JPH06155973A - Manufacture of optical card - Google Patents

Manufacture of optical card

Info

Publication number
JPH06155973A
JPH06155973A JP4331293A JP33129392A JPH06155973A JP H06155973 A JPH06155973 A JP H06155973A JP 4331293 A JP4331293 A JP 4331293A JP 33129392 A JP33129392 A JP 33129392A JP H06155973 A JPH06155973 A JP H06155973A
Authority
JP
Japan
Prior art keywords
layer
optical recording
recording material
optical
optical card
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4331293A
Other languages
Japanese (ja)
Other versions
JP3297940B2 (en
Inventor
Takeshi Kubota
毅 久保田
Yoshihiro Azuma
義洋 東
Shinichi Kurokawa
黒川  真一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP33129392A priority Critical patent/JP3297940B2/en
Publication of JPH06155973A publication Critical patent/JPH06155973A/en
Application granted granted Critical
Publication of JP3297940B2 publication Critical patent/JP3297940B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To provide a method for manufacture of a low cost optical card by using a high priced optical recording material usefully. CONSTITUTION:In a method for manufacture of an optical card, a duplicated light permissible base material 101 having a peeling film wherein a required transfer peeling layer is provided on its rear surface from a roughened surface original plate 15 via a mother mask 23 is formed by using the roughened surface original plate 15 wherein a pattern of an optical recording material part unit 104 is minutely arranged. Then, an optical recording material layer 102 is formed on the roughened surface. Each optical recording material part unit is arranged at a specific position of an optical card base material 106 by a thermal transfer system or a pressure-sensitive transfer system on the optical recording material layer 102 side via an adhesive layer 108. After peeling the peeling film off, further a surface-hardened layer 111 is provided onto the transfer peeling layer side via an adhesive layer 109, which is punched by an optical card unit thereafter.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は,簡便な方法で安価な光
カ−ドを提供する光カ−ドの製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an optical card which provides an inexpensive optical card by a simple method.

【0002】[0002]

【従来の技術】従来,カ−ド形態の記録メディアにおい
て,磁気カ−ド,ICカ−ドを上回る記憶容量を有する
光カ−ドが知られている。光カ−ドの記録方式には,R
OM型,追記型,消去可能型があり,それぞれについて
記録媒体,構成が検討されている。このうち,例えば追
記型の場合,無機薄膜系,有機染料系などが主流である
が,耐侯性,安定性の面から無機薄膜系がよく用いられ
る。しかし,このような材料系においても,構造上,光
記録媒体が外部に暴露されていると薬品等に侵された場
合,特性の劣化の危険性がある。このため,光記録媒体
の表面は透明保護層で被覆され,また,光カ−ドの規
格,意匠上の点から光記録材部はカ−ド内にアイランド
状に配置される。このようなカ−ドの例として実公平2-
22299 号公報があげられる。
2. Description of the Related Art Conventionally, as a card type recording medium, an optical card having a storage capacity exceeding that of a magnetic card or an IC card is known. The optical card recording method is R
There are an OM type, a write-once type, and an erasable type, and a recording medium and a structure are being examined for each. Among these, for example, in the case of the write-once type, the inorganic thin film type and the organic dye type are the mainstream, but the inorganic thin film type is often used from the viewpoint of weather resistance and stability. However, even in such a material system, if the optical recording medium is exposed to the outside due to its structure, there is a risk of deterioration of characteristics when it is attacked by chemicals or the like. For this reason, the surface of the optical recording medium is covered with a transparent protective layer, and the optical recording material portion is arranged in an island shape in the card in view of the specifications and design of the optical card. As an example of such a card,
No. 22299 is cited.

【0003】図2は,従来提案されている光カ−ドの記
録媒体形成工程の一例を示す。無機薄膜系の光記録媒体
は,真空薄膜形成装置で作成されるのが普通であり,こ
の場合,カ−ドサイズ以上の大きさの基材上に必要な寸
法の開口部を有する金属性あるいはフイルム(A)など
でマスキング処理を行って上記アイランド状に光記録媒
体を形成する。図中,点線は光カ−ドのサイズを示す
(B)。このように,光透過性の基材の一部分にしか記
録媒体を形成せず,金属マスクに付着した材料は,全く
無駄に消費されていたため(C),例えば,カ−ド寸法
縦 5.3cm,横 8.5cmに対して,開口部縦 1.6cm,横 8.4
cmの場合,20cm2 角の基板から4枚しかカ−ドが作製で
きなかった(D)。このような作成方法では,高価な光
記録材料の使用効率が悪く,光カ−ドの低コスト化が図
れなくなる。
FIG. 2 shows an example of a conventional recording medium forming process for an optical card. The inorganic thin film type optical recording medium is usually prepared by a vacuum thin film forming apparatus. In this case, a metal or film having an opening of a required size is formed on a substrate having a size larger than the card size. A masking process is performed with (A) or the like to form the optical recording medium in the island shape. In the figure, the dotted line indicates the size of the optical card (B). As described above, the recording medium is formed only on a part of the light-transmitting base material, and the material attached to the metal mask is wasted completely (C). The width is 8.5 cm, the opening length is 1.6 cm, and the width is 8.4.
In the case of cm, only 4 cards could be produced from a 20 cm 2 square substrate (D). With such a manufacturing method, the use efficiency of the expensive optical recording material is poor, and the cost of the optical card cannot be reduced.

