JPH0586007B2 - - Google Patents

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Publication number
JPH0586007B2
JPH0586007B2 JP59212708A JP21270884A JPH0586007B2 JP H0586007 B2 JPH0586007 B2 JP H0586007B2 JP 59212708 A JP59212708 A JP 59212708A JP 21270884 A JP21270884 A JP 21270884A JP H0586007 B2 JPH0586007 B2 JP H0586007B2
Authority
JP
Japan
Prior art keywords
tin
copper
plating
contact
alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59212708A
Other languages
Japanese (ja)
Other versions
JPS6191394A (en
Inventor
Yasuhiro Arakida
Kazuhiko Fukamachi
Susumu Kawauchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP59212708A priority Critical patent/JPS6191394A/en
Publication of JPS6191394A publication Critical patent/JPS6191394A/en
Publication of JPH0586007B2 publication Critical patent/JPH0586007B2/ja
Granted legal-status Critical Current

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  • Other Surface Treatments For Metallic Materials (AREA)
  • Contacts (AREA)

Description

【発明の詳細な説明】 発明の分野 本発明は、Sn含有量が1wt%以上且つ3wt%未
満であり、P含有量が0.03wt%以上且つ0.35wt%
未満でありそして残部が銅と不可避的不純物から
成る低錫りん青銅を母材とし、これに錫あるいは
錫合金層をめつきして成る銅合金−錫系接触子特
にはこの系に固有の高温でのめつき層の剥離問題
を生せずしかも苛酷な条件下での使用中劣化を生
じないような接触子の製造方法に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention is characterized in that the Sn content is 1wt% or more and less than 3wt%, and the P content is 0.03wt% or more and 0.35wt%.
Copper alloy-tin-based contacts made of low-tin phosphor bronze, the balance of which is copper and unavoidable impurities, is plated with a tin or tin alloy layer. The present invention relates to a method for manufacturing a contact that does not cause the problem of peeling of the plated layer during use and does not deteriorate during use under severe conditions.

発明の背景 コネクタ、スイツチ等の回路接続用の接触子に
は、りん青銅、ベリリウム銅、チタン銅等のよう
にバネ性及び耐食性を増した銅合金を母材とし、
その上に接触抵抗を減少させるため表面接点用金
属として金或いは銀めつきを施して使用すること
が多いが、価格や量産性の点から民生用電子機器
において用いるには適切でない。そこで、民生用
電子機器においては表面接点用金属として廉価な
錫または錫合金をめつきした銅合金−錫系接触子
が現在主として用いられている。
Background of the Invention Contactors for circuit connections such as connectors and switches are made of copper alloys with increased springiness and corrosion resistance, such as phosphor bronze, beryllium copper, and titanium copper, as base materials.
Furthermore, in order to reduce contact resistance, gold or silver plating is often applied as a surface contact metal, but this is not suitable for use in consumer electronic equipment from the viewpoint of cost and mass production. Therefore, in consumer electronic devices, copper alloy-tin contacts plated with inexpensive tin or tin alloy are currently mainly used as surface contact metals.

電子機器の内部に接触子を組込んで使用する場
合、機器内部が通電による発熱のため100℃前後
に昇温するから、接触子はこのような比較的高温
に長時間曝されていることになる。加えて、電子
機器は機械的振動を受けることも多い。例えば、
自動車電装回路において多数の接触子が使用され
るが、これらは長期の振動下に置かれる。こうし
た使用環境下では、母材のクリープ強度が低下
し、例えばコネクタの雄雌接触圧が低下してコネ
クタの嵌合がゆるんだり、外れたりする事態が見
られる。更に、従来からの銅合金、特にりん青銅
母材は3%以上の錫を含んでいるため電気(熱)
伝導性が著しく悪いことも問題視されるようにな
つた。
When a contact is installed inside an electronic device, the temperature inside the device rises to around 100℃ due to the heat generated by electricity, so the contact is exposed to such relatively high temperatures for a long period of time. Become. Additionally, electronic devices are often subject to mechanical vibrations. for example,
A large number of contacts are used in automotive electrical circuits and are subjected to long-term vibrations. Under such usage environments, the creep strength of the base material decreases, and, for example, the male-female contact pressure of the connector decreases, causing the connector to become loosely fitted or come off. Furthermore, conventional copper alloys, especially phosphor bronze base materials, contain more than 3% tin, which makes them difficult to handle electricity (heat).
The extremely poor conductivity has also come to be seen as a problem.

