JPH01105791A - Optical recorder and manufacture thereof - Google Patents

Abstract

PURPOSE: To obtain an optical recording member effectively used for massreproduction in industrial scale by forming a part of low reflectivity by the roughening treatment when an information recording pattern is formed on a base with a part of high reflectivity and the part of low reflectivity formed by the coarsened part having the light scattering property. CONSTITUTION: A photoresist layer 11 of 4000-20000 Å thickness is uniformly formed on a light transmittable substrate 10, and a photomask 12 formed corresponding to the information recording pattern is overlapped to the same to perform the patterning exposure. Then the coarsening exposure is performed with a glass plate 17 of which one face is coarsened with the fine irregularity. Then the photoresist layer 11 is developed, and the pattern of the photomask 12 is transferred onto the light transmittable substrate 10. Then a thin film layer of the light reflective material or optical recording material 13 is deposited, and a substrate 15 made of polyvinyl chloride or the like is adhered to the same to obtain the optical recording member having the part of high reflectivity 13b and the part of low reflectivity 13c.

Description

[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to an optical recording medium capable of optically recording information, and more specifically to a read-only memory (ROM) type in which information bits are read by laser light. The present invention relates to a direct φ read-after-write (DRAW type) or erasable and writable type optical recording medium in which information can be written using a laser beam, and a method for manufacturing the same.

[Background of the invention]

Conventionally, magnetic recording materials have been mainly used as recording materials embedded in cards such as credit cards and bank cards. This magnetic recording material has the advantage that information can be written and read easily, but on the other hand, it has the problem that it is relatively easy to store information, and it is not possible to record information at a high density.

In recent years, IC cards and optical cards have been developed from the viewpoint of recording and reproducing high-density information. Among these, an optical card using an optical recording/reproducing method has the advantage that the recorded information density is dramatically higher than that using a conventional magnetic method or an IC method.

By the way, as optical recording bodies or optical recording materials used in such optical cards, the following have been proposed so far.

For example, the example shown in FIG. 18A is an example of a so-called ROM (read only memory) type optical recording medium. An optical recording medium is formed, and the low reflectance portions 52 constitute information recording bits.

FIG. 18B is a sectional view of the optical card 50, and the transparent substrate 5
A light-reflecting material 55 corresponding to the information recording pattern is formed on 4 by photolithography, and on the other hand,
The optical card 50 is formed by bonding a base material 58 on which a black printed layer 57 is formed via an adhesive layer 56. Therefore, in this case, information is read by detecting the difference in light reflectance between the light reflective material 55 and the printed layer 57.

FIG. 19 shows an example of a ROM type optical recording medium disclosed in Japanese Patent Publication No. 58-48357. In this example, a silver halide emulsion film 60 formed on a certain base material
An information recording bit 62 having a different light reflectance from the surrounding portion 61 is formed by performing pattern exposure and development in accordance with recorded information.

On the other hand, the example shown in Fig. 20 is a so-called DRAW type (direct read after write type) light that does not require any development processing after writing information and can be read directly after writing. This is an example of a recording medium. In this case, one side of a photopolymer 71 is formed into an uneven shape, and a thin film of an optical recording material 72 such as Te is provided along this uneven surface and is bonded to a substrate 74 with an adhesive 73. At the same time,
An optical recording medium is constructed by laminating a light-transmitting acrylic resin 75 or the like on the upper surface of the photopolymer 71. As shown in FIG. 21, information is written on the optical recording medium by scanning the uneven portions of the optical recording material 72 with the irradiated laser beam 76, and checking the position by focusing on a convex portion, for example. After that, bit information is written on the convex portions of the optical recording material 72.

Further, the conventional DRAW type optical recording medium disclosed in Japanese Patent Publication No. 58-48357 will be explained with reference to FIG.
In this case, a film 80 of silver halide emulsion is formed on the base material, and patterns 81 and 82 having different light reflectances are formed by pattern exposure and development on this film 80. Check the position of part 81 and
Bit information is written on top.

However, according to the findings of the present inventors, all of the conventional optical recording media described above have relatively complicated manufacturing processes, and are not necessarily an economical method when mass-produced or reproduced. Moreover, the storage stability and durability of the obtained optical recording medium over time are still not fully satisfactory.

For example, in the optical recording medium shown in FIG. 18 above,
Since buttering of light-reflecting materials is carried out by wet etching using strong acids, etc., the process of cleaning the etching solution and drying is complicated and takes a long time, and if the cleaning is insufficient, corrosion may occur over time after completion. This progresses and shortens the life of the optical recording medium.

Furthermore, it is usually difficult to control the pH of the etching solution, and there are also problems such as troubles caused by foreign substances in the etching solution.

In addition, in the optical recording medium shown in FIG. 19, since the height and width of the convex surface are required to have a certain level of accuracy, there is a problem in that the control method becomes extremely difficult. However, there are problems in that the manufacturing process becomes complicated and costs increase.

The optical recording medium shown in FIG. 22 above is easier to manufacture than the optical recording medium shown in FIG. 20 above in that precision is required only in the width of the track; Since it requires a specific photographic material such as a silver oxide emulsion, it has the problem of increased manufacturing costs.

[Summary of the invention]

The present invention has been made in view of the problems of the prior art described above, and aims at the following points. - (a) To provide an optical recording medium that simplifies and speeds up the manufacturing process and is particularly suitable for mass duplication on an industrial scale, as well as a manufacturing method therefor.

(b) To provide an optical recording medium whose manufacturing raw materials are not limited to specific optical recording materials, which enables a relatively diverse selection of materials, and which further reduces manufacturing costs, as well as a manufacturing method therefor. (c) To provide an optical recording medium with excellent preservability, durability, and stability over time, and a manufacturing method therefor.

As a result of intensive research to achieve the above object, the present inventors found that in an optical recording medium that detects recorded information based on the difference in light reflectance, a comparison is made in which the low reflectance area is composed of a roughened area. The present invention was completed based on the discovery that unexpectedly precise and good optical recording information can be obtained by a simple means, and that it is also extremely advantageous in mass duplication on an industrial scale.

That is, the optical recording medium according to the present invention is an optical recording medium in which an information recording pattern that can be identified by a difference in light reflectance is formed on a base material, and the information recording pattern has a high reflectance portion and a low reflectance portion. The low reflectance portion is characterized by comprising a roughened portion having light scattering properties.

Further, in a specific embodiment of the optical recording medium of the present invention, a light reflective material layer or an optical recording layer is provided on the entire surface or a part of the substrate so as to cover the roughened portion formed on the substrate. Material layers may be laminated.

On the other hand, in the method for manufacturing an optical recording medium according to the present invention, in manufacturing an optical recording medium in which an information recording pattern consisting of a high reflectance portion and a low reflectance portion is formed on a base material, the low reflection It is characterized in that the ratio portion is formed by roughening treatment according to the information recording pattern.

[Detailed description of the invention]

Hereinafter, the present invention will be explained in detail with reference to specific examples shown in the drawings.

FIG. 1 is a view showing a ROM type optical card which is one embodiment of the optical recording medium of the present invention, FIG. 1A is a plan view, and FIG. 1B is a perspective view. FIG. 2 is a diagram showing a DRAW type optical card which is another embodiment of the optical recording medium of the present invention, and FIG. 3 is a diagram showing a ROM type and DRAW type optical card which are also another embodiment.
FIG. 4 is a diagram for explaining one embodiment of the method for manufacturing an optical recording medium of the present invention, FIG. 5, FIG. 6, FIG. 7, FIG. 8, and FIG. 9, FIG. 10, and FIG. 11 are diagrams for explaining other embodiments of the method for manufacturing an optical recording medium of the present invention, and FIG. 12 is a diagram for explaining the writing method of the optical recording medium of the present invention. It is a diagram.

FIG. 1 is a diagram showing an example in which the optical recording medium of the present invention is configured as a ROM type optical card.On the optical card 1, there is information recording consisting of a high reflection area 2 and a low reflection area 3. Bit 4 is formed. The optical card 1 is the 1st B
As shown in the figure, a light-reflecting material layer 7 can be formed between the transparent base material 5 and the card substrate 6, and the surface of the light-reflecting material layer 7 is roughened (microscopic irregularities). Information recording bit 4 is formed.

