JPH06124969A - Washing equipment of ic mold - Google Patents

Washing equipment of ic mold

Info

Publication number
JPH06124969A
JPH06124969A JP27586792A JP27586792A JPH06124969A JP H06124969 A JPH06124969 A JP H06124969A JP 27586792 A JP27586792 A JP 27586792A JP 27586792 A JP27586792 A JP 27586792A JP H06124969 A JPH06124969 A JP H06124969A
Authority
JP
Japan
Prior art keywords
mold
cleaning
cleaning member
package
spraying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP27586792A
Other languages
Japanese (ja)
Other versions
JP3190140B2 (en
Inventor
Yukito Matsubara
幸人 松原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Macoho Co Ltd
Original Assignee
Macoho Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Macoho Co Ltd filed Critical Macoho Co Ltd
Priority to JP27586792A priority Critical patent/JP3190140B2/en
Publication of JPH06124969A publication Critical patent/JPH06124969A/en
Application granted granted Critical
Publication of JP3190140B2 publication Critical patent/JP3190140B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To enable the effective washing of an IC mold, by installing a conveying part for conveying an IC mold in the upright state, and a washing material jetting part for jetting washing material against the IC mold. CONSTITUTION:The title washing equipment is provided with a conveying part 2 for conveying an IC mold in the upright state, and a washing material jetting part 3 for jetting power water containing abrasive grains against the IC mold. The washing material jetting part 3 for washing both side edge parts of the right and the left on the surface and the rear of an IC package on the surface and the rear of the IC mold is constituted of four nozzles 6AD, 6BC, 6'AD, 6'BC, two of which are arranged on the surface side as one pair and the other two of which are arranged on the rear side as the other pair. Thereby the upper and lower side edge parts on the surface and the rear of the IC package also can be washed. Further an interval changing mechanism 5 is installed which changes the interval between a pair of the nozzles 6AD, 6BC on the surface side and the interval between a pair of the nozzles 6'AD, 6'BC on the rear side. Thereby only the desired part positions can be washed without damaging the package.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、加圧水(砥粒を混入し
た加圧水の場合も含む。)を噴射してICモールドを洗
浄する(ウェットブラスト法,ショットブラスト法等と
呼ばれる。)ICモールドの洗浄装置に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an IC mold in which pressurized water (including pressurized water containing abrasive grains) is jetted to wash the IC mold (called a wet blast method, a shot blast method, etc.). The present invention relates to a cleaning device.

【0002】[0002]

【従来の技術】リードを突設したICパッケージを複数
個フレーム内に並設したICモールドに加圧水を噴射し
てICモールドを洗浄する(特にリードとICパッケー
ジとの連設部に付着しているバリを除去する)所謂ウェ
ットブラスト法に使用する従来装置は、例えば実開昭6
1−92538号のように、ICモールドを水平状態で
連続搬送させ、この連続状態で搬送されるICモールド
の表面若しくは表裏面の全面に加圧水を噴射して該IC
モールドを洗浄するものである。
2. Description of the Related Art A plurality of IC packages having protruding leads are sprayed onto an IC mold arranged in parallel in a frame to wash the IC mold (particularly, the IC package is attached to a connecting portion between the leads and the IC package). A conventional device used for the so-called wet blasting method (for removing burrs) is, for example, the actual open sho 6
No. 1-92538, the IC mold is continuously conveyed in a horizontal state, and pressurized water is jetted onto the entire front surface or front and back surfaces of the IC mold conveyed in this continuous state.
This is to clean the mold.

【0003】[0003]

【発明が解決しようとする課題】出願人は種々検討した
ところ、従来例には次の欠点があることを確認した。
As a result of various studies, the applicant has confirmed that the conventional example has the following drawbacks.

【0004】 従来例は、ICモールド全面に加圧水
を噴射せしめる構成であるから、砥粒含有加圧水を使用
した場合には、ICパッケージを損傷させてしまうとい
う欠点がある。
Since the conventional example has a configuration in which pressurized water is sprayed over the entire surface of the IC mold, there is a drawback that the IC package is damaged when the abrasive-containing pressurized water is used.

