JPH0585717A - Production of silica hydrosol without gelatification precipitation and device for water processing - Google Patents
Production of silica hydrosol without gelatification precipitation and device for water processingInfo
- Publication number
- JPH0585717A JPH0585717A JP12820991A JP12820991A JPH0585717A JP H0585717 A JPH0585717 A JP H0585717A JP 12820991 A JP12820991 A JP 12820991A JP 12820991 A JP12820991 A JP 12820991A JP H0585717 A JPH0585717 A JP H0585717A
- Authority
- JP
- Japan
- Prior art keywords
- water
- silicic acid
- hydrogen
- proton
- electrons
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Silicon Compounds (AREA)
- Physical Water Treatments (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】この発明はゲル化沈殿しない珪酸
ヒドロゾルの製造方法に係り、特に珪酸コロイド分子の
周囲に水素陽子を回遊させることによって珪酸コロイド
分子の凝集ゲル化、沈殿を防止する珪酸ヒドロゾルの製
造方法並びに水処理装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a silicic acid hydrosol which does not cause gelation and precipitation, and more particularly, a silicic acid hydrosol for preventing cohesive gelation and precipitation of silicic acid colloid molecules by causing hydrogen protons to migrate around the silicic acid colloid molecules. And a water treatment device.
【0002】[0002]
【従来の技術】従来、珪酸ゾルの製造方法としては珪酸
ナトリウム水溶液に硫酸を混合したり、四塩化珪素を水
に加えて混合する等の方法が知られており、消臭液、繊
維加工用、ワックス用等に使用されている。また市販品
としては日産化学工業のスノーテックス、ジュポン社の
ルドックス、モンサント化学のシトン、ナルコ社のナル
コAGなどが知られており、SiO2の濃度は15〜5
0%、粒子径は7〜40mμ、pHは3.0〜4.0の
酸性のものと8.0〜9.5のアルカリ性のものとがあ
る。2. Description of the Related Art Conventionally, as a method for producing a silicic acid sol, a method of mixing sulfuric acid with an aqueous solution of sodium silicate or adding silicon tetrachloride to water and mixing is known. Used for wax, etc. Further, as commercially available products, Snowtex manufactured by Nissan Chemical Industry, Ludox manufactured by Jupon, Siton manufactured by Monsanto Chemical, Nalco AG manufactured by Nalco, etc. are known, and the concentration of SiO 2 is 15 to 5.
0%, particle size 7 to 40 mμ, pH 3.0 to 4.0, and acidic pH 8.0 to 9.5.
【0003】[0003]
【発明が解決しようとする課題】珪酸ヒドロゾルの最大
の欠点は、経時的にゲル化が進み沈殿が生じる点で、品
質の安定に難点があった。このゲル化の原因の一つは珪
酸ヒドロゾルに含まれている塩がシロキサン結合を助長
するためである。ところが、珪酸ゾルの製法上でナトリ
ウム塩、アルミニウム塩を完全に除去することは技術的
に不可能とされていて、前記市販の珪酸ゾル中にもNa
2Oは0.02ないし0.32%も含まれている。この
ことから他の物質を添加すると一層ゲル化が生じる。こ
のような実状に鑑み、この発明は水の中の水素原子から
電子を放出させた水を珪酸ゾルに添加して、水素陽子を
珪酸コロイド粒子間に回遊させることによって珪酸コロ
イド粒子間の反発を電子的に生じさせてゲル化沈殿を防
止させることに成功しこの発明をするに至り、長期間保
存していてもゲル化沈殿しない珪酸ヒドロゾルの製造方
法並びに水処理装置を提供することを目的として開発さ
れたものである。The greatest drawback of the silicic acid hydrosol is that gelation progresses over time and precipitation occurs, which is a problem in stabilizing the quality. One of the causes of this gelation is that the salt contained in the silicic acid hydrosol promotes the siloxane bond. However, it is technically impossible to completely remove the sodium salt and the aluminum salt in the production process of the silicic acid sol.
2 O is contained in an amount of 0.02 to 0.32%. Therefore, when other substances are added, further gelation occurs. In view of such an actual situation, the present invention adds water to which electrons have been released from hydrogen atoms in water to a silicic acid sol, and causes hydrogen protons to migrate between the silicic acid colloidal particles to cause repulsion between the silicic acid colloidal particles. With the aim of providing a method for producing a silicic acid hydrosol and a water treatment apparatus which have been successfully produced by electronically preventing gelation precipitation and have reached the present invention, gelation precipitation does not occur even when stored for a long period of time. It was developed.
