが、反応に悪影響を及ぼさない溶媒であればその他
のいかなる有機溶媒中でも反応を行うことができる。こ
れらの常用の溶媒は水との混合物として使用してもよ
い。The reaction is usually carried out in a conventional manner such as water, alcohol such as methanol and ethanol, acetone, dioxane, acetonitrile, chloroform, methylene chloride, ethylene chloride, etrahydrofuran, ethyl acetate, N, N-dimethylformamide, pyridine. The reaction can be carried out in any other organic solvent as long as it does not adversely affect the reaction. These conventional solvents may be used as a mixture with water.
【0065】この反応において化合物(IIa)を遊離酸
の形またはその塩の形で使用する場合には、例えばN,
N’−ジシクロヘキシルカルボジイミド、N−シクロヘ
キシル−N’−モルホリノエチルカルボジイミド、N−
シクロヘキシル−N’−(4−ジエチルアミノシクロヘ
キシル)カルボジイミド、N,N’−ジエチルカルボジ
イミド、N,N’−ジイソプロピルカルボジイミド、N
−エチル−N’−(3−ジメチルアミノプロピル)カル
ボジイミド等のカルボジイミド化合物;N,N’−カル
ボニルビス−(2−メチルイミダゾール);ペンタメチ
レンケテン−N−シクロヘキシルイミン;ジフェニルケ
テン−N−シクロヘキシルイミン;エトキシアセチレ
ン;1−アルコキシ−1−クロロエチレン;亜燐酸トリ
アルキル;ポリ燐酸エチル;ポリ燐酸イソプロピル;オ
キシ塩化燐(塩化ホスホリル);三塩化燐;ジフェニル
アジ化ホスホリル;塩化チオニル;塩化オキザリル;例
えばクロロギ酸エチル、クロロギ酸イロプロピル等のハ
ロギ酸低級アルキル;トリフェニルホスフィン;2−エ
チル−7−ヒドロキシベンズイソオキサゾリウム塩;2
−エチル−5−(m−スルホフェニル)イソオキサゾリ
ウムヒドロキシド分子内塩;1−(p−クロロベンゼン
スルホニルオキシ)−6−クロロ−1H−ベンゾトリア
ゾール;上記カルボジイミド化合物と1−ヒドロキシ−
1H−ベンゾトリアゾールもしくはN−ヒドロキシスク
シンイミド等との組み合わせ;N,N−ジメチルホルム
アミドと塩化チオニル、ホスゲン、クロロギ酸トリクロ
ロメチル、オキシ塩化燐等との反応によって調製したい
わゆるビルスマイヤー試薬等のような慣用の縮合剤の存
在下に反応を行うのが好ましい。When the compound (IIa) is used in the form of a free acid or a salt thereof in this reaction, for example, N,
N'-dicyclohexylcarbodiimide, N-cyclohexyl-N'-morpholinoethylcarbodiimide, N-
Cyclohexyl-N '-(4-diethylaminocyclohexyl) carbodiimide, N, N'-diethylcarbodiimide, N, N'-diisopropylcarbodiimide, N
-Ethyl-N '-(3-dimethylaminopropyl) carbodiimide and other carbodiimide compounds; N, N'-carbonylbis- (2-methylimidazole); pentamethyleneketene-N-cyclohexylimine; diphenylketene-N-cyclohexylimine 1-alkoxy-1-chloroethylene; trialkyl phosphite; polyalkyl phosphate; isopropyl polyphosphate; isopropyl oxychloride (phosphoryl chloride); phosphorus trichloride; diphenyl azidophosphoryl; thionyl chloride; oxalyl chloride; Lower alkyl haloformates such as ethyl chloroformate and iropropyl chloroformate; triphenylphosphine; 2-ethyl-7-hydroxybenzisoxazolium salt; 2
-Ethyl-5- (m-sulfophenyl) isoxazolium hydroxide inner salt; 1- (p-chlorobenzenesulfonyloxy) -6-chloro-1H-benzotriazole; the carbodiimide compound and 1-hydroxy-
Combination with 1H-benzotriazole or N-hydroxysuccinimide; conventional such as so-called Vilsmeier reagent prepared by reaction of N, N-dimethylformamide with thionyl chloride, phosgene, trichloromethyl chloroformate, phosphorus oxychloride, etc. It is preferable to carry out the reaction in the presence of the condensing agent.
【0066】反応はまた、アルカリ金属炭酸水素塩、ト
リ(低級)アルキルアミン、ピリジン、N−(低級)ア
ルキルモルホリン、N,N−ジ(低級)アルキルベンジ
ルアミン等のような無機塩基または有機塩基の存在下に
行ってもよい。反応温度は特に限定されないが、通常は
冷却下ないし加温下に反応が行われる。The reaction may also be performed with an inorganic or organic base such as alkali metal hydrogen carbonate, tri (lower) alkylamine, pyridine, N- (lower) alkylmorpholine, N, N-di (lower) alkylbenzylamine and the like. May be performed in the presence of. The reaction temperature is not particularly limited, but the reaction is usually performed under cooling or heating.
【0067】化合物(IIa)のイミダゾリル基が保護さ
れている場合には、さらに化合物(IIa)と化合物(II
I) との反応生成物のN−保護基を脱離することにより
最終生成物(I)を製造することができる。When the imidazolyl group of compound (IIa) is protected, the compound (IIa) and compound (II
The final product (I) can be prepared by removing the N-protecting group of the reaction product with I).
【0068】N−保護基の脱離は加水分解、還元等のよ
うな常法に従って行われる。加水分解は塩基またはルイ
ス酸を含めた酸の存在下に行うのが好ましい。好適な塩
基としては、例えばナトリウム、カリウム等のアルカリ
金属、例えばマグネシウム、カルシウム等のアルカリ土
類金属、それらの金属の水酸化物または炭酸塩または炭
酸水素塩、ヒドラジン、例えばトリメチルアミン、トリ
エチルアミン等のトリアルキルアミン、ピコリン、1,
5−ジアザビシクロ [4.3.0] ノナ−5−エン、
1,4−ジアザビシクロ [2.2.2] オクタン、1,
8−ジアザビシクロ [5.4.0] ウンデカ−7−エン
等のような無機塩基および有機塩基が挙げられる。Removal of the N-protecting group is carried out by a conventional method such as hydrolysis, reduction and the like. Hydrolysis is preferably carried out in the presence of bases or acids, including Lewis acids. Suitable bases include, for example, alkali metals such as sodium and potassium, alkaline earth metals such as magnesium and calcium, hydroxides or carbonates or hydrogen carbonates of these metals, and hydrazines such as triethylamine and triethylamine. Alkylamine, picoline, 1,
5-diazabicyclo [4.3.0] non-5-ene,
1,4-diazabicyclo [2.2.2] octane, 1,
Inorganic and organic bases such as 8-diazabicyclo [5.4.0] undec-7-ene and the like can be mentioned.
【0069】好適な酸としては、例えばギ酸、酢酸、プ
ロピオン酸、トリクロロ酢酸、トリフルオロ酢酸等の有
機酸、例えば塩酸、臭化水素酸、硫酸、塩化水素、臭化
水素、フッ化水素等の無機酸および例えばピリジン塩酸
塩等の酸付加塩化合物が挙げられる。例えばトリクロロ
酢酸、トリフルオロ酢酸等のトリハロ酢酸等のような酸
を使用する脱離は、例えばアニソール、フェノール等の
陽イオン捕捉剤の存在下に行うのが好ましい。反応は通
常、水、例えばメタノール、エタノール等のアルコー
ル、塩化メチレン、クロロホルム、テトラクロロメタ
ン、テトラヒドロフランのような溶媒、またはそれらの
混合物中で行われるが、反応に悪影響を及ぼさない溶媒
であればその他のいかなる溶媒中でも行うことができ
る。液状の塩基または酸も溶媒として使用することがで
きる。反応温度は特に限定されず、通常冷却下ないし加
熱下に反応が行われる。Suitable acids include, for example, organic acids such as formic acid, acetic acid, propionic acid, trichloroacetic acid and trifluoroacetic acid, such as hydrochloric acid, hydrobromic acid, sulfuric acid, hydrogen chloride, hydrogen bromide and hydrogen fluoride. Included are inorganic acids and acid addition salt compounds such as pyridine hydrochloride. The elimination using an acid such as trihaloacetic acid such as trichloroacetic acid or trifluoroacetic acid is preferably carried out in the presence of a cation trapping agent such as anisole and phenol. The reaction is usually carried out in water, an alcohol such as methanol and ethanol, a solvent such as methylene chloride, chloroform, tetrachloromethane, tetrahydrofuran, or a mixture thereof, but other solvents can be used as long as they do not adversely affect the reaction. Can be performed in any solvent. Liquid bases or acids can also be used as solvents. The reaction temperature is not particularly limited, and the reaction is usually performed under cooling or heating.
【0070】脱離反応に適用されうる還元法としては、
化学的還元および接触還元が挙げられる。化学的還元に
使用される好適な還元剤は、例えばスズ、亜鉛、鉄等の
金属または例えば塩化クロム、酢酸クロム等の金属化合
物と、例えばギ酸、酢酸、プロピオン酸、トリフルオロ
酢酸、p−トルエンスルホン酸、塩酸、臭化水素酸等の
有機酸または無機酸との組合わせである。The reduction method applicable to the elimination reaction includes:
Examples include chemical reduction and catalytic reduction. Suitable reducing agents used for the chemical reduction are, for example, metals such as tin, zinc and iron or metal compounds such as chromium chloride and chromium acetate, and formic acid, acetic acid, propionic acid, trifluoroacetic acid, p-toluene. It is a combination with an organic or inorganic acid such as sulfonic acid, hydrochloric acid or hydrobromic acid.
【0071】接触還元に使用される好適な触媒は、例え
ば白金板、白金海綿、白金黒、コロイド白金、酸化白
金、白金線等の白金触媒、例えばパラジウム海綿、パラ
ジウム黒、酸化パラジウム、パラジウム−炭素、コロイ
ドパラジウム、パラジウム−硫酸バリウム、パラジウム
−炭酸バリウム等のパラジウム触媒、例えば還元ニッケ
ル、酸化ニッケル、ラネーニッケル等のニッケル触媒、
例えば還元コバルト、ラネーコバルト等のコバルト触
媒、例えば還元鉄、ラネー鉄等の鉄触媒、例えば還元
銅、ラネー銅、ウルマン銅等の銅触媒等のような常用の
ものである。還元は通常、水、メタノール、エタノー
ル、プロパノール、N,N−ジメチルホルムアミドのよ
うな反応に悪影響を及ぼさない慣用の溶媒またはそれら
の混合物中で行われる。さらに化学的還元に使用される
上記酸が液体である場合には、それらを溶媒として使用
することもできる。さらにまた、接触還元に使用される
好適な溶媒としては、上記溶媒およびジエチルエーテ
ル、ジオキサン、テトラヒドロフラン等のようなその他
の慣用の溶媒、またはそれらの混合物が挙げられる。こ
の還元の反応温度は特に限定されず、通常冷却下ないし
加熱下に反応が行われる。Suitable catalysts used for catalytic reduction are platinum catalysts such as platinum plate, platinum sponge, platinum black, colloidal platinum, platinum oxide, platinum wire, such as palladium sponge, palladium black, palladium oxide, palladium-carbon. Palladium catalysts such as colloidal palladium, palladium-barium sulfate and palladium-barium carbonate, nickel catalysts such as reduced nickel, nickel oxide and Raney nickel,
For example, a conventional cobalt catalyst such as reduced cobalt or Raney cobalt, an iron catalyst such as reduced iron or Raney iron, or a copper catalyst such as reduced copper, Raney copper or Ullmann copper. The reduction is usually carried out in conventional solvents which do not adversely influence the reaction such as water, methanol, ethanol, propanol, N, N-dimethylformamide, or a mixture thereof. Furthermore, if the acids used for the chemical reduction are liquids, they can also be used as solvents. Furthermore, suitable solvents used for catalytic reduction include the above solvents and other conventional solvents such as diethyl ether, dioxane, tetrahydrofuran and the like, or mixtures thereof. The reaction temperature for this reduction is not particularly limited, and the reaction is usually performed under cooling or heating.
