JPH06151327A - Member for thin-film manufacturing apparatus - Google Patents
Member for thin-film manufacturing apparatusInfo
- Publication number
- JPH06151327A JPH06151327A JP4300944A JP30094492A JPH06151327A JP H06151327 A JPH06151327 A JP H06151327A JP 4300944 A JP4300944 A JP 4300944A JP 30094492 A JP30094492 A JP 30094492A JP H06151327 A JPH06151327 A JP H06151327A
- Authority
- JP
- Japan
- Prior art keywords
- film manufacturing
- manufacturing apparatus
- thin
- tray
- glassy carbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、主として電子部品の製
造に用いられるトレイ、均熱板等の薄膜製造及び加工装
置の部材に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a member of a thin film manufacturing and processing apparatus such as a tray and a heat equalizing plate mainly used for manufacturing electronic parts.
【0002】[0002]
【従来の技術】従来、電子部品等の薄膜製造加工装置に
おいて、そのトレイや均熱板にはステンレスや高ニッケ
ル系の合金が使用されていた。これは、トレイや均熱板
が、腐食性雰囲気において耐食性が高いこと、真空
内の特性が良好なこと(特に脱ガスや不純物が少ないこ
と)、電気伝導度が良好なこと、熱膨張の小さいこ
と、一定値以上の熱伝導性を有すること、発塵の少
ないこと等の要求を満足していなければならないため、
金属材料が選択されていたことによる。しかし、薄膜を
製造加工する際にはトレイ、トレイに装着された基板
(以下、基板と略す)及び均熱板を適切な温度まで加
熱、冷却する必要がある。現状は室温から300℃まで
の加熱に約20分、300℃から100℃まで冷却する
のに約15分の時間を要していた。従来は、加熱や冷却
に要する時間を短縮するためには、加熱や冷却に使用す
るチャンバーを増設する対応を余儀なくされていた。2. Description of the Related Art Conventionally, in a thin film manufacturing / processing apparatus for electronic parts and the like, stainless steel or a high nickel alloy has been used for its tray and soaking plate. This is because the tray and soaking plate have high corrosion resistance in a corrosive atmosphere, good characteristics in vacuum (especially low degassing and impurities), good electrical conductivity, and low thermal expansion. In addition, it must meet the requirements of high thermal conductivity above a certain value and low dust generation.
This is because the metal material was selected. However, when manufacturing and processing a thin film, it is necessary to heat and cool the tray, the substrate (hereinafter abbreviated as substrate) mounted on the tray, and the soaking plate to an appropriate temperature. Currently, it takes about 20 minutes to heat from room temperature to 300 ° C. and about 15 minutes to cool from 300 ° C. to 100 ° C. In the past, in order to shorten the time required for heating and cooling, it was inevitable to increase the number of chambers used for heating and cooling.
【0003】[0003]
【発明が解決しようとする課題】従来の金属製のトレイ
や均熱板は、材質の密度が大きいため、装置の大型化
に伴いトレイ重量が大きくなる、材質の比熱と密度と
の積(熱容量)が大きいために暖まり難く、また冷め難
い、という欠点を持っている。そして、は装置全体の
大型化、大重量化、高価格化を招く。また、のために
現状のトレイ式薄膜製造加工装置では加熱及び冷却に長
い時間を要する。従って、従来装置のスループット向上
のためには、加熱及び冷却のチャンバーを増設するなど
の措置を講ずる必要があり、高価格化や装置設置面積の
増大等の弊害が発生していた。本発明は、前記した6種
の要求を満足し、かつ軽量化及び低熱容量化されたトレ
イや均熱板のような薄膜製造装置用部材を提供すること
を目的とする。Since the conventional metal trays and heat equalizing plates have a high density of materials, the weight of the trays increases as the size of the apparatus increases, and the product of the specific heat and the density (heat capacity) of the materials ) Is large, it is difficult to heat up and it is difficult to cool down. Then, this leads to an increase in size, weight and cost of the entire device. In addition, because of this, a long time is required for heating and cooling in the current tray type thin film manufacturing / processing apparatus. Therefore, in order to improve the throughput of the conventional device, it is necessary to take measures such as adding a heating and cooling chamber, which causes problems such as high price and increase in device installation area. It is an object of the present invention to provide a member for a thin film manufacturing apparatus, such as a tray or a heat equalizing plate, which satisfies the above-mentioned six kinds of requirements and has a reduced weight and a low heat capacity.
