JPH0597864A - Production of 2-exomethylenepenam derivative - Google Patents
Production of 2-exomethylenepenam derivativeInfo
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- JPH0597864A JPH0597864A JP4057476A JP5747692A JPH0597864A JP H0597864 A JPH0597864 A JP H0597864A JP 4057476 A JP4057476 A JP 4057476A JP 5747692 A JP5747692 A JP 5747692A JP H0597864 A JPH0597864 A JP H0597864A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
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- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、2−エキソメチレンペ
ナム誘導体の新規な製造法に関する。FIELD OF THE INVENTION The present invention relates to a novel method for producing a 2-exomethylene penum derivative.
【0002】[0002]
【従来の技術】従来、一般式〔化2〕で表される2−エ
キソメチレンペナム誘導体としては、R1がアミノ基又
は保護されたアミノ基で、R2が水素原子である化合物
しか知られておらず、その合成法としてもJ.Chem.
Soc., Chem.Commun., 81(1987)に記載されている
方法しか知られていない。しかし、この方法は収率が低
く、又反応工程の随所で煩雑な反応操作や分離操作が必
要で、到底実用的な製造法として満足できるものではな
かつた。2. Description of the Related Art Conventionally, as a 2-exomethylene penam derivative represented by the general formula [Chemical Formula 2], only a compound in which R 1 is an amino group or a protected amino group and R 2 is a hydrogen atom is known. However, as a synthetic method thereof, J. Chem.
Soc., Chem. Only the method described in Commun., 81 (1987) is known. However, this method has a low yield and requires complicated reaction operations and separation operations everywhere in the reaction process, and is not a satisfactory practical method at all.
【0003】[0003]
【化2】[Chemical 2]
【0004】(式中R1は水素原子、ハロゲン原子、ア
ミノ基、又は保護されたアミノ基を示す。R2は水素原
子、ハロゲン原子、低級アルコキシ基、低級アシル基、
低級アルキル基、水酸基、又は保護された水酸基を置換
基として有する低級アルキル基、水酸基、又は保護され
た水酸基を示す。又、R1とR2とで=Oを示す。R3は
水素原子又はカルボン酸保護基を示す。)(In the formula, R 1 represents a hydrogen atom, a halogen atom, an amino group, or a protected amino group. R 2 represents a hydrogen atom, a halogen atom, a lower alkoxy group, a lower acyl group,
A lower alkyl group, a hydroxyl group, or a hydroxyl group having a protected hydroxyl group as a substituent, a hydroxyl group, or a protected hydroxyl group is shown. Further, R 1 and R 2 indicate = 0. R 3 represents a hydrogen atom or a carboxylic acid protecting group. )
【0005】[0005]
【発明が解決しようとする課題】本発明の目的は、上記
従来法の如き難点がなく、安全、簡便な操作で、且つ工
業的に有利な方法で、しかも高収率、高純度で上記2−
エキソメチレンペナム誘導体を製造し得る方法を提供す
ることにある。SUMMARY OF THE INVENTION The object of the present invention is to avoid the above-mentioned problems of the conventional method, to perform a safe and simple operation, and to be an industrially advantageous method with high yield and high purity. −
It is an object of the present invention to provide a method capable of producing an exomethylene penum derivative.
【0006】[0006]
【課題を解決するための手段】本発明は、一般式〔化
1〕で表されるアレニルβ−ラクタム化合物を金属還元
剤と反応させて、一般式〔化2〕で表される2−エキソ
メチレンペナム誘導体を得ることを特徴とする2−エキ
ソメチレンペナム誘導体の製造法に係る。According to the present invention, an allenyl β-lactam compound represented by the general formula [Chemical formula 1] is reacted with a metal reducing agent to give a 2-exo represented by the general formula [Chemical formula 2]. The present invention relates to a method for producing a 2-exomethylene penum derivative, which is characterized in that a methylene penam derivative is obtained.
【0007】[0007]
【化1】[Chemical 1]
【0008】(式中R1は水素原子、ハロゲン原子、ア
ミノ基、又は保護されたアミノ基を示す。R2は水素原
子、ハロゲン原子、低級アルコキシ基、低級アシル基、
低級アルキル基、水酸基、又は保護された水酸基を置換
基として有する低級アルキル基、水酸基、又は保護され
た水酸基を示す。又、R1とR2とで=Oを示す。R3は
水素原子又はカルボン酸保護基を示す。Xは基−SO2
R4又は基−SR4を示す。R4は置換基を有していても
良いアリール基、又は置換基を有していても良い含窒素
芳香族複素環基を示す。)(In the formula, R 1 represents a hydrogen atom, a halogen atom, an amino group, or a protected amino group. R 2 represents a hydrogen atom, a halogen atom, a lower alkoxy group, a lower acyl group,
A lower alkyl group, a hydroxyl group, or a hydroxyl group having a protected hydroxyl group as a substituent, a hydroxyl group, or a protected hydroxyl group is shown. Further, R 1 and R 2 indicate = 0. R 3 represents a hydrogen atom or a carboxylic acid protecting group. X is a group —SO 2
Shows a R 4 or a group -SR 4. R 4 represents an aryl group which may have a substituent or a nitrogen-containing aromatic heterocyclic group which may have a substituent. )
【0009】本発明において、出発原料として用いられ
る上記一般式〔化1〕で表されるアレニルβ−ラクタム
化合物は、文献未載の新規化合物であり、例えば、一般
式〔化3〕で表されるアゼチジノン誘導体を塩基と反応
させることにより製造することができる。In the present invention, the allenyl β-lactam compound represented by the above-mentioned general formula [Chemical formula 1] used as a starting material is a novel compound which has not been published in the literature, and is represented by, for example, the general formula [Chemical formula 3]. It can be produced by reacting the azetidinone derivative with a base.
【0010】[0010]
【化3】 [Chemical 3]
【0011】(式中R1,R2,R3,Xは前記に同じ。
R5は置換基を有していても良い低級アルキル基、又は
置換基を有していても良いアリール基を示す。)(Wherein R 1 , R 2 , R 3 and X are the same as above.
R 5 represents a lower alkyl group which may have a substituent or an aryl group which may have a substituent. )
【0012】本明細書において示される各基は、具体的
には各々次の通りである。尚、以下の説明において特に
断らない限り、ハロゲン原子とは、例えば、弗素、塩
素、臭素、沃素などを意味する。低級アルキル基とは、
例えば、メチル、エチル、n−プロピル、イソプロピ
ル、n−ブチル、イソブチル、sec−ブチル、tert−ブチ
ルなどの直鎖又は分枝状のC1〜C4アルキル基を意味す
る。又、アリール基とは、例えば、フエニル、ナフチル
などを意味する。Each group shown in the present specification is specifically as follows. In the following description, unless otherwise specified, the halogen atom means, for example, fluorine, chlorine, bromine, iodine or the like. What is a lower alkyl group?
For example, it means a linear or branched C 1 -C 4 alkyl group such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl. The aryl group means, for example, phenyl, naphthyl and the like.
