JPH0569295A - Both sides grinding method using electrolytic dressing and its device - Google Patents

Both sides grinding method using electrolytic dressing and its device

Info

Publication number
JPH0569295A
JPH0569295A JP22756591A JP22756591A JPH0569295A JP H0569295 A JPH0569295 A JP H0569295A JP 22756591 A JP22756591 A JP 22756591A JP 22756591 A JP22756591 A JP 22756591A JP H0569295 A JPH0569295 A JP H0569295A
Authority
JP
Japan
Prior art keywords
gear
grindstone
planetary gear
work
dressing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22756591A
Other languages
Japanese (ja)
Other versions
JP3233954B2 (en
Inventor
Hitoshi Omori
整 大森
Takeo Nakagawa
威雄 中川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN Institute of Physical and Chemical Research
Original Assignee
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN Institute of Physical and Chemical Research filed Critical RIKEN Institute of Physical and Chemical Research
Priority to JP22756591A priority Critical patent/JP3233954B2/en
Publication of JPH0569295A publication Critical patent/JPH0569295A/en
Application granted granted Critical
Publication of JP3233954B2 publication Critical patent/JP3233954B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

Abstract

PURPOSE:To provide a both-side grinding method using electrolytic dressing and its device by applying the Elid grinding method to the both-side grinding. CONSTITUTION:A both sides grinding device is provided with a first gear 10 to hold a workpiece 2 in a penetrated hole, a second gears 12, 14 which are engaged with the first gear and drive the first gear, a lower side grinding wheel 16 and an upper side grinding wheel 18 which hold the workpiece and are located opposite to each other, a liquid supplying means to supply the conductive liquid into the space between the first gear and the lower side grinding wheel and the space between the first gear and the upper grinding wheel, and a power supplying means to supply the current to the space between the first gear and the lower side grinding wheel and the space between the first gear and the upper grinding wheel.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、電解ドレッシングを用
いた研削・研磨加工の分野に係わり、特に、電解ドレッ
シングを用いた両面研削の方法及び装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the field of grinding and polishing using electrolytic dressing, and more particularly to a method and apparatus for double-sided grinding using electrolytic dressing.

【0002】[0002]

【従来の技術】鋳鉄ファイバボンドダイヤモンド砥石等
の導電性砥石を用い、この砥石に電圧を印加し、砥石を
電解によりドレッシングする導電性砥石の電解ドレッシ
ング方法及び装置が、本願と同一の出願人による特開平
1-188266号( 特願昭63-12305号) に開示され、電子材料
であるシリコン等の半導体材料を鏡面研削することに成
功している。更に、この方法及び装置を発展させた電解
インプロセスドレッシング研削法(Electrolytic Inproc
ess Dressing: 以下 Elid 研削法という) と呼ばれる方
法及び装置が本願出願人により開発され、発表されてい
る( 理研シンボジウム「鏡面研削の最新技術動向」、平
成3年3月5日開催)。
2. Description of the Related Art A conductive grindstone such as a cast iron fiber bonded diamond grindstone is used, and an electrolytic dressing method and apparatus for a conductive grindstone in which a voltage is applied to the grindstone and the grindstone is electrolytically dressed by the same applicant as the present application. Kohei
It has been disclosed in Japanese Patent Application No. 1-188266 (Japanese Patent Application No. 63-12305) and has succeeded in mirror-finishing a semiconductor material such as silicon which is an electronic material. In addition, an electrolytic in-process dressing grinding method (Electrolytic Inproc
ess Dressing: A method and a device called “Elid grinding method” have been developed and announced by the applicant of the present application (RIKEN Symbodium “Latest Technology Trend of Mirror Grinding”, held on March 5, 1991).

【0003】この Elid 研削法は、ワークとの接触面を
有する砥石と、接触面に対向する電極と、砥石と電極と
の間に導電性液を流すノズルと、砥石と電極との間に電
圧を印加する電源及び給電体とからなる装置であり、砥
石と電極との間に導電性液を流しながら、砥石と電極と
の間に電圧を印加し、砥石を電解によりドレッシングす
るものである。
In this Elid grinding method, a grindstone having a contact surface with a work, an electrode facing the contact surface, a nozzle for flowing a conductive liquid between the grindstone and the electrode, and a voltage applied between the grindstone and the electrode. A device comprising a power source and a power feeding body for applying a voltage. A voltage is applied between the grindstone and the electrode while the conductive liquid is flowing between the grindstone and the electrode, and the grindstone is dressed electrolytically.

【0004】この Elid 研削法によるドレッシングの機
構を図7に示す。砥石の目立て開始時(A)には、砥石
と電極との間の電気抵抗が少なく比較的大きい電流(5
〜10A)が流れる。これにより、電解効果により砥石
表面の金属部(ボンド)が溶解し、非導電性のダイヤモ
ンド砥粒が突出する。更に、通電を続けると、酸化鉄(F
e2O3)を主とした絶縁被膜が砥石表面に形成され、砥石
の電気抵抗が大きくなる。これにより、電流が低下し、
ボンドの溶解が減り、砥粒の突出(砥石の目立て)が実
質的に終了する(B)。この状態で研削を開始する
(C)と、被膜が研削屑を遊離しつつ、ワークの研削に
つれてダイヤモンド砥粒が摩耗していく。更に研削を続
けると(D)、砥石表面の絶縁被膜が摩耗により除去さ
れ、砥石の電気抵抗が低下し、砥石と電極間の電流が増
大し、ボンドの溶解が増し、砥粒の突出(砥石の目立
て)が再開される。従って、 Elid 研削法による研削中
には、(B)〜(D)のように被膜の形成・除去により
ボンドの過溶出が抑えられ、砥粒の突出(砥石の目立
て)が自動的に調整される。(B)〜(D)に示す上述
したサイクルを以下 Elid サイクルと呼ぶ。
The dressing mechanism by this Elid grinding method is shown in FIG. At the start of grinding of the grindstone (A), the electric resistance between the grindstone and the electrode is small and a relatively large current (5
10A) flows. Thereby, the metal portion (bond) on the surface of the grindstone is dissolved by the electrolytic effect, and the non-conductive diamond abrasive grains are projected. Further, if the power is continued, iron oxide (F
An insulating film mainly composed of e 2 O 3 ) is formed on the surface of the grindstone, increasing the electric resistance of the grindstone. This reduces the current,
The dissolution of the bond is reduced, and the protrusion of abrasive grains (grinding of the grindstone) is substantially completed (B). When grinding is started in this state (C), the coating particles release grinding dust, and the diamond abrasive grains wear away as the work is ground. When the grinding is further continued (D), the insulating coating on the surface of the grindstone is removed by abrasion, the electric resistance of the grindstone is lowered, the current between the grindstone and the electrode is increased, the dissolution of the bond is increased, and the protrusion of the abrasive grains (grinding stone Is reopened. Therefore, during grinding by the Elid grinding method, excessive elution of the bond is suppressed by forming / removing the coating as shown in (B) to (D), and the protrusion of the abrasive grains (sharpening of the grindstone) is automatically adjusted. It The above-described cycles shown in (B) to (D) are hereinafter referred to as Elid cycles.