【0004】[0004]
【課題を解決するための手段】本発明者らは、トレイ、
均熱板等の薄膜製造装置用部材の最適材質について多角
的に検討を重ねた結果、金属材料に比較して密度が小さ
く、また熱容量も小さい材料であるガラス状炭素を用い
ることにより、前記した問題を解決できる事実を確認
し、本発明に到達した。本発明は、ガラス状炭素からな
る薄膜製造装置用部材に関する。The inventors of the present invention have proposed a tray,
As a result of a multifaceted study on the optimum material of the thin film manufacturing apparatus member such as a heat equalizing plate, the density of the material is smaller than that of a metal material, and the glassy carbon, which is a material having a small heat capacity, is used. After confirming the fact that the problem can be solved, the present invention has been completed. TECHNICAL FIELD The present invention relates to a member for a thin film manufacturing apparatus made of glassy carbon.
【0005】本発明におけるガラス状炭素は、フラン樹
脂、フェノール樹脂等の熱硬化性樹脂又はこれらの混合
樹脂を均一肉厚の平板に成形硬化し、次いで不活性ガス
雰囲気中で1000℃程度の温度で焼成炭化し、更に必
要に応じて3000℃までの温度で黒鉛化処理して得ら
れる。また、必要に応じて取り付け穴等を加工する。こ
のようにして製造したガラス状炭素からなる薄膜製造装
置用部材は、優れた熱安定性、化学的安定性、非発塵
性、軽量等の適合物性を具備している。The glassy carbon in the present invention is obtained by molding and curing a thermosetting resin such as a furan resin or a phenol resin, or a mixed resin thereof into a flat plate having a uniform thickness, and then in an inert gas atmosphere at a temperature of about 1000.degree. It is obtained by carbonizing by firing at, and graphitizing at a temperature of up to 3000 ° C. if necessary. Also, mounting holes and the like are processed as necessary. The member for a thin film manufacturing apparatus made of glassy carbon thus manufactured has suitable physical properties such as excellent thermal stability, chemical stability, non-dust generation and light weight.
【0006】[0006]
【実施例】次に本発明の実施例を説明する。フラン樹脂
から、かさ密度が1.49g/cm3、ショア硬さ11
0、曲げ強さ1200kg/cm2、電気比抵抗4200μ
Ω−cmの物理特性を有するガラス状炭素で、寸法が6×
920×1000(mm)の図1に示すトレイ1及び3×
300×400(mm)の均熱板2を製作した。また、比
較例として、SUS430を加工して同じ寸法のトレイ
及び均熱板を製作した。EXAMPLES Examples of the present invention will be described below. From furan resin, bulk density is 1.49g / cm 3 , Shore hardness is 11
0, bending strength 1200kg / cm 2 , electrical resistivity 4200μ
Glassy carbon with physical properties of Ω-cm, size 6 ×
Tray 1 and 3 × shown in FIG. 1 of 920 × 1000 (mm)
A soaking plate 2 of 300 × 400 (mm) was manufactured. As a comparative example, SUS430 was processed to manufacture a tray and a heat equalizing plate having the same size.
【0007】前記均熱板2を液晶用ガラス基板3と共に
図1に示すようにトレイ1に嵌め込み、プラズマCVD
装置にセットし、rf電源周波数13.56MHz、反
応ガスSiH4及びH2、圧力100Paの条件で、赤外線
ランプの加熱器5及び反射板4を持つ加熱機構から基板
3に加熱エネルギー6を照射して300℃に加熱し、α
−Siの薄膜形成を行った。その結果、ガラス状炭素の
トレイ及び均熱板には比較例のSUS430のものと同
等のα−Si膜の形成がなされた。また、同一装置を用
い、水素を導入して100Paに軸封し、トレイ1、均
熱板2及び基板3に対し、単位面積当り0.54W/cm
2及び1.1W/cm2の加熱エネルギー6を照射したとき
の、トレイ及び均熱板を20℃から300℃まで昇温さ
せるのに要する時間を測定した。ここで、均熱板の温度
は真空槽の外から挿入した熱電対7によって測定した。
一方、トレイ及び均熱板について材質別の重量の比較を
行った。これらの結果を表1に示す。なお、表中の均熱
板は4枚の重量を示す(1枚のトレイに4枚の均熱板を
使用した)。The soaking plate 2 and the glass substrate 3 for liquid crystal are fitted in the tray 1 as shown in FIG.
The substrate 3 is irradiated with heating energy 6 from a heating mechanism having an infrared lamp heater 5 and a reflector 4 under the conditions of rf power supply frequency 13.56 MHz, reaction gases SiH 4 and H 2 , and pressure 100 Pa. And heat to 300 ° C
A thin film of -Si was formed. As a result, an α-Si film equivalent to that of SUS430 of Comparative Example was formed on the glassy carbon tray and the heat equalizing plate. Also, using the same device, hydrogen was introduced and shaft-sealed to 100 Pa, and 0.54 W / cm per unit area for the tray 1, soaking plate 2 and substrate 3.
The time required to raise the temperature of the tray and the soaking plate from 20 ° C. to 300 ° C. when the heating energy 6 of 2 and 1.1 W / cm 2 was applied was measured. Here, the temperature of the soaking plate was measured by a thermocouple 7 inserted from the outside of the vacuum chamber.