【0013】R1で示される保護されたアミノ基として
はフエノキシアセトアミド、p−メチルフエノキシアセ
トアミド、p−メトキシフエノキシアセトアミド、p−ク
ロロフエノキシアセトアミド、p−ブロモフエノキシア
セトアミド、フエニルアセトアミド、p−メチルフエニ
ルアセトアミド、p−メトキシフエニルアセトアミド、p
−クロロフエニルアセトアミド、p−ブロモフエニルア
セトアミド、フエニルモノクロロアセトアミド、フエニ
ルジクロロアセトアミド、フエニルヒドロキシアセトア
ミド、フエニルアセトキシアセトアミド、α−オキソフ
エニルアセトアミド、チエニルアセトアミド、ベンズア
ミド、p−メチルベンズアミド、p−t−ブチルベンズア
ミド、p−メトキシベンズアミド、p−クロロベンズアミ
ド、p−ブロモベンズアミド、或いはTheodora W.Gr
eene著の“Protective Groupsin Organic Synthesi
s"(以下、単に「文献」という)の第7章(p218〜287)
に記載されている基、或いはフエニルグリシルアミド及
びアミノ基の保護されたフエニルグリシルアミド、p−
ヒドロキシフエニルグリシルアミド及びアミノ基、水酸
基又はその両方が保護されたp−ヒドロキシフエニルグ
リシルアミドを例示できる。フエニルグリシルアミド及
びp−ヒドロキシフエニルグリシルアミドのアミノ基の
保護基としては上記文献の第7章(p218〜287)に記載さ
れている基を例示できる。又p−ヒドロキシフエニルグ
リシルアミドの水酸基の保護基としては上記文献の第2
章(p10〜72)に記載されている基を例示できる。Examples of the protected amino group represented by R 1 include phenoxyacetamide, p-methylphenoxyacetamide, p-methoxyphenoxyacetamide, p-chlorophenoxyacetamide, p-bromophenoxyacetamide. , Phenylacetamide, p-methylphenylacetamide, p-methoxyphenylacetamide, p
-Chlorophenylacetamide, p-bromophenylacetamide, phenylmonochloroacetamide, phenyldichloroacetamide, phenylhydroxyacetamide, phenylacetoxyacetamide, α-oxophenylacetamide, thienylacetamide, benzamide, p-methylbenzamide, p -T-butylbenzamide, p-methoxybenzamide, p-chlorobenzamide, p-bromobenzamide, or Theodora W. Gr
eene's "Protective Groupsin Organic Synthesi"
Chapter 7 of s "(hereinafter simply referred to as" references ") (p218-287)
Or a phenylglycylamide and a protected phenylglycylamide of an amino group, p-
Examples thereof include hydroxyphenylglycylamide and p-hydroxyphenylglycylamide in which an amino group, a hydroxyl group, or both are protected. Examples of the protecting group for the amino group of phenylglycylamide and p-hydroxyphenylglycylamide include the groups described in Chapter 7 (p218 to 287) of the above literature. Further, as the protective group for the hydroxyl group of p-hydroxyphenylglycylamide, the second group of the above-mentioned document is used.
The groups described in Chapter (p10 to 72) can be exemplified.
【0014】R2で示される低級アルコキシ基をして
は、例えば、メトキシ、エトキシ、n−プロポキシ、イ
ソプロポキシ、n−ブトキシ、イソブトキシ、sec−ブト
キシ、tert−ブトキシなどの直鎖又は分枝状のC1〜C4
アルコキシ基を例示できる。The lower alkoxy group represented by R 2 includes, for example, straight chain or branched chain such as methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, sec-butoxy, tert-butoxy. C 1 to C 4
An alkoxy group can be exemplified.
【0015】R2で示される低級アシル基としては、例
えば、ホルミル、アセチル、プロピオニル、ブチリル、
イソブチリルなどの直鎖または分枝状のC1〜C4アシル
基を例示できる。The lower acyl group represented by R 2 includes, for example, formyl, acetyl, propionyl, butyryl,
Examples thereof include linear or branched C 1 to C 4 acyl groups such as isobutyryl.
【0016】R2で示される水酸基又は保護された水酸
基を置換基として有する低級アルキル基の保護された水
酸基、及びR2で示される保護された水酸基の保護基と
しては、上記文献の第2章(p10〜72)に記載されている
各種基を例示できる。R2で示される上記置換低級アル
キル基は、水酸基又は上記で示される保護された水酸基
の中から選ばれる同一又は異なる種類の置換基で、同一
又は異なる炭素上に1つ以上置換されていてもよい。As the protected hydroxyl group of a lower alkyl group having a hydroxyl group represented by R 2 or a protected hydroxyl group as a substituent and the protected group of a protected hydroxyl group represented by R 2 , see Chapter 2 of the above-mentioned document. Various groups described in (p10 to 72) can be exemplified. The substituted lower alkyl group represented by R 2 is a substituent of the same or different type selected from a hydroxyl group or a protected hydroxyl group represented by the above, and one or more may be substituted on the same or different carbon. Good.
【0017】R3で示されるカルボン酸保護基としては
ベンジル基、p−メトキシベンジル基、p−ニトロベンジ
ル基、ジフエニルメチル基、トリクロロエチル基、tert
−ブチル基或いは上記文献の第5章(p152〜192)に記載
されている基を例示できる。Examples of the carboxylic acid protecting group represented by R 3 include benzyl group, p-methoxybenzyl group, p-nitrobenzyl group, diphenylmethyl group, trichloroethyl group and tert.
Examples thereof include a -butyl group and groups described in Chapter 5 (p152 to 192) of the above literature.
【0018】R4で示される置換基を有していても良い
含窒素芳香族複素環基の含窒素芳香族複素環基として
は、例えば、チアゾール−2−イル、チアジアゾール−
2−イル、ベンゾチアゾール−2−イル、オキサゾール
−2−イル、ベンゾオキサゾール−2−イル、イミダゾ
ール−2−イル、ベンゾイミダゾール−2−イル、ピラ
ミジニル、ピリジル基などが例示できる。Examples of the nitrogen-containing aromatic heterocyclic group represented by R 4 which may have a substituent include, for example, thiazol-2-yl and thiadiazole-
Examples thereof include 2-yl, benzothiazol-2-yl, oxazol-2-yl, benzoxazol-2-yl, imidazol-2-yl, benzimidazol-2-yl, pyramidinyl and pyridyl groups.
【0019】R4で示されるアリール基又は含窒素芳香
族複素環基に置換していてもよい置換基の種類として
は、ハロゲン原子、水酸基、ニトロ基、シアノ基、アリ
ール基、低級アルキル基、アミノ基、モノ低級アルキル
アミノ基、ジ低級アルキルアミノ基、メルカプト基、基
R6S−(R6は低級アルキル基又はアリール基)で表さ
れるアルキルチオ基又はアリールチオ基、ホルミルオキ
シ基、基R6COO−(R6は前記に同じ)で表されるア
シルオキシ基、ホルミル基、基R6CO−(R6は前記に
同じ)で表されるアシル基、基R6O−(R6は前記に同
じ)で表されるアルコキシ基又はアリールオキシ基、カ
ルボキシル基、基R6OCO−(R6は前記に同じ)で表
されるアルコキシカルボニル基又はアリールオキシカル
ボニル基などが例示できる。R4におけるアリール基又
は含窒素芳香族複素環基は、上記置換基から選ばれる1
つ以上の同一又は異なる種類の置換基で置換されていて
もよい。The type of the substituent which may be substituted on the aryl group or the nitrogen-containing aromatic heterocyclic group represented by R 4 is a halogen atom, a hydroxyl group, a nitro group, a cyano group, an aryl group, a lower alkyl group, An amino group, a mono-lower alkylamino group, a di-lower alkylamino group, a mercapto group, an alkylthio group or an arylthio group represented by the group R 6 S- (R 6 is a lower alkyl group or an aryl group), a formyloxy group, a group R An acyloxy group represented by 6 COO- (R 6 is the same as above), a formyl group, an acyl group represented by a group R 6 CO- (R 6 is the same as the above), and a group R 6 O- (R 6 is alkoxy group or an aryloxy group represented by the same) to the carboxyl group, alkoxycarbonyl group or represented by group R 6 OCO- (R 6 have the same meanings as defined above) is an aryloxy group It can be exemplified. The aryl group or nitrogen-containing aromatic heterocyclic group for R 4 is selected from the above substituents 1
It may be substituted with one or more substituents of the same or different type.