【0072】[0072]
【化41】 [Chemical 41]
【0073】〔式中、R1 、R2 、R3 、R4 、R5 、
R10はそれぞれ前記定義の通りである〕 第1工程 化合物(II)またはその塩は、化合物(IV)もしくはカ
ルボキシ基におけるその反応性誘導体またはそれらの塩
を、化合物(V)もしくはアミノ基におけるその反応性
誘導体またはそれらの塩と反応させることにより製造で
きる。この反応は製造法aの縮合反応と実質的に同様に
して行うことができるので、この反応の反応方式および
例えば反応性誘導体、縮合剤、溶媒、反応温度等の反応
条件については製造法aの縮合反応の説明を参照すれば
よい。[Wherein R 1 , R 2 , R 3 , R 4 , R 5 ,
R 10 is each as defined above] Step 1 Compound (II) or a salt thereof is compound (IV) or a reactive derivative thereof at a carboxy group or a salt thereof is a compound (V) or a salt thereof at an amino group. It can be produced by reacting with a reactive derivative or a salt thereof. Since this reaction can be carried out in substantially the same manner as the condensation reaction of the production method a, the reaction scheme of this reaction and the reaction conditions such as the reactive derivative, the condensing agent, the solvent and the reaction temperature are the same as those of the production method a. The description of the condensation reaction may be referred to.
【0074】第2工程 化合物(I)またはその塩は、化合物(II)もしくはカ
ルボキシ基におけるその反応性誘導体またはそれらの塩
を、化合物(III) もしくはアミノ基におけるその反応性
誘導体またはそれらの塩と反応させ、必要に応じてN−
保護基を脱離することにより製造することができる。こ
の反応は製造法aの縮合反応と実質的に同様にして行う
ことができるので、この反応の反応方式および例えば反
応性誘導体、縮合剤、溶媒、反応温度等の反応条件につ
いては製造法aの縮合反応の説明を参照すればよい。Step 2 Compound (I) or a salt thereof is prepared by reacting compound (II) or its reactive derivative at a carboxy group or a salt thereof with compound (III) or a reactive derivative at an amino group or a salt thereof. React and, if necessary, N-
It can be produced by removing the protecting group. Since this reaction can be carried out in substantially the same manner as the condensation reaction of the production method a, the reaction scheme of this reaction and the reaction conditions such as the reactive derivative, the condensing agent, the solvent and the reaction temperature are the same as those of the production method a. The description of the condensation reaction may be referred to.
【0075】化合物(V)のイミダゾリル基が保護され
ている場合には、さらに化合物(II)と化合物(III) と
の反応生成物のN−保護基を脱離することにより最終生
成物(I)を製造することができる。この脱離反応は製
造法aの脱離反応と実質的に同様にして行うことができ
るので、この反応方式および例えば塩基、酸、還元剤、
触媒、溶媒、反応温度等の反応条件については製造法a
の脱離反応の説明を参照すればよい。When the imidazolyl group of compound (V) is protected, the final product (I) is further removed by eliminating the N-protecting group of the reaction product of compound (II) and compound (III). ) Can be manufactured. Since this elimination reaction can be carried out in substantially the same manner as the elimination reaction of the production method a, this reaction method and, for example, base, acid, reducing agent,
Regarding the reaction conditions such as the catalyst, the solvent and the reaction temperature, the production method a
See the description of the elimination reaction of.
【0076】R3 が低級アルキルである化合物(I)を
製造する場合、R3 に低級アルキルが導入された化合物
(V)を出発原料として用いてもよいし、下記製造法c
のように、R3 が水素である化合物(Va)を出発原料
として用い、(IV)と(Va)を縮合後、得られた化合
物(IIb)をアルキル化反応に付しR3 に低級アルキル
を導入してもよい。In the case of producing the compound (I) in which R 3 is lower alkyl, the compound (V) in which lower alkyl is introduced into R 3 may be used as a starting material, or the following production method c
As described above, a compound (Va) in which R 3 is hydrogen is used as a starting material, and after condensation of (IV) and (Va), the obtained compound (IIb) is subjected to an alkylation reaction to give R 3 a lower alkyl group. May be introduced.
【0077】[0077]
【化42】 [Chemical 42]
【0078】〔式中、R1 、R2 、R3 a 、R4 、
R5 、R10はそれぞれ前記定義の通りである〕 第1工程 化合物(IIb)またはその塩は、化合物(IV)もしくは
カルボキシ基におけるその反応性誘導体またはそれらの
塩を、化合物(Va)もしくはアミノ基におけるその反
応性誘導体またはそれらの塩と反応させることにより製
造できる。 この反応は製造法aの縮合反応と実質的に
同様にして行うことができるので、この反応の反応方式
および例えば反応性誘導体、縮合剤、溶媒、反応温度等
の反応条件については製造法aの縮合反応の説明を参照
すればよい。[Wherein R 1 , R 2 , R 3 a, R 4 ,
R 5 and R 10 are each as defined above] Step 1 Compound (IIb) or its salt is compound (IV) or its reactive derivative at the carboxy group or its salt, compound (Va) or amino It can be prepared by reacting with a reactive derivative of the group or a salt thereof. Since this reaction can be carried out in substantially the same manner as the condensation reaction of the production method a, the reaction scheme of this reaction and the reaction conditions such as the reactive derivative, the condensing agent, the solvent and the reaction temperature are the same as those of the production method a. The description of the condensation reaction may be referred to.
【0079】第2工程 化合物(IIc)またはその塩は、化合物(IIb)または
その塩を低級アルキル化反応に付すことにより製造する
ことができる。この反応に使用される好適な低級アルキ
ル化剤としては、例えばヨウ化メチル、ヨウ化エチル、
ヨウ化プロピル、ヨウ化ブチル、塩化ブチル、塩化ペン
チル等の低級アルキルハロゲン化物等が挙げられる。こ
の反応は通常、例えばナトリウム、カリウム等のアルカ
リ金属、例えばマグネシウム、カルシウム等のアルカリ
土類金属、それらの金属の水素化物または水酸化物、例
えばナトリウムメトキシド、ナトリウムエトキシド、カ
リウム第三級ブトキシド等のアルカリ金属アルコキシド
等のような塩基の存在下に行われる。この反応は通常、
水、例えばメタノール、エタノール、プロパノール等の
アルコール、テトラヒドロフラン、ジオキサン、酢酸エ
チル、塩化メチレン、N,N−ジメチルホルムアミド、
ジメチルスルホキシド、ジエチルエーテルのような慣用
の溶媒中で行われるが、反応に悪影響を及ぼさない溶媒
であれば、その他のいかなる有機溶媒中でも反応を行う
ことができる。また上記低級アルキル化剤が液体であれ
ばそれを溶媒として使用することもできる。反応温度は
特に限定されず、通常冷却下、常温、加温下または加熱
下に反応が行われる。Step 2 Compound (IIc) or a salt thereof can be produced by subjecting compound (IIb) or a salt thereof to a lower alkylation reaction. Suitable lower alkylating agent used in this reaction includes, for example, methyl iodide, ethyl iodide,
Examples thereof include lower alkyl halides such as propyl iodide, butyl iodide, butyl chloride and pentyl chloride. This reaction is usually carried out by alkali metals such as sodium and potassium, alkaline earth metals such as magnesium and calcium, hydrides or hydroxides of these metals such as sodium methoxide, sodium ethoxide, potassium tertiary butoxide. Etc. in the presence of a base such as an alkali metal alkoxide and the like. This reaction is usually
Water, for example, alcohols such as methanol, ethanol and propanol, tetrahydrofuran, dioxane, ethyl acetate, methylene chloride, N, N-dimethylformamide,
The reaction is carried out in a conventional solvent such as dimethyl sulfoxide or diethyl ether, but the reaction can be carried out in any other organic solvent as long as it does not adversely affect the reaction. If the lower alkylating agent is a liquid, it can be used as a solvent. The reaction temperature is not particularly limited, and the reaction is usually performed under cooling, at room temperature, under heating or under heating.
【0080】第3工程 化合物(Ia)またはその塩は、化合物(IIc)もしく
はカルボキシ基におけるその反応性誘導体またはそれら
の塩を、化合物(III) もしくはアミノ基におけるその反
応性誘導体またはそれらの塩と反応させることにより製
造できる。この反応は製造法aの縮合反応と実質的に同
様にして行うことができるので、この反応の反応方式お
よび例えば反応性誘導体、縮合剤、溶媒、反応温度等の
反応条件については製造法aの縮合反応の説明を参照す
ればよい。Step 3 Compound (Ia) or a salt thereof is prepared by reacting compound (IIc) or a reactive derivative thereof at a carboxy group or a salt thereof with compound (III) or a reactive derivative thereof at an amino group or a salt thereof. It can be produced by reacting. Since this reaction can be carried out in substantially the same manner as the condensation reaction of the production method a, the reaction scheme of this reaction and the reaction conditions such as the reactive derivative, the condensing agent, the solvent and the reaction temperature are the same as those of the production method a. The description of the condensation reaction may be referred to.
【0081】化合物(Va)のイミダゾリル基が保護さ
れている場合には、さらに化合物(IIc)と化合物(II
I) との反応生成物のN−保護基を脱離することにより
最終生成物(Ia)を製造することができる。この脱離
反応は製造法aの脱離反応と実質的に同様にして行うこ
とができるので、この反応方式および例えば塩基、酸、
還元剤、触媒、溶媒、反応温度等の反応条件については
製造法aの脱離反応の説明を参照すればよい。When the imidazolyl group of the compound (Va) is protected, the compound (IIc) and the compound (II
The final product (Ia) can be prepared by removing the N-protecting group of the reaction product with I). Since this elimination reaction can be carried out in substantially the same manner as the elimination reaction of the production method a, this reaction method and, for example, a base, an acid,
For the reaction conditions such as the reducing agent, the catalyst, the solvent and the reaction temperature, the description of the elimination reaction of the production method a may be referred to.
【0082】本発明の製造法において原料化合物(III)
および(IV) はそれぞれ以下の方法にて製造することが
できる。化合物(III) はTetrahedron:Asymmetry,Vol.1,
375-378(1990) に記載の方法、例えば後記製造例に記載
した方法に従って製造することができる。化合物(IV)
は特開昭64−19071号公報に記載の方法に従って
製造することができる。本明細書において、「Nα−」
はα−アミノ酸アミノ基の窒素原子に結合している置換
基、「Nim−」はイミダゾール環上の窒素原子に結合し
ている置換基であることをそれぞれ意味する。In the production method of the present invention, the starting compound (III)
Each of (IV) and (IV) can be produced by the following methods. Compound (III) is Tetrahedron: Asymmetry, Vol.1,
It can be produced according to the method described in 375-378 (1990), for example, the method described in the production examples below. Compound (IV)
Can be produced according to the method described in JP-A 64-19071. In the present specification, “Nα-”
Means a substituent bonded to the nitrogen atom of the α-amino acid amino group, and “N im −” means a substituent bonded to the nitrogen atom on the imidazole ring.
