JPH06126603A - Surface polishing method for cement hardened body - Google Patents

Surface polishing method for cement hardened body

Info

Publication number
JPH06126603A
JPH06126603A JP28017992A JP28017992A JPH06126603A JP H06126603 A JPH06126603 A JP H06126603A JP 28017992 A JP28017992 A JP 28017992A JP 28017992 A JP28017992 A JP 28017992A JP H06126603 A JPH06126603 A JP H06126603A
Authority
JP
Japan
Prior art keywords
polishing
rotary
cement
particle size
elements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28017992A
Other languages
Japanese (ja)
Inventor
Hiroyuki Harada
浩幸 原田
Toru Oyama
徹 大山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP28017992A priority Critical patent/JPH06126603A/en
Publication of JPH06126603A publication Critical patent/JPH06126603A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To obtain a really smooth surface in a short time with good efficiency and to lengthen the life of a rotary polishing element by bringing rotary polishing elements formed by holding and fixing hard polishing particles on the outer peripheral surface of a cylinder by electrodeposition plating into contact with the surface of a cement hardened body and allowing its relatively movement. CONSTITUTION:A rotary polishing element 1 is so constructed that polishing particles of one kind particle size per polishing element 1 such as a diamond particle #30, #60, #200 are held and fixed by electrodeposition nickel plating. In this case, two polishing elements 1 with #30 diamond and each one polishing element 1 for #60 and #200 are prepared and arranged in fixed positions in the order of roughness of particle size. A cement extruded building material 4 is transported in the direction of decreasing the particle size of the polishing element 1 and the polishing elements 1 are rotated in such a manner that the polishing elements with the same rotating direction are not adjacent to each other. Thus, the material is passed between the rotary polishing elements 1 and the roller conveyer 5 for instance at the relative speed of 10m/min to be surface-polished.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、セメント系押出成形建
材、ALCなどのセメント系硬化体の表面を平滑に研磨
する方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for smoothly polishing the surface of a cement-based extruded building material, a cement-based hardened material such as ALC.

【0002】[0002]

【従来の技術】従来、セメント系押出成形建材、ALC
などのセメント系硬化体の表面を研磨する方法として
は、図3に示すように回転体にサンドペーパーをエンド
レス状に取り付け、このサンドペーパーを硬化体の表面
に接触させる方法等があった。
2. Description of the Related Art Conventional cement-based extrusion molding materials, ALC
As a method of polishing the surface of the cement-based hardened body, there is a method in which sandpaper is attached endlessly to the rotating body as shown in FIG. 3 and the sandpaper is brought into contact with the surface of the hardened body.

【0003】[0003]

【発明が解決しようとする課題】しかし、サンドペーパ
ーを用いて研磨を行うと、一回でとれる研磨代が小さく
何回も研磨処理を重ねる必要がある上、サンドペーパー
は強度が小さいため、硬化体に強く押し付けることがで
きず、完全な平坦面が得られなかった。また紙や布など
への研磨粒の付着力が小さく、研磨粒自体の磨耗も速い
ので、研磨体の寿命が極めて短いという欠点もあった。
However, when sandpaper is used for polishing, the polishing allowance that can be taken at one time is small and it is necessary to repeat the polishing treatment many times. It could not be pressed strongly against the body and a perfect flat surface could not be obtained. Further, since the adhesion of the abrasive particles to the paper or cloth is small and the abrasive particles themselves are quickly worn, the life of the abrasive body is extremely short.

【0004】別法として、湿式による研磨方法も存在す
るが、研磨スピードが遅い上、上記の欠点は依然解決す
ることができなかった。以上の点に鑑みて本発明の課題
は、硬化体の研磨処理を完全に効率よく行うことが可能
なセメント系硬化体の表面を研磨する方法にある。
As another method, there is a wet polishing method, but the polishing speed is slow and the above-mentioned drawbacks have not been solved yet. In view of the above points, an object of the present invention is to provide a method for polishing the surface of a cement-based cured product, which allows the cured product to be completely and efficiently polished.

