JPH0561580B2 - - Google Patents
Info
- Publication number
- JPH0561580B2 JPH0561580B2 JP62293957A JP29395787A JPH0561580B2 JP H0561580 B2 JPH0561580 B2 JP H0561580B2 JP 62293957 A JP62293957 A JP 62293957A JP 29395787 A JP29395787 A JP 29395787A JP H0561580 B2 JPH0561580 B2 JP H0561580B2
- Authority
- JP
- Japan
- Prior art keywords
- reference electrode
- silver
- electrode
- insulating material
- conductive substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229910021607 Silver chloride Inorganic materials 0.000 description 21
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 21
- 238000000034 method Methods 0.000 description 15
- 239000004809 Teflon Substances 0.000 description 9
- 229920006362 Teflon® Polymers 0.000 description 9
- 239000011810 insulating material Substances 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 239000010408 film Substances 0.000 description 8
- 238000001659 ion-beam spectroscopy Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 150000002500 ions Chemical class 0.000 description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 6
- 229910052709 silver Inorganic materials 0.000 description 6
- 239000004332 silver Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910000906 Bronze Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 239000010974 bronze Substances 0.000 description 2
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 2
- ZOMNIUBKTOKEHS-UHFFFAOYSA-L dimercury dichloride Chemical class Cl[Hg][Hg]Cl ZOMNIUBKTOKEHS-UHFFFAOYSA-L 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000004925 denaturation Methods 0.000 description 1
- 230000036425 denaturation Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000000075 oxide glass Substances 0.000 description 1
- 229920000052 poly(p-xylylene) Polymers 0.000 description 1
- -1 polyparaxylylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000012047 saturated solution Substances 0.000 description 1
- 239000012085 test solution Substances 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Liquid Crystal (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62293957A JPH01136060A (ja) | 1987-11-24 | 1987-11-24 | 基準電極及びその製造方法 |
| US07/490,636 US5200053A (en) | 1987-11-24 | 1988-11-24 | Reference electrode |
| PCT/JP1988/001188 WO1989004959A1 (fr) | 1987-11-24 | 1988-11-24 | Electrode de reference |
| EP19880910119 EP0393188A4 (en) | 1987-11-24 | 1988-11-24 | Reference electrode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62293957A JPH01136060A (ja) | 1987-11-24 | 1987-11-24 | 基準電極及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01136060A JPH01136060A (ja) | 1989-05-29 |
| JPH0561580B2 true JPH0561580B2 (enrdf_load_stackoverflow) | 1993-09-06 |
Family
ID=17801373
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62293957A Granted JPH01136060A (ja) | 1987-11-24 | 1987-11-24 | 基準電極及びその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01136060A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070095661A1 (en) * | 2005-10-31 | 2007-05-03 | Yi Wang | Method of making, and, analyte sensor |
| TWI502195B (zh) | 2009-03-10 | 2015-10-01 | Senova Systems Inc | 在用於測量樣品中之分析物的電化學感測裝置中所用的多相分析物非敏感性電極、包含此電極的電化學感測裝置，與使用此感測裝置測量樣品中之分析物的方法 |
-
1987
- 1987-11-24 JP JP62293957A patent/JPH01136060A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01136060A (ja) | 1989-05-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |