JPH06120629A - Metallic base multilayer printed wiring board - Google Patents

Metallic base multilayer printed wiring board

Info

Publication number
JPH06120629A
JPH06120629A JP4292010A JP29201092A JPH06120629A JP H06120629 A JPH06120629 A JP H06120629A JP 4292010 A JP4292010 A JP 4292010A JP 29201092 A JP29201092 A JP 29201092A JP H06120629 A JPH06120629 A JP H06120629A
Authority
JP
Japan
Prior art keywords
wiring
metal
insulating layer
power element
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4292010A
Other languages
Japanese (ja)
Other versions
JP3168731B2 (en
Inventor
Yukihiro Maeda
幸宏 前田
Takashi Nagasaka
長坂  崇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
NipponDenso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NipponDenso Co Ltd filed Critical NipponDenso Co Ltd
Priority to JP29201092A priority Critical patent/JP3168731B2/en
Publication of JPH06120629A publication Critical patent/JPH06120629A/en
Application granted granted Critical
Publication of JP3168731B2 publication Critical patent/JP3168731B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To facilitate the manufacture of a board by putting it in such structure that a power element can be mounted without counterboring it, in a metallic base multilayer printed wiring board. CONSTITUTION:Metallic wiring 110 is junctioned onto a metallic base 101 through an insulating layer 103, and a multilayer printed wiring board 102 is junctioned onto the insulating layer 103 through an adhesive 114. Moreover, an upper wiring 104 and a lower wiring 106 are junctioned to both sides of the insulating layer 105 being epoxy resin, and the board 102 has a through hole 107 and a through hole 109. Copper films 108 are formed on these sidewalls by plating, and the upper wiring layer 104 and the lower wiring layer 106 are conductive by the copper film 108. On the insulating layer 103 on the metallic base 101, a copper metallic wiring 110 is arranged in the position where a power element 120 is arranged, and the power element 120 is junctioned with this metallic wiring 110 by solder 111. The metallic wiring 110 is electrically junctioned with the lower wiring layer 106a in the vicinity of its arrangement by solder 111.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、比較的大電流を扱うパ
ワー素子を配設するための金属ベース多層配線基板、又
は、パワー素子と比較的小電流を扱う電子素子とを同一
基板上に配設するための金属ベース多層配線基板に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a metal-based multilayer wiring board for disposing a power element handling a relatively large current, or a power element and an electronic element handling a relatively small current on the same substrate. The present invention relates to a metal-based multilayer wiring board for disposing.

【0002】[0002]

【従来の技術】従来、微小電流を扱う電子回路と大電流
を扱うパワー素子とを同一の金属ベ−ス上に実装したハ
イブリッド電子回路が知られている。この場合、パワー
素子は、放熱性能を向上させるために、金属ベ−スに絶
縁膜を介して配設され、パワー素子を形成しない部分に
は、電子回路の実装密度を向上させるために多層配線を
形成することが行われている。
2. Description of the Related Art Conventionally, there has been known a hybrid electronic circuit in which an electronic circuit handling a small current and a power element handling a large current are mounted on the same metal base. In this case, the power element is arranged on the metal base via the insulating film in order to improve the heat dissipation performance, and the part where the power element is not formed has a multilayer wiring for improving the mounting density of the electronic circuit. Is being formed.

【0003】金属ベ−ス上に多層配線を形成するには、
金属ベ−ス上に第1の絶縁膜を介して厚さ100μm程
度の銅箔を接着して第1の配線層を形成し、所定パター
ンにエッチングした後、そのパターン形成された銅箔の
上に第2の絶縁膜を印刷形成し、その第2の絶縁膜の上
に銅メッキにより第2の配線層を形成することが行われ
ている。しかしこの方法では、第1の配線層である銅箔
の厚さが厚いので、第2の絶縁膜を印刷で形成する時に
銅箔による段差部にボイドが発生すること、第2の配線
層はメッキにより形成されるので第2の配線層を厚くで
きないこと、メッキ液が第2の絶縁膜と第2の配線層と
の間に残留する等の問題がある。
To form a multilayer wiring on a metal base,
A copper foil having a thickness of about 100 μm is adhered on a metal base via a first insulating film to form a first wiring layer, which is etched into a predetermined pattern, and then on the patterned copper foil. A second insulating film is formed by printing on the second insulating film, and a second wiring layer is formed on the second insulating film by copper plating. However, in this method, since the thickness of the copper foil which is the first wiring layer is large, a void is generated in the step portion due to the copper foil when the second insulating film is formed by printing. Since it is formed by plating, there is a problem that the second wiring layer cannot be thickened and the plating solution remains between the second insulating film and the second wiring layer.