【0005】[0005]

【課題を解決するための手段】本発明は、円柱状体の外
周面に硬質研磨粒を電着メッキにより保持固定させてな
る回転研磨体をセメント硬化体の表面に接触させて相対
移動することを特徴とするセメント系硬化体の研磨方法
である。本発明でいうセメント系硬化体とは、セメント
系の材料を用いて成形、硬化させることによって得られ
るものであり、例えばセメント系押出成形建材や軽量気
泡コンクリート、コンクリートブロック、PC板などを
挙げることができる。
SUMMARY OF THE INVENTION According to the present invention, a rotary abrasive body, in which hard abrasive grains are held and fixed on the outer peripheral surface of a columnar body by electrodeposition plating, is brought into contact with the surface of a hardened cement body and relatively moved. And a method for polishing a cement-based hardened body. The cement-based hardened material in the present invention is obtained by molding and hardening using a cement-based material, and examples thereof include cement-based extrusion molded building materials, lightweight cellular concrete, concrete blocks, and PC boards. You can

【0006】本発明でいう硬質研磨粒としては、処理し
ようとする硬化体の硬度よりもある程度硬度の大きいも
のであれば構わないが、ダイアモンド、CBN、アルミ
ナ、炭化ケイ素、エメリー、ガーネット、珪石など固い
材質のものの方が一回でとれる研磨代が大きい点や回転
研磨体の寿命が長い点などから好ましいと言える。硬質
研磨粒の粒度は、研磨面に要求される表面の粗さにより
適宜選択される。たとえば、表面粗度がRa=3程度を
得るためには♯120(粒径150〜170μm)程度
の粒度が好ましく、Ra=2程度を得るためには♯20
0(粒径90〜110m)程度の粒度のものを用いると
好ましい。研磨代を多くとる必要がある場合、粒度の小
さい研磨粒を使用すると一回で研磨できる研磨代が小さ
く、研磨処理に多大な時間を要するので、粒度の粗いも
のであらかた研磨を行い、次段階でやや細かい粒度のも
ので研磨を行った後、最後に得ようとする表面粗度にあ
った粒度の研磨粒を用いて研磨を行えば、研磨代を多く
取りながらも表面精度の高い研磨面を効率よく得ること
ができる。
The hard abrasive grains referred to in the present invention may be those having a hardness to a certain extent greater than the hardness of the cured product to be treated, but diamond, CBN, alumina, silicon carbide, emery, garnet, silica stone, etc. It can be said that a hard material is preferable because it has a large polishing allowance at one time and has a long life of the rotary polishing body. The grain size of the hard abrasive grains is appropriately selected according to the surface roughness required for the polished surface. For example, a particle size of about # 120 (particle size 150 to 170 μm) is preferable to obtain a surface roughness Ra = 3, and a particle size of # 20 is preferable to obtain Ra = 2.
It is preferable to use particles having a particle size of about 0 (particle size 90 to 110 m). If it is necessary to take a large amount of polishing stock, the use of small-grain abrasive particles will reduce the polishing stock that can be polished at one time, and it will take a lot of time for the polishing process. After polishing with a finer grain size, if you polish with a grain size that matches the surface roughness you are trying to obtain at the end, you can obtain a large polishing allowance while maintaining a high surface precision. Can be obtained efficiently.

【0007】本発明の回転研磨体は、所定の形状に加工
された円柱状体の外周面に、前記の硬質研磨粒を電着メ
ッキによって保持固定させることにより得られる。円柱
状体の材質としては、セメント系硬化体へ適当な圧力を
もって接触させても変形等の不都合が生じない程度の強
度を持つものであり、金属を使用することが好ましい。
また、前記円柱状体に硬質研磨粒を電着メッキにより保
持固定するには、前記円柱状体を所定形状に加工後、表
面に硬質研磨粒を散布し、電着槽内で電着ニッケルメッ
キなどを行うことによって研磨粒を保持固定させる。
The rotary abrasive body of the present invention can be obtained by holding and fixing the above-mentioned hard abrasive grains on the outer peripheral surface of a cylindrical body processed into a predetermined shape by electrodeposition plating. As the material of the columnar body, it is preferable to use a metal because it has such strength that it does not cause any inconvenience such as deformation even if it is brought into contact with the cement-based hardened body with an appropriate pressure.
Further, in order to hold and fix the hard abrasive grains on the columnar body by electrodeposition plating, after processing the columnar body into a predetermined shape, the hard abrasive grains are sprinkled on the surface, and the electrodeposition nickel plating is performed in the electrodeposition tank. The abrasive grains are held and fixed by carrying out the above.

