JPH0587943U - End point detector for dry etching equipment - Google Patents

End point detector for dry etching equipment

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Publication number
JPH0587943U
JPH0587943U JP3616692U JP3616692U JPH0587943U JP H0587943 U JPH0587943 U JP H0587943U JP 3616692 U JP3616692 U JP 3616692U JP 3616692 U JP3616692 U JP 3616692U JP H0587943 U JPH0587943 U JP H0587943U
Authority
JP
Japan
Prior art keywords
light
light intensity
output
end point
control system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3616692U
Other languages
Japanese (ja)
Inventor
一行 豊田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Kokusai Electric Inc
Original Assignee
Hitachi Kokusai Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Kokusai Electric Inc filed Critical Hitachi Kokusai Electric Inc
Priority to JP3616692U priority Critical patent/JPH0587943U/en
Publication of JPH0587943U publication Critical patent/JPH0587943U/en
Pending legal-status Critical Current

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Abstract

(57)【要約】 【目的】 光量を自動的に調節し、光量調節時間を短縮
する。 【構成】 光量調節部Aに回転変位に従って連続的に光
量を変化させる光通過孔19を有する光量調節板4を設
置し、光強度−電気信号変換素子7の出力信号が設定器
12の設定出力に合致するよう光量調節板4をモータ9
により回転制御する自動制御系8を設け、合致時に光強
度−電気信号変換素子7の出力を自動制御系8より電気
信号処理装置16に切換スイッチ13で切換える構成と
する。
(57) [Summary] [Purpose] The light intensity is automatically adjusted to shorten the light intensity adjustment time. A light amount adjusting plate 4 having a light passage hole 19 for continuously changing the light amount according to a rotational displacement is installed in the light amount adjusting section A, and an output signal of the light intensity-electrical signal converting element 7 is a set output of a setter 12. The light amount adjusting plate 4 to the motor 9 so that
The automatic control system 8 for controlling the rotation is provided, and the output of the light intensity-electrical signal conversion element 7 is switched from the automatic control system 8 to the electric signal processing device 16 by the changeover switch 13 when they match.

Description

【考案の詳細な説明】[Detailed description of the device]

【0001】[0001]

【産業上の利用分野】[Industrial applications]

本考案は半導体製造装置の1つであるドライエッチング装置のエッチング終了 点を検出する終点検出器に関する。 The present invention relates to an end point detector that detects an etching end point of a dry etching apparatus which is one of semiconductor manufacturing apparatuses.

【0002】[0002]

【従来の技術】[Prior Art]

図4は従来の終点検出器の1例の構成説明図である。 この従来例は、図4に示すようにドライエッチング装置1のプラズマ光の光量 を光量調節部Aで調節し、この光量調節された光のうち特定波長の光のみ光学フ ィルタ6により取出す。 FIG. 4 is a diagram illustrating the configuration of an example of a conventional end point detector. In this conventional example, as shown in FIG. 4, the light quantity of the plasma light of the dry etching apparatus 1 is adjusted by the light quantity adjusting section A, and only the light of a specific wavelength is extracted by the optical filter 6 from the light quantity adjusted light.

【0003】 この特定波長の光の強度を光電子増倍管7により電気信号に変換し、この電気 信号をマイクロプロセッサ16に入力して光強度の変化分を求め、エッチング終 了点を判定するのであるが、光量調節Aに直径の異なる光通過孔19を有する複 数の孔あき板20A〜20Dの1つを人為的に選んでセットし、光電子増倍管7 に導入する光量が適切になるようこれらの孔あき板20A〜20Dを人為的に変 換していた。Since the intensity of the light of the specific wavelength is converted into an electric signal by the photomultiplier tube 7, the electric signal is input to the microprocessor 16 to obtain the change amount of the light intensity and the etching end point is determined. However, in the light quantity adjustment A, one of a plurality of perforated plates 20A to 20D having light passage holes 19 having different diameters is artificially selected and set, and the light quantity introduced into the photomultiplier tube 7 becomes appropriate. As described above, these perforated plates 20A to 20D are artificially converted.