【0020】R5で示される低級アルキル基、又はアリ
ール基に置換していてもよい置換基としては、R4にお
ける置換基で説明したと同様の置換基が例示できる。R
5における低級アルキル基、又はアリール基は、上記置
換基から選ばれる同一又は異なる種類の置換基で、同一
又は異なる炭素上に1つ以上置換されていてもよい。[0020] Examples of the lower alkyl group, or a substituted may have substituent aryl group represented by R 5, the same substituents as those described in the substituents in R 4 can be exemplified. R
One or more lower alkyl groups or aryl groups in 5 may be substituted on the same or different carbon with the same or different kinds of substituents selected from the above-mentioned substituents.
【0021】本発明において、出発原料として用いられ
る一般式〔化1〕で表されるアレニルβ−ラクタム化合
物を製造するに当たつては、上記一般式〔化3〕で表さ
れるアゼチジノン誘導体を適当な溶媒中、塩基と反応さ
せる。使用する塩基としては、脂肪族或いは芳香族アミ
ンが好ましい。その具体例としてはトリエチルアミン、
ジイソプロピルアミン、エチルジイソプロピルアミン、
トリブチルアミン、DBN(1,5−ジアザビシクロ〔4.3.
0〕ノネン−5)、DBU(1,8−ジアザビシクロ〔5.4.
0〕ウンデセン−7)、DABCO(1,4−ジアザビシクロ
〔2.2.2〕オクタン)、ピペリジン、N−メチルピペリジ
ン、2,2,6,6−テトラメチルピペリジン、モルホリン、
N−メチルモルホリン、N,N−ジメチルアニリン、N,
N−ジメチルアミノピリジン等を例示できる。In the present invention, when the allenyl β-lactam compound represented by the general formula [Chemical formula 1] used as a starting material is produced, the azetidinone derivative represented by the general formula [Chemical formula 3] is used. React with base in a suitable solvent. The base used is preferably an aliphatic or aromatic amine. Specific examples thereof include triethylamine,
Diisopropylamine, ethyldiisopropylamine,
Tributylamine, DBN (1,5-diazabicyclo [4.3.
0] nonene-5), DBU (1,8-diazabicyclo [5.4.
0] undecene-7), DABCO (1,4-diazabicyclo [2.2.2] octane), piperidine, N-methylpiperidine, 2,2,6,6-tetramethylpiperidine, morpholine,
N-methylmorpholine, N, N-dimethylaniline, N,
N-dimethylamino pyridine etc. can be illustrated.
【0022】これら塩基の使用量としては一般式〔化
3〕の化合物に対して通常1〜12倍モル、好ましくは1
〜6倍モル量使用する。溶媒としては一般式〔化3〕の
化合物を溶解し且つ該反応条件下で不活性なものである
限り広く使用でき、例えば蟻酸メチル、蟻酸エチル、蟻
酸プロピル、蟻酸ブチル、酢酸メチル、酢酸エチル、酢
酸プロピル、酢酸ブチル、プロピオン酸メチル、プロピ
オン酸エチル等の低級カルボン酸の低級アルキルエステ
ル類、ジエチルエーテル、エチルプロピルエーテル、エ
チルブチルエーテル、ジプロピルエーテル、ジイソプロ
ピルエーテル、ジブチルエーテル、メチルセロソルブ、
ジメトキシエタン等のエーテル類、テトラヒドロフラ
ン、ジオキサン等の環状エーテル類、アセトニトリル、
プロピオニトリル、ブチロニトリル、イソブチロニトリ
ル、バレロニトリル等のニトリル類、ベンゼン、トルエ
ン、キシレン、クロルベンゼン、アニソール等の置換も
しくは未置換の芳香族炭化水素類、ジクロルメタン、ク
ロロホルム、ジクロルエタン、トリクロルエタン、ジブ
ロムエタン、プロピレンジクロライド、四塩化炭素、フ
レオン類等のハロゲン化炭化水素類、ペンタン、ヘキサ
ン、ヘプタン、オクタン等の炭化水素類、シクロペンタ
ン、シクロヘキサン、シクロヘプタン、シクロオクタン
等のシクロアルカン類、ジメチルホルムアミド、ジメチ
ルアセトアミド等のアミド類、ジメチルスルホキシド等
を挙げることができ、これらは1種又は2種以上混合し
て使用される。又これらの溶媒には、必要に応じて水が
含有されていてもよい。斯かる溶媒の使用量は、一般式
〔化3〕の化合物1kg当り0.5〜200l程度、好ましくは
1〜50l程度とするのがよい。反応は−70℃〜100℃、
好ましくは−50℃〜50℃の範囲で行われる。The amount of these bases to be used is generally 1 to 12 times mol, preferably 1 mol, based on the compound of the general formula [Chemical Formula 3].
Use ~ 6 times the molar amount. The solvent can be widely used as long as it dissolves the compound of the general formula [Chemical Formula 3] and is inactive under the reaction conditions, for example, methyl formate, ethyl formate, propyl formate, butyl formate, methyl acetate, ethyl acetate, Lower alkyl esters of lower carboxylic acids such as propyl acetate, butyl acetate, methyl propionate and ethyl propionate, diethyl ether, ethyl propyl ether, ethyl butyl ether, dipropyl ether, diisopropyl ether, dibutyl ether, methyl cellosolve,
Ethers such as dimethoxyethane, cyclic ethers such as tetrahydrofuran and dioxane, acetonitrile,
Propionitrile, butyronitrile, isobutyronitrile, nitriles such as valeronitrile, benzene, toluene, xylene, chlorobenzene, substituted or unsubstituted aromatic hydrocarbons such as anisole, dichloromethane, chloroform, dichloroethane, trichloroethane, Halogenated hydrocarbons such as dibromethane, propylene dichloride, carbon tetrachloride and freons, hydrocarbons such as pentane, hexane, heptane and octane, cycloalkanes such as cyclopentane, cyclohexane, cycloheptane and cyclooctane, dimethylformamide , Dimethylacetamide and other amides, dimethylsulfoxide and the like, and these may be used alone or in admixture of two or more. Further, these solvents may contain water as needed. The amount of such a solvent used is about 0.5 to 200 liters, preferably about 1 to 50 liters per 1 kg of the compound of the general formula [Chemical Formula 3]. The reaction is -70 ℃ ~ 100 ℃,
It is preferably carried out in the range of -50 ° C to 50 ° C.
