JPH06152030A - Gas laser apparatus - Google Patents

Gas laser apparatus

Info

Publication number
JPH06152030A
JPH06152030A JP32124992A JP32124992A JPH06152030A JP H06152030 A JPH06152030 A JP H06152030A JP 32124992 A JP32124992 A JP 32124992A JP 32124992 A JP32124992 A JP 32124992A JP H06152030 A JPH06152030 A JP H06152030A
Authority
JP
Japan
Prior art keywords
chamber
gas
window
laser
medium gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP32124992A
Other languages
Japanese (ja)
Other versions
JP2784706B2 (en
Inventor
Junichi Fujimoto
准一 藤本
Yoshio Amada
芳穂 天田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Komatsu Ltd
Original Assignee
Komatsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Komatsu Ltd filed Critical Komatsu Ltd
Priority to JP4321249A priority Critical patent/JP2784706B2/en
Priority to US08/136,448 priority patent/US5373523A/en
Publication of JPH06152030A publication Critical patent/JPH06152030A/en
Application granted granted Critical
Publication of JP2784706B2 publication Critical patent/JP2784706B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To provide a gas laser apparatus in which a large amount of clean medium gas is not required to keep the inside of a window in a clean condition and problems such as an increase in cavity length or a leakage from a piping connecting part do not occur and a deterioration of an aperture can be prevented. CONSTITUTION:A dust filter case 9 is connected to a chamber 1 for holding main electrodes 3 and 4, and a clean medium gas filtered with a filter 13 is introduced into a secondary chamber 14 through a gas inlet passage 11 formed in the sidewall of the chamber 1. The medium gas stagnated in the secondary chamber 14 flows in the chamber 1 through a labyrinth 8 without moving the clean medium gas retained in the vicinity of the inside of a window 6. Thus, the laser medium gas in the chamber 1 containing dust is prevented from flowing toward the window 6. Also, since an aperture is mounted in the clean medium gas atmosphere between the window 6 and the labyrinth 8, a contamination or a deterioration in the aperture do not occur.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はガスレーザ装置に係り、
特に放電チャンバの両端に設けられたウインドウの汚損
防止機構に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas laser device,
In particular, the present invention relates to a window stain prevention mechanism provided at both ends of the discharge chamber.

【0002】[0002]

【従来の技術】気体状態の活性媒質を用いるガスレーザ
装置の中に、チャンバ内に封入したガスをファンにより
電極間に流し、放電によりガスの分子を励起させてレー
ザ媒質の反転分布を形成させ、高温になったガスを熱交
換器で冷却した後、ファンに戻しているCO2 レーザや
エキシマレーザがある。
2. Description of the Related Art In a gas laser device using an active medium in a gaseous state, a gas enclosed in a chamber is caused to flow between electrodes by a fan, and gas molecules are excited by discharge to form a population inversion of the laser medium. There are CO 2 lasers and excimer lasers that return the gas that has become high temperature to a fan after cooling it with a heat exchanger.

【0003】[0003]

【発明が解決しようとする課題】上記ガスレーザ装置に
おいて、レーザ発振の長寿命化を阻害する要因の一つに
光学系の汚れが挙げられる。レーザ発振を繰り返すこと
によって生成される粉体の化合物等がウインドウに付着
すると、透過率が低下し、レーザ出力の低下を招く。こ
の対策として特公昭60−26312やUSP−501
8161は、フィルタによって清浄化したガスをウイン
ドウ表面に強制的に吹きつけているが、塵を含むレーザ
媒質ガスを巻き込まないようにするため多量のパージ流
量が必要である。一方、特公昭58−186985は、
ウインドウ領域に清浄化したガスの入口を設け、放電管
のガス出口から電気集塵装置と休止ゾーンとを介して前
記ガス入口に至るガス循環路を設けて、ウインドウを清
浄なガスで洗浄する方式であるが、前記ガス循環路は放
電管の外部に設置されているため、キャビティ長の増
大、配管接続部からのリークの可能性などの問題点があ
る。また従来、アパーチャはチャンバの外側、すなわち
大気側に配設されていたので、パージしないと汚れる、
紫外光と雰囲気ガスとによってアパーチャが反応して劣
化または不純物を発生して周囲の光学部品を汚損する等
の問題がある。本発明は上記従来の問題点に着目してな
されたもので、ウインドウを清浄な状態に保つために多
量のパージガスを必要とせず、キャビティ長の増大、配
管接続部からのリークの可能性などの問題発生がなく、
かつアパーチャの劣化を防止することができるようなガ
スレーザ装置を提供することを目的としている。
In the gas laser device described above, one of the factors that hinders the extension of the laser oscillation life is contamination of the optical system. If a powdery compound or the like produced by repeating laser oscillation adheres to the window, the transmittance is lowered, and the laser output is lowered. As measures against this, Japanese Patent Publication No. 60-26312 and USP-501.
The 8161 forcibly blows the gas cleaned by the filter onto the window surface, but a large amount of purge flow rate is required to prevent the laser medium gas containing dust from being entrained. On the other hand, Japanese Examined Japanese Patent Publication Sho 58-186985
A method of cleaning the window with a clean gas by providing a purified gas inlet in the window region and providing a gas circulation path from the gas outlet of the discharge tube to the gas inlet through the electrostatic precipitator and the rest zone. However, since the gas circulation path is installed outside the discharge tube, there are problems such as an increase in the cavity length and the possibility of leakage from the pipe connecting portion. In addition, conventionally, the aperture was arranged outside the chamber, that is, on the atmosphere side, so if it is not purged, it becomes dirty.
There is a problem that the aperture reacts with the ultraviolet light and the atmospheric gas to deteriorate or generate impurities to stain the surrounding optical components. The present invention has been made in view of the above-mentioned conventional problems, and does not require a large amount of purge gas to keep the window in a clean state, and increases the cavity length and the possibility of leakage from the pipe connection portion. There is no problem,
Moreover, it is an object of the present invention to provide a gas laser device capable of preventing the deterioration of the aperture.

