JPH06115959A - Method for flame deposition - Google Patents

Method for flame deposition

Info

Publication number
JPH06115959A
JPH06115959A JP26130092A JP26130092A JPH06115959A JP H06115959 A JPH06115959 A JP H06115959A JP 26130092 A JP26130092 A JP 26130092A JP 26130092 A JP26130092 A JP 26130092A JP H06115959 A JPH06115959 A JP H06115959A
Authority
JP
Japan
Prior art keywords
burner
constant
rotary plate
speed
flame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26130092A
Other languages
Japanese (ja)
Inventor
Katsuo Yamamoto
克夫 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP26130092A priority Critical patent/JPH06115959A/en
Publication of JPH06115959A publication Critical patent/JPH06115959A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/14Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1484Means for supporting, rotating or translating the article being formed
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/14Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415Reactant delivery systems
    • C03B19/1423Reactant deposition burners
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/60Relationship between burner and deposit, e.g. position
    • C03B2207/66Relative motion

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)

Abstract

PURPOSE:To provide a method for flame deposition in which a uniform amount of deposition on a substrate can be obtained even if both the moving speed of a burner and the rotational speed of a rotating plate are kept constant. CONSTITUTION:A deposit synthesized in a flame of a flame reactional burner 5 present above a rotating plate 2 is deposited on substrates 1 while rotating the rotating plate 2 having the substrates installed thereon at a constant rotational frequency. In the process, when the peripheral speed of the rotating plate 2 in a part where the deposit is accumulated is (v) and the moving speed of the burner in the rotating radial direction of the rotating plate 2 is (s), the moving locus 6 of, the burner 5 is defined as a convex type curve having the maximum in the rotational direction of the rotating plate 2 so as to provide the (vXs) always constant. A driving force at a constant speed is applied from a constant rate reciprocation driving mechanism 8 to the burner in the rotating radial direction of the rotating plate 2 to carry out the reciprocation driving of the burner 5.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、基板を設置した回転板
を回転させつつ、該回転板の上方に存在する火炎反応バ
ーナの火炎中で合成した堆積物を該基板の上に堆積させ
る火炎堆積方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flame for rotating a rotary plate on which a substrate is installed, and depositing on the substrate a deposit synthesized in a flame of a flame reaction burner existing above the rotary plate. It relates to a deposition method.

【0002】[0002]

【従来の技術】図5及び図6は、従来の火炎堆積方法の
実施状況を示したものである。この場合には、複数枚の
基板1を周方向に並べて設置した回転板2を減速機3を
介して例えばサーボモータのような高精度のモータ4で
一定回転数で低速回転させる。かかる状態で、該回転板
2の上方に存在する火炎反応バーナ5を、回転板2の径
方向のA点,B点間に直線状に往復移動させつつ、該バ
ーナ5の火炎中で合成した堆積物を各基板1の上に堆積
させる。
2. Description of the Related Art FIGS. 5 and 6 show the state of implementation of a conventional flame deposition method. In this case, the rotary plate 2 in which a plurality of substrates 1 are arranged side by side in the circumferential direction is rotated at a constant rotational speed at a low speed by a high-precision motor 4 such as a servomotor via a speed reducer 3. In this state, the flame reaction burner 5 existing above the rotary plate 2 was linearly reciprocated between the points A and B in the radial direction of the rotary plate 2 while being synthesized in the flame of the burner 5. The deposit is deposited on each substrate 1.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、このよ
うな従来の火炎堆積方法では、基板1が乗っている回転
板2の回転を一定(N rpm)とすれば、外周側の半径D
の位置の周速がπDN/min 、内周側の半径dの位置の
周速がπdN/min と変化するため、基板1に均一な堆
積量を得るためには、非常に難しいバーナ5の移動量調
整をしなければならない問題点がある。
However, in such a conventional flame deposition method, if the rotation of the rotary plate 2 on which the substrate 1 is placed is constant (N rpm), the radius D on the outer peripheral side is increased.
Since the peripheral velocity at the position of πDN / min and the peripheral velocity at the position of the radius d on the inner peripheral side change to πdN / min, it is very difficult to move the burner 5 to obtain a uniform deposition amount on the substrate 1. There is a problem that the amount must be adjusted.