こうした状況に鑑みて、充分の伝導性を確保し
つつ、振動および熱条件下で強度を保持しうる母
材合金の開発が必要である。
In view of these circumstances, it is necessary to develop a base alloy that can maintain strength under vibration and thermal conditions while ensuring sufficient conductivity.

更に、従来の接触子と関連する重要な問題とし
て、接触子を上記のような使用条件下で使用する
と錫あるいは錫合金めつき層が母材から剥離し、
接触不良となる欠点が認識されていた。めつき層
剥離問題を克服する対策もこれまで為されてきた
が、新たな母材合金の開発に伴つてそれに最適の
錫めつき層剥離防止方法の開発も併せて必要とさ
れる。
Furthermore, an important problem associated with conventional contacts is that when the contacts are used under the above conditions, the tin or tin alloy plating layer peels off from the base material.
The drawback of poor contact was recognized. Measures have been taken to overcome the problem of tin plating layer peeling, but with the development of new base metal alloys, it is also necessary to develop an optimal method for preventing tin plating layer peeling.

発明の概要 本発明者は、かかる現状に鑑み、上述したよう
な問題を排除した接触子を開発するべく鋭意研究
を行なつた結果、母材としてこれまで使用された
りん青銅(Sn含有量3〜10wt%、P含有量0.03
〜0.35wt%)よりSn含有量を低減した低錫りん
青銅の使用が良好な結果を与えること及び錫めつ
き層の剥離防止方法としてめつき層の加熱溶融
(リフロー)処理が有効であることを見出した。
錫含有量が1wt%以上且つ3wt%未満の低錫りん
青銅は、その錫含量の低減により従来より向上せ
る電気(熱)伝導性を示すと同時に振動、熱等の
加わる使用条件下で充分の強度を保持する母材を
与える。該母材上への錫あるいは錫合金めつきと
続いての加熱溶融処理は、剥離を生じない密着性
および加工性の良好な表面接点金属を与えると共
に低廉性をも維持する。
SUMMARY OF THE INVENTION In view of the current situation, the present inventor conducted intensive research to develop a contact that eliminates the above-mentioned problems, and found that phosphor bronze (with a Sn content of 3 ~10wt%, P content 0.03
The use of low-tin phosphor bronze with a Sn content lower than 0.35wt%) gives good results, and heat-melting (reflow) treatment of the tin-plated layer is effective as a method for preventing peeling of the tin-plated layer. I found out.
Low-tin phosphor bronze with a tin content of 1 wt% or more and less than 3 wt% exhibits improved electrical (thermal) conductivity compared to conventional ones due to its reduced tin content, and at the same time exhibits sufficient electrical (thermal) conductivity under usage conditions such as vibration and heat. Provides a base material that retains strength. The plating of tin or tin alloy onto the base material followed by heating and melting provides a surface contact metal with good adhesion and workability without peeling, and also maintains low cost.

斯くして、本発明は、錫含有量が1wt%以上且
つ3wt%未満であり、りん含有量が0.03wt%以上
且つ0.35wt%未満でありそして残部が銅及び不可
避的不純物から成る銅合金製母材に錫あるいは錫
合金を電気めつきし、続いて加熱溶融処理を行う
か、または錫あるいは錫合金を溶融めつきするこ
とを特徴とする接触子の製造方法を提供するもの
である。
Thus, the present invention provides a copper alloy having a tin content of 1 wt% or more and less than 3 wt%, a phosphorus content of 0.03 wt% or more and less than 0.35 wt%, and the balance consisting of copper and unavoidable impurities. The present invention provides a method for manufacturing a contact, which comprises electroplating tin or a tin alloy onto a base material, followed by heating and melting treatment, or melting and plating tin or a tin alloy.

