JPH0563309A - Semiconductor laser device - Google Patents

Semiconductor laser device

Info

Publication number
JPH0563309A
JPH0563309A JP3223191A JP22319191A JPH0563309A JP H0563309 A JPH0563309 A JP H0563309A JP 3223191 A JP3223191 A JP 3223191A JP 22319191 A JP22319191 A JP 22319191A JP H0563309 A JPH0563309 A JP H0563309A
Authority
JP
Japan
Prior art keywords
chip
semiconductor laser
substrate
laser device
transparent plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3223191A
Other languages
Japanese (ja)
Inventor
Eizo Tanabe
英三 田辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP3223191A priority Critical patent/JPH0563309A/en
Publication of JPH0563309A publication Critical patent/JPH0563309A/en
Pending legal-status Critical Current

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  • Semiconductor Lasers (AREA)
  • Light Receiving Elements (AREA)

Abstract

PURPOSE:To make the title semiconductor laser device compact and lightweight. CONSTITUTION:The title semiconductor laser device is proved with a laser beams monitoring PD 2 formed on a Si substrate 12, an LD chip 1 and the electrodes 13, 14 required for the LD chip 1 provided on the Si substrate 12 as well as a common electrode 16 formed on the whole rear region of the Si substrate 12. Furthermore, a transparent plate 17 transmitting the outgoing laser beams is fixed to the stepped end face on the laser beam outgoing side end of the Si substrate 12 while the space between the LD chip 1 and the transparent plate 17 as well as the whole surface of the LD chip 1 and the PD 2 is covered with a transparent region 18 so that the title compact and lightweight semiconductor laser device may be manufactured at low cost without using any heavy parts at all.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は簡単な構造を持つ半導体
レーザ装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor laser device having a simple structure.

【0002】[0002]

【従来の技術】半導体レーザ装置はレーザディスクやコ
ンパクトディスクプレイヤー等の光ヘッドの光源として
用いられており、その構造の一例を図3に示す。図3は
従来の半導体レーザ装置の一部剥離斜視図であり、レー
ザダイオード(以下LDと記す)チップ1は、その出力
をモニタするフォトダイオード(以下PDと記す)2を
取り付けたサブマウント3の上に半田付けされている。
サブマウント3はLDチップ1の動作時のジュール熱を
放散させるために、金属ベース4上に一体化されている
ヒートシンク5に銀ペースト等で接着される。LDチッ
プ1とPD2は、それぞれの一つの端子が共通ポスト6
に接続され、他方の端子はそれぞれのポスト7,8へワ
イヤ接続される。そしてLDチップ1とPD2等は金属
ベース4上で、ガラス窓9を有する金属キャン10内に
密封されている。金属ベース4の周縁には、幾つかの切
り欠き11を形成して、半導体レーザ装置を取り付ける
ときの位置決めとして利用している。即ち、例えば半導
体レーザ装置を光ヘッド等に用いる場合、その光ヘッド
固有の治具に、金属ベース4を取り付け、その治具を動
かすことにより、必要な光学的調整を行なうことができ
る。
2. Description of the Related Art A semiconductor laser device is used as a light source of an optical head such as a laser disk or a compact disk player, and an example of its structure is shown in FIG. FIG. 3 is a partially peeled perspective view of a conventional semiconductor laser device. A laser diode (hereinafter, referred to as LD) chip 1 is provided with a photodiode (hereinafter, referred to as PD) 2 for monitoring an output of the sub-mount 3. Soldered on.
The submount 3 is adhered to the heat sink 5 integrated on the metal base 4 with silver paste or the like in order to dissipate the Joule heat during the operation of the LD chip 1. The LD chip 1 and the PD 2 each have one common terminal 6
, And the other terminal is wire connected to the respective posts 7, 8. Then, the LD chip 1 and the PD 2 are sealed on the metal base 4 in a metal can 10 having a glass window 9. Several notches 11 are formed on the periphery of the metal base 4 and are used as positioning when mounting the semiconductor laser device. That is, for example, when the semiconductor laser device is used for an optical head or the like, the required optical adjustment can be performed by attaching the metal base 4 to a jig specific to the optical head and moving the jig.