【0004】[0004]

【課題を解決するための手段】上記目的を達成するため
本発明に係るガスレーザ装置は、ラビリンスを収納する
副室をウインドウの内側のレーザ光路上に設け、除塵装
置によって清浄化したレーザ媒質ガスを前記副室に導入
して静圧に戻した上、前記ラビリンスを経てチャンバ内
に導入する構成とし、このような構成において、レーザ
媒質ガス中に浮遊する塵を除塵装置によって除去し、前
記除塵装置から副室に至るレーザ媒質ガス導入路をチャ
ンバの側壁に内蔵した。また、レーザ光を整形するアパ
ーチャを取着する場合は、ウインドウの内側近傍の清浄
なレーザ媒質ガス雰囲気内に配設するものとした。
In order to achieve the above object, a gas laser device according to the present invention provides a sub chamber for accommodating a labyrinth on a laser optical path inside a window, and a laser medium gas cleaned by a dust removing device is used. Introduced into the sub-chamber, returned to static pressure, and then introduced into the chamber via the labyrinth. In such a configuration, dust floating in the laser medium gas is removed by a dust remover, and the dust remover is used. The laser medium gas introduction path from the chamber to the sub chamber is built in the side wall of the chamber. Further, when the aperture for shaping the laser light is attached, it is arranged in a clean laser medium gas atmosphere near the inside of the window.

【0005】[0005]

【作用】上記構成によれば、ラビリンスを収納する副室
をウインドウの内側のレーザ光路上に設け、除塵装置に
よって清浄化したレーザ媒質ガスをラビリンスあるいは
ウインドウの内側に直接導入せず、いったん副室に導入
して静圧に回復させた後、前記ラビリンスを経てチャン
バ内に導入することにしたので、ウインドウの内側近傍
には常に清浄なレーザ媒質ガスを滞留させることができ
る。従って、塵を含むレーザ媒質ガスが前記ウインドウ
の内面に到達することはなく、多量のパージガスをウイ
ンドウに吹きつけなくてもウインドウ表面を清浄に保こ
とができる。また、除塵装置から前記副室に至るガス導
入路をチャンバの側壁に内蔵したので、キャビティ長の
増大、配管接続部からのリークの可能性などの問題が起
こらない。更に、レーザ光を整形するアパーチャを取着
する場合は、ウインドウ近傍の清浄なレーザ媒質ガス雰
囲気内に配設することにしたので、アパーチャの汚損、
劣化あるいは不純物発生による周囲の光学部品の汚損等
の問題発生を防止することができる。
According to the above construction, the sub chamber for accommodating the labyrinth is provided on the laser optical path inside the window, and the laser medium gas cleaned by the dust removing device is not directly introduced into the labyrinth or the inside of the window, but once the sub chamber is operated. Since it is introduced into the chamber through the labyrinth after being introduced into the chamber to recover the static pressure, a clean laser medium gas can always be retained near the inside of the window. Therefore, the laser medium gas containing dust does not reach the inner surface of the window, and the window surface can be kept clean without blowing a large amount of purge gas on the window. Further, since the gas introduction path from the dust removing device to the sub chamber is built in the side wall of the chamber, problems such as an increase in cavity length and a possibility of leakage from the pipe connecting portion do not occur. Further, when the aperture for shaping the laser light is attached, since it is arranged in a clean laser medium gas atmosphere near the window, contamination of the aperture,
It is possible to prevent problems such as contamination of surrounding optical components due to deterioration or generation of impurities.

