JPH06106477A - Super-finishing working device - Google Patents

Super-finishing working device

Info

Publication number
JPH06106477A
JPH06106477A JP28077592A JP28077592A JPH06106477A JP H06106477 A JPH06106477 A JP H06106477A JP 28077592 A JP28077592 A JP 28077592A JP 28077592 A JP28077592 A JP 28077592A JP H06106477 A JPH06106477 A JP H06106477A
Authority
JP
Japan
Prior art keywords
drum
grinding liquid
less
filter unit
foreign matters
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP28077592A
Other languages
Japanese (ja)
Other versions
JP3294338B2 (en
Inventor
Takashige Shiratori
貴重 白鳥
Shigeo Hayashi
繁雄 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Optical Co Ltd filed Critical Olympus Optical Co Ltd
Priority to JP28077592A priority Critical patent/JP3294338B2/en
Publication of JPH06106477A publication Critical patent/JPH06106477A/en
Application granted granted Critical
Publication of JP3294338B2 publication Critical patent/JP3294338B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

PURPOSE:To carry out polishing work in fine surface roughness by removing foreign matters contained in grinding liquid. CONSTITUTION:A centrifugal sparator 16 is arranged to carry out centrifugal separation on foreign matters contained in used grinding liquid 21 discharged from a surface polishing device body 15. Next, a 10mum filter unit 10 is arranged to remove the foreign matters of not less than 10mum. A 5mum filter unit 20 is also arranged to remove the foreign matters of not less than 5mum. The grinding liquid from which the foreign matters of not less than 5mum are resupplied to the surface polishing device body 15. Circulation of this grinding liquid 21 is carried out by a pump 8. In this way, when particle diameters of the forein matters contained in the grinding liquid 21 are less than 5mum, the maximum surface roughness of a polished material becomes reliably 1mum or less.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、フィルム式の超仕上げ
加工装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a film type super finishing apparatus.

【0002】[0002]

【従来の技術】図3はOA機器のプリンターを示す概略
図である。このプリンターは、印字記号に基ずき、イオ
ンカートリッジ1から発生したイオン2を回転するドラ
ム3に向かって放射し、ドラム3に印字信号に対応した
電荷を乗せ、静電潜像を形成する。そして、マグネット
ローラ5で磁化した一成分磁性トナー4により顕像化す
る。次に、給紙された用紙6の裏側からプレッシャーロ
ーラー7により圧力をかけることで転写と定着を同時に
行う。そして、ドラム3上の残留トナーをクリーニング
ブレード8によって除去し、さらに、次の作像のために
イレーサー9によってドラム3上の残留電荷を消去す
る。
2. Description of the Related Art FIG. 3 is a schematic view showing a printer of an office automation equipment. This printer emits ions 2 generated from an ion cartridge 1 toward a rotating drum 3 based on a print symbol, and charges the drum 3 with an electric charge corresponding to a print signal to form an electrostatic latent image. Then, the image is visualized by the one-component magnetic toner 4 magnetized by the magnet roller 5. Next, pressure and pressure are applied from the back side of the fed paper 6 by the pressure roller 7, so that transfer and fixing are performed at the same time. Then, the residual toner on the drum 3 is removed by the cleaning blade 8, and the residual charge on the drum 3 is erased by the eraser 9 for the next image formation.

【0003】このような構造を持つプリンターにおい
て、画質を決定する一つの大きな要素としてドラム3の
静電潜像を顕像化する際のドラム3とマグネットローラ
ー5の隙間寸法Pが挙げられる。すなわち、寸法Pの変
化(振れ)が大きいと文字、記号の歪、印字の濃淡等の
不具合になる。故に、ドラム3、マグネットローラー5
は、共にその加工に高精度が求められる。
In the printer having such a structure, one of the major factors that determines the image quality is the gap size P between the drum 3 and the magnet roller 5 when the electrostatic latent image on the drum 3 is visualized. That is, if the change (fluctuation) of the dimension P is large, there are problems such as distortion of characters and symbols, and shading of printing. Therefore, drum 3, magnet roller 5
Both require high precision in their processing.