FIG. 2 is a diagram showing a DRAW type optical card of the optical recording medium of the present invention. On the optical card 1, there is an optical recording track 8 which forms a high reflection part and can be written with light, and a low reflection part. A guide track 9 is formed. In addition,
In the above embodiment, the optical recording tracks 8 and the guide tracks 9 are formed alternately, but it is also possible to reduce the number of guide tracks 9. Alternatively, a preformat may be formed in which the low reflectance portion is used as a bit.

Figure 3 shows the ROM type in Figure 1 and the DRA type in Figure 2.
This is a diagram showing a W-type optical card, in which information recording bits 4.4 are formed on the left and right sides of an optical card 1, and an optical recording track 8 and a guide track 9 are formed in the center. Note that information recording bit 4 and optical recording track 8
The position of can be set arbitrarily.

Figures 4 to 11 are for the above ROM type or DRA.
An example of a method for manufacturing a W-type optical recording medium is shown. In the figure, the high reflectance portion 13b and the low reflectance portion 13c are shown as uneven, but the difference between these unevenness is usually 10
The thickness is approximately 0.08 to several μm, and is actually formed as a substantially flat or coplanar surface.

The examples shown in FIGS. 2 and 3 described above are all examples in which the optical recording medium of the present invention is configured as an optical card, but the optical recording medium according to the present invention is shown in FIG. As shown in the conceptual cross-sectional view, basically, a high reflectance portion 101 and a low reflectance portion 102 are formed on a certain base material 100.
An information recording pattern is formed. When reading information, the recorded information is identified by detecting the difference in the light reflectance of each part. In this case, the low reflectance part 102 has a roughened surface and scatters light. Therefore, differences in light reflectance can be easily detected. Further, the high reflectance portion 101 is formed on the base material 10
There is no particular problem as long as 0 itself has light reflectivity, but in order to provide high reflectivity, a light reflective material layer (not shown) can be separately provided on the base material 100.

In the cross-sectional view shown in FIG. 14, a low reflectance portion (roughened surface) 102 is formed on the lower side of a light-transmissive base material 100a, and a laser beam for reading information is irradiated from the upper side. be done. In this case, a light reflective material layer (or optical recording material layer) 103 can be formed on the entire surface or a part of the base material 100a so as to cover the roughened portion 102, and this light reflective material layer 103 constitutes the high reflectance part.

The example shown in FIG. 15A is a cross-sectional view of the optical recording medium shown in FIG. A light reflecting material layer or an optical recording material layer 103 is laminated on the surface of the base material 100a so as to cover the portion,
Furthermore, an adhesive layer 104, a printing layer 105, and a card base material 106 are laminated on this surface, while a transparent base material layer (protective layer) 108 is placed on the opposite side with a primer layer 107 interposed therebetween.
In addition, a surface hardening layer 109 is formed in a laminated manner.

Further, No. 15B is an example in which the light-transmitting base material 100a is formed in a manner that it also serves as a protective layer of the optical card in the case of No. 15A. The above light-transmitting base material 100a
The desired material, such as a plastic sheet or film, can be selected depending on the application and end product. Furthermore, other recording means such as magnetic stripes, holograms, imprints, photographs, bar codes, and general printing may be formed on this base material 100a.

In the structure shown in FIGS. 15A and 15B, the optical recording material layer 103 is not exposed at the edge of the card, and since it is a closed type with no voids as a whole, it has particularly excellent stability over time.

Next, the main constituent materials of the optical recording medium of the present invention will be explained.

Base material As the base material, conventionally known materials can be used as appropriate. In particular, as the light-transmitting material, resins such as polymethyl methacrylate (PMMA), polycarbonate, polyester, epoxy resin, polyolefin, polystyrene, and glass can be used.

For details of these base materials, please refer to the manufacturing method (1) described below.
) to (X) will also be explained in detail.

Light Reflective Material As the light reflective material used in the above ROM type, any material can be used as long as it has a refractive index different from that of the base material. For example, A D ST iSM nF e SC
OSN t SCu SZ n s S e SM O
%Ag5CtL In5Sns Sb, Te5PtsA
Metals such as u and their alloys, compounds, and other TiO2
Materials with high light reflectance, such as oxides such as , TiN, etc., and nitride organic dye thin films, can be used.

Optical recording materials Examples of optical recording materials for the above-mentioned DRAWROM type include metal-based materials (Ta, BiS In, Al, C/Al,
Cr/Afl, Zn/AlsSt, GeSm5
etc.), carbon-based CTe5Te-AssTe-8e, T
Oxide systems such as e-3e-AsSTe-C82, Te-C, Te composites, As-8e-3-Ge (T e OSG
e Os M o Osx x
XV O2, etc.), organic materials (dye thin film + resin, Ag + polymer, thermoplastic resin, Cu -P
c / T e etc.) are used.

In addition, as optical recording materials used for erasable and writable types, there are materials in which the ordered state between atoms constituting the film changes reversibly upon irradiation with light, and the light reflectance between the two differs, for example. , Te-As5Te-8es Te
-3e-AsSTe-C82, Te-C, As-8e-
Materials such as S-Ge are used.

Among the above, in the present invention, the DRAW type optical recording material includes a first layer made of tellurium oxide represented by the general formula TeO (x is a positive real number) and a first layer made of a tellurium oxide represented by the general formula 7eO (
y is a positive real number)
It is particularly preferable to use a layer in which x<y in the above general formula. Usually, in the above general formula, 0<x≦, 5, and 0.5≦
The range is y≦2.

The optical recording material layer made of tellurium oxide as described above is
It has particularly excellent stability and weather resistance as a DRAW type recording layer, and has excellent recording sensitivity and reproduction sensitivity when the optical recording medium is configured as a sealed optical card.

In producing the optical recording material layer as described above, the first and second layers can be easily produced by a reactive sputtering method.

Alternatively, as another method, each layer having the above-mentioned composition can be fabricated by evaporating tellurium onto a substrate by vacuum evaporation and simultaneously irradiating the substrate with an ion beam made of an oxygen-containing gas. In any case, the optical recording material layer can be produced relatively inexpensively by a simple and rapid method.

Next, the method for manufacturing the optical recording medium of the present invention will be specifically explained.

Manufacturing method (1) In the manufacturing method according to the first aspect of the present invention, an optical recording medium is manufactured in which an information recording pattern consisting of a high reflectance area and a low reflectance area is formed on a base material. Hits the,
The low reflectance portion is formed by roughening treatment according to the information recording pattern, and the process of forming the low reflectance portion roughened according to the information recording pattern consists of the following steps. .

(a) a step of forming a photoresist layer on the base material; (b) a step of performing a first exposure (buttering exposure) on the photoresist layer through a mask according to an information recording pattern; (c) Next, a step of performing a second exposure (roughening exposure) on the photoresist layer subjected to the first exposure through a transparent body on which a fine light and dark pattern is formed; ) A step of obtaining an information recording pattern consisting of a low reflectance portion with a roughened surface by developing the photoresist layer subjected to the second exposure.

Furthermore, the method of the present invention includes the step of laminating the above-described light reflective material layer or optical recording material layer on the entire surface or part of the base material so as to cover the low reflectance portion obtained in the above step. You can stay there.

FIG. 4 is a process cross-sectional view showing a specific example of the above manufacturing method. To explain in detail according to this diagram, first, a photoresist layer 11 is coated on a light-transmitting base material 10 using a rotary photoresist coating machine. After coating the photoresist layer 11 uniformly to a thickness of 4,000 to 20,000 layers, a photomask 12 formed according to the information recording pattern is overlaid on the photoresist layer 11 using a mask alignment device, and then a first exposure (patterning exposure) is performed. ).

