JPH0567716B2 - - Google Patents
Info
- Publication number
- JPH0567716B2 JPH0567716B2 JP62131500A JP13150087A JPH0567716B2 JP H0567716 B2 JPH0567716 B2 JP H0567716B2 JP 62131500 A JP62131500 A JP 62131500A JP 13150087 A JP13150087 A JP 13150087A JP H0567716 B2 JPH0567716 B2 JP H0567716B2
- Authority
- JP
- Japan
- Prior art keywords
- copper
- diaphragm
- electrolytic copper
- cathode
- purity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 61
- 229910052802 copper Inorganic materials 0.000 claims description 58
- 239000010949 copper Substances 0.000 claims description 58
- 238000005868 electrolysis reaction Methods 0.000 claims description 16
- 239000003292 glue Substances 0.000 claims description 14
- 239000003792 electrolyte Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 9
- 229910052709 silver Inorganic materials 0.000 claims description 9
- 229910052717 sulfur Inorganic materials 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 12
- 239000012535 impurity Substances 0.000 description 10
- 239000004744 fabric Substances 0.000 description 6
- 239000006259 organic additive Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 238000007670 refining Methods 0.000 description 4
- 238000011109 contamination Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000008151 electrolyte solution Substances 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910000365 copper sulfate Inorganic materials 0.000 description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- IDCBOTIENDVCBQ-UHFFFAOYSA-N TEPP Chemical compound CCOP(=O)(OCC)OP(=O)(OCC)OCC IDCBOTIENDVCBQ-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 229940112669 cuprous oxide Drugs 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Electrolytic Production Of Metals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62131500A JPS63297583A (ja) | 1987-05-29 | 1987-05-29 | 高純度電気銅製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62131500A JPS63297583A (ja) | 1987-05-29 | 1987-05-29 | 高純度電気銅製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63297583A JPS63297583A (ja) | 1988-12-05 |
JPH0567716B2 true JPH0567716B2 (ko) | 1993-09-27 |
Family
ID=15059465
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62131500A Granted JPS63297583A (ja) | 1987-05-29 | 1987-05-29 | 高純度電気銅製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63297583A (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4680325B2 (ja) | 2008-09-30 | 2011-05-11 | Jx日鉱日石金属株式会社 | 高純度銅又は高純度銅合金スパッタリングターゲット、同スパッタリングターゲットの製造方法及び高純度銅又は高純度銅合金スパッタ膜 |
US20110123389A1 (en) | 2008-09-30 | 2011-05-26 | Jx Nippon Mining & Metals Corporation | High Purity Copper and Method of Producing High Purity Copper Based on Electrolysis |
JP6600514B2 (ja) * | 2015-09-04 | 2019-10-30 | 国立大学法人秋田大学 | 銅の電解精製装置および電解精製方法 |
CN107059012A (zh) * | 2017-05-02 | 2017-08-18 | 广州合凯环保科技有限公司 | 一种电解反应系统、酸性蚀刻液再生及提铜工艺 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5690993A (en) * | 1979-12-21 | 1981-07-23 | Furukawa Electric Co Ltd:The | Electrolytic refining of copper |
JPS5716187A (en) * | 1980-06-20 | 1982-01-27 | Furukawa Electric Co Ltd:The | Electrolytic refinery of copper |
JPS6184389A (ja) * | 1984-09-28 | 1986-04-28 | Sumitomo Metal Mining Co Ltd | 高純度電気銅の製造方法 |
-
1987
- 1987-05-29 JP JP62131500A patent/JPS63297583A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5690993A (en) * | 1979-12-21 | 1981-07-23 | Furukawa Electric Co Ltd:The | Electrolytic refining of copper |
JPS5716187A (en) * | 1980-06-20 | 1982-01-27 | Furukawa Electric Co Ltd:The | Electrolytic refinery of copper |
JPS6184389A (ja) * | 1984-09-28 | 1986-04-28 | Sumitomo Metal Mining Co Ltd | 高純度電気銅の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS63297583A (ja) | 1988-12-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7648621B2 (en) | Copper electroplating method, pure copper anode for copper electroplating, and semiconductor wafer plated thereby with little particle adhesion | |
US3928153A (en) | Electrowinning process | |
US4292145A (en) | Electrodeposition of molten silicon | |
JPS6353275B2 (ko) | ||
JPH0567716B2 (ko) | ||
KR100298012B1 (ko) | 전해에의한금속박제조방법 | |
US2923671A (en) | Copper electrodeposition process and anode for use in same | |
JPS6184389A (ja) | 高純度電気銅の製造方法 | |
US4164456A (en) | Electrolytic process | |
JPH0768627B2 (ja) | 高純度銅の製造方法 | |
JP2004143478A (ja) | 酸性銅めっき方法および酸性銅めっき装置 | |
JPH034629B2 (ko) | ||
JPH055903B2 (ko) | ||
JP2623267B2 (ja) | 低銀品位の高純度電気銅の製造法 | |
CA2686490C (en) | Method for improving nickel cathode morphology | |
US2660555A (en) | Process of and electrolyte for refining copper | |
KR100349445B1 (ko) | 고순도 전기동의 전해장치 | |
JP2594799B2 (ja) | 低銀品位の高純度電気銅の製造法 | |
US2673837A (en) | Electrolytic production of fluoborates | |
JPH0423000B2 (ko) | ||
JPS6133918B2 (ko) | ||
US3300397A (en) | Electrolytic production of metallic fluoborates | |
US4243499A (en) | Process for electrolytic recovery of zinc from zinc sulfate solutions | |
US5013413A (en) | Apparatus for the continuous production of a polyvalent metal | |
JP2611399B2 (ja) | アノードケース |