【0004】また、バーナ5の移動速度を一定にした場
合には、非常に難しい回転板2の回転速度調整をしなけ
ればならない問題点がある。
Further, when the moving speed of the burner 5 is made constant, there is a problem that it is very difficult to adjust the rotating speed of the rotary plate 2.

【0005】更に、このようなバーナ5の移動量調整や
回転速度調整をするには、その制御を行う制御回路のコ
ストが高くなる問題点がある。
Furthermore, in order to adjust the movement amount and the rotation speed of the burner 5 as described above, there is a problem that the cost of a control circuit for controlling the burner 5 becomes high.

【0006】本発明の目的は、バーナの移動速度を一
定、回転板の回転速度を一定としても基板に均一な堆積
量を得ることができる火炎堆積方法を提供することにあ
る。
An object of the present invention is to provide a flame deposition method capable of obtaining a uniform deposition amount on a substrate even if the burner moving speed is constant and the rotating plate rotating speed is constant.

【0007】[0007]

【課題を解決するための手段】上記の目的を達成する本
発明の手段を説明すると、本発明は基板を設置した回転
板を一定回転数で回転させつつ、該回転板の上方に存在
する火炎反応バーナの火炎中で合成した堆積物を前記基
板の上に堆積させる火炎堆積方法において、前記堆積物
が堆積される部分の前記回転板の周速をvとし、前記回
転板の回転半径方向への前記バーナの移動速度をsとし
たとき、常にv×s=一定となるように前記バーナの移
動軌跡を前記回転板の回転方向に凸となる凸型曲線に定
め、前記バーナに前記回転板の回転半径方向へ一定速度
の駆動力を与えて該バーナの往復駆動を行うことを特徴
とする。
Means for Solving the Problems To explain the means of the present invention for achieving the above-mentioned object, the present invention is to rotate a rotating plate on which a substrate is installed at a constant rotation speed and to present a flame existing above the rotating plate. In a flame deposition method for depositing a deposit synthesized in a flame of a reaction burner on the substrate, a peripheral speed of the rotary plate at a portion where the deposit is deposited is set to v, and a radial direction of the rotary plate is rotated. When the moving speed of the burner is s, the moving locus of the burner is set to a convex curve that is convex in the rotation direction of the rotating plate so that v × s = constant, and the rotating plate is provided to the burner. The burner is reciprocally driven by applying a constant speed driving force in the radial direction of rotation.

【0008】[0008]

【作用】このようにv×s=一定の条件で堆積物を基板
上に堆積させると、基板に均一な堆積量を得ることがで
きる。
When the deposit is deposited on the substrate under the condition that v × s = constant in this way, a uniform deposition amount on the substrate can be obtained.

【0009】この場合、v×s=一定となるようにバー
ナの移動軌跡を回転板の回転方向に凸となる凸型曲線に
定めると、回転板の回転数を一定、バーナに与える駆動
速度を一定の条件で基板に均一な堆積量を得るための駆
動を行わせることができ、駆動装置が簡単になり、コス
トの低減を図ることができる。
In this case, if the locus of movement of the burner is set to a convex curve which is convex in the rotation direction of the rotary plate so that v × s = constant, the rotational speed of the rotary plate is constant and the drive speed given to the burner is constant. It is possible to drive the substrate under a constant condition to obtain a uniform deposition amount, the driving device is simplified, and the cost can be reduced.

【0010】[0010]

【実施例】本発明に係る火炎堆積方法の一実施例を図1
及び図2を参照して詳細に説明する。なお、前述した図
5及び図6と対応する部分には、同一符号を付けて示し
ている。
FIG. 1 shows an embodiment of the flame deposition method according to the present invention.
Also, a detailed description will be given with reference to FIG. The parts corresponding to those in FIGS. 5 and 6 described above are denoted by the same reference numerals.