【0023】本発明においては、上記の方法で一般式
〔化3〕の化合物より合成された、一般式〔化1〕で表
されるアレニルβ−ラクタム化合物は、通常の抽出等の
単離操作を行つたのち、特別な精製操作を行うことなく
そのまま金属還元剤と反応させて、上記一般式〔化2〕
で表される2−エキソメチレンペナム誘導体に変換する
こともできる。In the present invention, the allenyl β-lactam compound represented by the general formula [Chemical Formula 1] synthesized from the compound of the general formula [Chemical Formula 3] by the above-mentioned method is isolated by a conventional isolation operation such as extraction. Then, the reaction is carried out as it is with a metal reducing agent without any special purification operation,
It can also be converted into a 2-exomethylene penum derivative represented by.
【0024】上記反応は、通常溶媒中で行われる。溶媒
としては、一般式〔化1〕の化合物を溶解し且つ該反応
の条件下で不活性なものである限り従来公知のものを広
く使用でき、例えばメタノール、エタノール、プロパノ
ール、イソプロパノール、ブタノール、tert−ブタノー
ル等のアルコール類、蟻酸メチル、蟻酸エチル、蟻酸プ
ロピル、蟻酸ブチル、酢酸メチル、酢酸エチル、酢酸プ
ロピル、酢酸ブチル、プロピオン酸メチル、プロピオン
酸エチル等の低級カルボン酸の低級アルキルエステル
類、アセトン、メチルエチルケトン、メチルプロピルケ
トン、メチルブチルケトン、メチルイソブチルケトン、
ジエチルケトン等のケトン類、ジエチルエーテル、エチ
ルプロピルエーテル、エチルブチルエーテル、ジプロピ
ルエーテル、ジイソプロピルエーテル、ジブチルエーテ
ル、メチルセロソルブ、ジメトキシエタン等のエーテル
類、テトラヒドロフラン、ジオキサン等の環状エーテル
類、アセトニトリル、プロピオニトリル、ブチロニトリ
ル、イソブチロニトリル、バレロニトリル等のニトリル
類、ベンゼン、トルエン、キシレン、クロルベンゼン、
アニソール等の置換もしくは未置換の芳香族炭化水素
類、ジクロルメタン、クロロホルム、ジクロルエタン、
トリクロルエタン、ジブロムエタン、プロピレンジクロ
ライド、四塩化炭素、フレオン類等のハロゲン化炭化水
素類、ペンタン、ヘキサン、ヘプタン、オクタン等の炭
化水素類、シクロペンタン、シクロヘキサン、シクロヘ
プタン、シクロオクタン等のシクロアルカン類、ジメチ
ルホルムアミド、ジメチルアセトアミド等のアミド類、
ジメチルスルホキシド等を挙げることができ、これらは
1種又は2種以上混合して使用される。又これらの溶媒
には、必要に応じて水が含有されていてもよい。斯かる
溶媒の使用量は、一般式〔化1〕の化合物1kg当り0.5
〜200l程度、好ましくは1〜50l程度とするのがよ
い。The above reaction is usually carried out in a solvent. As the solvent, any conventionally known solvent can be widely used as long as it dissolves the compound of the general formula [Chemical Formula 1] and is inactive under the conditions of the reaction, for example, methanol, ethanol, propanol, isopropanol, butanol, tert. -Alcohols such as butanol, methyl formate, ethyl formate, propyl formate, butyl formate, methyl acetate, ethyl acetate, propyl acetate, butyl acetate, methyl propionate, lower alkyl esters of lower carboxylic acids such as ethyl propionate, acetone , Methyl ethyl ketone, methyl propyl ketone, methyl butyl ketone, methyl isobutyl ketone,
Ketones such as diethyl ketone, diethyl ether, ethyl propyl ether, ethyl butyl ether, dipropyl ether, diisopropyl ether, dibutyl ether, methyl cellosolve, dimethoxyethane and other ethers, tetrahydrofuran, dioxane and other cyclic ethers, acetonitrile, propio Nitriles such as nitrile, butyronitrile, isobutyronitrile, valeronitrile, benzene, toluene, xylene, chlorobenzene,
Substituted or unsubstituted aromatic hydrocarbons such as anisole, dichloromethane, chloroform, dichloroethane,
Halogenated hydrocarbons such as trichloroethane, dibromoethane, propylene dichloride, carbon tetrachloride and freons, hydrocarbons such as pentane, hexane, heptane and octane, cycloalkanes such as cyclopentane, cyclohexane, cycloheptane and cyclooctane Amides such as dimethylformamide and dimethylacetamide,
Examples thereof include dimethyl sulfoxide, and these may be used alone or in combination of two or more. Further, these solvents may contain water as needed. The amount of such a solvent used is 0.5 per 1 kg of the compound of the general formula [Chemical formula 1].
Approximately 200 liters, preferably approximately 1 to 50 liters.
【0025】上記反応で用いられる金属還元剤として
は、例えば金属鉛、金属チタン、金属ジルコニウム、金
属ガリウム、金属ビスマス、金属アンチモン等を挙げる
ことができる。反応させる金属の形状は特に制限はな
く、粉状、板状、塊状又は針金状等の広範囲の形態を使
用できるが、反応をより低い温度、より短時間で完結さ
せるために粉状金属が有利に使用される。金属還元剤と
して粉状金属を用いる場合、その粒子径は広い範囲から
選択可能であるが、好ましくは約10〜500メツシユのも
のが使用される。これら金属還元剤の使用量としては一
般式〔化1〕の化合物に対して約1〜10倍モル原子、好
ましくは約1〜4倍モル原子である。Examples of the metal reducing agent used in the above reaction include metal lead, metal titanium, metal zirconium, metal gallium, metal bismuth, metal antimony and the like. The shape of the metal to be reacted is not particularly limited, and a wide range of forms such as powder, plate, lump or wire can be used, but powder metal is advantageous for completing the reaction at a lower temperature in a shorter time. Used for. When a powdered metal is used as the metal reducing agent, its particle size can be selected from a wide range, but a particle size of about 10 to 500 mesh is preferably used. The amount of these metal reducing agents used is about 1 to 10 times mol atom, preferably about 1 to 4 times mol atom with respect to the compound of the general formula [Chemical Formula 1].
【0026】本発明では反応系内に上記金属還元剤より
もイオン化傾向の大きい金属を共存させることにより上
記金属還元剤の使用量を極端に低減させることができ、
反応後の後処理が容易になるとともに反応をより低い温
度、より短時間で遂行できる。上記金属還元剤とそれよ
りもイオン化傾向の大きい金属の組み合わせの具体例と
しては、Pb/Al、Bi/Al、Ti/Zn、Ga/Zn、
Zr/Zn、Sb/Zn、Te/Zn、Pb/Zn、Bi/Zn、
Bi/Mg、Bi/Sn、Sb/Sn等を例示できる。又、こ
れらの金属は単独又は2種以上混合しても使用できる。
使用するこれら金属の形状に特に制限はなく粉状、板
状、箔状、塊状あるいは針金状等の広範囲の形態が用い
られるが、反応をより円滑に進行させるためには粉状金
属が有利に用いられる。粉状金属の粒子径は広い範囲か
ら選択可能であるが、好ましくは約10〜300メツシユの
ものが使用される。これら金属の使用量は一般式〔化
1〕の化合物に対して通常約1〜50倍モル原子、好まし
くは約1〜10倍モル原子である。In the present invention, the amount of the metal reducing agent used can be extremely reduced by coexisting a metal having a greater ionization tendency than the metal reducing agent in the reaction system.