【0008】回転研磨体の形状は特に限定されないが、
幅は処理するセメント系硬化体の幅と同じか、またはそ
れより最大100mm程度大きめとし、直径は50〜5
00mm程度とすることが好ましい。さらに、前記円柱
状体の外周面にらせん状に溝を設けると、研磨粉を効率
よく排出することができる。前記回転研磨体は、1個ま
たは複数個を並列させ、セメント系硬化体に接触させる
と共に、回転研磨体を回転させながら両者を相対移動、
すなわち該回転研磨体を移動、あるいは硬化体自体を移
動、または双方を移動させることによって表面硬化処理
を行う。
The shape of the rotary abrasive is not particularly limited,
The width should be the same as the width of the hardened cementitious material to be treated, or a maximum of about 100 mm, and the diameter should be 50-5.
It is preferably about 00 mm. Further, by providing spiral grooves on the outer peripheral surface of the cylindrical body, the polishing powder can be efficiently discharged. One or a plurality of the rotary abrasive bodies are arranged in parallel and brought into contact with the cement-based hardened body, and the rotary abrasive bodies are relatively moved while rotating.
That is, the surface hardening treatment is performed by moving the rotary abrasive body, moving the hardened body itself, or moving both of them.

【0009】硬化体に研磨体を接触させる場合、適度な
圧力を加えて研磨体を接触させれば一回の研磨代をより
大きくすることができる。硬化体を移動させる場合ロー
ラーコンベア等を用いると、均一に処理を行うことがで
きるが、ローラーコンベアと回転研磨体の間隔を硬化体
の厚みよりやや小さめに設定すると、適当な圧力が硬化
体に掛かり、一回の研磨代をより大きくすることができ
る。
When the polishing body is brought into contact with the cured body, a single polishing allowance can be increased by applying an appropriate pressure to bring the polishing body into contact. When using a roller conveyor or the like to move the cured body, uniform treatment can be performed, but if the distance between the roller conveyor and the rotary polishing body is set to be slightly smaller than the thickness of the cured body, an appropriate pressure is applied to the cured body. Therefore, it is possible to further increase the polishing allowance for one time.

【0010】回転体の回転周速は500〜5000m/
min程度が好ましく、また相対移動速度は、5〜50
m/minが好ましい。複数の回転体を並列して研磨を
行う場合、全ての回転体を同方向に回転させると、ロー
ラーコンベア上を移動する硬化体を前進あるいは後退さ
せる力が働いてしまうので、同方向に回転する回転体が
隣合わないように並列させれば、前進及び後退させる力
が打ち消しあって、適正に研磨を行うことができる。さ
らにピンチローラー等を使用すれば、硬化体へ余分な前
進力あるいは後退力を阻止することができ、また硬化体
が反りを有していても研磨作業げ可能となり、好まし
い。
The peripheral speed of rotation of the rotating body is 500 to 5000 m /
min is preferable, and the relative moving speed is 5 to 50
m / min is preferable. When polishing multiple rotating bodies in parallel, rotating all the rotating bodies in the same direction causes a force to move forward or backward the cured body moving on the roller conveyor, so rotate in the same direction. If the rotating bodies are arranged side by side so as not to be adjacent to each other, the forces for advancing and retreating cancel each other out, and proper polishing can be performed. Further, it is preferable to use a pinch roller or the like because it is possible to prevent an excessive advancing force or a retreating force from being applied to the cured body, and polishing work can be performed even if the cured body has a warp.

【0011】[0011]

【作用】以上の構成にすると、一回にとれる研磨代が大
きくなり、真の平坦、平滑面を効率良く得ることができ
る。また、円柱状体がある程度の強度を持っているの
で、回転研磨体の寿命が長い。また、らせん状溝を回転
体に付与すれば、研磨粉を効率良く排出でき、排出工程
を新たに設けなくともよい。
With the above construction, the polishing allowance taken at one time becomes large, and a true flat and smooth surface can be efficiently obtained. Further, since the cylindrical body has a certain strength, the life of the rotary polishing body is long. Further, if the spiral groove is provided on the rotating body, the polishing powder can be efficiently discharged, and it is not necessary to newly provide a discharging step.

【0012】[0012]

【実施例】以下、実施例を示して本発明を詳細に説明す
る。
The present invention will be described in detail below with reference to examples.