【0011】本実施例では、周方向に複数の基板1を設
置した回転板2を、減速機3を介して例えばサーボモー
タのような高精度のモータ4によって一定回転数で低速
回転させる。
In this embodiment, the rotary plate 2 having a plurality of substrates 1 arranged in the circumferential direction is rotated at a constant rotational speed by a high-precision motor 4 such as a servomotor via a speed reducer 3.

【0012】かかる条件のもとで、堆積物が堆積される
部分の回転板2の周速をvとし、該回転板2の回転半径
方向へのバーナ5の移動速度をsとしたとき、常にv×
s=一定となるようにバーナ5の移動軌跡6を回転板2
の回転方向に凸となる凸型曲線に定める。
Under these conditions, when the peripheral speed of the rotary plate 2 on which the deposit is deposited is v and the moving speed of the burner 5 in the radial direction of rotation of the rotary plate 2 is s, it is always vx
The movement path 6 of the burner 5 is set to the rotary plate 2 so that s = constant.
Set to a convex curve that is convex in the rotation direction of.

【0013】バーナ5には、回転板2の回転半径方向へ
一定速度の駆動力を与えて該バーナ5を往復駆動させ
る。
A driving force of a constant speed is applied to the burner 5 in the rotation radius direction of the rotary plate 2 to reciprocate the burner 5.

【0014】このようにv×s=一定の条件で堆積物を
基板1上に堆積させると、各基板1に均一な堆積量を得
ることができる。
When the deposit is deposited on the substrate 1 under the condition that v × s = constant in this way, a uniform deposition amount can be obtained on each substrate 1.

【0015】この場合、v×s=一定となるようにバー
ナ5の移動軌跡6を回転板2の回転方向に凸となる凸型
曲線に定めると、回転板2の回転数を一定、バーナ5に
与える駆動速度を一定の条件で基板1に均一な堆積量を
得るための駆動を行わせることができ、駆動装置が簡単
になり、コストの低減を図ることができる。
In this case, if the moving locus 6 of the burner 5 is set to a convex curve which is convex in the rotation direction of the rotary plate 2 so that v × s = constant, the rotational speed of the rotary plate 2 is constant and the burner 5 is constant. It is possible to drive the substrate 1 so as to obtain a uniform deposition amount under a constant drive speed given to the substrate 1, the drive device becomes simple, and the cost can be reduced.

【0016】図3及び図4は、バーナ5を移動軌跡6に
沿って駆動する駆動装置の一例を示したものである。
FIGS. 3 and 4 show an example of a drive device for driving the burner 5 along the movement locus 6.

【0017】即ち、本実施例では、回転板2の上方にガ
イド体7を設け、図示しない支持手段で所定の向きで移
動しないようにしておく。該ガイド体7の下面には、バ
ーナ5の移動軌跡6を溝として設けておく。バーナ5
は、その上部を該溝よりなる移動軌跡6に嵌め、落下し
ないように係止させて該移動軌跡6に沿って移動するよ
うにしておく。
That is, in this embodiment, the guide member 7 is provided above the rotary plate 2 so that the guide member 7 does not move in a predetermined direction by the support means (not shown). The movement locus 6 of the burner 5 is provided as a groove on the lower surface of the guide body 7. Burner 5
The upper part is fitted to the movement locus 6 formed of the groove, and is locked so as not to fall so as to move along the movement locus 6.

【0018】回転板2の外周より外の位置には、油圧シ
リンダーや電動シリンダーの如き定速往復駆動機構8を
基台9に乗せて設置する。該定速往復駆動機構8は水平
方向の向きを変えられるように支持軸10で回動自在に
支持させておく。
At a position outside the outer periphery of the rotary plate 2, a constant speed reciprocating drive mechanism 8 such as a hydraulic cylinder or an electric cylinder is mounted on a base 9. The constant speed reciprocating drive mechanism 8 is rotatably supported by a support shaft 10 so that the horizontal direction can be changed.