【0005】 従来例は、水平状態で搬送されるIC
モールドに加圧水を噴射せしめる為、噴射された加圧水
がICモールド表面から良好に排出されず、ICモール
ド表面に水膜が形成されたり、砥粒が付着したりして、
該水膜や砥粒により加圧水噴射による洗浄効果が低下し
てしまうという欠点がある。
The conventional example is an IC that is transported in a horizontal state.
Since the pressurized water is sprayed onto the mold, the sprayed pressurized water is not satisfactorily discharged from the IC mold surface, a water film is formed on the IC mold surface, or abrasive grains are attached,
There is a drawback that the cleaning effect by the pressurized water jet is reduced by the water film and the abrasive grains.

【0006】本発明は、このような欠点を解決したIC
モールドの洗浄装置を提供することを技術的課題とする
ものである。
The present invention is an IC which solves such drawbacks.
It is a technical object to provide a mold cleaning device.

【0007】[0007]

【課題を解決するための手段】添付図面を参照して本発
明の要旨を説明する。
The gist of the present invention will be described with reference to the accompanying drawings.

【0008】ICモールド1を搬送する搬送部2と、該
ICモールド1の所望部位に砥粒を含有した洗浄部材を
噴射する洗浄部材噴射部3とを備えて構成したICモー
ルドの洗浄装置に係るものである。
[0008] A cleaning device for an IC mold, comprising a carrying part 2 for carrying the IC mold 1 and a cleaning member spraying part 3 for spraying a cleaning member containing abrasive particles to a desired portion of the IC mold 1. It is a thing.

【0009】また、ICモールド1を起立状態で搬送す
る搬送部2と,該ICモールド1に洗浄部材を噴射する
洗浄部材噴射部3とを備えて構成したことを特徴とする
ICモールドの洗浄装置係るものである。
An IC mold cleaning apparatus characterized in that it comprises a carrying section 2 for carrying the IC mold 1 upright and a cleaning member spraying section 3 for spraying a cleaning member onto the IC mold 1. It is related.

【0010】また、請求項2記載のICモールドの洗浄
装置であって、ICモールド1の表面若しくは裏面にし
てICパッケージ1'の右側縁部Aを洗浄する洗浄部材
噴射部3を設け、該洗浄部材噴射部3の洗浄部位を上下
方向に移動せしめる移動機構を設け、該洗浄部材噴射部
3に回動機構4を具備せしめて該洗浄部材噴射部3によ
る洗浄部位を可変可能に設けることでICパッケージ
1'の上側縁部Cも洗浄可能に構成したことを特徴とす
るICモールドの洗浄装置に係るものである。
Further, in the IC mold cleaning apparatus according to claim 2, a cleaning member spraying section 3 for cleaning the right side edge A of the IC package 1'is provided on the front surface or the back surface of the IC mold 1, and the cleaning is performed. An IC is provided by providing a moving mechanism for vertically moving the cleaning part of the member spraying part 3, and providing the cleaning member spraying part 3 with a rotating mechanism 4 so that the cleaning part by the cleaning member spraying part 3 can be changed. The present invention relates to a cleaning device for an IC mold, characterized in that the upper edge C of the package 1'is also configured to be washable.

【0011】また、請求項2記載のICモールドの洗浄
装置であって、ICモールド1の表面若しくは裏面にし
てICパッケージ1'の右左両側縁部A,Bを洗浄する
2つの洗浄部材噴射部3を設け、該洗浄部材噴射部3の
洗浄部位を上下方向に移動せしめる移動機構を設け、該
2つの洗浄部材噴射部3に回動機構4を具備せしめて該
2つの洗浄部材噴射部3による洗浄部位を可変可能に設
けることでICパッケージ1'の上下側縁部C,Dも洗
浄可能に構成し、前記2つの洗浄部材噴射部3の間隔を
可変せしめる間隔可変機構5を設けて構成したことを特
徴とするICモールドの洗浄装置に係るものである。
Further, in the IC mold cleaning apparatus according to claim 2, two cleaning member spraying parts 3 for cleaning the right and left side edges A and B of the IC package 1'on the front surface or the back surface of the IC mold 1. And a moving mechanism for vertically moving the cleaning portion of the cleaning member spraying section 3 are provided, and the two cleaning member spraying sections 3 are provided with a rotating mechanism 4 to clean by the two cleaning member spraying sections 3. The upper and lower side edge portions C and D of the IC package 1 ′ can be cleaned by arranging the parts variably, and the interval changing mechanism 5 for changing the distance between the two cleaning member jetting parts 3 is provided. The present invention relates to an IC mold cleaning device.

【0012】[0012]

【作用】請求項1記載の発明に係る作用について説明す
る。
The operation of the invention according to claim 1 will be described.