【0004】[0004]

【発明が解決しようとする課題】高価な光記録材料を無
駄なく利用して,安価なカ−ドを提供するものである。
SUMMARY OF THE INVENTION An inexpensive card is provided by using an expensive optical recording material without waste.

【0005】[0005]

【課題を解決するための手段】本発明は,光カ−ドの製
造方法において,光記録材部単位104のパターンを細
密配置した粗面化原版15を使用し,粗面化原版15か
ら,マザーマスク23を介して,背面に必要な場合の転
写剥離層100bを設けた剥離用フイルム100aを有
する複製した光透過性の基材101を形成し,その粗面
化面に光記録材料層102を形成し,光記録材料層10
2側に接着層108を介して光記録材部単位ごとに熱転
写方式又は感圧転写方式で,光カ−ド基材106の所定
位置に配設し,剥離用フイルム100aを剥離後,さら
に,上記転写剥離層100b側に接着剤層109を介し
て表面硬化層111を設けた後,光カ−ド単位に打ち抜
くことを特徴とする光カ−ドの製造方法である。上記で
転写剥離層100bは剥離用フイルム100a其自体が
剥離性があれば,省略できる。剥離用フイルム100a
としては,PETフイルムが代表的に用いられる。ま
た,上記最終の接着工程で接着剤層109と表面硬化層
111との間に表面保護層110を設けることもでき
る。
According to the present invention, in a method for manufacturing an optical card, a roughened original plate 15 in which a pattern of an optical recording material unit 104 is finely arranged is used. Through the mother mask 23, a duplicated light-transmissive substrate 101 having a peeling film 100a provided with a transfer peeling layer 100b on the back surface when necessary is formed, and the optical recording material layer 102 is formed on the roughened surface thereof. To form the optical recording material layer 10
After the peeling film 100a is peeled off by arranging it in a predetermined position of the optical card substrate 106 by a thermal transfer system or a pressure-sensitive transfer system for each optical recording material unit through the adhesive layer 108 on the second side. A method of manufacturing an optical card is characterized in that after the surface hardened layer 111 is provided on the transfer peeling layer 100b side via an adhesive layer 109, the surface hardened layer 111 is punched out in optical card units. The transfer peeling layer 100b can be omitted if the peeling film 100a itself has peeling property. Peeling film 100a
For this, a PET film is typically used. Further, the surface protective layer 110 may be provided between the adhesive layer 109 and the surface hardened layer 111 in the final adhesion step.

【0006】[0006]

【実施例】以下,本発明の実施態様を図面を用いて説明
する。図1は,本発明の光カ−ドの製造の工程を例示す
る説明図である。まず,情報記録パターンに応じて粗面
化された低反射部分を有する粗面化原版を光記録材部単
位のパターンのサイズで細密配置して作成する。以下,
各図面を用い,部分的に従来技術と対比させながら図1
の製造工程を説明する。図の寸法は,一部を誇張して記
載する。図3は,粗面化原版15の作成工程の断面図を
示し,透明基板11(厚さ400μmのアクリル板) に回
転型コーターで,フォトレジスト層を5000Åの厚さで均
一にコーティングしてフォトレジスト層12を形成す
る。フォトレジストとしては,ポジ型レジスト(キノン
ジアジド系)である「シプレー社製マイクロポジット14
00」が使用される(図3(A))。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is an explanatory view illustrating the steps of manufacturing the optical card of the present invention. First, a roughened original plate having a low reflection portion roughened according to an information recording pattern is finely arranged in a pattern size of an optical recording material unit. Less than,
Using each drawing and comparing partially with the prior art, FIG.
The manufacturing process of will be described. Some of the dimensions in the figure are exaggerated. FIG. 3 shows a cross-sectional view of the production process of the roughened master plate 15. The transparent substrate 11 (acrylic plate having a thickness of 400 μm) is coated with a photoresist layer evenly with a thickness of 5000 Å by a rotary coater. The resist layer 12 is formed. As a photoresist, a positive type resist (quinone diazide-based) "Chipley Microposit 14
00 ”is used (FIG. 3 (A)).

【0007】次に,第2段階として,マスク合わせ装置
を用いて,情報記録パターンに応じて形成したフォトマ
スク13をフォトレジスト層12(以下残存するレジス
トの工程毎の変化を12a,12b,12cで示す)に
重ね合わせた後,最初の露光(パターンニング露光)を
行う(図3(B))。ただし,ここで使用したフォトマ
スク13は図4(B)に示すような縦方向または縦横方
向に光記録材部のパターンサイズ104pを細密配置し
た原版を使用する。
Next, in the second step, a photomask 13 formed in accordance with the information recording pattern is formed on the photoresist layer 12 by using a mask aligning device (12a, 12b, 12c are the changes in the remaining resist in each step. (FIG. 3B), and the first exposure (patterning exposure) is performed. However, as the photomask 13 used here, an original plate in which the pattern size 104p of the optical recording material portion is finely arranged in the vertical direction or the horizontal and vertical directions as shown in FIG. 4B is used.

【0008】続いて,第3段階として,片面が微細な凹
凸状に粗面化されたガラス板14(平均粗さ0.3 μm,
#3000 研磨ガラス) を用いて,再び露光L (粗面化露
光) を行う(図3(C))。
Subsequently, as a third step, a glass plate 14 having one surface roughened into fine irregularities (average roughness 0.3 μm,
Exposure L (roughening exposure) is performed again using # 3000 polished glass (FIG. 3C).

【0009】露光後,第4段階として,フォトレジスト
層12を現像すると,紫外線の当たったところのフォト
レジストは流れ去り,当たらない部分のフォトレジスト
が残り,フォトマスク13のパターンが,透明基板11
の上に転写される。これにより,表面が粗面化されたフ
ォトレジスト層12(12c)が案内トラックの形状と
して,例えば,幅 5μm程度,ピッチ15μm程度で形成
される。(図3(D)) 図4は,光記録材部のパターン104pを配置した従来
(A),及び本発明(B)の原版の平面図を示す。
After the exposure, as a fourth step, when the photoresist layer 12 is developed, the photoresist where the ultraviolet rays are exposed flows away, the photoresist where the ultraviolet rays are not exposed remains, and the pattern of the photomask 13 is changed to the transparent substrate 11.
Is transcribed on. As a result, the photoresist layer 12 (12c) having a roughened surface is formed as a guide track with a width of about 5 μm and a pitch of about 15 μm. (FIG. 3 (D)) FIG. 4 is a plan view of the original plate of the conventional (A) and the present invention (B) in which the pattern 104p of the optical recording material portion is arranged.

【0010】図5は,本発明のマザーマスクを複製する
工程の断面図を示し,表面が粗面化された低反射率部分
からなる情報記録パターンが形成されている光記録媒体
(図3(D)に示すもの)を粗面化原版15とし,この
粗面化原版15から型取りプレスによりマザーマスクを
複製する。具体的には,透明基材21(厚さ12mmのア
クリル板) の上に,電離放射線硬化樹脂あるいは熱硬化
性樹脂の成形用樹脂よりなる型取り材22を介して,上
記で作成した粗面化原版15を積層し,プレス機でプレ
スを行った状態で紫外線を照射する(図5(A))。
FIG. 5 is a cross-sectional view of a step of duplicating the mother mask of the present invention, in which an optical recording medium having an information recording pattern formed of a low reflectance portion having a roughened surface is formed (see FIG. (Shown in D)) is used as the roughened original plate 15, and the mother mask is reproduced from this roughened original plate 15 by a molding press. Specifically, on the transparent substrate 21 (12 mm-thick acrylic plate), the rough surface prepared above is inserted via the molding material 22 made of the molding resin such as the ionizing radiation curable resin or the thermosetting resin. The chemical master 15 is laminated, and ultraviolet rays are radiated in a state of being pressed by a pressing machine (FIG. 5 (A)).

【0011】その後,粗面化原版15と透明基材21と
を離型して,透明基材21側にパターンを複製してマザ
ーマスク23を形成する(図5(B))。本実施例で
は,成形用樹脂としてUV硬化性樹脂(ザ・インクテッ
ク製,SE9−XA(ポリエステルアクリレートオリゴ
マーとネオペンチルグリコールジアクリレートを主体と
し,イルガキュアー184(光重合開始剤)を添加した
もの))が使用される。
After that, the roughened original plate 15 and the transparent substrate 21 are released from each other, and the pattern is duplicated on the transparent substrate 21 side to form the mother mask 23 (FIG. 5B). In this embodiment, as a molding resin, a UV curable resin (made by The Inktech, SE9-XA (mainly composed of polyester acrylate oligomer and neopentyl glycol diacrylate, and added with Irgacure 184 (photopolymerization initiator)) )) Is used.

【0012】図6は,本発明のマザーマスクから複製原
版及び光記録材部を形成する工程の断面図を示し,上記
マザーマスク23を大量複製用の複製原版として用いて
型取りによって複製用樹脂31からなる光透過性の基材
101を複製する。具体的には剥離用フイルム100a
厚さ50μmに転写剥離層100bを形成する。この転写
剥離層100bは熱がかかった時及び圧力がかかった
時,剥離用フイルム100aより剥離する層であり,ア
クリル系樹脂,セルロース系樹脂,ビニル系樹脂,ポリ
エステル系樹脂,ウレタン系樹脂,オレフィン系樹脂,
アミド系樹脂,エポキシ系樹脂などの従来剥離層として
の既知のものが広く利用できる。この転写剥離層100
bの膜厚は,0.05〜10μm,望ましくは0.2〜
2μmであることが好ましい。
FIG. 6 is a cross-sectional view of a step of forming a reproduction master plate and an optical recording material portion from the mother mask of the present invention, wherein the mother mask 23 is used as a replication master plate for mass replication and is molded by a molding resin. The light-transmissive base material 101 made of 31 is duplicated. Specifically, the peeling film 100a
The transfer peeling layer 100b is formed to a thickness of 50 μm. The transfer peeling layer 100b is a layer that is peeled from the peeling film 100a when heat is applied or pressure is applied, and the acrylic resin, the cellulose resin, the vinyl resin, the polyester resin, the urethane resin, the olefin. Resin,
Conventionally known release layers such as amide resins and epoxy resins can be widely used. This transfer peeling layer 100
The film thickness of b is 0.05 to 10 μm, preferably 0.2 to
It is preferably 2 μm.

【0013】剥離用フイルム100a及び転写剥離層1
00bとマザーマスク23のパターン面との間に複製用
樹脂31を挟み込み,プレス機でプレスした状態で紫外
線を照射する(図6(A))。その後,光透過性の基材
101をマザーマスク23から離型してパターンを複製
する(図6(B))。このようにして,複製用樹脂31
の表面に低反射率部分が形成され,この複製用樹脂31
が光カ−ドにおける光透過性の基材101となる。本実
施例では,複製用樹脂31として,紫外線硬化樹脂(ス
リーボンド社製,SS−120,ウレタンアクリレート
系)が使用される。続いて,光透過性の基材101の全
面に光記録材料層102を積層する。(図6(C))。
The peeling film 100a and the transfer peeling layer 1
00b and the pattern surface of the mother mask 23 are sandwiched between the duplicating resins 31 and irradiated with ultraviolet rays while being pressed by a pressing machine (FIG. 6A). Then, the light-transmissive base material 101 is released from the mother mask 23 to duplicate the pattern (FIG. 6B). In this way, the replication resin 31
A low reflectance portion is formed on the surface of the
Serves as the light-transmissive base material 101 in the optical card. In this embodiment, an ultraviolet curable resin (SS-120, urethane acrylate type, manufactured by ThreeBond Co., Ltd.) is used as the replication resin 31. Subsequently, the optical recording material layer 102 is laminated on the entire surface of the light transmissive base material 101. (FIG. 6 (C)).

【0014】図7は,光記録材料を形成するカルーセル
型スパッタリング装置に光透過性の基材101を装着し
た状態の説明図である。図7(A)は,従来のものであ
り,図7(B)は,本実施例を示す。この装置を用い,
酸素の反応性スパッタによってTeOx(x=0.4 )の
膜を500Åの厚さで形成する。
FIG. 7 is an explanatory view showing a state in which a light-transmissive base material 101 is attached to a carousel type sputtering apparatus for forming an optical recording material. FIG. 7A shows a conventional one, and FIG. 7B shows this embodiment. With this device,
A film of TeOx (x = 0.4) having a thickness of 500 Å is formed by reactive sputtering of oxygen.

【0015】図8は,図6(C)の光記録材料層102
の側に接着層108を形成した断面図である。接着層1
08は,アクリル系樹脂,ビニル系樹脂,ポリエステル
樹脂,ウレタン系樹脂,アミド系樹脂,エポキシ系樹脂
などの従来既知のものが広く用いられる。膜厚は,0.
1〜50μm,望ましくは0.5〜10μmであること
が好ましく,グラビアコーティング法,スピンコーティ
ング法,ナイフコーティング法,シルクスクリーン法,
ミヤバーコーティング法等によって形成する。この層
は,熱転写方式時は,熱をかけないときは接着性を持た
ず,熱をかけたときのみ接着剤として機能する層であ
り,感圧転写方式時は,圧力をかけることにより接着及
び粘着する層である。
FIG. 8 shows the optical recording material layer 102 of FIG. 6C.
It is sectional drawing which formed the adhesive layer 108 at the side of. Adhesive layer 1
As 08, widely known resins such as acrylic resins, vinyl resins, polyester resins, urethane resins, amide resins, and epoxy resins are widely used. The film thickness is 0.
1 to 50 μm, preferably 0.5 to 10 μm is preferable. Gravure coating method, spin coating method, knife coating method, silk screen method,
It is formed by the Miyabar coating method or the like. This layer is a layer that does not have adhesiveness when heat is not applied in the thermal transfer system and functions as an adhesive only when heat is applied. In the pressure-sensitive transfer system, adhesion and adhesion can be achieved by applying pressure. It is a sticky layer.

【0016】上記一連の工程とは別に,図9に示すよう
に,支持基板となる光カ−ド基材106を作成する。こ
の光カ−ド基材106は,乳白塩化ビニールからなる20
0 μmのコアシート106b,透明塩化ビニールからな
るオーバーシート106a,106c各50μmを貼りあ
わせて形成される。この場合,光カ−ド基材106は,
3層構造となるので,熱プレス時に反りを生ずることが
ない。また,熱プレス時に,オーバーシート106aは
コアシート106bとくっ付かないが,シルクスクリー
ンインキを使用するとくっ付くので,シルクスクリーン
印刷により印刷層107を形成する。
Apart from the above series of steps, as shown in FIG. 9, an optical card base material 106 serving as a supporting substrate is prepared. The optical card substrate 106 is made of opalescent vinyl chloride.
The core sheet 106b having a thickness of 0 μm and the oversheets 106a and 106c made of transparent vinyl chloride, each having a thickness of 50 μm, are formed by bonding. In this case, the optical card substrate 106 is
Since it has a three-layer structure, it does not warp during hot pressing. Further, at the time of hot pressing, the oversheet 106a does not stick to the core sheet 106b, but it sticks to the core sheet 106b when silkscreen ink is used, so the printed layer 107 is formed by silkscreen printing.

【0017】つぎに,図10に示される熱転写工程で,
光カ−ド基材106の所定位置に,上記図8の光記録材
料層102の側に接着層108を形成したものをから,
光記録材部単位104をホットスタンプ方式で熱転写
し,剥離用フイルム(100a)を剥離する。この熱転
写に関しては,ナビタス製平プレス機等を用い,欲しい
だけの光記録材部単位104をホットスタンプの形式で
供給する。転写圧力は,4〜10kg/cm2 が望まし
く,転写温度は,80〜120℃が望ましい。転写圧
力,温度が低すぎるとうまく転写せず転写むらが生じ,
また,剥離がうまくゆかず,共に高すぎると,光記録部
がダメージを受ける。この工程は,感圧転写方式を用い
てもよい。
Next, in the thermal transfer step shown in FIG.
The adhesive layer 108 is formed at a predetermined position on the optical card substrate 106 on the optical recording material layer 102 side of FIG.
The optical recording material unit 104 is thermally transferred by the hot stamp method, and the peeling film (100a) is peeled off. For this thermal transfer, a Navitas flat press machine or the like is used to supply as many optical recording material unit units 104 as desired in the form of a hot stamp. The transfer pressure is preferably 4 to 10 kg / cm 2 , and the transfer temperature is preferably 80 to 120 ° C. If the transfer pressure and temperature are too low, the transfer will not work properly and uneven transfer will occur.
If the peeling is not successful and both are too high, the optical recording part will be damaged. This step may use a pressure sensitive transfer method.

【0018】ついで,図11(A),(B)に最終製品
の二つの態様を示す。図11(A)は,上記熱転写のあ
と,上記の光記録材部単位104の転写剥離層100b
面に接着剤層109を介して,表面保護層110と表面
硬化層111とを設けたものであり,図11(B)接着
剤層109を介して,表面硬化層111のみを設けた
後,光カ−ド単位に打ち抜いたものである。
Next, FIGS. 11A and 11B show two modes of the final product. FIG. 11A shows the transfer peeling layer 100b of the optical recording material unit 104 after the thermal transfer.
The surface protective layer 110 and the surface hardened layer 111 are provided on the surface via the adhesive layer 109. After only the surface hardened layer 111 is provided via the adhesive layer 109 in FIG. It is punched out in optical card units.

【0019】ここで,表面保護層110となる基材とし
て,厚さ 400μmのポリカーボネート(PC)を使用す
る。他に,ポリメタクリル酸メチル(PMMA),アク
リロニトリル−スチレン共重合体(AS樹脂),セルロ
ースプロピオネート(CP)セルロースアセテートブチ
レート(CAB),ポリ塩化ビニル(PVC),ポリエ
ステル等が使用できるが,好ましい実施態様として,複
屈折の少ないPC,PMMA等が使用される。 表面硬
化層111としては,アクリル系のUV硬化性ハードコ
ート剤(東レ社製,UH−001)を使用する。他に,
UV硬化性樹脂(オリゴマー,モノマー開始剤)熱硬化
性樹脂等を使用することもできる。
Here, a polycarbonate (PC) having a thickness of 400 μm is used as a base material for the surface protective layer 110. In addition, polymethylmethacrylate (PMMA), acrylonitrile-styrene copolymer (AS resin), cellulose propionate (CP) cellulose acetate butyrate (CAB), polyvinyl chloride (PVC), polyester, etc. can be used. As a preferred embodiment, PC, PMMA or the like having low birefringence is used. As the surface hardened layer 111, an acrylic UV curable hard coat agent (UH-001, manufactured by Toray Industries, Inc.) is used. other,
A UV curable resin (oligomer, monomer initiator) thermosetting resin or the like can also be used.

【0020】そして,上記の接着剤層109は,光記録
する光を透過する層となるため,厚みは薄く,また,複
屈折が小さい材料を選ぶことが望ましく,透明性も必要
とされる。接着工程として、図11(A)の場合は,光
記録材部単位104の光透過性の基材101側に予めア
クリル系のUV硬化性ハードコート剤(東レ社製、UH
−001)による表面硬化層111を形成した表面保護
層110との間に、接着剤層109(UV硬化型接着
剤)を挟み込み、ラミネーターで密着させた後、表面硬
化層111側から紫外線を照射して硬化させた。UV硬
化型接着剤としては、「共立化学産業社製863」を使
用する(図10(C))。この後、打ち抜きラインに従
って、カ−ド寸法に打ち抜き加工して光カ−ドを作成す
る。
Since the adhesive layer 109 is a layer that transmits light for optical recording, it is desirable to select a material having a small thickness and a small birefringence, and transparency is also required. In the case of FIG. 11 (A) as the bonding step, an acrylic UV curable hard coat agent (manufactured by Toray Co., UH
-001), the adhesive layer 109 (UV curable adhesive) is sandwiched between the surface protective layer 110 having the surface hardened layer 111 formed thereon and adhered by a laminator, and then the surface hardened layer 111 is irradiated with ultraviolet rays. And cured. As the UV curable adhesive, "863 manufactured by Kyoritsu Chemical Industry Co., Ltd." is used (FIG. 10 (C)). After that, according to the punching line, punching is performed to a card size to prepare an optical card.

【0021】図11(B)の場合は、光記録材部単位1
04の光透過性の基材101側に、予め、剥離PETフ
イルム上に接着剤層109として上記のUV硬化型接着
剤「共立化学産業社製863」を 450μmの厚さに形成
したものをあてがってプレスし、PETフイルム側から
紫外線を照射する。硬化後、PETフイルムを剥離す
る。その後、アクリル系のUV硬化性ハードコート剤
(東レ社製、UH−001)からなる表面硬化層111
をローラー式コーティング機にて均一に塗布し、さら
に、紫外線を照射して硬化させた後、打ち抜きラインに
よって、カ−ド寸法に打ち抜き加工して光カ−ドを作成
する。
In the case of FIG. 11B, the optical recording material unit 1
The UV-curable adhesive “Kyoritsu Chemical Industry Co., Ltd. 863” having a thickness of 450 μm was previously applied as the adhesive layer 109 on the release PET film to the light-transmissive substrate 101 side of No. 04. And press, and irradiate ultraviolet rays from the PET film side. After curing, the PET film is peeled off. Then, a surface-hardened layer 111 made of an acrylic UV-curable hard coat agent (UH-001, manufactured by Toray Industries, Inc.)
Is evenly coated with a roller type coating machine, and is further irradiated with ultraviolet rays to be cured, and then is punched into a card size by a punching line to prepare an optical card.