【0083】[0083]
【実施例】以下に実施例を挙げて本発明を具体的に説明
するが、本発明はこれらに限定されるものではない。 製造例1 L−フェニルアラニン(50g)、粉砕炭酸カリウム
(167.34g)、ヨウ化ナトリウム(22.68
g)をN,N−ジメチルアセタミド(500ml)中へ攪
拌下加え、水(25ml)を加えた。60℃まで昇温後、
ベンジルクロライド(118.78g)を滴下した。滴
下終了後60〜65℃で6時間激しく攪拌した。反応終
了後、反応液を20〜30℃まで冷却し、水(750m
l)、酢酸エチル(500ml)を加え抽出した。酢酸エ
チル層を分取後、水(500ml)、10%亜硫酸水素ナ
トリウム水溶液(500ml)で2回、さらに水(500
ml)で洗浄し、酢酸エチル層を減圧濃縮乾固し、N,N
−ジベンジル−L−フェニルアラニン・ベンジルエステ
ル(136.88g)を黄色油状物として得た。NMR
(CDCl3 ,δ): 2.94-3.19 (2H,m), 3.72 (1H,t,
J=0.77Hz), 3.73 (4H,ABsystem,J=7.86Hz,1.40Hz), 5.1
7 (2H,ABsystem,J=2.51Hz,1.23Hz), 6.98-7.35 (20H,m)The present invention will be described in more detail with reference to the following examples, but the present invention is not limited thereto. Production Example 1 L-phenylalanine (50 g), ground potassium carbonate (167.34 g), sodium iodide (22.68)
g) was added to N, N-dimethylacetamide (500 ml) with stirring, and water (25 ml) was added. After raising the temperature to 60 ° C,
Benzyl chloride (118.78 g) was added dropwise. After completion of dropping, the mixture was vigorously stirred at 60 to 65 ° C for 6 hours. After the reaction was completed, the reaction solution was cooled to 20 to 30 ° C, and water (750 m
l) and ethyl acetate (500 ml) were added for extraction. After separating the ethyl acetate layer, water (500 ml), 10% aqueous sodium hydrogen sulfite solution (500 ml) twice, and further water (500 ml).
ml), and the ethyl acetate layer is concentrated to dryness under reduced pressure to give N, N
-Dibenzyl-L-phenylalanine benzyl ester (136.88g) was obtained as a yellow oil. NMR
(CDCl 3 , δ): 2.94-3.19 (2H, m), 3.72 (1H, t,
J = 0.77Hz), 3.73 (4H, ABsystem, J = 7.86Hz, 1.40Hz), 5.1
7 (2H, ABsystem, J = 2.51Hz, 1.23Hz), 6.98-7.35 (20H, m)
【0084】製造例2 N,N−ジベンジル−L−フェニルアラニン・ベンジル
エステル(27.24g)をメタノール(79.6ml)
に溶解し、水酸化ナトリウム水溶液(水酸化ナトリウム
4.8g、水19.9ml)を加え、1.5時間攪拌下還
流した。反応終了後メタノールを減圧濃縮し、水(99
ml)、酢酸エチル(99ml)を加え抽出した。酢酸エチ
ル層を分取後5%食塩水(99ml)で洗浄し、酢酸エチ
ル層を減圧濃縮乾固した。濃縮残渣にアセトン(20m
l)を加え内温45〜50℃まで昇温後、17.5%塩
酸(50ml)を同温で滴下した。滴下終了後、同温でア
セトン(30ml)を滴下し、同温で30分間攪拌後、内
温20〜25℃まで冷却し、1時間攪拌後5℃以下に冷
却し、2時間以上攪拌した。析出した結晶を濾過し、
N,N−ジベンジル−L−フェニルアラニンの塩酸塩
(21.19g)を白色結晶として得た。 融点:129〜156℃(分解) IR(Nujol): 3350, 2600, 1740, 1600, 1590 cm-1 NMR(CDCl3 ,δ): 2.93-3.29 (2H,m), 3.70-
3.78 (1H,m), 3.77 (4H,ABsystem,J=2.70Hz,1.36Hz),
6.69 (1H,bs), 7.03-7.32 (15H,m)Production Example 2 N, N-dibenzyl-L-phenylalanine benzyl ester (27.24 g) was added to methanol (79.6 ml).
Aqueous sodium hydroxide solution (sodium hydroxide 4.8 g, water 19.9 ml) was added, and the mixture was refluxed for 1.5 hours with stirring. After completion of the reaction, methanol was concentrated under reduced pressure, and water (99
ml) and ethyl acetate (99 ml) were added for extraction. The ethyl acetate layer was separated and washed with 5% brine (99 ml), and the ethyl acetate layer was concentrated under reduced pressure to dryness. Acetone (20m
l) was added and the internal temperature was raised to 45 to 50 ° C, and 17.5% hydrochloric acid (50 ml) was added dropwise at the same temperature. After the completion of the dropping, acetone (30 ml) was added dropwise at the same temperature, the mixture was stirred at the same temperature for 30 minutes, cooled to an internal temperature of 20 to 25 ° C, stirred for 1 hour, cooled to 5 ° C or lower, and stirred for 2 hours or more. The precipitated crystals are filtered,
N, N-dibenzyl-L-phenylalanine hydrochloride (21.19 g) was obtained as white crystals. Melting point: 129 to 156 ° C (decomposition) IR (Nujol): 3350, 2600, 1740, 1600, 1590 cm -1 NMR (CDCl 3 , δ): 2.93-3.29 (2H, m), 3.70-
3.78 (1H, m), 3.77 (4H, ABsystem, J = 2.70Hz, 1.36Hz),
6.69 (1H, bs), 7.03-7.32 (15H, m)
【0085】製造例3 N,N−ジベンジル−L−フェニルアラニンの塩酸塩
(50g)を塩化メチレン(500ml)に溶解し、これ
に水酸化ナトリウム水溶液(水酸化ナトリウム6g、水
500ml)を加え、30分攪拌後、分液し、有機層を硫
酸マグネシウムで乾燥し、減圧濃縮し、N,N−ジベン
ジル−L−フェニルアラニンを油状物として得た。テト
ラヒドロフラン(1000ml)に塩化ピバロイル(4
4.90g)を溶解し、−20℃まで冷却し、これにテ
トラヒドロフラン(500ml)に溶解した上記N,N−
ジベンジル−L−フェニルアラニンとトリエチルアミン
(18.84g)を−20〜−15℃で滴下した。滴下
後30分間同温で攪拌した。これに別途、マグネシウム
(21.12g)、イソアミルブロマイド(150.0
3g)、テトラヒドロフラン(500ml)から調整した
イソアミルマグネシウムブロマイドを−15〜0℃で2
時間かけて滴下した。滴下後ただちに酢酸(50ml)を
同温で滴下し、反応液を20%塩化アンモニア水(50
0ml)中へ加えた。さらにこれにトルエン(500m
l)、7%塩酸(500ml)を加え分液した。有機層を
7%塩酸(500ml)で洗浄後5%炭酸水素ナトリウム
水(500ml)で洗浄し、飽和食塩水(500ml)で洗
浄した。有機層を硫酸マグネシウムで乾燥後、減圧濃縮
し、2(S)−(N,N−ジベンジルアミノ)−1−フ
ェニル−3−オキソ−6−メチルヘプタン(100.2
g)を黄色油状物として得た。 IR(Neat) : 2700-3150, 1950, 1870, 1805, 1710, 1
600, 1450 cm-1 NMR(CDCl3 ,δ): 0.80-1.43 (4H,m), 2.05-
2.60 (2H,m), 2.86-3.22 (2H,m), 3.53-3.67 (1H,m),
3.70 (4H,ABsystem,J=3.71Hz,1.36Hz), 7.08-7.33 (15
H,m)Production Example 3 N, N-Dibenzyl-L-phenylalanine hydrochloride (50 g) was dissolved in methylene chloride (500 ml), and an aqueous sodium hydroxide solution (sodium hydroxide 6 g, water 500 ml) was added to the solution to give 30 After stirring for minutes, the layers were separated, the organic layer was dried over magnesium sulfate, and concentrated under reduced pressure to give N, N-dibenzyl-L-phenylalanine as an oil. Tetrahydrofuran (1000 ml) in pivaloyl chloride (4
4.90 g) was dissolved, cooled to -20 ° C., and dissolved in tetrahydrofuran (500 ml) to obtain the above N, N-.
Dibenzyl-L-phenylalanine and triethylamine (18.84g) were added dropwise at -20 to -15 ° C. After dropping, the mixture was stirred for 30 minutes at the same temperature. Separately, magnesium (21.12 g) and isoamyl bromide (150.0
3 g) and isoamyl magnesium bromide prepared from tetrahydrofuran (500 ml) at -15 to 0 ° C for 2
It dripped over time. Immediately after the addition, acetic acid (50 ml) was added dropwise at the same temperature, and the reaction solution was added with 20% aqueous ammonium chloride (50
0 ml). In addition to this, toluene (500m
l) and 7% hydrochloric acid (500 ml) were added for liquid separation. The organic layer was washed with 7% hydrochloric acid (500 ml), then with 5% aqueous sodium hydrogen carbonate solution (500 ml) and then with saturated brine (500 ml). The organic layer was dried over magnesium sulfate and then concentrated under reduced pressure, and 2 (S)-(N, N-dibenzylamino) -1-phenyl-3-oxo-6-methylheptane (100.2
g) was obtained as a yellow oil. IR (Neat): 2700-3150, 1950, 1870, 1805, 1710, 1
600, 1450 cm -1 NMR (CDCl 3 , δ): 0.80-1.43 (4H, m), 2.05-
2.60 (2H, m), 2.86-3.22 (2H, m), 3.53-3.67 (1H, m),
3.70 (4H, ABsystem, J = 3.71Hz, 1.36Hz), 7.08-7.33 (15
H, m)
【0086】製造例4 2(S)−(N,N−ジベンジルアミノ)−1−フェニ
ル−3−オキソ−6−メチルヘプタン(100g)をメ
タノール(500ml)とテトラヒドロフラン(500m
l)の混合液に溶解し、−20℃まで冷却した。同温
下、水素化ホウ素ナトリウム(63g)をゆっくり加え
た。反応終了後反応液を減圧濃縮し、残渣に酢酸エチル
(500ml)、水(500ml)を加え抽出した。水層を
酢酸エチル(250ml)で再抽出し、有機層を合わせ飽
和食塩水(500ml)で洗浄後、有機層を濃縮した。さ
らに残渣油状物に水(100ml)を加え共沸を行った。
共沸操作を8回行った後にトルエン(100ml)を加え
さらに共沸を行い、2(S)−(N,N−ジベンジルア
ミノ)−1−フェニル−3(S)−ヒドロキシ−6−メ
チルヘプタンを得た。 IR(Nujol) : 3400, 3350, 1950, 1890, 1810, 1600,
1590 cm-1, NMR(CDCl3 ,δ): 0.74 (6H,d,J=0.64Hz),
0.95-1.43 (5H,m), 2.81-2.92 (1H,m), 2.88 (2H,ABXsy
stem,J=6.75Hz,1.40Hz,0.61Hz), 3.55 (1H,dt,J=0.63H
z,0.26Hz), 3.64(4H,ABsystem,J=10.60Hz,1.32Hz), 4.4
9 (1H,bs), 7.19-7.36 (15H,m)Production Example 4 2 (S)-(N, N-dibenzylamino) -1-phenyl-3-oxo-6-methylheptane (100 g) was added to methanol (500 ml) and tetrahydrofuran (500 m).
It was dissolved in the mixed solution of l) and cooled to -20 ° C. Sodium borohydride (63 g) was slowly added at the same temperature. After completion of the reaction, the reaction solution was concentrated under reduced pressure, and ethyl acetate (500 ml) and water (500 ml) were added to the residue for extraction. The aqueous layer was re-extracted with ethyl acetate (250 ml), the organic layers were combined, washed with saturated brine (500 ml), and the organic layer was concentrated. Further, water (100 ml) was added to the residual oily substance to perform azeotropic distillation.
After performing the azeotropic operation 8 times, toluene (100 ml) was added to further perform azeotropic distillation, and 2 (S)-(N, N-dibenzylamino) -1-phenyl-3 (S) -hydroxy-6-methyl was added. I got heptane. IR (Nujol): 3400, 3350, 1950, 1890, 1810, 1600,
1590 cm -1 , NMR (CDCl 3 , δ): 0.74 (6H, d, J = 0.64Hz),
0.95-1.43 (5H, m), 2.81-2.92 (1H, m), 2.88 (2H, ABXsy
stem, J = 6.75Hz, 1.40Hz, 0.61Hz), 3.55 (1H, dt, J = 0.63H
z, 0.26Hz), 3.64 (4H, ABsystem, J = 10.60Hz, 1.32Hz), 4.4
9 (1H, bs), 7.19-7.36 (15H, m)
【0087】製造例5 2(S)−(N,N−ジベンジルアミノ)−1−フェニ
ル−3(S)−ヒドロキシ−6−メチルヘプタン(25
g)をメタノール(250ml)に溶解し、これに10%
パラジウム−炭素(1.25g)を水(10ml)に懸濁
し加え、さらにギ酸アンモニウム(15.70g)を加
え、室温下5時間攪拌した後、反応液を減圧濃縮した。
残渣を塩化メチレンに溶解後、水で洗浄し、有機層を硫
酸マグネシウムで乾燥し、減圧濃縮し、2(S)−アミ
ノ−1−フェニル−3(S)−ヒドロキシ−6−メチル
ヘプタン(14.0g)を得た。 IR(Nujol): 3350, 3300, 3000, 2730, 1600, 1500
cm-1 NMR(CDCl3 ,δ): 0.90 (6H,d,J=0.63Hz),
1.16-1.63 (5H,m), 1.85 (2H,bs), 2.84-2.97 (2H,m),
3.30-3.38 (1H,m), 7.18-7.36 (5H,m)Production Example 5 2 (S)-(N, N-dibenzylamino) -1-phenyl-3 (S) -hydroxy-6-methylheptane (25
g) was dissolved in methanol (250 ml) and added with 10%
Palladium-carbon (1.25 g) was suspended in water (10 ml), ammonium formate (15.70 g) was further added, the mixture was stirred at room temperature for 5 hr, and the reaction mixture was concentrated under reduced pressure.
The residue was dissolved in methylene chloride, washed with water, the organic layer was dried over magnesium sulfate, concentrated under reduced pressure, and 2 (S) -amino-1-phenyl-3 (S) -hydroxy-6-methylheptane (14 0.0 g) was obtained. IR (Nujol): 3350, 3300, 3000, 2730, 1600, 1500
cm -1 NMR (CDCl 3 , δ): 0.90 (6H, d, J = 0.63Hz),
1.16-1.63 (5H, m), 1.85 (2H, bs), 2.84-2.97 (2H, m),
3.30-3.38 (1H, m), 7.18-7.36 (5H, m)
【0088】製造例6 2(S)−アミノ−1−フェニル−3(S)−ヒドロキ
シ−6−メチルヘプタン(13g)を酢酸(130ml)
に溶解し、酸化白金(1.3g)を加え中圧(4気圧)
接触還元を行った。反応溶液は45℃に加温した。反応
終了後、触媒を濾去した後濾液を減圧濃縮した。残渣を
塩化メチレンに溶解後、5%炭酸水素ナトリウム水溶液
で洗浄し、有機層を硫酸マグネシウムで乾燥し、溶媒を
減圧留去し、2(S)−アミノ−1−シクロヘキシル−
3(S)−ヒドロキシ−6−メチルヘプタン(11.2
5g)を得た。 IR(Nujol) : 3410, 3350, 3300, 2900, 2700, 1600
cm-1 NMR(CDCl3 ,δ): 0.90 (6H,d,J=0.8Hz), 0.
77-1.74 (21H,m), 2.60-2.70 (1H,m), 3.13-3.21 (1H,
m)Production Example 6 2 (S) -Amino-1-phenyl-3 (S) -hydroxy-6-methylheptane (13 g) was added to acetic acid (130 ml).
Platinum oxide (1.3 g) was added to the solution and the medium pressure (4 atm) was applied.
Catalytic reduction was performed. The reaction solution was heated to 45 ° C. After completion of the reaction, the catalyst was filtered off and the filtrate was concentrated under reduced pressure. The residue was dissolved in methylene chloride, washed with 5% aqueous sodium hydrogen carbonate solution, the organic layer was dried over magnesium sulfate, the solvent was evaporated under reduced pressure, and 2 (S) -amino-1-cyclohexyl-
3 (S) -hydroxy-6-methylheptane (11.2
5 g) was obtained. IR (Nujol): 3410, 3350, 3300, 2900, 2700, 1600
cm -1 NMR (CDCl 3 , δ): 0.90 (6H, d, J = 0.8Hz), 0.
77-1.74 (21H, m), 2.60-2.70 (1H, m), 3.13-3.21 (1H,
m)
【0089】製造例7 L−酒石酸(6.60g)をイソプロピルアルコール
(90ml)と水(10ml)の混合液に加熱(70〜75
℃)溶解し、同温で2(S)−アミノ−1−シクロヘキ
シル−3(S)−ヒドロキシ−6−メチルヘプタン(1
0g)のイソプロピルアルコール(100ml)溶液を滴
下した。滴下終了後冷却し、析出した結晶を濾取し、2
(S)−アミノ−1−シクロヘキシル−3(S)−ヒド
ロキシ−6−メチルヘプタンのL−酒石酸塩(11.6
7g)を得た。Production Example 7 L-tartaric acid (6.60 g) was heated (70-75) to a mixture of isopropyl alcohol (90 ml) and water (10 ml).
C.) and dissolved at the same temperature, 2 (S) -amino-1-cyclohexyl-3 (S) -hydroxy-6-methylheptane (1
A solution of 0 g) in isopropyl alcohol (100 ml) was added dropwise. After completion of dropping, the mixture was cooled, and the precipitated crystals were collected by filtration, and 2
(S) -Amino-1-cyclohexyl-3 (S) -hydroxy-6-methylheptane L-tartrate (11.6
7 g) was obtained.
【0090】製造例8 2(S)−アミノ−3−シクロヘキシルプロピオン酸メ
チルの塩酸塩(150g)をN,N−ジメチルホルムア
ミド(1200ml)に溶解し、粉砕炭酸カリウム(33
0.7g)を加え、懸濁攪拌下ベンジルブロマイド(2
54.6g)を滴下した。滴下後内温50℃まで昇温
し、同温で9時間攪拌した後反応液を冷却し、濾過し
た。濾液に水(600ml)、ジイソプロピルエーテル
(600ml)を加え分液し、有機層を分取した。水層を
ジイソプロピルエーテル(300ml)で再抽出し、両有
機層を合わせ、5%塩酸(600ml)で洗浄後、5%炭
酸水素ナトリウム水溶液(600ml)、25%食塩水で
洗浄し、硫酸マグネシウムで乾燥後、溶媒を濃縮し、2
(S)−(N,N−ジベンジルアミノ)−3−シクロヘ
キシルプロピオン酸メチル(204.6g)を得た。 NMR(CDCl3 ,δ): 0.58-1.69 (13H, m), 3.3
7-3.44 (1H,m), 3.70(4H,ABsystem,J=8.17Hz,1.38Hz),
3.74 (3H,s), 7.17-7.48 (10H,m)Production Example 8 Methyl 2 (S) -amino-3-cyclohexylpropionate hydrochloride (150 g) was dissolved in N, N-dimethylformamide (1200 ml) and ground potassium carbonate (33 g) was added.
0.7 g) was added and benzyl bromide (2
54.6 g) was added dropwise. After the dropping, the internal temperature was raised to 50 ° C., the mixture was stirred at the same temperature for 9 hours, then the reaction liquid was cooled and filtered. Water (600 ml) and diisopropyl ether (600 ml) were added to the filtrate for liquid separation, and the organic layer was separated. The aqueous layer was re-extracted with diisopropyl ether (300 ml), both organic layers were combined and washed with 5% hydrochloric acid (600 ml), then with 5% aqueous sodium hydrogen carbonate solution (600 ml) and 25% brine, and magnesium sulfate. After drying, the solvent is concentrated and 2
Methyl (S)-(N, N-dibenzylamino) -3-cyclohexylpropionate (204.6 g) was obtained. NMR (CDCl 3 , δ): 0.58-1.69 (13H, m), 3.3
7-3.44 (1H, m), 3.70 (4H, ABsystem, J = 8.17Hz, 1.38Hz),
3.74 (3H, s), 7.17-7.48 (10H, m)
【0091】製造例9 2(S)−(N,N−ジベンジルアミノ)−3−シクロ
ヘキシルプロピオン酸メチル(200g)をメタノール
(1リットル)に溶解し、これに水酸化ナトリウム水溶
液(水酸化ナトリウム32.8g、水200ml)を加
え、6時間還流した。反応終了後反応液を濃縮し、残渣
に酢酸エチル(1リットル)を加え溶解した後、水(4
00ml)を加え分液した。有機層を分取後これを10%
クエン酸(400ml)で洗浄し、飽和食塩水(400m
l)で洗浄し、硫酸マグネシウムで乾燥し、溶媒を減圧
留去し、2(S)−(N,N−ジベンジルアミノ)−3
−シクロヘキシルプロピオン酸(91.1g)を得た。 NMR(CDCl3 ,δ): 0.69-1.64 (13H,m), 3.45
(1H,t,J=0.70Hz), 3.75 (4H,ABsystem,J=2.46Hz,1.36H
z), 7.21-7.38 (10H,m), 7.90 (1H,bs)Production Example 9 Methyl 2 (S)-(N, N-dibenzylamino) -3-cyclohexylpropionate (200 g) was dissolved in methanol (1 liter), and an aqueous sodium hydroxide solution (sodium hydroxide was added thereto). (32.8 g, 200 ml of water) was added, and the mixture was refluxed for 6 hours. After completion of the reaction, the reaction solution was concentrated, ethyl acetate (1 liter) was added to the residue to dissolve it, and water (4
(00 ml) was added and the layers were separated. 10% after collecting the organic layer
Wash with citric acid (400 ml), saturated saline solution (400 m
l), dried over magnesium sulfate, the solvent was distilled off under reduced pressure, and 2 (S)-(N, N-dibenzylamino) -3 was used.
-Cyclohexylpropionic acid (91.1 g) was obtained. NMR (CDCl 3 , δ): 0.69-1.64 (13H, m), 3.45
(1H, t, J = 0.70Hz), 3.75 (4H, ABsystem, J = 2.46Hz, 1.36H
z), 7.21-7.38 (10H, m), 7.90 (1H, bs)
【0092】製造例10 塩化ピバロイル(5.15g)をテトラヒドロフラン
(30ml)に溶解し、−30℃まで冷却した。これに同
温で2(S)−(N,N−ジベンジルアミノ)−3−シ
クロヘキシルプロピオン酸(5.0g)、トリエチルア
ミン(4.32g)のテトラヒドロフラン(20ml)溶
液を15分かけ滴下した。滴下後20℃で1時間攪拌し
た。再度反応液を−50℃まで冷却し、別途イソアミル
ブロマイド(21.49g)、マグネシウム(3.46
g)、テトラヒドロフラン(50ml)から調整したイソ
アミルマグネシウムブロマイド−テトラヒドロフラン溶
液を同温で15分かけ滴下した。滴下後同温で30分
間、15℃で30分間、25℃で1時間攪拌した後、2
0%塩化アンモニウム水溶液(100ml)中へ加え、ト
ルエン(100ml)を加え、7%塩酸でpH6〜7に調
整後有機層を分取した。有機層を7%塩酸(100ml)
で2回、5%炭酸水素ナトリウム水溶液(100ml)、
飽和食塩水(100ml)で洗浄後、硫酸マグネシウムで
乾燥し、溶媒を減圧留去し、2(S)−(N,N−ジベ
ンジルアミノ)−シクロヘキシル−3−オキソ−6−メ
チルヘプタン(9,41g)を得た。 NMR(CDCl3 ,δ): 0.85 (6H,dd,J=0.63Hz,0.
09Hz), 1.13-1.74 (16H,m), 2.24-2.61 (2H,m), 3.32
(1H,q,J=0.46Hz), 3.61 (4H,ABsystem,J=3.48Hz,1.37H
z), 7.19-7.36 (10H,m)Production Example 10 Pivaloyl chloride (5.15 g) was dissolved in tetrahydrofuran (30 ml) and cooled to -30 ° C. To this, a solution of 2 (S)-(N, N-dibenzylamino) -3-cyclohexylpropionic acid (5.0 g) and triethylamine (4.32 g) in tetrahydrofuran (20 ml) was added dropwise at the same temperature over 15 minutes. After dropping, the mixture was stirred at 20 ° C. for 1 hour. The reaction solution was cooled again to -50 ° C, and isoamyl bromide (21.49 g) and magnesium (3.46) were separately added.
g) and an isoamylmagnesium bromide-tetrahydrofuran solution prepared from tetrahydrofuran (50 ml) were added dropwise at the same temperature over 15 minutes. After dropping, the mixture was stirred at the same temperature for 30 minutes, 15 ° C. for 30 minutes, and 25 ° C. for 1 hour, and then 2
The mixture was added to a 0% ammonium chloride aqueous solution (100 ml), toluene (100 ml) was added, the pH was adjusted to 6 to 7 with 7% hydrochloric acid, and the organic layer was separated. The organic layer is 7% hydrochloric acid (100 ml)
Twice with 5% aqueous sodium hydrogen carbonate solution (100 ml),
The extract was washed with saturated brine (100 ml), dried over magnesium sulfate, the solvent was distilled off under reduced pressure, and 2 (S)-(N, N-dibenzylamino) -cyclohexyl-3-oxo-6-methylheptane (9 , 41 g) was obtained. NMR (CDCl 3 , δ): 0.85 (6H, dd, J = 0.63Hz, 0.
09Hz), 1.13-1.74 (16H, m), 2.24-2.61 (2H, m), 3.32
(1H, q, J = 0.46Hz), 3.61 (4H, ABsystem, J = 3.48Hz, 1.37H
z), 7.19-7.36 (10H, m)
【0093】製造例11 2(S)−(N,N−ジベンジルアミノ)−1−シクロ
ヘキシル−3−オキソ−6−メチルヘプタン(2g)
を、メタノール(20ml)とテトラヒドロフラン(20
ml)の混合液に溶解後、−20℃まで冷却した。反応溶
液中に水素化ホウ素ナトリウム(0.2g)を−20℃
に保ちながら添加した。添加後同温で1.5時間反応を
行った。反応終了後、反応液に水(50ml)を加え、塩
化メチレン(50ml)を加え抽出した。塩化メチレン層
を無水硫酸マグネシウムで乾燥後、溶媒を減圧留去し、
2(S)−(N,N−ジベンジルアミノ)−1−シクロ
ヘキシル−3(S)−ヒドロキシ−6−メチルヘプタン
(2.01g)を得た。 NMR(CDCl3 ,δ): 0.85 (6H,ABsystem,J=0.6
4Hz,0.21Hz), 0.79-1.74 (18H), 2.46-2.56 (1H,m), 3.
37-3.49 (1H,m), 3.62 (4H,ABsystem,J=8.76Hz, 1.35H
z), 4.48 (1H,bs), 7.16-7.37 (10H,m)Production Example 11 2 (S)-(N, N-dibenzylamino) -1-cyclohexyl-3-oxo-6-methylheptane (2 g)
To methanol (20 ml) and tetrahydrofuran (20
ml) and then cooled to -20 ° C. Sodium borohydride (0.2g) was added to the reaction solution at -20 ° C.
It was added while keeping. After the addition, the reaction was carried out at the same temperature for 1.5 hours. After completion of the reaction, water (50 ml) was added to the reaction solution, and methylene chloride (50 ml) was added for extraction. After drying the methylene chloride layer over anhydrous magnesium sulfate, the solvent was distilled off under reduced pressure,
2 (S)-(N, N-dibenzylamino) -1-cyclohexyl-3 (S) -hydroxy-6-methylheptane (2.01 g) was obtained. NMR (CDCl 3 , δ): 0.85 (6H, ABsystem, J = 0.6)
4Hz, 0.21Hz), 0.79-1.74 (18H), 2.46-2.56 (1H, m), 3.
37-3.49 (1H, m), 3.62 (4H, ABsystem, J = 8.76Hz, 1.35H
z), 4.48 (1H, bs), 7.16-7.37 (10H, m)
【0094】製造例12 2(S)−(N,N−ジベンジルアミノ)−1−シクロ
ヘキシル−3(S)−ヒドロキシ−6−メチルヘプタン
(5g)をメタノール(50ml)に溶解した。さらにギ
酸アンモニウム(6.18g)を加え、10%パラジウ
ム−炭素(50% wet, 0.5g)を加え、室温で激し
く攪拌した。反応終了後、反応液を濾過し、濾液を減圧
濃縮し、濃縮残渣に酢酸エチルと水を加え抽出を行っ
た。さらに、飽和食塩水で洗浄後、無水硫酸マグネシウ
ムで乾燥し、溶媒を減圧留去し、2(S)−アミノ−1
−シクロヘキシル−3(S)−ヒドロキシ−6−メチル
ヘプタン(4.13g)を得た。 NMR(CDCl3 ,δ): 0.90 (6H,d,J=0.8Hz), 0.
77-1.74 (21H,m), 2.60-2.70 (1H,m), 3.13-3.21 (1H,
m)Production Example 12 2 (S)-(N, N-dibenzylamino) -1-cyclohexyl-3 (S) -hydroxy-6-methylheptane (5 g) was dissolved in methanol (50 ml). Further, ammonium formate (6.18 g) was added, 10% palladium-carbon (50% wet, 0.5 g) was added, and the mixture was vigorously stirred at room temperature. After completion of the reaction, the reaction solution was filtered, the filtrate was concentrated under reduced pressure, and ethyl acetate and water were added to the concentrated residue for extraction. Further, after washing with saturated saline, it was dried over anhydrous magnesium sulfate, and the solvent was distilled off under reduced pressure to give 2 (S) -amino-1.
-Cyclohexyl-3 (S) -hydroxy-6-methylheptane (4.13 g) was obtained. NMR (CDCl 3 , δ): 0.90 (6H, d, J = 0.8Hz), 0.
77-1.74 (21H, m), 2.60-2.70 (1H, m), 3.13-3.21 (1H,
m)
【0095】実施例1 L−ヒスチジン(100g)を塩化メチレン(2.0リ
ットル)に懸濁し、内温20〜30℃でジクロロジメチ
ルシラン(83.2g)を加え、3時間加熱還流を行っ
た後、還流下トリエチルアミン(66.5g)を15〜
30分間を要し滴下し更に30分間加熱還流を行う。シ
リル化反応終了後、反応液を内温20〜30℃に冷却
し、同温でトリチルクロライド(188.6g)の塩化
メチレン(300ml)溶液を1時間を要し滴下し、滴下
終了後更に同温で1時間後反応を行う。トリチル化反応
終了後、減圧下濃縮し、残渣にメタノール(200ml)
を加え、15分間攪拌後、水(1.0リットル)を内温
20〜30℃で30分間を要し滴下する。滴下後トリエ
チルアミンを用い、pH6.5〜7.5に調整する。そ
の後、同温で析出結晶を濾取する。濾取した結晶は水
(400ml)、塩化メチレン(500ml)で各々洗浄し
た後、一夜真空乾燥し、Nim−トリチル−L−ヒスチジ
ン(192.3g)を得る。収率75% NMR(DMSO−d6 , δ) : 6.76 (1H,s), 7.08-7.
13 (6H,m), 7.29 (1H,s), 7.37-7.43 (9H,m)Example 1 L-histidine (100 g) was suspended in methylene chloride (2.0 liter), dichlorodimethylsilane (83.2 g) was added at an internal temperature of 20 to 30 ° C., and the mixture was heated under reflux for 3 hr. Then, under reflux, triethylamine (66.5 g) was added to 15-
It takes 30 minutes to add dropwise, and the mixture is heated under reflux for another 30 minutes. After completion of the silylation reaction, the reaction solution was cooled to an internal temperature of 20 to 30 ° C., and a solution of trityl chloride (188.6 g) in methylene chloride (300 ml) was added dropwise over 1 hour at the same temperature. The reaction is carried out at warm temperature for 1 hour. After completion of the tritylation reaction, the reaction mixture was concentrated under reduced pressure and the residue was methanol (200 ml).
Is added, and after stirring for 15 minutes, water (1.0 liter) is added dropwise at an internal temperature of 20 to 30 ° C. over 30 minutes. After dropping, the pH is adjusted to 6.5 to 7.5 using triethylamine. Then, the precipitated crystals are collected at the same temperature. The crystals collected by filtration were washed with water (400 ml) and methylene chloride (500 ml), respectively, and dried under vacuum overnight to give N im -trityl-L-histidine (192.3 g). Yield 75% NMR (DMSO-d 6 , δ): 6.76 (1H, s), 7.08-7.
13 (6H, m), 7.29 (1H, s), 7.37-7.43 (9H, m)
【0096】実施例2 塩化メチレン(1000ml)に2(S)−〔N−メチル
−N−〔2−{N−(モルホリノカルボニル)−N−メ
チルアミノ}エチル〕アミノカルボニルオキシ〕−3−
フェニルプロピオン酸のシクロヘキシルアミン塩(10
0g)を添加し、内温10℃まで冷却後5%塩酸(50
0ml)を加え、内温10〜15℃で10分間攪拌してフ
リー化する。静置後、塩化メチレン層を分取し、20%
食塩水(500ml)で洗浄する。得られた塩化メチレン
層は硫酸マグネシウムで乾燥後、濾去しフリー体の塩化
メチレン溶液を得る。この溶液にN−ヒドロキシスクシ
ンイミド(25.7g)を添加し内温0℃まで冷却し、
N,N’−ジシクロヘキシルカルボジイミド(46.1
g)の塩化メチレン(200ml)溶液を内温5℃以下で
加える。内温0〜5℃で2時間反応する。反応終了後、
析出しているN,N’−ジシクロヘキシルウレアを濾去
し、塩化メチレン(200ml)で洗浄する。濾液と洗液
を合わせ、5%クエン酸水溶液(500ml)、水(50
0ml)で各々洗浄する。塩化メチレン層を分取し、硫酸
マグネシウム乾燥後、減圧下残渣量(100ml)まで濃
縮し、活性エステル溶液を得る。一方、塩化メチレン
(1000ml)に1,1,1,3,3,3−ヘキサメチ
ルジシラザン(44.6g)、Nim−トリチル−L−ヒ
スチジン(85.4g)、トリメチルシリルクロライド
(33.1g)を添加し、加熱還流下1時間シリル化反
応を行う。反応終了後、内温30℃以下まで冷却し、先
の活性エステル溶液を加え、内温20〜30℃で1時間
縮合反応を行う。反応終了後、水(1000ml)を加
え、攪拌、静置後、塩化メチレン層を分取する。塩化メ
チレン層はさらに5%クエン酸水溶液(1000ml)、
水(1000ml)で各々洗浄する。塩化メチレン層を分
取し、濃縮乾固しNα−〔2(S)−〔N−メチル−N
−〔2−{N−(モルホリノカルボニル)−N−メチル
アミノ}エチル〕アミノカルボニルオキシ〕−3−フェ
ニルプロピオニル〕−Nim−トリチル−L−ヒスチジン
(174.6g)を得る。収率111% NMR(CDCl3 , δ) : 2.73-2.97 (8H,m), 3.01-
3.61 (14H,m), 4.46 (1H,br), 5.18 (1H,br), 6.75-6.9
0 (1H,m), 7.09-7.34 (20H,m), 7.40-7.55 (1H,m)Example 2 2 (S)-[N-methyl-N- [2- {N- (morpholinocarbonyl) -N-methylamino} ethyl] aminocarbonyloxy] -3- in methylene chloride (1000 ml)
Cyclohexylamine salt of phenylpropionic acid (10
0 g) was added, and the internal temperature was cooled to 10 ° C., and then 5% hydrochloric acid (50
0 ml), and the mixture is stirred at an internal temperature of 10 to 15 ° C for 10 minutes to make it free. After allowing to stand, collect the methylene chloride layer, 20%
Wash with brine (500 ml). The obtained methylene chloride layer is dried over magnesium sulfate and then filtered off to obtain a free methylene chloride solution. N-hydroxysuccinimide (25.7 g) was added to this solution, and the internal temperature was cooled to 0 ° C.