Next, as shown in FIG. 4(b), exposure is carried out again (roughening exposure) using a glass plate 17 whose one side is roughened to have fine irregularities. In this case, the roughened surface of the glass plate 17 is
It is preferable to place the layer as close to the surface of the resist layer as possible in order to improve the light scattering properties of the resulting roughened portion. In addition, in this example, a roughened glass was used as the mask for the second exposure, but the mask is not limited to this, and it is a transparent material with a fine light and dark pattern that is formed on the surface of the resist layer by exposure. It is sufficient that the material has fine irregularities (that is, the surface is roughened) after development.

Next, as shown in FIG. 4(C), when the photoresist layer 11 is developed, if a positive type resist is used, the photoresist in the areas exposed to the ultraviolet rays flows away, and the resist in the areas not exposed to the ultraviolet rays remains. The pattern of the photomax 12 is transferred onto a light-transmissive base material 10.

As a result, the surface of the photoresist layer 11 is roughened.
However, the shape of the information recording bit 4 shown in FIG. 1 or the guide track 9 shown in FIG. 2 is formed, for example, with a width of about 5 μm and a pitch of about 15 μm.

Next, as shown in FIG. 4(d), a thin film layer of a light reflecting material or optical recording material 13 is formed by vapor deposition, sputtering, a chemical method, or the like.

Next, as shown in FIG. 4(e), a substrate 15 made of polyvinyl chloride or the like is adhered to obtain an optical recording medium having a high reflectance portion 13b and a low reflectance portion 13c. Note that a developing step may be provided between the above exposure steps (a) and (b), and after the photoresist is left, the photoresist may be exposed to light for roughening, or the exposure step ( The order of a) and (b) may be reversed. Further, in the above example, the base material 10 is made of a light-transmitting material, but the substrate 1
It is also possible to make the substrate 5 light-transmissive and read it by irradiating light from the substrate 15 side. In this case, the base material 10 does not need to be a light-transmissive material.

In this optical recording medium, when light is incident from the light-transmitting base material 10, the light is strongly reflected in the high reflectance portion 13b, and the surface of the low reflectance portion 13c is roughened. The presence of photoresist will reduce the reflectance. When manufacturing a ROM type card, the above-described light-reflecting material is used as the layer 13 to form the information recording bit 4 shown in FIG. 1 in the low reflectance portion 13c. When manufacturing a card, by employing the optical recording material as the layer 13, the optical recording track 8 shown in FIG. 2 is formed in the high reflectance part 13b, and the guide track is formed in the low reflectance part 13c. 9 can be formed.

The photoresist 11 used in the above method includes orthoquinone diazide/novolac type, azide/rubber type, p
- Materials such as diazodiphenylamine/paraformaldehyde condensation type, azide polymer type, polyvinyl cinnamate type, and polycinnamylidene vinyl acetate type are used.

In the ROM type optical recording medium manufactured as described above, the information recording bits with low light reflectance are read by a line sensor (for example, a CCD line sensor) or a laser beam. Note that in a ROM type optical recording medium, a guide track is not necessarily required, and an information recording bit string can be used as a guide track.

In addition, in the DRAW type optical recording medium manufactured as described above, the light reflectance of the optical recording track 13b and the guide track 13c was measured using a white light lamp of 400 to 700 nm. recording track 1
3b had a light reflectance of about 50%, and guide track 13c had a light reflectance of about 10%. When writing bit information on an optical recording medium, two or three beams are used. In an example using three beams, as shown in FIG. 12, the guide track 13c and the optical recording track 13b are By detecting the difference in reflectance, the positions of the guide tracks 13C, 13c are checked to prevent them from shifting to the left or right, and bit information is written to the optical recording track 13b using the beam B in the middle. It is simpler than the beam one. Note that the guide tracks 13c are not necessarily formed alternately with the optical recording tracks 13b, and the number of guide tracks may be thinned out. In this case, the distance of the guide track 13c is calculated, the position of the optical recording track 13b is determined, and bit information is written.

Manufacturing method (n) In the manufacturing method according to the second aspect of the present invention, an optical recording medium is manufactured in which an information recording pattern consisting of a high reflectance part and a low reflectance part is formed on a base material. Hits the,
The low reflectance portion is formed by roughening treatment according to the information recording pattern, and the process of forming the low reflectance portion roughened according to the information recording pattern consists of the following steps. .

(b) Step of forming a photoresist layer on the original base material with fine irregularities formed on the surface; (b) Performing patterning exposure on the photoresist layer through a mask according to the information recording pattern. Step (c) The photoresist layer subjected to the patterning exposure is developed to expose the surface of the base material having a finely uneven surface in accordance with the information recording pattern, thereby forming the information recording pattern. A process of obtaining an optical recording medium.

Furthermore, the method of the present invention includes the step of laminating the above-described light reflective material layer or optical recording material layer on the entire surface or part of the base material so as to cover the low reflectance portion obtained in the above step. You can stay there.

FIG. 5 is a process sectional view showing a specific example of the above manufacturing method.
As shown in a), a photoresist layer 11 is uniformly coated on a finely roughened glass plate 17 using a rotary photoresist coating machine to a thickness of 40 to 20,000 coats, and then a mask alignment device is used to coat the photoresist layer 11 uniformly. After superimposing the photomask 12 on the photoresist layer 11, it is exposed to light. Next, as shown in FIG. 5(b), when the photoresist layer 11 is developed, in the case of a positive type resist, the photoresist in the areas irradiated with ultraviolet rays flows away, and the resist in the areas not irradiated remains, and the photomask 11 is The pattern is transferred onto the glass plate 17. As a result, openings with a width of about 5 μm and a pitch of about 15 μm are formed in the photoresist layer 11, and the rough surface of the glass plate 17 is exposed in a pattern, thereby obtaining the optical recording medium of the present invention.

Furthermore, in the present invention, the optical recording medium can be further reproduced using the optical recording medium as an original.

That is, as shown in FIG. 5(c), for example, ? ! ! After laminating the master plates made in FIG. 5(b) through a molding agent 16 made of a female radiation-curing resin or a thermosetting resin and pressing with a press machine, as shown in FIG. 5(d). As shown, the original plate and molding agent 1
The molding agent 1 can be removed by peeling and curing the molding agent 6, or by peeling it off after curing with a predetermined curing means in the state shown in FIG. 5(c).
For example, an information recording bit having a roughened protrusion surface is formed on the protrusion 6 with a width of about 5 μm and a length of about 20 μm.

Next, as shown in FIG. 5(e), the film thickness is 500 to 10
A thin film layer of a light reflecting material or an optical recording material 13 is formed by vapor deposition, sputtering, chemical methods, or the like. Next, as shown in FIG. 5(f), a substrate 15 made of polyvinyl chloride or the like is bonded using an adhesive or the like to produce an optical recording medium having a high reflectance portion 13b and a low reflectance portion 13c. Then, similarly to the specific example shown in FIG. 4, when manufacturing a ROM type card, by employing a light-reflecting material as the layer 13, the information shown in FIG. 1 can be recorded in the low reflectance portion 13c. bit 4, while DRAWROM
In the case of manufacturing a typed type, by employing an optical recording material as the layer 13, the optical recording track 8 shown in FIG. 2 is formed in the high reflectance part 13b, and the low reflectance part 13c
A guide track 9 is formed therein.

In the above specific example, the resin portion 16 is present in the light reflectance portion 13b as shown in the figure, but this is not necessarily necessary, and a roughened resin is present in the low reflectance portion 13c. That's enough.

As the molding resin used in the above method, the following may be used.

(A) Ionizing radiation photoresin ■Electron beam curable resin urethane acrylate, oligoester acrylate,
Trimethylolpropane triacrylate, neopentyl gelcol diacrylate, epoxy acrylate polyester acrylate, polyether acrylate,
A polymerizable oligomer or monomer having an acryloyl group such as melamine acrylate, or a blend of these oligomers or monomers with a monofunctional or polyfunctional monomer containing a polymerizable vinyl group such as acrylic acid, acrylamide, acrylonitrile, or styrene.

(2) Ultraviolet curable resin A photopolymerization initiator, sensitizer, or desired additives added to the resin composition of (1) above.

(B) Thermosetting resin epoxy resin, melamine resin, unsaturated polyester resin, urethane resin, urea resin, amide resin, phenol/formalin resin.

