JPH0580609B2 - - Google Patents
Info
- Publication number
- JPH0580609B2 JPH0580609B2 JP59131524A JP13152484A JPH0580609B2 JP H0580609 B2 JPH0580609 B2 JP H0580609B2 JP 59131524 A JP59131524 A JP 59131524A JP 13152484 A JP13152484 A JP 13152484A JP H0580609 B2 JPH0580609 B2 JP H0580609B2
- Authority
- JP
- Japan
- Prior art keywords
- base
- recess
- pressure sensor
- rough
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011248 coating agent Substances 0.000 claims description 20
- 238000000576 coating method Methods 0.000 claims description 20
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 239000011521 glass Substances 0.000 claims description 9
- 150000004703 alkoxides Chemical class 0.000 claims description 8
- 238000010030 laminating Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 3
- 239000012528 membrane Substances 0.000 claims 2
- 239000010408 film Substances 0.000 description 16
- 239000000463 material Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 238000000227 grinding Methods 0.000 description 3
- 238000003754 machining Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 238000009530 blood pressure measurement Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0072—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance
- G01L9/0075—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance using a ceramic diaphragm, e.g. alumina, fused quartz, glass
Description
【発明の詳細な説明】
(イ) 産業上の利用分野
本発明は、超精密圧力測定に使用される圧力セ
ンサの製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application The present invention relates to a method of manufacturing a pressure sensor used for ultra-precision pressure measurement.
(ロ) 従来の技術
圧力センサの一種には、第５図に示すように、
石英ガラス等からなるベースａの表面に凹部ｂを
設け、該ベースａの表面に同質ガラスで成形した
薄板状のたわみプレート（感圧プレート）ｃを貼
設してある微小間隔に設定した真空間隙ｄを形成
するとともに、その真空間隙ｄを挟むベースａと
たわみプレートｃとに、固定電極ｅと可変位電極
ｆとを対設してなる構造のものがある。すなわ
ち、この構造に係るものでは、そのたわみプレー
トｃに圧力が作用すると、該プレートｃが内面の
可変位電極ｆと共に変位して、真空間隙ｄの間隔
あるいは容量が圧力に応じて変化することを利用
するようにしたものであつて、具体的には、可変
位電極ｆと固定電極ｅとの間の静電容量の変化や
間隔変化による共振周波数の変化を電気的に検出
して圧力を精密測定できるようにしている。(b) Conventional technology As shown in Figure 5, one type of pressure sensor is
Vacuum gaps set at minute intervals are provided with recesses b on the surface of a base a made of quartz glass or the like, and a thin flexible plate (pressure sensitive plate) c made of homogeneous glass is pasted on the surface of the base a. d, and has a structure in which a fixed electrode e and a variable electrode f are provided oppositely on a base a and a flexible plate c that sandwich the vacuum gap d. That is, in this structure, when pressure is applied to the flexible plate c, the plate c is displaced together with the variable displacement electrode f on the inner surface, and the interval or capacity of the vacuum gap d changes in accordance with the pressure. Specifically, it electrically detects changes in resonance frequency due to changes in capacitance and changes in interval between variable potential electrode f and fixed electrode e to accurately measure pressure. I am making it possible to measure it.
しかして、この種の構成、原理にもとづく圧力
センサにあつては、前記真空間隙Ｄの設定間隔を
可及的小さなものとすること、即ち、前記電極
ｅ，ｆの電極間距離D0を可及的小さなものとす
ることが技術的に指向される。つまり、この種構
造のものでは、その圧力検出感度が、前記対向配
置される電極ｅ，ｆの間隔を小さくしてその静電
容量を可及的増大することにより一層鋭敏なもの
とされるからである。 Therefore, in the case of a pressure sensor based on this type of configuration and principle, the set interval of the vacuum gap D should be made as small as possible, that is, the distance D 0 between the electrodes e and f should be made as small as possible. The technical direction is to minimize the impact. In other words, in this type of structure, the pressure detection sensitivity is made even more sensitive by reducing the distance between the opposing electrodes e and f and increasing the capacitance as much as possible. It is.
