JPH0568825B2 - - Google Patents

Info

Publication number
JPH0568825B2
JPH0568825B2 JP60290304A JP29030485A JPH0568825B2 JP H0568825 B2 JPH0568825 B2 JP H0568825B2 JP 60290304 A JP60290304 A JP 60290304A JP 29030485 A JP29030485 A JP 29030485A JP H0568825 B2 JPH0568825 B2 JP H0568825B2
Authority
JP
Japan
Prior art keywords
liquid
chamber
arc chamber
arc
annular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP60290304A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61155999A (ja
Inventor
Jooberu Aan
Emu Kamu Deibitsudo
Jei Deii Hoosuden Ansonii
Pii Harupin Nikorasu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOOTETSUKU IND Ltd
Original Assignee
BOOTETSUKU IND Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOOTETSUKU IND Ltd filed Critical BOOTETSUKU IND Ltd
Publication of JPS61155999A publication Critical patent/JPS61155999A/ja
Publication of JPH0568825B2 publication Critical patent/JPH0568825B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/24—Means for obtaining or maintaining the desired pressure within the vessel
    • H01J61/28—Means for producing, introducing, or replenishing gas or vapour during operation of the lamp
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/52—Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space

Landscapes

  • Plasma Technology (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)
JP60290304A 1984-12-24 1985-12-23 高光度輻射を行なう装置 Granted JPS61155999A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CA000470997A CA1239437A (en) 1984-12-24 1984-12-24 High intensity radiation method and apparatus having improved liquid vortex flow
CA470997 1984-12-24

Publications (2)

Publication Number Publication Date
JPS61155999A JPS61155999A (ja) 1986-07-15
JPH0568825B2 true JPH0568825B2 (ref) 1993-09-29

Family

ID=4129455

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60290304A Granted JPS61155999A (ja) 1984-12-24 1985-12-23 高光度輻射を行なう装置

Country Status (6)

Country Link
US (1) US4700102A (ref)
EP (1) EP0186879B1 (ref)
JP (1) JPS61155999A (ref)
CN (1) CN1007561B (ref)
CA (1) CA1239437A (ref)
DE (1) DE3583497D1 (ref)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4937490A (en) * 1988-12-19 1990-06-26 Vortek Industries Ltd. High intensity radiation apparatus and fluid recirculating system therefor
US5561735A (en) * 1994-08-30 1996-10-01 Vortek Industries Ltd. Rapid thermal processing apparatus and method
US5556791A (en) * 1995-01-03 1996-09-17 Texas Instruments Incorporated Method of making optically fused semiconductor powder for solar cells
GB9506010D0 (en) * 1995-03-23 1995-08-23 Anderson John E Electromagnetic energy directing method and apparatus
CA2310883A1 (en) 1999-06-07 2000-12-07 Norman L. Arrison Method and apparatus for fracturing brittle materials by thermal stressing
US6912356B2 (en) * 1999-06-07 2005-06-28 Diversified Industries Ltd. Method and apparatus for fracturing brittle materials by thermal stressing
US6621199B1 (en) 2000-01-21 2003-09-16 Vortek Industries Ltd. High intensity electromagnetic radiation apparatus and method
JP2005515425A (ja) 2001-12-26 2005-05-26 ボルテック インダストリーズ リミテッド 温度測定および熱処理方法およびシステム
KR20120045040A (ko) 2002-12-20 2012-05-08 맷슨 테크날러지 캐나다 인코퍼레이티드 피가공물 지지 방법
WO2005059991A1 (en) 2003-12-19 2005-06-30 Mattson Technology Canada Inc. Apparatuses and methods for suppressing thermally induced motion of a workpiece
US7781947B2 (en) 2004-02-12 2010-08-24 Mattson Technology Canada, Inc. Apparatus and methods for producing electromagnetic radiation
US20050180141A1 (en) * 2004-02-13 2005-08-18 Norman Arrison Protection device for high intensity radiation sources
JP5967859B2 (ja) 2006-11-15 2016-08-10 マトソン テクノロジー、インコーポレイテッド 熱処理中の被加工物を支持するシステムおよび方法
CN102089873A (zh) 2008-05-16 2011-06-08 加拿大马特森技术有限公司 工件破损防止方法及设备
EA201391270A1 (ru) 2011-03-10 2014-08-29 Месокоут, Инк. Способ и устройство для плакирования металлических изделий
US9196760B2 (en) 2011-04-08 2015-11-24 Ut-Battelle, Llc Methods for producing complex films, and films produced thereby
JP5960846B2 (ja) * 2012-02-24 2016-08-02 マトソン テクノロジー、インコーポレイテッド 電磁放射を発生させるための装置及び方法
BR112015023290A2 (pt) 2013-03-15 2017-07-18 Mesocoat Inc pó de aspersão térmica, método de fabricação de um pó de aspersão térmica, revestimento por aspersão térmica formado de um pó de aspersão térmica, e, método de formação de um revestimento por aspersão térmica em um substrato

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3292028A (en) * 1962-06-20 1966-12-13 Giannini Scient Corp Gas vortex-stabilized light source
US3405305A (en) * 1964-12-28 1968-10-08 Giannini Scient Corp Vortex-stabilized radiation source with a hollowed-out electrode
US3366815A (en) * 1965-12-29 1968-01-30 Union Carbide Corp High pressure arc cooled by a thin film of liquid on the wall of the envelope
US4027185A (en) * 1974-06-13 1977-05-31 Canadian Patents And Development Limited High intensity radiation source
JPS5340274A (en) * 1976-09-27 1978-04-12 Stanley Electric Co Ltd Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor

Also Published As

Publication number Publication date
CA1239437A (en) 1988-07-19
EP0186879A3 (en) 1988-11-17
EP0186879B1 (en) 1991-07-17
JPS61155999A (ja) 1986-07-15
EP0186879A2 (en) 1986-07-09
US4700102A (en) 1987-10-13
DE3583497D1 (de) 1991-08-22
CN1007561B (zh) 1990-04-11
CN85109598A (zh) 1986-07-16

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Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees