JPH0580784B2 - - Google Patents
Info
- Publication number
- JPH0580784B2 JPH0580784B2 JP60244976A JP24497685A JPH0580784B2 JP H0580784 B2 JPH0580784 B2 JP H0580784B2 JP 60244976 A JP60244976 A JP 60244976A JP 24497685 A JP24497685 A JP 24497685A JP H0580784 B2 JPH0580784 B2 JP H0580784B2
- Authority
- JP
- Japan
- Prior art keywords
- exb
- ion beam
- aperture
- blanking
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60244976A JPS62103949A (ja) | 1985-10-30 | 1985-10-30 | 集束イオンビ−ム装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60244976A JPS62103949A (ja) | 1985-10-30 | 1985-10-30 | 集束イオンビ−ム装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62103949A JPS62103949A (ja) | 1987-05-14 |
JPH0580784B2 true JPH0580784B2 (enrdf_load_html_response) | 1993-11-10 |
Family
ID=17126745
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60244976A Granted JPS62103949A (ja) | 1985-10-30 | 1985-10-30 | 集束イオンビ−ム装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62103949A (enrdf_load_html_response) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0539555Y2 (enrdf_load_html_response) * | 1986-08-29 | 1993-10-07 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61220263A (ja) * | 1985-03-27 | 1986-09-30 | Hitachi Ltd | イオンマイクロビ−ム装置 |
-
1985
- 1985-10-30 JP JP60244976A patent/JPS62103949A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS62103949A (ja) | 1987-05-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4521850B2 (ja) | イオン注入器用の加速および分析アーキテクチャー | |
DE69821467T2 (de) | Rasterelektronenmikroskop unter kontrollierter umgebung mit einem magnetfeld zur erhöhten sekundärelektronenerfassung | |
GB2308492A (en) | Time-of-flight mass spectrometry | |
GB2361353A (en) | Gridless time of flight mass spectrometer for orthogonal ion injection | |
US6326631B1 (en) | Ion implantation device arranged to select neutral ions from the ion beam | |
JP2016115674A (ja) | ソフト電子イオン化のためのイオン源ならびに関連するシステムおよび方法 | |
DE102011109927B4 (de) | Einführung von Ionen in Kingdon-Ionenfallen | |
JPH01501583A (ja) | イオン化されたクラスタビームの質量分離装置 | |
CA1059656A (en) | Charged particle beam apparatus | |
US4841143A (en) | Charged particle beam apparatus | |
US10763072B1 (en) | Apparatus, system and techniques for mass analyzed ion beam | |
JP4421780B2 (ja) | イオン注入装置内でイオンビームを監視および調整するための装置及び方法 | |
JPH07169436A (ja) | イオン注入システムに用いられる低エネルギによる大電流ビームの発生 | |
JP2526941B2 (ja) | イオン注入装置 | |
JPH0580784B2 (enrdf_load_html_response) | ||
JP2946433B2 (ja) | イオンビーム制御システム | |
JPH07307140A (ja) | 質量分析装置及びイオン源 | |
JPH0539555Y2 (enrdf_load_html_response) | ||
RU2144237C1 (ru) | Оптическая колонка для излучения частиц | |
JP2940090B2 (ja) | 質量分析装置を有するイオン源 | |
KR960010432B1 (ko) | 펄스 비임 발생 방법 및 발생 장치 | |
JPH11154485A (ja) | 質量分析装置およびそれを備えるイオン注入装置 | |
JPH10261378A (ja) | イオン照射装置 | |
JPS62160648A (ja) | 集束イオンビ−ム装置 | |
Hues et al. | A pulsed alkali‐ion gun for time‐of‐flight secondary ion mass spectrometry |