【0004】特にドラム3は、電荷の保持が可能なこ
と、高寿命を実現するために表面硬度が高く、耐磨耗
性がよいこと、一成分磁性トナーの離型性のよいこ
と、が求められる。そのため、ドラムの円筒表面に厚さ
30〜40μmの絶縁塗装が施されていた。
In particular, the drum 3 is required to be capable of retaining electric charge, to have a high surface hardness in order to realize a long life, to have good abrasion resistance, and to have good releasability of the one-component magnetic toner. To be Therefore, the cylindrical surface of the drum is coated with an insulating coating having a thickness of 30 to 40 μm.

【0005】その状態を図4に示す。この塗装膜10は
酸化アルミナ等の微粒を含む樹脂でできており、ドラム
3に吹き付け塗装されていた。この塗装膜10の表面粗
さは最大面粗さが3〜4μmであり、表面はオレンジピ
ールと呼ばれる肌をしているため、以下の不具合があっ
た。
The state is shown in FIG. The coating film 10 was made of a resin containing fine particles such as alumina oxide, and was spray-coated on the drum 3. The surface roughness of the coating film 10 has a maximum surface roughness of 3 to 4 μm, and the surface has a skin called orange peel, so that the following problems occur.

【0006】表面粗さが粗いため、表面に付く1〜2
μmの微粒であるトナー4の量が一定にならず、用紙6
に転写された文字、記号等の濃度にムラが出る不具合が
あった。 樹脂塗装膜10は、耐磨耗性を持たせるために酸化ア
ルミナ等の微粒子を含んでいるが、樹脂塗装膜10に均
一に分散しないで塗装膜10の下側へ酸化アルミナ等の
微粒子が沈降する現象が生じ、結果として塗装膜10の
上部の5〜10μmの層の微粒子が不足する。この微粒
子が不足した部分は硬度が低く、耐磨耗性が低い等の欠
点がある。このため、ドラムの耐久性に大きな問題があ
った。
[0006] Because the surface roughness is rough, 1-2 is attached to the surface.
The amount of toner 4 which is fine particles of μm does not become constant, and
There was a problem that the density of characters, symbols, etc. transferred to was uneven. The resin coating film 10 contains fine particles of alumina oxide or the like in order to have abrasion resistance, but the fine particles of alumina oxide or the like settle below the coating film 10 without being uniformly dispersed in the resin coating film 10. Occurs, and as a result, the particles in the layer of 5 to 10 μm above the coating film 10 are insufficient. The portion lacking the fine particles has drawbacks such as low hardness and low abrasion resistance. Therefore, there is a big problem in the durability of the drum.

【0007】そこで、塗装したドラムを周知のフィルム
式の超仕上げ加工装置で研磨して硬度の不足した部分の
5〜10μmを除去すると共に、最大面粗さを1μm以
下の押さえる必要があった。
Therefore, it is necessary to polish the coated drum by a well-known film type superfinishing apparatus to remove 5 to 10 μm in a portion having insufficient hardness and to suppress the maximum surface roughness to 1 μm or less.

【0008】上記フィルム式の超仕上げ加工装置の周知
の加工原理は、図5および図6に示すように、適度な硬
さを持ったゴムローラー11と回転センタ13およびチ
ャック14により回転自在に保持したドラム3との間に
ドラムの最大面粗さを1μm程度にするために必要な粒
度を持った研磨用フィルム12(砥粒粒度15μm〜5
μm)を介し、ゴムローラー11をドラム3の長手方向
に振動bしながら往復動cさせ、回転aするドラム3に
0.5mm前後を押し当てることにより得られる圧力によ
り、ドラム3表面を仕上げるものである。
The well-known processing principle of the film type superfinishing apparatus is, as shown in FIGS. 5 and 6, rotatably held by a rubber roller 11 having an appropriate hardness, a rotation center 13 and a chuck 14. The polishing film 12 (abrasive grain size 15 μm to 5 μm-5) having a grain size necessary for making the maximum surface roughness of the drum about 1 μm between the drum 3 and
μm) to reciprocate the rubber roller 11 in the longitudinal direction of the drum 3 while vibrating b to move the drum 3 to the rotating a.
The surface of the drum 3 is finished by the pressure obtained by pressing it around 0.5 mm.

【0009】そして、研磨に適した水溶液(研削液)2
1を、ドラム3と研磨用フィルム12を介したゴムロー
ラー11との接触面に流し続けることによって、ドラム
3の発熱を押さえるとともに研磨により脱落した砥粒お
よび異物を洗い流していた。また、1本のドラムを加工
するのに、砥粒粒度が、15μm(♯1000)、9μ
m(♯2000)、5μm(♯3000)の3種類のフ
ィルム12を上記の順で用いて加工しており、このとき
のドラム1本の加工時間は約10分となっていた。
Aqueous solution (grinding liquid) 2 suitable for polishing
By continuing to flow 1 onto the contact surface between the drum 3 and the rubber roller 11 via the polishing film 12, the heat generation of the drum 3 was suppressed and the abrasive grains and foreign substances that had fallen off by polishing were washed away. In addition, when processing one drum, the abrasive grain size is 15 μm (# 1000), 9 μm.
Three types of films 12 of m (# 2000) and 5 μm (# 3000) were used in the above order, and the processing time of one drum at this time was about 10 minutes.

【0010】[0010]

【発明が解決しようとする課題】しかし、上記従来技術
のフィルム式超仕上げ加工装置にあっては、以下に述べ
る問題点があった。従来、ドラム3の加工に際し、図7
に示すように、研磨装置本体15より流出した研削液2
1は、一旦、タンク16に入った後、ポンプ17によっ
て再び研磨装置本体15に循環させられていた。
However, the above-mentioned conventional film type superfinishing apparatus has the following problems. Conventionally, when processing the drum 3, FIG.
As shown in FIG.
After the No. 1 once entered the tank 16, it was circulated to the polishing apparatus main body 15 again by the pump 17.

【0011】この方法では、初期の段階で使用される1
5μm、9μmのフィルムより発生した砥粒、除去され
たコーティング材などの不純物が再び循環してくるた
め、 研磨砥粒、研磨により除去されたコーティング材およ
びそれ以外から混入する異物が含まれたまま循環してい
る研削液21が、図5において、ドラム3とフィルム1
2との間に入り込み、研削液中に存在する特に大きな粒
子(5〜15μm以上)が、ドラム3に傷を付けること
によるドラム3の面粗さの劣化(最大面粗さ1.5〜3μ
m)が生じていた。 上記不具合点の状況において、研削液21に含まれ
る粒子の内、研磨により除去されたコーティング材が、
フィルム12の研磨砥粒の隙間に入り込み、これによっ
てフィルム12が目詰まり状態となり、加工本数に伴い
加工速度が遅くなる(加工時間が長くなる)という加工
能率の低下(加工初期状態で約10分の加工時間が、2
0本程加工した時点で、約14分にまで延びる)が生じ
ていた。
In this method, 1 used in the initial stage
Since the impurities such as abrasive grains generated from the film of 5 μm and 9 μm and the removed coating material are circulated again, the polishing abrasive grains, the coating material removed by polishing and the foreign substances mixed in from other sources remain. The circulating grinding liquid 21 in FIG.
2 and the particularly large particles (5 to 15 μm or more) present in the grinding fluid scratch the drum 3 to deteriorate the surface roughness of the drum 3 (maximum surface roughness 1.5 to 3 μm).
m) had occurred. In the situation of the above-mentioned inconveniences, among the particles contained in the grinding fluid 21, the coating material removed by polishing is
The polishing efficiency of the film 12 gets into the gap of the polishing abrasive grains, which causes the film 12 to be clogged and the processing speed becomes slower (the processing time becomes longer) depending on the number of processings (about 10 minutes in the initial processing state). Processing time of 2
(It extends to approximately 14 minutes at the time of processing about 0).

【0012】本発明は、上記従来技術の問題点に鑑みて
なされたもので、研削液中に含まれている脱落砥粒およ
び除去されたコーティング材等の異物の除去を行うこと
により、ドラムの最大面粗さ(Rmax)を1μm以下
に加工でき、時間とともに加工能率が低下しない超仕上
げ加工装置を提供することを目的とする。
The present invention has been made in view of the above-mentioned problems of the prior art, and by removing foreign matter such as the falling abrasive grains contained in the grinding fluid and the removed coating material, the drum An object of the present invention is to provide a super-finishing processing device capable of processing the maximum surface roughness (Rmax) to 1 μm or less and in which the processing efficiency does not decrease with time.