【0004】 孔あき板20A〜20Dを変換する理由について述べる。 図5は光電子増倍管に入力する光の強度(光のエネルギー)と光電子増倍管の 出力電流の関係を示す図である。 図5のaの三角形で示す範囲は終点検出器のマイクロプロセッサ16で処理で きる光の強度の変化範囲を示したもので、終点検出器の構成(使用部品の特性や それらの使用方法)で変る。直線a1 の傾きは光電子増倍管7の光電面及びダイ ノートに印加する電圧の大きで決定する。The reason for converting the perforated plates 20A to 20D will be described. FIG. 5 is a diagram showing the relationship between the intensity (light energy) of light input to the photomultiplier tube and the output current of the photomultiplier tube. The range indicated by the triangle in Fig. 5a shows the range of change in the intensity of light that can be processed by the microprocessor 16 of the end point detector, and it depends on the configuration of the end point detector (characteristics of parts used and how they are used). Change. The slope of the straight line a 1 is determined by the magnitude of the voltage applied to the photocathode of the photomultiplier tube 7 and the die note.

【0005】 図5のbで示す範囲はある条件でエッチングを行った時(終点検出時)に目的 とする光(通常、特定波長を光学フィルタ6で選択する)の強度の変化範囲であ る。 図5のcで示す範囲は、図5のaの三角形で示す範囲に入っていないため、マ イクロプロセッサ16で処理することができない。The range shown by b in FIG. 5 is a range of change in the intensity of the target light (usually, the specific wavelength is selected by the optical filter 6) when etching is performed under certain conditions (when the end point is detected). .. The range indicated by c in FIG. 5 does not fall within the range indicated by the triangle in FIG. 5a, and therefore cannot be processed by the microprocessor 16.

【0006】 マイクロプロセッサ16で図5のbで示した範囲の光の強度の変化を全て処理 できるようにするためには、図5のaで示した範囲を図5で右にずらすか図5の bで示す範囲を左にずらせばよい。In order for the microprocessor 16 to be able to process all changes in the light intensity in the range shown in FIG. 5B, the range shown in FIG. 5A should be shifted to the right in FIG. It is sufficient to shift the range indicated by b to the left.

【0007】 前者は光電子増倍管7の特性や構成部品の性能で一律に決められたものである ため実現が困難である。後者は光の強度を小さくすればよいので簡単である。 図4の複数枚の孔あき板20A〜20Dを選択変換する理由は、図5のbで示 す範囲を左にずらすことである。The former is difficult to realize because it is uniformly determined by the characteristics of the photomultiplier tube 7 and the performance of the components. The latter is easy because the intensity of light can be reduced. The reason for selectively converting the plurality of perforated plates 20A to 20D in FIG. 4 is to shift the range indicated by b in FIG. 5 to the left.

【0008】[0008]

【考案が解決しようとする課題】[Problems to be solved by the device]

かくして従来はこの複数の孔あき板20A〜20Dを光の強度の変化に合せて 人為的に変換していた。又、孔19の大きさは2mm,1mm,0.5mm・・ ・などと不連続であるためその範囲もステップ状に変化し、光電子増倍管に入力 する光量を連続的に調節することができない。 Thus, conventionally, the plurality of perforated plates 20A to 20D have been artificially converted according to changes in the intensity of light. Further, since the size of the hole 19 is discontinuous, such as 2 mm, 1 mm, 0.5 mm ..., The range also changes stepwise, and the amount of light input to the photomultiplier tube can be continuously adjusted. Can not.

【0009】[0009]

【課題を解決するための手段】[Means for Solving the Problems]