N, N'-dicyclohexylcarbodiimide (46.1
A solution of g) in methylene chloride (200 ml) is added at an internal temperature of 5 ° C or lower. React for 2 hours at an internal temperature of 0 to 5 ° C. After the reaction,
The precipitated N, N'-dicyclohexylurea is filtered off and washed with methylene chloride (200 ml). The filtrate and washings were combined and 5% citric acid aqueous solution (500 ml) and water (50
Wash each with 0 ml). The methylene chloride layer is separated, dried over magnesium sulfate and then concentrated under reduced pressure to a residue amount (100 ml) to obtain an active ester solution. On the other hand, 1,1,1,3,3,3-hexamethyldisilazane (44.6 g), N im -trityl-L-histidine (85.4 g) and trimethylsilyl chloride (33.1 g) in methylene chloride (1000 ml). ) Is added and the silylation reaction is carried out for 1 hour under heating under reflux. After completion of the reaction, the internal temperature is cooled to 30 ° C or lower, the active ester solution is added, and the condensation reaction is performed at the internal temperature of 20 to 30 ° C for 1 hour. After completion of the reaction, water (1000 ml) is added, the mixture is stirred and allowed to stand, and the methylene chloride layer is separated. The methylene chloride layer is a 5% aqueous citric acid solution (1000 ml),
Wash each with water (1000 ml). The methylene chloride layer was separated and concentrated to dryness, and Nα- [2 (S)-[N-methyl-N
- obtaining a trityl -L- histidine (174.6g) - [2-{N-(morpholinocarbonyl) -N- methylamino} ethyl] aminocarbonyloxy] -3-phenylpropionyl] -N im. Yield 111% NMR (CDCl 3 , δ): 2.73-2.97 (8H, m), 3.01-
3.61 (14H, m), 4.46 (1H, br), 5.18 (1H, br), 6.75-6.9
0 (1H, m), 7.09-7.34 (20H, m), 7.40-7.55 (1H, m)
【0097】実施例3 Nα−〔2(S)−〔N−メチル−N−〔2−{N−
(モルホリノカルボニル)−N−メチルアミノ}エチ
ル〕アミノカルボニルオキシ〕−3−フェニルプロピオ
ニル〕−Nim−トリチル−L−ヒスチジン(100g)
をテトラヒドロフラン(1000ml)に溶解し、水
(1.0g)を加え、内温−10℃まで冷却し、水素化
ナトリウム(60%、11.4g)を添加した後、ヨウ
化メチル(110.2g)を内温−5℃以下で滴下し、
更に内温0〜5℃で3時間反応する。反応終了後反応液
を5%クエン酸水溶液(500ml)と塩化メチレン(5
00ml)の混合液へ注加し、攪拌、静置後、有機層を分
取する。有機層は水(500ml)で洗浄した後、減圧下
濃縮乾固する。濃縮残渣に酢酸エチル(1000ml)、
5%重曹水(2000ml)加え溶解し、攪拌静置後水層
を分取する。分取した水層はクエン酸によりpH4〜
4.5に調整し、塩化メチレン(2000ml)を加え、
目的物を抽出する。塩化メチレン層を分取し、更に水
(500ml)で洗浄する。塩化メチレン層は硫酸マグネ
シウムで乾燥した後、減圧下濃縮乾固し、Nα−〔2
(S)−〔N−メチル−N−〔2−{N−(モルホリノ
カルボニル)−N−メチルアミノ}エチル〕アミノカル
ボニルオキシ〕−3−フェニルプロピオニル〕−Nα−
メチル−Nim−トリチル−L−ヒスチジン(94.7
g)を得る。収率93% NMR(CDCl3 , δ) : 2.71-2.90 (8H,m), 3.03-
3.62 (17H,m), 5.29-5.34 (2H,m), 6.60-6.80 (1H,m),
7.02-7.38 (20H,m), 7.50-7.75 (1H,m)Example 3 Nα- [2 (S)-[N-methyl-N- [2- {N-
(Morpholinocarbonyl) -N- methylamino} ethyl] aminocarbonyloxy] -3-phenylpropionyl] -N im - trityl -L- histidine (100 g)
Was dissolved in tetrahydrofuran (1000 ml), water (1.0 g) was added, the internal temperature was cooled to -10 ° C, sodium hydride (60%, 11.4 g) was added, and then methyl iodide (110.2 g) was added. ) Is added dropwise at an internal temperature of -5 ° C or lower,
Further, the reaction is performed at an internal temperature of 0 to 5 ° C for 3 hours. After completion of the reaction, the reaction solution was mixed with 5% citric acid aqueous solution (500 ml) and methylene chloride (5
(00 ml), and the mixture is stirred and allowed to stand, and the organic layer is separated. The organic layer is washed with water (500 ml) and then concentrated to dryness under reduced pressure. Ethyl acetate (1000 ml) on the concentrated residue,
5% sodium bicarbonate water (2000 ml) was added and dissolved, and the mixture was allowed to stand with stirring and the aqueous layer was separated. The pH of the collected aqueous layer is 4 to 4 due to citric acid.
Adjust to 4.5, add methylene chloride (2000 ml),
Extract the target product. The methylene chloride layer is separated and further washed with water (500 ml). The methylene chloride layer was dried over magnesium sulfate and then concentrated to dryness under reduced pressure to give Nα- [2
(S)-[N-methyl-N- [2- {N- (morpholinocarbonyl) -N-methylamino} ethyl] aminocarbonyloxy] -3-phenylpropionyl] -Nα-
Methyl -N im - trityl -L- histidine (94.7
g) is obtained. Yield 93% NMR (CDCl 3 , δ): 2.71-2.90 (8H, m), 3.03-
3.62 (17H, m), 5.29-5.34 (2H, m), 6.60-6.80 (1H, m),
7.02-7.38 (20H, m), 7.50-7.75 (1H, m)
【0098】実施例4 2(S)−アミノ−1−シクロヘキシル−3(S)−ヒ
ドロキシ−6−メチルヘプタンのL−酒石酸塩(48.
0g)を塩化メチレン(400ml)に加え、攪拌下、2
5%アンモニア水(150ml)、水(50ml)を加えフ
リー化し、静置後塩化メチレン層を分取し、水(150
ml)で洗浄する。分取した塩化メチレン層は硫酸マグネ
シウムで乾燥後、減圧下濃縮乾固する。濃縮残渣にテト
ラヒドロフラン(800ml)、Nα−〔2(S)−〔N
−メチル−N−〔2−{N−(モルホリノカルボニル)
−N−メチルアミノ}エチル〕アミノカルボニルオキ
シ〕−3−フェニルプロピオニル〕−Nα−メチル−N
im−トリチル−L−ヒスチジン(100.0g)、1−
ヒドロキシ−1H−ベンゾトリアゾール(20.6g)
を加え溶解後、−5℃〜−10℃まで冷却し、N,N’
−ジシクロヘキシルカルボジイミド(28.8g)、N
−メチルモルホリン(6.43g)を加え同温で24時
間反応する。反応終了後、析出しているN,N’−ジシ
クロヘキシルウレアを濾去し、酢酸エチル(50ml)で
洗浄する。濾液と洗液を合わせ、その溶液に酢酸エチル
(1000ml)、5%クエン酸(1000ml)を加え、
攪拌、静置後、有機層を分取する。得られた有機層は2
5%食塩水、冷5%水酸化ナトリウム水溶液、25%食
塩水(各々1000ml)で洗浄する。有機層は減圧下濃
縮乾固し、シリカゲルカラム精製(展開溶媒:塩化メチ
レンおよび3%メタノール、97%塩化メチレン混液)
を行い、2(S)−〔Nα−〔2(S)−〔N−メチル
−N−〔2−{N−(モルホリノカルボニル)−N−メ
チルアミノ}エチル〕アミノカルボニルオキシ〕−3−
フェニルプロピオニル〕−Nα−メチル−Nim−トリチ
ル−L−ヒスチジル〕アミノ−1−シクロヘキシル−3
(S)−ヒドロキシ−6−メチルヘプタン(114.1
g)を得る。精製収率91% NMR(CDCl3 , δ) : 0.83 (6H,dd,J=6.0Hz,6.0H
z), 1.15-1.63 (18H,m), 2.74-3.62 (21H,m), 4.05-4.1
5 (1H,m), 5.02-5.11 (1H,m), 6.60-6.80 (1H,m), 7.03
(5H,m), 7.26 (16H,m)Example 4 2 (S) -Amino-1-cyclohexyl-3 (S) -hydroxy-6-methylheptane L-tartrate (48.
0 g) to methylene chloride (400 ml), and with stirring, 2
5% ammonia water (150 ml) and water (50 ml) were added to make it free, and after standing, the methylene chloride layer was separated and water (150 ml) was collected.
ml). The separated methylene chloride layer is dried over magnesium sulfate and then concentrated to dryness under reduced pressure. Tetrahydrofuran (800 ml), Nα- [2 (S)-[N
-Methyl-N- [2- {N- (morpholinocarbonyl)
-N-methylamino} ethyl] aminocarbonyloxy] -3-phenylpropionyl] -Nα-methyl-N
im -trityl-L-histidine (100.0 g), 1-
Hydroxy-1H-benzotriazole (20.6 g)
Was added and dissolved, then cooled to −5 ° C. to −10 ° C., N, N ′
-Dicyclohexylcarbodiimide (28.8g), N
-Methylmorpholine (6.43 g) is added, and the mixture is reacted at the same temperature for 24 hours. After completion of the reaction, the precipitated N, N'-dicyclohexylurea is filtered off and washed with ethyl acetate (50 ml). The filtrate and washings are combined, ethyl acetate (1000 ml) and 5% citric acid (1000 ml) are added to the solution,
After stirring and standing, the organic layer is separated. The organic layer obtained is 2
Wash with 5% saline, cold 5% aqueous sodium hydroxide, 25% saline (1000 ml each). The organic layer was concentrated to dryness under reduced pressure and purified by silica gel column (developing solvent: methylene chloride and 3% methanol, 97% methylene chloride mixed solution).