【0004】一方、絶縁層の両側に銅箔が接着された配
線基板において、銅箔を所定形状にパターン形成し、ス
ルーホールを形成し、そのスルーホールを上下の配線層
が導通するようにメッキした後、この配線基板を金属ベ
ースに絶縁膜を介して接合させる方法もある。この方法
では、配線層の厚さは自由に決められ、前者の方法によ
るボイド等の問題は回避される。
On the other hand, in a wiring board in which copper foil is adhered to both sides of an insulating layer, the copper foil is patterned into a predetermined shape to form a through hole, and the through hole is plated so that the upper and lower wiring layers are electrically connected. After that, there is also a method of joining this wiring board to a metal base via an insulating film. In this method, the thickness of the wiring layer can be freely determined, and the problems such as voids caused by the former method can be avoided.

【0005】[0005]

【発明の解決しようとする課題】しかしながら、パワー
素子を放熱性を考慮して金属ベ−スに最も近い配線層に
配設するには、パワー素子を配設する領域の配線基板を
一部除去、即ち、座繰りして、金属ベ−スに最も近い最
下配線層を露出させることが必要である。
However, in order to dispose the power element in the wiring layer closest to the metal base in consideration of heat dissipation, the wiring substrate in the area where the power element is disposed is partially removed. That is, it is necessary to countersink to expose the bottom wiring layer closest to the metal base.

【0006】しかし、座ぐり加工をドリルで行う場合に
は、元々基板厚さが薄く多層配線基板の厚さにバラツキ
があるため、加工工具の送りを一定値に固定してしまう
と、必ずしも下層配線が完全に露出されるとは限らず、
逆に深く座ぐり過ぎて配線を破壊してしまうなどの問題
があった。
However, when the spot boring process is performed by a drill, since the substrate thickness is originally thin and the thickness of the multilayer wiring substrate varies, if the feed of the machining tool is fixed to a constant value, the lower layer is not always required. The wiring is not always completely exposed,
On the contrary, there was a problem that it was too deeply spotted and the wiring was destroyed.

【0007】本発明は、上記の課題を解決するために成
されたものでり、その目的は、金属ベース多層配線基板
において、座ぐり加工をすることなくパワー素子を搭載
できる構造とすることで、基板の製造を容易にすること
である。
The present invention has been made to solve the above-mentioned problems, and an object thereof is to provide a structure in which a power element can be mounted on a metal-based multilayer wiring board without spot-working. , To facilitate the manufacture of the substrate.

【0008】[0008]

【課題を解決するための手段】上記課題を解決するため
の発明の構成は、比較的大電流を扱うパワー素子を配設
するための基板、又は、比較的大電流を扱うパワー素子
と比較的小電流を扱う電子素子とを同一基板上に配設す
るための基板において、放熱のための金属ベースと、金
属ベースの上に接着された第1絶縁層と、第1絶縁層上
のパワー素子を配設する位置に配設された厚みの厚い金
属配線と、複数の配線層が絶縁層を介在させて多層に形
成された多層配線基板であって、パワー素子の配設され
る部分に形成された貫通孔を有し、金属配線が最下層の
配層に電気的に接合されて第1絶縁層上に接合される多
層配線基板を設けたことである。
SUMMARY OF THE INVENTION The structure of the invention for solving the above problems is a substrate for disposing a power element handling a relatively large current, or a power element handling a relatively large current. In a substrate for arranging an electronic device handling a small current on the same substrate, a metal base for heat dissipation, a first insulating layer adhered on the metal base, and a power device on the first insulating layer A multi-layer wiring board in which a thick metal wiring is arranged at a position where a plurality of wiring layers are arranged, and a plurality of wiring layers are formed in multiple layers with an insulating layer interposed therebetween. That is, the multilayer wiring board having the through holes formed therein and having the metal wiring electrically connected to the lowermost wiring layer and bonded onto the first insulating layer is provided.