本考案終点検出器は、上記の課題を解決するため、図1に示すようにドライエ ッチング装置1のプラズマ光の光量を光量調節部Aで調節し、この光量調節され た光のうち特定波長の光のみ光学フィルタ6により取出し、この特定波長の光の 強度を光強度−電気信号変換素子7により電気信号に変換し、この電気信号を電 気信号処理装置16に入力して光強度の変化を求め、エッチング終了点を判定す るドライエッチング装置の終点検出器において、前記光量調節Aに回転変位に従 って連続的に光量を変化させる光通過孔19を有する光量調節板4を設置し、前 記光強度−電気信号変換素子7の出力信号が設定器12の設定出力に合致するよ う該光量調節板4をモータ9により回転制御する自動制御系8を設け、合致時に 前記光強度−電気信号変換素子7の出力を該自動制御系8より前記電気信号処理 装置16に切換スイッチ13で切換える構成とする。 In order to solve the above problems, the end point detector of the present invention adjusts the light quantity of plasma light of the dry etching apparatus 1 by a light quantity adjusting unit A as shown in FIG. Only the light is extracted by the optical filter 6, the intensity of the light of the specific wavelength is converted into an electrical signal by the optical intensity-electrical signal conversion element 7, and this electrical signal is input to the electrical signal processing device 16 to change the optical intensity. In the end point detector of the dry etching apparatus for determining the etching end point, the light amount adjusting plate 4 having the light passing hole 19 for continuously changing the light amount according to the rotational displacement is installed in the light amount adjusting A, The above-mentioned light intensity-an automatic control system 8 for controlling the rotation of the light quantity adjusting plate 4 by a motor 9 so that the output signal of the electric signal converting element 7 matches the set output of the setting device 12 is provided. Electric The output of the signal converting element 7 a structure for switching the changeover switch 13 to the electrical signal processing device 16 from the automatic control system 8.

【0010】[0010]

【作 用】[Work]

ドライエッチング装置1のプラズマ光は光量調節部Aの光量調節板4の光通過 孔19を通り、その際光量が調節される。この光量調節された光のうち特定波長 の光のみが光学フィルタ6により取出され、この特定波長の光の強度が光強度− 電気信号変換素子7により電気信号に変換される。 The plasma light of the dry etching apparatus 1 passes through the light passage hole 19 of the light quantity adjusting plate 4 of the light quantity adjusting unit A, and the light quantity is adjusted at that time. Only the light of the specific wavelength is extracted by the optical filter 6 from the light of which the light amount is adjusted, and the intensity of the light of the specific wavelength is converted into an electric signal by the light intensity-electric signal conversion element 7.

【0011】 この電気信号が設定器12の設定出力に合致するよう自動制御系8によりモー タ9が駆動されて光量調節板4が回転制御され、合致した時点でモータ9が停止 され光量調節板4が停止される。この停止時の光量調節板4の光通過孔19を通 った光量、即ちその回転変位に比例した光量の光のうち特定波長の光が光学フィ ルタ6により取出される。The motor 9 is driven by the automatic control system 8 to control the rotation of the light quantity adjusting plate 4 so that this electric signal matches the set output of the setting device 12, and when it matches, the motor 9 is stopped and the light quantity adjusting plate is stopped. 4 is stopped. The light having a specific wavelength is extracted by the optical filter 6 from the amount of light that has passed through the light passage hole 19 of the light amount adjusting plate 4 at the time of stop, that is, the amount of light that is proportional to the rotational displacement.

【0012】 この特定波長の光の強度が光強度−電気信号変換素子7により電気信号に変換 される。この電気信号は切換スイッチ13により自動制御系8より電気信号処理 装置16に切換入力されて光強度の変化が求められ、ドライエッチング装置1の エッチング終了が判定されることになる。The light intensity of the specific wavelength is converted into an electric signal by the light intensity-electric signal conversion element 7. The electric signal is switched by the changeover switch 13 from the automatic control system 8 to the electric signal processing device 16 to obtain a change in the light intensity, and the end of etching of the dry etching device 1 is determined.

【0013】[0013]

【実施例】【Example】

図1(A)は本考案終点検出器の1実施例の構成を示す説明用斜視図、図1( B)はその自動制御系の構成を示すブロック図、図2は本考案における光量調節 板の正面図である。 図1において1はドライエッチング装置、2はケース(暗箱)、3はこのケー ス2に形成した光導入口、4はケース2内の光量調節部Aに設置された光量調節 板で、回転変位に従って連続的に光量を変化させる光通過孔19を有する(図2 参照)。 FIG. 1 (A) is an explanatory perspective view showing the structure of an embodiment of the end point detector of the present invention, FIG. 1 (B) is a block diagram showing the structure of its automatic control system, and FIG. 2 is a light quantity adjusting plate of the present invention. FIG. In FIG. 1, 1 is a dry etching device, 2 is a case (dark box), 3 is a light entrance formed in this case 2, 4 is a light quantity adjusting plate installed in the light quantity adjusting section A in the case 2, and rotational displacement is performed. In accordance with the above, there is a light passage hole 19 that continuously changes the light amount (see FIG. 2).