【0005】上述した Elid 研削法によれば、砥石のド
レッシングが研削加工中に行われるので、ドレッシング
により加工が中断されることがなく、かつ砥石の目詰ま
りが起こることもない。従って、従来の研磨に比較する
と1桁以上高負荷の研削ができると共に、面粗さが小さ
い鏡面仕上げが可能であった。しかし、上述した Elid
研削法は従来片面加工にのみ適用され、両面加工には適
用されていなかった。
According to the above-mentioned Elid grinding method, since the dressing of the grindstone is performed during the grinding process, the dressing does not interrupt the process and the grindstone does not become clogged. Therefore, compared with the conventional polishing, it was possible to perform high-load grinding by one digit or more, and it was possible to perform mirror finishing with a small surface roughness. However, the Elid mentioned above
Conventionally, the grinding method has been applied only to single-sided processing and not to double-sided processing.

【0006】一方、遊星歯車にワークを保持し、上下の
砥石でワークを挟持する両面研磨装置が従来知られてい
る。かかる両面研磨装置では、両面加工ができるもの
の、砥石のドレッシングは研磨作業を中断して行う必要
があるため、面粗さの向上のために砥粒を細かくすると
煩雑に加工を中断する必要があり、研磨作業の能率が悪
かった。
On the other hand, a double-sided polishing apparatus is conventionally known which holds a work on a planetary gear and holds the work between upper and lower grindstones. In such a double-sided polishing machine, although double-sided processing is possible, dressing of the grindstone requires interrupting the polishing operation, so it is necessary to interrupt the processing if the abrasive grains are made fine to improve the surface roughness. The efficiency of the polishing work was poor.

【0007】従って上述した Elid 研削法を両面研削に
適用する要望が従来からあった。
Therefore, there has conventionally been a demand for applying the above-mentioned Elid grinding method to double-sided grinding.

【0008】[0008]

【発明が解決しようとする課題】しかし、 Elid 研削法
を上述した両面研磨装置に適用するには、次のような問
題があった。 (1) 遊星歯車を上下の砥石から一定の距離間隔を隔
て、かつ絶縁して保持する必要がある。
However, there are the following problems in applying the Elid grinding method to the above-mentioned double-sided polishing apparatus. (1) It is necessary to hold the planetary gears at a constant distance from the upper and lower grindstones and insulate them.

【0009】かかる要望を満たすために遊星歯車の表面
に絶縁板を接合させると、絶縁板の早い磨耗により隙間
が変化すると共に導電性液の供給が不均一になる。 (2) 遊星歯車と上下の砥石の間に電流を流す必要が
ある。かかる要望を満たすために、遊星歯車全体を導電
材料で作り、かつ遊星歯車への給電を遊星歯車の歯を介
して行うと、電流の流れる面積が大きくなりすぎて電源
が大型化すると共に歯車の歯を通る電流の断続によりス
パークが生じ歯を早期に傷める。 (3) 遊星歯車と上下の砥石の間に導電性液を均一に
供給する必要がある。
When an insulating plate is bonded to the surface of the planetary gear to satisfy the demand, the gap is changed by the rapid abrasion of the insulating plate and the supply of the conductive liquid becomes non-uniform. (2) It is necessary to pass an electric current between the planetary gear and the upper and lower grindstones. In order to satisfy such a demand, if the entire planetary gear is made of a conductive material and the power is supplied to the planetary gear through the teeth of the planetary gear, the area through which the current flows becomes too large and the power source becomes large and the gear The intermittent current flow through the tooth causes sparking, prematurely damaging the tooth. (3) It is necessary to uniformly supply the conductive liquid between the planetary gear and the upper and lower grindstones.

【0010】かかる要望を満たすために、遊星歯車と上
下の砥石の間を導電性液すなわちクーラントで常に満た
すには、液槽を設け遊星歯車をこの中に沈める必要があ
り、装置が複雑化する。また、かかる液槽に溜められた
クーラントは、電解による発熱で液温が上がり易く、こ
れにより砥石面に形成された不導体被覆が剥離したりシ
ール剤の劣化が起こりやすい。更に、研磨屑や磨耗して
脱落したダイヤモンド砥粒が液槽中に溜まり、スクラッ
チ傷の原因となりやすい。
In order to satisfy such a demand, in order to constantly fill the space between the planetary gear and the upper and lower grindstones with a conductive liquid, that is, a coolant, it is necessary to provide a liquid tank and immerse the planetary gear therein, which complicates the apparatus. .. Further, the coolant stored in such a liquid tank is liable to rise in liquid temperature due to heat generated by electrolysis, whereby the non-conductive coating formed on the grindstone surface is easily peeled off and the sealant is apt to deteriorate. Further, polishing debris and diamond abrasive grains that have worn away and fallen off are likely to accumulate in the liquid tank and cause scratches.

【0011】従って、本発明は、上述した問題を解決
し、 Elid 研削法を両面研削に適用し、電解ドレッシン
グを用いた両面研削方法及び装置を提供することを目的
とする。
Therefore, an object of the present invention is to solve the above-mentioned problems, to apply the Elid grinding method to double-sided grinding, and to provide a double-sided grinding method and apparatus using electrolytic dressing.

【0012】[0012]

【課題を解決するための手段】上記課題を解決するた
め、本発明によれば、ワークを第1の歯車に設けた貫通
孔内に保持し、前記第1歯車に噛合する第2の歯車の回
転により前記第1歯車を駆動し、前記ワークを互に対向
する下側砥石及び上側砥石により挟持し、前記第1歯車
と下側砥石及び上側砥石との間に導電性液をそれぞれ供
給し、前記第2歯車と下側砥石及び上側砥石との間に電
流をそれぞれ供給することからなり、これにより、下側
砥石及び上側砥石の対向する加工面を電解ドレッシング
しながら、ワークの両面を研削加工することを特徴とす
る電解ドレッシングを用いた両面研削方法が提供され
る。
In order to solve the above-mentioned problems, according to the present invention, a second gear that holds a work in a through hole provided in the first gear and meshes with the first gear is provided. The first gear is driven by rotation, the work is sandwiched by a lower grindstone and an upper grindstone facing each other, and a conductive liquid is supplied between the first gear and the lower grindstone and the upper grindstone, respectively. An electric current is supplied between the second gear and each of the lower grindstone and the upper grindstone, whereby both sides of the work are ground while electrolytically dressing the facing surfaces of the lower grindstone and the upper grindstone. A double-sided grinding method using electrolytic dressing is provided.