【0009】[0009]

【作用】上記の構造の多層配線基板は、パワー素子の搭
載される部分に、予め穴開け加工を施しておくことがで
きる。そして、金属べースの上に電気絶縁のための第1
絶縁層を設け、その第1絶縁層の上にパワー素子の配設
される位置に金属配線を設けている。パワー素子はこの
金属配線上に接合される。そして、金属配線が配設され
た金属ベースと貫通孔の形成された多層配線基板が接合
され、金属ベースと最下層の配線層とが電気的に接合さ
れる。
In the multilayer wiring board having the above-mentioned structure, the portion where the power element is mounted can be preliminarily drilled. And the first for electrical insulation on the metal base
An insulating layer is provided, and metal wiring is provided on the first insulating layer at the position where the power element is provided. The power element is bonded onto this metal wiring. Then, the metal base on which the metal wiring is arranged and the multilayer wiring substrate in which the through hole is formed are joined, and the metal base and the wiring layer of the lowermost layer are electrically joined.

【0010】[0010]

【発明の効果】本発明は、上記のようにパワー素子の配
設される金属ベースにおいて第1絶縁層を介して金属配
線を設けたことから、多層配線基板において、パワー素
子を配設する部分に、多層配線基板の配下層の配線層を
も貫く貫通孔を予め形成した後、この多層配線基板を金
属ベース上の第1絶縁層に接合させることができる。従
って、最下層の配線層だけを完全に露出させるような精
密な座ぐり加工をする必要がないため、本金属ベース多
層配線基板の製造が極めて容易となる。
As described above, according to the present invention, since the metal wiring is provided through the first insulating layer in the metal base on which the power element is arranged as described above, the portion where the power element is arranged in the multilayer wiring board. In addition, after forming a through hole that also penetrates a wiring layer under the multilayer wiring board, the multilayer wiring board can be bonded to the first insulating layer on the metal base. Therefore, since it is not necessary to perform a precision counterboring process that completely exposes only the lowermost wiring layer, the manufacture of the present metal-based multilayer wiring board becomes extremely easy.

【0011】[0011]

【実施例】以下、本発明を具体的な一実施例に基づいて
説明する。 (1) 金属ベース多層配線基板の構成 金属ベース多層配線基板1 は、図1に示すように、金属
ベース101 と、金属ベース101 上に絶縁層103 を介して
接合された金属配線110 と、金属配線110 に接着剤114
により接合されている多層配線基板102 とを有してい
る。その多層配線基板102 はガラスエポキシである絶縁
層105 と、その絶縁層105 の上面及び下面に所定のパタ
ーンに形成された上面配線層104 と下面配線層106 とを
有している。多層配線基板102 には所定の位置にスルー
ホール107 とパワー素子120 を配設するための貫通孔10
9 が形成されている。そして、スルーホール107 と貫通
孔109 の側壁にはメッキにより銅薄膜108 が形成され、
上面配線層104 と下面配線層106 とはその銅薄膜108 に
より導通されている。
EXAMPLES The present invention will be described below based on a specific example. (1) Structure of Metal-Based Multilayer Wiring Board As shown in FIG. 1, the metal-based multilayer wiring board 1 includes a metal base 101, a metal wiring 110 joined to the metal base 101 via an insulating layer 103, and a metal. Adhesive 114 on wiring 110
The multi-layer wiring substrate 102 joined by The multilayer wiring board 102 has an insulating layer 105 made of glass epoxy, and an upper surface wiring layer 104 and a lower surface wiring layer 106 formed in a predetermined pattern on the upper and lower surfaces of the insulating layer 105. Through holes 10 for arranging through holes 107 and power elements 120 at predetermined positions are formed in the multilayer wiring board 102.
9 is formed. Then, a copper thin film 108 is formed on the sidewalls of the through hole 107 and the through hole 109 by plating,
The upper wiring layer 104 and the lower wiring layer 106 are electrically connected by the copper thin film 108.

【0012】又、金属ベース101 上の絶縁層103 にはパ
ワー素子120 が配設される位置に膜厚の厚い銅メッキ製
の金属配線110 が配設されている。この金属配線110 に
パワー素子120 がハンダ111 により接合されている。金
属配線110 は、これが配設される付近の下面配線層106a
にハンダ111 により電気的に接合される。
Further, a thick copper-plated metal wiring 110 is provided on the insulating layer 103 on the metal base 101 at a position where the power element 120 is provided. The power element 120 is joined to the metal wiring 110 by solder 111. The metal wiring 110 is formed on the lower surface wiring layer 106a near where the metal wiring 110 is arranged.
It is electrically joined by solder 111.

【0013】(2) 金属ベース多層配線基板の製造方法 この金属ベ−ス多層配線基板1は次のように製造され
る。図2の(1) に示されるように、ガラスエポキシから
成る絶縁層105 の上面及び下面に平板の配線用銅箔201,
202 が接着剤で接合される。その後、図2の(2)に示す
ように、その銅箔201,202 を所定の配線パターンにエッ
チングして、上面配線層104 と下面配線層106 とが形成
される。次に、スルーホール107 及び貫通孔109 が形成
される。その後、スルーホール107 及び貫通孔109 を銅
メッキして、それらの側壁に銅薄膜108 を形成する。次
に、図2の(3)に示すように、金属配線110 を金属ベー
ス101 の上の所定位置に絶縁層103 を介して、膜厚の厚
い(100μm程度) の銅メッキ箔を接合し、その後、パタ
ーンエッチングする事によって形成する。次に、図2の
(2)に示す構造の多層配線基板102 を貫通孔109 が金属
配線110 の直上にくるように位置決めして、多層配線基
板102 を接着剤114 を介在させて絶縁層103 に接合させ
る。
(2) Method of Manufacturing Metal-Based Multilayer Wiring Board This metal-based multilayer wiring board 1 is manufactured as follows. As shown in FIG. 2 (1), a flat copper foil 201 for wiring is formed on the upper and lower surfaces of the insulating layer 105 made of glass epoxy.
202 is glued together. After that, as shown in FIG. 2B, the copper foils 201 and 202 are etched into a predetermined wiring pattern to form the upper surface wiring layer 104 and the lower surface wiring layer 106. Next, the through hole 107 and the through hole 109 are formed. After that, the through holes 107 and the through holes 109 are plated with copper to form a copper thin film 108 on the side walls thereof. Next, as shown in (3) of FIG. 2, a metal wiring 110 is joined to a predetermined position on the metal base 101 with a thick copper plating foil (about 100 μm) through the insulating layer 103. After that, pattern etching is performed. Next, the multilayer wiring board 102 having the structure shown in FIG. 2B is positioned so that the through hole 109 is directly above the metal wiring 110, and the multilayer wiring board 102 is covered with the insulating layer 103 with the adhesive 114. To join.

【0014】次に、図1に示すように、貫通孔109 にパ
ワー素子120 を配設し、パワー素子120 をハンダ111 を
用いて金属配線110 に電気的に接合する。この時、ハン
ダ111 により金属配線110 と下面配線層106aとは電気的
に接続される。その後、パワー素子120 の上側端子を上
面配線層104aにワイヤボンディングにより接続する。
Next, as shown in FIG. 1, a power element 120 is arranged in the through hole 109, and the power element 120 is electrically joined to the metal wiring 110 by using a solder 111. At this time, the metal wiring 110 and the lower wiring layer 106a are electrically connected by the solder 111. Then, the upper terminal of the power element 120 is connected to the upper wiring layer 104a by wire bonding.

【0015】このように、パワー素子120 が配設される
貫通孔109 が多層配線基板102 に開けられた後に、金属
配線110 を貫通孔109 の底部分に介在させて、多層配線
基板102 が絶縁層103 に接合されることから、多層配線
基板102 に困難な座ぐり加工を施すことが必要でないた
め、製造が簡単である。
As described above, after the through hole 109 in which the power element 120 is arranged is opened in the multilayer wiring board 102, the multilayer wiring board 102 is insulated by interposing the metal wiring 110 in the bottom portion of the through hole 109. Since it is bonded to the layer 103, it is not necessary to subject the multilayer wiring substrate 102 to difficult counterbore processing, and therefore the manufacturing is simple.

