JPH0616458U - Vacuum film forming equipment - Google Patents

Abstract

(57) [Abstract] [Purpose] With a simple structure, the number of openings and the number of structures in the vacuum chamber are reduced to secure an optimum vacuum state and improve the degree of freedom of layout on the floor of the vacuum chamber. [Structure] Two upper and lower shutters 3 and 4 are provided to cover the upper part of the evaporation source 2 to prevent the supply of evaporated substances to the substrate.
An inner shaft 8 supporting the upper shutter 3 is inserted into an outer shaft 7 supporting the lower shutter 4 so that each shaft 7, 8 has a double pipe structure, and the inner shaft 8 and the outer shaft 7 are separated from each other. Relative rotation is possible. As a result, the two shutters 3 and 4 can be provided for one opening 1c of the vacuum chamber 1.

Description

[Detailed description of the device]

[0001]

[Industrial applications]

 The present invention relates to a vacuum film forming apparatus, and more particularly, to improvement of a peripheral structure of a shutter arranged above an evaporation source.

[0002]

[Prior art]

 Conventionally, for example, a vapor deposition apparatus as a vacuum film forming apparatus is known as disclosed in Japanese Utility Model Laid-Open No. 62-55556. As shown in FIG. 3, this type of vapor deposition apparatus melts and evaporates a vaporized substance from an evaporation source b provided on a floor surface a of a vacuum chamber (hereinafter referred to as a vacuum chamber), so that the evaporation source b A film is deposited on the surface of the substrate as an object to be film-formed (not shown) arranged above the substrate. A rotary actuator c is arranged below the vacuum chamber, and a shaft e connected to the rotary actuator c via a coupling d is provided with a disc-shaped shutter g via a shutter arm f. Installed. That is, when the shutter g reaches the position covering the upper part of the evaporation source b with the rotation of the shaft e accompanying the drive of the rotary actuator c, the shutter g allows the vaporized substances to reach the substrate. You can prevent it. That is, at the beginning of melting the evaporation material in the evaporation source b or at the end of the vapor deposition operation, the shutter g covers the upper part of the evaporation source b to prevent the adhesion of impurities to the substrate, and The film thickness can be set to the optimum value.

Further, when the shutter g is in a state of covering the upper side of the evaporation source b as described above, the evaporation substance is attached to the lower surface thereof. Then, in order to prevent a large amount of this evaporated substance from adhering to one shutter g, the above-mentioned mechanism is provided at two locations in the vicinity of one evaporation source b. Two shutters g and g'are arranged for the evaporation source b (see phantom line), and these two shutters g and g'are used alternately.

[0004]

[Problems to be solved by the device]

 However, in the structure in which the two shutters g and g ′ are arranged for one evaporation source b, if a plurality of evaporation sources b are arranged in the vacuum chamber, the shutters g and g The number of ′ arranged also increases accordingly. Therefore, in such a structure, it is necessary to form the openings for inserting the shaft e in the floor surface a of the vacuum chamber by the number of the shutters g and g '. If the number increases, the number of vacuum seals may increase and the degree of vacuum in the vacuum chamber may decrease, and many structures will be arranged in the vacuum chamber. As a result, the optimum vacuum state may not be obtained in the vacuum chamber, and good film formation may not be performed. Further, on the floor surface a of the vacuum chamber, auxiliary equipment such as an electric system is arranged in addition to the opening, and in the structure in which a plurality of evaporation sources b are arranged as described above, the evaporation sources b There is also a problem that the layout space of b is restricted and the layout flexibility cannot be secured sufficiently.

The present invention has been made in view of these points, and secures an optimum vacuum state by reducing the number of the openings and the structure in the vacuum chamber with a simple structure and the vacuum chamber. The objective is to obtain a structure that can improve the layout flexibility on the floor.

[0006]

[Means for Solving the Problems]

 To achieve the above object, the present invention adopts a coaxial multi-tube structure for a plurality of shafts to which shutters are attached, so that a mechanism for supporting a plurality of shutters can be inserted into one opening. I chose Specifically, the invention according to claim 1 supplies a film-forming substance toward a film-forming target from a supply source arranged in a vacuum chamber, and forms a film by the film-forming substance on the surface of the film-forming target. It is premised on a vacuum film forming apparatus for performing. Then, a position for covering the supply source so as to prevent the supply of the film-forming substance from the supply source to the film-forming material and the supply of the film-forming material from the supply source to the film-forming material. As described above, a shutter that is movable between a position that covers the supply source and a position that does not cover the supply source is provided, and a plurality of shutters are provided for one supply source. Then, a plurality of shafts that movably support the respective shutters are arranged coaxially to form a multi-tube structure.