【0013】前記第1歯車は遊星歯車であり、前記第2
歯車は互い同心に配置された太陽歯車及び内歯車であ
る、ことが好ましい。更に、本発明によれば、ワークを
貫通孔内に保持する第1の歯車と、前記第1歯車に噛合
し前記第1歯車を駆動する第2の歯車と、前記ワークを
挟持し互に対向する下側砥石及び上側砥石と、前記第1
歯車と下側砥石及び上側砥石との間に導電性液をそれぞ
れ供給する液供給手段と、前記第1歯車と下側砥石及び
上側砥石との間に電流をそれぞれ供給する給電手段とか
らなり、これにより、下側砥石及び上側砥石の対向する
加工面を電解ドレッシングしながら、ワークの両面を研
削加工することを特徴とする電解ドレッシングを用いた
両面研削装置が提供される。
The first gear is a planetary gear and the second gear is
The gears are preferably sun gears and internal gears arranged concentrically to each other. Further, according to the present invention, the first gear that holds the work in the through hole, the second gear that meshes with the first gear and drives the first gear, and the work that sandwiches the work face each other. Lower grindstone and upper grindstone to
A liquid supply means for supplying a conductive liquid between the gear and the lower grindstone and the upper grindstone, and a power supply means for supplying a current between the first gear and the lower grindstone and the upper grindstone, respectively. Thus, a double-sided grinding device using electrolytic dressing is provided, in which both surfaces of a work are ground while electrolytically dressing the facing surfaces of the lower grindstone and the upper grindstone.

【0014】前記第1歯車は遊星歯車であり、前記第2
歯車は互い同心に配置された太陽歯車及び内歯車であ
る、ことが好ましい。また、前記太陽歯車はそのピッチ
円より大きい円板部で挟持され、前記内歯車はそのピッ
チ円より小さい開口部を有するリング部で挟持され、前
記遊星歯車はワークよりも薄くその歯先が前記円板部及
び前記リング部の両方で挟持され、これにより前記遊星
歯車と前記下側砥石及び上側砥石との間にそれぞれ一定
の隙間が保持される、ことが好ましい。
The first gear is a planetary gear and the second gear is
The gears are preferably sun gears and internal gears arranged concentrically to each other. Further, the sun gear is clamped by a disk portion larger than the pitch circle, the internal gear is clamped by a ring portion having an opening smaller than the pitch circle, and the planetary gear is thinner than a work and its tooth tips are the aforesaid. It is preferable that it is sandwiched by both the disk portion and the ring portion, so that a constant gap is maintained between the planetary gear and the lower grindstone and the upper grindstone.

【0015】更に、前記給電手段は、前記太陽歯車に固
定され、前記遊星歯車に接触する給電板を有する、こと
が好ましい。また、前記遊星歯車には、半径方向に長
く、ワークよりも薄く遊星歯車よりも厚い電解ドレッシ
ング用電極が埋設される、ことが好ましい。更に、前記
液供給手段は、前記リング部の内面に設けられた円周方
向溝と、該円周方向溝から前記内歯車の歯先まで通じる
複数の半径方向溝とを有する、ことが好ましい。
Further, it is preferable that the power feeding means has a power feeding plate fixed to the sun gear and contacting the planetary gear. Further, it is preferable that an electrode for electrolytic dressing which is long in the radial direction and is thinner than the work and thicker than the planetary gear is embedded in the planetary gear. Further, it is preferable that the liquid supply means has a circumferential groove provided on the inner surface of the ring portion, and a plurality of radial grooves communicating from the circumferential groove to the tip of the internal gear.

【0016】また、前記両面研削装置は、前記太陽歯車
と内歯車及び下側砥石の上下方向位置を相対的に調整す
る調整手段を更に備える、ことが好ましい。
Further, it is preferable that the double-sided grinding apparatus further comprises adjusting means for relatively adjusting the vertical positions of the sun gear, the internal gear and the lower grindstone.

【0017】[0017]

【作用】上述した本発明の方法及び装置によれば、第1
歯車と下側砥石及び上側砥石との間に導電性液がそれぞ
れ供給され、この導電性液を介して第1歯車と下側砥石
及び上側砥石との間に電流がそれぞれ供給され、これに
より、下側砥石及び上側砥石の対向する加工面が電解ド
レッシングされる。従って下側砥石及び上側砥石の両方
を Elid 研削法により電解ドレッシングしながら、ワー
クの両面を研削することができる。従って、砥石のドレ
ッシングが研削加工中に行われるので、ドレッシングに
より加工が中断されることがなく、かつ砥石の目詰まり
が起こることもない。これにより、従来の両面研磨に比
較すると1桁以上高負荷の研削ができると共に、面粗さ
が小さい鏡面仕上げが可能となる。
According to the method and apparatus of the present invention described above, the first
A conductive liquid is respectively supplied between the gear and the lower grindstone and the upper grindstone, and an electric current is respectively supplied between the first gear and the lower grindstone and the upper grindstone via the conductive liquid, whereby, The facing processing surfaces of the lower grindstone and the upper grindstone are electrolytically dressed. Therefore, both sides of the work can be ground while electrolytically dressing both the lower grindstone and the upper grindstone by the Elid grinding method. Therefore, since the dressing of the grindstone is performed during the grinding process, the dressing does not interrupt the process and the clogging of the grindstone does not occur. As a result, compared with the conventional double-sided polishing, it is possible to perform high-load grinding by one digit or more, and it is possible to perform mirror-finishing with a small surface roughness.

【0018】更に、第1歯車が遊星歯車であり、第2歯
車が互い同心に配置された太陽歯車及び内歯車である場
合には、下側砥石及び上側砥石との間に絶縁物等を介在
させることなく、遊星歯車の上下面に一定の隙間が保持
されるので、磨耗による隙間変化が生じるおそれがな
く、かつこの隙間に導電性液を円滑に流すことができ
る。
Further, when the first gear is a planetary gear and the second gear is a sun gear and an internal gear arranged concentrically with each other, an insulator or the like is interposed between the lower and upper grindstones. Since a constant gap is maintained on the upper and lower surfaces of the planetary gear without causing such a change, there is no risk of a change in the gap due to wear, and the conductive liquid can be smoothly flown into this gap.

【0019】また、遊星歯車に接触する給電板を有する
ことにより、遊星歯車への給電を断続なく行うことがで
きる。更に、遊星歯車に、半径方向に長く、ワークより
も薄く遊星歯車よりも厚い電解ドレッシング用電極が埋
設される、ことにより、電解ドレッシングを行う電流密
度を高密度に保持することができる。
Further, by providing the power feeding plate which is in contact with the planetary gear, the power feeding to the planetary gear can be performed without interruption. Further, the electrode for electrolytic dressing which is long in the radial direction and is thinner than the work and thicker than the planetary gear is embedded in the planetary gear, whereby the current density for electrolytically dressing can be maintained at a high density.

【0020】また、前記リング部の内面に設けた溝を介
して導電性液を流すことにより、遊星歯車の上下面の隙
間に均一に供給することができ、遊星歯車全体を導電性
液に沈める必要がない。
Further, by flowing the conductive liquid through the groove provided on the inner surface of the ring portion, the conductive liquid can be uniformly supplied to the gap between the upper and lower surfaces of the planetary gear, and the whole planetary gear is submerged in the conductive liquid. No need.

【0021】[0021]

【実施例】以下、本発明の好適な一実施例を図面を参照
して説明する。図1は、本発明による電解ドレッシング
を用いた両面研削装置の平面図であり、この図において
上側砥石は明瞭化のため省略してある。また、図2は、
図1の線A−Aにおける断面図である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A preferred embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a plan view of a double-sided grinding machine using electrolytic dressing according to the present invention, in which the upper grindstone is omitted for clarity. In addition, FIG.
It is sectional drawing in line AA of FIG.