【0003】[0003]

【発明が解決しようとする課題】以上のような従来の半
導体レーザ装置についての問題は次の点である。光ヘッ
ド等の半導体レーザ装置が適用される機器は、小形、軽
量化が進められており、半導体レーザ装置自体も小形、
軽量化の必要性が生じている。これに対して、従来の半
導体レーザ装置の大きさや重量の大部分は、金属ベース
4と金属キャン10が占めており、これらを小形、軽量
化するのは、ほぼ限界に達している。
The problems with the conventional semiconductor laser device as described above are as follows. The equipment to which the semiconductor laser device such as an optical head is applied is being made smaller and lighter, and the semiconductor laser device itself is also small,
There is a need for weight reduction. On the other hand, most of the size and weight of the conventional semiconductor laser device is occupied by the metal base 4 and the metal can 10, and the reduction in size and weight of these is almost reached.

【0004】本発明は上述の点に鑑みてなされたもので
あり、その目的は、より小形、軽量化を実現した半導体
レーザ装置を提供することにある。
The present invention has been made in view of the above points, and an object of the present invention is to provide a semiconductor laser device which is smaller and lighter in weight.

【0005】[0005]

【課題を解決するための手段】上記の課題を解決するた
めに、本発明の半導体レーザ装置は、Si基板に形成し
たレーザ光をモニターするPDと、Si基板上に設けた
LDチップとこれらに必要な電極、およびSi基板の裏
面全域に形成した共通電極を有し、Si基板のレーザ光
出射側端部の段差を付けた端面に、出射レーザ光を透過
させる透明板を取り付け、LDチップと透明板との間、
およびLDチップとPDの全表面を透明樹脂で被覆する
構成としたものである。
In order to solve the above-mentioned problems, a semiconductor laser device of the present invention includes a PD for monitoring a laser beam formed on a Si substrate, an LD chip provided on the Si substrate, and It has a necessary electrode and a common electrode formed over the entire back surface of the Si substrate, and a transparent plate for transmitting the emitted laser light is attached to the stepped end face of the laser light emitting side end of the Si substrate to form an LD chip. Between the transparent plate,
In addition, the entire surface of the LD chip and PD is covered with a transparent resin.

【0006】[0006]

【作用】本発明の半導体レーザ装置は上記のように構成
したために、従来の金属ステムと金属キャンを用いるこ
となく、LDチップを搭載しているSi基板に、位置決
め基準を持たせることができ、従来半導体レーザ装置自
体に使用していた最も高価な部品を省いていることか
ら、低価格が実現されるとともに、全体の形状が極めて
小さく軽量化されているので、この装置が適用される光
ヘッド等の小形,軽量化も達成される。
Since the semiconductor laser device of the present invention is configured as described above, the Si substrate on which the LD chip is mounted can have a positioning reference without using the conventional metal stem and metal can. Since the most expensive parts that were used in the conventional semiconductor laser device itself are omitted, low cost is realized, and the overall shape is extremely small and lightweight, so the optical head to which this device is applied It is also possible to achieve small size and light weight.

【0007】[0007]

【実施例】以下、本発明を実施例に基づき説明する。図
1は本発明による半導体レーザ装置の構成を示す斜視図
であり、図3と共通部品は同一符号を用いてある。図1
において、LDチップ1は、位置決め基準としても用い
られるシリコン(Si)基板12上に設けてあり、この
Si基板12上には、LDチップ1の出力をモニターす
るPD2を備えている他、PD電極13,LD電極14
を有し、LDチップ1とLD電極14はリードワイヤ1
5で半田付けしている。Si基板12の裏面には共通電
極16を形成してある。これら各部材の電気的な接続関
係を図2に示すが、これについては後述する。
EXAMPLES The present invention will be described below based on examples. FIG. 1 is a perspective view showing the structure of a semiconductor laser device according to the present invention, and the same parts as those in FIG. 3 are designated by the same reference numerals. Figure 1
In FIG. 1, the LD chip 1 is provided on a silicon (Si) substrate 12 which is also used as a positioning reference, and a PD 2 for monitoring the output of the LD chip 1 is provided on the Si substrate 12 as well as a PD electrode. 13, LD electrode 14
And the LD chip 1 and the LD electrode 14 have the lead wire 1
Soldering with 5. A common electrode 16 is formed on the back surface of the Si substrate 12. The electrical connection relationship of each of these members is shown in FIG. 2, which will be described later.