On the other hand, the weights of the trays and the heat equalizing plates were compared by material. The results are shown in Table 1. The heat equalizing plates in the table indicate the weight of four sheets (four trays were used for one tray).
【0008】[0008]
【表1】 [Table 1]
【0009】表1から、ガラス状炭素のものは従来の金
属製のものに比較して、加熱時間は約1/4に短縮され
ていることが明らかである。また、ガラス状炭素を使用
することにより、トレイで16.4kg、均熱板で9kg、
合計25.4kgの軽量化が図れたことになり、これは、
従来の金属(SUS430)に対し、80%の軽量化と
なる。From Table 1, it is clear that the heating time of glassy carbon is shortened to about 1/4 of that of conventional metal. Also, by using glassy carbon, the tray is 16.4 kg, the soaking plate is 9 kg,
This means that we have achieved a total weight reduction of 25.4 kg.
It is 80% lighter than the conventional metal (SUS430).
【0010】[0010]
【発明の効果】本発明によれば、トレイ、均熱板等の薄
膜製造装置用部材がガラス状炭素からなるので、装置の
機械的な構成を変えることなしに軽量化及び低熱容量化
が図れる。According to the present invention, since members for thin film manufacturing equipment such as trays and heat equalizing plates are made of glassy carbon, weight reduction and heat capacity reduction can be achieved without changing the mechanical structure of the equipment. .
【図1】トレイ及び均熱板の使用状態を示す図である。FIG. 1 is a diagram showing a usage state of a tray and a heat equalizing plate.
1…トレイ、2…均熱板、3…液晶用ガラス基板、4…
反射板、5…加熱器、6…加熱エネルギー、7…熱電対1 ... Tray, 2 ... Soaking plate, 3 ... Glass substrate for liquid crystal, 4 ...
Reflector, 5 ... Heater, 6 ... Heating energy, 7 ... Thermocouple
───────────────────────────────────────────────────── フロントページの続き (72)発明者 菊池 好洋 茨城県日立市鮎川町三丁目3番1号 日立 化成工業株式会社桜川工場内 (72)発明者 中山 憲一 茨城県日立市鮎川町三丁目3番1号 日立 化成工業株式会社桜川工場内 (72)発明者 池本 学 東京都府中市四谷5丁目8番1号 日電ア ネルバ株式会社内 (72)発明者 上田 仁 東京都府中市四谷5丁目8番1号 日電ア ネルバ株式会社内 (72)発明者 渡部 嘉 東京都府中市四谷5丁目8番1号 日電ア ネルバ株式会社内 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Yoshihiro Kikuchi 3-3-1 Ayukawa-cho, Hitachi-shi, Ibaraki Hitachi Chemical Co., Ltd. Sakuragawa factory (72) Inventor Kenichi Nakayama 3-chome, Ayukawa-cho, Hitachi-shi, Ibaraki 3-1 Hitachi Chemical Co., Ltd. Sakuragawa Plant (72) Inventor Manabu Ikemoto 5-8-1, Yotsuya, Fuchu-shi, Tokyo 8-1 Nichiden Anelva Co., Ltd. (72) Hitoshi Ueda 5-chome, Yotsuya, Fuchu-shi, Tokyo 8-1 Nichiden Anerva Co., Ltd. (72) Inventor Ka Watanabe 5-8-1, Yotsuya, Fuchu-shi, Tokyo Nichiden Anerva Co., Ltd.
Claims (1)
材。1. A member for a thin film manufacturing apparatus made of glassy carbon.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4300944A JPH06151327A (en) | 1992-11-11 | 1992-11-11 | Member for thin-film manufacturing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4300944A JPH06151327A (en) | 1992-11-11 | 1992-11-11 | Member for thin-film manufacturing apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH06151327A true JPH06151327A (en) | 1994-05-31 |
Family
ID=17890980
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4300944A Pending JPH06151327A (en) | 1992-11-11 | 1992-11-11 | Member for thin-film manufacturing apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06151327A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6725526B2 (en) * | 2002-01-14 | 2004-04-27 | Hitachi Global Storage Technologies Netherlands B.V. | Method of forming microsuspension assemblies for direct access storage devices |
-
1992
- 1992-11-11 JP JP4300944A patent/JPH06151327A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6725526B2 (en) * | 2002-01-14 | 2004-04-27 | Hitachi Global Storage Technologies Netherlands B.V. | Method of forming microsuspension assemblies for direct access storage devices |
US7170715B2 (en) | 2002-01-14 | 2007-01-30 | Hitachi Global Storage Technologies Netherlands B.V. | Microsuspension assemblies for direct access storage devices |
US7340823B2 (en) | 2002-01-14 | 2008-03-11 | Hitachi Global Storage Technologies Netherlands B.V. | Methods for forming head suspension assemblies |
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