【0022】本発明による両面研削装置は、遊星歯車1
0と、この遊星歯車10に噛合し垂直な軸心1を中心に
互に同心に配置された太陽歯車12及び内歯車14と、
互に対向する下側砥石16及び上側砥石18とを備え
る。太陽歯車12は、太陽歯車支持板13を介して駆動
軸20に連結され、この駆動軸20は、図示しない駆動
装置により軸心1を中心に回転するようになっている。
また内歯車14は、内歯車支持板15を介して本体22
に固定され、この本体22は図示しないベースに固着さ
れている。本体22は上面に下側砥石16を収容する凹
部22aを有し、この凹部22aには適当な絶縁支持材
24を介して中央開口部16aを有する下側砥石16が
載せられている。
The double-sided grinding machine according to the present invention comprises a planetary gear 1
0, and a sun gear 12 and an internal gear 14 that mesh with the planetary gear 10 and are arranged concentrically with each other around a vertical axis 1.
A lower grindstone 16 and an upper grindstone 18 facing each other are provided. The sun gear 12 is connected to a drive shaft 20 via a sun gear support plate 13, and the drive shaft 20 is configured to rotate about a shaft center 1 by a drive device (not shown).
Further, the internal gear 14 is connected to the main body 22 via the internal gear support plate 15.
The main body 22 is fixed to a base (not shown). The main body 22 has a recess 22a for accommodating the lower grindstone 16 on the upper surface, and the lower grindstone 16 having a central opening 16a is placed in the recess 22a via an appropriate insulating support material 24.

【0023】下側砥石16の上面には、遊星歯車10が
配置され、この遊星歯車10には貫通孔10aが設けら
れ、ほぼ直方体のワーク2がこの貫通孔10a内に保持
される。貫通孔10aの形状は、ワーク2が上下方向に
抵抗なく摺動するように、ほぼワーク2の外形と同一で
ある。貫通孔10aの数は、各遊星歯車10に1つだけ
でも良く、複数であっても良い。遊星歯車10の上部に
は中央開口部18aを有する上側砥石18が載せられ、
下側砥石16と上側砥石18とにより、ワーク2を挟持
している。下側砥石16と上側砥石18は、少なくとも
対向する面が砥粒を含む導電性砥石、好ましくは鋳鉄フ
ァイバボンドダイヤモンド砥石等であるのが好ましい。
下側砥石16と上側砥石18は、同一の砥石粒度であっ
ても、或いは異なる粒度であっても良い。
A planetary gear 10 is arranged on the upper surface of the lower grindstone 16, a through hole 10a is provided in the planetary gear 10, and a substantially rectangular parallelepiped workpiece 2 is held in the through hole 10a. The shape of the through hole 10a is substantially the same as the outer shape of the work 2 so that the work 2 can slide in the vertical direction without resistance. The number of the through holes 10a may be only one for each planetary gear 10 or may be plural. On the upper part of the planetary gear 10, an upper grindstone 18 having a central opening 18a is placed,
The work 2 is held between the lower grindstone 16 and the upper grindstone 18. It is preferable that the lower grindstone 16 and the upper grindstone 18 are conductive grindstones containing abrasive grains on at least opposing surfaces, and preferably cast iron fiber bond diamond grindstones.
The lower grindstone 16 and the upper grindstone 18 may have the same grindstone grain size or different grain sizes.

【0024】上述した構成により、駆動軸20を回転さ
せると、遊星歯車10は、自転しながら、太陽歯車12
のまわりを公転する。ワーク2には、上側砥石18の自
重が作用しているので、ワーク2は、遊星運動を繰り返
しながら、下側砥石16と上側砥石18とにより、研削
される。上述した構成と異なり、例えば太陽歯車12を
固定し内歯車14を駆動しても良く、或いは、周知のキ
ャリアを介して遊星歯車を駆動しても、或いは、下側砥
石16及び/又は上側砥石18を駆動しても良い。ま
た、上側砥石18を下方に押しつける周知の押付け装
置、例えば加圧シリンダ、又はジャッキ等を備え、押付
け圧力を調整できるようにしても良い。
When the drive shaft 20 is rotated by the above-mentioned structure, the planetary gear 10 rotates while the sun gear 12 rotates.
Revolve around. Since the weight of the upper grindstone 18 acts on the work 2, the work 2 is ground by the lower grindstone 16 and the upper grindstone 18 while repeating the planetary motion. Unlike the above-described configuration, for example, the sun gear 12 may be fixed and the internal gear 14 may be driven, or the planetary gear may be driven via a known carrier, or the lower grinding wheel 16 and / or the upper grinding wheel. 18 may be driven. Further, a well-known pressing device for pressing the upper grindstone 18 downward, for example, a pressure cylinder, a jack, or the like may be provided so that the pressing pressure can be adjusted.

【0025】太陽歯車10はそのピッチ円より大きい円
板部、すなわち太陽歯車支持板13と太陽歯車固定板2
1とで挟持される。また、内歯車14はそのピッチ円よ
り小さい開口部を有するリング部、すなわち内歯車支持
板15と内歯車固定板23とで挟持される。遊星歯車1
0はワーク2の厚さよりも薄く、遊星歯車10の歯先が
前記円板部及び前記リング部の両方で挟持され、これに
より遊星歯車10と下側砥石16及び上側砥石18との
間にそれぞれ一定の隙間が保持される。
The sun gear 10 has a disk portion larger than its pitch circle, that is, the sun gear support plate 13 and the sun gear fixing plate 2.
It is sandwiched between 1. Further, the internal gear 14 is sandwiched by a ring portion having an opening smaller than the pitch circle, that is, the internal gear support plate 15 and the internal gear fixing plate 23. Planetary gear 1
0 is thinner than the thickness of the work 2, and the tooth tips of the planetary gear 10 are clamped by both the disk portion and the ring portion, whereby the planetary gear 10 and the lower grinding wheel 16 and the upper grinding wheel 18 are respectively separated. A constant gap is maintained.

【0026】太陽歯車支持板13と駆動軸20との間、
及び内歯車支持板15と本体22との間には、それぞれ
上下方向位置を調整する手段、すなわちスペーサ25
a、25bが挿入され、この厚さを調整することにより
太陽歯車と内歯車の上下方向位置を調整することができ
る。なお、スペーサを用いずに、下側砥石16を上下に
移動する駆動装置を設けてもよい。
Between the sun gear support plate 13 and the drive shaft 20,
Between the inner gear support plate 15 and the main body 22, means for adjusting the vertical position, that is, the spacer 25 is provided.
By inserting a and 25b and adjusting the thickness, the vertical position of the sun gear and the internal gear can be adjusted. A drive device for moving the lower grindstone 16 up and down may be provided without using the spacer.