Manufacturing method (III) In the manufacturing method according to the third aspect, the formation of the information recording pattern may be performed as follows.

(a) A step of forming a photoresist layer on a base material with a smooth surface or fine irregularities, (b) A step of patterning and exposing the photoresist layer through a mask according to the information pattern. (c) Next, by performing development and etching, the portion of the base material where the resist layer is not present is selectively roughened or flattened, thereby obtaining an optical recording medium on which an information recording pattern is formed.

6 and 7 show other examples of the molding type similar to the specific example shown in FIG. 5 above. These specific examples have the advantage of improving the durability of the press mold.

In FIG. 6, on a finely roughened glass plate 17,
After applying the photoresist layer 11, a photomask 12 is applied.
After superimposing the photoresist layer 11 on the photoresist layer 11, the photoresist layer 11 is exposed (FIG. 6(a)), and then the photoresist layer 11 is developed (Fig. 6(a)).
After Figure 6(b)), wet etching is performed for 1 minute using a glass etching solution such as an aqueous solution of ammonium fluoride/nitric acid.
The process is continued for one hour (FIG. 6(C)), and the rough surface of the opening portion of the glass plate 17 where there is no photoresist is smoothed. At this time, the glass etching solution may be any other solution as long as the etched surface is smoothed, and the depth of etching is not particularly specified, as long as the etching surface is smoothed. In this state, it can be used as an optical recording medium.

Furthermore, in the present invention, as shown in FIG. 6(d),
After removing the resist, as shown in FIG. 6(e), a molding agent 16 made of an ionizing radiation-curable resin or a thermosetting resin, which will be described later, is applied onto the light-transmitting base material 10, as shown in FIG. 6(e). After laminating the original plates made in (d) and pressing them with a press machine, after curing by irradiating or heating with electron beams or ultraviolet rays,
As shown in FIG. 6(f), by peeling off the original and the molding agent 16, an information recording bit with a roughened surface, for example, is formed on a part of the molding agent 16, and then,
An optical recording medium is manufactured in the same manner as the steps shown in FIGS. 5(e) and 5(f).

Examples of the molding agent 16 are shown below.

(A) Ionizing radiation photoresin ■ Electron beam curable resin Polymerizable oligomers and monomers with acryloyl groups such as urethane acrylate, epoxy acrylate, polyester acrylate, polyether acrylate, and melamine acrylate, and acrylic acid, acrylamide, acrylonitrile, styrene, etc. Contains monofunctional or polyfunctional monomers containing vinyl groups.

■Ultraviolet curing resin A photopolymerization initiator is added to the resin composition of (1) above.

(B) Thermosetting resin epoxy resin, melamine resin, unsaturated polyester resin, urethane resin, urea resin, amide resin, phenol/formalin resin.

The specific example shown in FIG. 7 is different from the specific example shown in FIG. 6 above in that a rough surface is formed on the glass plate 17 by etching as shown in FIG. It is a point of formation. In this case, either dry etching or wet etching can be used. The dry etching method can be carried out by etching the glass using CF4 plasma, HF gas, etc. so that the etched surface of the glass is roughened.

Further, for wet etching, in addition to the etching solution used in the example shown in FIG. 6, a highly concentrated hydrofluoric acid solution, such as an acidic ammonium fluoride/mineral acid solution, may be used.

In the specific example of FIG. 8, the light reflective material or optical recording material 13 is formed on the molding agent 16 in the specific examples of FIGS. Recording material 13
This is an example of a structure in which a roughened molding agent 16 and a substrate 15 are laminated together by vapor deposition, sputtering, or plating.

In the specific examples shown in FIGS. 5 to 7, 9 and 10, reading can be done from either side of the base material 10 or the substrate 15.
Although writing is possible, in this specific example, the board 1
Reading and writing are performed only from the 5 side.

Manufacturing method (IV) Next, a specific example shown in FIG. 9 will be explained.

In this specific example, as shown in FIG. 9(C), a plating step is performed before the molding step of FIG. 5(C), and a metal plating layer 18 is formed to cover the photoresist layer 11. After that, the metal plating layer 18 is peeled off and the metal plating layer 1 is removed.
8, a pattern of information recording bits or guide tracks with a roughened surface is formed. Next, using this as an original plate, as shown in FIG. 9(d), after pressing the molding resin 19, as shown in FIG. 9(e), the original plate and the molding resin 19 are pressed.
By peeling off and curing the molded resin 19, an information recording pattern with a roughened surface is formed on the molded resin 19, and then a thin film layer of the light reflecting material or the optical recording material 13 is formed.

In the above specific example, the metal plating 18 is used as the original plate for the press, but a precisely etched metal plate may also be used as the press mold.

Furthermore, a molded resin having a roughened information recording pattern formed on the surface can also be obtained by injection molding using the above-mentioned metal plate as a mold. Further, as shown in FIG. 10, a light reflective material or an optical recording material 13 is formed on the base material 10 by vapor deposition, sputtering, or plating, and a pattern is embossed using the metal plate as a press mold, and then a substrate 15 is formed. They may be laminated.

Manufacturing method (V) Next, a specific example shown in FIG. 11 will be explained.

First, after applying the material 20 on the light-transmitting base material 10,
After superimposing the photomask 12 on the material layer 20, ultraviolet rays are irradiated (FIG. 11(a)) When the material 20 is irradiated with ultraviolet rays and then heat-treated, the light transmittance changes between exposed and non-exposed areas. It is a material that When exposed to light and heated, the light is scattered due to the formation of nitrogen gas bubbles in the area hit by the ultraviolet rays, as shown in Figure 11(b), or the light is scattered as shown in Figure 11(b'). As a result, the generated nitrogen gas bubbles expand, burst, and radiate to the outside, causing bubbles to form inside the material layer 20 and the surface to become microscopically uneven, scattering light and reducing the reflectance. It is presumed that this is due to a decrease in

According to this specific example, in which an optical recording medium can be manufactured by sputtering the light reflecting material or optical recording material 13 in the same manner as the specific example shown in FIG. 4, there is also the advantage that the manufacturing process is further simplified. It is.

In this specific example, for example, Culver Film (trade name) manufactured by Culver Co., Ltd. may be used as the material 20, and its composition is Saran (a copolymer of vinylidene chloride and acrylonitrile), PMMA, P-diazo- N, N-
Consists of dimethylaniline BF4-salt. In addition,
For example, a photosensitive material such as a diazonium compound, an azide compound, or a bisazide compound may be dispersed in a thermoplastic resin such as a styrene type, a rosin type, or a polyester type.

Manufacturing method (Vl) In the present invention, the process of forming the low reflectance portion roughened according to the information pattern is performed as shown in FIG. 11B.
It can be carried out according to the following steps.

(a) Step of forming a mask pattern 31 corresponding to the information recording pattern on the light-transmissive base material 30 (FIG. 11B(a))
), (b) roughening the surface of the portion of the light-transmissive base material 30 where the mask pattern 31 is not formed by etching (FIG. 11B (b)), (c) photocoating on the base material 32 Step of forming resist layer 33 (FIG. 11B (C))
(d) The material obtained in the step (b) is used as a mask for roughening exposure, and the step (b) is carried out through the roughening exposure mask.
A step of subjecting the photoresist layer 33 of the base material 32 obtained in c) to roughening exposure (FIG. 11B (d)); (e) the photoresist layer 33 subjected to the roughening exposure;
A step of developing an information recording pattern consisting of a low reflectance portion with a roughened surface (FIG. 11B (e)).

Further, in the above embodiment, by removing the mask pattern formed on the surface of the transparent body obtained in the above step (b), the transparent body can be used as it is as an optical recording medium (or its original).

As the above-mentioned light-transmitting base material, a light-transmitting material such as glass may be used, and as the mask pattern material, metal such as Or may be used, but other materials may also be used as appropriate.

The etching solution used in the etching step (b) above may contain fine particles. Specifically, when the transparent body is glass and the mask pattern is Cr, alpha alumina (particle size of about 1μ) is added to a known glass etching agent or a mixture of acidic ammonium fluoride and concentrated sulfuric acid.
, glass particles, SiC particles, cerium oxide, and other inorganic fine particles may be used. In this case, the type and particle size of the inorganic fine particles can be selected depending on the purpose. By selecting these conditions, it is also possible to control the rough surface state obtained.