【0006】[0006]

【実施例】以下に本発明に係るガスレーザ装置の実施例
について、図面を参照して説明する。図1はエキシマレ
ーザ装置の構造を模式的に示す断面図、図2は図1のP
部拡大図である。これらの図において、1は所定のガス
を封入するチャンバ、2はファン、3,4は主電極、5
はファン駆動用モータ、6はウインドウ、7はウインド
ウホルダ、8はラビリンスである。前記チャンバ1には
ダストフィルタケース9が連結され、チャンバ1とダス
トフィルタケース9とは、光軸方向のほぼ中央に設けら
れたダストフィルタ入口10と、チャンバ1の両端の壁
面内に設けられたガス導入路11とダストフィルタケー
ス9の両端に設けられたダストフィルタ出口12とによ
って連通している。前記ダストフィルタケース9内に
は、フロント側ウインドウ用、リア側ウインドウ用のフ
ィルタ13がそれぞれ配設されている。
Embodiments of the gas laser device according to the present invention will be described below with reference to the drawings. FIG. 1 is a cross-sectional view schematically showing the structure of the excimer laser device, and FIG. 2 is P of FIG.
FIG. In these figures, 1 is a chamber for enclosing a predetermined gas, 2 is a fan, 3 and 4 are main electrodes, 5
Is a fan driving motor, 6 is a window, 7 is a window holder, and 8 is a labyrinth. A dust filter case 9 is connected to the chamber 1, and the chamber 1 and the dust filter case 9 are provided in a dust filter inlet 10 provided substantially at the center in the optical axis direction and inside wall surfaces of both ends of the chamber 1. The gas introduction path 11 and the dust filter outlets 12 provided at both ends of the dust filter case 9 communicate with each other. Inside the dust filter case 9, filters 13 for the front window and the rear window are arranged.

【0007】レーザ媒質ガスはファン2の駆動によって
主電極3,4間を流れ、主電極3,4間のガスを吹き払
った後、図示しない熱交換器で冷却されて再びファン2
に戻る。このファン2によって生じる圧力差を利用して
ダストフィルタケース9内に流れを発生させ、レーザ媒
質ガスは前記ダストフィルタ入口10からダストフィル
タケース9内に入り、フィルタ13を通過することによ
って濾過される。ダストフィルタ出口12を出た清浄な
ガスは、チャンバ壁面内のガス導入路11を通り、図2
に示すようにラビリンス8を収納する副室14に入る。
副室14はレーザ光路上に設けられ、流入したガスの流
れを静定させるバッファ領域Bを形成している。ここで
静圧に回復したガスは、ウインドウ6の内面近傍の静定
領域Aの部分に滞留する清浄なガスを動かすことなく、
ラビリンス8を通過してチャンバ1内の放電領域Cすな
わち主電極3,4の方向に流れる。従って、塵を含む放
電領域Cのガスがウインドウ6に向かって流入すること
を防止する。
The laser medium gas flows between the main electrodes 3 and 4 by driving the fan 2, blows off the gas between the main electrodes 3 and 4, and then is cooled by a heat exchanger (not shown) and is again fan 2.
Return to. The pressure difference generated by the fan 2 is used to generate a flow in the dust filter case 9, and the laser medium gas enters the dust filter case 9 from the dust filter inlet 10 and is filtered by passing through the filter 13. . The clean gas that has exited the dust filter outlet 12 passes through the gas introduction passage 11 in the chamber wall surface, as shown in FIG.
As shown in, the sub-chamber 14 for accommodating the labyrinth 8 is entered.
The sub-chamber 14 is provided on the laser optical path and forms a buffer region B for stabilizing the flow of the inflowing gas. Here, the gas that has returned to the static pressure does not move the clean gas that remains in the statically determinable region A near the inner surface of the window 6,
It flows through the labyrinth 8 toward the discharge region C in the chamber 1, that is, in the direction of the main electrodes 3 and 4. Therefore, the gas in the discharge region C containing dust is prevented from flowing toward the window 6.