【0027】更に、遊星歯車10と下側砥石16及び上
側砥石18との間に弱導電性の切削液すなわちクーラン
トをそれぞれ供給する液供給手段が設けられる。この液
供給手段は、図2に示すように、前記リング部、すなわ
ち内歯車支持板15と内歯車固定板23の内面に設けら
れた円周方向溝15b、23bと、この円周方向溝15
b、23bから内歯車14の歯先まで通じる複数の半径
方向溝15c、23cとを有する。半径方向溝15c、
23cは遊星歯車10の歯先が干渉しないような形状に
なっており、クーラントの噴出口として役立つ。また、
内歯車14には円周方向溝15b、23bの間を連通さ
せるように複数の貫通孔14aが設けられる。更に、内
歯車固定板23は、円周方向溝23bにクーラントを供
給する供給口23aを備える。
Further, between the planetary gear 10 and the lower grindstone 16 and the upper grindstone 18, there are provided liquid supply means for respectively supplying a weakly conductive cutting liquid, that is, a coolant. As shown in FIG. 2, the liquid supply means includes circumferential grooves 15b and 23b provided on the inner surface of the ring portion, that is, the internal gear support plate 15 and the internal gear fixing plate 23, and the circumferential groove 15b.
b, 23b to the tooth tips of the internal gear 14 and a plurality of radial grooves 15c, 23c. Radial groove 15c,
Reference numeral 23c has a shape such that the tooth tips of the planetary gear 10 do not interfere with each other, and serves as a coolant ejection port. Also,
The internal gear 14 is provided with a plurality of through holes 14a so that the circumferential grooves 15b and 23b communicate with each other. Further, the internal gear fixing plate 23 has a supply port 23a for supplying the coolant to the circumferential groove 23b.

【0028】上述した構成により、供給口23aを介し
てクーラントを流すことにより、クーラントは図2に破
線で示すドーナツ状の円周方向溝15b、23bを流れ
ながら、噴出口すなわち半径方向溝15c、23cを通
り、遊星歯車10の上下面の隙間に均一に噴出される。
クーラントは、各噴出口から遊星歯車10の上下面の隙
間に供給された後、本体22の凹部22aの下部に設け
られた開口部22bを介してクーラント槽30に溜めら
れ、切屑、砥粒の破片等を除去し、循環ポンプ32によ
り再度供給口23aに供給される。かかるクーラント循
環系は、周知の手段、例えばOリング、パッキン等によ
り液密に構成されている。
With the above-described structure, by flowing the coolant through the supply port 23a, the coolant flows through the donut-shaped circumferential grooves 15b and 23b shown by the broken line in FIG. 23 c and is jetted out uniformly in the gap between the upper and lower surfaces of the planetary gear 10.
The coolant is supplied from the respective jet outlets to the gap between the upper and lower surfaces of the planetary gear 10, and then stored in the coolant tank 30 through the opening 22b provided in the lower portion of the recess 22a of the main body 22 to collect chips and abrasive grains. The debris and the like are removed, and the circulation pump 32 supplies the supply again to the supply port 23a. Such a coolant circulation system is liquid-tightly configured by a known means such as an O-ring and packing.

【0029】更に、遊星歯車10と下側砥石16及び上
側砥石18との間に電流をそれぞれ供給する給電手段を
備える。この給電手段は、太陽歯車12に周知の手段、
例えばボルト止めにより固定され、遊星歯車10に接触
する給電板26を有する。この給電板26はほぼ円形の
リン青銅の導電性金属板であり、その外周部は半径方向
のスリットにより複数の円弧部分に分割され、各円弧部
分は遊星歯車10に接触するように折り曲げられてい
る。従って、円弧部分の弾性により、給電板26は常に
遊星歯車10の周囲部分に接触している。給電板26は
後述する遊星歯車に設けられた電極に直接接触するのが
好ましいが、これに限られるものではない。また、給電
板26を上記構成と異なる構成、例えばスリットのない
完全な円板又はカップ状形とし、バネ等で下方に付勢す
るようにしても良い。
Further, power supply means for supplying a current between the planetary gear 10 and the lower grindstone 16 and the upper grindstone 18 is provided. This power feeding means is a means known to the sun gear 12,
For example, the power supply plate 26 is fixed by bolting and contacts the planetary gear 10. The power supply plate 26 is a substantially circular phosphor bronze conductive metal plate, the outer peripheral portion of which is divided into a plurality of arc portions by radial slits, and each arc portion is bent so as to contact the planetary gear 10. There is. Therefore, due to the elasticity of the arc portion, the power supply plate 26 is always in contact with the peripheral portion of the planetary gear 10. It is preferable that the power supply plate 26 directly contacts an electrode provided on a planetary gear described later, but the present invention is not limited to this. Further, the power feeding plate 26 may have a configuration different from the above configuration, for example, a perfect disc or a cup shape without slits, and may be biased downward by a spring or the like.

【0030】給電手段は、更に電源28を備え、下側砥
石16及び上側砥石18に+の電圧を印加し、給電板2
6を介して遊星歯車10に−の電圧を印加できるように
なっている。この電源28は、パルス電源或いはパルス
と直流を混在させた電源であるのが良い。電源28と上
側砥石18との接続は適当な電線により直接行われ、電
源28と下側砥石16との接続は、本体22に設けられ
た適当な電流導入端子29を介して接続される。図示の
ように、下側砥石16及び上側砥石18は、遊星歯車1
0、本体22、及び駆動軸20等と間隔を隔て、かつ下
側砥石16は絶縁支持材24で本体22と絶縁されてい
る。また、給電板26はブラシ27を介して電源28と
摺動的に接続されている。
The power feeding means is further provided with a power source 28, which applies a + voltage to the lower grinding wheel 16 and the upper grinding wheel 18 to supply the power feeding plate 2
A negative voltage can be applied to the planetary gear 10 via 6. The power source 28 may be a pulse power source or a power source in which pulse and DC are mixed. The power supply 28 and the upper grindstone 18 are directly connected by an appropriate electric wire, and the power supply 28 and the lower grindstone 16 are connected via an appropriate current introduction terminal 29 provided in the main body 22. As illustrated, the lower grindstone 16 and the upper grindstone 18 are the planetary gears 1
0, the main body 22, the drive shaft 20, and the like, and the lower grindstone 16 is insulated from the main body 22 by an insulating support material 24. The power supply plate 26 is slidably connected to a power source 28 via a brush 27.