2 (S)-[Nα- [2 (S)-[N-methyl-N- [2- {N- (morpholinocarbonyl) -N-methylamino} ethyl] aminocarbonyloxy] -3-
Phenylpropionyl] -Nα-methyl-N im -trityl-L-histidyl] amino-1-cyclohexyl-3
(S) -Hydroxy-6-methylheptane (114.1
g) is obtained. Purification yield 91% NMR (CDCl 3 , δ): 0.83 (6H, dd, J = 6.0Hz, 6.0H
z), 1.15-1.63 (18H, m), 2.74-3.62 (21H, m), 4.05-4.1
5 (1H, m), 5.02-5.11 (1H, m), 6.60-6.80 (1H, m), 7.03
(5H, m), 7.26 (16H, m)
【0099】実施例5 2(S)−〔Nα−〔2(S)−〔N−メチル−N−
〔2−{N−(モルホリノカルボニル)−N−メチルア
ミノ}エチル〕アミノカルボニルオキシ〕−3−フェニ
ルプロピオニル〕−Nα−メチル−Nim−トリチル−L
−ヒスチジル〕アミノ−1−シクロヘキシル−3(S)
−ヒドロキシ−6−メチルヘプタン(100g)を50
%含水酢酸(1000ml)に溶解し、内温50〜55℃
で2時間脱トリチル反応を行う。反応終了後、内温20
〜30℃まで冷却し、酢酸エチル(1000ml)を加
え、25%アンモニア水でpH7.8〜8.0に調整
し、攪拌、静置後、有機層を分取する。有機層に10%
クエン酸水溶液(1000ml)を加え、攪拌静置後、ク
エン酸層を分取し、さらに10%クエン酸水溶液(50
0ml)で再抽出する。クエン酸層を合わせ、酢酸エチル
(500ml)で洗浄する。分取したクエン酸層に酢酸エ
チル(500ml)を加え、25%アンモニア水でpH
7.8〜8.0に調整し、攪拌、静置後有機層を分取す
る。分取した有機層は20%食塩水(500ml)で洗浄
後、硫酸マグネシウムで乾燥し、減圧下濃縮乾固し、2
(S)−〔Nα−〔2(S)−〔N−メチル−N−〔2
−{N−(モルホリノカルボニル)−N−メチルアミ
ノ}エチル〕アミノカルボニルオキシ〕−3−フェニル
プロピオニル〕−Nα−メチル−L−ヒスチジル〕アミ
ノ−1−シクロヘキシル−3(S)−ヒドロキシ−6−
メチルヘプタン(70.1g)を得る。収率93%Example 5 2 (S)-[Nα- [2 (S)-[N-methyl-N-
[2- {N- (morpholinocarbonyl) -N-methylamino} ethyl] aminocarbonyloxy] -3-phenylpropionyl] -Nα-methyl-N im -trityl-L
-Histidyl] amino-1-cyclohexyl-3 (S)
50-hydroxy-6-methylheptane (100 g)
% Dissolved in water containing acetic acid (1000ml), internal temperature 50-55 ℃
The detrityl reaction is carried out for 2 hours. After the reaction is completed, the internal temperature is 20
The mixture is cooled to -30 ° C, ethyl acetate (1000 ml) is added, the pH is adjusted to 7.8-8.0 with 25% aqueous ammonia, the mixture is stirred and left standing, and the organic layer is separated. 10% for organic layer
Aqueous citric acid solution (1000 ml) was added, and the mixture was allowed to stand with stirring.
Re-extract with 0 ml). The citric acid layers are combined and washed with ethyl acetate (500 ml). Ethyl acetate (500 ml) was added to the separated citric acid layer, and the pH was adjusted to 25% with aqueous ammonia.
Adjust to 7.8-8.0, stir and leave still, and then separate the organic layer. The separated organic layer was washed with 20% saline (500 ml), dried over magnesium sulfate, and concentrated to dryness under reduced pressure.
(S)-[Nα- [2 (S)-[N-methyl-N- [2
-{N- (morpholinocarbonyl) -N-methylamino} ethyl] aminocarbonyloxy] -3-phenylpropionyl] -Nα-methyl-L-histidyl] amino-1-cyclohexyl-3 (S) -hydroxy-6-
Methylheptane (70.1 g) is obtained. Yield 93%
【0100】実施例6 2(S)−〔Nα−〔2(S)−〔N−メチル−N−
〔2−{N−(モルホリノカルボニル)−N−メチルア
ミノ}エチル〕アミノカルボニルオキシ〕−3−フェニ
ルプロピオニル〕−Nα−メチル−L−ヒスチジル〕ア
ミノ−1−シクロヘキシル−3(S)−ヒドロキシ−6
−メチルヘプタン(100g)を酢酸エチル(1000
ml)に溶解し、0.6μフィルターで清澄濾過する。酢
酸エチル(200ml)で洗浄後、濾液と洗液を合わせ、
内温20〜30℃で4N−塩酸/酢酸エチル溶液(3
3.2ml)を加え20分間攪拌する。減圧下、濃縮乾固
し、残渣に酢酸エチル(800ml)、アセトン(160
ml)を加え溶解する。溶解後、内温55〜60℃でn−
ヘキサン(800ml)を30分間を要し滴下する。滴下
後、種晶(0.05g)を加え同温で13.5時間以上
攪拌し、結晶を十分に析出させる。内温20〜30℃ま
で冷却し、同温で1時間攪拌した後、析出晶を濾取す
る。結晶は酢酸エチル−n−ヘキサン(100ml〜20
0ml)の混液で洗浄し、一夜真空乾燥し、2(S)−
〔Nα−〔2(S)−〔N−メチル−N−〔2−{N−
(モルホリノカルボニル)−N−メチルアミノ}エチ
ル〕アミノカルボニルオキシ〕−3−フェニルプロピオ
ニル〕−Nα−メチル−L−ヒスチジル〕アミノ−1−
シクロヘキシル−3(S)−ヒドロキシ−6−メチルヘ
プタン一塩酸塩(82.2g)を得る。収率78%(N
im−トリチル−L−ヒスチジンからの総収率68%) NMR(D2 O,δ): 0.83 (6H,d,J=6.0Hz), 1.04-
1.82 (18H,m), 2.64-3.88 (24H,m), 3.90-4.05 (1H,m),
5.12-5.20 (1H,m), 7.2-7.4 (6H,m), 8.61 (1H,s)Example 6 2 (S)-[Nα- [2 (S)-[N-methyl-N-
[2- {N- (morpholinocarbonyl) -N-methylamino} ethyl] aminocarbonyloxy] -3-phenylpropionyl] -Nα-methyl-L-histidyl] amino-1-cyclohexyl-3 (S) -hydroxy- 6
-Methylheptane (100 g) was added to ethyl acetate (1000
ml) and clarify filtration with a 0.6μ filter. After washing with ethyl acetate (200 ml), combine the filtrate and washings,
4N-hydrochloric acid / ethyl acetate solution (3
3.2 ml) is added and stirred for 20 minutes. It was concentrated to dryness under reduced pressure, and ethyl acetate (800 ml) and acetone (160 ml) were added to the residue.
ml) and dissolve. After melting, n- at an internal temperature of 55 to 60 ° C
Hexane (800 ml) is added dropwise over 30 minutes. After the dropping, seed crystals (0.05 g) are added and the mixture is stirred at the same temperature for 13.5 hours or more to sufficiently precipitate crystals. After cooling to an internal temperature of 20 to 30 ° C. and stirring at the same temperature for 1 hour, the precipitated crystals are collected by filtration. The crystals are ethyl acetate-n-hexane (100 ml to 20 ml).
(0 ml), and dried under vacuum overnight, then 2 (S)-
[Nα- [2 (S)-[N-methyl-N- [2- {N-
(Morpholinocarbonyl) -N-methylamino} ethyl] aminocarbonyloxy] -3-phenylpropionyl] -Nα-methyl-L-histidyl] amino-1-
Cyclohexyl-3 (S) -hydroxy-6-methylheptane monohydrochloride (82.2 g) is obtained. Yield 78% (N
Total yield from im -trityl-L-histidine 68%) NMR (D 2 O, δ): 0.83 (6H, d, J = 6.0Hz), 1.04-
1.82 (18H, m), 2.64-3.88 (24H, m), 3.90-4.05 (1H, m),
5.12-5.20 (1H, m), 7.2-7.4 (6H, m), 8.61 (1H, s)
【0101】[0101]
【発明の効果】本発明の製造法によれば、出発原料Nim
−トリチル−L−ヒスチジンからの総収率は68%であ
り、従来法に較べて収率の向上が図られた。安価なL−
ヒスチジンを出発原料として高収率で最終生成物(I)
が得られるため、製造コストの大幅な軽減が図られ、産
業上極めて有用な製造法である。化合物(II)は新規化
合物であり、本発明の製造法の合成中間体として有用で
ある。According to the manufacturing method of the present invention, the starting material N im
The total yield from -trityl-L-histidine was 68%, which was an improvement in yield as compared with the conventional method. Inexpensive L-
Final product (I) in high yield starting from histidine
Therefore, the manufacturing cost can be significantly reduced, and the manufacturing method is extremely useful in industry. The compound (II) is a novel compound and is useful as a synthetic intermediate in the production method of the present invention.
Claims (4)
シ基、アリール基、低級アルキルチオ基および式 【化2】 (式中、R6 は水素またはアシル基、R7 は水素または
低級アルキル基をそれぞれ意味する)で示される基より
なる群から選択された置換基で置換されていてもよい低
級アルキル基;アリール基;または低級アルキル基およ
びアシル基よりなる群から選択された置換基で置換され
ていてもよいアミノ基;R2 は水素または低級アルキル
基を意味するか、またはR1 およびR2 は隣接する窒素
原子と一緒になって、低級アルキル基、ヒドロキシ(低
級)アルキル基、低級アルコキシ(低級)アルキル基、
アシル(低級)アルキル基、オキソ基およびアシル基よ
りなる群から選択された置換基で置換されていてもよい
複素環基を形成する、R3 は水素または低級アルキル
基、R4 は水素またはN−保護基、R5 は水素またはカ
ルボキシ保護基を意味する〕で示される化合物またはそ
の塩。1. The formula: [Wherein R 1 is an acyl group, a hydroxy group, a lower alkoxy group, an aryl group, a lower alkylthio group or a compound represented by the formula: (Wherein R 6 represents hydrogen or an acyl group, R 7 represents hydrogen or a lower alkyl group, respectively), and a lower alkyl group optionally substituted by a substituent selected from the group consisting of: aryl A group; or an amino group which may be substituted with a substituent selected from the group consisting of a lower alkyl group and an acyl group; R 2 represents hydrogen or a lower alkyl group, or R 1 and R 2 are adjacent to each other. Together with the nitrogen atom, a lower alkyl group, a hydroxy (lower) alkyl group, a lower alkoxy (lower) alkyl group,
R 3 is hydrogen or a lower alkyl group, R 4 is hydrogen or N, which forms a heterocyclic group which may be substituted with a substituent selected from the group consisting of an acyl (lower) alkyl group, an oxo group and an acyl group. A protecting group, R 5 represents hydrogen or a carboxy protecting group] or a salt thereof.
8 およびR9 は隣接する窒素原子と一緒になって、低級
アルキル基で置換されてもよい複素環基を形成する〕で
示される基で置換された低級アルキル基、R2 が低級ア
ルキル基、R5 が水素または低級アルキル基である請求
項1に記載の化合物。2. R 1 is of the formula: [In the formula, R 7 represents hydrogen or a lower alkyl group, and R 7
8 and R 9 together with the adjacent nitrogen atom form a heterocyclic group which may be substituted with a lower alkyl group], a lower alkyl group substituted with a group represented by the following formula, R 2 is a lower alkyl group, The compound according to claim 1, wherein R 5 is hydrogen or a lower alkyl group.
