JPH0588308B2 - - Google Patents
Info
- Publication number
- JPH0588308B2 JPH0588308B2 JP20000288A JP20000288A JPH0588308B2 JP H0588308 B2 JPH0588308 B2 JP H0588308B2 JP 20000288 A JP20000288 A JP 20000288A JP 20000288 A JP20000288 A JP 20000288A JP H0588308 B2 JPH0588308 B2 JP H0588308B2
- Authority
- JP
- Japan
- Prior art keywords
- base material
- film
- tin
- thin films
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000463 material Substances 0.000 claims description 57
- 239000010409 thin film Substances 0.000 claims description 47
- 239000010408 film Substances 0.000 claims description 37
- 239000002131 composite material Substances 0.000 claims description 25
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 21
- 239000011195 cermet Substances 0.000 claims description 7
- 238000010030 laminating Methods 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 description 19
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 8
- 238000005520 cutting process Methods 0.000 description 8
- -1 nitrogen ions Chemical class 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- 229910052735 hafnium Inorganic materials 0.000 description 5
- 229910052726 zirconium Inorganic materials 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000009684 ion beam mixing Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 150000004767 nitrides Chemical class 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- 238000007733 ion plating Methods 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 238000003466 welding Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
- 239000004416 thermosoftening plastic Substances 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20000288A JPH0250949A (ja) | 1988-08-12 | 1988-08-12 | 複合超硬材料 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20000288A JPH0250949A (ja) | 1988-08-12 | 1988-08-12 | 複合超硬材料 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0250949A JPH0250949A (ja) | 1990-02-20 |
| JPH0588308B2 true JPH0588308B2 (zh) | 1993-12-21 |
Family
ID=16417163
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20000288A Granted JPH0250949A (ja) | 1988-08-12 | 1988-08-12 | 複合超硬材料 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0250949A (zh) |
-
1988
- 1988-08-12 JP JP20000288A patent/JPH0250949A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0250949A (ja) | 1990-02-20 |
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