【0031】上述した構成により、スパーク等の発生な
しに、下側砥石16及び上側砥石18に+の電圧を印加
し、給電板26を介して遊星歯車10に−の電圧を印加
することができる。図3は遊星歯車部分を詳細に示して
いる。図1及び図3からわかるように、遊星歯車10に
は、半径方向に長く、ワーク2よりも薄く、かつ遊星歯
車10よりも厚い電解ドレッシング用電極34がワーク
2と同様に埋設されている。この電極34の材質は遊星
歯車10よりも電気伝導性の高い材質、例えば銅で作ら
れ、遊星歯車10に設けられた貫通孔10bに嵌めら
れ、かつハンダ付け、ロウ付け等で遊星歯車10に接合
されている。電極34の面積は、下側砥石16及び上側
砥石18との間に適当な電流密度が発生するように定め
られる。また、電極34の形状は、遊星歯車の中心から
外方に広がる台形又は扇形が好ましい。これにより、電
流密度の集中度、電極面積の大きさ等をバランス良く構
成し、砥石表面に形成される絶縁膜の厚さを適度に維持
し、ダイヤモンド砥粒の突き出しを砥石前面に亘って均
一に確保することができる。また上下の砥石粒度が異な
る場合、電極面積を上下で相違させてもよい。更に、電
極34を使用せずに、遊星歯車10全体を適当な電気伝
導性材料で構成してもよく、あるいは電極34を遊星歯
車10の両面に接合させても良い。
With the above-described structure, a positive voltage can be applied to the lower grinding wheel 16 and the upper grinding wheel 18 and a negative voltage can be applied to the planetary gear 10 via the power feeding plate 26 without the occurrence of sparks or the like. .. FIG. 3 shows the planetary gear part in detail. As can be seen from FIGS. 1 and 3, in the planetary gear 10, an electrode 34 for electrolytic dressing, which is long in the radial direction, thinner than the work 2, and thicker than the planetary gear 10, is embedded similarly to the work 2. The electrode 34 is made of a material having higher electric conductivity than the planetary gear 10, for example, copper, is fitted in the through hole 10b provided in the planetary gear 10, and is soldered or brazed to the planetary gear 10. It is joined. The area of the electrode 34 is determined so that an appropriate current density is generated between the lower grindstone 16 and the upper grindstone 18. Further, the shape of the electrode 34 is preferably trapezoidal or fan-shaped which spreads outward from the center of the planetary gear. As a result, the degree of concentration of current density, the size of the electrode area, etc. are configured in a well-balanced manner, the thickness of the insulating film formed on the grindstone surface is maintained at an appropriate level, and the protrusion of diamond abrasive grains is evenly distributed over the front surface of the grindstone. Can be secured. Further, when the grain sizes of the upper and lower grindstones are different, the electrode areas may be different between the upper and lower sides. Furthermore, without using the electrode 34, the entire planetary gear 10 may be made of a suitable electrically conductive material, or the electrode 34 may be bonded to both surfaces of the planetary gear 10.

【0032】図4及び図5は、本発明による第2の実施
例を示している。この図において、図1〜図3と共通す
る部品は同じ番号で示す。図4は、第2実施例の平面図
であり、シリコンウエハすなわちワーク2を貫通孔10
a内に保持する第1の平歯車10が示されている。この
第1平歯車10は、その中心を貫通する軸40のまわり
に回転可能に取付けられ、これと噛み合う第2の平歯車
42により回転されるようになっている。第1平歯車1
0には、電極34が前述したように取付けられている。
4 and 5 show a second embodiment according to the present invention. In this figure, parts common to those in FIGS. 1 to 3 are indicated by the same numbers. FIG. 4 is a plan view of the second embodiment, in which the silicon wafer, that is, the work 2 is formed in the through hole 10.
A first spur gear 10 held in a is shown. The first spur gear 10 is rotatably mounted around a shaft 40 passing through its center and is rotated by a second spur gear 42 meshing with the shaft 40. 1st spur gear 1
Electrode 34 is attached to 0 as described above.

【0033】図5は、図4の側面断面図である。この図
において、ワーク2を挟持し互に対向する下側砥石16
及び上側砥石18が、本体22の上部にスペーサ25b
を介して水平に置かれている。本体22には、クーラン
トを溜める液槽が設けられ、このクーラントは本体内に
設けられたポンプ32により、軸40に設けられた開口
孔40a及び噴出口40bを介して、第1平歯車10と
下側砥石16及び上側砥石18との間に導電性液をそれ
ぞれ供給するようになっている。
FIG. 5 is a side sectional view of FIG. In this figure, the lower grindstones 16 that sandwich the workpiece 2 and face each other
And the upper grindstone 18 has a spacer 25b on the top of the main body 22.
Is laid horizontally through. A liquid tank for accumulating the coolant is provided in the main body 22, and the coolant is supplied to the first spur gear 10 through an opening hole 40a and an ejection port 40b provided in the shaft 40 by a pump 32 provided in the main body. A conductive liquid is supplied between the lower grindstone 16 and the upper grindstone 18.

【0034】更に、第1平歯車10の周囲には、本体2
2の上部にスペーサ25bを介してリング14′がリン
グ固定板23′により挟持されている。リング14′は
第2平歯車42側が切欠かれたC字状の環状板であり、
第2平歯車42よりも板厚が厚くなっている。リング固
定板23′の上部には、第1実施例と同様な給電板26
が固定され、この給電板26を介して第1平歯車10に
−の電圧を印加し、また、第1の実施例と同様に、下側
砥石16及び上側砥石18に+の電圧を印加できるよう
に給電手段を備えている。
Further, the main body 2 is provided around the first spur gear 10.
The ring 14 'is sandwiched by the ring fixing plate 23' on the upper part of the spacer 2 via the spacer 25b. The ring 14 'is a C-shaped annular plate with the second spur gear 42 side cut out,
The plate thickness is thicker than that of the second spur gear 42. Above the ring fixing plate 23 ', a power feeding plate 26 similar to that of the first embodiment is provided.
Is fixed, and a − voltage can be applied to the first spur gear 10 via the power supply plate 26, and a + voltage can be applied to the lower grindstone 16 and the upper grindstone 18 as in the first embodiment. Thus, the power supply means is provided.

【0035】上述した構成により、遊星歯車機構を用い
ることなく、簡単な構造で両面研削を行うこともでき
る。なお、駆動系は、上述した歯車に限られずプーリ
ー、摩擦車等を用いても良い。 実施例1 表1に示す実験装置、及び条件を用いて本発明による両
面研削を試験した。ここで、遊星歯車の寸法は、外径1
44mm、厚さ5mmであり、電極の寸法は、高さ46
mm、上辺3.5mm、下辺8.5mmの台形であり、
厚さは5.5mmであった。またワークとしてジルコニ
アを用い、その寸法は縦9mm、横30mm、高さ6m
mであった。試験結果を図6に示す。
With the above structure, it is possible to perform double-sided grinding with a simple structure without using a planetary gear mechanism. The drive system is not limited to the gears described above, and a pulley, a friction wheel, or the like may be used. Example 1 Double-sided grinding according to the present invention was tested using the experimental equipment and conditions shown in Table 1. Here, the size of the planetary gear is the outer diameter 1
The size of the electrode is 44 mm and the thickness is 5 mm.
mm, upper side 3.5 mm, lower side 8.5 mm trapezoid,
The thickness was 5.5 mm. Zirconia is used as the work, and its dimensions are 9 mm in length, 30 mm in width, and 6 m in height.
It was m. The test results are shown in FIG.

【0036】[0036]

【表1】 [Table 1]

【0037】図6は、コバルトボンド砥石によるジルコ
ニアの Elid 研削法による切削性を示す図であり、本発
明による切削性の変化(○印)と Elid 研削を使用しな
い場合の切削性の変化(●印)とを比較して示してい
る。Elid 研削を使用しない、すなわち電解を付与しな
い場合には、砥石面の目つぶれにより切削性が10分程
で落ち込み急激に切削性が悪化している。一方、 Elid
研削を使用した本発明の場合には、時間が経過しても切
削性が低下せず、切削性がほぼ一定となり、良好な研削
が維持されることがわかる。
FIG. 6 is a diagram showing the machinability of zirconia with a cobalt bond grindstone by the Elid grinding method. The machinability changes (circle) according to the present invention and the machinability changes when Elid grinding is not used (● (Indicated by a mark). When Elid grinding is not used, that is, when electrolysis is not applied, the grindability of the grindstone surface causes the machinability to drop in about 10 minutes, and the machinability sharply deteriorates. On the other hand, Elid
In the case of the present invention using grinding, it can be seen that the machinability does not decrease over time, the machinability becomes almost constant, and good grinding is maintained.