ところが、現状では主にその製造技術上の困難
に起因して上記の高感度化指向に限界を来たして
いるのが実情である。従来、この種圧力センサを
つくる方法としては、表面に所要の加工を施こし
たベースに別体のたわみプレートを貼設すること
により行なわれている。すなわち、前記ベースａ
の表面に必要な前記凹部ｂを機械的に研削加工し
て設け、その底部に前記固定電極ｅをコーテイン
グして設ける一方、同様にその内面に予め前記可
変位電極ｆを設けた別体の前記たわみプレートｃ
を適宜の接着剤を介してベースの表面に貼り合せ
るようにするのが通例である。しかし、このよう
にして得られるものでは、ベースａに対する加工
精度の点からその凹部ｂの深さを薄くすること一
定の限界（具体的には15μm程度以上）があり、
そのため真空間隙ｄの間隔寸法、従つて、その電
極ｅ，ｆの電極間距離D0を狭めることにも当然
限度がある不都合を招来している。 However, the current situation is that the above-mentioned goal of increasing sensitivity has reached its limit, mainly due to difficulties in manufacturing technology. Conventionally, this type of pressure sensor has been manufactured by attaching a separate flexible plate to a base whose surface has been subjected to necessary processing. That is, the base a
The necessary recess b is provided on the surface of the recess b by mechanical grinding, and the fixed electrode e is coated on the bottom of the recess b, while the variable electrode f is similarly provided on the inner surface of the separate recess b. Deflection plate c
It is customary to attach the base to the surface of the base using a suitable adhesive. However, in the case of the product obtained in this way, there is a certain limit (specifically, about 15 μm or more) in reducing the depth of the recess b from the viewpoint of processing accuracy with respect to the base a.
Therefore, there is naturally a limit to the narrowing of the interval dimension of the vacuum space d, and thus the inter-electrode distance D 0 between the electrodes e and f.
(ハ) 発明が解決しようとする問題点
本発明は、かかる従来技術の問題点に着目して
なされたもので、上記に特定される種類の圧力セ
ンサの製造方法として、特にその真空間隙を挟む
前記対向電極の電極間距離をより狭いものに自在
に調整できるようにしたもの、換言すればより高
感度の圧力センサをつくり出すことができるよう
にしたもの提供することを目的としている。(c) Problems to be Solved by the Invention The present invention has been made by focusing on the problems of the prior art, and is a method for manufacturing a pressure sensor of the type specified above. It is an object of the present invention to provide a device in which the distance between the opposing electrodes can be freely adjusted to a narrower one, in other words, a pressure sensor with higher sensitivity can be created.
(ニ) 問題点を解決するための手段
本発明は、このような目的を達成するために、
ベースの表面に設けた凹部にたわみプレートを貼
設して該凹部内を真空間隙に形成するとともに、
この真空間隙を挟むベースとたわみプレートとに
固定電極と可変位電極とを対設してなる圧力セン
サの製造方法であつて、前記ベースに前記固定電
極を設けるにさいし、まずベースの表面に粗凹部
を設け、次にこの粗凹部の底部に極薄の被覆膜を
積層して凹部深さを調節し、この被覆膜の積層体
の上に前記固定電極を設けるようにしたことを特
徴としている。(d) Means for solving the problems In order to achieve the above object, the present invention provides the following:
A flexible plate is attached to a recess provided on the surface of the base to form a vacuum gap within the recess, and
In this method of manufacturing a pressure sensor, a fixed electrode and a variable position electrode are disposed oppositely on a base and a flexible plate that sandwich this vacuum gap. A recess is provided, and then an extremely thin coating film is laminated on the bottom of the rough recess to adjust the depth of the recess, and the fixed electrode is provided on the layered layer of the coating film. It is said that
(ホ) 作用
すなわち、本発明の製造方法は、まずベースの
表面に適宜の手段により粗凹部を設け、次にアル
コキシドの焼成ガラスのような極薄の被覆膜の積
層体をもつて該粗凹部を底上げするようにするこ
とにより、従来の加工精度の限界を超えて、固定
電極が設けられるその凹部深さを自在に調整でき
るようにしたものである。(E) Effect That is, in the manufacturing method of the present invention, first, rough depressions are formed on the surface of the base by an appropriate means, and then a laminate of an extremely thin coating film such as fired glass of alkoxide is applied to the rough depressions. By raising the bottom of the recess, the depth of the recess in which the fixed electrode is provided can be freely adjusted, exceeding the limits of conventional processing accuracy.
(ヘ) 実施例
以下、本発明の実施例を図面を参照して説明す
る。(f) Examples Examples of the present invention will be described below with reference to the drawings.