An example of the above-mentioned etching agent and processing conditions are as follows.

First, apply 50 ml of glass etching liquid (Relite 5X-20 (France: 5EPPIC)) onto the C mask pattern.
95% H2S0 mixed with 420 g of 95% H2S0), spread it evenly with a roller through a protective film (for example, PET film), leave it for several tens of seconds to 2 minutes, remove the protective film, and then apply water. By washing and drying, it is possible to obtain an optical recording medium (original plate) on which an information pattern consisting of roughened low reflectance areas is formed.

Manufacturing method (■) In the present invention, the step of forming the information pattern: the correspondingly roughened low reflectance portion can be carried out according to the following steps, as shown in FIG. 11C.

(a) Step of forming a mask pattern 31 corresponding to the information recording pattern on the light-transmitting base material 30 (FIG. 11C(a))
), (b) forming a photoresist layer 33 on the surface of the light-transmitting substrate 30 so as to cover the mask pattern 31 (FIG. 11C (b)); (c) forming the light-transmitting base Step (b) of performing a first exposure (patterning exposure) from the surface of the material 30 opposite to the photoresist layer 33; (d) Next, the photoresist layer 33 subjected to the first exposure is On the other hand, from the photoresist layer 33 side through the transparent body 40 on which a fine light and dark pattern is formed, W4 is
Step (C) of performing the second exposure (roughening exposure); (e) the photoresist layer 33 subjected to the second exposure;
The process of obtaining an information recording pattern consisting of a low reflectance area with a roughened surface by developing the
d)).

To further explain the above method based on a specific example, a Cr mask pattern consisting of a thin film pattern of a desired metal such as C is formed on the surface of a light-transmissive substrate such as glass in accordance with a conventional method.

Furthermore, a positive photoresist is coated on this Cr mask pattern using a spinner, and prebaked at 90 to 100° C. for about 300 minutes.

Next, an ultra-high pressure mercury lamp (4 kW
) for 8 seconds from a distance of 80 cm/cm (
patterning exposure). Next, a ground glass plate (#4000) is brought into close contact with the surface on the photoresist layer side, and second exposure (roughening exposure) is performed. Exposure in this case is about 1 second using the ultra-high pressure mercury lamp. Further, a development process is performed for about 300 minutes using a predetermined developer (for example, an alkaline developer) to obtain an information pattern having a structure in which a resist layer having a roughened surface is laminated on the Cr mask pattern. be able to.

The above method is extremely superior in that it eliminates uneven adhesion during patterning. That is, according to the above method, the roughening exposure improves the accuracy of the resist layer pattern and makes it possible to finish the surface of the resist layer in a favorable roughened state.

Manufacturing method (■) In the present invention, the process of forming the low reflectance portion roughened according to the information pattern is performed as shown in FIG. 11D.
This can be done through the following steps.

(b) Forming a metal mask layer 31 on the light-transmitting base material 30 (FIG. 11D (a)); (B) Forming a photoresist layer 33 on the surface of the metal mask layer 31 (FIG. 11D (a)); b)), (c) performing a first exposure (patterning exposure) from the photoresist layer 33 side through the photomask 12 (same (C)); (d) then the first exposure Step (d) of forming a photoresist layer 33 according to the information recording pattern by developing the photoresist layer 33 that has been etched; (e) Further, by etching the metal mask layer 31 , photoresist layer 3 according to the information recording pattern
3 and metal mask layer 31 (same (e)
)), (f) A step of performing a second exposure (roughening exposure) on the photoresist layer 33 through the transparent body 40 on which a fine light and dark pattern is formed ((f)), ( g) Photoresist layer 33 subjected to the second exposure
A process of obtaining an information recording pattern consisting of a low reflectance portion with a roughened surface by further developing the
Same (g)).

In addition, the materials for the above-mentioned light-transmissive base material, mask layer, etc. are as follows:
The materials of the manufacturing method (VI) and (■) above can be used similarly.

Manufacturing method (IX) The optical recording medium according to the present invention is itself excellent in simplifying the manufacturing process, but in the present invention, by adopting the following method, mass production on an industrial scale, This makes it more suitable for mass duplication.

For example, in the manufacturing method in this aspect, an optical record in which an information recording pattern consisting of a low reflectance portion with a roughened surface is formed, obtained in the manufacturing method (I) to (ii) above, is used. The body is used as an original plate for surface roughening,
Furthermore, an optical recording medium can be reproduced from this roughening original plate by a method such as a mold press.

Furthermore, in the present invention, a mother mask is once produced from the roughened original plate, and this mother mask is used as a reproduction original plate for mass duplication, and an optical recording medium can be obtained by molding.

This method of manufacturing an optical recording medium using a mother mask is particularly effective when the surface roughening original is made of a mechanically or chemically weak material.

The optical recording medium obtained by molding using the above-mentioned mother mask as a reproduction master is further coated with a light-reflecting material layer on the entire surface or part of the base material so as to cover the low-reflectance portion of the optical recording medium. Alternatively, optical recording material layers can be laminated.

Regarding mass duplication, as shown in Manufacturing Example 4 and FIG. It becomes possible to manufacture.

Manufacturing method (X) In the present invention, each optical recording medium obtained by the above manufacturing methods (I) to (IX) is used as an original plate, and a standbar is created from this original plate by plating, pressing, etc. -, the optical recording medium can be further reproduced by an injection method, a thermopressure pressing method, or a resin molding method as described above.

The material of the stand bar used in this case is Ni5A
Examples include metals such as L, CuSCr, and the like.

On the other hand, the resin for replication is not particularly limited, but thermoplastic resins are preferably used, particularly in the hot press method.

〔Example〕

Hereinafter, the present invention will be explained in more detail based on actual production examples, but the present invention is not limited to the description of these production examples.

Manufacturing Example 1 An optical recording medium was manufactured by the following steps according to the method shown in FIG. 4 above.

■ Thickness 0.4m+g, size 10100X100 P
Using an MMA base material, (1) a photoresist was applied to the surface of the base material under the following conditions.

Spinner coat: 3000rpm, 20sec
Resist Nijibrai Microbosit Thickness: 5,000 people ■ After coating, a brebake was performed at 90 degrees for 120 minutes.

■ Next, pattern exposure was carried out under the following conditions using a two-mask Cr sputter mask pattern: DRAWROM type rack width 5μm information track width 10μm ROM type information recording bit width 5μm length 5-20μm ultra-high pressure mercury lamp: 4KV% 8sec ■Next Next, ground glass exposure (full-surface contact exposure) was carried out under the following conditions.

Ground glass: average roughness 0.　3μm Ultra-high pressure mercury lamp: 4KV% 6sec ■ Post-exposure development was performed under the following conditions.

60sec to Sibley Microbosit Developer,
Washing with water (2) Bost baking was performed at 90° C. for 20 minutes, thereby forming a resist layer with a rough surface on the base material.

■ Next, the recording layer (light reflective material layer or optical recording material layer)
was formed under the following conditions.

A layer of 500 people thick was formed using a DC two-pole sputtering device.

DRAW type: Te sputtering ROM type: AfI sputtering■ For adhesion between the substrate and the base material, use Toshi Hi-Sole as the adhesive and laminate the PVC 0.3 thickness of the board onto the base material obtained above. They were integrated and punched out to the size of a [phase] card to obtain an optical card, which is an example of the optical recording medium of the present invention.

In addition, in the above manufacturing example, when manufacturing a DRAWSROM combination card, D
Combines RAW and ROM processes.

Production Example 2 Steps ① to ③ described in Production Example 1 above were carried out in the same manner, and ① 15 parts of oligoester acrylate (Aroex M-8030 manufactured by Toagosei Co., Ltd.) and 5 parts of neopentyl glycol diacrylate (manufactured by Nippon Kasei Co., Ltd.) were added. Pharmaceutical, NPOD A),
3 parts of 2-hydroxyethyl acrylate (Kyoeisha Yushi O
H), 2 parts of trimethylolpropane triacrylate (
A UV resin consisting of Nippon Kayaku Co., Ltd., TMPTA), benzophenone (genuine chemical type), and 25 parts was sandwiched between a 0.4-thick polycarbonate sheet and an original plate, and pressed with an air press at 4 kg/cjs for 30 sec. After that, it was cured by UV irradiation.