【0038】なお、切削性は Elid 研削を使用しない場
合の方が本発明の場合よりも高い値を示しているが、こ
れは試験条件、すなわち砥石の初期の目立て状態等が相
違していることによるものであった。また、切削性は図
から明らかなように、約1μm/分以上、すなわち、例
えば10分間で10μmに相当するものであり、通常の
研磨に比較して1桁以上高い結果が得られた。また、得
られた表面粗さは、両面共にRmax 0.08μmの良好
な鏡面であった。
The machinability is higher in the case where Elid grinding is not used than in the case of the present invention, but this is because the test conditions, that is, the initial setting condition of the grindstone, etc. are different. It was due to. Further, as is clear from the figure, the machinability corresponds to about 1 μm / min or more, that is, 10 μm in 10 minutes, for example, and a result higher by one digit or more than that obtained by ordinary polishing was obtained. The surface roughness obtained was a good mirror surface with Rmax of 0.08 μm on both surfaces.

【0039】なお、従来の Elid 研削法では、弱導電性
のクーラントを用いているが、本発明では、ある程度電
解性の高いクーラントを使用することができた。これ
は、電解電流値の低下がさほど大きく現れなかったこと
により、加工中の絶縁被膜が比較的薄く形成されている
ことによるものである。つまり、本発明で使用した砥石
が通常の幅の狭い砥石と異なり大口径であり、また広い
面積に均一に電解がかかり、更に上下砥石とワーク間で
常に荷重をかけながら電解ドレッシングしているため、
適当な厚さの絶縁被覆が形成され、維持されるためであ
る。
In the conventional Elid grinding method, a weakly conductive coolant is used, but in the present invention, a coolant having a high degree of electrolysis can be used. This is because the decrease in the electrolytic current value did not appear so large that the insulating coating being processed was formed relatively thin. That is, since the grindstone used in the present invention has a large diameter unlike a normal narrow grindstone, and the electrolysis is uniformly applied to a wide area, and the electrolytic dressing is performed while always applying a load between the upper and lower grindstones and the work. ,
This is because an insulating coating having an appropriate thickness is formed and maintained.

【0040】[0040]

【発明の効果】上述した本発明の方法及び装置によれ
ば、第1歯車と下側砥石及び上側砥石との間に導電性液
がそれぞれ供給され、この導電性液を介して第1歯車と
下側砥石及び上側砥石との間に電流がそれぞれ供給さ
れ、これにより、下側砥石及び上側砥石の対向する加工
面が電解ドレッシングされる。従って下側砥石及び上側
砥石の両方を Elid 研削法により電解ドレッシングしな
がら、ワークの両面を研削することができる。従って、
砥石のドレッシングが研削加工中に行われるので、ドレ
ッシングにより加工が中断されることがなく、かつ砥石
の目詰まりが起こることもない。これにより、従来の両
面研磨に比較すると1桁以上高負荷の研削ができると共
に、面粗さが小さい鏡面仕上げが可能となる。
According to the above-described method and apparatus of the present invention, the conductive liquid is supplied between the first gear and the lower grindstone and the upper grindstone, respectively. Electric currents are respectively supplied between the lower grindstone and the upper grindstone, so that the facing processing surfaces of the lower grindstone and the upper grindstone are electrolytically dressed. Therefore, both sides of the work can be ground while electrolytically dressing both the lower grindstone and the upper grindstone by the Elid grinding method. Therefore,
Since the dressing of the grindstone is performed during the grinding process, the dressing does not interrupt the process and the grindstone is not clogged. As a result, compared with the conventional double-sided polishing, it is possible to perform high-load grinding by one digit or more, and it is possible to perform mirror-finishing with a small surface roughness.

【0041】更に、第1歯車が遊星歯車であり、第2歯
車が互い同心に配置された太陽歯車及び内歯車である場
合には、下側砥石及び上側砥石との間に絶縁物等を介在
させることなく、遊星歯車の上下面に一定の隙間が保持
されるので、磨耗による隙間変化が生じるおそれがな
く、かつこの隙間に導電性液を円滑に流すことができ
る。
Further, when the first gear is a planetary gear and the second gear is a sun gear and an internal gear arranged concentrically with each other, an insulator or the like is interposed between the lower and upper grindstones. Since a constant gap is maintained on the upper and lower surfaces of the planetary gear without causing such a change, there is no risk of a change in the gap due to wear, and the conductive liquid can be smoothly flown into this gap.

【0042】また、遊星歯車に接触する給電板を有する
ことにより、遊星歯車への給電を断続なく行うことがで
きる。更に、遊星歯車に、半径方向に長く、ワークより
も薄く遊星歯車よりも厚い電解ドレッシング用電極が埋
設される、ことにより、電解ドレッシングを行う電流密
度を高密度に保持することができる。
Further, by providing the power feeding plate which is in contact with the planetary gear, it is possible to feed power to the planetary gear without interruption. Further, the electrode for electrolytic dressing which is long in the radial direction and is thinner than the work and thicker than the planetary gear is embedded in the planetary gear, whereby the current density for electrolytically dressing can be maintained at a high density.

【0043】また、前記リング部の内面に設けた溝を介
して導電性液を流すことにより、遊星歯車の上下面の隙
間に均一に供給することができ、遊星歯車全体を導電性
液に沈める必要がない。従って、 Elid 研削法を両面研
削に適用し、電解ドレッシングを用いた両面研削方法及
び装置を提供することができる。
Further, by flowing the conductive liquid through the groove provided on the inner surface of the ring portion, the conductive liquid can be uniformly supplied to the gap between the upper and lower surfaces of the planetary gear, and the whole planetary gear is submerged in the conductive liquid. No need. Therefore, the Elid grinding method can be applied to double-sided grinding to provide a double-sided grinding method and apparatus using electrolytic dressing.

【0044】本発明を直方体形状のワークに対して主と
して説明したが、円形のワーク、特にシリコンウエハの
両面研削に適用できることは明らかである。
Although the present invention has been mainly described with respect to a rectangular parallelepiped shape work, it is obvious that the present invention can be applied to double-sided grinding of a circular work, especially a silicon wafer.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明による両面研削装置の平面図である。FIG. 1 is a plan view of a double-sided grinding device according to the present invention.

【図2】図1の線A−Aにおける断面図である。2 is a cross-sectional view taken along the line AA in FIG.

【図3】遊星歯車の部分を示す詳細図である。FIG. 3 is a detailed view showing a portion of a planetary gear.

【図4】本発明による第2の両面研削装置の平面図であ
る。
FIG. 4 is a plan view of a second double-sided grinding device according to the present invention.

【図5】図4の側面断面図である。5 is a side sectional view of FIG.

【図6】本発明による試験結果を示す図である。FIG. 6 is a diagram showing test results according to the present invention.

【図7】Elid 研削法における Elid サイクルを示す説
明図である。
FIG. 7 is an explanatory diagram showing an Elid cycle in an Elid grinding method.