〔2−{N−(モルホリノカルボニル)−N−メチルア
ミノ}エチル〕アミノカルボニルオキシ〕−3−フェニ
ルプロピオニル〕−Nim−トリチル−L−ヒスチジンお
よびNα−〔2(S)−〔N−メチル−N−〔2−{N
−(モルホリノカルボニル)−N−メチルアミノ}エチ
ル〕アミノカルボニルオキシ)−3−フェニルプロピオ
ニル〕−Nα−メチル−Nim−トリチル−L−ヒスチジ
ンから選ばれる請求項2に記載の化合物。3. Nα- [2 (S)-[N-methyl-N-
[2-{N- (morpholinocarbonyl) -N- methylamino} ethyl] aminocarbonyloxy] -3-phenylpropionyl] -N im - trityl -L- histidine and Nα- [2 (S) - [N- methyl -N- [2- {N
- (morpholinocarbonyl) -N- methylamino} ethyl] aminocarbonyl) -3-phenylpropionyl] -Nα- methyl -N im - compound of claim 2 selected from trityl -L- histidine.
シ基、アリール基、低級アルキルチオ基および式 【化5】 (式中、R6 は水素またはアシル基、R7 は水素または
低級アルキル基をそれぞれ意味する)で示される基より
なる群から選択された置換基で置換されていてもよい低
級アルキル基;アリール基;または低級アルキル基およ
びアシル基よりなる群から選択された置換基で置換され
ていてもよいアミノ基;R2 は水素または低級アルキル
基を意味するか、またはR1 およびR2 は隣接する窒素
原子と一緒になって、低級アルキル基、ヒドロキシ(低
級)アルキル基、低級アルコキシ(低級)アルキル基、
アシル(低級)アルキル基、オキソ基およびアシル基よ
りなる群から選択された置換基で置換されていてもよい
複素環基を形成する、R3 は水素または低級アルキル
基、R10は低級アルキル基を意味する〕で示される化合
物またはその塩の製造法であって、 (a)式 【化6】 〔式中、R4 は水素またはN−保護基、R1 、R2 、R
3 はそれぞれ前記定義の通りである〕で示される化合物
もしくはカルボキシ基におけるその反応性誘導体または
それらの塩を、式 【化7】 〔式中、R10は前記定義の通りである〕で示される化合
物もしくはそのアミノ基における反応性誘導体またはそ
れらの塩と反応させ、必要に応じてN−保護基を脱離し
て、式 【化8】 〔式中、R1 、R2 、R3 、R10はそれぞれ前記定義の
通りである〕で示される化合物またはその塩を得るか、 (b)式 【化9】 〔式中、R1 、R2 はそれぞれ前記定義の通りである〕
で示される化合物もしくはカルボキシ基におけるその反
応性誘導体またはそれらの塩を、式 【化10】 〔式中、R5 は水素またはカルボキシ保護基、R3 、R
4 はそれぞれ前記定義の通りである〕で示される化合物
またはその塩と反応させ、式 【化11】 〔式中、R1 、R2 、R3 、R4 、R5 はそれぞれ前記
定義の通りである〕で示される化合物またはその塩を
得、次いでこれを式 【化12】 〔式中、R10は前記定義の通りである〕で示される化合
物またはその塩と反応させ、必要に応じてN−保護基を
脱離して、式 【化13】 〔式中、R1 、R2 、R3 、R10はそれぞれ前記定義の
通りである〕で示される化合物またはその塩を得るか、 (c)式 【化14】 〔式中、R1 、R2 はそれぞれ前記定義の通りである〕
で示される化合物もしくはカルボキシ基におけるその反
応性誘導体またはそれらの塩を、式 【化15】 〔式中、R4 、R5 はそれぞれ前記定義の通りである〕
で示される化合物またはその塩と反応させ、式 【化16】 〔式中、R1 、R2 、R4 、R5 はそれぞれ前記定義の
通りである〕で示される化合物またはその塩を得、次い
でこれを塩基の存在下に式 【化17】 〔式中、Xはハロゲン、R3 a は低級アルキル基を示
す〕で示される化合物と反応させ、式 【化18】 〔式中、R1 、R2 、R3 a 、R4 、R5 はそれぞれ前
記定義の通りである〕で示される化合物またはその塩を
得、更にこれを式 【化19】 〔式中、R10は前記定義の通りである〕で示される化合
物またはその塩と反応させ、必要に応じてN−保護基を
脱離して、式 【化20】 〔式中、R1 、R2 、R3 a 、R10はそれぞれ前記定義
の通りである〕で示される化合物またはその塩を得る製
造法。4. The formula: [Wherein R 1 is an acyl group, a hydroxy group, a lower alkoxy group, an aryl group, a lower alkylthio group or a compound represented by the formula: (Wherein R 6 represents hydrogen or an acyl group, R 7 represents hydrogen or a lower alkyl group, respectively), and a lower alkyl group optionally substituted by a substituent selected from the group consisting of: aryl A group; or an amino group which may be substituted with a substituent selected from the group consisting of a lower alkyl group and an acyl group; R 2 represents hydrogen or a lower alkyl group, or R 1 and R 2 are adjacent to each other. Together with the nitrogen atom, a lower alkyl group, a hydroxy (lower) alkyl group, a lower alkoxy (lower) alkyl group,
R 3 is hydrogen or a lower alkyl group, and R 10 is a lower alkyl group, which forms a heterocyclic group which may be substituted with a substituent selected from the group consisting of an acyl (lower) alkyl group, an oxo group and an acyl group. A method for producing a compound represented by the formula: or a salt thereof, comprising: [In the formula, R 4 is hydrogen or an N-protecting group, R 1 , R 2 , R
3 is each as defined above] or a reactive derivative thereof at the carboxy group or a salt thereof is represented by the formula: [Wherein R 10 is as defined above] or a reactive derivative of the amino group thereof or a salt thereof is reacted, and if necessary, the N-protecting group is eliminated to give a compound of the formula: 8] [Wherein R 1 , R 2 , R 3 and R 10 are as defined above] or a salt thereof, or (b) a compound represented by the formula: [In the formula, R 1 and R 2 are as defined above]
Or a reactive derivative thereof at the carboxy group or a salt thereof is represented by the formula: [Wherein R 5 is hydrogen or a carboxy protecting group, R 3 and R
Each of 4 is as defined above] and is reacted with a compound represented by the formula: [Wherein R 1 , R 2 , R 3 , R 4 and R 5 are as defined above] or a salt thereof, which is then of the formula [Wherein R 10 is as defined above] or a salt thereof is reacted with the compound to remove the N-protecting group, if necessary. A compound represented by the formula: wherein R 1 , R 2 , R 3 , and R 10 are as defined above, or a salt thereof, or (c) [In the formula, R 1 and R 2 are as defined above]
A compound represented by or a reactive derivative thereof at the carboxy group or a salt thereof is represented by the formula: [In the formula, R 4 and R 5 are as defined above]
A compound represented by the formula: [Wherein each of R 1 , R 2 , R 4 and R 5 is as defined above] or a salt thereof is obtained, which is then prepared in the presence of a base. [Wherein X represents halogen and R 3 a represents a lower alkyl group], and the compound represented by the formula: [Wherein R 1 , R 2 , R 3 a, R 4 and R 5 are as defined above] or a salt thereof, which is further represented by the formula: [Wherein R 10 is as defined above] or a salt thereof is reacted, and the N-protecting group is removed, if necessary, to give a compound of the formula: [Wherein R 1 , R 2 , R 3 a, and R 10 are as defined above] or a process for obtaining a salt thereof.
Priority Applications (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4175806A JPH0616645A (en) | 1992-07-02 | 1992-07-02 | New synthetic intermediate and production of amino acid derivative |
US08/360,683 US5523410A (en) | 1992-07-02 | 1993-06-28 | Intermediate for synthesis and production of amino acid derivative |
CA002139362A CA2139362A1 (en) | 1992-07-02 | 1993-06-28 | Novel intermediate for synthesis and production of amino acid derivative |
KR1019940704717A KR950702188A (en) | 1992-07-02 | 1993-06-28 | New intermediates in the production and synthesis of amino acid derivatives |
PCT/JP1993/000885 WO1994001409A1 (en) | 1992-07-02 | 1993-06-28 | Novel intermediate for synthesis and production of amino acid derivative |
EP93913599A EP0648747A4 (en) | 1992-07-02 | 1993-06-28 | Novel intermediate for synthesis and production of amino acid derivative. |
RU94046317/04A RU94046317A (en) | 1992-07-02 | 1993-06-28 | New synthetic intermediate compound for preparing amino acid derivatives and processes for preparing amino acid derivatives |
HU9403793A HUT70049A (en) | 1992-07-02 | 1993-06-28 | Process for producing imidazole derivatives |
MX9303933A MX9303933A (en) | 1992-07-02 | 1993-06-30 | NOVEL SYNTHETIC INTERMEDIATE COMPOUNDS AND PROCEDURE FOR THE PREPARATION OF AMINO ACID DERIVATIVES. |
CN93109875A CN1089604A (en) | 1992-07-02 | 1993-07-02 | The synthetic intermediate and the method for the novelty of preparation amino acid derivative |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4175806A JPH0616645A (en) | 1992-07-02 | 1992-07-02 | New synthetic intermediate and production of amino acid derivative |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0616645A true JPH0616645A (en) | 1994-01-25 |
Family
ID=16002566
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4175806A Pending JPH0616645A (en) | 1992-07-02 | 1992-07-02 | New synthetic intermediate and production of amino acid derivative |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0616645A (en) |
-
1992
- 1992-07-02 JP JP4175806A patent/JPH0616645A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4921855A (en) | New Histidyl amino acid derivatives, and pharmaceutical composition comprising the same | |
DE68927620T2 (en) | Benzodiazepine derivatives | |
JPH04352757A (en) | Amino acid derivative | |
DE69507293T2 (en) | BENZAMIDE DERIVATIVES AS VASOPRESSINE ANTAGONISTS | |
JP2001500864A (en) | Thrombin inhibitors | |
US5523410A (en) | Intermediate for synthesis and production of amino acid derivative | |
JP2002542228A (en) | MMP inhibitor | |
EP0324431A1 (en) | New indolylpiperidine compounds, processes for the preparation thereof and pharmaceutical composition comprising the same | |
JPH0853403A (en) | New compound and its production | |
JPH0616645A (en) | New synthetic intermediate and production of amino acid derivative | |
RU2057124C1 (en) | Amino acid derivatives, their pharmaceutically acceptable salt and a method of their synthesis | |
JPH06172318A (en) | Novel synthetic intermediate and production of amino acid derivative | |
US5223489A (en) | Amino acid derivatives, processes for the preparation thereof and pharmaceutical composition comprising the same | |
RU2070195C1 (en) | Amino acid derivatives or their pharmaceutically acceptable salts and pharmaceutical composition based on thereof | |
JPH09118662A (en) | Urea derivative | |
WO1995000502A1 (en) | Novel intermediate for synthetic use and process for producing aminopiperazine derivative | |
EP0396065A1 (en) | Novel amino acid derivatives possessing renin-inhibitory activities | |
JPH08337579A (en) | Guanidinothiazole and its use as antiulcerous agent, h2-receptor antagonistic agent and antimicrobial agent | |
IE55234B1 (en) | Process for the preparation of azetidine sulfonic acids | |
WO1999012912A1 (en) | Thiourea derivatives or non-toxic salts thereof for inhibitng ras-transformed cell growth | |
KR790001398B1 (en) | Process for preparing 1,2,3,4-tetra hydro isoquinoline derivatives | |
JPH02243674A (en) | Amino acid derivative, production thereof and pharmaceutical composition containing the same | |
JPS59181270A (en) | Thiazole derivative and its salt | |
JP2003206299A (en) | New method for producing peptide compound | |
JP2000001486A (en) | Guanidine derivative |