【0013】洗浄部材には砥粒が存する為、それだけ洗
浄力が高まるとともにICモールド1の所望部位のみに
洗浄部材を噴射する構成であり、ICパッケージ1’に
は洗浄部材は噴射されない為、ICパッケージ1’にダ
メージを何ら与えることはない。
Since abrasive particles are present in the cleaning member, the cleaning power is increased and the cleaning member is sprayed only on a desired portion of the IC mold 1, and the IC package 1'is not sprayed with the cleaning member. No damage to package 1 '.

【0014】請求項2記載の発明に係る作用について説
明する。
The operation of the invention according to claim 2 will be described.

【0015】ICモールド1は起立状態で搬送される
為、洗浄部材噴射部3からICモールド1に噴射された
洗浄部材は自然流下し、該洗浄部材はICモールド1の
表裏面に残存しない。
Since the IC mold 1 is conveyed in an upright state, the cleaning member sprayed from the cleaning member spraying unit 3 onto the IC mold 1 naturally flows down, and the cleaning member does not remain on the front and back surfaces of the IC mold 1.

【0016】請求項3記載の発明に係る作用について説
明する。
The operation of the invention according to claim 3 will be described.

【0017】洗浄部材噴射部3の洗浄部位を移動機構に
より上下方向に移動させながら該洗浄部材噴射部3から
の洗浄部材により一つのICパッケージ1'の右側縁部
Aを洗浄し、搬送部2によりICモールド1を所定量搬
送し、同様に該ICパッケージ1'の左側縁部Bを洗浄
する。
While moving the cleaning portion of the cleaning member spraying unit 3 in the vertical direction by the moving mechanism, the cleaning member from the cleaning member spraying unit 3 cleans the right side edge A of one IC package 1 ', and the transport unit 2 The IC mold 1 is conveyed by a predetermined amount, and the left side edge portion B of the IC package 1'is washed in the same manner.

【0018】洗浄部材噴射部3を回動機構4により回動
せしめて洗浄部位を変更し、搬送部2によりICモール
ド1を搬送しながら該ICパッケージ1'の上側縁部
C,下側縁部Dを洗浄する。
The cleaning member injection part 3 is rotated by the rotating mechanism 4 to change the cleaning part, and the IC mold 1 is transferred by the transfer part 2 while the upper edge C and the lower edge of the IC package 1 '. Wash D.

【0019】請求項4記載の発明に係る作用について説
明する。
The operation of the invention according to claim 4 will be described.

【0020】2つの洗浄部材噴射部3の洗浄部位を移動
機構により上下方向に移動させながら該洗浄部材噴射部
3からの洗浄部材により一つのICパッケージ1'の右
左側縁部A,Bを洗浄し、搬送部2によりICモールド
1を所定量搬送し、同様に該ICパッケージ1'に隣接
するICパッケージ1'の右左側縁部A,Bを洗浄し、
同様にして並設されたすべてのICパッケージ1'の右
左側縁部A,Bを洗浄する。
The right and left edges A and B of one IC package 1'are cleaned by the cleaning member from the cleaning member spraying unit 3 while vertically moving the cleaning parts of the two cleaning member spraying units 3 by the moving mechanism. Then, a predetermined amount of the IC mold 1 is carried by the carrying unit 2, and the right and left edges A and B of the IC package 1 ′ adjacent to the IC package 1 ′ are washed in the same manner.
Similarly, the right and left edges A and B of all the IC packages 1'arranged side by side are cleaned.

【0021】続いて、2つの洗浄部材噴射部3を回動機
構4により回動せしめて洗浄部位を変更し、搬送部2に
よりICモールド1を搬送しながら、並設されたすべて
のICパッケージ1'の上側縁部C,下側縁部Dを洗浄
する。
Subsequently, the two cleaning member injection parts 3 are rotated by the rotating mechanism 4 to change the cleaning part, and while the IC mold 1 is transferred by the transfer part 2, all the IC packages 1 arranged side by side. The upper edge portion C and the lower edge portion D of the'are washed.

【0022】[0022]

【実施例】図面は、本発明の一実施例を図示したもの
で、本実施例の構造は次の通りである。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The drawings show one embodiment of the present invention, and the structure of this embodiment is as follows.