第１図は、先に第５図で示した従来法に係るも
のと対比して示すところの、本発明に係る圧力セ
ンサの構成を示している。そこで、このものを例
に、その製造工程を説明すると、まず石英ガラス
等からなるベース１の表面に、従来と同様にして
機械的な研削加工等により粗凹部２を設けてい
る。次にこの粗凹部２には、第２図に示すよう
に、その底部に対して極薄の被覆膜３を多層に積
層し、それら積層体４で底部を底上げしている。
この被覆膜３の積層数は、粗凹部２の加工深さと
設定電極間距離に応じて適宜の層数に選定され
る。また、この被覆膜３を構成する物質として
は、フラツトな極薄膜のものに仕上げられて底上
げ微調整が可能なものであると同時に、望ましく
はベース１と同質の絶縁材料を構成するものを使
用する。いま、ベース１が石英ガラスである場合
について説明すると、かかる物質の好適な具体例
として、Siのアルコキシドの焼成ガラスが挙げら
れる。すなわち、Siのアルコキシド（特にケイ酸
エチル；Si（OC2H5）4が好適である）は溶媒と共
に塗布して0.1〜0.2μm程度の極めて薄い膜状体と
して均一に被覆することが容易にできるし、これ
を加水分解させて焼成すると、最終的にベース１
と同質のSiO2膜を構成することになるからであ
る（ちなみに、このSiのアルコキシド焼成ガラス
による積層体４では、被覆膜３とベース１および
各被覆膜３同士が完全に一体均質化することにな
る）。 FIG. 1 shows the configuration of a pressure sensor according to the present invention in comparison with the conventional method shown in FIG. 5 above. To explain the manufacturing process using this product as an example, first, a rough recess 2 is provided on the surface of a base 1 made of quartz glass or the like by mechanical grinding or the like in the same manner as in the past. Next, as shown in FIG. 2, in this rough recess 2, multiple layers of extremely thin coating films 3 are laminated on the bottom of the rough recess 2, and the bottom is raised with these laminates 4.
The number of laminated layers of the coating film 3 is selected to be an appropriate number depending on the machining depth of the rough recess 2 and the set distance between electrodes. The material constituting the coating film 3 should be a flat, ultra-thin film that can be finely adjusted to raise the base, and preferably made of the same insulating material as the base 1. use. Now, to explain the case where the base 1 is quartz glass, a preferred specific example of such a material is sintered glass of Si alkoxide. In other words, Si alkoxide (especially ethyl silicate; Si(OC 2 H 5 ) 4 is preferred) can be applied together with a solvent to uniformly coat it as an extremely thin film of about 0.1 to 0.2 μm. If you hydrolyze this and bake it, you will finally get Base 1.
(Incidentally, in this laminate 4 made of Si alkoxide fired glass, the coating film 3, the base 1, and each coating film 3 are completely integrated and homogenized.) ).
かくして、粗凹部２の底部を被覆膜３の積層体
４で底上げし、その凹部深さを任意に調節したベ
ース１には、その積層体４の上に従来と同様にし
て固定電極５が設けられ、さらにひき続き常法の
如くしてたわみプレート６が貼設される。すなわ
ち、前記積層体４の上に金属蒸着等によるコーテ
イングで所要の固定電極５を設けるとともに、予
めその内面所定位置に可変位電極７を設けてある
たわみプレート６をベース１の表面に適宜接着剤
（例えば前記と同様のアルコキシド）を介し真空
中で貼設一体化することにより、その真空間隙８
に電極５，７を対設してなる圧力センサが得られ
る。このようにして得られる圧力センサでは、そ
の真空間隙８を挟む固定電極５と可変位電極７と
の電極間距離Ｄを、被覆層３の積層により調節し
て従来品のそれよりも小さい（Ｄ＜D0）任意の
微小間隔に制御することが容易に可能となる。 Thus, on the base 1, the bottom of the rough recess 2 is raised with the laminate 4 of the coating film 3, and the depth of the recess is arbitrarily adjusted, and the fixed electrode 5 is placed on the laminate 4 in the same manner as in the past. The flexible plate 6 is then applied in a conventional manner. That is, the required fixed electrodes 5 are provided on the laminate 4 by coating with metal vapor deposition, etc., and the flexible plate 6, on which the variable electrode 7 is previously provided at a predetermined position on its inner surface, is attached to the surface of the base 1 with an appropriate adhesive. (for example, the same alkoxide as above), the vacuum gap 8
A pressure sensor is obtained in which electrodes 5 and 7 are placed opposite each other. In the pressure sensor obtained in this way, the inter-electrode distance D between the fixed electrode 5 and the variable electrode 7, which sandwich the vacuum gap 8, is adjusted by laminating the coating layer 3 to be smaller than that of the conventional product (D <D 0 ) It becomes possible to easily control the distance to an arbitrary minute distance.