The UV irradiation conditions are as follows.

High-pressure mercury lamp: Curing after exposure for 30 seconds at 80 W/cd ■ After the resin was cured, it was peeled off from the original plate to obtain a cured resin having a roughened pattern portion on the surface.

[Co., Ltd.] The process described in Production Example 1 is applied to the obtained cured resin.
- [Phase] was carried out in the same manner to obtain an optical card which is an example of the optical recording medium of the present invention.

Manufacturing Example 3 According to the process shown in FIG. 16, an optical card as shown in FIG. 15 was manufactured. Each component and manufacturing conditions are as follows.

(1) First, a surface hardening layer and a brimer layer were formed on both sides of a transparent substrate.

Transparent base 0.4 m thick acrylic plate (polyethylene terephthalate, polycarbonate, epoxy, polyolefin, polyester may also be used) Surface hardening layer material: UV curable hard coating agent (manufactured by Toshi, UH-00)
1), others 1: UV curable CO, I) sesame, monomer initiator) resin, thermosetting resin, etc. can be used.

Coating: spinner coat, 3000rpIls
20sec-.

Thickness 1000-2000OA Cure: 80W/(!11 High pressure mercury lamp, conveyor speed 10m/gin 3 times irradiation (distance 150mm) Brimer coat material: UV curable brimer (Three Bond R-428)
-20) In addition, UV curable resins, thermoplastic resins, etc. can be used.

Coating: spinner coat, 3000 rpms
20sec Thickness 0.5~50μ Cure: 80W/cm, high pressure mercury lamp, conveyor speed 10i/sin 3 times irradiation (distance 150m/+g) (2) Preparation of resist roughening original plate Base material 0, 4m/ls acrylic plate ( In particular, the thickness and material are not limited as long as it has flatness) Resist coating material: Positive resist (quinone diazide type) Microposite 1400 made by Sibley (Other resists can be used as long as they have good resolution etc.) Coating: spinner coat, 3000Ppm,
20sec s thickness 5000 people brebake = 90℃,
20 minutes patterning exposure mask: C "Sputter mask used pattern nDRAW type...Guiding rack 3μm Information track 9μROM type...Information recording bit width 5μ, length 5~2
0μ Exposure: Ultra-high pressure mercury lamp 4K vs 8 seconds roughening exposure (full surface exposure) Ground glass: Average roughness 0.3 μm (#3000 polished glass) Exposure: Ultra-high pressure mercury lamp 4K vs 6 seconds Development, water washing Developer: Made by Multilayer Ink, alkaline development Solution (MR-D) Development time: 30 sec (3) Mother mask duplication material base material: Transparent substrate with good flatness, 12 m/m acrylic plate (in addition to the above, especially if the material has the above characteristics) ) Mother mask resin: UV curable resin (manufactured by Moroya Ink, 5EL-XA) (mainly composed of polyester acrylate oligomer and neopentyl glycol diacrylate monomer, with addition of photopolymerization initiator (Irgacure 184) ) Viscosity 100cps (low viscosity 50cps ~1000ep
Other UV curable resins can be used as long as they are about S. Depending on the mold releasability, a mold release agent or the like is added. ) Replication method: Sandwich the mother mask resin between the above transparent base material and the roughened resist original plate prepared in (2), press 5 kg.
After 30 seconds, UV 2 Kv high-pressure mercury lamp #4'00 l1eta was irradiated for 1 minute, and the resist roughening original plate and transparent substrate were released from the mold, and the pattern was replicated on the transparent substrate side.

The shape of the roughened portion of the resist layer in the information recording pattern thus obtained was as follows.

Height of resist layer: Approx. 5000 ~ 1 μm Diameter of opening on roughened surface: Approx. 2000 ~ 5000A Depth of opening on roughened surface: Approx. 500 ~ 2000 (4) Replication material As a resin for replication UV curable resin (for Three Bond, 5
S-120, urethane acrylate type) is used.

Viscosity: 80 to 100 cps (Other UV-curable resins can be used as long as they have low viscosity.) The primer side of the transparent base material produced by replication method (1) and the UV-curable resin of the mother mask produced by (3) Sandwich the duplication resin (SS-120) between the sides and press 5kg/cI.
#, after 30 seconds, UV (2Kw high pressure mercury lamp) distance 40
After irradiation with Dtx/lx for 1 minute, the transparent base material and the mother mask were released, and the pattern was replicated on the transparent base material side.

(5) Optical recording material layer TeO film and TeO film (however, x-0, 5, x
A laminated film was formed with y y-1,8').

Formation of the above laminated film was carried out under the following conditions.

For example, a reactive sputtering device was used.

(a) TeO film

(2) Introduce Ar and 02 gases into the chamber at the following flow rates and adjust the degree of vacuum to 5X10-3.

Ar: 3cc/gin, 02: 0.5c
c/win ■ Sputtering start input power 100 W Film forming time 20 seconds (b) TeO film ■ Same as above ■ Ar 2: 2 cc/win.

02: , 5cc/gin ■ Input power 100W Film forming time 20 seconds (6) Adhesive laminate material adhesive (two-component curing type, urethane type, Toshi UH-1)
260C) Lamination method: Vinyl chloride, PET, etc. The card base material printed on the 3a+/m base material and the base material provided with the recording layer prepared in (5) above were laminated via an adhesive.

Production Example 4 (Glass Etching Type) In Production Example 3 above, a roughened original plate was prepared in the following manner.

(2) A Cr sputter mask pattern consisting of a guide track width of 5 μm and an information track width of 10 μm was formed on a glass plate by photophosphorography.

(2) A glass etching solution having the composition shown below was applied onto the above mask pattern and spread uniformly with a roller through a protective film (PET film).

Relight 5X-20 (7-y cis 5EPP I CAL
)...50° 95% H2SO4...20°■ After applying the above etching solution, it was left to stand for 10 seconds and washed with water to prepare a roughened original plate.

Example 5 (Method of forming a roughened pattern of resist on a mask) In the above Manufacturing Example 3, the roughened original plate was prepared by the following method.

(2) A positive photoresist was applied under the following conditions to a Cr sputter mask in which a predetermined pattern with a guide track width of 5 μm and an information track width of 10 μm was formed by photolithography on a glass plate.

Spin code: 2000rpo+, 20 seconds resist Nijibrae Microposite thickness =
, 5 .mu.m (1) After coating, a brebake was performed at 90.degree. C. for 20 minutes.

(2) Next, pattern exposure was performed from the glass side of the Cr mask under the following conditions.

Ultra-high pressure mercury lamp: 4kv (80w/cm), 8D■
Next, using ground glass (#4000), this was brought into close contact with the resist side of the Cr mask, and surface roughening exposure was performed under the following conditions.

Ultra-high pressure mercury lamp: 4kW (80w/cm), 2 seconds■
After exposure, development was performed under the following conditions.

Dip in Sibley Microbojit developer for 60 seconds and wash with water.

(2) Bost baking was performed at 90° C. for 20 minutes, thereby obtaining a roughened original plate.

Production Example 6 The mother mask (second mask) 210 produced in Production Example 3 above is pasted and fixed on the circumference of the center drum 200 of the apparatus shown in FIG. 17, and then duplicated from the ink pan 201 while rotating the drum 200. UV curable resin 202 was supplied to the mother mask 210 while being adjusted by a doctor 203. On the other hand, polycarbonate 204
is sent, and the polycarbonate is successively crimped by the nip rolls 205. Next, ultraviolet rays (2Kw) are irradiated from the UV lamp 206 to harden the resin, and the resin layer is separated from the mother mask 210 using the tension of the guide roll 207a during winding. It is irradiated with ultraviolet light by a lamp 208 and wound up.