【0004】[0004]
【課題を解決するための手段】この発明は前記課題を解
決し目的を達成するために、水に強いエネルギーをかけ
て水の水素原子から電子を放出させて陽子濃度2.5〜
4pHの水素陽子高濃度水を造る工程と該工程により得
た水素陽子高濃度水を珪酸ゾルに添加して珪酸コロイド
粒子の周囲に水素陽子を回遊させる工程の結合から成る
ゲル化沈殿しない珪酸ヒドロゾルの製造方法という技術
的な手段を講じた。前記珪酸ゾルはSiO2として15
〜60重量%、好ましくは20重量%前後の酸性珪酸ゾ
ルを使用し、市販品では前記スノーテックスO(pH
3.0〜4.0,SiO2 20〜21%,粒子径10〜
20mμ)の使用が好ましい。前記水の水素原子から電
子を放出させるためにエネルギーを付加する手段として
は、(イ)水に電場を与える、(ロ)紫外線を水に照射
する、(ハ)水に陰電圧をかける、の3方法がある。前
記水素原子は、核である陽子に一つの電子が引力を受け
て付いている。酸素原子は核である陽子に8個の電子が
引力を受けて付いている。水の分子は水素の電子が酸素
の陽子に結合している。この発明においては水の水素原
子に外方からエネルギーを与えることによって水素陽子
の引力を打ち消して電子を引き離し放出させるものであ
る。In order to solve the above-mentioned problems and to achieve the object, the present invention applies strong energy to water to emit electrons from hydrogen atoms of water to obtain a proton concentration of 2.5 to
Silica hydrosol which does not cause gelation and precipitation, which is composed of a step of producing a 4 proton-concentrated water having a pH of 4 and a step of adding the hydrogen proton-concentrated water obtained by the step to a silicate sol to cause the hydrogen protons to migrate around the silicic acid colloid particles. The technical means of manufacturing method was taken. The silicic acid sol has a SiO 2 content of 15
-60 wt%, preferably around 20 wt% of acidic silicic acid sol is used.
3.0-4.0, SiO 2 20-21%, particle size 10
The use of 20 mμ) is preferred. The means for adding energy to release electrons from the hydrogen atoms of the water include (a) applying an electric field to the water, (b) irradiating the water with ultraviolet rays, and (c) applying a negative voltage to the water. There are 3 methods. In the hydrogen atom, one electron is attached to a nucleus, which is a proton, by attraction. Eight electrons are attached to the nucleus, which is an oxygen atom, by the attraction of electrons. In the water molecule, hydrogen electrons are bound to oxygen protons. In the present invention, by externally applying energy to the hydrogen atoms of water, the attractive force of the hydrogen protons is canceled and the electrons are separated and released.
【0005】また水処理装置としては、(1)中空鉄心
に導水管と排水管を連設すると共に、該中空鉄心の外周
部に電磁コイルを装着した水処理装置、(2)有底筒体
に導水管と排水管を連設すると共に該有底筒体の上部に
紫外線光源を配設した水処理装置という手段を講じた。As the water treatment device, (1) a water treatment device in which a water guiding pipe and a drain pipe are connected to a hollow core and an electromagnetic coil is attached to an outer peripheral portion of the hollow core, (2) a bottomed cylindrical body A means called a water treatment device is provided in which a water pipe and a drain pipe are connected to each other and an ultraviolet light source is arranged above the bottomed cylindrical body.
【0006】[0006]
【作用】上記構成のこの発明において水の分子に外部か
ら強いエネルギーを与えることによって水素原子から電
子を放出させることができる。このことによって酸素に
電子を介して結合されていた水素の陽子が水の分子から
遊離状に存在することになる。すなわち水素陽子高濃度
水となる。該水素陽子高濃度水を一定の割合で珪酸ゾル
に添加混合させると、電気的に不安定な水素陽子は珪酸
コロイド分子から電子を取り込もうとして珪酸コロイド
分子の周囲を回遊し始める。このことから水素陽子同士
が互いに牽制し合うため珪酸コロイド分子間で反発が生
じて凝集が生じにくくなり、ゲル化が防止される。In the present invention having the above-mentioned structure, electrons can be emitted from hydrogen atoms by applying strong energy to water molecules from the outside. As a result, the protons of hydrogen, which have been bound to oxygen via electrons, exist in a free state from the water molecules. That is, it becomes high-concentration hydrogen proton water. When the hydrogen-proton high-concentration water is added to and mixed with the silicic acid sol at a constant ratio, the electrically unstable hydrogen protons start to migrate around the silicic acid colloid molecules in an attempt to take in electrons from the silicic acid colloid molecules. As a result, hydrogen protons restrain each other, so that repulsion occurs between the silicic acid colloid molecules and aggregation does not easily occur, and gelation is prevented.
【0007】また水処理装置として、電場を利用する装
置は中空鉄心の中に水を通して電磁コイルに通電すると
中空鉄心内に強い電場(電界)が生じ、該電場のエネル
ギーを得た水の分子の水素の電子は水素陽子の引力に打
ち勝って分離し、放出されるため、水素陽子高濃度水が
得られる。また紫外線を利用する装置においては、水の
分子の水素の電子が紫外線エネルギーを吸収して水素陽
子の引力に打ち勝って分離、放出されるので水素陽子高
濃度水が得られる。Further, as a water treatment device, a device utilizing an electric field generates a strong electric field (electric field) in the hollow core when water is passed through the hollow iron core to energize an electromagnetic coil. Hydrogen electrons overcome the attractive force of hydrogen protons, are separated, and are released, so that high-concentration hydrogen proton water is obtained. Further, in an apparatus utilizing ultraviolet rays, hydrogen electrons of water molecules absorb ultraviolet energy and overcome the attractive force of hydrogen protons to be separated and released, so that high concentration hydrogen proton water is obtained.
【0008】[0008]
【実施例】この発明の実施例を図面に基づいて説明す
る。図1は水の水素原子の概念的模式図で、水素陽子の
周りに1個の電子が引力により結合している。図2は酸
素原子の概念的模式図で、酸素陽子の周りに8個の電子
が引力により結合している。図3は水の分子の概念的模
式図で、水素原子が電子部分を酸素原子の引力により吸
着結合されている。図4は珪酸の概念的模式図で、珪素
の陽子の周囲には14個の電子が結合し、酸素の周囲に
は8個の電子が結合している。この発明で使用する水は
一般の水道水や蒸留水でよいが、塩素が入っている場合
はあらかじめ公知の脱塩素処理を行なう。Embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a conceptual schematic diagram of a hydrogen atom in water, in which one electron is bound by attractive force around a hydrogen proton. FIG. 2 is a conceptual schematic diagram of an oxygen atom, in which eight electrons are bound to each other around an oxygen proton by attractive force. FIG. 3 is a conceptual schematic diagram of a water molecule in which hydrogen atoms are adsorbed and bonded to the electronic part by the attractive force of oxygen atoms. FIG. 4 is a conceptual schematic diagram of silicic acid, in which 14 electrons are bound around the silicon proton and 8 electrons are bound around the oxygen. The water used in the present invention may be ordinary tap water or distilled water, but when chlorine is contained, a known dechlorination treatment is performed in advance.
【0009】前記エネルギー源として電場を水に与える
方法として、図5に示すように処理装置1の中空鉄心2
の周囲に電磁コイル3を装着して電磁コイル3に100
Vの電圧を付加すると中空鉄心2の中央部に電磁場が形
成される。したがって、この中空鉄心2の中へ水道管4
から注水すると中空鉄心3の中の水に電場が作用し、水
の分子を構成する水素原子から電子が放出される。この
処理された水を濾過槽5に入れて電子を除去する。該濾
過槽5は鉄製で、中に電子を通す濾過膜(セラミック)
5Aが仕切状に配設されていて1室に1.8V,0.5
アンペアの陽電極5Bが配設されている。該陽電極5B
に通電すると電子は濾過膜5Aを通過して陽電極5B側
へと移動するので、電子を効率良く除去することができ
る。このようにして、処理した水素陽子高濃度水は水素
陽子濃度が2.5〜4pHの範囲で取り出す。この濃度
は処理時の水の流量調節によって容易に調節することが
できる。標準的には容量1リットル程度の鉄心内を流量
毎分0.1リットル程度である。このようにして電子放
出処理をした水は、水の分子(図3)中の水素原子(図
1)が電子を失って水素陽子が酸素原子から分離され
る。この場合の水は水の分子(H2O)の他に水素陽子
が混在した形で存在する。この水素陽子高濃度水を市販
の珪酸ゾル(スノーテックスO=日産化学工業製。Si
O2濃度20重量%,pH3.5,Fe15ppm,Al2
O3233ppm,Cl 5ppm,粒径12.8mμ,水分8
0%)に添加混合させて珪酸ヒドロゾルを造成した。こ
の場合、珪酸ゾル100部に対して、これに添加する水
素陽子高濃度水の量を10部、30部、50部、70
部、100部の5種類とし、更に水素陽子濃度を2.
5,3.2,4の3種類としてそれぞれゲル化耐久日数
を比較したものが図6に示すグラフである。この図でも
判るように、添加量の多い方が略比例的に耐久性が優れ
ている。これに対して珪酸ゾルに普通の蒸留水を添加し
た場合のゲル化耐久性を図7で示す。このグラフによれ
ば、10日でゲル化が生じており、最良の場合でもやっ
と33日の耐久性しか認められないから、300日以上
の耐久性があるこの発明方法はゲル化防止に著しい効果
があることが認められる。これは、電子を失った水素陽
子が、珪酸コロイド分子から電子を取り込もうとして珪
酸コロイド分子(図4)の周囲を回遊するためで、水素
陽子同士が互いに近づくことを牽制し合い、そのことか
ら珪酸コロイド分子間で反発が生じて凝集しなくなるも
のである。As a method of applying an electric field to water as the energy source, as shown in FIG. 5, the hollow iron core 2 of the processing apparatus 1 is used.
Attach the electromagnetic coil 3 around the
When a voltage of V is applied, an electromagnetic field is formed in the central part of the hollow core 2. Therefore, the water pipe 4 is inserted into the hollow core 2.
When water is poured from the inside, an electric field acts on the water in the hollow iron core 3, and electrons are emitted from the hydrogen atoms constituting the water molecules. The treated water is put into the filtration tank 5 to remove electrons. The filtration tank 5 is made of iron, and a filtration membrane (ceramic) through which electrons pass
5A are arranged in a partition and 1.8V, 0.5 in one chamber
An amp positive electrode 5B is provided. The positive electrode 5B
When electricity is applied to the electrons, the electrons pass through the filtration membrane 5A and move to the positive electrode 5B side, so that the electrons can be efficiently removed. In this way, the treated hydrogen proton-enriched water is taken out in the hydrogen proton concentration range of 2.5 to 4 pH. This concentration can be easily adjusted by adjusting the flow rate of water during treatment. As a standard, the flow rate in an iron core having a capacity of about 1 liter is about 0.1 liter per minute. In the water thus subjected to the electron emission treatment, hydrogen atoms (FIG. 1) in the water molecules (FIG. 3) lose electrons and hydrogen protons are separated from oxygen atoms. In this case, water exists in a form in which hydrogen protons are mixed with water molecules (H 2 O). Commercially available silicic acid sol (Snowtex O = manufactured by Nissan Chemical Industry. Si
O 2 concentration 20% by weight, pH 3.5, Fe 15 ppm, Al 2
O 3 233ppm, Cl 5ppm, particle size 12.8mμ, moisture 8
0%) was added and mixed to form a silicic acid hydrosol. In this case, the amount of hydrogen-proton high-concentration water added to 100 parts of silicic acid sol was 10, 30, 50, 70 parts.
And 100 parts, and the hydrogen proton concentration is 2.
The graph shown in FIG. 6 is a comparison of the gelling endurance days for each of the three types, 5, 3.2 and 4. As can be seen from this figure, the larger the amount added, the more nearly proportionally the durability is excellent. On the other hand, FIG. 7 shows gelation durability when ordinary distilled water is added to silicic acid sol. According to this graph, gelation occurs in 10 days, and only the durability of 33 days is finally recognized even in the best case. Therefore, the method of the present invention having a durability of 300 days or more is significantly effective in preventing gelation. It is recognized that there is. This is because the hydrogen protons that have lost electrons migrate around the silicic acid colloid molecules (Fig. 4) in an attempt to take in the electrons from the silicic acid colloid molecules, and the hydrogen protons restrain each other from approaching each other. The silicic acid colloid molecules repel each other and do not aggregate.
【0010】前記エネルギー源として紫外線を利用する
場合は公知の紫外線電球(ブラックライト)を使用し
た。紫外線は3000Å付近より長波長側を近紫外線、
2000Å付近より短波長側を極端紫外線(真空領域の
紫外線ともいう)といい、紫外線を吸収した物質は解離
または電離現象(光電効果)を生じ、電子が放出され
る。水の場合極端紫外線を照射するとこれを吸収し、電
子が放出される。具体的には、図8に示すように、処理
装置1の筒体6内壁に反射層6Bを形成して、上部に紫
外線光源(ブラックライト,波長2000Å、100
W)7が配設されている。符号6Aはフィルタである。
水道管4から水を筒体6内に注入して紫外線を照射させ
ると、反射層6Bに反射して紫外線が有効に利用でき
る。筒体6内の水の流量毎分0.3リットル前後で水素
陽子濃度3.5pH程度を得ることができる。この濃度
調節は筒体6容量及び、バルブ4A調節による流量調整
により調節することができる。前記エネルギー源として
他にアーク灯,トリウム電球,せん光電球,石英水銀
灯,水中火花放電,水素放電灯,キセノン放電灯,ヘリ
ウム放電灯,ライマン火花放電等がある。この処理装置
において紫外線の波長を2800〜2540Åとすると
殺菌消毒に利用することができ、養魚、水栽培用水に利
用することができる。When ultraviolet rays are used as the energy source, a known ultraviolet light bulb (black light) is used. UV rays are near UV rays on the longer wavelength side than around 3000 Å,
The short wavelength side from around 2000 Å is called extreme ultraviolet (also referred to as ultraviolet in a vacuum region), and a substance that absorbs ultraviolet causes dissociation or ionization phenomenon (photoelectric effect), and electrons are emitted. In the case of water, when it is irradiated with extreme ultraviolet rays, they are absorbed and electrons are emitted. Specifically, as shown in FIG. 8, a reflective layer 6B is formed on the inner wall of the cylindrical body 6 of the processing apparatus 1, and an ultraviolet light source (black light, wavelength 2000Å, 100
W) 7 is provided. Reference numeral 6A is a filter.
When water is injected into the tubular body 6 from the water pipe 4 and irradiated with ultraviolet rays, the ultraviolet rays are reflected by the reflection layer 6B and the ultraviolet rays can be effectively used. A hydrogen proton concentration of about 3.5 pH can be obtained at a flow rate of water of about 0.3 liters per minute in the cylindrical body 6. The concentration can be adjusted by adjusting the capacity of the cylinder 6 and the flow rate by adjusting the valve 4A. Other energy sources include arc lamps, thorium lamps, flash lamps, quartz mercury lamps, underwater spark discharges, hydrogen discharge lamps, xenon discharge lamps, helium discharge lamps and Lyman spark discharges. When the wavelength of ultraviolet rays is set to 2800 to 2540Å in this processing device, it can be used for sterilization and disinfection, and can be used for fish farming and water for hydroponics.
【0011】図9は陰電圧を水に付加する処理装置1を
示す。処理槽8は鉄製で、陰電極8Aが接続されてい
る。処理槽8内に電子を透過させる透析筒(セラミッ
ク)9が内装され、該透析筒9内に陽電極10が配設さ
れている。両電極に直流2Vの電圧をかけると、陰電圧
のかかった水の水素原子から電子が放出され、陽電極1
0に引かれて電子は透析筒9内へと移動する。また透析
筒9内の水素陽子が陰電極に引かれて透析筒9外に移動
する。これによって処理槽8から取り出す水は水素陽子
高濃度水となる。その水素陽子濃度は処理槽の流量毎分
0.1リットル前後でpH3.5前後となり、流量の調
節によって濃度調節をすることができる。FIG. 9 shows a treatment device 1 for applying a negative voltage to water. The processing tank 8 is made of iron, and the negative electrode 8A is connected to it. A dialysis cylinder (ceramic) 9 that allows electrons to pass through is installed inside the treatment tank 8, and a positive electrode 10 is disposed in the dialysis cylinder 9. When a DC voltage of 2 V is applied to both electrodes, electrons are emitted from the hydrogen atoms of the negatively charged water, and the positive electrode 1
The electrons are attracted to 0 and move into the dialysis cylinder 9. Further, hydrogen protons in the dialysis cylinder 9 are attracted to the negative electrode and move to the outside of the dialysis cylinder 9. As a result, the water taken out from the treatment tank 8 becomes hydrogen proton high-concentration water. The hydrogen proton concentration becomes around pH 3.5 at a flow rate of about 0.1 liter per minute in the treatment tank, and the concentration can be adjusted by adjusting the flow rate.
【0012】以上説明したように、水に強いエネルギー
を与えて水素原子から電子を放出させる手段は実用上で
使いやすいものを選択すればよく、水素陽子濃度は2.
5〜4pHの範囲なら良好な効果を上げることができ
る。またSiO2として20%を含む市販の珪酸ゾルに
対する水素陽子高濃度水の添加量も10%〜100%の
範囲で良好な効果を上げることができるが、市販の珪酸
ゾルに含まれている塩を中和させる以上に必要なので、
50%〜100%が好ましい。このようにして造られる
珪酸ヒドロゾルは外的に塩を添加しない限り、著しく耐
久性に優れている。As described above, the means for giving strong energy to water to emit electrons from hydrogen atoms may be selected from those practically easy to use, and the hydrogen proton concentration is 2.
A good effect can be obtained in the range of 5 to 4 pH. Further, a good effect can be obtained when the amount of hydrogen-proton high-concentration water added to the commercially available silicic acid sol containing 20% as SiO 2 is in the range of 10% to 100%, but the salt contained in the commercially available silicic acid sol. It is necessary to neutralize
50% to 100% is preferable. The silicic acid hydrosol produced in this way is remarkably excellent in durability unless a salt is externally added.
【0013】[0013]
【発明の効果】以上説明したように、この発明は珪酸ゾ
ルを希釈して珪酸ヒドロゾルとするための分散媒として
の水に強いエネルギーをかけて水素原子から電子を放出
させた水素陽子高濃度水を添加するため水素陽子が珪酸
コロイド分子から電子を取り込もうとして回遊し、その
結果、水素陽子が珪酸コロイド分子間の反発を高めて凝
集を防止し、長期にわたってゲル化させない効果があ
る。As described above, the present invention is a high concentration hydrogen proton water in which electrons are released from hydrogen atoms by applying strong energy to water as a dispersion medium for diluting a silicic acid sol into a silicic acid hydrosol. Therefore, hydrogen protons migrate to capture electrons from the silicic acid colloid molecules, and as a result, the hydrogen protons increase the repulsion between the silicic acid colloid molecules to prevent aggregation and prevent gelation for a long period of time.
【0014】また水処理装置は簡単な構造で容易に水素
陽子高濃度水を得ることができ、殺菌されるために養
魚、水栽培用水等の製造にも効果がある。Further, the water treatment device has a simple structure and can easily obtain hydrogen-proton high-concentration water, and since it is sterilized, it is also effective for producing fish culture, hydroponics water, and the like.
【図1】水素原子の概念的模式図である。FIG. 1 is a conceptual schematic diagram of a hydrogen atom.
【図2】酸素原子の概念的模式図である。FIG. 2 is a conceptual schematic diagram of an oxygen atom.
【図3】水の分子の概念的模式図である。FIG. 3 is a conceptual schematic diagram of water molecules.
【図4】珪酸分子の概念的模式図である。FIG. 4 is a conceptual schematic diagram of a silicic acid molecule.
【図5】水に電場を与える処理装置の縦断正面図であ
る。FIG. 5 is a vertical cross-sectional front view of a processing device that applies an electric field to water.
【図6】この発明方法で製造した珪酸ヒドロゾルのゲル
化耐久性を示すグラフである。FIG. 6 is a graph showing gelation durability of silicic acid hydrosol produced by the method of the present invention.
【図7】従来方法による珪酸ヒドロゾルのゲル化耐久性
を示すグラフである。FIG. 7 is a graph showing gelation durability of silicic acid hydrosol by a conventional method.
