JPH06119776A - Dynamic semiconductor memory - Google Patents

Dynamic semiconductor memory

Info

Publication number
JPH06119776A
JPH06119776A JP4267255A JP26725592A JPH06119776A JP H06119776 A JPH06119776 A JP H06119776A JP 4267255 A JP4267255 A JP 4267255A JP 26725592 A JP26725592 A JP 26725592A JP H06119776 A JPH06119776 A JP H06119776A
Authority
JP
Japan
Prior art keywords
power supply
burn
internal
time
type mos
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4267255A
Other languages
Japanese (ja)
Inventor
Kazutoshi Hirayama
和俊 平山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP4267255A priority Critical patent/JPH06119776A/en
Publication of JPH06119776A publication Critical patent/JPH06119776A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a dynamic semiconductor memory preventing destruction due to an internal boosting node at a burn-in time and setting a burn-in time to a proper value. CONSTITUTION:A P type MOS transistor 13 is turned ON by a control signal B. I. Enable' at a burn-in time, and an internal boosting signal is cramped to an internal source voltage + the threshold value Vth of an N type MOS transistor 14 level. The path of the transistors 13, 14 is interrupted always at a regular time excepting that, and the internal boosting signal is an internal source voltage + the threshold value Vth of an n type MOS transistor 11 + the threshold value Vth of the n type MOS transistor 12 level. Then, when the threshold values Vth.n of the n type MOS transistors 11, 12, 14 for cramping are equal, the internal boosting signal becomes the internal source voltage + 2XVth.n at a regular time and the internal source voltage + Vth.n at a burn-in time, and the internal boosting signal is lowered by the Vth.n in a cramp level at a burn-in time than a regular time, and the node conducted to the signal is protected by that.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、内部電源降圧回路を
備えたダイナミック型半導体メモリに関し、特にバーン
イン時の電源電圧制御に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a dynamic semiconductor memory having an internal power supply voltage down circuit, and more particularly to power supply voltage control during burn-in.

【0002】[0002]

【従来の技術】従来、ダイナミック型半導体メモリにお
いて、外部からの電源電圧はそのまま内部へと印加され
ていたが(すなわち、外部から5V印加されれば内部も
5V)、年々、半導体デバイスが微細化され、トランジ
スタのゲート長もサブミクロンの世界に入ると、電界に
よる信頼性の問題が起こるようになってきた。
2. Description of the Related Art Conventionally, in a dynamic semiconductor memory, a power supply voltage from the outside has been applied to the inside as it is (that is, if 5 V is applied from the outside, the inside is also 5 V), but the semiconductor device is miniaturized year by year. However, when the gate length of the transistor enters the submicron world, the reliability problem due to the electric field has come to occur.

【0003】そこで、最近、例えば16MDRAM等の
高集積メモリでは、外部電源電圧の印加電圧が5Vであ
りながら、内部では3V〜4V程度に電圧を下げてデバ
イスの信頼性を確保する内部電源降下回路を備えるもの
がある。
Therefore, recently, in a highly integrated memory such as 16M DRAM, an internal power supply voltage dropping circuit for ensuring the reliability of the device by internally lowering the voltage to about 3V to 4V while the applied voltage of the external power supply voltage is 5V. Some are equipped with.

【0004】ところで、一般に、半導体メモリでは、製
造工程中に生じる微細な欠陥によって引き起こされる初
期不良を出荷前のテスト工程中で除去するために、通常
使用時よりも高温・高電圧による連続動作を数時間〜数
十時間行う所謂バーンインと呼ばれる連続動作試験があ
る。ここで、高温・高電圧にするのは、通常時の動作条
件での数年〜数十年に該当するようにデバイスにかかる
ストレスを加速するためである。
By the way, generally, in a semiconductor memory, in order to remove an initial defect caused by a minute defect generated in a manufacturing process in a test process before shipping, a continuous operation at higher temperature and higher voltage than in normal use is performed. There is a so-called burn-in continuous operation test that is performed for several hours to several tens of hours. Here, the reason why the temperature is set to high temperature and high voltage is to accelerate the stress applied to the device so as to correspond to several years to several decades under normal operating conditions.