【0013】[0013]

【課題を解決するための手段】上記目的を達成するため
に、本発明はフィルム式の超仕上げ加工装置において、
上記加工装置に供給する研削液の循環経路中に、研削液
中の不純物を取り除く遠心分離機を設けるとともに、研
削液中の微細な不純物を取り除くフィルタユニットを少
なくとも1つ備えることとした。
In order to achieve the above object, the present invention provides a film type superfinishing apparatus,
A centrifugal separator for removing impurities in the grinding fluid is provided in the circulation path of the grinding fluid supplied to the processing apparatus, and at least one filter unit for removing fine impurities in the grinding fluid is provided.

【0014】[0014]

【作用】上記構成によれば、研削液中に含まれる数〜数
十μmの異物は遠心分離機で除去されるとともに、5μ
m以上あるいは1μm以上の異物はフィルタユニットで
除去される。
According to the above construction, the foreign matter of several to several tens of μm contained in the grinding fluid is removed by the centrifugal separator and the foreign matter of 5 μm is removed.
Foreign matter of m or more or 1 μm or more is removed by the filter unit.

【0015】[0015]

【実施例1】図1は、本発明に係る超仕上げ加工装置の
実施例1を示す斜視図である。本実施例の加工装置は、
被加工物の表面を超仕上げ加工する表面研磨装置本体1
5と、表面研磨装置本体15より排出された研削液21
中に含まれる粒子・異物を遠心分離する遠心分離機16
と、遠心分離機16からの研削液21を貯めるタンク1
7と、研削液21を循環させるためのタンク17に設け
られたポンプ18と、タンク17から送液された研削液
21中に含まれる粒子・異物を除去する10μmフィル
タユニット19と、10μmフィルユニット19から送
られた研削液21中に含まれる粒子・異物を除去する5
μmフィルタユニット20とから構成されている。5μ
mフィルタユニット20を通った研削液21は、表面研
磨機本体15に送られて循環し、再び使用される。な
お、上記構成において、タンク17、ポンプ18の循環
経路中における取り付け位置およびその個数について
は、特に制限されるものではない。
[Embodiment 1] FIG. 1 is a perspective view showing Embodiment 1 of a superfinishing apparatus according to the present invention. The processing apparatus of this embodiment is
Surface polishing apparatus body 1 for superfinishing the surface of a work piece
5 and the grinding liquid 21 discharged from the surface polishing apparatus main body 15
Centrifuge 16 for centrifuging particles / foreign matter contained therein
And a tank 1 for storing the grinding fluid 21 from the centrifuge 16.
7, a pump 18 provided in a tank 17 for circulating the grinding liquid 21, a 10 μm filter unit 19 for removing particles and foreign matters contained in the grinding liquid 21 sent from the tank 17, and a 10 μm fill unit Removal of particles and foreign matter contained in the grinding fluid 21 sent from 19
and a μm filter unit 20. 5μ
The grinding fluid 21 that has passed through the m filter unit 20 is sent to the surface polishing machine main body 15, circulates, and is used again. In addition, in the above-mentioned structure, the mounting positions and the number of the tank 17 and the pump 18 in the circulation path are not particularly limited.

【0016】本実施例の超仕上げ加工装置によれば、表
面研磨装置本体15で発生する砥粒・コーティング材な
どの異物を取り込んだ研削液21は、まず、10μmフ
ィルタユニット19の目詰まり防止のため、遠心分離機
16によって、数μm〜数十μm以上の大きな粒子・異
物の除去が行われた後、タンク17を経由してポンプ1
8によって10μmフィルタユニット19に送られ、5
μmフィルタユニット20の目詰まり防止のため、10
μm以上の微粒子の除去が行われる。最後に、研削液2
1は5μmフィルタユニット20に送られ、5μm以上
の微粒子の除去が行われ、清浄された研削液21は、表
面研磨装置本体15に供給される。そして、かかる研削
液21の循環は、循環経路中に組み込まれているポンプ
18によって行われている。
According to the superfinishing apparatus of this embodiment, the grinding liquid 21 that has taken in foreign substances such as abrasive grains and coating material generated in the surface polishing apparatus body 15 first prevents clogging of the 10 μm filter unit 19. Therefore, after the centrifugal separator 16 removes large particles / foreign substances of several μm to several tens of μm or more, the pump 1 is passed through the tank 17.
Sent to the 10 μm filter unit 19 by 8
To prevent clogging of the μm filter unit 20, 10
Fine particles of μm or more are removed. Finally, grinding fluid 2
1 is sent to the 5 μm filter unit 20, fine particles of 5 μm or more are removed, and the cleaned grinding fluid 21 is supplied to the surface polishing apparatus body 15. Then, the circulation of the grinding liquid 21 is performed by the pump 18 incorporated in the circulation path.