【0014】 5はこの光量調節板4の光通過孔19を通る光量調節された光を伝達する光フ ァイバ、6はこの光ファイバ5より光のうち特定波長の光を取出す光学フィルタ 、7は特定波長の光の強度を電流に変換する光電子増倍管、8は自動制御系、9 はこの自動制御系8により駆動される直流モータ、10はこの直流モータ9の回 転を光量調節板4の回転軸に伝達するためのベルト,プーリ等による回転伝送機 構である。Reference numeral 5 is an optical fiber for transmitting the light whose amount of light has been adjusted through the light passage hole 19 of the light amount adjusting plate 4, 6 is an optical filter for extracting light of a specific wavelength from the optical fiber 5, and 7 is A photomultiplier tube for converting the intensity of light of a specific wavelength into an electric current, 8 is an automatic control system, 9 is a DC motor driven by this automatic control system, 10 is the rotation of this DC motor 9, and is a light quantity adjusting plate 4 This is a rotary transmission mechanism that uses belts, pulleys, etc. to transmit to the rotating shaft of the.

【0015】 11は光電子増倍管7の電気信号(電流)を電圧に変換する電流−電圧変換用 増幅器、14はこの増幅器11の出力電圧と設定器12により設定された設定電 圧とを比較し、その差電圧を出力する比較器、15はその出力差電圧を入力して 直流モータ9を駆動するモータ駆動回路、13は電流−電圧変換用増幅器11の 出力電圧を比較器14側からマイクロプロセッサ16側に切換え入力すると共に モータ駆動回路15の直流モータ9への出力を遮断する切換スイッチである。Reference numeral 11 denotes a current-voltage conversion amplifier that converts an electric signal (current) of the photomultiplier tube 7 into a voltage, and 14 compares an output voltage of the amplifier 11 with a set voltage set by a setter 12. Then, 15 is a comparator for outputting the difference voltage, 15 is a motor drive circuit for driving the DC motor 9 by inputting the output difference voltage, and 13 is the output voltage of the current-voltage conversion amplifier 11 from the comparator 14 side. This is a changeover switch for switching and inputting to the processor 16 side and for shutting off the output to the DC motor 9 of the motor drive circuit 15.

【0016】 図3は本考案の自動制御系における、フィードバック制御系の説明図である。 17は比較器14の出力差電圧があるとき、その出力差電圧を出力するPI増 幅部、18はこのPI増幅部17の出力電圧を入力してフィードバック電圧を比 較器14に入力する伝達関数である。 この伝達関数18は直流モータ9の駆動,光量調節板4の回転,光電子増倍管 7の入力光量の変化であり、伝達関数18の出力電圧,即ちフィードバック電圧 は比較器14の入力となる。FIG. 3 is an explanatory diagram of a feedback control system in the automatic control system of the present invention. Reference numeral 17 denotes a PI amplifier for outputting the output differential voltage of the comparator 14 when there is an output differential voltage, and reference numeral 18 denotes a transfer for inputting the output voltage of the PI amplifier 17 to input a feedback voltage to the comparator 14. Is a function. The transfer function 18 is the drive of the DC motor 9, the rotation of the light quantity adjusting plate 4, and the change of the input light quantity of the photomultiplier tube 7, and the output voltage of the transfer function 18, that is, the feedback voltage becomes the input of the comparator 14.

【0017】 上記の構成において本実施例の作用を説明する。 設定器12による設定値は、通常、マイクロプロセッサ16で処理する光の強 度信号(電気信号)が変化する範囲のほぼ中心値で、例えばその範囲が0〜5V であれば2.5Vとする。 光電子増倍管7の光電面とダイノードに印加する電圧をその印加範囲の中央付 近に設定し、制御動作を開始する。The operation of the present embodiment having the above configuration will be described. The set value by the setting device 12 is generally the center value of the range in which the intensity signal (electrical signal) of the light processed by the microprocessor 16 changes, and is 2.5 V if the range is 0 to 5 V, for example. .. The voltage applied to the photocathode of the photomultiplier tube 7 and the dynode is set near the center of the application range, and the control operation is started.