【0005】このため、内部電源降圧回路を内蔵した半
導体メモリでも外部電源電圧を上げていけば、一定の比
率で内部電源電圧も上がったり、又は外部電源電圧と等
しくなったり、あるいは特殊なタイミング設定等で外部
電源と内部電源が接続されたりして、デバイス内部で電
圧による加速が行えるようにしているのが一般的であ
る。
Therefore, even in the semiconductor memory having the internal power supply voltage down circuit, if the external power supply voltage is increased, the internal power supply voltage also rises at a constant rate or becomes equal to the external power supply voltage, or special timing setting, etc. In general, an external power source and an internal power source are connected to each other so that acceleration can be performed by a voltage inside the device.

【0006】[0006]

【発明が解決しようとする課題】しかしながら、上述し
た従来の内部電源降圧回路によるバーンイン中の電圧加
速では単純に電源電圧を上げた場合、ダイナミック型半
導体メモリのメモリセルのワード線等のように内部昇圧
された信号に高ストレスがかかりすぎて、チップを無用
に破壊してしまうことがあった。
However, in the voltage acceleration during burn-in by the above-described conventional internal power supply voltage down circuit, when the power supply voltage is simply increased, the internal voltage is increased like the word line of the memory cell of the dynamic semiconductor memory. The boosted signal was so stressed that it destroyed the chip unnecessarily.

【0007】また、破壊されない程度に電圧を下げてし
まうと、その反面、製造工程中でのバーンイン時間が数
百〜数千時間にもなってしまい、生産性が著しく損って
しまうという問題点がある。
On the other hand, if the voltage is lowered to such an extent that it is not destroyed, on the other hand, the burn-in time in the manufacturing process becomes hundreds to thousands of hours, resulting in a significant loss of productivity. There is.

【0008】この発明は上記のような問題点を解消する
ためになされたもので、適度な電圧加速が得られるよう
な値にバーンイン中の電源電圧が上げられるように、内
部昇圧信号の信号レベルをバーンイン時にコントロール
することができ、生産性を損わないバーンイン時間で初
期不良を検出できるダイナミック型半導体メモリを得る
ことを目的とする。
The present invention has been made in order to solve the above-mentioned problems, and the signal level of the internal boosting signal is increased so that the power supply voltage during burn-in can be increased to a value at which an appropriate voltage acceleration can be obtained. It is an object of the present invention to obtain a dynamic semiconductor memory capable of controlling the semiconductor device during burn-in and detecting an initial defect in a burn-in time that does not impair productivity.

【0009】[0009]

【課題を解決するための手段】この発明の請求項1に係
るダイナミック型半導体メモリは、内部電源の電圧レベ
ルを外部電源よりも降下させる内部電源降圧回路を備え
たダイナミック型半導体メモリにおいて、不良品を除去
する連続動作試験を行うためのバーンイン時に内部電源
のクランプレベルを通常使用時のそれよりも低く設定す
るクランプ回路を備えたものである。
A dynamic semiconductor memory according to claim 1 of the present invention is a dynamic semiconductor memory having an internal power supply voltage step-down circuit for lowering a voltage level of an internal power supply as compared with an external power supply. It is provided with a clamp circuit that sets the clamp level of the internal power supply to a lower level than that during normal use at the time of burn-in for performing a continuous operation test for removing.

【0010】また、請求項2に係るダイナミック型半導
体メモリは、内部電源の電圧レベルを外部電源よりも降
下させる内部電源降圧回路を備えたダイナミック型半導
体メモリにおいて、内部電源の電圧レベルを、不良品を
除去する連続動作試験のためのバーンイン時に、メモリ
セル部と周辺回路部とで別個に設定する電源設定回路を
備えたものである。
The dynamic semiconductor memory according to a second aspect of the invention is a dynamic semiconductor memory having an internal power supply voltage step-down circuit that lowers the voltage level of the internal power supply as compared with the external power supply. In the burn-in for the continuous operation test for removing the above, the memory cell section and the peripheral circuit section are separately provided with a power supply setting circuit.

【0011】[0011]

【作用】この発明の請求項1におけるダイナミック型半
導体メモリは、内部昇圧される信号のクランプレベルを
バーンイン時と通常使用時とで変えることにより、チッ
プのバーンイン中の破壊を防ぐ。
According to the first aspect of the present invention, the dynamic semiconductor memory prevents the chip from being destroyed during burn-in by changing the clamp level of the internally boosted signal during burn-in and during normal use.

【0012】また、請求項2におけるダイナミック型半
導体メモリは、内部昇圧される信号が使われる内部電圧
系とメモリセルに使う内部電圧系とをバーンイン時に独
立に制御してチップのバーンイン中の破壊を防ぐ。
According to another aspect of the dynamic semiconductor memory of the present invention, the internal voltage system in which the internally boosted signal is used and the internal voltage system used in the memory cell are independently controlled at the time of burn-in to prevent damage during chip burn-in. prevent.

【0013】[0013]

【実施例】【Example】

実施例1.以下、この発明の一実施例を説明する。図1
は実施例1に係る内部昇圧回路のクランプ回路を示す回
路図である。この内部昇圧回路は、内部で昇圧されてチ
ップ破壊を招く内部昇圧信号を、バーンイン時には、ク
ランプするレベルを変更して不必要にレベルが持ち上が
るのを防ぐ手段を備えた一例である。
Example 1. An embodiment of the present invention will be described below. Figure 1
3 is a circuit diagram showing a clamp circuit of an internal booster circuit according to Embodiment 1. FIG. This internal booster circuit is an example provided with a means for preventing an unnecessarily rising level of the internal boosted signal that is boosted internally and causes chip destruction at the time of burn-in by changing the clamped level.

【0014】図1において、11,12及び14はN型
MOSトランジスタ、13はP型MOSトランジスタで
あり、P型MOSトランジスタ13のゲートには、バー
ンイン時に“L”レベルに活性化されるバーンイン時制
御信号バーB.I.Enableが入力される。このバーンイ
ン時制御信号は、例えば外部電源電圧が高められて5V
から7V以上になると活性化されたり、あるいは特定の
タイミングで特定ピンに高電圧が印加される例えばアド
レスキー等により、バーンインであることの認識に基づ
いて与えられる。なお、図示される内部電源は内部電源
降圧回路により外部電源に対して一定した比率で降下さ
れた電源である。
In FIG. 1, 11, 12, and 14 are N-type MOS transistors, 13 is a P-type MOS transistor, and the gate of the P-type MOS transistor 13 is activated to "L" level during burn-in. Control signal bar B. I. Enable is input. The control signal during burn-in is, for example, 5 V when the external power supply voltage is increased.
Is activated when the voltage exceeds 7V or more, or is applied based on the recognition of burn-in by an address key or the like in which a high voltage is applied to a specific pin at a specific timing. The internal power supply shown in the figure is a power supply that has been dropped by the internal power supply voltage down circuit at a constant ratio to the external power supply.

【0015】次に、図1の構成に係る動作を説明する。
今、バーンインである事を認識し、バーンイン時制御信
号バーB.I.Enableが“L”レベルに活性化される
と、P型MOSトランジスタ13がONして、これによ
り、内部昇圧信号は、内部電源電圧+N型MOSトラン
ジスタ14のしきい値Vthレベルにクランプされるよう
になる。
Next, the operation according to the configuration of FIG. 1 will be described.
Now that the burn-in is recognized, the control signal bar B. I. When Enable is activated to "L" level, the P-type MOS transistor 13 is turned on, whereby the internal boosted signal is clamped to the internal power supply voltage + threshold Vth level of the N-type MOS transistor 14. Like

【0016】それ以外の時、つまり通常時にはトランジ
スタ13,14のパスは常にしゃ断されているため、内
部昇圧信号はn型MOSトランジスタ11,12による
クランプレベル、すなわち、内部電源電圧+n型MOS
トランジスタ11のしきい値Vth+n型MOSトランジ
スタ12のしきい値Vthレベルである。
At other times, that is, in normal times, the paths of the transistors 13 and 14 are always cut off, so that the internal boosted signal is clamped by the n-type MOS transistors 11 and 12, that is, the internal power supply voltage + n-type MOS.
The threshold value V th of the transistor 11 + the threshold value V th level of the n-type MOS transistor 12 is set.

【0017】従って、クランプ用のn型MOSトランジ
スタ11,12,14のしきい値Vthn が等しいとす
れば、通常時は、内部電源電圧+2×Vthn となり、
バーンイン時は、内部電源電圧+Vthn となって、V
thn だけ内部昇圧信号はバーンイン時に通常時よりク
ランプレベルが低くなり、この信号に通じるノードはそ
の分保護されることになる。
Therefore, assuming that the clamping n-type MOS transistors 11, 12, and 14 have the same threshold value V th · n , the normal power supply voltage is + 2 × V th · n .
At the time of burn-in, the internal power supply voltage becomes + V th · n, and V
During the burn-in, the clamp level of the internal boosted signal by th · n becomes lower than in the normal state, and the node communicating with this signal is protected accordingly.

【0018】また、電源電圧が高いバーンインを行う場
合は、図2に示すように、図1のn型MOSトランジス
タ14を使わずにバーンイン時は直に内部電源電圧レベ
ルとしてしまうことも考えられる。
When performing a burn-in with a high power supply voltage, as shown in FIG. 2, the internal power supply voltage level may be directly set during the burn-in without using the n-type MOS transistor 14 of FIG.

【0019】従って、上記実施例1によれば、内部昇圧
される内部信号のレベルをバーンイン時に制御すること
により、適度な電圧加速が行えて、かつチップ破壊を起
こさないようにすることができる。
Therefore, according to the first embodiment, by controlling the level of the internal signal boosted internally during burn-in, it is possible to perform appropriate voltage acceleration and prevent chip destruction.

【0020】次に、この発明の実施例2について説明す
る。図3は実施例2に係る構成図である。図3に示すよ
うに、昇圧レベルのみにこだわることなく、メモリセル
に使う内部降圧回路と、昇圧レベルを含む周辺回路用に
使う内部降圧回路とを独立に制御して、バーンイン時の
電源電圧そのものの値を変えてしまう方法も考えられ
る。
Next, a second embodiment of the present invention will be described. FIG. 3 is a configuration diagram according to the second embodiment. As shown in FIG. 3, the internal voltage down converter used for the memory cell and the internal voltage down converter used for the peripheral circuit including the voltage boost level are independently controlled without paying attention to only the voltage boost level, and the power supply voltage itself at the time of burn-in It is also possible to change the value of.

【0021】この時には、バーンイン用時にバーンイン
時制御信号バーB.I.Enableが活性化されて、メモリ
セル用電源には外部電源がそのまま出るようになり、周
辺回路用電源には、外部電源よりn型MOSトランジス
タ22のしきい値Vth分だけ降下したレベルが出ていく
ようになっている。メモリセル用の方が高い理由は、バ
ーンイン時の主な目的が面積も大きい多数のメモリセル
により高い電界をかけて欠陥セルをスクリーニングする
ことだからである。
At this time, the burn-in control signal bar B. I. The Enable is activated, and the external power supply comes to be output to the memory cell power supply as it is, and the peripheral circuit power supply has a level lower than the external power supply by the threshold value V th of the n-type MOS transistor 22. It is designed to work. The reason for the higher cost for the memory cell is that the main purpose at the time of burn-in is to screen a defective cell by applying a high electric field to a large number of memory cells having a large area.

【0022】[0022]

【発明の効果】以上のように、この発明の請求項1によ
れば、内部電源の電圧レベルを外部電源よりも降下させ
る内部電源降圧回路を備えたダイナミック型半導体メモ
リにおいて、不良品を除去する連続動作試験を行うため
のバーンイン時に内部電源のクランプレベルを通常使用
時のそれよりも低く設定するクランプ回路を備えたの
で、バーンイン時に内部昇圧レベルが過度に高電位にな
るのを防ぐ事ができ、生産性を損わない程度の時間でバ
ーンインの行える高電位に電源電圧を設定できるダイナ
ミック型半導体メモリが得られるという効果がある。
As described above, according to the first aspect of the present invention, defective products are eliminated in the dynamic semiconductor memory having the internal power supply voltage down circuit for lowering the voltage level of the internal power supply as compared with the external power supply. A clamp circuit that sets the clamp level of the internal power supply to a lower level than that during normal use during burn-in for performing continuous operation tests prevents the internal boost level from becoming excessively high during burn-in. There is an effect that a dynamic semiconductor memory in which the power supply voltage can be set to a high potential in which burn-in can be performed in a time that does not impair productivity is obtained.

【0023】また、請求項2によれば、内部電源の電圧
レベルを外部電源よりも降下させる内部電源降圧回路を
備えたダイナミック型半導体メモリにおいて、内部電源
の電圧レベルを、不良品を除去する連続動作試験のため
のバーンイン時に、メモリセル部と周辺回路部とで別個
に設定する電源設定回路を備えたので、内部昇圧される
信号が使われる内部電圧系とメモリセルに使う内部電圧
系とをバーンイン時に独立に制御してチップのバーンイ
ン中の破壊を防ぐことができるという効果がある。
According to a second aspect of the present invention, in a dynamic semiconductor memory having an internal power supply voltage step-down circuit that lowers the voltage level of the internal power supply than that of the external power supply, the voltage level of the internal power supply is continuously changed to eliminate defective products. At the time of burn-in for the operation test, the memory cell section and the peripheral circuit section are equipped with a power supply setting circuit that is set separately, so the internal voltage system used for the internally boosted signal and the internal voltage system used for the memory cell are There is an effect that the chip can be prevented from being destroyed during burn-in by controlling independently at the time of burn-in.