Post-treatment after the reaction becomes easy and the reaction can be performed at a lower temperature and in a shorter time. Specific examples of the combination of the above metal reducing agent and a metal having a greater ionization tendency than that include Pb / Al, Bi / Al, Ti / Zn, Ga / Zn,
Zr / Zn, Sb / Zn, Te / Zn, Pb / Zn, Bi / Zn,
Examples include Bi / Mg, Bi / Sn, Sb / Sn and the like. These metals can be used alone or in combination of two or more.
There is no particular limitation on the shape of these metals to be used, and a wide variety of shapes such as powder, plate, foil, lump or wire are used, but powder metal is advantageous for promoting the reaction more smoothly. Used. The particle size of the powdery metal can be selected from a wide range, but a particle size of about 10 to 300 mesh is preferably used. The amount of these metals used is usually about 1 to 50 times mol atom, preferably about 1 to 10 times mol atom to the compound of the general formula [Chem. 1].
【0027】本発明において上記金属還元剤よりもイオ
ン化傾向の大きい金属を併用する場合は、上記金属還元
剤の代りにそれら金属の化合物を使用するのがより好ま
しい。When a metal having a greater ionization tendency than the above-mentioned metal reducing agent is used in the present invention, it is more preferable to use a compound of the metal instead of the above-mentioned metal reducing agent.
【0028】上記金属化合物の具体例としては、例えば
弗化鉛、塩化鉛、臭化鉛、沃化鉛等のハロゲン化鉛、硝
酸鉛、硫酸鉛、過塩素酸鉛、硼酸鉛、炭酸鉛、リン酸鉛
等の無機酸鉛、酢酸鉛、シユウ酸鉛、ステアリン酸鉛等
の脂肪酸鉛、酸化鉛、水酸化鉛、弗化チタン、塩化チタ
ン、臭化チタン、沃化チタン等のハロゲン化チタン、硫
酸チタン、硝酸チタン等の無機酸チタン、弗化ガリウ
ム、塩化ガリウム、臭化ガリウム、沃化ガリウム等のハ
ロゲン化ガリウム、硫酸ガリウム、硝酸ガリウム、過塩
素酸ガリウム等の無機酸ガリウム、弗化ジルコニウム、
塩化ジルコニウム、臭化ジルコニウム、沃化ジルコニウ
ム等のハロゲン化ジルコニウム、硫酸ジルコニウム、臭
化テルルウム、塩化テルルウム、沃化テルルウム等のハ
ロゲン化テルルウム、弗化ビスマス、塩化ビスマス、臭
化ビスマス、沃化ビスマス等のハロゲン化ビスマス、硝
酸ビスマス、硫酸ビスマス等の無機酸ビスマス、酸化ビ
スマス、弗化アンチモン、塩化アンチモン、臭化アンチ
モン、沃化アンチモン等のハロゲン化アンチモン、硫酸
アンチモン等の無機酸アンチモン、酸化アンチモン等を
例示できる。これらの金属化合物の使用量としては、理
論的には1分子が反応系内に存在すればよいが、通常一
般式〔化1〕の化合物に対して約0.0001〜2.0倍モルと
するのがよい。Specific examples of the above metal compounds include lead halides such as lead fluoride, lead chloride, lead bromide and lead iodide, lead nitrate, lead sulfate, lead perchlorate, lead borate, lead carbonate, and the like. Inorganic lead such as lead phosphate, lead acetate such as lead acetate, lead oxalate, lead stearate, etc., lead oxide, lead hydroxide, titanium fluoride, titanium chloride, titanium bromide, titanium iodide, etc. Inorganic titanium oxides such as titanium sulfate and titanium nitrate, gallium halides such as gallium fluoride, gallium chloride, gallium bromide and gallium iodide, gallium sulfate such as gallium sulfate, gallium nitrate and gallium perchlorate, and fluorides zirconium,
Zirconium chloride, zirconium bromide, zirconium iodide, etc., zirconium halide, zirconium sulfate, tellurium bromide, tellurium chloride, tellurium iodide, etc. tellurium halide, bismuth fluoride, bismuth chloride, bismuth bromide, bismuth iodide, etc. Bismuth halide, bismuth nitrate, bismuth sulfate, etc., inorganic bismuth oxide, bismuth oxide, antimony fluoride, antimony bromide, antimony bromide, antimony iodide, etc., antimony halides, antimony sulfate, antimony oxide, antimony oxide, etc. Can be illustrated. The amount of these metal compounds to be used may theoretically be such that one molecule is present in the reaction system, but it is usually about 0.0001 to 2.0 times the molar amount of the compound of the general formula [Chemical Formula 1]. ..
【0029】上記反応の反応温度は、原料物質、使用す
る溶媒等により異なり一概には言えないが、通常−20〜
100℃程度、好ましくは0〜50℃程度である。尚、該反
応においては、超音波の照射下に反応を行うと、反応が
より速やかに進行する場合がある。The reaction temperature of the above reaction varies depending on the starting materials, the solvent used, etc. and cannot be generally stated, but it is usually -20 to
The temperature is about 100 ° C, preferably 0 to 50 ° C. In this reaction, if the reaction is carried out under the irradiation of ultrasonic waves, the reaction may proceed more quickly.
【0030】上記反応終了後、例えば通常の抽出操作を
行うことにより、目的とする一般式〔化2〕の2−エキ
ソメチレンペナム誘導体をほぼ純品の形態で単離し得
る。更に精製の必要があれば、再結晶、カラムクロマト
グラフイー等の慣用の精製手段を採用すれば良い。After completion of the above reaction, the desired 2-exomethylene penam derivative of the general formula [Chemical Formula 2] can be isolated in a substantially pure form by, for example, performing a conventional extraction operation. If further purification is required, conventional purification means such as recrystallization or column chromatography may be adopted.
【0031】[0031]
【実施例】以下に参考例及び実施例を挙げて本発明をよ
り一層明らかにする。尚、Phはフエニル基を示す。EXAMPLES The present invention will be further clarified with reference to the following Reference Examples and Examples. Incidentally, Ph represents a phenyl group.