【0022】図12は,上記図6の光透過性の基材10
1を巻き取り状態で生産する装置の説明図である。ま
ず,転写剥離層100bを形成した剥離用フイルム10
0aが排出ロールの形態で供給される。
FIG. 12 shows the light-transmissive substrate 10 of FIG.
It is explanatory drawing of the apparatus which produces 1 in a winding state. First, the peeling film 10 on which the transfer peeling layer 100b is formed.
0a is supplied in the form of a discharge roll.

【0023】ついで,転写剥離層100bの下側で,マ
ザーマスク23を上面に有する紫外線照射装置を配置
し,転写剥離層100bとマザーマスク23との間に,
UV硬化性樹脂を注入する。(図12(A)) 次に,UV硬化性樹脂の注入孔を離脱して,剥離用フイ
ルム100aとマザーマスク23に注入したUV硬化性
の複製用樹脂31とを接触させ(図12(B)),剥離
用フイルム100aの上面より,上プレス型でプレスし
た状態で下側より紫外線を照射する(図12(C),
(D)),ついで,上プレス型及びその前後のロ−ルを
離脱させ,剥離用フイルム100a及び転写剥離層10
0bとともに光透過性の基材101が巻取ロ−ルとして
巻き取られる(図12(E))。
Next, an ultraviolet irradiation device having a mother mask 23 on its upper surface is arranged below the transfer peeling layer 100b, and between the transfer peeling layer 100b and the mother mask 23,
Inject UV curable resin. (FIG. 12 (A)) Next, the injection hole of the UV curable resin is removed, and the peeling film 100a is brought into contact with the UV curable replication resin 31 injected into the mother mask 23 (FIG. 12 (B). )), The upper surface of the peeling film 100a is irradiated with ultraviolet rays from the lower side in a state of being pressed by the upper press die (FIG. 12 (C),
(D)) Next, the upper press die and the rolls before and after it are released, and the peeling film 100a and the transfer peeling layer 10 are removed.
0b and the light-transmissive base material 101 are wound up as a winding roll (FIG. 12 (E)).

【0024】図13は,巻取複製基板への光記録媒体形
成を示し,巻き取りによる光透過性の基材101を用い
て,光記録媒体を形成する説明図である。上記の図12
(E)で巻き取り複製された光透過性の基材101を装
置のドラムの円周の長さに断裁した原反を,光記録材料
を形成するカルーセル型スパッタリング装置に取り付け
治具により取り付け,前記の反応性スパッタによる光記
録媒体の連続膜を形成することにより,更に大きな効果
が得られる。
FIG. 13 shows formation of an optical recording medium on a winding duplicate substrate, and is an explanatory view of forming an optical recording medium using a light-transmissive substrate 101 by winding. Figure 12 above
The light-transmissive base material 101 wound and duplicated in (E) is cut into the length of the circumference of the drum of the device, and the original fabric is attached to a carousel type sputtering device for forming an optical recording material by an attachment jig. By forming the continuous film of the optical recording medium by the above-mentioned reactive sputtering, a larger effect can be obtained.

【0025】[0025]

【発明の効果】本発明によれば,高価な光記録材料を無
駄なく利用して,安価な光カ−ドの製造方法が可能とな
った。
According to the present invention, an inexpensive optical card manufacturing method can be realized by utilizing an expensive optical recording material without waste.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の光カ−ドの製造工程を例示する説明図
である。
FIG. 1 is an explanatory view illustrating the manufacturing process of an optical card of the present invention.

【図2】従来提案されている光カ−ドの記録媒体形成工
程の一例を示す。
FIG. 2 shows an example of a conventional recording medium forming process of an optical card.

【図3】粗面化原版の作成工程の断面図を示す。FIG. 3 shows a cross-sectional view of a roughened original plate manufacturing process.

【図4】光記録材部のパターンを配置した従来,及び本
発明の原版の平面図を示す。
FIG. 4 is a plan view of a conventional and an original plate of the present invention in which a pattern of an optical recording material portion is arranged.

【図5】本発明のマザーマスクを複製する工程の断面図
を示す。
FIG. 5 shows a cross-sectional view of a step of replicating the mother mask of the present invention.

【図6】本発明のマザーマスクから複製原版及び光記録
材部を形成する工程の断面図を示す。
FIG. 6 is a cross-sectional view showing a process of forming a replication original plate and an optical recording material portion from the mother mask of the present invention.

【図7】光記録材料を形成するカルーセル型スパッタリ
ング装置に光透過性の基材を装着した状態を示す従来及
び本発明の説明図である。
FIG. 7 is an explanatory diagram of a conventional and the present invention showing a state in which a light-transmissive base material is attached to a carousel type sputtering apparatus for forming an optical recording material.