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明の実施例1による内部昇圧回路のクラ
ンプ回路を示す回路図である。
FIG. 1 is a circuit diagram showing a clamp circuit of an internal booster circuit according to a first embodiment of the present invention.

【図2】図1の他の実施例を示す回路図である。FIG. 2 is a circuit diagram showing another embodiment of FIG.

【図3】この発明の実施例2による内部昇圧回路のクラ
ンプ回路を示す回路図である。
FIG. 3 is a circuit diagram showing a clamp circuit of an internal booster circuit according to a second embodiment of the present invention.

【符号の説明】[Explanation of symbols]

11 n型MOSトランジスタ 12 n型MOSトランジスタ 13 p型MOSトランジスタ 14 n型MOSトランジスタ 21 p型MOSトランジスタ 22 n型MOSトランジスタ 23 p型MOSトランジスタ 11 n-type MOS transistor 12 n-type MOS transistor 13 p-type MOS transistor 14 n-type MOS transistor 21 p-type MOS transistor 22 n-type MOS transistor 23 p-type MOS transistor

─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成5年4月12日[Submission date] April 12, 1993

【手続補正1】[Procedure Amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0003[Name of item to be corrected] 0003

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0003】そこで、最近、例えば16MDRAM等の
高集積メモリでは、外部電源電圧の印加電圧が5Vであ
りながら、内部では3V〜4V程度に電圧を下げてデバ
イスの信頼性を確保する内部電源降回路を備えるもの
がある。
[0003] Therefore, recently, for example in a highly integrated memory such as 16M DRAM, yet applied voltage of the external power supply voltage is 5V, and an internal descending internal power supply to ensure the reliability of the device by lowering the voltage to approximately 3V~4V pressure Some have a circuit.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 内部電源の電圧レベルを外部電源よりも
降下させる内部電源降圧回路を備えたダイナミック型半
導体メモリにおいて、不良品を除去する連続動作試験を
行うためのバーンイン時に内部電源のクランプレベルを
通常使用時のそれよりも低く設定するクランプ回路を備
えたことを特徴とするダイナミック型半導体メモリ。
1. A dynamic semiconductor memory having an internal power supply voltage-down circuit for lowering the voltage level of an internal power supply as compared with an external power supply, wherein the clamp level of the internal power supply is set at the time of burn-in for conducting a continuous operation test for removing defective products. A dynamic semiconductor memory having a clamp circuit which is set lower than that during normal use.
【請求項2】 内部電源の電圧レベルを外部電源よりも
降下させる内部電源降圧回路を備えたダイナミック型半
導体メモリにおいて、内部電源の電圧レベルを、不良品
を除去する連続動作試験のためのバーンイン時に、メモ
リセル部と周辺回路部とで別個に設定する電源設定回路
を備えたことを特徴とするダイナミック型半導体メモ
リ。
2. A dynamic semiconductor memory having an internal power supply voltage step-down circuit for lowering the voltage level of an internal power supply than an external power supply, at the time of burn-in for a continuous operation test for removing defective products. A dynamic semiconductor memory having a power setting circuit for separately setting a memory cell section and a peripheral circuit section.
JP4267255A 1992-10-06 1992-10-06 Dynamic semiconductor memory Pending JPH06119776A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4267255A JPH06119776A (en) 1992-10-06 1992-10-06 Dynamic semiconductor memory

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4267255A JPH06119776A (en) 1992-10-06 1992-10-06 Dynamic semiconductor memory

Publications (1)

Publication Number Publication Date
JPH06119776A true JPH06119776A (en) 1994-04-28

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP4267255A Pending JPH06119776A (en) 1992-10-06 1992-10-06 Dynamic semiconductor memory

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JP (1) JPH06119776A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7408818B2 (en) 2006-02-09 2008-08-05 Renesas Technology Corp. Semiconductor device undergoing defect detection test

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7408818B2 (en) 2006-02-09 2008-08-05 Renesas Technology Corp. Semiconductor device undergoing defect detection test

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