【0032】参考例1 一般式〔化4〕の化合物→一般式〔化5〕の化合物Reference Example 1 Compound of the general formula [Chemical formula 4] → Compound of the general formula [Chemical formula 5]
【0033】[0033]
【化4】 [Chemical 4]
【0034】[0034]
【化5】 [Chemical 5]
【0035】一般式〔化4〕の化合物〔R1=フエニル
アセトアミド、R2=H、R3=ジフエニルメチル、X=
フエニルスルホニル、R5=トリフルオロメチル〕1gを
N,N−ジメチルホルムアミド 10mlに溶解する。これ
を、−30℃に冷却したのち、トリエチルアミン 0.43ml
を加え−30℃で1時間撹拌して反応させる。反応混合物
を酢酸エチルで抽出し、抽出液を水洗後無水硫酸ナトリ
ウム上で乾燥した。抽出液を減圧濃縮すると、一般式
〔化5〕の化合物〔R1,R2,R3,及びXは前記に同
じ〕が収率99%で得られる。 NMR(CDCl3);δppm 3.61(s,2H), 5.31(dd,1H,J=5Hz and 7
Hz),5.57 and 5.70(ABq,2H,J=15Hz), 5.8
4(d,1H,J=5Hz),6.02(d,1H,J=7H
z), 6.81(s,1H), 7.22〜7.73(m,20H)Compound of the general formula [Chemical Formula 4] [R 1 = phenylacetamide, R 2 = H, R 3 = diphenylmethyl, X =
1 g of phenylsulfonyl, R 5 = trifluoromethyl] is dissolved in 10 ml of N, N-dimethylformamide. After cooling this to -30 ° C, 0.43 ml of triethylamine
Is added and stirred at -30 ° C for 1 hour to react. The reaction mixture was extracted with ethyl acetate, the extract was washed with water and dried over anhydrous sodium sulfate. When the extract is concentrated under reduced pressure, the compound of the general formula [Chemical Formula 5] [R 1 , R 2 , R 3 and X are the same as above] is obtained with a yield of 99%. NMR (CDCl 3 ); δppm 3.61 (s, 2H), 5.31 (dd, 1H, J = 5Hz and 7
Hz), 5.57 and 5.70 (ABq, 2H, J = 15Hz), 5.8
4 (d, 1H, J = 5Hz), 6.02 (d, 1H, J = 7H
z), 6.81 (s, 1H), 7.22 to 7.73 (m, 20H)
【0036】参考例2〜8 表1に示す出発化合物を用いて実施例1と同様の反応を
行い以下に示す化合物が得られた。 一般式〔化3〕の化合物→一般式〔化1〕の化合物Reference Examples 2-8 Using the starting compounds shown in Table 1, the same reaction as in Example 1 was carried out to obtain the compounds shown below. Compound of General Formula [Chemical Formula 3] → Compound of General Formula [Chemical Formula 1]
【0037】[0037]
【表1】 [Table 1]
【0038】以下にNMRデータをまとめて示す。 NMR(CDCl3);δppmThe NMR data will be summarized below. NMR (CDCl 3 ); δppm
【0039】化合物(1b):3.58(s,2H), 3.80
(s,3H), 5.10(s,2H),5.32(dd,1H,J
=5Hz and 8Hz),5.60and 5.47(ABq,2H,J
=15Hz),5.87(d,1H,J=5Hz), 6.08(d,1
H,J=8Hz),6.85〜7.83(m,14H)Compound (1b): 3.58 (s, 2H), 3.80
(S, 3H), 5.10 (s, 2H), 5.32 (dd, 1H, J
= 5Hz and 8Hz), 5.60and 5.47 (ABq, 2H, J
= 15Hz), 5.87 (d, 1H, J = 5Hz), 6.08 (d, 1
H, J = 8Hz), 6.85 to 7.83 (m, 14H)
【0040】化合物(1c):3.59(s,2H), 3.74
(s,3H),5.33(dd,1H,J=5Hzand 8Hz),
5.54 and 5.64(ABq,2H,J=15Hz),5.88(d,
1H,J=5Hz), 6.02(d,1H,J=8Hz),7.2
0〜7.90(m,10H)Compound (1c): 3.59 (s, 2H), 3.74
(S, 3H), 5.33 (dd, 1H, J = 5Hz and 8Hz),
5.54 and 5.64 (ABq, 2H, J = 15Hz), 5.88 (d,
1H, J = 5Hz), 6.02 (d, 1H, J = 8Hz), 7.2
0 ~ 7.90 (m, 10H)
【0041】化合物(1d):3.67(s,2H), 5.25
(dd,1H,J=5Hz and 8Hz),5.69 (d,1H,
J=5Hz),5.60 and 5.76(ABq,2H,J=15H
z),6.71(s,1H), 7.00〜7.34(m,20H)Compound (1d): 3.67 (s, 2H), 5.25
(Dd, 1H, J = 5Hz and 8Hz), 5.69 (d, 1H,
J = 5Hz), 5.60 and 5.76 (ABq, 2H, J = 15H)
z), 6.71 (s, 1H), 7.00 to 7.34 (m, 20H)
【0042】化合物(1e):3.02(dd,1H,J=2.6
Hz and 15.7Hz),3.58(dd,1H,J=5.4Hz and 1
5.7Hz),3.79(s,3H), 5.17(s,2H),5.47 a
nd5.60(ABq,2H,J=15.2Hz),5.62(dd,1
H,J=2.6Hz and 5.4Hz),6.87〜7.89(m,9H)Compound (1e): 3.02 (dd, 1H, J = 2.6
Hz and 15.7Hz), 3.58 (dd, 1H, J = 5.4Hz and 1
5.7Hz), 3.79 (s, 3H), 5.17 (s, 2H), 5.47a
nd5.60 (ABq, 2H, J = 15.2Hz), 5.62 (dd, 1
H, J = 2.6Hz and 5.4Hz), 6.87 to 7.89 (m, 9H)
【0043】化合物(1f):2.99(dd,1H,J=2.6
Hz and 15.7Hz),3.53(dd,1H,J=5.5Hz and 1
5.7Hz),5.56(dd,1H,J=2.6Hz and 5.5Hz)5.
54 and 5.66(ABq,2H,J=15.2Hz),6.88(s,
1H), 7.29〜7.76(m,15H)Compound (1f): 2.99 (dd, 1H, J = 2.6
Hz and 15.7Hz), 3.53 (dd, 1H, J = 5.5Hz and 1
5.7Hz), 5.56 (dd, 1H, J = 2.6Hz and 5.5Hz) 5.
54 and 5.66 (ABq, 2H, J = 15.2Hz), 6.88 (s,
1H), 7.29 ~ 7.76 (m, 15H)
【0044】参考例9〜11 反応溶媒と反応温度を変えた以外は実施例1と同様の反
応を行い一般式〔化5〕の化合物が表2に示す収率で得
られた。Reference Examples 9 to 11 The same reaction as in Example 1 was carried out except that the reaction solvent and the reaction temperature were changed, and the compound of the general formula [Chemical Formula 5] was obtained in the yields shown in Table 2.