【0013】[0013]

【実施例1】縦2500mm、横600mm、厚さ6
0.5〜62.0mmであり、表面にうねりを有するセ
メント系押出建材の表面を、以下の方法によって研磨処
理した。図1に本実施例で用いた回転研磨装置の側面図
を、図2には前記回転研磨装置の正面図を示す。1は回
転研磨体であり、それぞれ直径120mm、幅700m
mの円柱状体に♯30、♯60、♯200のダイアモン
ド粒が1個の回転体につき1種の粒度の研磨粒が、電着
ニッケルメッキによって保持固定されている。それぞれ
の円柱状体円周には5mm深のらせん状溝6が設けられ
ている。本実施例では、前記の♯30の回転体を2個、
♯60及び♯200の回転体を1個ずつ用意し、粗いも
のから順に定位置に並列させた。
[Embodiment 1] Length 2500 mm, width 600 mm, thickness 6
The surface of the cement-based extruded building material having a size of 0.5 to 62.0 mm and having waviness on the surface was polished by the following method. FIG. 1 shows a side view of the rotary polishing apparatus used in this embodiment, and FIG. 2 shows a front view of the rotary polishing apparatus. Reference numeral 1 is a rotary polishing body, each having a diameter of 120 mm and a width of 700 m.
Abrasive grains of # 30, # 60, and # 200 diamond grains of one kind per one rotating body are held and fixed to the cylindrical body of m by electrodeposition nickel plating. A spiral groove 6 having a depth of 5 mm is provided on the circumference of each cylindrical body. In this embodiment, the two # 30 rotating bodies are
The rotating bodies of # 60 and # 200 were prepared one by one, and were arranged in parallel in order from the coarse one at a fixed position.

【0014】図中の2はモーター、3はベルトであり、
回転研磨体1を駆動させる。4はセメント系押出建材で
あり、該セメント系押出建材は5のローラーコンベアに
よって回転体の粒度の粗いものから細かいものの方向へ
送られる。回転研磨体1とローラーコンベア5の間隔
は、粗いものから順に61.0mm、60.3mm、6
0.1mm、60.0mmとした。
In the figure, 2 is a motor, 3 is a belt,
The rotary polishing body 1 is driven. Reference numeral 4 is a cement-based extruded building material, and the cement-based extruded building material is fed by the roller conveyor 5 in the direction of coarse to fine particles of the rotating body. The intervals between the rotary abrasive 1 and the roller conveyor 5 are 61.0 mm, 60.3 mm, 6 in order from the coarse one.
It was set to 0.1 mm and 60.0 mm.

【0015】前記回転研磨体1は図のように回転方向が
同じものが隣合わないように、周速1100m/min
で回転させ、ローラーコンベア5上にセメント系押出建
材4を載置して、回転研磨体1とローラーコンベア5と
の間を10m/minの相対速度で通過させることによ
って表面研磨を行った。その結果、得られたセメント系
押出建材4の表面は均一に研磨され、Ra=2の粗度と
なった。この操作を同様に数十枚のパネルについて行っ
たが、付着されている研磨粒の脱落は観察されなかっ
た。
As shown in the figure, the rotary polishing body 1 has a peripheral speed of 1100 m / min so that those having the same rotation direction are not adjacent to each other.
Then, the cement-based extruded building material 4 was placed on the roller conveyor 5 and passed between the rotary polishing body 1 and the roller conveyor 5 at a relative speed of 10 m / min to perform surface polishing. As a result, the surface of the obtained cement-based extruded building material 4 was uniformly polished, and the roughness was Ra = 2. This operation was similarly performed on several tens of panels, but no drop of adhered abrasive grains was observed.

【0016】[0016]