【0023】ICモールド1を起立状態で搬送する搬送
部2と、該ICモールド1に砥粒を含有せしめた加圧水
を噴射する洗浄部噴射部3を具備した洗浄装置であっ
て、ICモールド1の表面及び裏面にしてICパッケー
ジ1'の表裏の右左両側縁部A,Bを洗浄する洗浄部材
噴射部3としての表側で一組,裏側で一組合計2組4つ
のノズル6AD,6BC,6'AD,6'BCを設け、該
4つのノズル6AD,6BC,6'AD,6'BCの洗浄
部位を上下方向に移動せしめる移動機構を設け、該4つ
のノズル6AD,6BC,6'AD,6'BCに回動機構
4を具備せしめて該4つのノズル6AD,6BC,6'
AD,6'BCによる洗浄部位を可変可能に設けること
でICパッケージ1'の表裏の上下側縁部C,Dも洗浄
可能に構成し、前記表側の一組のノズル6ADと6BC
との間隔及び裏側の一組のノズル6'ADと6'BCとの
間隔を可変せしめる間隔可変機構5を設けたものであ
る。
A cleaning device comprising a carrying section 2 for carrying the IC mold 1 in an upright state, and a cleaning section spraying section 3 for spraying pressurized water containing abrasive grains in the IC mold 1. One set on the front side as the cleaning member spraying unit 3 for cleaning the right and left side edges A and B on the front and back sides of the IC package 1'on the front and back sides, one set on the back side, a total of two sets 4 nozzles 6AD, 6BC, 6 ' AD, 6'BC is provided, and a moving mechanism for vertically moving the cleaning portions of the four nozzles 6AD, 6BC, 6'AD, 6'BC is provided, and the four nozzles 6AD, 6BC, 6'AD, 6 are provided. 'The BC is equipped with the rotation mechanism 4 and the four nozzles 6AD, 6BC, 6'
By variably providing the cleaning portion by AD, 6'BC, the upper and lower side edge portions C, D of the IC package 1'can also be configured to be cleaned, and the pair of nozzles 6AD and 6BC on the front surface side
The distance varying mechanism 5 for varying the distance between the nozzles and the pair of nozzles 6'AD and 6'BC on the back side is provided.

【0024】以下詳述する。Details will be described below.

【0025】基台7の上方位置にチャンネンル溝を形成
した一対のガイドレール8,8'を所定の間隔Lを介存
せしめて横設する。
A pair of guide rails 8 and 8'having a channel groove formed above the base 7 are laterally provided with a predetermined space L therebetween.

【0026】尚、この間隔Lは、上側のガイドレール8
を適宜な手段により上動せしめることで可変可能に構成
する。
The distance L is set to the upper guide rail 8
Is configured to be variable by moving it up by an appropriate means.

【0027】下側のガイドレール8'の適当ケ所には切
欠窓部9が形成されている。
A notched window portion 9 is formed at an appropriate position on the lower guide rail 8 '.

【0028】また、基台7の所定ケ所には、上端に回転
輪10を設けた回動体11が対向状態一組にして4組立設さ
れている。
Further, at predetermined positions of the base 7, four rotating bodies 11 having a rotating wheel 10 provided at the upper end are assembled in a set so as to face each other.

【0029】この2本一組の回動体11の回転輪10は図
4,5に図示したようにICモールド1の表裏にして切
欠窓部9の位置で回動し、両回転輪10はICモールド1
が通過する間隙を介して対設せしめられている。
As shown in FIGS. 4 and 5, the rotating wheel 10 of the pair of rotating bodies 11 is rotated at the position of the notch window 9 on the front and back of the IC mold 1, and both rotating wheels 10 are IC. Mold 1
Are placed opposite to each other with a gap passing through.

【0030】ICモールド1の表側に位置する回転輪10
は上側が径大の回転輪10,下側が径小の回転輪10,また
ICモールド1の裏側に位置する回転輪10は逆に下側が
径大の回転輪10,上側が径小の回転輪10である。
Rotating wheel 10 located on the front side of the IC mold 1.
Is the rotating wheel 10 with a large diameter on the upper side, the rotating wheel 10 with a small diameter on the lower side, and the rotating wheel 10 located on the back side of the IC mold 1 is the rotating wheel with a large diameter on the lower side and the rotating wheel with a small diameter on the upper side. Is 10.

【0031】従って、ICモールド1は図4に図示した
ように裏側の径大の回転輪10上面に載置された状態で安
定的に搬送されることになる。
Therefore, as shown in FIG. 4, the IC mold 1 is stably conveyed while being mounted on the upper surface of the rotating wheel 10 having a large diameter on the back side.