【0045】[0045]
【表2】 [Table 2]
【0046】実施例1 一般式〔化6〕の化合物→一般式〔化7〕の化合物Example 1 Compound of general formula [Chemical formula 6] → compound of general formula [Chemical formula 7]
【0047】[0047]
【化6】 [Chemical 6]
【0048】[0048]
【化7】 [Chemical 7]
【0049】一般式〔化6〕の化合物〔R1=フエニル
アセトアミド、R2=H、R3=p−メトキシベンジル、
X=フエニルスルホニル〕100mgをN,N−ジメチルホル
ムアミド1mlに溶解した。これに亜鉛粉末 50mgを加
え、続いてBiCl3 50mgを加えて室温で30分間撹拌し
ながら反応させた。このようにして得られた反応液に1
N−塩酸を加え、酢酸エチルで抽出した。有機層を分液
し、水洗後無水硫酸マグネシウム上で乾燥し、減圧濃縮
する。得られた濃縮残渣をシリカゲルカラムクロマトグ
ラフイーを用いて精製すると一般式〔化7〕の化合物
〔R1=フエニルアセトアミド、R2=H、R3=p−メト
キシベンジル〕が収率92%で得られた。 NMR(CDCl3);δppm 3.61(ABq,2H,J=16Hz), 3.80(s,3H),
5.11(s,2H),5.18(t,1H,J=1Hz), 5.2
4(t,1H,J=1Hz),5.35(t,1H,J=1H
z), 5.57(d,1H,J=4Hz),5.75(dd,1H,
J=4Hz and 9Hz), 6.07(d,1H,J=9H
z),6.85〜7.40(m,9H)Compound of the general formula [Chemical Formula 6] [R 1 = phenylacetamide, R 2 = H, R 3 = p-methoxybenzyl,
X = phenylsulfonyl] (100 mg) was dissolved in 1 ml of N, N-dimethylformamide. To this, 50 mg of zinc powder was added, then 50 mg of BiCl 3 was added, and the mixture was reacted at room temperature for 30 minutes with stirring. 1 to the reaction solution thus obtained
N-hydrochloric acid was added, and the mixture was extracted with ethyl acetate. The organic layer is separated, washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained concentrated residue was purified by silica gel column chromatography to obtain a compound of the general formula [Chemical formula 7] [R 1 = phenylacetamide, R 2 = H, R 3 = p-methoxybenzyl] in a yield of 92%. Obtained in. NMR (CDCl 3 ); δppm 3.61 (ABq, 2H, J = 16Hz), 3.80 (s, 3H),
5.11 (s, 2H), 5.18 (t, 1H, J = 1Hz), 5.2
4 (t, 1H, J = 1Hz), 5.35 (t, 1H, J = 1H)
z), 5.57 (d, 1H, J = 4Hz), 5.75 (dd, 1H,
J = 4Hz and 9Hz), 6.07 (d, 1H, J = 9H
z), 6.85 to 7.40 (m, 9H)
【0050】実施例2 一般式〔化8〕の化合物→一般式〔化9〕の化合物Example 2 Compound of general formula [Chemical formula 8] → compound of general formula [Chemical formula 9]
【0051】[0051]
【化8】 [Chemical 8]
【0052】[0052]
【化9】 [Chemical 9]
【0053】一般式〔化8〕の化合物〔R1=フエニル
アセトアミド、R2=H、R3=ジフエニルメチル、X=
フエニルスルホニル〕200mgを出発原料として、以下実
施例1と同様の反応を行い、一般式〔化9〕の化合物
〔R1=フエニルアセトアミド、R2=H、R3=ジフエ
ニルメチル〕が収率89%で得られた。 NMR(CDCl3);δppm 3.62(s,2H), 5.26〜5.28(m,2H), 5.37
(t,1H,J=2Hz),5.61(d,1H,J=4Hz),
5.76(dd,1H,J=4Hz and 9Hz),6.14(d,
1H,J=9Hz), 6.82(s,1H), 7.20〜7.41
(m,15H)Compound of the general formula [Chemical formula 8] [R 1 = phenylacetamide, R 2 = H, R 3 = diphenylmethyl, X =
[Phenylenylsulfonyl] 200 mg as a starting material, and the same reaction as in Example 1 is performed below to obtain a compound of the general formula [Chem. 9] [R 1 = phenylacetamide, R 2 = H, R 3 = diphenylmethyl] in a yield. It was obtained in 89%. NMR (CDCl 3 ); δppm 3.62 (s, 2H), 5.26 to 5.28 (m, 2H), 5.37
(T, 1H, J = 2Hz), 5.61 (d, 1H, J = 4Hz),
5.76 (dd, 1H, J = 4Hz and 9Hz), 6.14 (d,
1H, J = 9Hz), 6.82 (s, 1H), 7.20 to 7.41
(M, 15H)
【0054】実施例3 一般式〔化10〕の化合物→一般式〔化11〕の化合物Example 3 Compound of general formula [Chemical Formula 10] → compound of general formula [Chemical Formula 11]
【0055】[0055]
【化10】 [Chemical 10]
【0056】[0056]
【化11】 [Chemical 11]
【0057】一般式〔化10〕の化合物〔R1=フエニ
ルアセトアミド、R2=H、R3=メチル、X=フエニル
スルホニル〕50mgをN,N−ジメチルホルムアミド 0.5m
lに溶解する。これに亜鉛粉末 50mgとTiCl4 10μl
を加え、室温下25分間撹拌しながら反応させた。実施例
1と同様の後処理を行い、一般式〔化11〕の化合物
〔R1=フエニルアセトアミド、R2=H、R3=メチ
ル〕を収率95%で得た。 NMR(CDCl3);δppm 3.62(ABq,2H,J=16Hz), 3.78(s,3H),
5.19(t,1H,J=2Hz), 5.28(t,1H,J=2
Hz),5.40(t,1H,J=2Hz), 5.60(d,1H,
J=4Hz),5.77(dd,1H,J=4Hz and 9H
z),6.20(d,1H,J=9Hz),7.27〜7.39(m,5
H)50 mg of the compound of the general formula [Chemical Formula 10] [R 1 = phenylacetamide, R 2 = H, R 3 = methyl, X = phenylsulfonyl] was added to 0.5 m of N, N-dimethylformamide.
dissolve in 1. 50mg zinc powder and 10μl TiCl 4
Was added and reacted at room temperature for 25 minutes with stirring. The same post-treatment as in Example 1 was carried out to obtain a compound of the general formula [Formula 11] [R 1 = phenylacetamide, R 2 = H, R 3 = methyl] in a yield of 95%. NMR (CDCl 3 ); δppm 3.62 (ABq, 2H, J = 16Hz), 3.78 (s, 3H),
5.19 (t, 1H, J = 2Hz), 5.28 (t, 1H, J = 2)
Hz), 5.40 (t, 1H, J = 2Hz), 5.60 (d, 1H,
J = 4Hz), 5.77 (dd, 1H, J = 4Hz and 9H
z), 6.20 (d, 1H, J = 9Hz), 7.27 to 7.39 (m, 5
H)
【0058】実施例4 一般式〔化12〕の化合物→一般式〔化13〕の化合物Example 4 Compound of general formula [Chemical Formula 12] → compound of general formula [Chemical Formula 13]
【0059】[0059]
【化12】 [Chemical formula 12]
【0060】[0060]
【化13】 [Chemical 13]
【0061】一般式〔化12〕の化合物〔R1=R2=
H、R3=p−メトキシベンジル、X=フエニルスルホニ
ル〕189mgを出発原料として、以下実施例1と同様に反
応を行い、一般式〔化13〕の化合物〔R1=R2=H、
R3=p−メトキシベンジル〕が収率88%で得られた。 NMR(CDCl3);δppm 3.16(dd,1H,J=1.5Hz and 16Hz),3.66(dd,
1H,J=4Hz and 16Hz), 3.82(s,3H),5.13
(s,2H), 5.24(dd,1H,J=1.8Hz and 1.8H
z),5.28(dd,1H,J=1.8Hz and 1.8Hz),5.32
(dd,1H,J=1.8Hz and 1.8Hz),5.38(dd,1
H,J=1.5Hz and 4Hz),6.87〜7.30(m,4H)The compound of the general formula [Chem. 12] [R 1 = R 2 =
Using 189 mg of H, R 3 = p-methoxybenzyl, X = phenylsulfonyl] as a starting material, the following reaction was carried out in the same manner as in Example 1 to obtain a compound of the general formula [Chemical Formula 13] [R 1 = R 2 = H,
R 3 = p-methoxybenzyl] was obtained in 88% yield. NMR (CDCl 3 ); δppm 3.16 (dd, 1H, J = 1.5Hz and 16Hz), 3.66 (dd,
1H, J = 4Hz and 16Hz), 3.82 (s, 3H), 5.13
(S, 2H), 5.24 (dd, 1H, J = 1.8Hz and 1.8H
