JPH0563898B2 - - Google Patents
Info
- Publication number
- JPH0563898B2 JPH0563898B2 JP29534186A JP29534186A JPH0563898B2 JP H0563898 B2 JPH0563898 B2 JP H0563898B2 JP 29534186 A JP29534186 A JP 29534186A JP 29534186 A JP29534186 A JP 29534186A JP H0563898 B2 JPH0563898 B2 JP H0563898B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- deflection
- ion beam
- deflected
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 56
- 150000002500 ions Chemical class 0.000 description 11
- 238000010586 diagram Methods 0.000 description 6
- 238000005468 ion implantation Methods 0.000 description 6
- 239000007943 implant Substances 0.000 description 4
- 238000002513 implantation Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29534186A JPS63148526A (ja) | 1986-12-10 | 1986-12-10 | イオンビーム注入装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29534186A JPS63148526A (ja) | 1986-12-10 | 1986-12-10 | イオンビーム注入装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63148526A JPS63148526A (ja) | 1988-06-21 |
JPH0563898B2 true JPH0563898B2 (enrdf_load_html_response) | 1993-09-13 |
Family
ID=17819359
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP29534186A Granted JPS63148526A (ja) | 1986-12-10 | 1986-12-10 | イオンビーム注入装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63148526A (enrdf_load_html_response) |
-
1986
- 1986-12-10 JP JP29534186A patent/JPS63148526A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS63148526A (ja) | 1988-06-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS62295347A (ja) | イオンビ−ム高速平行走査装置 | |
GB1286454A (en) | Surface potential analysis by electron beams | |
JPS62190641A (ja) | 試料上での二次粒子の検知方法および装置 | |
US4626690A (en) | Apparatus for chopping a charged particle beam | |
JPH0563898B2 (enrdf_load_html_response) | ||
JP2714009B2 (ja) | 荷電ビーム装置 | |
JPH024441Y2 (enrdf_load_html_response) | ||
JPS637024B2 (enrdf_load_html_response) | ||
JPS6324617Y2 (enrdf_load_html_response) | ||
JPS61206152A (ja) | イオン注入装置 | |
US4401995A (en) | Chart recorder recording method and apparatus | |
JP3379128B2 (ja) | イオン注入装置 | |
JP3416998B2 (ja) | イオン注入装置 | |
JPH02145950A (ja) | X線光電子分析装置 | |
JPS6212624B2 (enrdf_load_html_response) | ||
JPS60240044A (ja) | 電子ビ−ムパルス発生方式 | |
JPH0563895B2 (enrdf_load_html_response) | ||
JPH0563897B2 (enrdf_load_html_response) | ||
JPH024442Y2 (enrdf_load_html_response) | ||
JP2861030B2 (ja) | イオン注入装置 | |
EP0183259B1 (en) | Image tube circuit | |
JPH02121252A (ja) | 荷電粒子ビーム複合装置 | |
JPS625158A (ja) | 二次イオン質量分析装置 | |
JPH0758297B2 (ja) | 非接触電位測定装置 | |
JPS62172649A (ja) | 集束イオンビ−ム装置 |