【0017】本実施例によれば、表面研磨装置本体15
により発生せしめる微粒子の内、5μm以上の大きさの
ものは、全て除去することができる。ドラム表面粗さ
(Rmax)1μm以下の表面精度を出すのに必要なフ
ィルム12の砥粒粒度は、5〜15μmであることは既
に述べたが、この装置における研削液21の持つ微粒子
の粒度には、5μm以上のものはないということから、
脱落砥粒の影響は排除されドラムの最大表面粗さは確実
に1μm以下が保証され、加工能率についても、従来の
ように加工本数に従って加工時間が延びると言うような
こともなく、初期の加工時間10分を常に維持すること
が可能となる。なお、本実施例にあっては、5μmおよ
び10μmのフィルタユニット19,20を用いたが、
5μm以下であれば、これに限定されるものではない。
According to this embodiment, the surface polishing apparatus body 15
Of the fine particles generated by, the particles having a size of 5 μm or more can all be removed. It has already been stated that the grain size of the abrasive grains of the film 12 required to obtain the surface accuracy of the drum surface roughness (Rmax) of 1 μm or less is 5 to 15 μm. Since there is no more than 5 μm,
The influence of the fallen abrasive grains is eliminated, the maximum surface roughness of the drum is guaranteed to be 1 μm or less, and the processing efficiency does not extend according to the number of processing as in the conventional method. It becomes possible to always maintain the time of 10 minutes. In this embodiment, the filter units 19 and 20 of 5 μm and 10 μm are used.
If it is 5 μm or less, it is not limited to this.

【0018】[0018]

【実施例2】図2は、本発明に係る超仕上げ加工装置の
実施例2を示す斜視図である。本実施例の超仕上げ加工
装置は、研削液21の循環経路中における5μmフィル
タユニット20と表面研磨装置本体15との間に、1μ
mフィルタユニット22を設けたもので、その他の構成
は、上記実施例1の構成と同様である。
Second Embodiment FIG. 2 is a perspective view showing a second embodiment of the superfinishing apparatus according to the present invention. The super-finishing processing apparatus of the present embodiment is 1 μm between the 5 μm filter unit 20 and the surface polishing apparatus main body 15 in the circulation path of the grinding fluid 21.
The m-filter unit 22 is provided, and the other structure is the same as that of the first embodiment.

【0019】本実施例にあっては、5μmフィルタユニ
ット20を通過した研削液21中から1μm以上の微粒
子を除去することができる。
In this embodiment, fine particles of 1 μm or more can be removed from the grinding liquid 21 that has passed through the 5 μm filter unit 20.

【0020】本実施例によれば、研削液21中に1μm
以上の微粒子が含まれていないので、表面粗さ0.8μm
以下(0.6〜0.8μm)の精度を有するドラムの加工が
可能になる。また、加工能率については、実施例1と同
様に初期の加工時間10分を維持することが可能とな
る。
According to this embodiment, 1 μm is contained in the grinding liquid 21.
Surface roughness of 0.8 μm because the above fine particles are not included
It is possible to process a drum having the following accuracy (0.6 to 0.8 μm). Further, regarding the processing efficiency, it is possible to maintain the initial processing time of 10 minutes as in the first embodiment.