【比較例1】実施例1の回転研磨体1のかわりに、図3
に示す研磨体を同数並列させた以外は、実施例1と同様
の装置を用意し、縦2500mm、横600mm、平均
厚さ60.5〜62mmであり、表面にうねりを有する
セメント系押出建材の表面を、実施例1と同様の方法に
よって研磨処理を行った。図3において、2はモーター
であり、4はセメント系押出建材、5はローラーコンベ
アー、7はサンドペーパーである。2個のモーターの周
囲に、幅700mmであり、♯30、♯60、♯200
の各粗度のサンドペーパー7を取り付けたものを、♯3
0のものについては2個、♯60及び♯200のものに
ついてはそれぞれ1個ずつ用意し、これらの回転体を、
粗いものから順に定位置に並列させた。後は実施例1と
同様にして研磨処理を行った。ところが、相対速度10
m/minにて前記装置を運転させたところ目詰まりを
起こしたため、相対速度を2m/minに落として研磨
処理を行った。
Comparative Example 1 Instead of the rotary abrasive body 1 of Example 1, FIG.
An apparatus similar to that of Example 1 was prepared except that the same number of the polishing bodies shown in FIG. 2 were arranged in parallel, and the length was 2500 mm, the width was 600 mm, the average thickness was 60.5 to 62 mm, and the surface of the cement-based extruded building material had undulations. The surface was polished by the same method as in Example 1. In FIG. 3, 2 is a motor, 4 is a cement-based extruded building material, 5 is a roller conveyor, and 7 is sandpaper. Around the two motors, with a width of 700 mm, # 30, # 60, # 200
# 3 with sandpaper 7 of each roughness
Prepare two for 0, one for # 60 and # 200, and use these rotating bodies.
The coarse ones were placed in parallel at fixed positions in order. Thereafter, the polishing treatment was performed in the same manner as in Example 1. However, relative speed 10
Since clogging occurred when the device was operated at m / min, the relative speed was reduced to 2 m / min to carry out the polishing treatment.

【0017】その結果、Ra=2の粗度に研磨されたセ
メント系押出建材が得られたが、数十枚のパネルについ
てこの処理を繰り返したところ、回転研磨体に付着され
ていた研磨粒が脱落した部分が見られた。また、セメン
ト系押出建材表面のうねりが依然として残っていた。
As a result, a cement-based extruded building material having a roughness of Ra = 2 was obtained. When this treatment was repeated for several tens of panels, the abrasive grains adhered to the rotary abrasive body were The part that fell out was seen. In addition, the undulations on the surface of the cement-based extruded building material still remained.

【0018】[0018]

【発明の効果】本発明の構成にすると、研磨粒が研磨の
摩擦力に耐えうる付着力をもって付着されており、ま
た、円柱状体がある程度の強度を持っているので、研磨
代を多く取ることが可能であり、短時間で真の平滑面を
効率良く得ることができる上、回転研磨体の寿命が長
い。
According to the constitution of the present invention, since the abrasive grains are adhered with an adhesive force capable of withstanding the frictional force of polishing, and the cylindrical body has a certain strength, a large polishing allowance is taken. It is possible to efficiently obtain a true smooth surface in a short time, and the life of the rotary polishing body is long.

【0019】さらに、前記回転研磨体にらせん状溝を設
ければ、研磨処理を行いながら研磨粉を除去することが
できる。
Further, by providing a spiral groove in the rotary polishing body, the polishing powder can be removed while performing the polishing process.

【図面の簡単な説明】[Brief description of drawings]

【図1】実施例で用いた回転研磨装置の側面図FIG. 1 is a side view of a rotary polishing apparatus used in Examples.

【図2】実施例で用いた回転研磨装置の正面図FIG. 2 is a front view of the rotary polishing apparatus used in the examples.

【図3】比較例で用いた回転研磨装置の側面図FIG. 3 is a side view of a rotary polishing device used in a comparative example.

【符号の説明】[Explanation of symbols]

1 回転研磨体 2 モーター 3 ベルト 4 セメント系押出建材 5 ローラーコンベア 6 らせん状溝 7 サンドペーパー 1 Rotary Abrasive 2 Motor 3 Belt 4 Cement-based Extruded Building Material 5 Roller Conveyor 6 Spiral Groove 7 Sandpaper

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 円柱状体の外周面に硬質研磨粒を電着メ
ッキによって保持固定させてなる回転研磨体をセメント
硬化体の表面に接触させて相対移動することを特徴とす
るセメント系硬化体の研磨方法
1. A cement-based hardened body characterized in that a rotating abrasive body, in which hard abrasive grains are held and fixed on the outer peripheral surface of a columnar body by electrodeposition plating, is brought into contact with the surface of the hardened cement body and moves relatively. Polishing method
JP28017992A 1992-10-19 1992-10-19 Surface polishing method for cement hardened body Pending JPH06126603A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28017992A JPH06126603A (en) 1992-10-19 1992-10-19 Surface polishing method for cement hardened body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28017992A JPH06126603A (en) 1992-10-19 1992-10-19 Surface polishing method for cement hardened body

Publications (1)

Publication Number Publication Date
JPH06126603A true JPH06126603A (en) 1994-05-10

Family

ID=17621401

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28017992A Pending JPH06126603A (en) 1992-10-19 1992-10-19 Surface polishing method for cement hardened body

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