【0032】尚、すべての回転輪10(回動体11)は図外
の駆動機構により同期して回動せしめられ、この回動
量,回動方向,回動時期・時間は適宜な制御機構により
制御される。
It should be noted that all the rotating wheels 10 (rotating bodies 11) are rotated in synchronization by a drive mechanism (not shown), and the amount of rotation, the rotating direction, the rotating timing and time are controlled by an appropriate control mechanism. To be done.

【0033】ノズル6について説明する。The nozzle 6 will be described.

【0034】ノズル6はノズル6AD,ノズル6BC,
ノズル6'AD,ノズル6'BCの4つで構成され、ノズ
ル6AD,6BCはICモールド1の表側に位置し、ノ
ズル6'A,6'BCはICモールド1の裏側に位置し、
これら4つのノズル6は、ICモールド1に対して所定
角度に傾斜した状態で配設されている。
The nozzle 6 includes a nozzle 6AD, a nozzle 6BC,
It is composed of four nozzles 6′AD and 6′BC, the nozzles 6AD and 6BC are located on the front side of the IC mold 1, and the nozzles 6′A and 6′BC are located on the back side of the IC mold 1.
These four nozzles 6 are arranged in a state of being inclined at a predetermined angle with respect to the IC mold 1.

【0035】ノズル6ADと6'ADとは図6に図示し
たような形状の第一連結杆12により連結されており、ま
た、ノズル6'Aとノズル6'BCとは同様に第二連結杆
13により連結されている。
The nozzles 6AD and 6'AD are connected by a first connecting rod 12 having a shape as shown in FIG. 6, and the nozzles 6'A and 6'BC are similarly connected by a second connecting rod.
Connected by 13.

【0036】また、この第一連結杆12,第二連結杆13は
一体で図示省略の移動機構により上下方向に移動可能に
構成され、また、第一連結杆12,第二連結杆13は互いに
独立して間隔可変機構5としてのシリンダー装置14(第
一連結杆12の為のシリンダー装置は図示省略)で図6に
おいて上下方向に移動可能に構成されている。
The first connecting rod 12 and the second connecting rod 13 are integrally constructed so as to be vertically movable by a moving mechanism (not shown), and the first connecting rod 12 and the second connecting rod 13 are mutually connected. A cylinder device 14 (a cylinder device for the first connecting rod 12 is not shown) as an interval varying mechanism 5 is independently movable in the vertical direction in FIG.

【0037】また、第一連結杆12,第二連結杆13は一体
で回動機構4としての駆動モータにより90°回動可能
に構成されている。
The first connecting rod 12 and the second connecting rod 13 are integrally rotatable by a drive motor as the rotating mechanism 4 by 90 °.

【0038】図面のノズル6ADとノズル6'BC,ま
た、ノズル6BCとノズル6'ADとは互いの噴射が衝
突してしまわないように噴射位置が少しズレるように配
設される。
The nozzle 6AD and the nozzle 6'BC in the drawing, and the nozzle 6BC and the nozzle 6'AD are arranged so that their injection positions are slightly displaced so as not to collide with each other.

【0039】尚、ノズル6の先端からは砥粒を混入した
加圧水が噴射されるように構成されている。
The nozzle 6 is constructed so that pressurized water containing abrasive grains is jetted from the tip of the nozzle 6.

【0040】符号15はICモールド1の供給部,16はI
Cモールド1の取り出し部,17,18は水流膜が形成され
た入口部及び出口部である。
Reference numeral 15 is a supply portion of the IC mold 1, and 16 is an I
The take-out parts 17, 18 of the C mold 1 are an inlet part and an outlet part where a water flow film is formed.

【0041】本実施例は上記構成であるから、次の作用
効果を呈する。
Since this embodiment has the above-mentioned structure, the following operational effects are exhibited.

【0042】まず、ガイドレール8・8'間に図5にお
ける左側からICモールド1を挿入する(図7参照)。
First, the IC mold 1 is inserted between the guide rails 8 and 8'from the left side in FIG. 5 (see FIG. 7).

【0043】ノズル6AD(6'AD)とノズル6BC
(6'BC)との間隔は、シリンダー装置14により夫々
第一連結杆12,第二連結杆13を独立に移動せしめて予め
所定間隔にセットしておく。
Nozzle 6AD (6'AD) and nozzle 6BC
The distance to (6′BC) is set to a predetermined distance by moving the first connecting rod 12 and the second connecting rod 13 independently by the cylinder device 14.