発明の具体的説明 本発明においては、該銅合金の条、シート等に
めつきおよび加熱溶融処理した後接触子に成型す
るのが通例であるが、該銅合金を接触子に成型し
た後にめつきおよび加熱溶融処理することも妨げ
るものでない。ここでは前者に基いて説明する。
DETAILED DESCRIPTION OF THE INVENTION In the present invention, it is customary to plate and heat melt a strip, sheet, etc. of the copper alloy and then mold it into a contact. There is no hindrance to applying heat-melting and heat-melting treatments. Here, the explanation will be based on the former.

本発明において使用される銅合金条は、Sn含
有量が1wt%以上且つ3wt%未満であり、P含有
量が0.03wt%以上且つ0.35wt%未満でありそして
残部が銅と不可避的不純物から成る銅合金であ
る。好ましい組成は、1.7〜2.3wt%Sn及び0.03〜
0.2wt%Pを含むものである。これは、一般にり
ん青銅と呼称されるものよりSn含有量が少ない
ことを特徴とし、ここでは低錫りん青銅と呼ばれ
る。一般りん青銅はこれまで単にバネ性および耐
食性がよいことだけを理由に深い検討を加えるこ
となく母材の一つとして採用されていたのである
が、接触子、特に自動車電装用接触子の母材とし
ては低錫りん青銅の方が電気(熱)伝導性が良い
(IACS値30%以上)点で接触子母材として優れて
いる。
The copper alloy strip used in the present invention has a Sn content of 1 wt% or more and less than 3 wt%, a P content of 0.03 wt% or more and less than 0.35 wt%, and the balance consists of copper and inevitable impurities. It is a copper alloy. The preferred composition is 1.7~2.3wt%Sn and 0.03~
It contains 0.2wt%P. This is characterized by a lower Sn content than what is commonly referred to as phosphor bronze, and is referred to here as low tin phosphor bronze. Until now, general phosphor bronze had been used as a base material for contacts, especially contacts for automotive electrical equipment, but it had been used as a base material without any deep consideration simply because of its good springiness and corrosion resistance. As such, low-tin phosphor bronze is superior as a contact base material because it has better electrical (thermal) conductivity (IACS value of 30% or more).

この銅合金条は、アルカリ脱脂、電解脱脂、酸
洗、水洗等の所定の浄化処理を公知の態様で施さ
れた後、銅下地めつきをせずに、直接錫あるいは
錫合金めつきを施される。従来、めつき層剥離防
止対策の一つとして銅下地めつきが為されること
が多かつたが、本発明においては不要であり、か
えつて有害である。
This copper alloy strip is subjected to predetermined purification treatments such as alkaline degreasing, electrolytic degreasing, pickling, and water washing in a known manner, and then directly plated with tin or tin alloy without being plated with a copper undercoat. be done. Conventionally, copper underplating has often been used as a measure to prevent peeling of the plating layer, but this is unnecessary in the present invention and is even harmful.