【0008】図3は、アパーチャを取着した請求項3の
ガスレーザ装置のウインドウ近傍の断面図である。アパ
ーチャ15は、ウインドウホルダ7の段付き穴の底面、
すなわち上記静定領域Aとバッファ領域Bとの境界面に
取着されている。従って、アパーチャ15は常に清浄な
レーザ媒質ガス雰囲気中にあるため、材質を選ぶことに
より汚損、劣化等の不具合が起こらない。例えば、フッ
素をレーザ媒質ガスに用いるエキシマレーザ装置ではア
ルミニウムにNiめっきを施したアパーチャを用いると
良好な結果が得られる。また、アパーチャ15は静定領
域Aとバッファ領域Bとを分離する仕切りとしての機能
も備え、領域Aをさらに安定に保つことが出来る。
FIG. 3 is a cross-sectional view of the vicinity of the window of the gas laser device according to claim 3 in which the aperture is attached. The aperture 15 is the bottom of the stepped hole of the window holder 7,
That is, it is attached to the boundary surface between the statically determined area A and the buffer area B. Therefore, since the aperture 15 is always in a clean laser medium gas atmosphere, problems such as contamination and deterioration do not occur by selecting the material. For example, in an excimer laser device in which fluorine is used as a laser medium gas, good results can be obtained by using an aperture of Ni plated on aluminum. Further, the aperture 15 also has a function as a partition that separates the static determination area A and the buffer area B, and the area A can be kept more stable.

【0009】[0009]

【発明の効果】以上説明したように、本発明によれば次
の効果が得られる。 (1)ウインドウの内側のレーザ光路上にラビリンスを
収納する副室を設け、除塵装置によって清浄化したレー
ザ媒質ガスを前記副室に導入して静定した上、前記ラビ
リンスを経てチャンバ内に導入することにしたので、ウ
インドウの内側近傍には常に清浄なレーザ媒質ガスを滞
留させることができる。従って、放電領域に浮遊する塵
を含むレーザ媒質ガスが前記ウインドウの内面に到達す
ることはなく、多量のパージガスをウインドウに吹きつ
けなくてもウインドウ表面を常に清浄に保ことができ
る。 (2)除塵装置から副室に至るレーザ媒質ガス導入路を
チャンバの側壁に内蔵したので、キャビティ長の増大、
配管接続部からのリークの可能性などの問題が起こらな
い。 (3)レーザ光を整形するアパーチャを取着する場合
は、ウインドウの内側近傍の清浄なレーザ媒質ガス雰囲
気内に配設することにしたので、アパーチャの汚損、劣
化あるいは不純物発生による周囲の光学部品の汚損等の
問題発生を防止することができるとともに、アパーチャ
専用のパージ機構を必要としない。また、アパーチャの
おかれる雰囲気レーザ媒質ガスが完全ドライであり、化
学反応を起こす可能性のあるガスはハロゲンのみである
から、アパーチャの材質選定が容易になる。更に、アパ
ーチャを上記静定領域Aとバッファ領域Bとの境界面に
取着することにより、静定領域内の清浄な媒質ガスをよ
り安定に保つことができるので、ウインドウの汚れ防止
効果が増大する。
As described above, according to the present invention, the following effects can be obtained. (1) A sub-chamber for accommodating the labyrinth is provided on the laser optical path inside the window, and the laser medium gas cleaned by the dust removing device is introduced into the sub-chamber and allowed to settle, and then introduced into the chamber through the labyrinth. Therefore, the clean laser medium gas can always stay in the vicinity of the inside of the window. Therefore, the laser medium gas containing dust floating in the discharge region does not reach the inner surface of the window, and the window surface can always be kept clean without blowing a large amount of purge gas on the window. (2) Since the laser medium gas introduction path from the dust remover to the sub chamber is built in the side wall of the chamber, the cavity length increases,
Problems such as the possibility of leaks from the pipe connections do not occur. (3) When the aperture for shaping the laser beam is attached, since it is arranged in a clean laser medium gas atmosphere near the inside of the window, the surrounding optical parts due to contamination, deterioration of the aperture or generation of impurities. It is possible to prevent the occurrence of problems such as stains and the like, and there is no need for a purge mechanism dedicated to the aperture. Further, since the atmosphere laser medium gas in which the aperture is placed is completely dry and the only gas that may cause a chemical reaction is halogen, selection of the material of the aperture becomes easy. Further, by attaching the aperture to the boundary surface between the statically-determining region A and the buffer region B, the clean medium gas in the statically-determining region can be kept more stable, so that the effect of preventing the window from becoming dirty is increased. To do.

【図面の簡単な説明】[Brief description of drawings]

【図1】ガスレーザ装置の構造を模式的に示す断面図で
ある。
FIG. 1 is a sectional view schematically showing the structure of a gas laser device.