【0019】該定速往復駆動機構8の可動軸8aの先端
にバーナ5を支持させる。該バーナ5にはガス供給口5
aからガスを供給する。
The burner 5 is supported at the tip of the movable shaft 8a of the constant speed reciprocating drive mechanism 8. The burner 5 has a gas supply port 5
Gas is supplied from a.

【0020】このような構成で回転板2を一定回転数で
低速回転させ、且つバーナ5には定速往復駆動機構8か
ら一定速度の往復駆動力を与える。すると、バーナ5は
移動軌跡6に沿って移動される。該移動軌跡6は、平面
図で見ると回転板2の回転方向に凸となる凸型曲線の形
になっているので、周速度が速い回転板2の外周側での
回転板2の回転半径方向へのバーナ5の移動速度は遅く
なり、周速度が遅い回転板2の中心側での回転板2の回
転半径方向へのバーナ5の移動速度は速くなる。
With such a structure, the rotary plate 2 is rotated at a constant rotational speed at a low speed, and a constant speed reciprocating driving force is applied to the burner 5 from the constant speed reciprocating driving mechanism 8. Then, the burner 5 is moved along the movement track 6. When viewed in a plan view, the movement locus 6 is in the form of a convex curve that is convex in the rotation direction of the rotary plate 2, so the radius of rotation of the rotary plate 2 on the outer peripheral side of the rotary plate 2 having a high peripheral speed. The moving speed of the burner 5 in the direction becomes slow, and the moving speed of the burner 5 in the radial direction of rotation of the rotary plate 2 on the center side of the rotary plate 2 having a low peripheral speed becomes fast.

【0021】従って、堆積物が堆積される部分の回転板
2の周速をvとし、該回転板2の回転半径方向へのバー
ナ5の移動速度をsとしたとき、常にv×s=一定とな
るように制御を行うことができる。故に、簡単な駆動装
置を用いて、各基板1に均一な堆積量を得ることができ
る。
Therefore, when the peripheral speed of the rotary plate 2 on which the deposit is deposited is v, and the moving speed of the burner 5 in the radial direction of rotation of the rotary plate 2 is s, v × s = constant Can be controlled so that Therefore, it is possible to obtain a uniform deposition amount on each substrate 1 using a simple driving device.

【0022】回転板2:直径1000mm、基板1:直径75m
m、回転板2の回転数:max 20 rpm、バーナ5の移動速
度:5mm/sec の条件で実験したところ、基板1の表面
に略均一な堆積物を形成することができた。
Rotating plate 2: diameter 1000 mm, substrate 1: diameter 75 m
When an experiment was conducted under the conditions of m, the number of revolutions of the rotary plate 2: max 20 rpm, and the moving speed of the burner 5: 5 mm / sec, a substantially uniform deposit could be formed on the surface of the substrate 1.

【0023】[0023]

【発明の効果】以上説明したように、本発明に係る火炎
堆積方法では、堆積物が堆積される部分の回転板の周速
をvとし、該回転板の回転半径方向へのバーナの移動速
度をsとしたとき、常にv×s=一定の条件で堆積物を
基板上に堆積させるので、該基板に均一な堆積量を得る
ことができる。
As described above, in the flame deposition method according to the present invention, the peripheral speed of the rotary plate on which the deposit is deposited is v, and the moving speed of the burner in the radial direction of rotation of the rotary plate. Where s is s, the deposit is always deposited on the substrate under the condition that v × s = constant, so that a uniform deposition amount can be obtained on the substrate.

【0024】特に本発明では、v×s=一定となるよう
にバーナの移動軌跡を、回転板の回転方向に凸となる凸
型曲線として定めているので、回転板の回転数を一定、
バーナに与える駆動速度を一定の条件で、基板に均一な
堆積量を得るための駆動を行わせることができる。この
ため、回転板及びバーナの駆動装置が共に簡単になり、
装置のコストの低減を図ることができる。
In particular, in the present invention, the trajectory of the burner is defined as a convex curve which is convex in the rotation direction of the rotating plate so that v × s = constant.
It is possible to drive the substrate to obtain a uniform deposition amount under a constant drive speed given to the burner. Therefore, the drive device for the rotary plate and the burner are both simple,
The cost of the device can be reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る火炎堆積方法を実施する装置の一
例を示す平面図である。
FIG. 1 is a plan view showing an example of an apparatus for carrying out a flame deposition method according to the present invention.