【0044】移動機構により第一連結杆12,第二連結杆
13を一体で移動させることでノズル6AD,6'AD,
6BC,6'BCを下方に移動させ、最先端位置のIC
パッケージ1'の右左側縁部A,Bを洗浄する(図7中
の○印はノズル6AD,6BCの噴射位置である。)。
By the moving mechanism, the first connecting rod 12 and the second connecting rod
By moving 13 as a unit, the nozzles 6AD, 6'AD,
6BC and 6'BC are moved downwards and the IC at the most advanced position
The right and left edges A and B of the package 1'are cleaned (the circles in FIG. 7 indicate the injection positions of the nozzles 6AD and 6BC).

【0045】続いて、ICモールド1を所定量右側へ搬
送し、同様にノズル6AD,6'AD,6BC,6'BC
を上方に移動させ、2番目のICパッケージ1'の右左
側縁部A,Bを洗浄する。
Subsequently, the IC mold 1 is conveyed to the right by a predetermined amount, and similarly, the nozzles 6AD, 6'AD, 6BC, 6'BC are also conveyed.
Is moved upward and the right and left edges A and B of the second IC package 1 ′ are washed.

【0046】このようにしてn番目までのすべてのIC
パッケージ1'の右左側縁部A,Bの洗浄が完了する
(この場合のICモールド1の搬送は間欠搬送とな
る。)。
In this way, all ICs up to the nth
Cleaning of the left and right edges A and B of the package 1'is completed (the IC mold 1 in this case is intermittently transferred).

【0047】続いて、回動機構4としての駆動モータが
作動し、第一連結杆12,第二連結杆13が一体で90°回
動し、図6に図示した状態となり、続いて、シリンダー
装置14の作動により第一連結杆12,第二連結杆13は独立
して作動し、第一連結杆12,第二連結杆13の間隔即ちノ
ズル6AD(6'AD)とノズル6BC(6'BC)との
間隔が所定間隔にセットされる。
Subsequently, the drive motor as the rotating mechanism 4 is operated, the first connecting rod 12 and the second connecting rod 13 are integrally rotated by 90 °, and the state shown in FIG. 6 is obtained. The first connecting rod 12 and the second connecting rod 13 are operated independently by the operation of the device 14, and the distance between the first connecting rod 12 and the second connecting rod 13, that is, the nozzle 6AD (6'AD) and the nozzle 6BC (6 '). BC) is set to a predetermined interval.

【0048】この状態が図8であり、図8中の●印は所
定間隔にセットされた後のノズル6AD,6BCの噴射
位置である。
This state is shown in FIG. 8, and the mark ● in FIG. 8 is the injection position of the nozzles 6AD and 6BC after being set at a predetermined interval.

【0049】この状態で、ICモールド1は図8中左方
向へ連続的に搬送され、従って、ノズル6AD,6'A
D,6BC,6'BCにより並設されているICパッケ
ージ1'の上下側縁部C,Dが連続的に洗浄される。
In this state, the IC mold 1 is continuously conveyed to the left in FIG. 8, and accordingly, the nozzles 6AD, 6'A.
The upper and lower edge portions C and D of the IC package 1 ′ arranged in parallel by D, 6BC and 6′BC are continuously washed.

【0050】この洗浄終了後の状態が図9の状態であ
り、続いて、ICモールド1は右方向へ搬送され、取り
出し部16から該ICモールド1は取り出され、次のIC
モールド1が所定位置に搬送され、第一連結杆12,第二
連結杆13が一体で90°戻回動し、ノズル6AD(6'
AD)と6BC(6'BC)との間隔が所定間隔にセッ
トされ、図7の状態から再び前記同様の作動が繰り返さ
れることになる。
The state after completion of this cleaning is the state of FIG. 9, and subsequently, the IC mold 1 is conveyed to the right, the IC mold 1 is taken out from the take-out section 16, and the next IC is taken out.
The mold 1 is conveyed to a predetermined position, the first connecting rod 12 and the second connecting rod 13 are integrally rotated back by 90 °, and the nozzle 6AD (6 '
The interval between AD) and 6BC (6'BC) is set to a predetermined interval, and the operation similar to the above is repeated from the state of FIG.