【図2】図1のP部拡大図である。FIG. 2 is an enlarged view of a P part in FIG.

【図3】アパーチャを取着したガスレーザ装置のウイン
ドウ近傍の断面図である。
FIG. 3 is a cross-sectional view near a window of a gas laser device having an aperture attached.

【符号の説明】[Explanation of symbols]

1 チャンバ 6 ウインドウ 8 ラビリンス 9 ダストフィルタケース 11 ガス導入路 13 フィルタ 14 副室 15 アパーチャ 1 Chamber 6 Window 8 Labyrinth 9 Dust Filter Case 11 Gas Inlet 13 Filter 14 Sub-chamber 15 Aperture

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 ガスレーザ装置において、ラビリンスを
収納する副室をウインドウの内側のレーザ光路上に設
け、除塵装置によって清浄化したレーザ媒質ガスを前記
副室に導入して静圧に戻した上、前記ラビリンスを経て
チャンバ内に導入することを特徴とするガスレーザ装
置。
1. In a gas laser device, a sub-chamber for accommodating a labyrinth is provided on a laser optical path inside a window, and a laser medium gas cleaned by a dust remover is introduced into the sub-chamber to return to a static pressure. A gas laser device characterized by being introduced into a chamber through the labyrinth.
【請求項2】 レーザ媒質ガス中に浮遊する塵を除塵装
置によって除去し、前記除塵装置から副室に至るレーザ
媒質ガス導入路をチャンバの側壁に内蔵したことを特徴
とする請求項1のガスレーザ装置。
2. The gas laser according to claim 1, wherein dust floating in the laser medium gas is removed by a dust remover, and a laser medium gas introduction path from the dust remover to the sub chamber is built in a side wall of the chamber. apparatus.
【請求項3】 レーザ光を整形するアパーチャを、ウイ
ンドウの内側近傍の清浄なレーザ媒質ガス雰囲気内に配
設したことを特徴とする請求項1のガスレーザ装置。
3. The gas laser device according to claim 1, wherein the aperture for shaping the laser beam is arranged in a clean laser medium gas atmosphere near the inside of the window.
JP4321249A 1992-10-15 1992-11-05 Gas laser device Expired - Lifetime JP2784706B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP4321249A JP2784706B2 (en) 1992-11-05 1992-11-05 Gas laser device
US08/136,448 US5373523A (en) 1992-10-15 1993-10-14 Excimer laser apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4321249A JP2784706B2 (en) 1992-11-05 1992-11-05 Gas laser device

Publications (2)

Publication Number Publication Date
JPH06152030A true JPH06152030A (en) 1994-05-31
JP2784706B2 JP2784706B2 (en) 1998-08-06

Family

ID=18130476

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4321249A Expired - Lifetime JP2784706B2 (en) 1992-10-15 1992-11-05 Gas laser device

Country Status (1)

Country Link
JP (1) JP2784706B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7819945B2 (en) * 2008-10-30 2010-10-26 Cymer, Inc. Metal fluoride trap
US11168193B2 (en) 2018-07-30 2021-11-09 3M Innovative Properties Company Foams and methods of making
WO2023040226A1 (en) * 2021-09-14 2023-03-23 北京科益虹源光电技术有限公司 Dustproof structure for light emergent window sheet of laser, and laser

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59176172U (en) * 1983-05-11 1984-11-24 株式会社ダイヘン laser oscillator
JPS63108786A (en) * 1986-10-25 1988-05-13 Hitachi Ltd Gas laser generator
JPH02288385A (en) * 1989-04-28 1990-11-28 Mitsubishi Heavy Ind Ltd Gas laser device
JPH03200386A (en) * 1989-12-27 1991-09-02 Matsushita Electric Ind Co Ltd Excimer laser apparatus

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59176172U (en) * 1983-05-11 1984-11-24 株式会社ダイヘン laser oscillator
JPS63108786A (en) * 1986-10-25 1988-05-13 Hitachi Ltd Gas laser generator
JPH02288385A (en) * 1989-04-28 1990-11-28 Mitsubishi Heavy Ind Ltd Gas laser device
JPH03200386A (en) * 1989-12-27 1991-09-02 Matsushita Electric Ind Co Ltd Excimer laser apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7819945B2 (en) * 2008-10-30 2010-10-26 Cymer, Inc. Metal fluoride trap
US11168193B2 (en) 2018-07-30 2021-11-09 3M Innovative Properties Company Foams and methods of making
WO2023040226A1 (en) * 2021-09-14 2023-03-23 北京科益虹源光电技术有限公司 Dustproof structure for light emergent window sheet of laser, and laser

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