【0008】Si基板12のレーザ光出力側は、レーザ
出射光を遮らないように、段差を形成した端面に、レー
ザ光を透過する透明板17を貼付してある。したがっ
て、LDチップ1のレーザ光出射面と透明板17とは間
隔を持つ。そしてPD2とLDチップ1との全表面を被
覆するとともに、LDチップ1のレーザ光出射面と透明
板17との間隔を満たすように、レーザ光の透過可能な
透明樹脂18を塗布している。透明板17は、光放射特
性(ファーフィールドパターン)を乱さないためであ
り、透明樹脂18は、LDチップ1が外気に曝されて、
酸化や変質を生ずるのを防止するためのものである。光
ヘッド等へ組み込む場合は、この装置のSi基板12の
角または陵等が適合する治具に、導電性接着剤でマウン
トする。
On the laser light output side of the Si substrate 12, a transparent plate 17 that transmits the laser light is attached to the end face where a step is formed so as not to block the laser emission light. Therefore, the laser light emitting surface of the LD chip 1 and the transparent plate 17 have a space. Then, while covering the entire surfaces of the PD 2 and the LD chip 1, a transparent resin 18 capable of transmitting laser light is applied so as to fill the space between the laser light emitting surface of the LD chip 1 and the transparent plate 17. This is because the transparent plate 17 does not disturb the light emission characteristic (far field pattern), and the transparent resin 18 exposes the LD chip 1 to the outside air,
The purpose is to prevent oxidation and deterioration. When incorporated in an optical head or the like, it is mounted with a conductive adhesive on a jig that fits the corners or edges of the Si substrate 12 of this device.

【0009】さて、図1ではSi基板12,LDチップ
1の内部構造や各電極の詳細を表わすことができないの
で、本発明の装置の電気的接続関係を明らかにするため
に、図2(a)に模式断面図、図2(b)に等価回路を
示す。図2(a)は図3と同一符号を用いてあるが、L
Dチップ1とPD2の各1個を接続した例である。図2
(a)ではSi基板12にn形Siを用い、通常の半導
体製造プロセスによりp形に変換した領域がPD2であ
り、p形領域と接続したPD2のp側電極13は、Si
基板12上に絶縁層19を介して、Si基板12の端部
まで張り出しており、外部接続用電極となっている。L
Dチップ1はSi基板12上に設けたp側電極20aに
直接接続され、Si基板12の裏側の共通電極16と同
電位となっている。LDチップ1のこれと反対側に設け
たn側電極20bは、Si基板12上に絶縁層21を介
して設けたLD電極14に、リードワイヤ15を用いて
半田付けする。図2(b)に等価回路を示すが、これは
図3に示す従来装置のLDとPDの関係のように、通常
の場合と同じである。
Since the internal structure of the Si substrate 12 and the LD chip 1 and the details of each electrode cannot be shown in FIG. 1, in order to clarify the electrical connection relationship of the device of the present invention, FIG. ) Shows a schematic sectional view, and FIG. 2B shows an equivalent circuit. 2 (a) uses the same symbols as in FIG. 3, but L
In this example, one D chip 1 and one PD 2 are connected. Figure 2
In (a), n-type Si is used for the Si substrate 12, and the region converted to p-type by a normal semiconductor manufacturing process is PD2, and the p-side electrode 13 of PD2 connected to the p-type region is Si.
It overhangs on the substrate 12 through the insulating layer 19 to the end portion of the Si substrate 12, and serves as an electrode for external connection. L
The D chip 1 is directly connected to the p-side electrode 20a provided on the Si substrate 12, and has the same potential as the common electrode 16 on the back side of the Si substrate 12. The n-side electrode 20b provided on the opposite side of the LD chip 1 is soldered to the LD electrode 14 provided on the Si substrate 12 via the insulating layer 21 using the lead wire 15. An equivalent circuit is shown in FIG. 2B, which is the same as the normal case, as in the relationship between the LD and PD of the conventional device shown in FIG.