【0016】上記実施例では、金属配線110 を金属ベー
ス101 に絶縁層103 を介在させて接着した後、多層配線
基板102 を配設して、金属配線110 と下面配線層106aと
をハンダ111 で電気的に接合するようにしているが、図
3に示すように製造しても良い。即ち、図3に示すよう
に、金属配線110 を多層配線基板102 に形成された貫通
孔109 を蓋するように下面配線層106aに導電性ペースト
113 で接合した後、この多層配線基板102 を絶縁層103
上に接着剤で接着する。この時、金属配線110の周囲に
は溝112 が形成されており、導電性ペーストが金属配線
110 の中央部に流出するのが防止されている。
In the above embodiment, after the metal wiring 110 is adhered to the metal base 101 with the insulating layer 103 interposed therebetween, the multilayer wiring board 102 is arranged, and the metal wiring 110 and the lower surface wiring layer 106a are soldered 111. Although they are electrically joined, they may be manufactured as shown in FIG. That is, as shown in FIG. 3, a conductive paste is applied to the lower wiring layer 106a so that the metal wiring 110 covers the through holes 109 formed in the multilayer wiring substrate 102.
After joining at 113, the multilayer wiring board 102 is connected to the insulating layer 103.
Glue on top with glue. At this time, a groove 112 is formed around the metal wiring 110, and the conductive paste is used for the metal wiring.
Outflow to the center of 110 is prevented.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例にかかる金属ベース多層配線基
板の構成を示した断面図。
FIG. 1 is a sectional view showing a configuration of a metal-based multilayer wiring board according to an embodiment of the present invention.

【図2】図1に示す金属ベース多層配線基板の製造過程
を示す断面図。
FIG. 2 is a cross-sectional view showing a manufacturing process of the metal-based multilayer wiring board shown in FIG.

【図3】他の実施例にかかる金属ベース多層配線基板の
構成を示した断面図。
FIG. 3 is a cross-sectional view showing the configuration of a metal-based multilayer wiring board according to another embodiment.

【符号の説明】[Explanation of symbols]

101 金属ベ−ス 102 多層配線基板 103 絶縁層 105 絶縁層(ガラスエポキシ) 109 貫通孔 110 金属配線 111 ハンダ 112 溝 114 接着剤 120 パワー素子 101 Metal Base 102 Multilayer Wiring Board 103 Insulation Layer 105 Insulation Layer (Glass Epoxy) 109 Through Hole 110 Metal Wiring 111 Solder 112 Groove 114 Adhesive 120 Power Device

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 比較的大電流を扱うパワー素子を配設す
るための基板、又は、比較的大電流を扱うパワー素子と
比較的小電流を扱う電子素子とを同一基板上に配設する
ための基板において、 放熱のための金属ベースと、 前記金属ベースの上に接着された第1絶縁層と、 前記第1絶縁層上のパワー素子を配設する位置に配設さ
れた金属配線と、 複数の配線層が絶縁層を介在させて多層に形成された多
層配線基板であって、前記パワー素子の配設される部分
に形成された貫通孔を有し、前記金属配線が最下層の配
線層に電気的に接合されて前記第1絶縁層上に接合され
る多層配線基板とを有することを特徴とする金属ベース
多層配線基板。
1. A substrate on which a power element handling a relatively large current is arranged, or a power element handling a relatively large current and an electronic element handling a relatively small current are arranged on the same substrate. A metal base for heat dissipation, a first insulating layer adhered on the metal base, and a metal wiring arranged at a position where the power element is arranged on the first insulating layer, A multilayer wiring board in which a plurality of wiring layers are formed in multiple layers with an insulating layer interposed, and a through hole is formed in a portion where the power element is arranged, and the metal wiring is the lowermost wiring. And a multilayer wiring board electrically bonded to the layer and bonded onto the first insulating layer.
JP29201092A 1992-10-05 1992-10-05 Metal-based multilayer wiring board Expired - Lifetime JP3168731B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29201092A JP3168731B2 (en) 1992-10-05 1992-10-05 Metal-based multilayer wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29201092A JP3168731B2 (en) 1992-10-05 1992-10-05 Metal-based multilayer wiring board

Publications (2)

Publication Number Publication Date
JPH06120629A true JPH06120629A (en) 1994-04-28
JP3168731B2 JP3168731B2 (en) 2001-05-21

Family

ID=17776364

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29201092A Expired - Lifetime JP3168731B2 (en) 1992-10-05 1992-10-05 Metal-based multilayer wiring board

Country Status (1)

Country Link
JP (1) JP3168731B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010073767A (en) * 2008-09-17 2010-04-02 Jtekt Corp Multilayer circuit board
KR101433454B1 (en) * 2012-07-25 2014-08-28 (주)엠제이티 manufacture method of printed circuit board having teflon

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010073767A (en) * 2008-09-17 2010-04-02 Jtekt Corp Multilayer circuit board
US8415565B2 (en) 2008-09-17 2013-04-09 Jtekt Corporation Multilayer circuit substrate
KR101433454B1 (en) * 2012-07-25 2014-08-28 (주)엠제이티 manufacture method of printed circuit board having teflon

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