According to a second aspect of the invention, in the vacuum film forming apparatus according to the first aspect, the shutter is composed of two shutters arranged above and below the supply source, and the shutter is located on the upper side. A hollow cylindrical outer shaft in which one shutter is supported by the upper end of a solid cylindrical inner shaft, while the lower second shutter is set at a position lower than the upper end of the inner shaft. Support at the upper end of. The inner shaft is inserted through the outer shaft, and the inner shaft and the outer shaft are arranged so as to be rotatable relative to each other.

[0008]

[Action]

 With the above structure, the present invention provides the following effects. According to another aspect of the invention, each shutter covers the supply source so as to prevent the supply of the film-forming substance from the supply source to the film-forming target, and the shutter from the supply source to the film-forming target. It is moved by a shaft to and from a position overlying the source to allow the supply of membrane material. Further, since the plurality of shafts are coaxially arranged and have a multi-tube structure, it is possible to provide a plurality of shutters for one opening formed in the vacuum chamber, thus reducing the number of openings. Accordingly, the number of vacuum seal parts is reduced. According to the second aspect of the present invention, the inner shaft and the outer shaft that respectively support the first shutter and the second shutter have a double tube structure, so that two shutters are provided for one opening formed in the vacuum chamber. Can be prepared.

[0009]

【Example】

 Next, an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a vertical cross-sectional view around an evaporation source in a vapor deposition apparatus as a vacuum film forming apparatus according to this example. In FIG. 1, reference numeral 1 denotes a vacuum chamber as a vacuum chamber, and an evaporation source 2 as a supply source in the present invention is disposed on a bottom surface 1b at a position where a predetermined dimension is present from a side wall 1a thereof. There is. The evaporation source 2 is filled with an evaporation material for forming a film, and the evaporation material is heated to melt and evaporate, and is attached to a substrate (not shown) as a film formation target located above. Then, a film is formed on the surface of the substrate.

Hereinafter, the peripheral portion of the shutter, which is a characteristic configuration of this embodiment, will be described. In this example, one evaporation source 2 is provided with upper and lower two first and second shutters 3, 4. The shutters 3 and 4 are disk-shaped, and when the shutters 3 and 4 are above the vaporization source 2, the vaporized substances emitted from the vaporization source 2 are deposited on the lower surfaces of the shutters 3 and 4. By being attached, this vaporized substance does not reach the substrate. As for the structure of the support mechanism 5 of each of the shutters 3 and 4 and the peripheral portion thereof, the shutter support mechanism 5 is inserted at a position close to the evaporation source 2 on the floor surface 1b of the vacuum chamber 1. An opening 1c for forming is formed. The support base 6 is inserted through the peripheral edge of the opening 1c, and the upper surface of the flange portion 6a formed at the center of the support base 6 in the vertical direction is located at the peripheral edge of the opening 1c. It is bolted to the lower surface of the vacuum chamber 1. Further, an O-ring R is arranged between the flange portion 6a and the lower surface of the vacuum chamber 1 to ensure the sealing property inside the vacuum chamber 1. A bearing hole 6b penetrating in the vertical direction is formed in the center of the support base 6.

An outer shaft 7 is inserted into the bearing hole 6b of the support base 6 via radial bearings B and B. The outer shaft 7 has a hollow cylindrical shape, the upper end position of which is set slightly above the upper surface of the evaporation source 2, and the lower end position of which is slightly lower than the lower end of the support base 6. It is set downward. A gear 7a is arranged on the outer peripheral surface of the lower end portion of the outer shaft 7. Further, O-rings R, R are also arranged between the outer peripheral surface of the outer shaft 7 and the inner peripheral surface of the support base 6. A bearing hole 7b penetrating in the vertical direction is also formed in the central portion of the outer shaft 7, and the inner shaft 8 is inserted into the bearing hole 7b via radial bearings B and B. The inner shaft 8 has a solid cylindrical shape, the upper end position of which is set slightly above the upper end of the outer shaft 7, and the lower end of which is slightly lower than the lower end of the outer shaft 7. Is set to. Further, O-rings R, R are also arranged between the outer peripheral surface of the inner shaft 8 and the inner peripheral surface of the outer shaft 7.