【図2】本発明に係る火炎堆積方法を実施する装置の一
例を示す側面図である。
FIG. 2 is a side view showing an example of an apparatus for carrying out the flame deposition method according to the present invention.

【図3】本実施例のバーナ駆動装置を示す平面図であ
る。
FIG. 3 is a plan view showing a burner driving device of this embodiment.

【図4】本実施例のバーナ駆動装置を示す一部縦断側面
図である。
FIG. 4 is a partially longitudinal side view showing the burner driving device of the present embodiment.

【図5】従来の火炎堆積装置の平面図である。FIG. 5 is a plan view of a conventional flame deposition device.

【図6】従来の火炎堆積装置の側面図である。FIG. 6 is a side view of a conventional flame deposition device.

【符号の説明】[Explanation of symbols]

1 基板 2 回転板 3 減速機 4 モータ 5 火炎反応バーナ 6 移動軌跡 7 ガイド体 8 定速往復駆動機構 9 基台 10 支持軸 1 Substrate 2 Rotating Plate 3 Reducer 4 Motor 5 Flame Reaction Burner 6 Trajectory 7 Guide Body 8 Constant Speed Reciprocating Drive Mechanism 9 Base 10 Support Shaft

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 基板を設置した回転板を一定回転数で回
転させつつ、該回転板の上方に存在する火炎反応バーナ
の火炎中で合成した堆積物を前記基板の上に堆積させる
火炎堆積方法において、 前記堆積物が堆積される部分の前記回転板の周速をvと
し、前記回転板の回転半径方向への前記バーナの移動速
度をsとしたとき、常にv×s=一定となるように前記
バーナの移動軌跡を前記回転板の回転方向に凸となる凸
型曲線に定め、前記バーナに前記回転板の回転半径方向
へ一定速度の駆動力を与えて該バーナの往復駆動を行う
ことを特徴とする火炎堆積方法。
1. A flame deposition method in which a rotary plate on which a substrate is installed is rotated at a constant rotational speed, and a deposit synthesized in a flame of a flame reaction burner existing above the rotary plate is deposited on the substrate. In the above, when v is the peripheral speed of the rotary plate of the portion on which the deposit is deposited and s is the moving speed of the burner in the radial direction of rotation of the rotary plate, v x s is always constant. The movement trajectory of the burner is defined as a convex curve that is convex in the rotation direction of the rotary plate, and a reciprocating drive of the burner is performed by applying a constant speed driving force to the burner in the rotation radius direction of the rotary plate. Flame deposition method characterized by.
JP26130092A 1992-09-30 1992-09-30 Method for flame deposition Pending JPH06115959A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26130092A JPH06115959A (en) 1992-09-30 1992-09-30 Method for flame deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26130092A JPH06115959A (en) 1992-09-30 1992-09-30 Method for flame deposition

Publications (1)

Publication Number Publication Date
JPH06115959A true JPH06115959A (en) 1994-04-26

Family

ID=17359884

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26130092A Pending JPH06115959A (en) 1992-09-30 1992-09-30 Method for flame deposition

Country Status (1)

Country Link
JP (1) JPH06115959A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1153894A1 (en) * 2000-05-12 2001-11-14 The Furukawa Electric Co., Ltd. Manufacturing method of optical waveguide
KR100389577B1 (en) * 2001-06-26 2003-06-27 주식회사 세미텔 Uniform Deposition System Of A Semiconductor Wafer And Storage Medium Thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1153894A1 (en) * 2000-05-12 2001-11-14 The Furukawa Electric Co., Ltd. Manufacturing method of optical waveguide
KR100389577B1 (en) * 2001-06-26 2003-06-27 주식회사 세미텔 Uniform Deposition System Of A Semiconductor Wafer And Storage Medium Thereof

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