【0051】尚、洗浄する範囲即ち、ICパッケージ
1'の外縁から外側へ何mmの位置まで洗浄するかはノ
ズル6の開口径を適宜設定することで決定する。
The range of cleaning, that is, how many mm from the outer edge of the IC package 1 to the outside, the cleaning is determined by appropriately setting the opening diameter of the nozzle 6.

【0052】以上、本実施例は、極めて効率良くICモ
ールド1を洗浄でき、また、本実施例のノズル6は所望
部位のみに噴射するタイプであり、ICパッケージ1'
には何ら噴射しないタイプであるから(所謂全面打ちタ
イプではなく所謂狙い打ちタイプであるから)、洗浄部
材に砥粒を混入せしめてもICパッケージ1'を損傷す
る心配はなく(従って、樹脂製砥粒でなく洗浄力の高い
硬質のアルミナやセラミック製砥粒の使用が可能とな
る。)、且つ砥粒の存する分だけ確実に洗浄効果が得ら
れ、従って、砥粒なしの水のみでは洗浄不可能であった
バリまできれいに除去することが可能となる。
As described above, in this embodiment, the IC mold 1 can be cleaned extremely efficiently, and the nozzle 6 of this embodiment is of a type that sprays only on a desired portion.
Since it is a type that does not eject anything (because it is a so-called aiming type, not a so-called whole-faced type), there is no fear of damaging the IC package 1 ′ even if abrasive particles are mixed into the cleaning member (hence, the resin-made abrasive type). It is possible to use hard alumina or ceramic abrasive particles that have high cleaning power instead of particles.) And the cleaning effect can be reliably obtained as much as there are abrasive particles. Therefore, cleaning with water without abrasive particles is not possible. It is possible to remove even burrs that were possible.

【0053】[0053]

【発明の効果】本発明は上述のように構成したからIC
パッケージを損傷することなく所望部位のみの良好な洗
浄が可能となり、また、ICモールド外面から水や砥粒
が自然流下し、ICモールドの外面に水膜が形成された
り、砥粒が付着したりしない為、それだけ効果的な洗浄
が可能となり、更に、最もきれいに洗浄したい部位であ
るICパッケージの外周縁部のみを効率良く洗浄するこ
とができる。
Since the present invention is constructed as described above, an IC
Good cleaning of only the desired part is possible without damaging the package, and water and abrasive grains naturally flow down from the outer surface of the IC mold, forming a water film on the outer surface of the IC mold, and attaching abrasive grains. Therefore, effective cleaning can be performed, and only the outer peripheral edge of the IC package, which is the most desired part, can be efficiently cleaned.

【0054】以上、所期の効果を発揮することになる。As described above, the desired effect is exhibited.

【図面の簡単な説明】[Brief description of drawings]

【図1】本実施例の全体正面図である。FIG. 1 is an overall front view of this embodiment.

【図2】本実施例の要部の正面図である。FIG. 2 is a front view of a main part of this embodiment.

【図3】本実施例の要部の平面図である。FIG. 3 is a plan view of a main part of this embodiment.

【図4】図3におけるA−A指示線側面図である。FIG. 4 is a side view of the AA instruction line in FIG.

【図5】本実施例の要部の正面図である。FIG. 5 is a front view of a main part of this embodiment.

【図6】本実施例の要部の斜視図である。FIG. 6 is a perspective view of a main part of this embodiment.

【図7】本実施例の作動説明図である。FIG. 7 is an operation explanatory view of the present embodiment.

【図8】本実施例の作動説明図である。FIG. 8 is an operation explanatory diagram of the present embodiment.

【図9】本実施例の作動説明図である。FIG. 9 is an operation explanatory view of the present embodiment.

【符号の説明】[Explanation of symbols]

1 ICモールド 1' ICパッケージ 2 搬送部 3 洗浄部材噴射部 4 回動機構 5 間隔可変機構 A 右側縁部 B 左側縁部 C 上側縁部 D 下側縁部 DESCRIPTION OF SYMBOLS 1 IC mold 1'IC package 2 Transport part 3 Cleaning member injection part 4 Rotation mechanism 5 Spacing variable mechanism A Right side edge B Left side edge C Upper side edge D Lower side edge