A layer of aluminum is applied to the resin layer side of the optical recording medium wound up in this manner using a winding vapor deposition device (not shown).
Vapor deposition is carried out at a speed of 0 m/min, resist ink is printed on this vapor deposition surface by screen printing, unnecessary parts are removed by etching, and then a card base material is laminated with adhesive and punched to form a card shape. By doing so, it was possible to continuously manufacture ROM type or DRAW type optical cards.

Applications The optical recording medium of the present invention can be used as optical recording materials in various forms such as flexible disks, cards, tapes, etc., and is applied, for example, to the following applications.

(1) Financial distribution industry: cash advance cards, credit cards, prepaid cards.

(2) Medical and health industry: health certificates, medical records, medical cards,
emergency card.

(3) Entertainment industry: software media, membership cards, admission tickets, game machine control media, video game media, karaoke media, golf scorecards.

(4) Transportation and travel industry: traveler cards, licenses, commuter passes,
passport.

(5) Publishing industry: electronic publishing.

(6) Information processing industry: External recording devices and filing for electronic machines.

(7) Educational industry: educational material programs, performance management cards, library attendance management, and book management.

(8) Automobile industry: maintenance records, operation management.

(9) FA: Program recording medium for MC, NC, robot, etc.

(10) Others: Building control, home control, ID cards, media for vending machines, address book cards.

〔Effect of the invention〕

As explained above, the optical recording medium according to the present invention is an optical recording medium formed by forming an information recording pattern having a different light reflectance with respect to the surroundings on a base material, and the low reflectance portion has a light scattering property. Since it is composed of a roughened part with a roughened surface, it is possible to avoid complicating the process due to etching, etc. as much as possible, simplifying the manufacturing process, and not being limited to a specific optical recording material with respect to raw materials. Furthermore, since it is suitable for mass reproduction on an industrial scale, it has an excellent effect in reducing manufacturing costs.

Furthermore, since the optical recording medium according to the present invention has the above-described configuration, it is excellent in storage stability, durability, and stability over time.

[Brief explanation of the drawing]

FIG. 1 shows a ROM type optical card which is an embodiment of the optical recording medium of the present invention, FIG. 1A is a plan view, FIG. 1B is a perspective view, and FIG. 2 is a diagram showing the optical recording medium of the present invention. FIG. 3 is a diagram showing a DRAWROM type board as another embodiment, and FIG. 4 is a diagram showing a ROM type and DRAWROM type combination board as another embodiment. FIG. 4 is an embodiment of the method for manufacturing an optical recording medium of the present invention. Figures 5, 6, 7, 8, 9, 10, and 11 for explaining examples are other embodiments of the method for manufacturing an optical recording medium of the present invention. Diagram to explain,
FIG. 12 is a diagram for explaining the writing method of the optical recording medium of the present invention, FIGS. 13 and 14 are conceptual cross-sectional views of the optical recording medium according to the present invention, and FIG. 15 is an optical recording medium of the present invention. 16 is an explanatory diagram showing the manufacturing process of the optical card; FIG. 17 is a sectional view of an apparatus that can be used in the manufacturing process of the optical recording medium of the present invention; FIG. 18 shows one example of a conventional optical card, FIG. 18A is a plan view, FIG. 18B is a sectional view, and FIG. 19 is a perspective view showing another example of the conventional optical card.
FIG. 20 is a sectional view showing another example of a conventional optical card;
The figure is a diagram for explaining the writing method in Figure 20.
FIG. 2 is a perspective view showing another example of a conventional optical recording medium. 1... Optical card, 4... Information recording bit, 8...
Optical recording track, 9... Guide track, 10... Base material, 11... Photoresist layer, 12... Photomask, 13... Light reflective material or optical recording material, 13b
...High reflectance part, 13c...Low reflectance part, 15
... Substrate 16 ... molding agent, 17 ... glass plate,
18...Metal plating, 19...Molded resin, 20...
·material. Applicant's representative Sato - Yu FIG, 1A FIG, 1B FIG, 2 FIG, 3 N) tilI 1llll FIG, 4 FIG, 5 ++111 FIG, 6 +1111 FIG, 7 FIG, 8 FIG, 10 FIG, 9 / \ FIG , 1IA FIG, llB! 1 1! v hshiFIG, llC FIG, IID FIG, 12 FIG, 13 hν FIG, 14 FIG, 15A FIG, 158 FIG, +6 FIG, 17 FIG, l8A hν FIG, 188 FIG, 19 FIG, 20

Claims (1)