次に、第３図、第４図に示される他の実施例に
ついて説明する。本発明の製造方法では、ベース
１に設けられる凹部の電極設置面に当る底部は、
最終的には被覆膜３の積層により任意の深さでか
つフラツトなものに仕上げることが可能である。
従つて、ベース１に最初の工程で設ける粗凹部２
は、左程の加工精度を必要とせず、それ故種々の
簡便な加工手段を採用することが可能である。 Next, other embodiments shown in FIGS. 3 and 4 will be described. In the manufacturing method of the present invention, the bottom of the recess provided in the base 1, which corresponds to the electrode installation surface, is
Finally, by laminating the coating film 3, it is possible to finish it to any desired depth and to a flat surface.
Therefore, the rough recess 2 provided in the base 1 in the first step
does not require as much machining precision as on the left, and therefore it is possible to employ various simple machining means.
第３図に示す圧力センサの例では、その粗凹部
２−１を円弧面に成形するようにして凹設し、そ
の底部を被覆膜３の積層体４で平坦化している。
つまり、このようにすると、ベース１に対する加
工の便宜が図られる。 In the example of the pressure sensor shown in FIG. 3, the rough recess 2-1 is formed into an arcuate surface, and the bottom thereof is flattened with a laminate 4 of the coating film 3.
In other words, by doing so, processing of the base 1 can be facilitated.
また、第４図に示すものの例では、ベース１の
プレーン面に別体の薄膜リング状のスペーサ９を
貼設して所要の粗凹部２−２を設けるようにして
いる。この場合では、研削加工を必要としないか
ら加工の簡便化が期待できる。 Further, in the example shown in FIG. 4, a separate thin film ring-shaped spacer 9 is pasted on the plain surface of the base 1 to provide a required rough recess 2-2. In this case, since grinding is not required, processing can be expected to be simplified.
なお、以上に述べた実施例では、ベース１に石
英ガラスを用いる場合を例に説明したが、ベース
１の材質は勿論これに限定されず、その他種々の
材料が使用できる。そして、特にガラス質のもの
のベース材料の場合では、やはりその成分に対応
するアルコキシドの焼成ガラスを被覆膜３の構成
材料とすればよい。例えば、Al2O3系ガラスに対
しては、Alのアルコキシドの焼成ガラスをもつ
て被覆膜３を構成するのである。 In the embodiments described above, the base 1 is made of quartz glass, but the material of the base 1 is of course not limited to this, and various other materials can be used. In particular, in the case of a glassy base material, the coating film 3 may be made of fired glass of an alkoxide corresponding to the component. For example, for Al 2 O 3 glass, the coating film 3 is made of fired glass of Al alkoxide.
(ト) 発明の効果
以上説明したように、本発明の製造方法では、
ベース表面にまず粗凹部を設け、次いでその凹部
深さを極薄の被覆膜を積層して調節し、その上に
固定電極を設けるようにしたものであるから、圧
力センサとしてその電極間距離を狭ばめたもの、
つまり非常に高感度のものをつくり出すことが可
能である。そして、この製造工程においては、粗
凹部の形成にあまり加工精度を要求されなくなる
から、この点加工上有利であるし、また最終的に
真空間隙乃至電極間距離を決定するその凹部深さ
は、被覆膜により微調整できるから品質安定化の
上でも好都合なものである。(g) Effects of the invention As explained above, in the manufacturing method of the present invention,
First, a rough recess is formed on the base surface, then the depth of the recess is adjusted by laminating an ultra-thin coating film, and a fixed electrode is provided on top of the recess, so the distance between the electrodes can be used as a pressure sensor. narrowed down,
In other words, it is possible to create something with extremely high sensitivity. This manufacturing process does not require much processing precision to form the rough recesses, which is advantageous in terms of processing, and the depth of the recesses, which ultimately determines the vacuum gap or the distance between the electrodes, is Fine adjustment can be made using the coating film, which is advantageous in terms of quality stabilization.
