JPH0564406B2 - - Google Patents
Info
- Publication number
- JPH0564406B2 JPH0564406B2 JP60161926A JP16192685A JPH0564406B2 JP H0564406 B2 JPH0564406 B2 JP H0564406B2 JP 60161926 A JP60161926 A JP 60161926A JP 16192685 A JP16192685 A JP 16192685A JP H0564406 B2 JPH0564406 B2 JP H0564406B2
- Authority
- JP
- Japan
- Prior art keywords
- container
- plasma generation
- ion source
- generation container
- permanent magnet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000463 material Substances 0.000 claims description 7
- 239000004020 conductor Substances 0.000 claims 2
- 230000005389 magnetism Effects 0.000 claims 1
- 230000006866 deterioration Effects 0.000 description 4
- 239000002826 coolant Substances 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 238000010891 electric arc Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60161926A JPS6224537A (ja) | 1985-07-24 | 1985-07-24 | イオン源 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60161926A JPS6224537A (ja) | 1985-07-24 | 1985-07-24 | イオン源 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6224537A JPS6224537A (ja) | 1987-02-02 |
JPH0564406B2 true JPH0564406B2 (fr) | 1993-09-14 |
Family
ID=15744660
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60161926A Granted JPS6224537A (ja) | 1985-07-24 | 1985-07-24 | イオン源 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6224537A (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2540492B2 (ja) * | 1986-01-16 | 1996-10-02 | 日新電機株式会社 | イオン源用ア−クチヤンバ−装置 |
JPH01246756A (ja) * | 1988-03-29 | 1989-10-02 | Mitsubishi Electric Corp | イオン源装置 |
JP5257399B2 (ja) * | 2010-04-16 | 2013-08-07 | 日新イオン機器株式会社 | イオン源及びイオン注入装置 |
-
1985
- 1985-07-24 JP JP60161926A patent/JPS6224537A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6224537A (ja) | 1987-02-02 |
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