【0010】以上のように、本発明の半導体レーザ装置
は、LDチップからのレーザ光をモニターするためのP
Dと、これに接続する2個の電極と、LDチップ用の2
個の電極を設けたSi基板の所定の位置に、LDチップ
を半田付けし、LDチップの反対側の電極と、Si基板
上のもう一つのLD電極とはワイヤボンディングにより
接続してある。LDチップのレーザ光出力側は、Si基
板の段差を形成した端面に透明板を貼付し、この透明板
はレーザ光を全て透過する。PDとLDチップの表面
は、透明樹脂によって厚く被覆し、この樹脂はLDチッ
プの光出射面と透明板との間にも充填している。この装
置構成は、従来の金属ステムと金属キャンを用いること
なく、LDチップを搭載しているSi基板に、位置決め
基準を持たせているものである。
As described above, the semiconductor laser device of the present invention has the P for monitoring the laser light from the LD chip.
D, two electrodes connected to it, and two for the LD chip
The LD chip is soldered at a predetermined position on the Si substrate provided with the individual electrodes, and the electrode on the opposite side of the LD chip and the other LD electrode on the Si substrate are connected by wire bonding. On the laser light output side of the LD chip, a transparent plate is attached to the end surface of the Si substrate on which the step is formed, and this transparent plate transmits all the laser light. The surfaces of the PD and the LD chip are thickly covered with a transparent resin, and this resin is also filled between the light emitting surface of the LD chip and the transparent plate. In this device configuration, a Si substrate on which an LD chip is mounted has a positioning reference without using a conventional metal stem and metal can.

【0011】[0011]

【発明の効果】従来の半導体レーザ装置の大きさや重量
は、その大部分を占めている金属ベースと金属キャンが
決定しているが、本発明では実施例で述べたように、S
i基板にPDとLDチップを搭載し、透明樹脂で被覆す
る構成としたために、重量部品を使用しなくて済み、極
めて小形、軽量化することができる。
The size and weight of the conventional semiconductor laser device are determined by the metal base and the metal can that occupy most of them, but in the present invention, as described in the embodiment, S
Since the PD and the LD chip are mounted on the i-substrate and covered with the transparent resin, it is not necessary to use heavy parts, and the size and weight can be extremely reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の半導体レーザ装置の構成を示す斜視図FIG. 1 is a perspective view showing the configuration of a semiconductor laser device of the present invention.

【図2】(a)は本発明の半導体レーザ装置の模式断面
図、(b)は同じく等価回路図
2A is a schematic cross-sectional view of a semiconductor laser device of the present invention, and FIG. 2B is an equivalent circuit diagram thereof.

【図3】従来の半導体レーザ装置の一部剥離斜視図FIG. 3 is a partially peeled perspective view of a conventional semiconductor laser device.

【符号の説明】[Explanation of symbols]

1 LDチップ 2 フォトダイオード 3 サブマウント 4 金属ベース 5 ヒートシンク 6 共通ポスト 7 ポスト 8 ポスト 9 ガラス窓 10 金属キャン 11 切り欠き 12 Si基板 13 PD電極 14 LD電極 15 リードワイヤ 16 共通電極 17 透明板 18 透明樹脂 19 絶縁層 20a LDのp側電極 20b LDのn側電極 21 絶縁層 1 LD Chip 2 Photodiode 3 Submount 4 Metal Base 5 Heat Sink 6 Common Post 7 Post 8 Post 9 Glass Window 10 Metal Can 11 Notch 12 Si Substrate 13 PD Electrode 14 LD Electrode 15 Lead Wire 16 Common Electrode 17 Transparent Plate 18 Transparent Resin 19 Insulating layer 20a LD p-side electrode 20b LD n-side electrode 21 Insulating layer