第１図は、本発明の一実施例に係る圧力センサ
の構造を示す概略断面図であり、第２図は、その
要部拡大図である。第３図と第４図は、本発明の
他の実施例に係る圧力センサの構造を示す各概略
断面図である。第５図は、従来法により得られる
圧力センサの構造を示す概略断面図である。
１……ベース、２，２−１，２−２……粗凹
部、３……被覆膜、４……積層体、５……固定電
極、６……たわみプレート、７……可変位電極、
８……真空間隙、９……スペーサ。
FIG. 1 is a schematic sectional view showing the structure of a pressure sensor according to an embodiment of the present invention, and FIG. 2 is an enlarged view of the main parts thereof. 3 and 4 are schematic sectional views showing the structure of a pressure sensor according to another embodiment of the present invention. FIG. 5 is a schematic sectional view showing the structure of a pressure sensor obtained by a conventional method. DESCRIPTION OF SYMBOLS 1...Base, 2,2-1,2-2...Rough recess, 3...Coating film, 4...Laminated body, 5...Fixed electrode, 6...Flexible plate, 7...Variable potential electrode ,
8...Vacuum gap, 9...Spacer.
Claims (1)
を貼設して該凹部内を真空間隙に形成するととも
に、この真空間隙を挟むベースとたわみプレート
とに固定電極と可変位電極とを対設してなる圧力
センサの製造方法であつて、前記ベースに前記固
定電極を設けるにさいし、まずベースの表面に粗
凹部を設け、次にこの粗凹部の底部に極薄の被覆
膜を積層して凹部深さを調節し、この被覆膜の積
層体の上に前記固定電極を設けるようにしたこと
を特徴とする圧力センサの製造方法。 ２ ベースがガラスからなり、被覆膜がアルコキ
シドの焼成ガラスからなることを特徴とする特許
請求の範囲第１項記載の圧力センサの製造方法。[Claims] 1. A flexible plate is attached to a recess provided on the surface of the base to form a vacuum gap within the recess, and a fixed electrode and a variable electrode are attached to the base and the flexible plate that sandwich this vacuum gap. A method for manufacturing a pressure sensor, in which, in providing the fixed electrode on the base, first a rough recess is provided on the surface of the base, and then an extremely thin coating is provided on the bottom of the rough recess. A method for manufacturing a pressure sensor, characterized in that the depth of the recess is adjusted by laminating membranes, and the fixed electrode is provided on the laminated body of coating membranes. 2. The method of manufacturing a pressure sensor according to claim 1, wherein the base is made of glass and the coating film is made of fired alkoxide glass.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13152484A JPS6110736A (en) | 1984-06-25 | 1984-06-25 | Manufacture of pressure sensor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13152484A JPS6110736A (en) | 1984-06-25 | 1984-06-25 | Manufacture of pressure sensor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6110736A JPS6110736A (en) | 1986-01-18 |
| JPH0580609B2 true JPH0580609B2 (en) | 1993-11-09 |
Family
ID=15060071
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13152484A Granted JPS6110736A (en) | 1984-06-25 | 1984-06-25 | Manufacture of pressure sensor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6110736A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3920555B2 (en) * | 2000-10-27 | 2007-05-30 | 株式会社山武 | Bonding agent and bonding method |
| EP1653209A4 (en) * | 2003-07-03 | 2007-03-07 | Toyo Communication Equip | Quartz type pressure sensor, and production method therefor |
| JP4521633B2 (en) | 2004-03-12 | 2010-08-11 | 直樹 末広 | Correlation separation identification method for code division multiplexed signals |
| DE102009027742A1 (en) | 2009-07-15 | 2011-01-27 | Endress + Hauser Gmbh + Co. Kg | Capacitive ceramic pressure measuring cell and pressure sensor with such a pressure measuring cell |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5942938B2 (en) * | 1979-05-31 | 1984-10-18 | 松下電工株式会社 | Breaker trip mechanism |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5942938U (en) * | 1982-09-14 | 1984-03-21 | 松下電器産業株式会社 | Capacitive pressure sensor |
-
1984
- 1984-06-25 JP JP13152484A patent/JPS6110736A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5942938B2 (en) * | 1979-05-31 | 1984-10-18 | 松下電工株式会社 | Breaker trip mechanism |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6110736A (en) | 1986-01-18 |
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