錫あるいは錫合金のめつきは電解めつきおよび
無電解めつき或いは溶融めつきのいずれでも実施
することができる。錫合金としては一般にはんだ
材料として知られる鉛、ビスマス、カドミニウ
ム、アンチモン、インジウム、アルミニウム、亜
鉛等を一種以上含むものを包括するものである。
めつき条件は従来と変ることはない。電解めつき
浴としては、錫酸カリウム、錫酸ナトリウム、塩
化第一錫等を使用してのアルカリ浴、しゆう酸塩
浴、ホウフツ化浴、硫酸塩浴、フエノールスルホ
ン酸浴等がいずれも使用できる。溶融めつきは、
所定のフラツクス水溶液(ZnCl2の40°Beの水溶
液)に1〜2秒間浸漬後溶融めつき槽に10秒程度
浸漬しエアーブローによりめつき層の厚さを適宜
調整する所謂溶融めつきが代表的である。フラツ
クス水溶液への浸漬の代りに、フラツクスを溶融
めつき層に浮上させ、そのフラツクス層を通して
溶融めつき層に浸けるようにすることもできる。
Plating of tin or a tin alloy can be carried out by electrolytic plating, electroless plating or hot-dip plating. The tin alloy includes those containing one or more of lead, bismuth, cadmium, antimony, indium, aluminum, zinc, etc., which are generally known as solder materials.
The plating conditions remain the same as before. Examples of electrolytic plating baths include alkaline baths using potassium stannate, sodium stannate, stannous chloride, etc., oxalate baths, borofusate baths, sulfate baths, and phenolsulfonic acid baths. Can be used. Melt plating is
The typical method is so-called hot-dip plating, in which the product is immersed in a predetermined flux aqueous solution (40°Be aqueous solution of ZnCl 2 ) for 1 to 2 seconds, then immersed in a hot-dip plating bath for about 10 seconds, and the thickness of the plating layer is adjusted appropriately by air blowing. It is true. Instead of dipping into an aqueous flux solution, the flux may be floated onto the melted layer and immersed through the flux layer into the melted layer.

こうして、錫あるいは錫合金でめつきされた該
銅合金条は続いて加熱溶融処理を受ける。加熱溶
融処理はリフロー処理とも呼ばれるもので、バー
ナー直下型炉、エレマ炉等の加熱炉において材料
温度を錫の融点すなわち231℃以上500〜800℃で
3〜20秒の適宜の時間加熱することによつて行わ
れる。この処理によつて錫あるいは錫合金層の再
溶融と流動化が起る。但し溶融めつきしたものに
ついては再溶融は特に行なう必要はない。
The copper alloy strip plated with tin or tin alloy is then subjected to a heat melting process. Heat-melting treatment is also called reflow treatment, and involves heating the material at a temperature of 500 to 800 degrees Celsius above the melting point of tin, that is, 231 degrees Celsius, for an appropriate period of 3 to 20 seconds in a heating furnace such as a direct-burner furnace or an Elema furnace. It is done by folding. This treatment causes remelting and fluidization of the tin or tin alloy layer. However, it is not necessary to re-melt the melted material.

本発明に従つて作製された接触子は高温下での
使用中にもめつき層の剥離を生じない。例えば、
105℃、150℃、180℃の温度で600時間保持した後
90°曲げ剥離試験を行つても剥離は全く生じない。
更に、自動車電装回路にコネクタとして組込んで
の実際試験においても、接触圧の低下は生ぜず、
きわめて良好な導電性能を発揮した。
Contacts made in accordance with the present invention do not suffer from peeling of the plating layer during use at high temperatures. for example,
After holding at temperature of 105℃, 150℃, 180℃ for 600 hours
Even when a 90° bending peel test is performed, no peeling occurs at all.
Furthermore, even in actual tests where it was incorporated into an automobile electrical circuit as a connector, there was no drop in contact pressure.
It exhibited extremely good conductive performance.

発明の効果 本発明は、熱、振動等の苛酷な条件で使用され
る接触子として長期故障を生じないしかもきわめ
て良好な接触機能を果す接触子およびその製造方
法を提供するものである。
Effects of the Invention The present invention provides a contact which is used under severe conditions such as heat and vibration, and which does not cause long-term failure and which performs an extremely good contact function, and a method for manufacturing the same.

実施例 1 組成:2wt%Sn、0.1wt%P、残部Cuの銅合金
条を、アルカリ脱脂、電解脱脂、そして酸洗
中和後、銅下地なしで硫酸錫浴で1.0μの電解
錫めつきを行つた。
Example 1 A copper alloy strip with a composition of 2 wt% Sn, 0.1 wt% P, and the balance Cu was subjected to alkaline degreasing, electrolytic degreasing, and pickling neutralization, followed by 1.0 μ electrolytic tin plating in a tin sulfate bath without a copper base. I went to

クレゾールスルホン酸浴ならびにめつき条件は
下記の通りである。
The cresol sulfonic acid bath and plating conditions are as follows.