[Scope of Claims] 1. An optical recording medium in which an information recording pattern that can be identified by a difference in light reflectance is formed on a base material, wherein the information recording pattern has a high reflectance part and a low reflectance part. 1. An optical recording medium, characterized in that the low reflectance portion is comprised of a roughened portion having light scattering properties. 2. The optical recording medium according to claim 1, wherein a light-reflecting material layer is laminated on the entire surface or a part of the base material so as to cover the roughened portion. 3. The optical recording medium according to claim 1, further comprising an optical recording material layer laminated on the entire surface or a part of the base material so as to cover the roughened portion. 4. The optical recording medium according to claim 1, wherein the low reflectance portion is made of photoresist. 5. Claim 1 in which the low reflectance portion is made of resin
Optical recording medium as described in section. 6. The optical recording medium according to claim 1, wherein the low reflectance portion is made of an ionizing radiation-cured resin. 7. The optical recording medium according to claim 1, wherein the low reflectance portion is made of a thermosetting resin. 8. The optical recording medium according to claim 1, wherein the low reflectance portion is formed of a material that generates gas upon application of energy. 9. The optical recording medium according to claim 1, wherein the information recording pattern consists of bit information. 10. The optical recording medium according to claim 1, wherein the information recording pattern consists of a plurality of sets of optical recording tracks and guide tracks. 11. The optical recording medium according to claim 1, wherein the information recording pattern consists of bit information and a plurality of sets of optical recording tracks and guide tracks. 12. A card base material is laminated on the surface of the optical recording body on the light reflective material layer side through an adhesive layer, and on the other hand, the card base material is laminated on the surface of the optical recording body on the side where the light reflective material layer is provided. The optical recording medium according to claim 2, wherein a transparent protective layer is laminated on the side surface. 13. A card base material is laminated on the surface of the optical recording material layer side of the optical recording material via an adhesive layer, and on the other hand, a card base material is laminated on the surface of the optical recording material layer on the side opposite to the surface on which the optical recording material layer is provided. The optical recording medium according to claim 3, wherein a transparent protective layer is laminated on the side surface. 14. The light according to claim 1, wherein the base material is made of glass, the low reflectance part is made of a roughened part of the surface of the glass base material, and the high reflectance part is made of a photoresist layer. record body. 15. When manufacturing an optical recording medium in which an information recording pattern consisting of a high reflectance part and a low reflectance part is formed on a base material, the low reflectance part is roughened according to the information recording pattern. A method for producing an optical recording medium, characterized in that it is formed by surface treatment. 16. The method according to claim 15, wherein the surface roughening treatment is performed by photolithography. 17. The method according to claim 15, wherein the step of forming the low reflectance portion roughened according to the information recording pattern comprises the following steps. (B) Forming a photoresist layer on the base material; (B) Performing first exposure (patterning exposure) to the photoresist layer through a mask corresponding to the information recording pattern; (C) Next, a step of performing a second exposure (roughening exposure) on the photoresist layer subjected to the first exposure through a transparent body in which a fine light and dark pattern is formed; A step of developing an information recording pattern consisting of a low reflectance portion with a roughened surface by developing the photoresist layer exposed in Step 2. 18. The method according to claim 18, wherein the transparent body having a fine light-dark pattern used in the step (c) is a transparent body having fine irregularities formed on its surface. 19. The method according to claim 15, wherein the step of forming the low reflectance portion roughened according to the information recording pattern comprises the following steps. (a) a step of forming a photoresist layer on a base material having fine irregularities formed on its surface; (b) a step of patterning exposure to the photoresist layer through a mask corresponding to an information recording pattern; (c) By developing the photoresist layer subjected to the patterning exposure, the surface of the base material having fine irregularities is exposed according to the information recording pattern,
A process of obtaining an information recording pattern with a roughened surface. 20. The method according to claim 17 or 19, wherein the step of forming the low reflectance portion roughened according to the information recording pattern comprises the following steps. (b) Use the optical recording medium obtained in step (c) above, on which an information recording pattern consisting of low reflectance portions with a roughened surface is formed, as a roughened original plate; The patterned rough surface of the original plate is transferred to the resin layer by overlapping the base material and the information recording pattern side of the roughened original plate with or without pressure through a cured resin layer and making a mold. (c) a step of curing the resin layer molded in step (b) above to obtain an information recording pattern consisting of a low reflectance portion with a roughened surface. 21. The method according to claim 15, wherein the step of forming the low reflectance portion roughened according to the information recording pattern comprises the following steps. (B) A step of forming a material layer on a base material that generates gas by applying energy; (B) A step of subjecting the material layer to patterning exposure through a mask corresponding to an information recording pattern; (C) Further, a step of generating a gas in the material layer by applying energy to the material layer to obtain a light-scattering material layer; (d) developing the material layer; , a step of obtaining an information recording pattern consisting of a low reflectance portion with a roughened surface. 22. The method according to claim 21, wherein the step of forming the low reflectance portion roughened according to the information recording pattern comprises the following steps. (b) Use the optical recording medium obtained in step (d) above, on which an information recording pattern consisting of low reflectance portions with a roughened surface is formed, as a roughened master; The patterned rough surface of the original plate is transferred to the resin layer by overlapping the base material and the information recording pattern side of the roughened original plate with or without pressure through a cured resin layer and making a mold. (c) a step of curing the resin layer molded in step (b) above to obtain an information recording pattern consisting of a low reflectance portion with a roughened surface. 23. The method according to claim 15, wherein the step of forming the low reflectance portion roughened according to the information recording pattern comprises the following steps. (b) forming a photoresist layer on the base material; (b) exposing the photoresist layer to pattern light through a mask corresponding to the information recording pattern; (c) then forming a photoresist layer on the photoresist layer. Perform development,
A step of obtaining an information recording pattern consisting of a low reflectance portion with a roughened surface by further etching. 24. The method according to claim 23, wherein the step of forming the low reflectance portion roughened according to the information recording pattern comprises the following steps. (b) The optical recording medium obtained in the step (b), on which an information recording pattern consisting of low reflectance portions with a roughened surface is formed, is used as a roughened master plate; The patterned rough surface of the original plate is transferred to the resin layer by overlapping the base material and the information recording pattern side of the roughened original plate with or without pressure through a cured resin layer and making a mold. (c) a step of curing the resin layer molded in step (b) above to obtain an information recording pattern consisting of a low reflectance portion with a roughened surface. 25. The finally obtained optical recording medium on which an information recording pattern consisting of low reflectance areas with a roughened surface is formed is used as a roughening original plate (mother mask), and this mother mask is used as a roughening original plate (mother mask). 25. The method according to claim 20, 22, or 24, wherein an optical recording medium is obtained by molding using a mask as a reproduction master for mass reproduction. 26. Claims 17 to 26 include the step of laminating a light reflective material layer or an optical recording material layer on the entire surface or a part of the base material so as to cover the low reflectance portion of the obtained optical recording medium.
The method according to any one of paragraph 25. 27. The method according to claim 15, wherein the step of forming the low reflectance portion roughened according to the information pattern comprises the following steps. (b) forming a mask pattern in accordance with the information recording pattern on the transparent body; (b) roughening the surface of the portion of the transparent body where the mask pattern is not formed; (c) roughening the surface of the transparent body on which the mask pattern is not formed; a step of forming a photoresist layer on the material; A step of performing roughening exposure on the photoresist layer of the obtained base material, (f) developing the photoresist layer that has been subjected to the roughening exposure to roughen the surface. A process of obtaining an information recording pattern consisting of low reflectance portions. 28. The method according to claim 15, wherein the step of forming the low reflectance portion roughened according to the information pattern comprises the following steps. (b) forming a mask pattern in accordance with the information recording pattern on the transparent body; (b) roughening the surface of the portion of the transparent body where the mask pattern is not formed; (c) making the transparent body rough. A step of removing a mask pattern formed on the body surface to obtain an information pattern consisting of a roughened surface with low reflectance. 29. The method according to claim 27 or 28, wherein the etching solution used in the etching step of step (b) contains fine particles. 30. The method according to claim 27, wherein the step of forming the low reflectance portion roughened according to the information recording pattern comprises the following steps. (b) The optical recording medium obtained in the step (b), on which an information recording pattern consisting of low reflectance portions with a roughened surface is formed, is used as a roughened master plate; The patterned rough surface of the original plate is transferred to the resin layer by overlapping the base material and the information recording pattern side of the roughened original plate with or without pressure through a cured resin layer and making a mold. (c) a step of curing the resin layer molded in step (b) above to obtain an information recording pattern consisting of a low reflectance portion with a roughened surface. 31. The finally obtained optical recording medium on which an information recording pattern consisting of low reflectance areas with a roughened surface is formed is used as a roughening original plate (mother mask), and this mother mask is used as a roughening original plate (mother mask). Claim 3: An optical recording medium is obtained by molding using a mask as a reproduction master for mass reproduction.
The method described in item 0. 32. Claims 27 to 32 include the step of laminating a light reflective material layer or an optical recording material layer on the entire surface or a part of the base material so as to cover the low reflectance portion of the obtained optical recording medium.
The method according to any one of paragraph 31. 33. The method according to claim 15, wherein the step of forming the low reflectance portion roughened according to the information pattern is performed according to the following steps. (b) Forming a mask pattern corresponding to the information recording pattern on the light-transmissive base material; (B) Forming a photoresist layer on the surface of the light-transmissive base material so as to cover the mask pattern. (c) performing a first exposure (patterning exposure) from the surface of the light-transmissive base material opposite to the photoresist layer; (d) then the photoresist layer on which the first exposure has been performed; (e) performing a second exposure (roughening exposure) from the photoresist layer side through a transparent body on which a fine light-dark pattern is formed; (e) the second exposure is performed; A step of developing the photoresist layer to obtain an information recording pattern consisting of low reflectance areas with a roughened surface. 34. The method according to claim 33, wherein the step of forming the low reflectance portion roughened according to the information recording pattern comprises the following steps. (b) The optical recording medium obtained in the step (e), on which an information recording pattern consisting of low reflectance portions with a roughened surface is formed, is used as a roughened master plate; The patterned rough surface of the original plate is transferred to the resin layer by overlapping the base material and the information recording pattern side of the roughened original plate with or without pressure through a cured resin layer and making a mold. (c) a step of curing the resin layer molded in step (b) above to obtain an information recording pattern consisting of a low reflectance portion with a roughened surface. 35. The finally obtained optical recording medium on which an information recording pattern consisting of low reflectance areas with a roughened surface is formed is used as a roughening original plate (mother mask), and this mother mask is used as a roughening original plate (mother mask). 35. The method according to claim 34, wherein an optical recording medium is obtained by molding using a mask as a reproduction master for mass reproduction. 36. Claims 33 to 36 include the step of laminating a light reflective material layer or an optical recording material layer on the entire surface or part of the base material so as to cover the low reflectance portion of the obtained optical recording medium.
36. The method according to any one of paragraphs 35. 37. The method according to claim 15, wherein the step of forming the low reflectance portion roughened according to the information pattern is performed according to the following steps. (b) Forming a metal mask layer on the light-transmitting substrate; (b) Forming a photoresist layer on the surface of the metal mask layer; (c) Forming a photoresist layer from the side of the photoresist layer through the photomask. (d) Next, the photoresist layer subjected to the first exposure is developed to form a photoresist layer corresponding to the information recording pattern. (e) further etching the metal mask layer to form a laminate of a photoresist layer and a metal mask layer according to the information recording pattern; (f) etching the photoresist layer with fine particles. A step of performing a second exposure (roughening exposure) through a transparent body on which a light and dark pattern is formed; (g) further developing the photoresist layer that has been subjected to the second exposure; A process of obtaining an information recording pattern consisting of a low reflectance portion with a roughened surface.