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 ICモールドを搬送する搬送部と、該I
Cモールドの所望部位に砥粒を含有した洗浄部材を噴射
する洗浄部材噴射部とを備えて構成したICモールドの
洗浄装置。
1. A transport unit for transporting an IC mold and the I
An IC mold cleaning device comprising: a cleaning member spraying unit that sprays a cleaning member containing abrasive particles onto a desired portion of a C mold.
【請求項2】 ICモールドを起立状態で搬送する搬送
部と,該ICモールドに洗浄部材を噴射する洗浄部材噴
射部とを備えて構成したことを特徴とするICモールド
の洗浄装置。
2. A cleaning device for an IC mold, comprising: a carrying part for carrying the IC mold in an upright state, and a cleaning member spraying part for spraying a cleaning member onto the IC mold.
【請求項3】 請求項2記載のICモールドの洗浄装置
であって、 ICモールドの表面若しくは裏面にしてICパッケージ
の右側縁部を洗浄する洗浄部材噴射部を設け、該洗浄部
材噴射部の洗浄部位を上下方向に移動せしめる移動機構
を設け、該洗浄部材噴射部に回動機構を具備せしめて該
洗浄部材噴射部による洗浄部位を可変可能に設けること
でICパッケージの上側縁部も洗浄可能に構成したこと
を特徴とするICモールドの洗浄装置。
3. The cleaning device for an IC mold according to claim 2, wherein a cleaning member spraying unit for cleaning the right edge of the IC package is provided on the front surface or the back surface of the IC mold, and the cleaning member spraying unit is cleaned. An upper edge of the IC package can be cleaned by providing a moving mechanism for moving the part in the vertical direction, and providing the cleaning member injection part with a rotating mechanism so that the cleaning part by the cleaning member injection part can be changed. An IC mold cleaning device characterized by being configured.
【請求項4】 請求項2記載のICモールドの洗浄装置
であって、 ICモールドの表面若しくは裏面にしてICパッケージ
の右左両側縁部を洗浄する2つの洗浄部材噴射部を設
け、該洗浄部材噴射部の洗浄部位を上下方向に移動せし
める移動機構を設け、該2つの洗浄部材噴射部に回動機
構を具備せしめて該2つの洗浄部材噴射部による洗浄部
位を可変可能に設けることでICパッケージの上下側縁
部も洗浄可能に構成し、前記2つの洗浄部材噴射部の間
隔を可変せしめる間隔可変機構を設けて構成したことを
特徴とするICモールドの洗浄装置。
4. The IC mold cleaning apparatus according to claim 2, wherein two cleaning member spraying units for cleaning the right and left side edges of the IC package are provided on the front surface or the back surface of the IC mold, and the cleaning member spraying unit. Of the IC package by providing a moving mechanism for vertically moving the cleaning portion of the unit, and providing a rotating mechanism for the two cleaning member ejecting portions so that the cleaning portions by the two cleaning member ejecting portions are variably provided. An IC mold cleaning apparatus characterized in that upper and lower side edge portions are also configured to be washable, and a distance varying mechanism for varying a distance between the two cleaning member ejecting portions is provided.
JP27586792A 1992-10-14 1992-10-14 IC package cleaning equipment Expired - Lifetime JP3190140B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27586792A JP3190140B2 (en) 1992-10-14 1992-10-14 IC package cleaning equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27586792A JP3190140B2 (en) 1992-10-14 1992-10-14 IC package cleaning equipment

Publications (2)

Publication Number Publication Date
JPH06124969A true JPH06124969A (en) 1994-05-06
JP3190140B2 JP3190140B2 (en) 2001-07-23

Family

ID=17561540

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27586792A Expired - Lifetime JP3190140B2 (en) 1992-10-14 1992-10-14 IC package cleaning equipment

Country Status (1)

Country Link
JP (1) JP3190140B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100283847B1 (en) * 1994-05-16 2001-04-02 윤종용 De-flashing device of molded semiconductor package and its de-flashing method
JP2017216304A (en) * 2016-05-30 2017-12-07 日亜化学工業株式会社 Light emitting device and method for manufacturing the same
JP2020107910A (en) * 2020-04-01 2020-07-09 日亜化学工業株式会社 Light emitting device and method for manufacturing the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100283847B1 (en) * 1994-05-16 2001-04-02 윤종용 De-flashing device of molded semiconductor package and its de-flashing method
JP2017216304A (en) * 2016-05-30 2017-12-07 日亜化学工業株式会社 Light emitting device and method for manufacturing the same
JP2020107910A (en) * 2020-04-01 2020-07-09 日亜化学工業株式会社 Light emitting device and method for manufacturing the same

Also Published As

Publication number Publication date
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