z), 5.28 (dd, 1H, J = 1.8Hz and 1.8Hz), 5.32
(Dd, 1H, J = 1.8Hz and 1.8Hz), 5.38 (dd, 1
H, J = 1.5Hz and 4Hz), 6.87 to 7.30 (m, 4H)
【0062】実施例5 一般式〔化14〕の化合物→一般式〔化15〕の化合物Example 5 Compound of general formula [Chemical Formula 14] → compound of general formula [Chemical Formula 15]
【0063】[0063]
【化14】 [Chemical 14]
【0064】[0064]
【化15】 [Chemical 15]
【0065】一般式〔化14〕の化合物〔R1=R2=
H、R3=ジフエニルメチル、X=フエニルスルホニ
ル〕720mgを出発原料として、以下実施例1と同様に反
応を行い、一般式〔化15〕の化合物〔R1=R2=H、
R3=ジフエニルメチル〕が収率86%で得られた。 NMR(CDCl3);δppm 3.12(dd,1H,J=1.5Hz and 16.0Hz),3.60(d
d,1H,J=4.1Hz and16.0Hz),5.23(dd,1H,
J=1.8Hz and 1.8Hz),5.32(dd,1H,J=1.8Hz
and 1.8Hz),5.36(dd,1H,J=1.5Hz and 4.1H
z),5.37(dd,1H,J=1.8Hz and 1.8Hz), 6.87
(s,1H),7.27〜7.35(m,10H)A compound of the general formula [Chemical Formula 14] [R 1 = R 2 =
H, R 3 = diphenylmethyl, X = phenylsulfonyl] 720 mg was used as a starting material, and a reaction was carried out in the same manner as in Example 1 below to give a compound of the general formula [C 15] [R 1 = R 2 = H,
R 3 = diphenylmethyl] was obtained with a yield of 86%. NMR (CDCl 3 ); δppm 3.12 (dd, 1H, J = 1.5Hz and 16.0Hz), 3.60 (d
d, 1H, J = 4.1Hz and 16.0Hz), 5.23 (dd, 1H,
J = 1.8Hz and 1.8Hz), 5.32 (dd, 1H, J = 1.8Hz
and 1.8Hz), 5.36 (dd, 1H, J = 1.5Hz and 4.1H
z), 5.37 (dd, 1H, J = 1.8Hz and 1.8Hz), 6.87
(S, 1H), 7.27 to 7.35 (m, 10H)
【0066】実施例6〜11 金属及び金属塩を変えた以外は、実施例1と同様の反応
を行い一般式〔化7〕の化合物〔R1=フエニルアセト
アミド、R2=H、R3=p−メトキシベンジル〕を得
た。結果を表3に示す。Examples 6 to 11 The same reaction as in Example 1 was carried out except that the metal and the metal salt were changed, and the compound of the general formula [Chemical Formula 7] [R 1 = phenylacetamide, R 2 = H, R 3 = P-methoxybenzyl] was obtained. The results are shown in Table 3.
【0067】[0067]
【表3】 [Table 3]
【0068】[0068]
【発明の効果】本発明では、目的とする一般式〔化2〕
で表される2−エキソメチレンペナム誘導体が簡便な操
作で、且つ工業的に有利な方法で、しかも高収率、高純
度で製造される。INDUSTRIAL APPLICABILITY In the present invention, the desired general formula [Chemical formula 2]
The 2-exomethylene penum derivative represented by is produced by a simple operation, an industrially advantageous method, and a high yield and a high purity.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 // A61K 31/43 ADZ 7252−4C (72)発明者 笹岡 三千雄 徳島県徳島市川内町加賀須野463 大塚化 学株式会社徳島研究所内 (72)発明者 城井 敬史 徳島県徳島市川内町加賀須野463 大塚化 学株式会社徳島研究所内 (72)発明者 亀山 豊 徳島県徳島市川内町加賀須野463 大塚化 学株式会社徳島研究所内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification number Internal reference number FI technical display location // A61K 31/43 ADZ 7252-4C (72) Inventor Mitsuo Sasaoka Kagasuno Kawauchi, Tokushima City, Tokushima Prefecture 463 Otsuka Chemical Co., Ltd.Tokushima Research Institute (72) Inventor Takashi Shiroi Kagasuno, Tokushima City, Tokushima Prefecture 463 Otsuka Chemical Co., Ltd. Tokushima Research Institute (72) Inventor, Kameyama Toyo Kameyama 463 Oka, Kawauchi Town, Tokushima Prefecture Kagaku Co., Ltd. Tokushima Research Center
Claims (1)
ラクタム化合物を金属還元剤と反応させて、一般式〔化
2〕で表される2−エキソメチレンペナム誘導体を得る
ことを特徴とする2−エキソメチレンペナム誘導体の製
造法。 【化1】 (式中R1は水素原子、ハロゲン原子、アミノ基、又は
保護されたアミノ基を示す。R2は水素原子、ハロゲン
原子、低級アルコキシ基、低級アシル基、低級アルキル
基、水酸基、又は保護された水酸基を置換基として有す
る低級アルキル基、水酸基、又は保護された水酸基を示
す。又、R1とR2とで=Oを示す。R3は水素原子又は
カルボン酸保護基を示す。Xは基−SO2R4又は基−S
R4を示す。R4は置換基を有していても良いアリール
基、又は置換基を有していても良い含窒素芳香族複素環
基を示す。) 【化2】 (式中R1,R2,R3は前記に同じ。)1. An allenyl β-represented by the general formula:
A method for producing a 2-exomethylenepenum derivative, which comprises reacting a lactam compound with a metal reducing agent to obtain a 2-exomethylenepenum derivative represented by the general formula [Chemical Formula 2]. [Chemical 1] (In the formula, R 1 represents a hydrogen atom, a halogen atom, an amino group, or a protected amino group. R 2 represents a hydrogen atom, a halogen atom, a lower alkoxy group, a lower acyl group, a lower alkyl group, a hydroxyl group, or a protected amino group. Represents a lower alkyl group having a hydroxyl group as a substituent, a hydroxyl group, or a protected hydroxyl group, R 1 and R 2 represent ═O, R 3 represents a hydrogen atom or a carboxylic acid protecting group, and X represents Group -SO 2 R 4 or group -S
R 4 is shown. R 4 represents an aryl group which may have a substituent or a nitrogen-containing aromatic heterocyclic group which may have a substituent. ) [Chemical 2] (In the formula, R 1 , R 2 and R 3 are the same as above.)
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1996028422A1 (en) * | 1995-03-10 | 1996-09-19 | Otsuka Kagaku Kabushiki Kaisha | PROCESS FOR THE PRODUCTION OF β-LACTAM COMPOUNDS |
US6197185B1 (en) | 1995-03-10 | 2001-03-06 | Otsuka Kagaku Kabushiki Kaisha | Process for preparing beta lactam compound |
-
1992
- 1992-02-10 JP JP05747692A patent/JP3224261B2/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1996028422A1 (en) * | 1995-03-10 | 1996-09-19 | Otsuka Kagaku Kabushiki Kaisha | PROCESS FOR THE PRODUCTION OF β-LACTAM COMPOUNDS |
US5905147A (en) * | 1995-03-10 | 1999-05-18 | Otsuka Kagaku Kabushiki Kaisha | Process for preparing β-lactam compound |
US6043356A (en) * | 1995-03-10 | 2000-03-28 | Otsuka Kagaku Kabushiki Kaisha | Process for preparing β-lactam compound |
US6197185B1 (en) | 1995-03-10 | 2001-03-06 | Otsuka Kagaku Kabushiki Kaisha | Process for preparing beta lactam compound |
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