クレゾールスルホン酸浴:硫酸第1錫 55g/ 硫酸 100g/ クレゾールスルホン酸
100g/ ゼラチン 2g/ ベータナフトール
1g/ 浴 温:25℃ 電流密度:3A/dm2 こうして錫めつきされた条を小型マツフル加熱
炉において650℃に5秒間保持した後、70℃に冷
却し湯洗後熱風乾燥した。その後、この条を接触
子の形状に成型した。こうして作製された接触子
を105℃、150℃、180℃において600時間大気加熱
した後、90°曲げによる剥離試験を行つたが、め
つき層の剥離は全く認められなかつた。
Cresol sulfonic acid bath: stannous sulfate 55g/sulfuric acid 100g/cresol sulfonic acid
100g/gelatin 2g/beta-naphthol
1 g/Bath Temperature: 25°C Current Density: 3A/dm 2 The thus tinned strip was held at 650°C for 5 seconds in a small Matsufuru heating furnace, then cooled to 70°C, washed with hot water, and dried with hot air. This strip was then molded into the shape of a contact. After the contacts thus produced were heated in the atmosphere at 105°C, 150°C, and 180°C for 600 hours, a peel test was performed by bending at 90°, but no peeling of the plating layer was observed.

比較例 1 実施例1の資料に加熱溶融処理を施さずに接触
子を作製した。これを105℃において360時間保持
後剥離試験をしたところめつき層の剥離が生じ
た。
Comparative Example 1 A contact was produced using the material of Example 1 without subjecting it to heat-melting treatment. When this was held at 105° C. for 360 hours and then subjected to a peel test, the plated layer peeled off.

参考例 1 銅下地めつきを下記の硫酸浴を使用して行つた
以外は実施例1と同等にして接触子を作製した。
Reference Example 1 A contact was produced in the same manner as in Example 1 except that the copper undercoat was plated using the sulfuric acid bath described below.

硫酸銅浴 硫酸銅 210g/ 硫 酸 100g/ 浴 温 30℃ 電流密度 5A/dm2 剥離試験の結果錫めつき層の剥離が生じた。本
発明において銅下地めつきは有害である。
Copper sulfate bath Copper sulfate 210g/sulfuric acid 100g/bath temperature 30°C current density 5A/dm As a result of the 2 peel test, the tinned layer peeled off. Copper underplating is detrimental in this invention.

実施例 2 実施例1と同じ鋼合金条をアルカリ脱脂、電解
脱脂そして酸洗中和後フエノールスルホン酸浴で
半田めつきした。めつき浴組成および条件は次の
通りとした。
Example 2 The same steel alloy strip as in Example 1 was subjected to alkaline degreasing, electrolytic degreasing, pickling and neutralization, and then solder plating in a phenolsulfonic acid bath. The plating bath composition and conditions were as follows.

フエノールスルホン酸第1錫 160g/ フエノールスルホン酸鉛 160g/ フエノールスルホン酸 150g/ 浴 温 30℃ 電流密度 3A/dm2 その後エレマ炉において650℃で20秒間加熱後
放冷した。得られためつき材を接触子に成型し、
105℃、150℃、180℃において600時間保持後90℃
曲げ剥離試験を行つたが、いずれも半田めつき層
の剥離を生じなかつた。
Stannous phenolsulfonate 160g/Lead phenolsulfonate 160g/Phenolsulfonic acid 150g/Bath temperature 30°C Current density 3A/ dm2Then , the mixture was heated in an Elema furnace at 650°C for 20 seconds and allowed to cool. The obtained mating material is molded into a contact,
90℃ after 600 hours at 105℃, 150℃, 180℃
A bending peel test was conducted, but no peeling of the solder plated layer occurred in any case.

