KR19980025590U - Etch end point detection device - Google Patents

Abstract

The present invention relates to an apparatus for detecting an end point of etching, and in the related art, it is inconvenient to continuously change the wavelength setting for the monochromator in a manual manner.

Accordingly, the present invention provides an apparatus for detecting an end point of etch, comprising: a monochromator having an input slit into which an input wavelength is incident, a mirror reflecting a wavelength incident through the input slit, a micrometer to preset a detection wavelength, and A mirror that sequentially transmits the wavelength passing through the micrometer to the photoamplifier tube, a grating and sine bar that adjusts the angle of the mirror by a value set in the micrometer, and at the micrometer A stepping motor for automatically setting the wavelength of the waveguide, a motor controller for driving the stepping motor, and a CPI oil for generating a control signal of the motor controller. The present invention provides a wavelength of an etching end point for each process. Is set in advance in the setup program and automatically adjusts the setup wavelength to detect different wavelengths. Manually there is an effect that it is possible to eliminate the inconvenience caused by such mistakes and manually adjusting the setting of the micrometer wavelength.

Description

Etch end point detection device

The present invention relates to an etching end point detection device, and particularly, an etching end point that is suitable for accurately detecting an etching end point by inputting and setting a wavelength of an end point corresponding to each process into a program so that the micrometer is automatically adjusted. It relates to a detection device.

Figure 1 shows a conventional etching end point detection apparatus, as shown in the etching chamber 10, the etching process proceeds, and based on a pre-programmed set wavelength, the monochromator passing only a specific wavelength for each process Amplifying the signal passed through the meter 30, the photoelectric tube tube (PMT) (40) for converting the signal passed through the monochromator (30) into an electrical signal, and the photo amplifier tube (40) The amplifier circuit 50 and the microcomputer 60 which receives this signal and detects an etching end point are comprised.

In addition, the monochromator 30 includes an input slit 31 into which an input wavelength is incident, a mirror 32 reflecting a wavelength incident through the input slit 31, and a micrometer to preset a detection wavelength. (35), the mirrors 33 and 34 which sequentially transmit the wavelengths passing through the micrometer 35 to the photoamplifier tube 40, and the mirrors by the values set in the micrometer 35. It is composed of a grating and sine bar (26) for adjusting the angle of (33), and the operation thereof will be described with reference to the monochromator 30 as a focus.

First, the wavelength generated during the etching process is incident through the input slit 31 and the incident wavelength is reflected through the mirror 32.

In this way, the wavelength reflected by the mirror 32 is sequentially influenced by the value set in the micrometer 35 and passes through the mirrors 33 and 34 in order to be transmitted to the photo-amplification tube tube 40.

That is, the angles of the mirrors 33 and 34 are adjusted by the grating / sine bar 36 on the basis of a value preset in the micrometer 35.

The photoelectric amplifier tube 40 which has received the signal passing through the monochromator 30 converts the received signal into an electrical signal, amplifies it in the amplifier circuit 50 and inputs it to the microcomputer 60.

Then, the microcomputer 60 detects the etching end point by the input electric signal to control the entire system.

However, it is inconvenient to continuously change the setting of the wavelength for the monochromator 30 in a manual manner.

The present invention has been devised to solve the conventional problems as described above, and by setting the wavelength of the end point suitable for each process in the program, the wavelength set in the micrometer is automatically adjusted so that the etching end point can be accurately detected. It is an object of the present invention to provide an etching end point detection device.

1 is a block diagram of a conventional etching end point detection device.

Figure 2 is a detailed configuration of the monochromator and the photo amplifier tube in Figure 1;

3 is a block diagram of an apparatus for detecting an etching end point of the present invention.

Explanation of symbols on the main parts of the drawings

10: etching chamber 20: electrode

30 Monochrome 31 Input slit

32 ~ 34 Mirror 35 Micrometer

36 grating / sine bar 40 photoelectric amplifier tube (PMT)

41: photo amplifier tube power supply 42: discharge slit

50: amplifier circuit 60: microcomputer

70 stepping motor 80 motor controller

80: CPI

Etch end point detection device of the present invention for achieving the above object is an etch chamber (10) in which the etching process proceeds, and a monochromator (30) that passes only a specific wavelength for each process based on a pre-programmed set wavelength. ), A photo amplifier tube (PMT) 40 for converting the signal passing through the monochromator 30 into an electrical signal, and an amplifier for amplifying and outputting the signal passed through the photo amplifier tube 40. In the etching end point detecting device comprising a circuit 50 and a microcomputer 60 which receives the signal and detects the etching end point, the monochromator 30 has an input slit 31 into which an input wavelength is incident. ), The mirror 32 reflecting the wavelength incident through the input slit 31, the micrometer 35 for setting the detection wavelength in advance, and the wavelength passing through the micrometer 35 in sequence. Photo Amplifier Tube (40) And a grating and sine bar 26 for adjusting the angle of the mirror 33 by a value set in the micrometer 35 and a mirror 33 and 34 for transmitting to the micrometer 35. A stepping motor 70 for automatically setting the wavelength at 35, a motor controller 80 for driving the stepping motor 70, and a cifi oil for generating a control signal of the motor controller 80. 90), its operation and effects are as follows.

First, the wavelength generated during the etching process is incident through the input slit 31 and the incident wavelength is reflected through the mirror 32.

In this way, the wavelength reflected by the mirror 32 is sequentially influenced by the value set in the micrometer 35 and passes through the mirrors 33 and 34 in order to be transmitted to the photo-amplification tube tube 40.

That is, the angles of the mirrors 33 and 34 are adjusted by the grating / sine bar 36 on the basis of a value set in advance in the micrometer 35. At this time, the wavelength of the end of etching suitable for each process is set by the setting program. When input to the recipe (recipe), the CPI (90) controls the motor controller 80 to drive the stepping motor 70 to automatically adjust the wavelength set in the micrometer (35).

At this time, the set wavelength value of the monochromator 35 is set to 0.00 nm to 999 nm.

The photoelectric amplifier tube 40 that receives the signal passing through the monochromator 30 converts the received signal into an electrical signal, and amplifies it in the amplifier circuit 50 and inputs it to the microcomputer 60. .

Then, the microcomputer 60 detects the etching end point by the input electrical signal to control the entire system.

As such, if the wavelength to be detected is input to the recipe, automatic control is possible for each step of each process.

As described above, the present invention sets the wavelength of the etching end point suitable for each process in advance in the setting program and automatically adjusts the setting wavelength, thereby manually setting the setting wavelength of the micrometer 35 when detecting different wavelengths. There is an effect that can eliminate the inconvenience of adjustment and manual mistakes.

Claims (2)

An etching chamber through which an etching process is performed, a monochromator for passing only a specific wavelength suitable for each process based on a pre-programmed wavelength, and a photo amplifier tube for converting a signal passing through the monochromator into an electrical signal ( An etch end point detection device comprising a PMT), an amplifier circuit for amplifying and outputting a signal having passed through a photoelectric amplifier tube, and a microcomputer that receives the signal and detects an etch end point; The monochromator sequentially includes an input slit to which an input wavelength is incident, a mirror that reflects a wavelength incident through the input slit, a micrometer that presets a detection wavelength, and a wavelength that passes through the micrometer. A mirror delivered to the amplification tube tube, a grating and sine bar for adjusting the angle of the mirror by the value set in the micrometer, and a stepping motor for automatically setting the wavelength at the micrometer. And a motor controller for driving the stepping motor, and a CPI for generating a control signal of the motor controller. The apparatus of claim 1, wherein the set wavelength value of the monochromator is set to 0.00 nm to 999 nm.