【0018】 ドライエッチング装置1のプラズマ光は光導入口3から光量調節部Aの光量調 節板4の光通過孔19を通り、その際光量が調節される。この光量調節された光 は光ファイバ5を通り、そのうちの特定波長の光のみが光学フィルタ6より取出 され、この特定波長の光の強度が光電子増倍管7により電流に変換される。The plasma light of the dry etching apparatus 1 passes from the light inlet 3 to the light passage hole 19 of the light quantity adjusting plate 4 of the light quantity adjusting unit A, and the light quantity is adjusted at that time. The light of which the amount of light is adjusted passes through the optical fiber 5, and only the light of the specific wavelength is extracted from the optical filter 6, and the intensity of the light of the specific wavelength is converted into a current by the photomultiplier tube 7.

【0019】 この電流は自動制御系8の電流−電圧変換用増幅器11により電圧に変換され 、この電圧と設定器12により設定された電圧が比較器14により比較され、そ の差電圧がモータ駆動回路15に入力されて直流モータ9が駆動され、光量調節 板4が回転伝送機構10を介して回転される。光量調節板4の回転により光通過 孔19を通る光量が変えられる。This current is converted into a voltage by the current-voltage conversion amplifier 11 of the automatic control system 8, and this voltage and the voltage set by the setting device 12 are compared by the comparator 14, and the difference voltage thereof is used to drive the motor. The direct current motor 9 is driven by the input to the circuit 15, and the light quantity adjusting plate 4 is rotated via the rotation transmission mechanism 10. The amount of light passing through the light passage hole 19 can be changed by rotating the light amount adjusting plate 4.

【0020】 これによって光電子増倍管7の出力電流が変わり、電流−電圧変換用増幅器1 1の出力電圧が変わる。この出力電圧が設定電圧に合致するまで換言すれば比較 器14の出力差電圧が零になるまで、直流モータ9により光量調節板4が回転さ れ、合致した時点で直流モータ9が停止され、光量調節板4が停止されて制御動 作が終了する。As a result, the output current of the photomultiplier tube 7 changes, and the output voltage of the current-voltage conversion amplifier 11 changes. Until this output voltage matches the set voltage, in other words, until the output voltage difference of the comparator 14 becomes zero, the light quantity adjusting plate 4 is rotated by the DC motor 9, and when it matches, the DC motor 9 is stopped. The light amount adjusting plate 4 is stopped and the control operation is completed.

【0021】 制御動作が終了した時点で、光電子増倍管7に入力する光量が適切となるため 、その出力電流が電流−電圧変換用増幅器11により電圧に変換され、この電圧 は切換スイッチ13により自動制御系8よりマイクロプロセッサ16に切換入力 されて光強度の変化が求められ、ドライエッチング装置1のエッチング終了が判 定されることになる。When the control operation is completed, the amount of light input to the photomultiplier tube 7 becomes appropriate, so that the output current thereof is converted into a voltage by the current-voltage conversion amplifier 11, and this voltage is changed by the changeover switch 13. The automatic control system 8 switches and inputs to the microprocessor 16 to obtain a change in the light intensity, and the end of etching of the dry etching apparatus 1 is determined.

【0022】 又、図3を用いてフィードバック制御系の作用を詳述する。 光電子増倍管7の出力電流が電流−電圧変換用増幅器11により電圧に変換さ れ、設定電圧とフィードバック電圧が比較器14で比較される。差があればその 差電圧がPI増幅部17により伝達関数18に伝えられる。この伝達関数18の 出力電圧、即ちフィードバック電圧が比較器14に入力され、この動作がPI増 幅部17の出力が零になる迄で続く。The operation of the feedback control system will be described in detail with reference to FIG. The output current of the photomultiplier tube 7 is converted into a voltage by the current-voltage conversion amplifier 11, and the set voltage and the feedback voltage are compared by the comparator 14. If there is a difference, the difference voltage is transmitted to the transfer function 18 by the PI amplifier 17. The output voltage of the transfer function 18, that is, the feedback voltage is input to the comparator 14, and this operation continues until the output of the PI amplifier 17 becomes zero.

【0023】 PI増幅部17の出力が零になり、制御動作が終了した時点で、光電子増倍管 7に入力する光量が適切となるため、上記のように電流−電圧変換用増幅器11 の出力電圧が切換スイッチ13による切換えでマイクロプロセッサ16に入力さ れてエッチング終了点検出処理に移る。When the output of the PI amplifier 17 becomes zero and the control operation ends, the amount of light input to the photomultiplier tube 7 becomes appropriate, so that the output of the current-voltage conversion amplifier 11 as described above. The voltage is input to the microprocessor 16 by the changeover switch 13, and the etching end point detection processing is started.

【0024】 従来,直径の異なる光通過孔19を有する複数の孔あき板20A〜20Dを手 作業で変換し光電子増倍管7に入力する光量を人為的に調節していたのを、本実 施例においては自動的に調節することができ、部品交換作業を不要にでき、又光 電子増倍管7に入力する光量の調節時間を大幅に短縮することができる。Conventionally, a plurality of perforated plates 20A to 20D having light passage holes 19 having different diameters were manually converted and the amount of light input to the photomultiplier tube 7 was artificially adjusted. In the embodiment, the adjustment can be performed automatically, the parts replacement work can be eliminated, and the adjustment time of the light quantity input to the photomultiplier tube 7 can be greatly shortened.

【0025】 従来と本考案の光量調節時間を比較した結果を表1に示す。Table 1 shows the result of comparing the light amount adjustment times of the conventional device and the present invention.

【0026】[0026]

【表1】 上記表1より明らかなように従来の光量調節時間は75分であったのを本考案 では15分に短縮することができた。[Table 1] As is apparent from Table 1 above, the conventional light amount adjustment time was 75 minutes, but in the present invention, it was possible to reduce it to 15 minutes.

【0027】[0027]

【考案の効果】[Effect of the device]

上述のように本考案によれば、光量調節部Aに回転変位に従って連続的に光量 を変化させる光通過孔19を有する光量調節板4を設置し、光強度−電気信号変 換素子7の出力信号が設定器12の設定出力に合致するよう光量調節板4をモー タ9により回転制御する自動制御系8を設け、合致時に光強度−電気信号変換素 子7の出力を自動制御系8より電気信号処理装置16に切換スイッチ13で切換 える構成としたので、光強度−電気信号変換素子7に入力する光量を自動的に調 節することができ、部品交換作業を不要にできるばかりでなく、光強度−電気信 号変換素子7に入力する光量の調節時間を大幅に短縮することができる。 As described above, according to the present invention, the light quantity adjusting plate A is provided with the light quantity adjusting plate 4 having the light passage hole 19 for continuously changing the light quantity according to the rotational displacement, and the output of the light intensity-electrical signal converting element 7 is provided. An automatic control system 8 is provided to control the rotation of the light quantity adjusting plate 4 by the motor 9 so that the signal matches the set output of the setting device 12. When the signals match, the output of the light intensity-electrical signal conversion element 7 is output from the automatic control system 8. Since the electric signal processing device 16 is configured to be switched by the changeover switch 13, the amount of light input to the light intensity-electrical signal conversion element 7 can be automatically adjusted, and not only the parts replacement work is unnecessary. The time for adjusting the amount of light input to the light intensity-electrical signal conversion element 7 can be greatly shortened.

【図面の簡単な説明】[Brief description of drawings]

【図1】(A)は本考案終点検出器の1実施例の構成を
示す説明用斜視図である。(B)はその自動制御系の構
成を示すブロック図である。
FIG. 1A is an explanatory perspective view showing the configuration of an embodiment of an end point detector of the present invention. (B) is a block diagram showing the configuration of the automatic control system.

【図2】本考案における光量調節板の正面図である。FIG. 2 is a front view of a light amount adjusting plate according to the present invention.

【図3】本考案の自動制御系におけるフィードバック制
御系の説明図である。
FIG. 3 is an explanatory diagram of a feedback control system in the automatic control system of the present invention.

【図4】従来の終点検出器の1例の構成説明図である。FIG. 4 is a structural explanatory view of an example of a conventional end point detector.

【図5】光電子増倍管に入力する光の強度(光のエネル
ギー)と光電子増倍管の出力電流の関係を示す図であ
る。
FIG. 5 is a diagram showing the relationship between the intensity of light (light energy) input to the photomultiplier tube and the output current of the photomultiplier tube.