【符号の説明】[Explanation of symbols]

2 ワーク 10 遊星歯車 12 太陽歯車 14 内歯車 16 下側砥石 18 上側砥石 20 駆動軸 22 本体 24 絶縁支持材 26 給電板 27 ブラシ 28 電源 34 電極 2 Work 10 Planetary Gear 12 Sun Gear 14 Internal Gear 16 Lower Grinding Stone 18 Upper Grinding Stone 20 Drive Shaft 22 Main Body 24 Insulation Supporting Material 26 Power Supply Plate 27 Brush 28 Power Supply 34 Electrode

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】 ワークを第1の歯車に設けた貫通孔内に
保持し、 前記第1歯車に噛合する第2の歯車の回転により前記第
1歯車を駆動し、 前記ワークを互に対向する下側砥石及び上側砥石により
挟持し、 前記第1歯車と下側砥石及び上側砥石との間に導電性液
をそれぞれ供給し、 前記第2歯車と下側砥石及び上側砥石との間に電流をそ
れぞれ供給することからなり、 これにより、下側砥石及び上側砥石の対向する加工面を
電解ドレッシングしながら、ワークの両面を研削加工す
ることを特徴とする電解ドレッシングを用いた両面研削
方法。
1. A work is held in a through hole provided in a first gear, and the first gear is driven by the rotation of a second gear meshing with the first gear so that the works face each other. It is sandwiched between a lower grindstone and an upper grindstone, a conductive liquid is supplied between the first gear and the lower grindstone and the upper grindstone, and an electric current is applied between the second gear and the lower grindstone and the upper grindstone. A double-sided grinding method using electrolytic dressing, characterized in that both sides of the work are ground while electrolytically dressing the facing surfaces of the lower grindstone and the upper grindstone.
【請求項2】 前記第1歯車は遊星歯車であり、前記第
2歯車は互い同心に配置された太陽歯車及び内歯車であ
る、ことを特徴とする請求項1に記載の方法。
2. The method according to claim 1, wherein the first gear is a planetary gear and the second gear is a sun gear and an internal gear arranged concentrically with each other.
【請求項3】 ワークを貫通孔内に保持する第1の歯車
と、 前記第1歯車に噛合し前記第1歯車を駆動する第2の歯
車と、 前記ワークを挟持し互に対向する下側砥石及び上側砥石
と、 前記第1歯車と下側砥石及び上側砥石との間に導電性液
をそれぞれ供給する液供給手段と、 前記第1歯車と下側砥石及び上側砥石との間に電流をそ
れぞれ供給する給電手段とからなり、 これにより、下側砥石及び上側砥石の対向する加工面を
電解ドレッシングしながら、ワークの両面を研削加工す
ることを特徴とする電解ドレッシングを用いた両面研削
装置。
3. A first gear that holds a work in a through hole, a second gear that meshes with the first gear and drives the first gear, and a lower side that sandwiches the work and faces each other. A grindstone and an upper grindstone, a liquid supply unit that respectively supplies a conductive liquid between the first gear and the lower grindstone and the upper grindstone, and an electric current is supplied between the first gear, the lower grindstone, and the upper grindstone. A double-sided grinding machine using electrolytic dressing, characterized in that it is configured to supply power to each of them, and grinds both sides of the work while electrolytically dressing the facing surfaces of the lower grindstone and the upper grindstone.
【請求項4】 前記第1歯車は遊星歯車であり、前記第
2歯車は互い同心に配置された太陽歯車及び内歯車であ
る、ことを特徴とする請求項3に記載の装置。
4. The apparatus according to claim 3, wherein the first gear is a planetary gear, and the second gear is a sun gear and an internal gear arranged concentrically with each other.
【請求項5】 前記太陽歯車はそのピッチ円より大きい
円板部で挟持され、前記内歯車はそのピッチ円より小さ
い開口部を有するリング部で挟持され、前記遊星歯車は
ワークよりも薄くその歯先が前記円板部及び前記リング
部の両方で挟持され、 これにより前記遊星歯車と前記下側砥石及び上側砥石と
の間にそれぞれ一定の隙間が保持される、ことを特徴と
する請求項4に記載の装置。
5. The sun gear is clamped by a disc portion larger than its pitch circle, the internal gear is clamped by a ring portion having an opening smaller than its pitch circle, and the planetary gear is thinner than a workpiece. 5. The tip is clamped by both the disc portion and the ring portion, whereby a constant gap is maintained between the planetary gear and the lower grindstone and the upper grindstone, respectively. The device according to.
【請求項6】 前記給電手段は、前記太陽歯車に固定さ
れ、前記遊星歯車に接触する給電板を有する、ことを特
徴とする請求項5に記載の装置。
6. The apparatus according to claim 5, wherein the power feeding means has a power feeding plate fixed to the sun gear and in contact with the planetary gear.
【請求項7】 前記遊星歯車には、半径方向に長く、ワ
ークよりも薄く遊星歯車よりも厚い電解ドレッシング用
電極が埋設される、ことを特徴とする請求項6に記載の
装置。
7. The apparatus according to claim 6, wherein an electrode for electrolytic dressing, which is long in the radial direction and is thinner than the work and thicker than the planet gear, is embedded in the planetary gear.
【請求項8】 前記液供給手段は、前記リング部の内面
に設けられた円周方向溝と、該円周方向溝から前記内歯
車の歯先まで通じる複数の半径方向溝とを有する、こと
を特徴とする請求項7に記載の装置。
8. The liquid supply means has a circumferential groove provided on the inner surface of the ring portion, and a plurality of radial grooves communicating from the circumferential groove to the addendum of the internal gear. The device according to claim 7, characterized in that
【請求項9】 前記両面研削装置は、前記太陽歯車と内
歯車及び下側砥石の上下方向位置を相対的に調整する調
整手段を更に備える、ことを特徴とする請求項8に記載
の装置。
9. The apparatus according to claim 8, wherein the double-sided grinding apparatus further comprises adjusting means for relatively adjusting the vertical positions of the sun gear, the internal gear, and the lower grindstone.
JP22756591A 1991-09-09 1991-09-09 Double-side grinding machine using electrolytic dressing Expired - Lifetime JP3233954B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22756591A JP3233954B2 (en) 1991-09-09 1991-09-09 Double-side grinding machine using electrolytic dressing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22756591A JP3233954B2 (en) 1991-09-09 1991-09-09 Double-side grinding machine using electrolytic dressing

Publications (2)

Publication Number Publication Date
JPH0569295A true JPH0569295A (en) 1993-03-23
JP3233954B2 JP3233954B2 (en) 2001-12-04

Family

ID=16862909

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22756591A Expired - Lifetime JP3233954B2 (en) 1991-09-09 1991-09-09 Double-side grinding machine using electrolytic dressing

Country Status (1)

Country Link
JP (1) JP3233954B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011035023A (en) * 2009-07-30 2011-02-17 Nippon Steel Corp Polishing method and polishing apparatus of semiconductor substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011035023A (en) * 2009-07-30 2011-02-17 Nippon Steel Corp Polishing method and polishing apparatus of semiconductor substrate

Also Published As

Publication number Publication date
JP3233954B2 (en) 2001-12-04

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