The first shutter 3 is attached to an upper end portion of the inner shaft 8 and is attached to a tip end portion of a first shutter arm 3a extending in the horizontal direction, while the second shutter 4 is It is attached to the upper end of the outer shaft 7 and is attached to the tip of a second shutter arm 4a extending in the horizontal direction.

Further, the drive mechanism of the shafts 7 and 8 and the peripheral structure thereof will be described. A flange portion 6c is formed at a lower end portion of the support base 6, and a stay 9 is interposed in the flange portion 6c. The base plate 10 is supported. Then, the first and second rotary actuators 11 and 12 are attached to the base plate 10. The rotary shaft 11a of the first rotary actuator 11 is connected to the lower end portion of the inner shaft 8 via a coupling 13, and the inner shaft 8 becomes rotatable as the first actuator 11 is driven. ing . Further, the first rotary actuator 11 swings the arrangement position of the first shutter 3 between a position that covers the evaporation source 2 and a position that is separated from the evaporation source 2. It has become. On the other hand, in the second rotary actuator 12, a gear 12b is arranged on its rotary shaft 12a, and this gear 12b is meshed with a gear 7a provided on the lower end portion of the outer shaft 7. The driving force of the actuator 12 is transmitted by the gears 12b and 7a as the actuator 12 is driven, whereby the outer shaft 7 is rotatable. Even in the second rotary reactor 12, the position where the second shutter 4 is provided is swung between a position that covers the upper portion of the evaporation source 2 and a position that is separated from the upper portion of the evaporation source 2. It is supposed to let you.

In this example, a plurality of evaporation sources 2 (for example, four) are provided in the vacuum chamber 1, and the shutters 3 and 4 and the shutter support as described above are provided for each evaporation source 2. A mechanism 5 is provided.

Next, the operation of the vacuum vapor deposition apparatus configured as described above will be described. First, at the initial stage when this operation is started and the evaporation material of the evaporation source 2 is melted and evaporated, there is a possibility that impurities are contained in the evaporated material, so that these impurities do not adhere to the substrate. First, the second rotary actuator 12 is driven so that the second shutter 4 is positioned above the evaporation source 2, and the first rotary actuator 12 is moved so that the first shutter 3 is displaced from above the evaporation source 2. Drive 11 As a result, the evaporated substance containing impurities is attached to the lower surface of the second shutter 4, and the impurities do not reach the substrate.

After performing such an operation for a predetermined period of time, the second rotary actuator 12 is driven to move the second shutter 4 to a position outside the evaporation source 2 to emit light from the evaporation source 2. The evaporation material is supplied toward the substrate to form a film on the surface of the substrate.

Then, after performing such a film formation operation for a predetermined time, the first rotary reactor 12 is driven to position the first shutter 3 above the evaporation source 2 so that the evaporation source 2 is removed from the evaporation source 2. The vaporized substance emitted is stopped from being supplied to the substrate, and the film formation is stopped. In this case, the evaporation substance emitted from the evaporation source 2 is attached to the lower surface of the first shutter 3. In this way, since two shutters 3 and 4 are arranged for one evaporation source 2 and these two shutters 3 and 4 are used alternately, one evaporation substance is generated. It is possible to prevent a large amount from adhering to the shutter.

As described above, according to this example, when two shutters 3 and 4 are provided for one evaporation source 2, the shafts 7 and 8 supporting the shutters 3 and 4 are doubled. Since the two shutters 3 and 4 can be provided only by providing the opening 1c at one place as a tubular structure, the number of the openings 1c can be reduced and the number of the vacuum seal portions can be reduced. The space inside the vacuum chamber 1 can be expanded due to the reduction of the structures inside the vacuum chamber 1. As a result, an optimum vacuum state can be secured in the vacuum chamber 1 and good film formation can be performed. . In addition, since the vacuum chamber floor 1b is secured large by the reduction of the opening, it is possible to improve the layout flexibility of the installation position of the evaporation source 2, the auxiliary equipment and the like.

Further, by utilizing the configuration of the present example, as shown in FIG. 2, in the vacuum vapor deposition apparatus provided with the two evaporation sources 2, 2, the shutters 3, 2 are respectively attached to the respective evaporation sources 2, 2. 4 can also be provided. Even in such a structure, in the conventional case, openings are formed at a total of two locations in the vicinity of the evaporation sources 2 and 2, respectively, and the shutters are formed by these openings. It was necessary to provide a supporting mechanism, but since this opening only needs to be provided in one place, the vacuum seal portion can be reduced and the degree of vacuum in the vacuum chamber can be reliably ensured.

In this embodiment, the shafts 7 and 8 for supporting the first and second shutters 3 and 4 have a double tube structure. However, in the invention according to claim 1, 3 The structure may support more than one shutter, for example, the three shafts respectively supporting the three shutters may have an inner-outer triple tube structure.

[0021]

[Effect of device]

 As described above, according to the present invention, the following effects are exhibited. According to the invention of claim 1, a position for covering the supply source so as to prevent the supply of the film-forming substance from the supply source to the film-forming target, and a film formation from the supply source to the film-forming target. A shutter is provided so as to be movable between a position that covers the source so as to allow the supply of the substance, and a plurality of shutters are provided for one source, Since a plurality of shafts for movably supporting the respective shutters are coaxially arranged to have a multi-tube structure, a plurality of shutters are provided for one opening formed in the vacuum chamber. With a simple structure, it is possible to reduce the number of air-sealed portions due to the reduction in the number of openings, and to enlarge the space inside the vacuum chamber due to the reduction in the structure inside the vacuum chamber. Optimum vacuum condition can be secured in the vacuum chamber for good film formation Rukoto can. Further, by reducing the openings, a large floor surface of the vacuum chamber can be secured, and it is possible to improve the degree of freedom in the layout of the arrangement positions of the supply source and the auxiliary machinery.

According to the second aspect of the invention, the shutter is composed of two shutters arranged above and below the supply source, and the first shutter located on the upper side is a solid cylindrical inner shaft. While supporting the second shutter located on the lower side of the inner shaft, the second shutter located below is supported on the upper end of a hollow cylindrical outer shaft having an upper end set at a position lower than the upper end of the inner shaft. Since the inner shaft and the outer shaft are arranged so as to be rotatable relative to each other by inserting the outer shaft into the outer shaft, two shutters are provided for one opening formed in the vacuum chamber. As in the effect of the invention described in claim 1, an optimum vacuum state can be secured in the vacuum chamber, and the layout of the arrangement position of the supply source and the auxiliary machinery can be controlled automatically. The reason can be improved.

[Brief description of drawings]

FIG. 1 is a vertical cross-sectional side view around an evaporation source in a vapor deposition device.

FIG. 2 is a side view around an evaporation source in a modified example.

FIG. 3 is a view corresponding to FIG. 1 in a conventional vapor deposition device.

[Explanation of symbols]

 1 Vacuum Chamber (Vacuum Tank) 2 Evaporation Source (Supply Source) 3 First Shutter 4 Second Shutter 7 Outer Shaft 8 Inner Shaft

Claims (2)

[Scope of utility model registration request] 1. A vacuum film forming apparatus for supplying a film forming substance toward a film forming object from a supply source arranged in a vacuum chamber to form a film by the film forming substance on the surface of the film forming object. And a position for covering the supply source so as to prevent the supply of the film-forming substance from the supply source to the film-forming target and the supply of the film-forming substance from the supply source to the film-forming target. As described above, a shutter that is movable between a position that covers the supply source and a position that does not cover the supply source is provided, and a plurality of shutters are provided for one supply source. A vacuum film forming apparatus comprising a multi-tube structure in which a plurality of movably supported shafts are coaxially arranged. 2. The shutter is two shutters arranged above and below the supply source, and the first shutter located on the upper side is supported by an upper end portion of a solid cylindrical inner shaft. On the other hand, the second shutter located on the lower side is supported by the upper end of a hollow cylindrical outer shaft whose upper end is set at a position lower than the upper end of the inner shaft, and the inner shaft is the outer shaft. 2. The vacuum film forming apparatus according to claim 1, wherein the inner shaft and the outer shaft are disposed so as to be rotatable relative to each other.