【符号の説明】[Explanation of symbols]

1 ドライエッチング装置 2 ケース(暗箱) 3 光導入口 4 光量調節板 5 光ファイバ 6 光学フィルタ 7 光,強度−電気信号変換素子(光電子増倍管) 8 自動制御系 9 (直流)モータ 10 回転伝送機構 11 電流−電圧変換用増幅器 12 設定器 13 切換スイッチ 14 比較器 15 モータ駆動回路 16 電気信号処理装置 17 PI増幅部 18 伝達関数 19 光通過孔 1 Dry Etching Device 2 Case (Dark Box) 3 Light Inlet 4 Light Quantity Control Plate 5 Optical Fiber 6 Optical Filter 7 Light, Intensity-Electrical Signal Converter (Photomultiplier Tube) 8 Automatic Control System 9 (DC) Motor 10 Rotation Transmission Mechanism 11 Current-voltage conversion amplifier 12 Setting device 13 Changeover switch 14 Comparator 15 Motor drive circuit 16 Electric signal processing device 17 PI amplification unit 18 Transfer function 19 Light passage hole

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】 ドライエッチング装置(1)のプラズマ
光の光量を光量調節部(A)で調節し、この光量調節さ
れた光のうち特定波長の光のみ光学フィルタ(6)によ
り取出し、この特定波長の光の強度を光強度−電気信号
変換素子(7)により電気信号に変換し、この電気信号
を電気信号処理装置(16)に入力して光強度の変化を
求め、エッチング終了点を判定するドライエッチング装
置の終点検出器において、前記光量調節(A)に回転変
位に従って連続的に光量を変化させる光通過孔(19)
を有する光量調節板(4)を設置し、前記光強度−電気
信号変換素子(7)の出力信号が設定器(12)の設定
出力に合致するよう該光量調節板(4)をモータ(9)
により回転制御する自動制御系(8)を設け、合致時に
前記光強度−電気信号変換素子(7)の出力を該自動制
御系(8)より前記信号処理装置(16)に切換スイッ
チ(13)で切換える構成とするドライエッチング装置
の終点検出器。
1. The amount of plasma light of a dry etching device (1) is adjusted by a light amount adjusting section (A), and only light of a specific wavelength is extracted by an optical filter (6) from the light amount adjusted light. The light intensity of the wavelength is converted into an electric signal by the light intensity-electrical signal conversion element (7), the electric signal is input to the electric signal processing device (16) to obtain the change in the light intensity, and the etching end point is determined. In the end point detector of the dry etching apparatus, a light passage hole (19) for continuously changing the light amount according to the rotational displacement in the light amount adjustment (A).
Is installed, and the light intensity adjusting plate (4) is set so that the output signal of the light intensity-electrical signal converting element (7) matches the set output of the setting device (12). )
An automatic control system (8) for controlling rotation by means is provided, and at the time of coincidence, the output of the light intensity-electrical signal conversion element (7) is switched from the automatic control system (8) to the signal processing device (16) by a switch (13). The end point detector of the dry etching system configured to switch with.
JP3616692U 1992-04-28 1992-04-28 End point detector for dry etching equipment Pending JPH0587943U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3616692U JPH0587943U (en) 1992-04-28 1992-04-28 End point detector for dry etching equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3616692U JPH0587943U (en) 1992-04-28 1992-04-28 End point detector for dry etching equipment

Publications (1)

Publication Number Publication Date
JPH0587943U true JPH0587943U (en) 1993-11-26

Family

ID=12462179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3616692U Pending JPH0587943U (en) 1992-04-28 1992-04-28 End point detector for dry etching equipment

Country Status (1)

Country Link
JP (1) JPH0587943U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009147207A (en) * 2007-12-17 2009-07-02 Hitachi High-Technologies Corp Plasma processing equipment

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS606852A (en) * 1983-06-24 1985-01-14 Hitachi Ltd Monitoring method of plasma and monitor
JPS62165920A (en) * 1986-01-17 1987-07-22 Hitachi Ltd Judging device for end point of etching

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS606852A (en) * 1983-06-24 1985-01-14 Hitachi Ltd Monitoring method of plasma and monitor
JPS62165920A (en) * 1986-01-17 1987-07-22 Hitachi Ltd Judging device for end point of etching

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009147207A (en) * 2007-12-17 2009-07-02 Hitachi High-Technologies Corp Plasma processing equipment

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