【図8】水に紫外線を照射する処理装置の縦断正面図で
ある。FIG. 8 is a vertical cross-sectional front view of a processing device that irradiates water with ultraviolet rays.
【図9】水に陰電圧をかける処理装置の縦断正面図であ
る。FIG. 9 is a vertical cross-sectional front view of a processing device that applies a negative voltage to water.
1 処理装置 2 中空鉄心 3 電磁コイル 4 水道管 4A バルブ 5 濾過槽 5A 濾過膜 5B 陰電極 6 筒体 6A 反射層 6B フィルタ 7 紫外線光源 8 処理槽 8A 陰電極 9 透析筒 10 陽電極 1 treatment device 2 hollow iron core 3 electromagnetic coil 4 water pipe 4A valve 5 filtration tank 5A filtration membrane 5B negative electrode 6 cylinder 6A reflective layer 6B filter 7 ultraviolet light source 8 treatment tank 8A negative electrode 9 dialysis cylinder 10 positive electrode
─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───
【手続補正書】[Procedure amendment]
【提出日】平成4年9月14日[Submission date] September 14, 1992
【手続補正1】[Procedure Amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】発明の名称[Name of item to be amended] Title of invention
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【発明の名称】 ゲル化沈殿しない珪酸ヒドロゾルの
製造方法並びに水処理装置Title: Method for producing silicic acid hydrosol that does not gel and precipitate and water treatment apparatus
Claims (3)
ら電子放出をさせて水素陽子高濃度水を造成し、該水素
陽子高濃度水を珪酸ゾルに添加混合し、珪酸コロイド分
子の周囲に水素陽子を回遊させて珪酸コロイド分子相互
間の反発を持続させることを特徴とするゲル化沈殿しな
い珪酸ヒドロゾルの製造方法。1. An external energy is applied to water to cause an electron to be emitted from a hydrogen atom to form hydrogen-proton high-concentration water, and the hydrogen-proton high-concentration water is added to and mixed with a silicic acid sol so that the water is surrounded by silicic acid colloid molecules. A method for producing a silicic acid hydrosol that does not cause gelation and precipitation, characterized in that hydrogen protons are allowed to migrate to sustain repulsion between silicic acid colloid molecules.
共に該中空鉄心の外周部に電磁コイルを装着したことを
特徴とする水処理装置。2. A water treatment apparatus comprising a hollow core, a water guide pipe and a drain pipe connected to the hollow core, and an electromagnetic coil attached to the outer periphery of the hollow core.
共に該有底筒体の上部に紫外線光源を配設したことを特
徴とする水処理装置。3. A water treatment apparatus characterized in that a water guiding pipe and a drain pipe are connected to a bottomed tubular body and an ultraviolet light source is disposed above the bottomed tubular body.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12820991A JPH0585717A (en) | 1991-05-02 | 1991-05-02 | Production of silica hydrosol without gelatification precipitation and device for water processing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12820991A JPH0585717A (en) | 1991-05-02 | 1991-05-02 | Production of silica hydrosol without gelatification precipitation and device for water processing |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0585717A true JPH0585717A (en) | 1993-04-06 |
Family
ID=14979185
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12820991A Pending JPH0585717A (en) | 1991-05-02 | 1991-05-02 | Production of silica hydrosol without gelatification precipitation and device for water processing |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0585717A (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59136187A (en) * | 1983-01-25 | 1984-08-04 | Houshin Kagaku Sangiyoushiyo:Kk | Fluid sterilizer |
JPS61138587A (en) * | 1984-12-10 | 1986-06-26 | Hoshitaka Nakamura | Water purifier for drinking water |
JPH033499A (en) * | 1989-05-31 | 1991-01-09 | Hitachi Ltd | Learning remote controller |
-
1991
- 1991-05-02 JP JP12820991A patent/JPH0585717A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59136187A (en) * | 1983-01-25 | 1984-08-04 | Houshin Kagaku Sangiyoushiyo:Kk | Fluid sterilizer |
JPS61138587A (en) * | 1984-12-10 | 1986-06-26 | Hoshitaka Nakamura | Water purifier for drinking water |
JPH033499A (en) * | 1989-05-31 | 1991-01-09 | Hitachi Ltd | Learning remote controller |
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