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】シリコン基板に形成しレーザ光をモニター
するフォトダイオードとその電極、前記シリコン基板上
に電気的に接続したレーザダイオードチップとその電
極、前記シリコン基板のレーザ光出射側端面に取り付け
出射レーザ光を全て透過させる大きさの透明板、前記レ
ーザダイオードチップと前記フォトダイオードの全表面
を被覆する透明樹脂、前記シリコン基板の裏面全域に形
成した共通電極を有することを特徴とする半導体レーザ
装置。
1. A photodiode formed on a silicon substrate for monitoring laser light and its electrode, a laser diode chip electrically connected to the silicon substrate and its electrode, and mounted on an end face of the silicon substrate on the laser light emitting side for emission. A semiconductor laser device comprising: a transparent plate sized to allow all laser light to pass therethrough, a transparent resin covering the entire front surface of the laser diode chip and the photodiode, and a common electrode formed over the entire back surface of the silicon substrate. ..
【請求項2】請求項1記載の半導体レーザ装置におい
て、シリコン基板のレーザ光出射側端部に形成した段差
部の端面に透明板を取り付けたことを特徴とする半導体
レーザ装置。
2. The semiconductor laser device according to claim 1, wherein a transparent plate is attached to an end surface of a step portion formed at an end portion of the silicon substrate on the laser light emitting side.
【請求項3】請求項1または2記載の半導体レーザ装置
において、レーザダイオードチップと透明板との間隔を
透明樹脂で埋めたことを特徴とする半導体レーザ装置。
3. The semiconductor laser device according to claim 1 or 2, wherein a gap between the laser diode chip and the transparent plate is filled with a transparent resin.
JP3223191A 1991-09-04 1991-09-04 Semiconductor laser device Pending JPH0563309A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3223191A JPH0563309A (en) 1991-09-04 1991-09-04 Semiconductor laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3223191A JPH0563309A (en) 1991-09-04 1991-09-04 Semiconductor laser device

Publications (1)

Publication Number Publication Date
JPH0563309A true JPH0563309A (en) 1993-03-12

Family

ID=16794230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3223191A Pending JPH0563309A (en) 1991-09-04 1991-09-04 Semiconductor laser device

Country Status (1)

Country Link
JP (1) JPH0563309A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5744857A (en) * 1996-01-30 1998-04-28 Mitsubishi Denki Kabushiki Kaisha Semiconductor device
WO2002029904A1 (en) * 2000-09-29 2002-04-11 Sanyo Electric Co., Ltd. Receiving optics and photosemiconductor device having the same
JP2002359403A (en) * 2001-05-31 2002-12-13 Nichia Chem Ind Ltd Light-emitting device
KR100444234B1 (en) * 2002-06-18 2004-08-16 삼성전기주식회사 Trench forming laser diode package and producing method thereof
JP2009290066A (en) * 2008-05-30 2009-12-10 Toshiba Corp Semiconductor light-emitting device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5744857A (en) * 1996-01-30 1998-04-28 Mitsubishi Denki Kabushiki Kaisha Semiconductor device
WO2002029904A1 (en) * 2000-09-29 2002-04-11 Sanyo Electric Co., Ltd. Receiving optics and photosemiconductor device having the same
US7777234B2 (en) 2000-09-29 2010-08-17 Sanyo Electric Co., Ltd. Light-receiving element and photonic semiconductor device provided therewith
JP2002359403A (en) * 2001-05-31 2002-12-13 Nichia Chem Ind Ltd Light-emitting device
KR100444234B1 (en) * 2002-06-18 2004-08-16 삼성전기주식회사 Trench forming laser diode package and producing method thereof
JP2009290066A (en) * 2008-05-30 2009-12-10 Toshiba Corp Semiconductor light-emitting device

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