【図8】図6(C)の光記録材料層の側に接着層を形成
した断面図である。
FIG. 8 is a cross-sectional view in which an adhesive layer is formed on the optical recording material layer side of FIG. 6 (C).

【図9】支持基板となる光カ−ド基材の断面図である。FIG. 9 is a cross-sectional view of an optical card substrate serving as a supporting substrate.

【図10】光カ−ド基材に光記録材部単位を転写する工
程の断面図を示す。
FIG. 10 is a sectional view showing a step of transferring an optical recording material unit to an optical card substrate.

【図11】本発明の方法で完成した光カ−ドの積層状態
を説明する断面図である。
FIG. 11 is a cross-sectional view illustrating a laminated state of an optical card completed by the method of the present invention.

【図12】図6の光透過性の基材を巻き取り状態で生産
する装置の説明図である。
12 is an explanatory diagram of an apparatus for producing the light-transmitting substrate of FIG. 6 in a wound state.

【図13】巻き取りによる光透過性の基材を用いて光記
録媒体を形成する説明図である。
FIG. 13 is an explanatory diagram of forming an optical recording medium using a light-transmissive base material by winding.

【符号の説明】[Explanation of symbols]

11 透明基板 12 フォトレジスト層 13 フォトマスク 14 ガラス板 15 粗面化原版 21 透明基材 22 型取り材 23 マザーマスク 31 複製用樹脂 100a 剥離用フイルム 100b 転写剥離層 101 光透過性の基材 102 光記録材料層 104 光記録材部単位 106 光カ−ド基材 106a オーバーシート 106b コアシート 106c オーバーシート 107 印刷層 108 接着層 109 接着剤層 110 表面保護層 111 表面硬化層 11 Transparent Substrate 12 Photoresist Layer 13 Photomask 14 Glass Plate 15 Roughening Master Plate 21 Transparent Base Material 22 Molding Material 23 Mother Mask 31 Copying Resin 100a Peeling Film 100b Transfer Peeling Layer 101 Light Transmissive Base Material 102 Light Recording material layer 104 Optical recording material unit 106 Optical card substrate 106a Oversheet 106b Core sheet 106c Oversheet 107 Printing layer 108 Adhesive layer 109 Adhesive layer 110 Surface protective layer 111 Surface hardening layer

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 光カ−ドの製造方法において,光記録材
部単位(104)のパターンを細密配置した粗面化原版
(15)を使用し,粗面化原版(15)から,マザーマ
スク(23)を介して,背面に剥離用フイルム(100
a)を有する複製した光透過性の基材(101)を形成
し,その粗面化面に光記録材料層(102)を形成し,
光記録材料層(102)側に形成した接着層(108)
を介して光記録材部単位(104)ごとに熱転写方式又
は感圧転写方式で,光カ−ド基材(106)の所定位置
に配設し,剥離用フイルム(100a)を剥離後,光透
過性の基材(101)の剥離面側に接着剤層(109)
を介して表面硬化層(111)を設けた後,光カ−ド単
位に打ち抜くことを特徴とする光カ−ドの製造方法。
1. A method of manufacturing an optical card, wherein a roughened original plate (15) in which a pattern of an optical recording material unit (104) is finely arranged is used, and the roughened original plate (15) is changed to a mother mask. The peeling film (100
forming a replicated light transmissive substrate (101) having a) and forming an optical recording material layer (102) on the roughened surface thereof,
Adhesive layer (108) formed on the optical recording material layer (102) side
Each of the optical recording material units (104) is arranged at a predetermined position of the optical card substrate (106) by a thermal transfer method or a pressure-sensitive transfer method, and after peeling the peeling film (100a), Adhesive layer (109) on the release surface side of the transparent substrate (101)
A method of manufacturing an optical card, comprising: providing a surface-hardened layer (111) through a die, and then punching in optical card units.
JP33129392A 1992-11-18 1992-11-18 Method of manufacturing optical card Expired - Fee Related JP3297940B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33129392A JP3297940B2 (en) 1992-11-18 1992-11-18 Method of manufacturing optical card

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33129392A JP3297940B2 (en) 1992-11-18 1992-11-18 Method of manufacturing optical card

Publications (2)

Publication Number Publication Date
JPH06155973A true JPH06155973A (en) 1994-06-03
JP3297940B2 JP3297940B2 (en) 2002-07-02

Family

ID=18242072

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33129392A Expired - Fee Related JP3297940B2 (en) 1992-11-18 1992-11-18 Method of manufacturing optical card

Country Status (1)

Country Link
JP (1) JP3297940B2 (en)

Also Published As

Publication number Publication date
JP3297940B2 (en) 2002-07-02

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