【0021】[0021]

【発明の効果】以上のように、本発明によれば、研削液
中に含まれる5μm以上の微粒子を遠心分離機およびフ
ィルタユニットで取り除いて循環させることとしたの
で、ドラム表面の面粗さの改善と、数μmの表面層の除
去を行う際に、ドラムの最大面粗さ(Rmax)1μm
以下のドラムを得ることができる。また、ドラムの加工
時に際しては、研磨砥粒の目詰まりがなくなり、時間約
10分を常に維持することが可能で、加工能率を低下さ
せることにく研磨加工を行うことができる。
As described above, according to the present invention, since the fine particles of 5 μm or more contained in the grinding fluid are removed by the centrifugal separator and the filter unit and circulated, the surface roughness of the drum surface is reduced. The maximum surface roughness (Rmax) of the drum is 1 μm when the improvement and the removal of the surface layer of several μm are performed.
You can get the following drums: Further, during the processing of the drum, the polishing abrasive grains are not clogged, and the time can be maintained for about 10 minutes at all times, and the polishing can be performed without lowering the processing efficiency.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例1を示す斜視図である。FIG. 1 is a perspective view showing a first embodiment of the present invention.

【図2】本発明の実施例2を示す斜視図である。FIG. 2 is a perspective view showing a second embodiment of the present invention.

【図3】被研磨材であるドラムを使用したプリンターを
示す概略図である。
FIG. 3 is a schematic view showing a printer that uses a drum that is a material to be polished.

【図4】ドラムの円筒表面に施した絶縁塗装膜を示すド
ラムの半載正面図である。
FIG. 4 is a semi-mounted front view of the drum showing an insulating coating film applied to the cylindrical surface of the drum.

【図5】フィルム式の超仕上げ加工装置の加工原理を示
す説明図である。
FIG. 5 is an explanatory view showing a processing principle of a film type super finishing apparatus.

【図6】フィルム式の超仕上げ加工装置の加工原理を示
す説明図である。
FIG. 6 is an explanatory view showing a processing principle of a film type super finishing apparatus.

【図7】従来の加工装置を示す斜視図である。FIG. 7 is a perspective view showing a conventional processing apparatus.

【符号の説明】[Explanation of symbols]

15 表面研磨装置本体 16 タンク 18 ポンプ 19 10μmフィルタユニット 20 5μmフィルタユニット 21 研削液 22 1μmフィルタユニット 15 Surface Polishing Device Main Body 16 Tank 18 Pump 19 10 μm Filter Unit 20 5 μm Filter Unit 21 Grinding Fluid 22 1 μm Filter Unit

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 フィルム式の超仕上げ加工装置におい
て、上記加工装置に供給する研削液の循環経路中に、研
削液中の不純物を取り除く遠心分離機を設けるととも
に、研削液中の微細な不純物を取り除くフィルタユニッ
トを少なくとも1つ備えたことを特徴とする超仕上げ加
工装置。
1. A film-type superfinishing apparatus, wherein a centrifugal separator for removing impurities in the grinding fluid is provided in a circulation path of the grinding fluid supplied to the processing apparatus, and fine impurities in the grinding fluid are removed. A superfinishing device comprising at least one filter unit to be removed.
JP28077592A 1992-09-25 1992-09-25 Super finishing machine Expired - Fee Related JP3294338B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28077592A JP3294338B2 (en) 1992-09-25 1992-09-25 Super finishing machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28077592A JP3294338B2 (en) 1992-09-25 1992-09-25 Super finishing machine

Publications (2)

Publication Number Publication Date
JPH06106477A true JPH06106477A (en) 1994-04-19
JP3294338B2 JP3294338B2 (en) 2002-06-24

Family

ID=17629791

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28077592A Expired - Fee Related JP3294338B2 (en) 1992-09-25 1992-09-25 Super finishing machine

Country Status (1)

Country Link
JP (1) JP3294338B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102672593A (en) * 2012-06-04 2012-09-19 上海卡贝尼精密陶瓷有限公司 Ultra-precise combined polishing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102672593A (en) * 2012-06-04 2012-09-19 上海卡贝尼精密陶瓷有限公司 Ultra-precise combined polishing method
CN102672593B (en) * 2012-06-04 2015-12-09 上海卡贝尼精密陶瓷有限公司 A kind of ultraprecise composite polishing method

Also Published As

Publication number Publication date
JP3294338B2 (en) 2002-06-24

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