実施例 3 実施例1と同じ鋼合金条をアルカリ脱脂、電解
脱脂そして酸洗中和後水洗して、40°Be塩化亜鉛
水溶液のフラツクスを塗布後320℃における浴温
の溶融錫に浸漬して2μの厚さの錫めつきを施し
た。
Example 3 The same steel alloy strip as in Example 1 was alkaline degreased, electrolytically degreased, pickled, neutralized, washed with water, coated with a flux of 40°Be zinc chloride aqueous solution, and immersed in molten tin at a bath temperature of 320°C. Tin plating is applied to a thickness of 2μ.

その後、接触子に成型後105℃において600時間
保持した後、剥離試験をしたがめつき層の剥離は
いずれも認められなかつた。
Thereafter, after molding into a contact and holding it at 105°C for 600 hours, a peel test was performed, and no peeling of the plating layer was observed.

Claims (1)

【特許請求の範囲】 1 錫含有量が1wt%以上且つ3wt%未満であり、
りん含有量が0.03wt%以上且つ0.35wt%未満であ
りそして残部が銅及び不可避的不純物から成る銅
合金製母材に錫あるいは錫合金を電気めつきし、
続いて加熱溶融処理を行うことを特徴とする接触
子の製造方法。 2 錫含有量が1wt%以上且つ3wt%未満であり、
りん含有量が0.03wt%以上且つ0.35wt%未満であ
りそして残部が銅及び不可避的不純物から成る銅
合金製母材に錫あるいは錫合金を溶融めつきする
ことを特徴とする接触子の製造方法。
[Claims] 1. The tin content is 1wt% or more and less than 3wt%,
Electroplating tin or a tin alloy on a copper alloy base material with a phosphorus content of 0.03 wt% or more and less than 0.35 wt%, and the balance consisting of copper and unavoidable impurities,
A method for manufacturing a contact, the method comprising subsequently performing a heating and melting process. 2 The tin content is 1wt% or more and less than 3wt%,
A method for producing a contact, characterized by melt-plating tin or a tin alloy onto a copper alloy base material having a phosphorus content of 0.03 wt% or more and less than 0.35 wt%, the remainder consisting of copper and unavoidable impurities. .
JP59212708A 1984-10-12 1984-10-12 Contact maker and its manufacture Granted JPS6191394A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59212708A JPS6191394A (en) 1984-10-12 1984-10-12 Contact maker and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59212708A JPS6191394A (en) 1984-10-12 1984-10-12 Contact maker and its manufacture

Publications (2)

Publication Number Publication Date
JPS6191394A JPS6191394A (en) 1986-05-09
JPH0586007B2 true JPH0586007B2 (en) 1993-12-09

Family

ID=16627112

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59212708A Granted JPS6191394A (en) 1984-10-12 1984-10-12 Contact maker and its manufacture

Country Status (1)

Country Link
JP (1) JPS6191394A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61186496A (en) * 1985-02-13 1986-08-20 Nippon Mining Co Ltd Contact
DE4005836C2 (en) * 1990-02-23 1999-10-28 Stolberger Metallwerke Gmbh Electrical connector pair
US5849424A (en) * 1996-05-15 1998-12-15 Dowa Mining Co., Ltd. Hard coated copper alloys, process for production thereof and connector terminals made therefrom
KR100392528B1 (en) 1998-09-11 2003-07-23 닛코 킨조쿠 가부시키가이샤 Metallic material, process of manufacture thereof, and terminal and connector using the metallic material

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS501366A (en) * 1973-05-11 1975-01-08
JPS5550489A (en) * 1978-10-11 1980-04-12 Furukawa Electric Co Ltd:The Continuous production of tin plated strip material

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS501366A (en) * 1973-05-11 1975-01-08
JPS5550489A (en) * 1978-10-11 1980-04-12 Furukawa Electric Co Ltd:The Continuous production of tin plated strip material

Also Published As

Publication number Publication date
JPS6191394A (en) 1986-05-09

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